WO2022047948A1 - Method for preparing aluminum-based conductive thin film with multilayer composite structure - Google Patents
Method for preparing aluminum-based conductive thin film with multilayer composite structure Download PDFInfo
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- WO2022047948A1 WO2022047948A1 PCT/CN2020/123850 CN2020123850W WO2022047948A1 WO 2022047948 A1 WO2022047948 A1 WO 2022047948A1 CN 2020123850 W CN2020123850 W CN 2020123850W WO 2022047948 A1 WO2022047948 A1 WO 2022047948A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
Definitions
- the invention relates to the technical field of coating, in particular to a preparation method of an aluminum-based conductive film with a multi-layer composite structure.
- Aluminized conductive film is a composite flexible packaging material formed by coating the surface of plastic film with multiple layers of extremely thin metal aluminum and aluminum oxide composite coatings.
- the most commonly used processing method is vacuum aluminizing method, which is In the high vacuum state, metal aluminum is melted and evaporated at high temperature, so that the vapor of aluminum is deposited on the surface of the plastic film, so that the surface of the plastic film has a metallic luster.
- Alumina coating can be produced by atmospheric natural oxidation (aging) during the process, ozone oxidation, or oxidation by transporting oxygen during vacuum aluminization. Because it not only has the characteristics of plastic film, but also has the conductive characteristics of metal, and the high barrier property of oxide, it is a cheap and beautiful, excellent performance and practical thin film material.
- the present invention provides a preparation method of an aluminum-based conductive film with a multi-layer composite structure.
- a preparation method of an aluminum-based conductive film of a multi-layer composite structure comprising the steps of:
- the original film is baked to remove moisture to ensure that no excess moisture reacts with the evaporated aluminum layer, resulting in poor adhesion and failure of firmness;
- S5 vapor-deposits the aluminum layer again, conducts at least one vacuum vapor deposition and coating oxidation on the film material, and immediately attaches to a separate cooling roller for cooling after each vapor deposition is completed; in this example, a total of three additional vapor depositions are performed, and each coating is 40nm;
- S6 is winding, and the film material that has been evaporated is collected into a roll.
- a further improvement of the present invention is that the number of times of the bottoming evaporation process in step S3 is 1-3 times.
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Abstract
A method for preparing an aluminum-based conductive thin film with a multilayer composite structure. The method specifically comprises: subjecting an original film to a film drying process (S1) to remove moisture, then installing same on a vacuum evaporation equipment, and heating an aluminum raw material by means of an evaporation source; delivering an appropriate amount of oxygen to the bottom of the evaporation source for aluminum oxide coating (S2); subjecting the film material to at least one priming evaporation process (S3); delivering an appropriate amount of oxygen (S4) to the interface, away from the evaporation source, of a coating layer; adjusting the evaporation amount and subjecting the film material to at least one vacuum evaporation and coating layer oxidation process again (S5); and after each evaporation process is finished, immediately fitting the film material onto an separate cooling roller for cooling, and collecting and rolling the evaporated film material (S6). By designing all the steps in the preparation process in the method for preparing the aluminum-based conductive thin film, damage to the film surface due to an over-high temperature in the vacuum evaporation process is avoided, the pass rate of the product is improved, and the production cost is reduced.
Description
本发明涉及镀膜技术领域，具体的说，是涉及一种多层复合结构的铝基导电薄膜的制备方法。The invention relates to the technical field of coating, in particular to a preparation method of an aluminum-based conductive film with a multi-layer composite structure.
镀铝导电膜是采用特殊工艺在塑料薄膜表面镀上多层极薄的金属铝与氧化铝的复合镀层而形成的一种复合软包装材料，其中最常用的加工方法当数真空镀铝法，就是在高真空状态下通过高温将金属铝融化蒸发，使铝的蒸汽沉淀堆积到塑料薄膜表面上，从而使塑料薄膜表面具有金属光泽。氧化铝镀层可由工艺过程中大气自然氧化(熟化)，臭氧氧化，或在真空镀铝过程中输送氧气进行氧化而生产。由于它既具有塑料薄膜的特性，又具有金属的导电特性，以及氧化物的高阻隔性，是一种廉价美观、性能优良、实用性强的薄膜材料。Aluminized conductive film is a composite flexible packaging material formed by coating the surface of plastic film with multiple layers of extremely thin metal aluminum and aluminum oxide composite coatings. The most commonly used processing method is vacuum aluminizing method, which is In the high vacuum state, metal aluminum is melted and evaporated at high temperature, so that the vapor of aluminum is deposited on the surface of the plastic film, so that the surface of the plastic film has a metallic luster. Alumina coating can be produced by atmospheric natural oxidation (aging) during the process, ozone oxidation, or oxidation by transporting oxygen during vacuum aluminization. Because it not only has the characteristics of plastic film, but also has the conductive characteristics of metal, and the high barrier property of oxide, it is a cheap and beautiful, excellent performance and practical thin film material.
现有的铝膜生产工艺主要的步骤为：选取基材---放卷---真空镀铝---收卷---分切，但是在实际生产中由于原膜耐热性差，在进行真空镀铝过程中容易导致膜面受热严重，造成膜面变形或断膜，使得材料报废。此外，纯铝镀层与塑料基材的附着力与阻隔性较弱，影响产品优率。The main steps of the existing aluminum film production process are: selecting the base material---unwinding---vacuum aluminizing---winding---cutting, but in actual production, due to the poor heat resistance of the original film, In the process of vacuum aluminum plating, it is easy to cause serious heating of the film surface, resulting in deformation of the film surface or film breakage, and the material is scrapped. In addition, the adhesion and barrier properties of the pure aluminum coating and the plastic substrate are weak, which affects the product quality rate.
以上缺陷，有待改善。The above defects need to be improved.
发明内容SUMMARY OF THE INVENTION
为了克服现有的技术的不足，本发明提供一种多层复合结构的铝基导电薄膜的制备方法。In order to overcome the deficiencies of the prior art, the present invention provides a preparation method of an aluminum-based conductive film with a multi-layer composite structure.
本发明技术方案如下所述：The technical scheme of the present invention is as follows:
一种多层复合结构的铝基导电薄膜的制备方法，包括步骤：A preparation method of an aluminum-based conductive film of a multi-layer composite structure, comprising the steps of:
S1烘膜，将原膜进行烘膜去除水分；S1 bake film, bake the original film to remove moisture;
S2氧化铝镀膜，将原膜安装至真空蒸镀设备，启动设备，在蒸镀设备内输送氧气或臭氧，开始走膜工艺；S2 aluminum oxide coating, install the original film to the vacuum evaporation equipment, start the equipment, transport oxygen or ozone in the evaporation equipment, and start the filming process;
S3打底蒸镀铝层，对膜材进行至少一次打底蒸镀，每次蒸镀完成后立即贴合 单独冷却辊进行冷却；S3 is primed and vapor-deposited an aluminum layer, and the film is subjected to at least one primed vapor-deposition, and is immediately attached to a separate cooling roller for cooling after each vapor-deposition is completed;
S4镀层氧化，在膜材离开蒸发源的界面处输送氧气，对刚形成的铝层表面进行氧化；The S4 coating is oxidized, and oxygen is transported at the interface where the film material leaves the evaporation source to oxidize the surface of the newly formed aluminum layer;
S5再次蒸镀铝层，对膜材进行至少一次真空蒸镀及镀层氧化，每次蒸镀完成后立即贴合单独冷却辊进行冷却；S5 vapor-deposits the aluminum layer again, and conducts at least one vacuum vapor deposition and coating oxidation on the film material. After each vapor deposition is completed, it is immediately attached to a separate cooling roller for cooling;
S6收卷，对已完成蒸镀的膜材进行收集成卷。S6 is winding, and the film material that has been evaporated is collected into a roll.
本制备方法具体为：将原膜进行烘膜工艺去除水分后安装至真空蒸镀设备，蒸发源加热铝原料，在蒸发源底部输送适量氧气进行氧化铝镀膜，对膜材进行至少一次打底蒸镀，在镀层离开蒸发源的界面处输送适量氧气，调整蒸镀量对膜材再进行至少一次真空蒸镀及镀层氧化，每次蒸镀完成后立即贴合单独冷却辊进行冷却，对已完成蒸镀的膜材进行收集成卷。The preparation method is specifically as follows: the original film is subjected to a drying process to remove moisture and then installed in a vacuum evaporation equipment, the evaporation source heats the aluminum raw material, an appropriate amount of oxygen is transported at the bottom of the evaporation source to carry out alumina coating, and the film material is subjected to at least one primer evaporation Plating, deliver an appropriate amount of oxygen at the interface where the coating leaves the evaporation source, adjust the evaporation amount, and perform at least one vacuum evaporation and coating oxidation on the film material. The vapor-deposited film is collected into rolls.
本发明的进一步改进在于：步骤S3中的单次镀层控制在30nm以内。A further improvement of the present invention is that the single coating in step S3 is controlled within 30 nm.
通过控制蒸镀量从而控制单次镀层厚度，避免蒸发量过大导致膜面受热严重，造成膜面变形或断膜，使产品报废。By controlling the amount of evaporation to control the thickness of a single coating, it is avoided that the film surface is severely heated due to excessive evaporation, resulting in deformation of the film surface or film breakage, and the product is scrapped.
本发明的进一步改进在于：步骤S4中输送氧气的管路口附带离子源功能。A further improvement of the present invention is that: in step S4, the pipeline port for transporting oxygen is provided with an ion source function.
离子源为氧分子提供动能，能够提高镀层氧化效果。The ion source provides kinetic energy for oxygen molecules, which can improve the oxidation effect of the coating.
本发明的进一步改进在于：步骤S5中的单次镀层控制在30-50nm。A further improvement of the present invention is that the single coating in step S5 is controlled at 30-50 nm.
打底蒸镀完成后提高单次蒸镀量，对膜材金属层进行加厚处理，避免因为持续使用低沉积量蒸镀将造成氧化层增多电阻率增高，影响产品效果。After the primer evaporation is completed, increase the amount of single evaporation, and thicken the metal layer of the film material to avoid the increase in the oxide layer and the increase in resistivity due to the continuous use of low deposition evaporation, which will affect the product effect.
本发明的进一步改进在于：步骤S3打底蒸镀工序次数为1-3次。A further improvement of the present invention is that the number of times of the bottoming evaporation process in step S3 is 1-3 times.
通过提前对膜材进行打底蒸镀，能够避免蒸发量过大导致膜面受热严重，造成膜面变形或断膜，使产品报废。By pre-evaporating the film material in advance, it can prevent the film surface from being seriously heated due to excessive evaporation, resulting in deformation of the film surface or film breakage, and the product being scrapped.
本发明的进一步改进在于：步骤S5工序次数为1-5次。A further improvement of the present invention is that: the number of steps in step S5 is 1-5 times.
通过对打底蒸镀完成后的膜材进行多次蒸镀，对膜材金属层进行加厚处理。The metal layer of the film material is thickened by vapor-depositing the film material after the primer evaporation is completed for multiple times.
本发明的进一步改进在于：原膜为PET，PI，PE或PP材质。A further improvement of the present invention is that the original film is made of PET, PI, PE or PP.
PET，PI，PE或PP材质的原膜在真空环境的蒸发镀膜过程相比其他材质效果更好，避免因为原膜材质的原因导致产品出现膜面变形或断膜等问题。The evaporation coating process of the original film made of PET, PI, PE or PP in a vacuum environment is better than other materials, avoiding problems such as film surface deformation or film breakage due to the original film material.
本发明的进一步改进在于：蒸镀温度为1200-1600摄氏度。A further improvement of the present invention is that the evaporation temperature is 1200-1600 degrees Celsius.
通过将蒸镀温度控制在1200-1600摄氏度，能够提高蒸镀效果，同时避免因为蒸镀温度过高造成膜面变形或断膜等问题。By controlling the vapor deposition temperature at 1200-1600 degrees Celsius, the vapor deposition effect can be improved, and at the same time, problems such as film surface deformation or film breakage caused by the high vapor deposition temperature can be avoided.
本发明的进一步改进在于：步骤S2-S6在同一真空腔体内完成。A further improvement of the present invention is that steps S2-S6 are completed in the same vacuum chamber.
蒸镀步骤在同一真空腔体内完成可有效消除薄膜多次在卷绕***中重复走带造成的打滑，打皱，变形等优率损失；能够避免薄膜多次破真空而暴露在大气环境下而受到水汽侵入，从而避免了镀层间脱离以及镀层疏松等问题；可避免多次破真空-重新换卷穿戴-腔体清洁-再抽真空-蒸发源再加热多个步骤重复发生造成的工时浪费。同时，因为腔体开启时间大幅减少，可最大程度地降低外部环境中颗粒物对真空腔体及内部部件与薄膜产品的污染及破坏，降低产品孔洞发生几率。The evaporation step is completed in the same vacuum chamber, which can effectively eliminate the loss of slippage, wrinkling, deformation and other advantages caused by the repeated tape transport of the film in the winding system for many times; it can avoid the film breaking the vacuum for many times and being exposed to the atmospheric environment. It is invaded by water vapor, thus avoiding the problems of separation between the coatings and loose coatings; it can avoid the waste of working hours caused by repeated repeated steps of vacuum breaking - re-rolling and wearing - cavity cleaning - re-vacuuming - evaporation source reheating. At the same time, because the opening time of the cavity is greatly reduced, the pollution and damage of the particles in the external environment to the vacuum cavity, internal components and film products can be minimized, and the probability of product holes can be reduced.
本发明的进一步改进在于：蒸发源采用电阻式蒸发、中频感应坩埚蒸发或电子束蒸发。A further improvement of the present invention is that: the evaporation source adopts resistance evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation.
电阻式蒸发、中频感应坩埚蒸发或电子束蒸发属于稳态蒸发，能够有效避免薄膜上产生孔洞，提高产品优率。Resistive evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation are steady-state evaporation, which can effectively avoid holes in the film and improve the product quality rate.
本发明的有益效果包括：本发明通过设计制备过程中的各个步骤，避免了在真空蒸镀过程中由于温度过高导致膜面受损，提高产品合格率，降低生产成本。通过在蒸镀前进行烘膜处理确保无多余水分与蒸镀后的铝层反应造成粘结力变差以及牢固度失效；通过制作氧化铝镀层提高镀层与原膜的粘结力；通过提前对膜材进行打底蒸镀，能够避免蒸发量过大导致膜面受热严重，造成膜面变形或断膜，使产品报废；每次蒸镀完成后膜材立即贴合单独冷却辊进行冷却，能够对上次镀膜过程中的膜材提供冷却保护，同时也对刚形成的铝层起到固化稳定作用，并为下次蒸镀提供降温准备。The beneficial effects of the present invention include: by designing each step in the preparation process, the present invention avoids damage to the film surface due to excessively high temperature during the vacuum evaporation process, improves the product qualification rate and reduces the production cost. By baking film treatment before evaporation, it is ensured that no excess water reacts with the aluminum layer after evaporation, resulting in poor adhesion and failure of firmness; by making aluminum oxide coating to improve the adhesion between the coating and the original film; The film material is primed and evaporated, which can prevent the film surface from being seriously heated due to excessive evaporation, resulting in deformation of the film surface or film breakage, and the product is scrapped; after each evaporation is completed, the film material is immediately attached to a separate cooling roller for cooling, which can It provides cooling protection for the film material in the last coating process, and also plays a role in curing and stabilizing the newly formed aluminum layer, and provides cooling preparation for the next evaporation.
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。In order to illustrate the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that are used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only These are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained according to these drawings without creative efforts.
图1为本发明实施例的步骤示意图。FIG. 1 is a schematic diagram of steps according to an embodiment of the present invention.
为了更好的解释本发明，以便于理解，下面结合附图，通过具体实施方式，对本发明作详细描述。显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。In order to better explain the present invention and facilitate understanding, the present invention will be described in detail below with reference to the accompanying drawings and through specific embodiments. Obviously, the described embodiments are only some, but not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
一种多层复合结构的铝基导电薄膜的制备方法，包括步骤：A preparation method of an aluminum-based conductive film of a multi-layer composite structure, comprising the steps of:
S1烘膜，将原膜进行烘膜去除水分，确保无多余水分与蒸镀后的铝层反应造成粘结力变差，造成牢固度失效；S1 baking film, the original film is baked to remove moisture to ensure that no excess moisture reacts with the evaporated aluminum layer, resulting in poor adhesion and failure of firmness;
S2将原膜安装至真空蒸镀设备，蒸发源加热铝原料开启蒸发镀铝，在蒸发源底部控制管路输送适量氧气或臭氧，然后开始走膜及镀膜工艺；本实施例中蒸发源优选小型单元坩埚，坩埚蒸发源属于稳态蒸发，结合单腔体多段蒸镀的工艺特点，可有效避免薄膜上产生孔洞。S2: Install the original film into the vacuum evaporation equipment, the evaporation source heats the aluminum raw material to start the evaporation aluminization, and the control pipeline at the bottom of the evaporation source transports an appropriate amount of oxygen or ozone, and then starts the filming and coating process; in this embodiment, the evaporation source is preferably small The unit crucible and the crucible evaporation source belong to steady-state evaporation. Combined with the process characteristics of single-chamber multi-stage evaporation, it can effectively avoid the generation of holes in the film.
S3打底蒸镀铝层，对膜材进行至少一次打底蒸镀，避免蒸发量过大导致膜面受热严重，造成膜面变形或断膜，使产品报废；本实施例共进行1次打底蒸镀，单次镀层为25nm；每次蒸镀完成后立即贴合单独冷却辊进行冷却，该冷却辊对上次镀膜过程中的膜材提供冷却保护，同时也对刚形成的铝层起到固化稳定作用，并且为接下来马上再进入下次蒸镀提供降温准备；S3 primed and evaporated aluminum layer, and performed priming evaporation on the film material at least once to avoid excessive evaporation, which would lead to serious heating of the film surface, resulting in deformation of the film surface or film breakage, and the product was scrapped; in this example, a total of 1 coating was carried out. Bottom evaporation, the single coating is 25nm; after each evaporation is completed, it is cooled by a separate cooling roller, which provides cooling protection for the film material in the previous coating process, and also plays a to the curing and stabilization effect, and provide cooling preparation for entering the next evaporation immediately;
S4镀层氧化，在膜材离开蒸发源的界面处输送适量氧气或臭氧，对刚形成的铝层表面进行适度氧化；The S4 coating is oxidized, and an appropriate amount of oxygen or ozone is transported at the interface where the film material leaves the evaporation source to moderately oxidize the surface of the newly formed aluminum layer;
S5再次蒸镀铝层，对膜材进行至少一次真空蒸镀及镀层氧化，每次蒸镀完成后立即贴合单独冷却辊进行冷却；本实施例共进行3次再次蒸镀，每次镀层为40nm；S5 vapor-deposits the aluminum layer again, conducts at least one vacuum vapor deposition and coating oxidation on the film material, and immediately attaches to a separate cooling roller for cooling after each vapor deposition is completed; in this example, a total of three additional vapor depositions are performed, and each coating is 40nm;
S6收卷，对已完成蒸镀的膜材进行收集成卷。S6 is winding, and the film material that has been evaporated is collected into a roll.
本发明通过设计制备过程中的各个步骤，避免了在真空蒸镀过程中由于温度过高导致膜面受损，同时通过在蒸镀前进行烘膜处理确保无多余水分与蒸镀后的铝层反应造成粘结力变差以及牢固度失效，提高产品合格率，降低生产成本。By designing each step in the preparation process, the invention avoids damage to the film surface due to excessively high temperature during the vacuum evaporation process, and at the same time, the film is baked before evaporation to ensure that there is no excess moisture and the aluminum layer after evaporation The reaction leads to poor adhesion and failure of firmness, improving product qualification rate and reducing production costs.
本发明的进一步改进在于：步骤S3中的单次镀层控制在30nm以内。通过控制蒸镀量从而控制单次镀层厚度，避免蒸发量过大导致膜面受热严重，造成膜面变形或断膜，使产品报废。A further improvement of the present invention is that the single coating in step S3 is controlled within 30 nm. By controlling the amount of evaporation to control the thickness of a single coating, it is avoided that the film surface is severely heated due to excessive evaporation, resulting in deformation of the film surface or film breakage, and the product is scrapped.
本发明的进一步改进在于：步骤S4中输送氧气的管路口附带离子源功能。离子源为氧分子提供动能，能够提高镀层氧化效果。A further improvement of the present invention is that: in step S4, the pipeline port for transporting oxygen is provided with an ion source function. The ion source provides kinetic energy for oxygen molecules, which can improve the oxidation effect of the coating.
本发明的进一步改进在于：步骤S5中的单次镀层控制在30-50nm。打底蒸镀完成后提高单次蒸镀量，对膜材金属层进行加厚处理，避免因为持续使用低沉积量蒸镀将造成氧化层增多电阻率增高，影响产品效果。A further improvement of the present invention is that the single coating in step S5 is controlled at 30-50 nm. After the primer evaporation is completed, increase the amount of single evaporation, and thicken the metal layer of the film material to avoid the increase in the oxide layer and the increase in resistivity due to the continuous use of low deposition evaporation, which will affect the product effect.
本发明的进一步改进在于：步骤S3打底蒸镀工序次数为1-3次。通过提前对膜材进行打底蒸镀，能够避免蒸发量过大导致膜面受热严重，造成膜面变形或断膜，使产品报废。A further improvement of the present invention is that the number of times of the bottoming evaporation process in step S3 is 1-3 times. By pre-evaporating the film material in advance, it can prevent the film surface from being seriously heated due to excessive evaporation, resulting in deformation of the film surface or film breakage, and the product being scrapped.
本发明的进一步改进在于：步骤S5工序次数为1-5次。通过对打底蒸镀完成后的膜材进行多次蒸镀，对膜材金属层进行加厚处理。A further improvement of the present invention is that: the number of steps in step S5 is 1-5 times. The metal layer of the film material is thickened by vapor-depositing the film material after the primer evaporation is completed for multiple times.
本发明的进一步改进在于：原膜为PET，PI，PE或PP材质。PET，PI，PE或PP材质的原膜在真空环境的蒸发镀膜过程相比其他材质效果更好，避免因为原膜材质的原因导致产品出现膜面变形或断膜等问题。A further improvement of the present invention is that the original film is made of PET, PI, PE or PP. The evaporation coating process of the original film made of PET, PI, PE or PP in a vacuum environment is better than other materials, avoiding problems such as film surface deformation or film breakage due to the original film material.
本发明的进一步改进在于：蒸镀温度为1200-1600摄氏度。通过将蒸镀温度控制在1200-1600摄氏度，能够提高蒸镀效果，同时避免因为蒸镀温度过高造成膜面变形或断膜等问题。A further improvement of the present invention is that the evaporation temperature is 1200-1600 degrees Celsius. By controlling the evaporation temperature at 1200-1600 degrees Celsius, the evaporation effect can be improved, and at the same time, problems such as film surface deformation or film breakage caused by too high evaporation temperature can be avoided.
本发明的进一步改进在于：步骤S2-S6在同一真空腔体内完成。蒸镀步骤在同一真空腔体内完成可有效消除薄膜多次在卷绕***中重复走带造成的打滑，打皱，变形等优率损失；能够避免薄膜多次破真空而暴露在大气环境下而受到水汽侵入，从而避免了镀层间脱离以及镀层疏松等问题；可避免多次破真空-重新换卷穿戴-腔体清洁-再抽真空-蒸发源再加热多个步骤重复发生造成的工时浪费。同时，因为腔体开启时间大幅减少，可最大程度地降低外部环境中颗粒物对真空腔体及内部部件与薄膜产品的污染及破坏，降低产品孔洞发生几率。A further improvement of the present invention is that steps S2-S6 are completed in the same vacuum chamber. The evaporation step is completed in the same vacuum chamber, which can effectively eliminate the slippage, wrinkling, deformation and other advantages of the film caused by repeated tape transport in the winding system. It is invaded by water vapor, thus avoiding the problems of separation between the coatings and loose coatings; it can avoid the waste of working hours caused by repeated repeated steps of vacuum breaking - re-rolling and wearing - cavity cleaning - re-vacuuming - evaporation source reheating. At the same time, because the opening time of the cavity is greatly reduced, the pollution and damage of the particles in the external environment to the vacuum cavity, internal components and film products can be minimized, and the probability of product holes can be reduced.
本发明的进一步改进在于：蒸发源采用电阻式蒸发、中频感应坩埚蒸发或电子束蒸发。电阻式蒸发、中频感应坩埚蒸发或电子束蒸发属于稳态蒸发，能够有效避免薄膜上产生孔洞，提高产品优率。A further improvement of the present invention is that: the evaporation source adopts resistance evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation. Resistive evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation are steady-state evaporation, which can effectively avoid holes in the film and improve the product quality rate.
应当理解的是，对本领域普通技术人员来说，可以根据上述说明加以改进或变换，而所有这些改进和变换都应属于本发明所附权利要求的保护范围。It should be understood that, for those skilled in the art, improvements or changes can be made according to the above description, and all these improvements and changes should fall within the protection scope of the appended claims of the present invention.
上面结合附图对本发明专利进行了示例性的描述，显然本发明专利的实现并不受上述方式的限制，只要采用了本发明专利的方法构思和技术方案进行的各种改进，或未经改进将本发明专利的构思和技术方案直接应用于其它场合的，均在本发明的保护范围内。The patent of the present invention has been exemplarily described above in conjunction with the accompanying drawings. Obviously, the realization of the patent of the present invention is not limited by the above-mentioned methods, as long as various improvements made by the method concept and technical scheme of the patent of the present invention are adopted, or no improvement is made. It is within the protection scope of the present invention to directly apply the concept and technical solution of the patent of the present invention to other occasions.
Claims (10)
- 一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，包括步骤：A preparation method of an aluminum-based conductive film of a multi-layer composite structure, characterized in that, comprising the steps of:S1烘膜，将原膜进行烘膜去除水分；S1 bake film, bake the original film to remove moisture;S2氧化铝镀膜，将原膜安装至真空蒸镀设备，启动设备，在蒸镀设备内输送氧气或臭氧，开始走膜工艺；S2 aluminum oxide coating, install the original film to the vacuum evaporation equipment, start the equipment, transport oxygen or ozone in the evaporation equipment, and start the filming process;S3打底蒸镀铝层，对膜材进行至少一次打底蒸镀，每次蒸镀完成后立即贴合单独冷却辊进行冷却；S3 primed and evaporated aluminum layer, and the film material was primed and evaporated at least once. After each evaporation was completed, it was immediately attached to a separate cooling roller for cooling;S4镀层氧化，在膜材离开蒸发源的界面处输送氧气，对刚形成的铝层表面进行氧化；The S4 coating is oxidized, and oxygen is transported at the interface where the film material leaves the evaporation source to oxidize the surface of the newly formed aluminum layer;S5再次蒸镀铝层，对膜材进行至少一次真空蒸镀及镀层氧化，每次蒸镀完成后立即贴合单独冷却辊进行冷却；S5 evaporates the aluminum layer again, and performs vacuum evaporation and coating oxidation on the film material at least once. After each evaporation is completed, it is immediately attached to a separate cooling roller for cooling;S6收卷，对已完成蒸镀的膜材进行收集成卷。S6 is winding, and the film material that has been evaporated is collected into a roll.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述步骤S3中的单次镀层控制在30nm以内。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the single coating in the step S3 is controlled within 30 nm.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述步骤S4中输送氧气的管路口附带离子源功能。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein in the step S4, the port of the pipeline for transporting oxygen is provided with an ion source function.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述步骤S5中的单次镀层控制在30-50nm。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the single coating in the step S5 is controlled at 30-50 nm.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述步骤S3打底蒸镀工序次数为1-3次。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, characterized in that, in step S3, the number of primer evaporation processes is 1-3 times.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述步骤S5工序次数为1-5次。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the number of times of the step S5 is 1-5 times.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述原膜为PET，PI，PE或PP材质。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the original film is made of PET, PI, PE or PP.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，蒸镀温度为1200-1600摄氏度。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the evaporation temperature is 1200-1600 degrees Celsius.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述步骤S2-S6在同一真空腔体内完成。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the steps S2-S6 are completed in the same vacuum chamber.
- 根据权利要求1所述的一种多层复合结构的铝基导电薄膜的制备方法，其特征在于，所述蒸发源采用电阻式蒸发、中频感应坩埚蒸发或电子束蒸发。The method for preparing an aluminum-based conductive film with a multi-layer composite structure according to claim 1, wherein the evaporation source adopts resistance evaporation, intermediate frequency induction crucible evaporation or electron beam evaporation.
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