CN110241397B - Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof - Google Patents
Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof Download PDFInfo
- Publication number
- CN110241397B CN110241397B CN201910672540.7A CN201910672540A CN110241397B CN 110241397 B CN110241397 B CN 110241397B CN 201910672540 A CN201910672540 A CN 201910672540A CN 110241397 B CN110241397 B CN 110241397B
- Authority
- CN
- China
- Prior art keywords
- radio frequency
- cavity
- film
- temperature zone
- unreeling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Abstract
The invention discloses horizontal multilayer magnetic control coating composite CVD equipment and a working method thereof, and relates to the field of roll-to-roll CVD film growth equipment. The CVD equipment comprises an equipment frame, wherein an unreeling mechanism, a structural valve III, a structural valve II, a structural valve I, a reeling mechanism, a first radio frequency cavity, a second radio frequency cavity, a temperature zone I and a temperature zone II are arranged at the top of the equipment frame; the CVD equipment can continuously, rapidly and efficiently prepare a composite film in a form of a large-area and high-quality metal film-sandwiched nanometer film.
Description
Technical Field
The invention relates to the field of roll-to-roll CVD film growth equipment, in particular to horizontal multilayer magnetic control coating composite CVD equipment and a working method thereof.
Background
The CVD film grows in a common vapor deposition method film, and single-sided or double-sided films are formed through single-temperature area or multi-temperature area deposition and are all single-layer films. Plasma enhanced CVD coating is also incapable of producing composite films in the form of multilayer-property metal films sandwiching nanofilms that are highly practical. At present, equipment for manufacturing a composite film in a mode that a metal film is clamped with a nano film is difficult to achieve that gases in a cavity are not interfered with each other in each independent working cavity.
The existing film growth technology mainly adopts a vapor deposition method or a Plasma Enhanced Chemical Vapor Deposition (PECVD) method, can continuously and rapidly prepare a film with large area and high quality and a CVD coating film, and rapidly prepare the film with high quality and large area on a substrate after the required raw material gas enters a cavity and is heated and cooled in a warm zone. In the plasma enhanced chemical vapor deposition method, a gas containing atoms of a thin film component is ionized by microwaves or radio frequency to locally form plasma, and the plasma has strong chemical activity and is easy to react, so that a desired thin film is deposited on a substrate. The method has the advantages of low basic temperature, high deposition rate, good film forming quality, fewer pinholes and difficult cracking.
However, the film forming is carried out by two methods, namely a vapor deposition method and a PECVD method, which are both single-sided or double-sided single-layer films, if a composite film in a form of a metal film and a nano film is required to be prepared, the expected effect cannot be achieved; and a plurality of independent working chambers are needed to cooperate together for preparing the film, when the working chambers work, the raw material gas and the protective gas are not the same in each cavity, so that the mutual noninterference of the gases in each cavity is not easy to realize.
Disclosure of Invention
In order to solve the technical problems, the invention aims to provide a horizontal multilayer magnetic control coating composite CVD device and a working method thereof.
The aim of the invention can be achieved by the following technical scheme:
the invention provides horizontal multilayer magnetic control coating composite CVD equipment, which comprises an equipment frame, wherein the top of the equipment frame is provided with an unreeling mechanism, a structural valve III, a structural valve II, a structural valve I, a reeling mechanism, a first radio frequency cavity, a second radio frequency cavity, a temperature zone I and a temperature zone II;
the unreeling mechanism comprises an unreeling cabin and an unreeling shaft, the unreeling shaft is located on the central axis of the unreeling cabin upwards, and one end of the unreeling cabin is connected with one end of the first radio frequency cavity through a first flange;
the other end of the first radio frequency cavity is connected with one end of a structure valve III, the other end of the structure valve III is connected with one end of a temperature zone II, the other end of the temperature zone II is connected with one end of a structure valve II, the other end of the structure valve II is connected with one end of a temperature zone I, the other end of the temperature zone I is connected with one end of a structure valve I, and the other end of the structure valve I is connected with one end of a second radio frequency cavity;
the structure valve III, the temperature zone I, the structure valve II, the temperature zone II and the structure valve I are provided with cylindrical cavities with the same diameter, and quartz tubes are arranged in the cylindrical cavities in a penetrating manner;
the winding mechanism comprises a winding cabin and a winding shaft, and the winding shaft is positioned on the central axis of the winding cabin upwards; the winding cabin is connected with the other end of the second radio frequency cavity through a second flange;
the first radio frequency cavity is internally provided with a first transmitting electrode, a first target material and a first grounding electrode, wherein the first target material is symmetrically arranged at the bottom of the first transmitting electrode and the top of the first grounding electrode;
the second radio frequency cavity is internally provided with a second transmitting electrode, a second target material and a second grounding electrode, and the second target material is symmetrically arranged at the bottom of the second transmitting electrode and the top of the second grounding electrode.
As a further scheme of the invention, a rotating motor for driving the unreeling shaft to rotate is arranged in the unreeling cabin; and a rotating motor for driving the winding shaft to rotate is arranged in the winding cabin.
As a further scheme of the invention, heating furnaces are arranged in the Wen Ouyi and the second temperature zone.
As a further scheme of the invention, the first transmitting electrode is positioned at the top of the inner cavity of the first radio frequency cavity, the longitudinal section of the first transmitting electrode is in an inverted T shape, the first grounding electrode is positioned at the bottom of the inner cavity of the first radio frequency cavity, the longitudinal section of the first grounding electrode is in a T shape, and the top wall of the first radio frequency cavity is connected with the first composite vacuum gauge.
As a further scheme of the invention, the second transmitting electrode is positioned at the top of the inner cavity of the second radio frequency cavity, the longitudinal section of the second transmitting electrode is in an inverted T shape, the second grounding electrode is positioned at the bottom of the inner cavity of the second radio frequency cavity, the longitudinal section of the second grounding electrode is in a T shape, and the top wall of the second radio frequency cavity is connected with the second composite vacuum gauge.
As a further scheme of the invention, the bottom of the first flange is provided with a pumping hole IV; and the top of the second flange is provided with a first air inlet.
As a further scheme of the invention, the top and the bottom of the first structural valve are respectively provided with a second air inlet and a first air extraction opening; the top and the bottom of the second structural valve are respectively provided with a third air inlet and a second air extraction opening; and the top and the bottom of the structural valve III are respectively provided with an air inlet IV and an air extraction opening III.
As a further scheme of the invention, a mechanical pump is arranged in the equipment frame, and a radio frequency controller and a flow controller are arranged on the outer wall of the equipment frame.
The invention also provides a working method of the horizontal multilayer magnetic control coating composite CVD equipment, which is suitable for the horizontal multilayer magnetic control coating composite CVD equipment and comprises the following steps:
1) Introducing inert gas Ar into the unreeling cabin, plugging the rolled base material on the unreeling shaft, and rolling the base material by a rotary motor in the unreeling cabin;
2) The radio frequency controller controls the starting of a radio frequency power supply, and a first transmitting electrode, a first target material and a first grounding electrode in the first radio frequency cavity work to excite the target body; sputtering target material to the substrate film to form a metal film;
3) Along with the rolling action of a rotating motor in the rolling cabin, the base material forwards passes through the second temperature area and the first temperature area, a second transmitting electrode, a second target material and a second grounding electrode in the second radio frequency cavity work, the target body is excited, the target body material is promoted to be sputtered to the base material, then the base material is covered with a nano film and a metal film, and the base material after film formation by adhesion and growth is continuously wound into a roll along with the rotating and tightening action of the rolling shaft;
4) And (3) continuously working the substrate after the growing film is collected by the winding shaft, closing the mechanical pump, continuously introducing Ar into the first air inlet, the second air inlet, the third air inlet and the fourth air inlet to maintain the cavity of the quartz tube at the atmospheric pressure, opening the winding cabin, taking out the winding shaft after the film is covered, and collecting the film.
The invention has the beneficial effects that:
1. the horizontal multilayer magnetically controlled film plating composite CVD equipment adopts the linkage of a winding shaft and a unwinding shaft on a reel-to-reel basis, a base material is subjected to the magnetically controlled sputtering of a first radio frequency cavity and a second radio frequency cavity, a target material is excited and sputtered on the base material by means of a radio frequency controller to form a layer of metal film, then a nano film prepared from raw material gas is formed by deposition in two temperature areas, a composite film in the form of the nano film sandwiched by the metal film can be obtained, and the air inlet and the air exhaust opening are respectively arranged at two ends of the two radio frequency cavities and the two temperature areas, so that the air inlet and the air exhaust opening work to achieve dynamic balance during working, and the effect that the gases in the cavities do not interfere with each other during working is achieved. The CVD equipment can continuously, rapidly and efficiently prepare the composite film with large area and high quality in the form of the metal film and the nano film.
2. According to the invention, the substrate is horizontally transversely connected with the unreeling shaft and the reeling shaft, so that the substrate film covering area is increased under the condition of no carrier; the first radio frequency cavity is excited by a radio frequency controller, a layer of metal film is sputtered on a base material, the metal film moves forward under the action of a rotating motor of a winding shaft, and a layer of nano film is continuously coated on the basis of the front layer of film after passing through a first temperature zone; and through the second temperature zone, perfecting the nano film layer on the basis of the front layer nano film, sputtering a target material through a second radio frequency cavity, covering a layer of metal film, and finally continuously rotating and tightening the winding shaft to prepare the composite film in the form of the metal film and the nano film on the substrate.
Drawings
The invention is further described below with reference to the accompanying drawings.
FIG. 1 is a schematic diagram of a horizontal multi-layer magnetron coating composite CVD apparatus according to the present invention.
In the figure: 1. a mechanical pump; 2. a winding cabin; 3. a winding shaft; 4. a substrate; 5. a second radio frequency cavity; 6. a second flange; 7. an air inlet I; 8. a second composite vacuum gauge; 9. a second emitter electrode; 10. a second target; 11. a second ground electrode; 12. an extraction opening I; 13. a first structural valve; 14. an air inlet II; 15. a first temperature zone; 16. an extraction opening II; 17. a second structural valve; 18. an air inlet III; 19. a second temperature zone; 20. a quartz tube; 21. an extraction opening III; 22. a structural valve III; 23. an air inlet is formed; 24. a first emitter electrode; 25. a first target; 26. a first ground electrode; 27. a first radio frequency cavity; 28. a fourth air extraction opening; 29. a reel is unreeled; 30. unreeling cabin; 31. a radio frequency controller; 32. a flow controller; 33. touching the control panel; 34. an equipment frame; 35. a first flange; 36. a first composite vacuum gauge.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
Referring to fig. 1, the embodiment provides a horizontal multi-layer magnetically controlled film plating composite CVD apparatus, which includes an apparatus frame 34, wherein an unreeling mechanism, a third structural valve 22, a second structural valve 17, a first structural valve 13, a reeling mechanism, a first rf cavity 27, a second rf cavity 5, a first temperature zone 15, and a second temperature zone 19 are disposed on top of the apparatus frame 34.
Specifically, the unreeling mechanism comprises an unreeling cabin 30 and an unreeling shaft 29, wherein the unreeling cabin 30 is used for introducing inert gas Ar, and the unreeling shaft 29 is used for racing package of the base material 4. A rotating motor for driving the unreeling shaft 29 to rotate is provided in the unreeling compartment 30. The unreeling shaft 29 is located on the central axis of the unreeling cabin 30 upwards, and one end of the unreeling cabin 30 is connected with one end of the first radio frequency cavity 27 through the first flange 35.
The other end of the first radio frequency cavity 27 is connected with one end of a structure valve III 22, the other end of the structure valve III 22 is connected with one end of a temperature zone II 19, the other end of the temperature zone II 19 is connected with one end of a structure valve II 17, the other end of the structure valve II 17 is connected with one end of a temperature zone I15, the other end of the temperature zone I15 is connected with one end of a structure valve I13, and the other end of the structure valve I13 is connected with one end of a second radio frequency cavity 5.
The winding mechanism comprises a winding cabin 2 and a winding shaft 3, a rotating motor for driving the winding shaft 3 to rotate is arranged in the winding cabin 2, and the winding shaft 3 is located on the central shaft of the winding cabin 2. The winding cabin 2 is connected with the other end of the second radio frequency cavity 5 through a second flange 6. The structure valve III 22, the temperature zone I15, the structure valve II 17, the temperature zone II 19 and the structure valve I13 are provided with cylindrical cavities with the same diameter, and a quartz tube 20 is arranged in the cylindrical cavities in a penetrating way. Heating furnaces are arranged in the first temperature zone 15 and the second temperature zone 19.
The first rf cavity 27 is internally provided with a first transmitting electrode 24, a first target 25 and a first grounding electrode 26, the first transmitting electrode 24 is positioned at the top of the inner cavity of the first rf cavity 27 and has an inverted T-shaped longitudinal section, the first grounding electrode 26 is positioned at the bottom of the inner cavity of the first rf cavity 27 and has a T-shaped longitudinal section, and the first target 25 is symmetrically arranged at the bottom of the first transmitting electrode 24 and the top of the first grounding electrode 26. A first composite vacuum gauge 36 is connected to the top wall of the first rf cavity 27.
The second radio frequency cavity 5 is internally provided with a second transmitting electrode 9, a second target 10 and a second grounding electrode 11, the second transmitting electrode 9 is positioned at the top of the inner cavity of the second radio frequency cavity 5 and is in an inverted T shape in longitudinal section, the second grounding electrode 11 is positioned at the bottom of the inner cavity of the second radio frequency cavity 5 and is in a T shape in longitudinal section, and the second target 10 is symmetrically arranged at the bottom of the second transmitting electrode 9 and the top of the second grounding electrode 11. The top wall of the second radio frequency cavity 5 is connected with a second composite vacuum gauge 8.
The bottom of the first flange 35 is provided with a fourth extraction opening 28; the top of the second flange 6 is provided with a first air inlet 7. The top and the bottom of the first structural valve 13 are respectively provided with a second air inlet 14 and a first air extraction opening 12. The top and the bottom of the second structural valve 17 are respectively provided with a third air inlet 18 and a second air extraction opening 16. The top and the bottom of the third structural valve 22 are respectively provided with a fourth air inlet 23 and a third air extraction opening 21. The design of a plurality of extraction openings and air inlets can be used for the mechanical pump 1 to extract vacuum from the inner cavity of the quartz tube 20, so as to ensure the vacuum degree requirement when the equipment is filled with raw material gas and other gases required to be used. Meanwhile, the air inlets at the top and the bottom of each working cavity and the air suction opening are used for air intake at one end and air suction at one end during working, so that the dynamic balance of air is achieved, and therefore the air in each working cavity is not interfered with each other during working.
The inside of the equipment frame 34 is provided with a mechanical pump 1, and the outer wall of the equipment frame 34 is provided with a radio frequency controller 31, a flow controller 32 and a touch control panel 33.
Example 2
Referring to fig. 1, the embodiment provides a working method of a horizontal multi-layer magnetically controlled film plating composite CVD apparatus, which includes the following steps:
1) Introducing inert gas Ar into the unreeling cabin 30, plugging the rolled base material 4 on the unreeling shaft 29, and rolling the base material by a rotary motor in the unreeling cabin 30;
2) The radio frequency controller 31 controls the starting of a radio frequency power supply, and the first transmitting electrode 24, the first target 25 and the first grounding electrode 26 in the first radio frequency cavity 27 work to excite the target; sputtering target material to the base material 4 to form a metal film;
3) Along with the rolling action of the rotating motor in the rolling cabin 2, the base material forwards passes through the second temperature area 19 and the first temperature area 15, the second transmitting electrode 9, the second target material 10 and the second grounding electrode 11 in the second radio frequency cavity 5 work to excite the target body, so that the target body material is promoted to be sputtered to the base material 4 and then coated with the nano film and the metal film, and the base material after the film is attached and grown continuously winds into a roll along with the rotating tightening action of the rolling shaft 3;
4) And (3) continuously working the substrate to be wound on the reel 3 to collect the grown film, closing the mechanical pump 1, continuously introducing Ar into the first air inlet 7, the second air inlet 14, the third air inlet 18 and the fourth air inlet 23 to maintain the cavity of the quartz tube 20 at the atmospheric pressure, opening the winding cabin 2, taking out the coated reel 3, and collecting the film.
The working method of the horizontal multilayer magnetic control coating composite CVD equipment comprises the following specific working processes:
s1, plugging the rolled base material 4 on a unreeling shaft 29, connecting a copper foil to the unreeling shaft 3 after passing through a quartz tube 20, closing a first structural valve 13, a second structural valve 17 and a third structural valve 22, starting a mechanical pump 1, sealing the quartz tube 20, and starting a vacuum pump to vacuumize each cavity to 10- 1 Pa；
S2, after the temperature of the heating furnace in the first temperature zone 15 and the second temperature zone 19 is programmed to 800 ℃, the first air inlet 7 and the fourth air inlet 23 continuously introduce protective gas, the second air inlet 14 and the third air inlet 18 introduce mixed gas of the protective gas and raw material gas, and the first air extraction port 12, the second air extraction port 16, the third air extraction port 21 and the fourth air extraction port 28 keep the same power for air extraction, so that the gases in all working cavities are not interfered with each other;
s3, starting a radio frequency controller 31, exciting the first radio frequency cavity 27 and the second radio frequency cavity 5, exciting a target body to sputter and cover a layer of metal film on the base material under the action of the unwinding shaft 29, and then continuously advancing the base material under the action of the rotating motor in the winding cabin 2, and cooling the first temperature zone 15 and the second temperature zone 19; the substrate passes through a second temperature zone 19, a layer of nano film is continuously coated on the basis of the front layer of film, the nano film layer is perfected on the basis of the front layer of nano film through a first temperature zone 15, then a layer of metal film is coated after the target body is excited through a second radio frequency cavity 5, and the substrate after the composite film in the form of the nano film is adhered and grown, and is continuously wound into a roll along with the rotating tightening action of a rolling shaft 3;
s4, continuously rotating the reel 3 to be wound to obtain a substrate with a composite film, closing the mechanical pump 1, continuously introducing Ar into the first air inlet 7, the second air inlet 14, the third air inlet 18 and the fourth air inlet 23 to maintain the inner cavity of the quartz tube 20 at the atmospheric pressure, taking out the reel with the film after the winding cabin 2 is opened, and collecting the film.
In the description of the present specification, the descriptions of the terms "one embodiment," "example," "specific example," and the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing is merely illustrative and explanatory of the invention, as various modifications and additions may be made to the particular embodiments described, or in a similar manner, by those skilled in the art, without departing from the scope of the invention or exceeding the scope of the invention as defined in the claims.
Claims (7)
1. The horizontal multilayer magnetically controlled film plating composite CVD equipment comprises an equipment frame (34) and is characterized in that an unreeling mechanism, a third structural valve (22), a second structural valve (17), a first structural valve (13), a reeling mechanism, a first radio frequency cavity (27), a second radio frequency cavity (5), a first temperature zone (15) and a second temperature zone (19) are arranged at the top of the equipment frame (34); the unreeling mechanism comprises an unreeling cabin (30) and an unreeling shaft (29), wherein the unreeling shaft (29) is positioned on the central axis of the unreeling cabin (30) upwards, and one end of the unreeling cabin (30) is connected with one end of the first radio frequency cavity (27) through a first flange (35); the other end of the first radio frequency cavity (27) is connected with one end of a structure valve III (22), the other end of the structure valve III (22) is connected with one end of a temperature zone II (19), the other end of the temperature zone II (19) is connected with one end of a structure valve II (17), the other end of the structure valve II (17) is connected with one end of a temperature zone I (15), the other end of the temperature zone I (15) is connected with one end of a structure valve I (13), and the other end of the structure valve I (13) is connected with one end of a second radio frequency cavity (5); the structure valve III (22), the temperature zone I (15), the structure valve II (17), the temperature zone II (19) and the structure valve I (13) are provided with cylindrical cavities with the same diameter, and quartz tubes (20) are arranged in the cylindrical cavities in a penetrating manner; the winding mechanism comprises a winding cabin (2) and a winding shaft (3), and the winding shaft (3) is positioned on the central axis of the winding cabin (2) upwards; the winding cabin (2) is connected with the other end of the second radio frequency cavity (5) through a second flange (6); a first transmitting electrode (24), a first target material (25) and a first grounding electrode (26) are arranged in the first radio frequency cavity (27), and the first target material (25) is symmetrically arranged at the bottom of the first transmitting electrode (24) and the top of the first grounding electrode (26); a second transmitting electrode (9), a second target material (10) and a second grounding electrode (11) are arranged in the second radio frequency cavity (5), and the second target material (10) is symmetrically arranged at the bottom of the second transmitting electrode (9) and the top of the second grounding electrode (11);
the bottom of the first flange (35) is provided with a fourth extraction opening (28); the top of the second flange (6) is provided with a first air inlet (7); the top and the bottom of the first structural valve (13) are respectively provided with a second air inlet (14) and a first air extraction opening (12); the top and the bottom of the second structural valve (17) are respectively provided with a third air inlet (18) and a second air extraction opening (16); the top and the bottom of the third structural valve (22) are respectively provided with a fourth air inlet (23) and a third air extraction opening (21);
the base material is subjected to magnetron sputtering through the first radio frequency cavity (27) and the second radio frequency cavity (5), a target material is excited and sputtered on the base material by means of a radio frequency controller to form a layer of metal film, then a nano film prepared from raw material gas is formed through deposition in two temperature areas, the base material can be continuously coated with a film to obtain a composite film in a mode that the metal film is clamped with the nano film, and an air inlet and an air extraction opening are respectively arranged at two ends of the two radio frequency cavities and the two temperature areas, so that the air inlet and the air extraction opening work to achieve dynamic balance during working, and the effect that the gases in the cavities do not interfere with each other during working is achieved.
2. The horizontal multilayer magnetically controlled film plating composite CVD apparatus according to claim 1, wherein a rotating motor for driving the unreeling shaft (29) to rotate is provided in the unreeling chamber (30); and a rotating motor for driving the winding shaft (3) to rotate is arranged in the winding cabin (2).
3. The horizontal multilayer magnetic control coating composite CVD device according to claim 1, wherein heating furnaces are arranged in the first temperature zone (15) and the second temperature zone (19).
4. The horizontal multilayer magnetically controlled film plating composite CVD apparatus according to claim 1, wherein the first emitter electrode (24) is located at the top of the inner cavity of the first rf cavity (27) and has an inverted T-shaped longitudinal section, the first ground electrode (26) is located at the bottom of the inner cavity of the first rf cavity (27) and has a T-shaped longitudinal section, and the top wall of the first rf cavity (27) is connected with the first composite vacuum gauge (36).
5. The horizontal multilayer magnetically controlled film plating composite CVD apparatus according to claim 1, wherein the second emitter electrode (9) is located at the top of the inner cavity of the second rf cavity (5) and has an inverted T-shaped longitudinal section, the second ground electrode (11) is located at the bottom of the inner cavity of the second rf cavity (5) and has a T-shaped longitudinal section, and the top wall of the second rf cavity (5) is connected with the second composite vacuum gauge (8).
6. The horizontal multilayer magnetic control film plating composite CVD equipment according to claim 1, wherein a mechanical pump (1) is arranged in the equipment frame (34), and a radio frequency controller (31) and a flow controller (32) are arranged on the outer wall of the equipment frame (34).
7. A method for operating a horizontal multilayer magnetically controlled film coating composite CVD apparatus, adapted to a horizontal multilayer magnetically controlled film coating composite CVD apparatus according to any one of claims 1 to 6, comprising the steps of:
1) Introducing inert gas Ar into the unreeling cabin (30), and plugging the rolled base material (4) on the unreeling shaft (29), wherein the base material is rolled by a rotary motor in the unreeling cabin (30);
2) The radio frequency control instrument (31) controls the starting of a radio frequency power supply, and a first transmitting electrode (24), a first target material (25) and a first grounding electrode (26) in the first radio frequency cavity (27) work to excite the target body; sputtering target material to a substrate (4) to form a metal film;
3) Along with the rolling action of a rotating motor in the rolling cabin (2), the base material forwards passes through a second temperature zone (19) and a first temperature zone (15), a second transmitting electrode (9), a second target material (10) and a second grounding electrode (11) in a second radio frequency cavity (5) work, the target body is excited, the target body material is promoted to be sputtered to the base material (4) and then coated with a nano film and a metal film, and the base material after film adhesion growth is continuously wound into a roll along with the rotating tightening action of a rolling shaft (3);
4) And (3) continuously working the base material after the growing film is collected by the winding shaft (3), closing the mechanical pump (1), continuously introducing Ar into the cavity of the quartz tube (20) by the first air inlet (7), the second air inlet (14), the third air inlet (18) and the fourth air inlet (23), opening the winding cabin (2), taking out the winding shaft (3) after the film is covered, and collecting the film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910672540.7A CN110241397B (en) | 2019-07-24 | 2019-07-24 | Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910672540.7A CN110241397B (en) | 2019-07-24 | 2019-07-24 | Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110241397A CN110241397A (en) | 2019-09-17 |
| CN110241397B true CN110241397B (en) | 2023-06-23 |
Family
ID=67893389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910672540.7A Active CN110241397B (en) | 2019-07-24 | 2019-07-24 | Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110241397B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111826633A (en) * | 2020-06-10 | 2020-10-27 | 合肥百思新材料研究院有限公司 | Continuous carbon fiber composite graphene preparation equipment |
| CN111807714B (en) * | 2020-06-10 | 2022-09-27 | 合肥百思新材料研究院有限公司 | Continuous self-cleaning glass substrate growth equipment |
Citations (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5016562A (en) * | 1988-04-27 | 1991-05-21 | Glasstech Solar, Inc. | Modular continuous vapor deposition system |
| US5609737A (en) * | 1993-08-24 | 1997-03-11 | Frontec Incorporated | Film manufacturing method using single reaction chamber for chemical-vapor deposition and sputtering |
| JPH09199430A (en) * | 1996-01-17 | 1997-07-31 | Canon Inc | Method and equipment for continuous formation of functional deposited film |
| EP1021592A1 (en) * | 1997-08-29 | 2000-07-26 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| JP2000260722A (en) * | 1999-01-07 | 2000-09-22 | Canon Inc | Substrate-processing method and substrate-processing apparatus |
| US6186090B1 (en) * | 1999-03-04 | 2001-02-13 | Energy Conversion Devices, Inc. | Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| JP2001279456A (en) * | 2000-03-30 | 2001-10-10 | Canon Inc | Deposited film treating system and method for it |
| US6576061B1 (en) * | 1998-12-22 | 2003-06-10 | Canon Kabushiki Kaisha | Apparatus and method for processing a substrate |
| JP2003183835A (en) * | 2002-09-02 | 2003-07-03 | Canon Inc | Process and apparatus for forming deposited film |
| US6841044B1 (en) * | 2002-08-28 | 2005-01-11 | Novellus Systems, Inc. | Chemically-enhanced physical vapor deposition |
| JP2005133165A (en) * | 2003-10-31 | 2005-05-26 | Masahito Yonezawa | Treatment device and treatment method for beltlike substrate |
| JP2007221171A (en) * | 2007-05-21 | 2007-08-30 | Canon Anelva Corp | Apparatus for forming different types of thin films |
| CN101348903A (en) * | 2008-08-29 | 2009-01-21 | 中国石油大学(北京) | Multifunctional small film deposition equipment |
| JP2009179838A (en) * | 2008-01-30 | 2009-08-13 | Fuji Electric Systems Co Ltd | Thin film production apparatus |
| JP2012031503A (en) * | 2010-06-30 | 2012-02-16 | Toyama Univ | Film forming device and film forming method of composite film |
| WO2012063318A1 (en) * | 2010-11-09 | 2012-05-18 | トーメイダイヤ株式会社 | Substrate for cvd diamond deposition and method for forming deposition surface |
| JP2012131194A (en) * | 2010-12-24 | 2012-07-12 | Konica Minolta Holdings Inc | Gas barrier film |
| JP2015101768A (en) * | 2013-11-26 | 2015-06-04 | 株式会社島津製作所 | Film deposition apparatus |
| CN105624640A (en) * | 2016-01-31 | 2016-06-01 | 安徽贝意克设备技术有限公司 | Roll-to-roll continuous grapheme film growth device and technique |
| JP2016132594A (en) * | 2015-01-20 | 2016-07-25 | 本田技研工業株式会社 | Production method of carbon nanotube and production apparatus of the same |
| CN107142463A (en) * | 2017-04-27 | 2017-09-08 | 湖州金象科技股份有限公司 | A kind of plasma activated chemical vapour deposition and magnetron sputtering or the compound coating method of ion plating |
| CN107697906A (en) * | 2017-08-21 | 2018-02-16 | 上海理工大学 | A kind of preparation method of copper/graphene composite material |
| CN207047318U (en) * | 2017-04-11 | 2018-02-27 | 㵢杰有限公司 | Continous way precipitation equipment |
| CN108690974A (en) * | 2017-04-11 | 2018-10-23 | *杰有限公司 | Continous way precipitation equipment and continous way deposition method |
| CN109680259A (en) * | 2019-02-18 | 2019-04-26 | 合肥百思新材料研究院有限公司 | A kind of roll-to-roll graphene film growth apparatus of vertical continuous P E enhancing |
| CN210420149U (en) * | 2019-07-24 | 2020-04-28 | 合肥百思新材料研究院有限公司 | Horizontal multilayer magnetic control coating composite CVD equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101239575B1 (en) * | 2010-08-16 | 2013-03-05 | 고려대학교 산학협력단 | Apparatus for forming gas barrier and method for forming thereof |
| EP2799589B1 (en) * | 2011-12-28 | 2021-04-07 | Dai Nippon Printing Co., Ltd. | Vapor deposition method having pretreatment that uses plasma |
-
2019
- 2019-07-24 CN CN201910672540.7A patent/CN110241397B/en active Active
Patent Citations (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5016562A (en) * | 1988-04-27 | 1991-05-21 | Glasstech Solar, Inc. | Modular continuous vapor deposition system |
| US5609737A (en) * | 1993-08-24 | 1997-03-11 | Frontec Incorporated | Film manufacturing method using single reaction chamber for chemical-vapor deposition and sputtering |
| JPH09199430A (en) * | 1996-01-17 | 1997-07-31 | Canon Inc | Method and equipment for continuous formation of functional deposited film |
| EP1021592A1 (en) * | 1997-08-29 | 2000-07-26 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
| US6576061B1 (en) * | 1998-12-22 | 2003-06-10 | Canon Kabushiki Kaisha | Apparatus and method for processing a substrate |
| JP2000260722A (en) * | 1999-01-07 | 2000-09-22 | Canon Inc | Substrate-processing method and substrate-processing apparatus |
| US6186090B1 (en) * | 1999-03-04 | 2001-02-13 | Energy Conversion Devices, Inc. | Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| JP2001279456A (en) * | 2000-03-30 | 2001-10-10 | Canon Inc | Deposited film treating system and method for it |
| US6841044B1 (en) * | 2002-08-28 | 2005-01-11 | Novellus Systems, Inc. | Chemically-enhanced physical vapor deposition |
| JP2003183835A (en) * | 2002-09-02 | 2003-07-03 | Canon Inc | Process and apparatus for forming deposited film |
| JP2005133165A (en) * | 2003-10-31 | 2005-05-26 | Masahito Yonezawa | Treatment device and treatment method for beltlike substrate |
| JP2007221171A (en) * | 2007-05-21 | 2007-08-30 | Canon Anelva Corp | Apparatus for forming different types of thin films |
| JP2009179838A (en) * | 2008-01-30 | 2009-08-13 | Fuji Electric Systems Co Ltd | Thin film production apparatus |
| CN101348903A (en) * | 2008-08-29 | 2009-01-21 | 中国石油大学(北京) | Multifunctional small film deposition equipment |
| JP2012031503A (en) * | 2010-06-30 | 2012-02-16 | Toyama Univ | Film forming device and film forming method of composite film |
| WO2012063318A1 (en) * | 2010-11-09 | 2012-05-18 | トーメイダイヤ株式会社 | Substrate for cvd diamond deposition and method for forming deposition surface |
| JP2012131194A (en) * | 2010-12-24 | 2012-07-12 | Konica Minolta Holdings Inc | Gas barrier film |
| JP2015101768A (en) * | 2013-11-26 | 2015-06-04 | 株式会社島津製作所 | Film deposition apparatus |
| JP2016132594A (en) * | 2015-01-20 | 2016-07-25 | 本田技研工業株式会社 | Production method of carbon nanotube and production apparatus of the same |
| CN105624640A (en) * | 2016-01-31 | 2016-06-01 | 安徽贝意克设备技术有限公司 | Roll-to-roll continuous grapheme film growth device and technique |
| CN207047318U (en) * | 2017-04-11 | 2018-02-27 | 㵢杰有限公司 | Continous way precipitation equipment |
| CN108690974A (en) * | 2017-04-11 | 2018-10-23 | *杰有限公司 | Continous way precipitation equipment and continous way deposition method |
| CN107142463A (en) * | 2017-04-27 | 2017-09-08 | 湖州金象科技股份有限公司 | A kind of plasma activated chemical vapour deposition and magnetron sputtering or the compound coating method of ion plating |
| CN107697906A (en) * | 2017-08-21 | 2018-02-16 | 上海理工大学 | A kind of preparation method of copper/graphene composite material |
| CN109680259A (en) * | 2019-02-18 | 2019-04-26 | 合肥百思新材料研究院有限公司 | A kind of roll-to-roll graphene film growth apparatus of vertical continuous P E enhancing |
| CN210420149U (en) * | 2019-07-24 | 2020-04-28 | 合肥百思新材料研究院有限公司 | Horizontal multilayer magnetic control coating composite CVD equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110241397A (en) | 2019-09-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110241397B (en) | Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof | |
| CN109680259B (en) | Vertical continuous PE reinforcing roll-to-roll graphene film growth equipment | |
| CN102021539B (en) | Film deposition method | |
| US8877291B2 (en) | Method of manufacturing thin film which suppresses unnecessary scattering and deposition of a source material | |
| US20100248970A1 (en) | Apparatus for and method of continuous hts tape buffer layer deposition using large scale ion beam assisted deposition | |
| WO2022047948A1 (en) | Method for preparing aluminum-based conductive thin film with multilayer composite structure | |
| CN111962037B (en) | Magnetron sputtering evaporation dual-system winding vacuum coating machine and coating process thereof | |
| CN106929806A (en) | High-barrier nano inorganic non-metallic film, its preparation method and vacuum winding filming equipment | |
| CN210420149U (en) | Horizontal multilayer magnetic control coating composite CVD equipment | |
| CN100485838C (en) | High speed winding multi-layer capacity film coater | |
| CN108933048B (en) | Manufacturing equipment and manufacturing process of metallized film for low-power-loss capacitor | |
| JPH09170072A (en) | Vacuum coating apparatus provided with crucible used for holding material to be evaporated and disposed in vacuum chamber | |
| CN104775102A (en) | Vacuum coating system combining reel-to-reel magnetron sputtering cathode and columnar multi-arc source | |
| CN2910966Y (en) | High speed winding multi-layered electric capacity thin film coating apparatus | |
| CN107217241A (en) | Reinforced graphite alkene coating thin film device and method based on PECVD | |
| CN212610876U (en) | Winding type optical film coating device based on magnetron sputtering and electron gun evaporation | |
| WO2024045748A1 (en) | Thin film deposition apparatus and thin film deposition method | |
| CN112794316A (en) | Device and method for continuously preparing vertically-oriented graphene on large scale by using plasma | |
| CN102157262B (en) | Method for preparing capacitor with Ta205 thin film as dielectric film | |
| CN100557073C (en) | A kind of method of growing cube-texture yttrium-stabile zirconium dioxide film | |
| CN209443080U (en) | Magnetron sputtering coating system | |
| CN209873092U (en) | Vertical continuous PE (polyethylene) enhanced roll-to-roll graphene film growth equipment | |
| CN206089793U (en) | Apparatus for preparing high resistant separates vacuum winding coating of nanometer inorganic non -metallic film | |
| WO2022146200A1 (en) | Method for forming an licoo2 film and device for carrying out same | |
| CN204644456U (en) | The vacuum coating film equipment that volume to volume magnetic control sputtering cathode combines with column multi-arc source |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20230109 Address after: 230000 China (Anhui) Pilot Free Trade Zone, Hefei, Anhui Province D7-308, Phase I, Innovation Industrial Park Road, No. 800, Wangjiang West Road, High-tech Zone, Hefei Applicant after: ANHUI BEQ EQUIPMENT TECHNOLOGY CO.,LTD. Address before: 238000 northwest corner of the intersection of Heping Avenue and Xiuhu Road, Chaohu Economic Development Zone, Hefei City, Anhui Province Applicant before: HEFEI BAISI NEW MATERIALS RESEARCH INSTITUTE Co.,Ltd. |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |