WO2022016658A1 - 一种显示面板及其制备方法、显示装置 - Google Patents

一种显示面板及其制备方法、显示装置 Download PDF

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Publication number
WO2022016658A1
WO2022016658A1 PCT/CN2020/111395 CN2020111395W WO2022016658A1 WO 2022016658 A1 WO2022016658 A1 WO 2022016658A1 CN 2020111395 W CN2020111395 W CN 2020111395W WO 2022016658 A1 WO2022016658 A1 WO 2022016658A1
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Prior art keywords
area
layer
functional area
functional
light
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PCT/CN2020/111395
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English (en)
French (fr)
Inventor
龚建国
王衣可
陈永胜
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武汉华星光电半导体显示技术有限公司
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Publication of WO2022016658A1 publication Critical patent/WO2022016658A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors

Definitions

  • the present application relates to the field of display panels, and in particular, to a display panel, a manufacturing method thereof, and a display device.
  • AMOLED Active-matrix organic light-emitting diode
  • the mainstream full-screen displays on the market include U-shaped notch-shaped full-screen displays and water-drop-shaped full-screen displays. These displays are designed to further increase the screen-to-body ratio.
  • the bangs and water droplets are mainly used to place non-display components such as cameras, which cannot be realized in the true sense. 's full screen.
  • FIG. 1 is a schematic top view of the under-screen camera display panel 100 provided in the prior art.
  • the display panel 100 includes a main display area 101 and a functional area. 102, the camera is arranged under the screen of the functional area 102, and the main display area 101 and the functional area 102 are activated together to realize a complete full-screen display.
  • the functional area 102 When the camera starts and needs to take a picture, the functional area 102 does not display the screen, and the light from the functional area 102 is collected by the camera module to perform the photographing action; while in the functional area 102, in order to make the camera imaging effect better, the pixel per unit area is The number is lower than that of the normal main display area 101 (that is, the PPI of the functional area 102 is lower than the PPI of the main display area 101 ), so as to maintain a high transmittance and facilitate the camera to display images.
  • the current implementation process is mainly to set different densities of vapor deposition through holes on the metal mask, which are realized by vapor deposition in the vapor deposition cavity.
  • the process difficulty increases and the cost increases.
  • the light-emitting layers prepared from metal masks with different densities of through-hole evaporation will lead to defective devices.
  • One object of the present invention is to provide a display panel, which can solve the problem that when preparing a full-screen under-screen camera area in the prior art, it is necessary to set different densities of vapor deposition through holes on the metal mask, and the process is complicated and the cost is high. The problem.
  • the present invention provides a display panel, comprising a functional area and a main display area surrounding the functional area, a substrate layer extending from the main display area to the functional area; an anode layer disposed on the substrate layer the pixel definition layer, which is arranged on the anode layer, the pixel definition layer has an opening, and the anode layer is exposed in the opening; the light-emitting structural unit is arranged in the opening; the functional area is In the light-transmitting area, in the functional area, there are several light-transmitting holes in the pixel definition layer.
  • the widths of the light-transmitting holes may be the same or different, and the light-transmitting holes may be hollowed out or filled with transparent materials, which can improve the light transmittance of the functional area.
  • the cross-sectional shape of the light-transmitting hole is a rectangle or a trapezoid, or other shapes, which are not limited here, as long as the light transmittance of the functional area can be improved. .
  • the pixel definition layer between two adjacent light-emitting structural units has a first width
  • the main display area between two adjacent light-emitting structural units
  • the pixel definition layer has a second width, the second width is smaller than the first width
  • the area of the opening of the functional area is smaller than the area of the opening of the main display area.
  • the light-transmitting holes with a larger number or a larger width can be arranged in the pixel definition layer in the functional area to further improve the light transmittance of the functional area.
  • the distance between the centers of two adjacent openings is the same. Therefore, the density of the openings on the functional area is the same as the density of the openings on the main display area.
  • the pixel density of the functional area is set to be the same as the pixel density of the main display area, so that the metal mask is no longer provided with different densities of vapor-deposited through holes, and the same density of vapor-deposited through holes is directly arranged, which reduces the difficulty of the process and reduces the cost.
  • the light-emitting structural unit includes a hole injection layer, which is provided on the anode layer; a hole transport layer, which is provided on the hole injection layer; and a light-emitting layer, which is provided on the anode layer. on the hole transport layer; an electron transport layer on the light-emitting layer; and an electron injection layer on the electron transport layer.
  • a cathode layer is also included, which is disposed on the light-emitting structural unit and the pixel definition layer.
  • the material of the anode layer on the functional area is a transparent material
  • the material of the cathode layer on the functional area is a transparent material. The light transmittance of the functional area is further improved.
  • the material of the anode layer in the main display area is an indium tin oxide film
  • the material of the cathode layer in the main display area is an alloy film
  • a functional component is also included, which is disposed below the functional area, and the functional component is an earpiece component, a camera component, or a flash.
  • the number of the functional areas is greater than 2, and the functional areas are located above the main display area, or may be located in the middle of the main display area, the location of which is not limited here. .
  • the substrate layer includes a base substrate; a light shielding layer is provided on the base substrate; an active layer is provided on the light shielding layer; and a gate insulating layer is provided on the on the active layer; a gate layer on the gate insulating layer; an interlayer dielectric layer on the gate layer; a source and drain layer on the interlayer dielectric layer; The flat layer is arranged on the source and drain layers; the anode layer is arranged on the flat layer.
  • the present invention also provides a preparation method for preparing the display panel involved in the present invention
  • the display panel includes a functional area and a main display area surrounding the functional area
  • the preparation method includes the following Steps: providing a substrate layer, the substrate layer extending from the main display area to the functional area; preparing an anode layer on the substrate layer; preparing a pixel definition layer on the anode layer, and on the pixel An opening is prepared on the definition layer, and the anode layer is exposed in the opening; a plurality of light-transmitting holes are prepared on the pixel definition layer on the functional area; and a light-emitting structural unit is prepared in the opening.
  • the step of preparing the light emitting structure includes providing a reticle, through which a luminescent material is evaporated to form a light emitting structure unit in the opening.
  • the area of the opening of the functional area is smaller than the area of the opening of the main display area, and the mask has an evaporation through hole corresponding to the opening.
  • the density of the vapor-deposited vias in the display area is the same as the density of the vapor-deposited vias in the display area. Vapor-deposited through holes with different densities are no longer arranged on the metal mask, which reduces the difficulty of the process and the cost.
  • the present invention further provides a display device including the display panel involved in the present invention.
  • the present invention provides a display panel, a preparation method thereof, and a display device, wherein the pixel density of the camera area under the screen is set to be the same as the pixel density of the main display area, so that the pixel density on the metal mask is equal to that of the main display area. Evaporation-deposited through holes with different densities are no longer provided, which reduces the difficulty of the process and reduces the cost; further, setting a number of light-transmitting holes on the pixel definition layer of the under-screen camera area can improve the light transmittance of the under-screen camera area.
  • FIG. 1 is a schematic top-view structural diagram of an under-screen camera display panel provided in the prior art
  • FIG. 2 is a schematic cross-sectional structural diagram of a display panel according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural diagram of a light-emitting structural unit provided in an embodiment of the present invention.
  • FIG. 4 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present invention.
  • a first feature "on” or “under” a second feature may include direct contact between the first and second features, or may include the first and second features Not directly but through additional features between them.
  • the first feature being “above”, “over” and “above” the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is level higher than the second feature.
  • the first feature is “below”, “below” and “below” the second feature includes the first feature being directly below and diagonally below the second feature, or simply means that the first feature has a lower level than the second feature.
  • FIG. 2 is a schematic cross-sectional structure of the display panel 100 provided in this embodiment.
  • the display panel 100 includes a functional area 102 and a main display area 101 surrounding the functional area 102.
  • the substrate layer 110 As well as the substrate layer 110 , the pixel definition layer 120 , the anode layer 130 , the light emitting structural unit 140 , the cathode layer 150 and functional components.
  • the substrate layer 110 extends from the main display area 101 to the functional area 102.
  • the substrate layer 110 includes a base substrate, a light shielding layer, an active layer, a gate insulating layer, a gate layer, an interlayer dielectric layer, and a source and drain layer. and flat layers.
  • the shading layer is arranged on the base substrate; the active layer is arranged on the shading layer; the gate insulating layer is arranged on the active layer; the gate layer is arranged on the gate insulating layer; the interlayer dielectric layer is arranged on the gate layer
  • the source and drain layers are arranged on the interlayer dielectric layer; the flat layer is arranged on the source and drain layers; the anode layer 130 is arranged on the flat layer.
  • the anode layer 130 is not described in detail for the structure of the substrate layer 110 .
  • the anode layer 130 is disposed on the substrate layer 110, the pixel definition layer 120 is disposed on the anode layer 130, the pixel definition layer 120 has an opening 121, the anode layer 130 is exposed in the opening 121, and the light emitting structure unit 140 is disposed in the opening 121;
  • the region 102 is a light-transmitting region.
  • the pixel defining layer 120 has a plurality of light-transmitting holes 122 .
  • the widths of the light-transmitting holes 122 are the same. In other embodiments, the widths of the light-transmitting holes 122 may also be different. In this embodiment, the light-transmitting holes 122 are hollowed out. It can also be filled with transparent materials, which can improve the light transmittance of the functional area 102 .
  • the cross-sectional shape of the light-transmitting hole 122 is a rectangle.
  • the width of the light-transmitting hole 122 may also be a trapezoid or other shapes, which are not limited here, as long as it is ensured that the functional area 102 can be increased in width. light transmittance.
  • the pixel definition layer 120 between two adjacent light emitting structural units 140 has a first width W1
  • the pixel definition layer 120 between two adjacent light emitting structural units 140 has a second width W1.
  • the width W2 and the second width W2 are smaller than the first width W1
  • the area of the opening 121 of the functional area 102 is smaller than the area of the opening 121 of the main display area 101.
  • More light-transmitting holes 122 with larger numbers or larger widths can be provided in the pixel definition layer 120 in the functional area 102 to further improve the light transmittance of the functional area 102 .
  • the distance between the centers of two adjacent openings 121 is the same, and the density of the openings 121 on the functional area 102 is the same as the density of the openings 121 on the main display area 101 .
  • the pixel density of the functional area 102 is set to be the same as the pixel density of the main display area 101, so that the metal mask is no longer provided with different densities of vapor deposition through holes, which reduces the difficulty of the process and reduces the cost.
  • FIG. 3 is a schematic structural diagram of a light-emitting structural unit provided in an embodiment of the present invention.
  • the light emitting structural unit 140 includes a hole injection layer 141 disposed on the anode layer 130; a hole transport layer 142 disposed on the hole injection layer 141; a light emitting layer 143 disposed on the hole transport layer 142; an electron transport layer 144 , which is arranged on the light-emitting layer 143 ; the electron injection layer 145 is arranged on the electron transport layer 144 .
  • the cathode layer 147 is disposed on the upper pixel definition layer 120 and the light emitting structure unit 140 .
  • the material of the anode layer 130 on the functional area 102 is a transparent material, and the material of the cathode layer 147 on the functional area 102 is a transparent material.
  • the light transmittance of the functional area 102 is further improved.
  • the material of the anode layer 130 of the main display area 101 is an indium tin oxide film
  • the material of the cathode layer 147 of the main display area 101 is an alloy film.
  • the functional component is arranged below the functional area 102, and the functional component is an earpiece component, a camera component or a flash.
  • the number of the functional areas 102 is greater than 2, and the functional areas 102 are located above the main display area 101 , and may also be located in the middle of the main display area 101 , the location of which is not limited herein.
  • An embodiment of the present invention further provides a preparation method for preparing the display panel 100 involved in the present invention.
  • the display panel 100 includes a functional area 102 and a main display area 101 surrounding the functional area 102.
  • FIG. 4 illustrates the present invention
  • the embodiment provides a flowchart of a method for manufacturing a display panel, and the method includes steps 1-5.
  • Step 1 A substrate layer 110 is provided, and the substrate layer 110 extends from the main display area 101 to the functional area 102 .
  • Step 2 preparing the anode layer 130 on the substrate layer 110 .
  • Step 3 preparing the pixel defining layer 120 on the anode layer 130 , and preparing an opening 121 on the pixel defining layer 120 , and the anode layer 130 is exposed in the opening 121 .
  • the width of the pixel definition layer 120 in the functional area 102 is larger than the width of the pixel definition layer 120 in the main display area 101 .
  • Step 4 preparing a plurality of light-transmitting holes 122 on the pixel definition layer 120 on the functional area 102 .
  • the width of the anode layer 130 in the functional area 102 is smaller than that of the anode layer 130 in the main display area 101 .
  • the material of the anode layer 130 on the functional area 102 is a transparent material.
  • Step 5 Provide a mask, and form the light-emitting structure unit 140 on the opening 121 by evaporating the light-emitting material through the mask.
  • the reticle includes a shielding portion and an evaporation through hole.
  • the evaporation through hole corresponds to the opening 121. Since the density of the opening 121 on the functional area 102 is the same as the density of the opening 121 on the main display area 101, the reticle is in the functional area 102. The density of the vapor-deposited vias is the same as that of the vapor-deposited vias in the main display area 101 . Vapor-deposited through holes with different densities are no longer arranged on the metal mask, which reduces the difficulty of the process and the cost.
  • the present invention further provides a display device including the display panel 100 involved in the present invention.
  • the present invention provides a display panel, a preparation method thereof, and a display device, wherein the pixel density of the camera area under the screen is set to be the same as the pixel density of the main display area, so that the metal mask is no longer set with different densities of pixels. Evaporating through-holes reduces the difficulty of the process and reduces the cost; further, setting a number of light-transmitting holes on the pixel definition layer of the under-screen camera area can improve the light transmittance of the under-screen camera area.
  • a display panel, a manufacturing method thereof, and a display device provided by the embodiments of the present application have been introduced in detail above.
  • the principles and implementations of the present application are described with specific examples. The descriptions of the above embodiments are only used for Help to understand the technical solution of the present application and its core idea; those of ordinary skill in the art should understand: it can still modify the technical solutions recorded in the foregoing embodiments, or perform equivalent replacements to some of the technical features; and these modifications Or alternatively, the essence of the corresponding technical solution does not deviate from the scope of the technical solutions of the embodiments of the present application.

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Abstract

本申请公开了一种显示面板及其制备方法、显示装置，所述显示面板包括功能区和围绕所述功能区的主显示区，基板层，从主显示区延伸至所述功能区；阳极层，设于所述基板层上；像素定义层，设于所述阳极层上，所述像素定义层上具有开口，所述阳极层裸露于所述开口中；在所述功能区，所述像素定义层中具有若干透光孔。

Description

一种显示面板及其制备方法、显示装置 技术领域
本申请涉及显示面板领域，尤其地涉及一种显示面板及其制备方法、显示装置。
 背景技术
有源矩阵有机发光二极管（Active-matrix organic light-emitting diode，AMOLED）是一种显示屏技术，AMOLED与多数手机使用的传统液晶显示器相比，具有更宽的视角、更高的刷新率和更薄的尺寸，因此正在得到智能手机采用。另外目前智能手机发展的趋势是向着全面屏方向的发展，即向用户提供更高屏占比的手机。
市面上主流的全面屏有U型刘海屏以及水滴型全面屏，此类显示屏的设计是为了进一步提高屏占比，刘海以及水滴部分主要用来放置摄像头等非显示部件，无法实现真正意义上的的全面屏。
现有技术中还提供一种屏下摄像头显示面板，请参阅图1，图1为现有技术中提供的屏下摄像头显示面板100的俯视结构示意图，显示面板100包括主显示区101和功能区102，摄像头设置于功能区102的屏下，主显示区101与功能区102一起启动，实现完全的全面屏显示。当摄像头启动需要进行拍照动作时，功能区102不进行画面显示，光线从功能区102被摄像头模组采集，进行拍照动作；而在功能区102，为了让摄像头成像效果更好，单位面积的像素个数相比正常主显示区101要低（即功能区102的PPI要低于主显示区101的PPI），从而保持高的透过率，方便摄像头呈像。
为了满足功能区102的低PPI需求、主显示区101高PPI的需求，目前实现工艺主要是在金属掩模板上设置不同密度的蒸镀通孔，通过在蒸镀腔体蒸镀来实现，实际工艺难度提升，成本升高。而且不同密度蒸镀通孔的金属掩模板制备的发光层，会导致器件不良。
因此，确有必要来开发一种新型的显示面板，以克服现有技术的缺陷。
 技术问题
本发明的一个目的是提供一种显示面板，其能够解决现有技术中制备全面屏的屏下摄像头区域时，需要在金属掩模板上设置不同密度的蒸镀通孔，其工艺复杂成本较高的问题。
 技术解决方案
为实现上述目的，本发明提供一种显示面板，包括功能区和围绕所述功能区的主显示区，基板层，从主显示区延伸至所述功能区；阳极层，设于所述基板层上；像素定义层，设于所述阳极层上，所述像素定义层上具有开口，所述阳极层裸露于所述开口中；发光结构单元，设于所述开口中；所述功能区为透光区，在所述功能区，所述像素定义层中具有若干透光孔。
其中，所述透光孔的宽度可以相同也可以不同，所述透光孔可以是镂空的，也可以填充透明材料，能够提高所述功能区的透光率。
进一步的，在其他实施方式中，其中所述透光孔的横截面形状为矩形或梯形，也可以为其他形状，在此不做限定，只要保证能够提高所述功能区的透光率即可。
进一步的，在其他实施方式中，其中在所述功能区，相邻两个发光结构单元之间的像素定义层具有第一宽度，在所述主显示区，相邻两个发光结构单元之间的像素定义层具有第二宽度，所述第二宽度小于第一宽度，所述功能区的开口的面积小于所述主显示区的开口的面积。能够在所述功能区内的所述像素定义层中设置更多数量或更大宽度的所述透光孔，进一步地提高所述功能区的透光率。
进一步的，在其他实施方式中，其中在所述主显示区和所述功能区，相邻两个所述开口的中心之间的间距均相同。故所述功能区上的所述开口的密度与所述主显示区上的所述开口的密度相同。
设置功能区的像素密度和主显示区的像素密度相同，使得金属掩模版上不再设置不同密度的蒸镀通孔，直接设置相同密度的蒸镀通孔，降低了工艺难度，降低了成本。
进一步的，在其他实施方式中，其中所述发光结构单元包括空穴注入层，设于所述阳极层上；空穴传输层，设于所述空穴注入层上；发光层，设于所述空穴传输层上；电子传输层，设于所述发光层上；电子注入层，设于所述电子传输层上。
进一步的，在其他实施方式中，其中还包括阴极层，设于所述发光结构单元和所述像素定义层上。
进一步的，在其他实施方式中，其中所述功能区上的所述阳极层的材料采用透明材料，所述功能区上的所述阴极层的材料采用透明材料。进一步地提高所述功能区的透光率。
在其他实施方式中，所述主显示区的所述阳极层的材料采用氧化铟锡薄膜，所述主显示区的所述阴极层的材料采用合金薄膜。
进一步的，在其他实施方式中，其中还包括功能组件，设于所述功能区的下方，所述功能组件为听筒组件或摄像头组件或闪光灯。
进一步的，在其他实施方式中，其中所述功能区的数量大于2，所述功能区位于所述主显示区的上方，也可以位于所述主显示区的中间，其位置在此不做限定。
进一步的，在其他实施方式中，其中所述基板层包括衬底基板；遮光层，设于所述衬底基板上；有源层，设于所述遮光层上；栅极绝缘层，设于所述有源层上；栅极层，设于所述栅极绝缘层上；层间介质层，设于所述栅极层上；源漏极层，设于所述层间介质层上；平坦层，设于所述源漏极层上；所述阳极层设于所述平坦层上。
为实现上述目标，本发明还提供一种制备方法，用以制备本发明涉及的所述显示面板，所述显示面板包括功能区和围绕所述功能区的主显示区，所述制备方法包括以下步骤：提供一基板层，所述基板层从所述主显示区延伸至所述功能区；制备阳极层于所述基板层上；制备像素定义层于所述阳极层上，并在所述像素定义层上制备开口，所述阳极层裸露于所述开口中；在所述功能区上的所述像素定义层上制备若干透光孔；制备发光结构单元于所述开口中。
进一步的，在其他实施方式中，其中制备所述发光结构的步骤包括提供一掩模版，通过所述掩模版蒸镀发光材料于所述开口中形成发光结构单元。
进一步的，在其他实施方式中，其中所述功能区的开口的面积小于所述主显示区的开口的面积，所述掩膜版具有与所述开口对应的蒸镀通孔，在所述功能区的所述蒸镀通孔的密度和在所述显示区的所述蒸镀通孔的密度相同。金属掩模版上不再设置不同密度的蒸镀通孔，降低了工艺难度，降低了成本。
为实现上述目标，本发明还提供一种显示装置，包括本发明涉及的所述显示面板。
 有益效果
相对于现有技术，本发明的有益效果在于：本发明提供一种显示面板及其制备方法、显示装置，设置屏下摄像头区域的像素密度和主显示区的像素密度相同，使得金属掩模版上不再设置不同密度的蒸镀通孔，降低了工艺难度，降低了成本；进一步地，在屏下摄像头区域的像素定义层上设置若干透光孔，能够提高屏下摄像头区域的透光率。
 附图说明
下面结合附图，通过对本申请的具体实施方式详细描述，将使本申请的技术方案及其它有益效果显而易见。
图1为现有技术中提供的屏下摄像头显示面板的俯视结构示意图；
图2为本发明实施例提供的显示面板的剖视结构示意图；
图3为本发明实施例中提供的发光结构单元的结构示意图；
图4为本发明实施例提供的显示面板的制备方法的流程图。
附图说明：
显示面板-100；
主显示区-101；功能区-102；
基板层-110；
像素定义层-120；阳极层-130；
开口-121；透光孔-122；
发光结构单元-140；空穴注入层-141；
空穴传输层-142；发光层-143；
电子传输层-144；电子注入层-145；
阴极层-150。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请中，除非另有明确的规定和限定，第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触，也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且，第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方，或仅仅表示第一特征水平高度小于第二特征。
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开，下文中对特定例子的部件和设置进行描述。当然，它们仅仅为示例，并且目的不在于限制本申请。此外，本申请可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。此外，本申请提供了的各种特定的工艺和材料的例子，但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
本发明实施例提供一种显示面板，请参阅图2，图2为本实施例提供的显示面板100的剖视结构示意，显示面板100包括功能区102和围绕功能区102的主显示区101，以及基板层110、像素定义层120、阳极层130、发光结构单元140、阴极层150和功能组件。
基板层110从主显示区101延伸至功能区102，具体地，基板层110包括衬底基板、遮光层、有源层、栅极绝缘层、栅极层、层间介质层、源漏极层和平坦层。其中遮光层设于衬底基板上；有源层设于遮光层上；栅极绝缘层设于有源层上；栅极层设于栅极绝缘层上；层间介质层设于栅极层上；源漏极层设于层间介质层上；平坦层设于源漏极层上；阳极层130设于平坦层上，本实施例的改进点在于功能区102内的像素定义层120和阳极层130，故对基板层110的结构不再一一赘述。
阳极层130设于基板层110上，像素定义层120设于阳极层130上，像素定义层120上具有开口121，阳极层130裸露于开口121中,发光结构单元140设于开口121中；功能区102为透光区，在功能区102，像素定义层120中具有若干透光孔122。
在本实施例中，透光孔122的宽度为相同的，在其他实施方式中，透光孔122的宽度也可以不同；在本实施例中，透光孔122是镂空的，在其他实施方式中，也可以填充透明材料，都能够提高功能区102的透光率。
在本实施例中，透光孔122的横截面形状为矩形，在其他实施方式中，透光孔122的宽度也可以梯形或其他形状，在此不做限定，只要保证能够提高功能区102的透光率即可。
在功能区102，相邻两个发光结构单元140之间的像素定义层120具有第一宽度W1，在主显示区101，相邻两个发光结构单元140之间的像素定义层120具有第二宽度W2，第二宽度W2小于第一宽度W1,功能区102的开口121的面积小于主显示区101的开口121的面积。能够在功能区102内的像素定义层120中设置更多数量或更大宽度的透光孔122，进一步地提高功能区102的透光率。
在主显示区101和功能区102，相邻两个开口121的中心之间的间距均相同，功能区102上的开口121的密度与主显示区101上的开口121的密度相同。
设置功能区102的像素密度和主显示区101的像素密度相同，使得金属掩模版上不再设置不同密度的蒸镀通孔，降低了工艺难度，降低了成本。
请参阅图3，图3为本发明实施例中提供的发光结构单元的结构示意图。发光结构单元140包括空穴注入层141，设于阳极层130上；空穴传输层142，设于空穴注入层141上；发光层143，设于空穴传输层142上；电子传输层144，设于发光层143上；电子注入层145，设于电子传输层144上。
阴极层147设于上像素定义层120和发光结构单元140上。
功能区102上的阳极层130的材料采用透明材料，功能区102上的阴极层147的材料采用透明材料。进一步地提高功能区102的透光率。
在其他实施方式中，主显示区101的阳极层130的材料采用氧化铟锡薄膜，主显示区101的阴极层147的材料采用合金薄膜。
功能组件，设于功能区102的下方，功能组件为听筒组件或摄像头组件或闪光灯。
功能区102的数量大于2，功能区102位于主显示区101的上方，也可以位于主显示区101的中间，其位置在此不做限定。
本发明实施例还提供一种制备方法，用以制备本发明涉及的显示面板100，显示面板100包括功能区102和围绕功能区102的主显示区101，请参阅图4，图4为本发明实施例提供的显示面板的制备方法的流程图，制备方法包括步骤1-步骤5。
步骤1：提供一基板层110，基板层110从主显示区101延伸至功能区102。
步骤2：制备阳极层130于基板层110上。
步骤3：制备像素定义层120于阳极层130上，并在像素定义层120上制备开口121，阳极层130裸露于开口121中。
其中，功能区102内的像素定义层120的宽度比主显示区101内的像素定义层120的宽度大。
步骤4：在功能区102上的像素定义层120上制备若干透光孔122。
其中，功能区102内的阳极层130的宽度比主显示区101内的阳极层130的宽度小。功能区102上的阳极层130的材料采用透明材料。
步骤5：提供一掩模版，通过掩模版蒸镀发光材料于开口121中上形成发光结构单元140。
掩模版包括遮挡部和蒸镀通孔，蒸镀通孔与开口121对应，由于功能区102上的开口121的密度与主显示区101上的121的密度相同，所以掩模版在功能区102的蒸镀通孔的密度和在主显示区101的蒸镀通孔的密度相同。金属掩模版上不再设置不同密度的蒸镀通孔，降低了工艺难度，降低了成本。
为实现上述目标，本发明还提供一种显示装置，包括本发明涉及的显示面板100。
本发明的有益效果在于：本发明提供一种显示面板及其制备方法、显示装置，设置屏下摄像头区域的像素密度和主显示区的像素密度相同，使得金属掩模版上不再设置不同密度的蒸镀通孔，降低了工艺难度，降低了成本；进一步地，在屏下摄像头区域的像素定义层上设置若干透光孔，能够提高屏下摄像头区域的透光率。
在上述实施例中，对各个实施例的描述都各有侧重，某个实施例中没有详述的部分，可以参见其他实施例的相关描述。
以上对本申请实施例所提供的一种显示面板及其制备方法、显示装置进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (16)

  1. 一种显示面板，其中，包括功能区和围绕所述功能区的主显示区，
    基板层，从主显示区延伸至所述功能区；
    阳极层，设于所述基板层上；
    像素定义层，设于所述阳极层上，所述像素定义层上具有开口，所述阳极层裸露于所述开口中；
    发光结构单元，设于所述开口中；
    所述功能区为透光区，在所述功能区，所述像素定义层中具有若干透光孔。
  2. 根据权利要求1所述的显示面板，其中，在所述功能区，相邻两个发光结构单元之间的像素定义层具有第一宽度，在所述主显示区，相邻两个发光结构单元之间的像素定义层具有第二宽度，所述第二宽度小于第一宽度。
  3. 根据权利要求1所述的显示面板，其中，所述功能区的开口的面积小于所述主显示区的开口的面积。
  4. 根据权利要求1所述的显示面板，其中，在所述主显示区和所述功能区，相邻两个所述开口的中心之间的间距均相同。
  5. 根据权利要求1所述的显示面板，其中，所述透光孔为镂空结构或者所述透光孔中填充有透明材料。
  6. 根据权利要求1所述的显示面板，其中，所述功能区上的所述阳极层的材料采用透明材料。
  7. 根据权利要求1所述的显示面板，其中，还包括
    功能组件，设于所述功能区的下方，所述功能组件为听筒组件或摄像头组件或闪光灯。
  8. 一种制备方法，用以制备如权利要求1所述的显示面板，包括功能区和围绕所述功能区的主显示区，其中，制备方法包括以下步骤：
    提供一基板层，所述基板层从所述主显示区延伸至所述功能区；
    制备阳极层于所述基板层上；
    制备像素定义层于所述阳极层上，并在所述像素定义层上制备开口，所述阳极层裸露于所述开口中；
    在所述功能区上的所述像素定义层上制备若干透光孔；
    提供一掩模版，通过所述掩模版蒸镀发光材料于所述开口中形成发光结构单元。
  9. 根据权利要8所述的制备方法，其中，所述功能区的开口的面积小于所述主显示区的开口的面积，所述掩膜版具有与所述开口对应的蒸镀通孔，在所述功能区的所述蒸镀通孔的密度和在所述显示区的所述蒸镀通孔的密度相同。
  10. 一种显示装置，其中，包括权利要求1所述的显示面板。
  11. 根据权利要求10所述的显示装置，其中，在所述功能区，相邻两个发光结构单元之间的像素定义层具有第一宽度，在所述主显示区，相邻两个发光结构单元之间的像素定义层具有第二宽度，所述第二宽度小于第一宽度。
  12. 根据权利要求10所述的显示装置，其中，所述功能区的开口的面积小于所述主显示区的开口的面积。
  13. 根据权利要求10所述的显示装置，其中，在所述主显示区和所述功能区，相邻两个所述开口的中心之间的间距均相同。
  14. 根据权利要求10所述的显示装置，其中，所述透光孔为镂空结构或者所述透光孔中填充有透明材料。
  15. 根据权利要求10所述的显示装置，其中，所述功能区上的所述阳极层的材料采用透明材料。
  16. 根据权利要求10所述的显示装置，其中，还包括
    功能组件，设于所述功能区的下方，所述功能组件为听筒组件或摄像头组件或闪光灯。
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