WO2021258886A1 - 一种显示面板及其制备方法和显示装置 - Google Patents

一种显示面板及其制备方法和显示装置 Download PDF

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Publication number
WO2021258886A1
WO2021258886A1 PCT/CN2021/093339 CN2021093339W WO2021258886A1 WO 2021258886 A1 WO2021258886 A1 WO 2021258886A1 CN 2021093339 W CN2021093339 W CN 2021093339W WO 2021258886 A1 WO2021258886 A1 WO 2021258886A1
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sub
pixel
pixels
transparent
display panel
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PCT/CN2021/093339
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English (en)
French (fr)
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刘月
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京东方科技集团股份有限公司
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Priority to US17/764,185 priority Critical patent/US20220352299A1/en
Publication of WO2021258886A1 publication Critical patent/WO2021258886A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/353—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8052—Cathodes
    • H10K59/80521—Cathodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • the embodiments of the present disclosure belong to the field of display technology, and specifically relate to a display panel, a manufacturing method thereof, and a display device.
  • OLED Organic Light-Emitting Diode
  • LCD Organic Light-Emitting Diode
  • Panel display has a tendency to replace the traditional liquid crystal display and become the recognized next-generation screen display technology.
  • OLED displays can be divided into active driving (AMOLED, Active Matrix OLED) and passive driving (PMOLED, Passive Matrix OLED).
  • AMOLED Active Matrix OLED
  • PMOLED Passive Matrix OLED
  • AMOLED Active Matrix OLED
  • PMOLED Passive Matrix OLED
  • the embodiment of the present disclosure provides a display panel, a manufacturing method thereof, and a display device.
  • an embodiment of the present disclosure provides a display panel, including: a substrate, a plurality of pixel units disposed on the substrate; the pixel units are arranged in an array, and the pixel units in two adjacent columns are formed at intervals Space area; the pixel unit includes a pixel defining layer and sub-pixels, the sub-pixels are arranged in the pixel area defined by the pixel defining layer; the cathodes of the sub-pixels in a row of the pixel units are connected as a whole;
  • a transparent suppression layer is further provided in the spacing area, the pixel defining layer and the transparency suppression layer are sequentially distributed away from the substrate, and the orthographic projection of the transparent suppression layer on the substrate completely covers the spacing area .
  • the transparent suppression layer uses a transparent inorganic inhibitor or organic inhibitor
  • the cathode uses magnesium or modified magnesium.
  • the transparent suppression layer uses any one of 8-hydroxyquinoline-lithium, 8-hydroxyquinoline aluminum, and lithium fluoride.
  • the sub-pixels include a first sub-pixel, a second sub-pixel, and a third sub-pixel;
  • the first sub-pixel and the second sub-pixel are arranged on a straight line, and the third sub-pixel is not on the same straight line with the first sub-pixel and the second sub-pixel.
  • the shape of the sub-pixel includes a regular hexagon
  • the first sub-pixels and the second sub-pixels are arranged along the row direction of the array, and along the row direction of the array, the third sub-pixels in any two adjacent pixel units are located thereon
  • the first sub-pixels and the second sub-pixels in the respective pixel units are arranged to form different sides of a straight line;
  • the third sub-pixels in each pixel unit are located on the same side of the pixel unit to which the first sub-pixels and the second sub-pixels are arranged to form a straight line. .
  • the shape of the sub-pixel includes a rectangle
  • the first sub-pixels and the second sub-pixels are arranged along the column direction of the array, and along the column direction of the array, the third sub-pixels in each of the pixel units are located in all of the respective pixel units.
  • the first sub-pixels and the second sub-pixels are arranged to form the same side of a straight line.
  • the first sub-pixel, the second sub-pixel, and the third sub-pixel are spaced apart from each other, and the third sub-pixel corresponds to the first sub-pixel and the The interval between the second sub-pixels.
  • the orthographic projection of the cathode on the substrate in a row of the pixel units covers all the sub-pixels in the pixel unit and the intervals between the sub-pixels.
  • the colors of the first sub-pixel, the second sub-pixel, and the third sub-pixel are different;
  • the color of the first sub-pixel is any one of red, green, and blue;
  • the color of the second sub-pixel is any one of red, green, and blue;
  • the color of the third sub-pixel is any one of red, green, and blue.
  • embodiments of the present disclosure also provide a display device, including the above-mentioned display panel.
  • embodiments of the present disclosure also provide a method for manufacturing a display panel, including:
  • Preparing a plurality of pixel units on a substrate the pixel units are arranged in an array, and the pixel units in two adjacent columns are spaced apart from each other to form a space;
  • Preparing the pixel unit includes preparing a pixel defining layer and sub-pixels, the sub-pixels are formed in the pixel area defined by the pixel defining layer; the cathodes of the sub-pixels in a row of the pixel units are formed as a whole;
  • the manufacturing method of the display panel further includes forming a transparent suppression layer after forming the pixel defining layer and before forming the cathode.
  • the orthographic projection on the substrate completely covers the spaced area.
  • forming the transparent suppressing layer includes: forming a portion of the transparent suppressing layer by vapor deposition using a mask with a portion of the transparent suppressing layer pattern;
  • forming the transparent suppression layer includes: splicing a first mask with a part of the transparent suppression layer pattern and a second mask with another part of the transparent suppression layer pattern to make a part of the transparent suppression layer
  • the pattern of the transparent suppression layer is spliced with another part of the pattern of the transparent suppression layer to form a complete pattern of the transparent suppression layer;
  • Vapor deposition forms the pattern of the transparent suppression layer.
  • the pattern of the transparent suppression layer on the first mask plate and the second mask plate are the same, and the pattern of a part of the transparent suppression layer on the first mask plate is the same as the pattern of the transparent suppression layer.
  • the graphics of the other part of the transparent suppression layer on the second mask partially overlap.
  • forming the cathode includes: forming the pattern of the cathode by vapor deposition using a mask with a first pattern;
  • the first pattern is an overall pattern of the area where the pixel unit is located and the spacing area on the substrate.
  • FIG. 1 is a top view of a structure of a display panel in an embodiment of the disclosure
  • FIG. 2 is a structural cross-sectional view of the display panel in FIG. 1 along a section line AA;
  • FIG. 3 is a top view of the arrangement of sub-pixels in the display panel in FIG. 1;
  • FIG. 4 is a top view of the structure of a mask with a pattern of a partially transparent suppression layer in an embodiment of the present disclosure
  • FIG. 5 is a schematic diagram of a process of forming a transparent suppression layer pattern by vapor deposition using the mask in FIG. 4;
  • FIG. 6 is a diagram showing the vapor deposition effect of a transparent suppression layer pattern and a cathode pattern of a display panel in an embodiment of the disclosure
  • FIG. 7 is a schematic diagram of a process of forming a transparent suppression layer pattern by vapor deposition using a first mask plate and a second mask plate in an embodiment of the disclosure
  • FIG. 8 is a top view of the structure of another display panel in an embodiment of the disclosure.
  • FIG. 9 is a structural cross-sectional view of the display panel in FIG. 8 along the BB section line;
  • FIG. 10 is a top view of the arrangement of sub-pixels in the display panel in FIG. 8;
  • FIG. 11 is a top view of the structure of a mask with a pattern of a partially transparent suppression layer in another embodiment of the present disclosure
  • FIG. 12 is a schematic diagram of a process of forming a transparent suppression layer pattern by vapor deposition using the mask in FIG. 11;
  • FIG. 12 is a schematic diagram of a process of forming a transparent suppression layer pattern by vapor deposition using the mask in FIG. 11;
  • FIG. 13 is an evaporation effect diagram of a transparent suppression layer pattern and a cathode pattern of another display panel in an embodiment of the disclosure
  • Fig. 14 is a schematic diagram of a process of forming a transparent suppression layer pattern by vapor deposition using a first mask plate and a second mask plate in another embodiment of the present disclosure.
  • Substrate 2. Pixel unit; 21, pixel defining layer; 22, sub-pixel; 220, anode; 221, light-emitting function layer; 222, cathode; 3. transparent suppression layer; 201, first sub-pixel; 202, first Two sub-pixels; 203. The third sub-pixel; 4. Partially transparent suppression layer pattern; 5. Mask plate; 6. Part of the transparent suppression layer pattern; 7. First mask plate; 8. Another part of the transparent suppression layer pattern; 9. The second mask.
  • under-screen identification devices such as under-screen cameras
  • certain requirements have been put forward for the transmittance of the screen.
  • the light transmission recognized under the screen is mainly realized through the spaced area between the cathodes.
  • the isolation column method is usually used to isolate the cathode of PMOLED, that is, the cathode is separated into independent areas by the isolation column, and the light transmission identified under the screen is mainly through the isolation column.
  • the area is realized, but the manufacturing process of the isolation column is complicated and the light transmittance is low; and sometimes the isolation column cannot completely separate the cathode into independent regions, which affects the display quality.
  • the exemplary embodiment of the present invention provides a display panel, a manufacturing method thereof, and a display device.
  • the embodiment of the present disclosure provides a display panel, as shown in FIG. 1 and FIG. 2, comprising: a substrate 1 and a plurality of pixel units 2 arranged on the substrate 1; the pixel units 2 are arranged in an array with two adjacent columns of pixel units 2.
  • the pixel unit 2 includes a pixel defining layer 21 and a sub-pixel 22.
  • the sub-pixel 22 is arranged in the pixel area defined by the pixel defining layer 21.
  • the sub-pixel 22 includes an anode 220 which is sequentially stacked on the substrate 1 and emits light.
  • the functional layer 221 and the cathode 222; the cathodes 222 of the sub-pixels 22 in a row of pixel units 2 are connected as a whole; the transparent suppression layer 3 is also provided in the interval area, and the pixel defining layer 21 and the transparency suppression layer 3 are distributed away from the substrate 1 in turn, and are transparent.
  • the orthographic projection of the suppression layer 3 on the substrate 1 completely covers the spaced area.
  • the transparent suppression layer 3 uses a transparent inorganic inhibitor or an organic inhibitor
  • the cathode 222 uses magnesium or modified magnesium.
  • the display panel is a passively driven OLED (PMOLED, Passive Matrix OLED) display panel.
  • PMOLED Passive Matrix OLED
  • Magnesium and inorganic inhibitors or organic inhibitors have mutually exclusive characteristics.
  • Modified magnesium refers to the modification of magnesium to make it more mutually exclusive with inorganic inhibitors or organic inhibitors.
  • the display panel adopts transparent inorganic inhibitor or organic inhibitor material for the transparent suppression layer 3, and uses magnesium or modified magnesium for the cathode 222. Since the material of the transparent suppression layer 3 and the material of the cathode 222 have mutually exclusive characteristics, Therefore, the transparent suppression layer 3 material can suppress the formation of the cathode 222 material.
  • the transparent suppression layer 3 material By forming the transparent suppression layer 3 material in the interval area, it can ensure that the cathode 222 material does not form a film in the interval area, and at the same time, it can ensure that the cathode 222 material can be completely covered.
  • the actual pixel light-emitting area so as to ensure that the cathodes 222 of the pixel units 2 in adjacent columns are independent of each other, thereby ensuring that the display panel can display normally; because the material of the transparency suppression layer 3 has good light transmission performance, it can greatly improve the light transmission of the display panel.
  • the light transmittance of the under-screen recognition equipment of the display panel can be greatly improved, thereby meeting the requirements of the under-screen recognition equipment for the light transmittance of the display panel; in addition, compared with the current technology of using spacers, a transparent suppression layer
  • the preparation process of 3 is simple, and the difficulty of process realization is low.
  • the transparent suppression layer 3 uses any one of 8-hydroxyquinoline-lithium (Liq), 8-hydroxyquinoline-aluminum (Alq 3 ), and lithium fluoride (LiF).
  • the sub-pixel 22 includes a first sub-pixel 201, a second sub-pixel 202, and a third sub-pixel 203; the first sub-pixel 201 and the second sub-pixel 202 are arranged on a straight line, The third sub-pixel 203 is not on the same straight line as the first sub-pixel 201 and the second sub-pixel 202.
  • the shape of the sub-pixel 22 includes a regular hexagon; the first sub-pixel 201 and the second sub-pixel 202 are arranged along the row direction X of the array, and along the row direction X of the array, any two adjacent pixel units 2
  • the third sub-pixel 203 in each pixel unit 2 is located on different sides of a straight line in which the first sub-pixel 201 and the second sub-pixel 202 are arranged; along the column direction Y of the array, the third sub-pixel in each pixel unit 2
  • the pixels 203 are located on the same side of the pixel unit 2 where the first sub-pixel 201 and the second sub-pixel 202 are arranged to form a straight line.
  • the shape of the sub-pixels 22 and the arrangement of the sub-pixels 22 can effectively increase the area of the spacing area when the display area of the display panel is fixed, thereby improving the light transmittance of the under-screen identification equipment, and better Meet the requirements of the under-screen recognition equipment for the light transmittance of the display panel.
  • the first sub-pixel 201, the second sub-pixel 202, and the third sub-pixel 203 are spaced apart from each other, and the third sub-pixel 203 corresponds to the distance between the first sub-pixel 201 and the second sub-pixel 202. interval.
  • the orthographic projection of the cathode 222 on the substrate 1 in a column of pixel units 2 covers all the sub-pixels 22 and the interval between the sub-pixels 22 in the column of pixel units 2.
  • the anodes of the sub-pixels 22 of the same color in each pixel unit 2 are respectively connected to a data line.
  • the colors of the first sub-pixel 201, the second sub-pixel 202, and the third sub-pixel 203 are different; the color of the first sub-pixel 201 is any one of red, green, and blue; the color of the second sub-pixel 202 The color is any one of red, green, and blue; the color of the third sub-pixel 203 is any one of red, green, and blue.
  • the sizes of the first sub-pixel 201 and the second sub-pixel 202 are the same, and the sizes of the third sub-pixel 203 and the first sub-pixel 201 and the second sub-pixel 202 may be the same or different, depending on actual needs. It depends on the display effect achieved.
  • the shape of the sub-pixels can also be circular or other regular polygonal shapes. As long as the area of the spacing area can be relatively increased, and the normal display of the display panel can be achieved, the shape of the sub-pixels can be arbitrary. Within the protection scope of the embodiments of the present disclosure.
  • this embodiment also provides a method for manufacturing the display panel, which includes: preparing a plurality of pixel units on a substrate; Area; preparing the pixel unit includes preparing a pixel defining layer and sub-pixels, and the sub-pixels are formed in the pixel area defined by the pixel defining layer; forming the sub-pixels includes sequentially forming an anode, a light-emitting functional layer and a cathode on a substrate; the sub-pixels in a column of pixel units
  • the cathode is formed as one body; the preparation method of the display panel further includes forming a transparent suppression layer after forming the pixel defining layer and before forming the cathode.
  • the transparent suppression layer is formed in the space area, and the orthographic projection of the transparent suppression layer on the substrate completely covers the space area.
  • the preparation method of the display panel before forming the transparent suppression layer includes: sequentially preparing an anode, a pixel defining layer, and a light-emitting function layer on a substrate; the preparation of the anode, the pixel defining layer, and the light-emitting function layer all adopt traditional processes, here No longer.
  • the material of the transparent suppression layer and the material of the cathode have mutually exclusive characteristics, the material of the transparent suppression layer can suppress the film formation of the cathode material.
  • the cathode material can be secured It will not form a film in the interval area, and at the same time, it can ensure that the cathode material can completely cover the actual pixel light-emitting area, thereby ensuring that the cathodes of adjacent columns of pixel units are independent of each other, thereby ensuring that the display panel can display normally; compared to the current preparation of isolation columns With the independent cathode technology, the preparation process of the transparent suppression layer is simple, and the process realization difficulty is low.
  • forming a transparent suppression layer includes:
  • Step S101 using the mask plate 5 with the partially transparent suppressing layer pattern 4 to vapor-deposit to form a portion of the transparent suppressing layer pattern.
  • Step S102 moving the mask 5 with the partially transparent suppressing layer pattern 4, and forming another partially transparent suppressing layer pattern by evaporation.
  • forming the cathode 222 includes: forming a pattern of the cathode 222 by vapor deposition using a mask with a first pattern; wherein the first pattern is the overall pattern of the area where the pixel unit is located and the spacing area on the substrate. That is, the first pattern corresponds to the display area on the entire display panel.
  • the cathode 222 pattern is formed by evaporation, since the pattern of the transparent suppression layer 3 has been formed in the interval area, based on the mutually exclusive characteristics of the transparent suppression layer material and the cathode material, the transparent In the pattern area of the suppression layer 3, the cathode material cannot be formed into a film, so that mutually independent cathode 222 patterns are formed.
  • the method for forming the transparent suppression layer may also be: as shown in FIG. 7, forming the transparent suppression layer includes:
  • Step S101' splicing the first mask 7 with a part of the transparent suppression layer pattern 6 and the second mask 9 with another part of the transparent suppression layer pattern 8 to make a part of the transparent suppression layer pattern 6 and another part of the transparent suppression layer Layer graphics 8 are spliced to form a complete transparent suppression layer graphics;
  • Step S102' vapor deposition to form a pattern of the transparent suppression layer.
  • the patterns of the transparent suppression layer on the first mask 7 and the second mask 9 are the same, and a part of the transparent suppression layer pattern 6 on the first mask 7 and the other on the second mask 9 A part of the transparent suppression layer pattern 8 partially overlaps.
  • a complete pattern of the transparent suppression layer can be formed by seamless splicing, so that the pattern of the transparent suppression layer can be formed by one evaporation.
  • the preparation process of the transparent suppression layer is simple, and the process realization difficulty is low.
  • the embodiment of the present disclosure also provides a display panel.
  • the shape of the sub-pixel 22 includes a rectangle;
  • the third sub-pixel 203 in each pixel unit 2 is located in the pixel unit 2 to which it belongs.
  • the first sub-pixel 201 and the second sub-pixel 202 are arranged to form a straight line. The same side.
  • the shape of the sub-pixels 22 and the arrangement of the sub-pixels 22 can effectively increase the area of the spacing area when the display area of the display panel is fixed, thereby improving the light transmittance of the under-screen identification equipment, and better Meet the requirements of the under-screen recognition equipment for the light transmittance of the display panel.
  • this embodiment also provides a method for manufacturing the display panel. As shown in FIGS. 11-14, the method for manufacturing the display panel in this embodiment is the same as that in the above embodiment, and will not be omitted here. Go into details.
  • the transparent suppression layer material can inhibit the formation of the cathode material.
  • the transparent suppression layer material By forming the transparent suppression layer material in the interval area, it can ensure that the cathode material will not form a film in the interval area, and at the same time, it can also ensure that the cathode material can completely cover the actual pixels.
  • the light-emitting area ensures that the cathodes of adjacent columns of pixel units are independent of each other, thereby ensuring that the display panel can display normally; because the transparent suppression layer material has better light transmission performance, it can greatly increase the light transmittance of the display panel, thereby making The light transmittance of the under-screen recognition device of the display panel can be greatly improved, thereby meeting the requirements of the under-screen recognition device for the light transmittance of the display panel; in addition, compared with the current technology of using spacers, the preparation process of the transparent suppression layer is simple. The process realization difficulty is low.
  • An embodiment of the present disclosure also provides a display device, including the display panel in any of the above-mentioned embodiments.
  • the display panel in any of the above embodiments, it can not only ensure that the display device can display normally, but also can increase the light transmittance of the display device, so as to meet the requirements of the under-screen recognition equipment for the light transmittance of the display device.
  • the preparation process of the display device is simple, and the process difficulty is low.
  • the display device provided by the exemplary embodiment of the present invention may be any product or component with a display function, such as an OLED panel, an OLED TV, a display, a mobile phone, and a navigator.
  • a display function such as an OLED panel, an OLED TV, a display, a mobile phone, and a navigator.

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Abstract

本公开实施例提供一种显示面板及其制备方法和显示装置。该显示面板包括：基板，设置在基板上的多个像素单元；像素单元排布呈阵列，相邻两列像素单元相互间隔形成间隔区域；像素单元包括像素限定层和子像素，子像素设置于像素限定层限定的像素区域内；一列像素单元中子像素的阴极连接为一体；间隔区域内还设置有透明抑制层，像素限定层和透明抑制层依次远离基板分布，且透明抑制层在基板上的正投影完全覆盖间隔区域。该显示面板能正常显示，能满足屏下识别设备对其光线透过率要求。

Description

一种显示面板及其制备方法和显示装置 技术领域
本公开实施例属于显示技术领域，具体涉及一种显示面板及其制备方法和显示装置。
背景技术
有机电激发光器件(OLED，OrganicLight-Emitting Diode)由于自主发光、色域广、响应快、面板薄、可弯曲、耐低温等独有的优异特性，已经广泛应用于手机，车载显示，相机等面板显示，大有取代传统的液晶显示器的趋势，成为公认的下一代屏幕显示技术。
OLED显示按驱动方式可以分为主动驱动式(AMOLED,Active Matrix OLED)和被动驱动式(PMOLED,Passive Matrix OLED)。PMOLED单纯地以阴极、阳极构成矩阵状，以扫描方式点亮阵列中的像素，每个像素都是操作在短脉冲模式下，为瞬间高亮度发光。优点是结构简单，可以有效降低制造成本。
发明内容
本公开实施例提供一种显示面板及其制备方法和显示装置。
第一方面，本公开实施例提供一种显示面板，包括：基板，设置在所述基板上的多个像素单元；所述像素单元排布呈阵列，相邻两列所述像素单元相互间隔形成间隔区域；所述像素单元包括像素限定层和子像素，所述子像素设置于所述像素限定层限定的像素区域内；一列所述像素单元中所述子像素的阴极连接为一体；
所述间隔区域内还设置有透明抑制层，所述像素限定层和所述透明抑制层依次远离所述基板分布，且所述透明抑制层在所述基板上的正投影完全覆盖所述间隔区域。
可选地，所述透明抑制层采用透明的无机抑制剂或者有机抑制剂，所 述阴极采用镁或者改性的镁。
可选地，所述透明抑制层采用8-羟基喹啉-锂、8-羟基喹啉铝、氟化锂中的任意一种。
可选地，所述子像素包括第一子像素、第二子像素和第三子像素；
所述第一子像素和所述第二子像素排布在一条直线上，所述第三子像素与所述第一子像素和所述第二子像素不在同一条直线上。
可选地，所述子像素的形状包括正六边形；
所述第一子像素和所述第二子像素沿所述阵列的行方向排布，沿所述阵列的行方向，任意相邻两个所述像素单元中的所述第三子像素位于其各自所属所述像素单元中所述第一子像素和所述第二子像素排布形成直线的不同侧；
沿所述阵列的列方向，各所述像素单元中的所述第三子像素位于其各自所属所述像素单元中所述第一子像素和所述第二子像素排布形成直线的相同侧。
可选地，所述子像素的形状包括矩形；
所述第一子像素和所述第二子像素沿所述阵列的列方向排布，沿所述阵列的列方向，各所述像素单元中的所述第三子像素位于其各自所属的所述像素单元中所述第一子像素和所述第二子像素排布形成直线的相同侧。
可选地，所述像素单元中，所述第一子像素、所述第二子像素和所述第三子像素相互间隔设置，所述第三子像素对应所述第一子像素和所述第二子像素之间的间隔。
可选地，一列所述像素单元中所述阴极在所述基板上的正投影覆盖一列所述像素单元中的所有所述子像素以及所述子像素之间的间隔。
可选地，所述第一子像素、所述第二子像素和所述第三子像素的颜色不同；
所述第一子像素的颜色为红、绿、蓝中的任意一种；
所述第二子像素的颜色为红、绿、蓝中的任意一种；
所述第三子像素的颜色为红、绿、蓝中的任意一种。
第二方面，本公开实施例还提供一种显示装置，包括上述显示面板。
第三方面，本公开实施例还提供一种显示面板的制备方法，包括：
在基板上制备多个像素单元；所述像素单元排布呈阵列，相邻两列所述像素单元相互间隔形成间隔区域；
制备所述像素单元包括制备像素限定层和子像素，所述子像素形成于所述像素限定层限定的像素区域内；一列所述像素单元中所述子像素的阴极形成为一体；
所述显示面板的制备方法在形成所述像素限定层之后且在形成所述阴极之前还包括形成透明抑制层，所述透明抑制层形成于所述间隔区域内，且所述透明抑制层在所述基板上的正投影完全覆盖所述间隔区域。
可选地，形成所述透明抑制层包括：采用具有部分所述透明抑制层图形的掩膜板蒸镀形成一部分所述透明抑制层的图形；
移动所述具有部分所述透明抑制层图形的掩膜板，蒸镀形成另一部分所述透明抑制层的图形。
可选地，形成所述透明抑制层包括：将具有一部分所述透明抑制层图形的第一掩膜板和具有另一部分所述透明抑制层图形的第二掩膜板进行拼接，使一部分所述透明抑制层图形和另一部分所述透明抑制层图形拼接形成完整的所述透明抑制层的图形；
蒸镀形成所述透明抑制层的图形。
可选地，所述第一掩膜板和所述第二掩膜板上的所述透明抑制层的图形相同，所述第一掩膜板上的一部分所述透明抑制层的图形和所述第二掩膜板上的另一部分所述透明抑制层的图形局部重叠。
可选地，形成所述阴极包括：采用具有第一图形的掩膜板蒸镀形成所述阴极的图形；
其中，所述第一图形为所述基板上所述像素单元所在区域以及所述间隔区域的整体图形。
附图说明
附图用来提供对本公开实施例的进一步理解，并且构成说明书的一部分，与本公开实施例一起用于解释本公开，并不构成对本公开的限制。通过参考附图对详细示例实施例进行描述，以上和其它特征和优点对本领域技术人员将变得更加显而易见，在附图中：
图1为本公开实施例中一种显示面板的结构俯视图；
图2为图1中显示面板沿AA剖切线的结构剖视图；
图3为图1中显示面板中的子像素排布俯视图；
图4为本公开一实施例中具有部分透明抑制层图形的掩膜板的结构俯视图；
图5为采用图4中的掩膜板蒸镀形成透明抑制层图形的过程示意图；
图6为本公开实施例中一种显示面板的透明抑制层图形和阴极图形的蒸镀效果图；
图7为本公开实施例中采用第一掩膜板和第二掩膜板蒸镀形成透明抑制层图形的过程示意图；
图8为本公开实施例中另一种显示面板的结构俯视图；
图9为图8中显示面板沿BB剖切线的结构剖视图；
图10为图8中显示面板中的子像素排布俯视图；
图11为本公开另一实施例中具有部分透明抑制层图形的掩膜板的结构俯视图；
图12为采用图11中的掩膜板蒸镀形成透明抑制层图形的过程示意图；
图13为本公开实施例中另一种显示面板的透明抑制层图形和阴极图形的蒸镀效果图；
图14为本公开另一实施例中采用第一掩膜板和第二掩膜板蒸镀形成透 明抑制层图形的过程示意图。
其中附图标记为：
1、基板；2、像素单元；21、像素限定层；22、子像素；220、阳极；221、发光功能层；222、阴极；3、透明抑制层；201、第一子像素；202、第二子像素；203、第三子像素；4、部分透明抑制层图形；5、掩膜板；6、一部分透明抑制层图形；7、第一掩膜板；8、另一部分透明抑制层图形；9、第二掩膜板。
具体实施方式
为使本领域技术人员更好地理解本公开实施例的技术方案，下面结合附图和具体实施方式对本公开实施例提供的一种显示面板及其制备方法和显示装置作进一步详细描述。
在下文中将参考附图更充分地描述本公开实施例，但是所示的实施例可以以不同形式来体现，且不应当被解释为限于本公开阐述的实施例。反之，提供这些实施例的目的在于使本公开透彻和完整，并将使本领域技术人员充分理解本公开的范围。
本公开实施例不限于附图中所示的实施例，而是包括基于制造工艺而形成的配置的修改。因此，附图中例示的区具有示意性属性，并且图中所示区的形状例示了区的具体形状，但并不是旨在限制性的。
随着“全面屏”时代的到来，屏下识别设备设计(如屏下摄像头)已成为主流解决方案，为了提高屏下识别设备的识别效果，对屏幕的透过率提出了一定的要求。屏下识别的透光主要是通过阴极之间的间隔区域实现。
对于PMOLED(Passive Matrix OLED，被动驱动式OLED)，目前通常采用隔离柱的方法隔离形成PMOLED的阴极，即通过隔离柱将阴极分隔成独立的区域，而屏下识别的透光主要是通过隔离柱区域实现，但隔离柱制作工艺复杂且光线透过率低；且有时隔离柱无法彻底将阴极分隔成独立区域，影响显示品质。
针对上述采用隔离柱的方法隔离形成PMOLED的阴极致使屏下识别透光率低的问题，本发明的示意性实施例提供一种显示面板及其制备方法和显示装置。
本公开实施例提供一种显示面板，如图1和图2所示，包括：基板1，设置在基板1上的多个像素单元2；像素单元2排布呈阵列，相邻两列像素单元2相互间隔形成间隔区域；像素单元2包括像素限定层21和子像素22，子像素22设置于像素限定层21限定的像素区域内，子像素22包括依次叠置于基板1上的阳极220、发光功能层221和阴极222；一列像素单元2中子像素22的阴极222连接为一体；间隔区域内还设置有透明抑制层3，像素限定层21和透明抑制层3依次远离基板1分布，且透明抑制层3在基板1上的正投影完全覆盖间隔区域。
可选地，本实施例中，透明抑制层3采用透明的无机抑制剂或者有机抑制剂，阴极222采用镁或者改性的镁。
该显示面板为被动驱动式OLED(PMOLED，Passive Matrix OLED)显示面板。镁与无机抑制剂或者有机抑制剂具有互斥特性。改性的镁指的是对镁进行改性，使其与无机抑制剂或者有机抑制剂具有更强的互斥特性。该显示面板通过使透明抑制层3采用透明的无机抑制剂或者有机抑制剂材料，以及使阴极222采用镁或者改性的镁，由于透明抑制层3的材料与阴极222的材料具有互斥特性，所以透明抑制层3材料能够抑制阴极222材料成膜，通过在间隔区域内形成透明抑制层3材料，能够确保阴极222材料不会在间隔区域内成膜，同时还能确保阴极222材料能完全覆盖实际像素发光区，从而保证相邻列像素单元2的阴极222彼此独立，进而确保显示面板能够正常显示；由于透明抑制层3材料具有较好的透光性能，所以能够大幅提高显示面板的光线透过率，从而使显示面板屏下识别设备的光线透过率能大大提高，进而满足了屏下识别设备对显示面板光线透过率的要求；另外， 相对目前采用隔离柱的技术，透明抑制层3的制备工艺简单，工艺实现难度低。
本实施例中，透明抑制层3采用8-羟基喹啉-锂(Liq)、8-羟基喹啉铝(Alq 3)、氟化锂(LiF)中的任意一种。
可选地，如图3所示，子像素22包括第一子像素201、第二子像素202和第三子像素203；第一子像素201和第二子像素202排布在一条直线上，第三子像素203与第一子像素201和第二子像素202不在同一条直线上。
进一步可选地，子像素22的形状包括正六边形；第一子像素201和第二子像素202沿阵列的行方向X排布，沿阵列的行方向X，任意相邻两个像素单元2中的第三子像素203位于其各自所属像素单元2中第一子像素201和第二子像素202排布形成直线的不同侧；沿阵列的列方向Y，各像素单元2中的第三子像素203位于其各自所属像素单元2中第一子像素201和第二子像素202排布形成直线的相同侧。该子像素22形状以及子像素22排布方式，能够在显示面板显示区面积一定的情况下，使间隔区域的面积有效增大，从而能提高屏下识别设备光线的透过率，更好地满足屏下识别设备对显示面板光线透过率的要求。
可选地，像素单元2中，第一子像素201、第二子像素202和第三子像素203相互间隔设置，第三子像素203对应第一子像素201和第二子像素202之间的间隔。如此设置，在显示面板显示区面积一定的情况下，能进一步使间隔区域的面积有效增大，从而能提高屏下识别设备光线的透过率，更好地满足屏下识别设备对显示面板光线透过率的要求。
可选地，一列像素单元2中阴极222在基板1上的正投影覆盖一列像素单元2中的所有子像素22以及子像素22之间的间隔。另外，一行像素单元2中，各个像素单元2中颜色相同的子像素22的阳极分别连接一条数据线。显示面板显示驱动时，一行像素单元2中的各像素单元2逐个扫描，阴极222逐条给信号，以实现对PMOLED显示面板的驱动显示。
可选地，第一子像素201、第二子像素202和第三子像素203的颜色不同；第一子像素201的颜色为红、绿、蓝中的任意一种；第二子像素202的颜色为红、绿、蓝中的任意一种；第三子像素203的颜色为红、绿、蓝中的任意一种。
需要说明的是，第一子像素201和第二子像素202的大小相同，第三子像素203与第一子像素201和第二子像素202的大小可以相同，也可以不同，具体根据实际需要实现的显示效果而定。
另外需要说明的是，子像素的形状也可以是圆形或者其它的正多边形形状，只要能够相对增大间隔区域的面积，又能实现显示面板的正常显示，子像素的形状可以任意，都在本公开实施例的保护范围内。
基于显示面板的上述结构，本实施例还提供一种该显示面板的制备方法，包括：在基板上制备多个像素单元；像素单元排布呈阵列，相邻两列所素单元相互间隔形成间隔区域；制备像素单元包括制备像素限定层和子像素，子像素形成于像素限定层限定的像素区域内；形成子像素包括依次在基板上形成阳极、发光功能层和阴极；一列像素单元中子像素的阴极形成为一体；显示面板的制备方法在形成像素限定层之后且在形成阴极之前还包括形成透明抑制层，透明抑制层形成于间隔区域内，且透明抑制层在基板上的正投影完全覆盖间隔区域。
本实施例中，显示面板的制备方法在形成透明抑制层之前包括：依次在基板上制备阳极、像素限定层、发光功能层；阳极、像素限定层、发光功能层的制备均采用传统工艺，这里不再赘述。
该显示面板的制备方法中，由于透明抑制层的材料与阴极的材料具有互斥特性，所以透明抑制层材料能够抑制阴极材料成膜，通过在间隔区域内形成透明抑制层材料，能够确保阴极材料不会在间隔区域内成膜，同时还能确保阴极材料能完全覆盖实际像素发光区，从而保证相邻列像素单元的阴极彼此独立，进而确保显示面板能够正常显示；相对于目前制备隔离 柱形成独立的阴极的技术，透明抑制层的制备工艺简单，工艺实现难度低。
可选地，如图4-图6所示，形成透明抑制层包括：
步骤S101:采用具有部分透明抑制层图形4的掩膜板5蒸镀形成一部分透明抑制层的图形。
步骤S102:移动具有部分透明抑制层图形4的掩膜板5，蒸镀形成另一部分透明抑制层的图形。
可选地，形成阴极222包括：采用具有第一图形的掩膜板蒸镀形成阴极222的图形；其中，第一图形为基板上像素单元所在区域以及间隔区域的整体图形。即第一图形对应整个显示面板上的显示区，蒸镀形成阴极222图形时，由于已经在间隔区域内形成透明抑制层3的图形，基于透明抑制层材料与阴极材料的互斥特性，在透明抑制层3图形区域，阴极材料无法成膜，从而形成了相互独立的阴极222图形。
需要说明的是，本实施例中显示面板的制备方法中，形成透明抑制层的方法也可以为：如图7所示，形成透明抑制层包括：
步骤S101'：将具有一部分透明抑制层图形6的第一掩膜板7和具有另一部分透明抑制层图形8的第二掩膜板9进行拼接，使一部分透明抑制层图形6和另一部分透明抑制层图形8拼接形成完整的透明抑制层的图形；
步骤S102'：蒸镀形成透明抑制层的图形。
可选地，第一掩膜板7和第二掩膜板9上的透明抑制层的图形相同，第一掩膜板7上的一部分透明抑制层图形6和第二掩膜板9上的另一部分透明抑制层图形8局部重叠。如此能够无缝拼接形成完整的透明抑制层的图形，从而通过一次蒸镀即可形成透明抑制层的图形。
该显示面板的制备方法，透明抑制层的制备工艺简单，工艺实现难度低。
本公开实施例还提供一种显示面板，与上述实施例中不同的是，如图8-图10所示，子像素22的形状包括矩形；第一子像素201和第二子像素202沿阵列的列方向Y排布，沿阵列的列方向Y，各像素单元2中的第三子像素203位于其各自所属的像素单元2中第一子像素201和第二子像素202排布形成直线的相同侧。
该子像素22形状以及子像素22排布方式，能够在显示面板显示区面积一定的情况下，使间隔区域的面积有效增大，从而能提高屏下识别设备光线的透过率，更好地满足屏下识别设备对显示面板光线透过率的要求。
本实施例中显示面板的其他结构与上述实施例中相同，此处不再赘述。
基于显示面板的上述结构，本实施例还提供一种该显示面板的制备方法，如图11-图14所示，本实施例中显示面板的制备方法与上述实施例中相同，此处不再赘述。
上述实施例中所提供的显示面板，通过使透明抑制层采用透明的无机抑制剂或者有机抑制剂材料，以及使阴极采用镁或者改性的镁，由于透明抑制层的材料与阴极的材料具有互斥特性，所以透明抑制层材料能够抑制阴极材料成膜，通过在间隔区域内形成透明抑制层材料，能够确保阴极材料不会在间隔区域内成膜，同时还能确保阴极材料能完全覆盖实际像素发光区，从而保证相邻列像素单元的阴极彼此独立，进而确保显示面板能够正常显示；由于透明抑制层材料具有较好的透光性能，所以能够大幅提高显示面板的光线透过率，从而使显示面板屏下识别设备的光线透过率能大大提高，进而满足了屏下识别设备对显示面板光线透过率的要求；另外，相对目前采用隔离柱的技术，透明抑制层的制备工艺简单，工艺实现难度低。
本公开实施例还提供一种显示装置，包括上述任一实施例中的显示面板。
通过采用上述任一实施例中的显示面板，不仅能确保该显示装置能够正常显示，而且能够提高该显示装置的光线透过率，从而满足屏下识别设备对显示装置光线透过率的要求，且该显示装置制备工艺简单，工艺难度低。
本发明示意性实施例所提供的显示装置可以为OLED面板、OLED电视、显示器、手机、导航仪等任何具有显示功能的产品或部件。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (15)

  1. 一种显示面板，其特征在于，包括：基板，设置在所述基板上的多个像素单元；所述像素单元排布呈阵列，相邻两列所述像素单元相互间隔形成间隔区域；所述像素单元包括像素限定层和子像素，所述子像素设置于所述像素限定层限定的像素区域内；一列所述像素单元中所述子像素的阴极连接为一体；
    所述间隔区域内还设置有透明抑制层，所述像素限定层和所述透明抑制层依次远离所述基板分布，且所述透明抑制层在所述基板上的正投影完全覆盖所述间隔区域。
  2. 根据权利要求1所述的显示面板，其特征在于，所述透明抑制层采用透明的无机抑制剂或者有机抑制剂，所述阴极采用镁或者改性的镁。
  3. 根据权利要求2所述的显示面板，其特征在于，所述透明抑制层采用8-羟基喹啉-锂、8-羟基喹啉铝、氟化锂中的任意一种。
  4. 根据权利要求1所述的显示面板，其特征在于，所述子像素包括第一子像素、第二子像素和第三子像素；
    所述第一子像素和所述第二子像素排布在一条直线上，所述第三子像素与所述第一子像素和所述第二子像素不在同一条直线上。
  5. 根据权利要求4所述的显示面板，其特征在于，所述子像素的形状包括正六边形；
    所述第一子像素和所述第二子像素沿所述阵列的行方向排布，沿所述阵列的行方向，任意相邻两个所述像素单元中的所述第三子像素位于其各 自所属所述像素单元中所述第一子像素和所述第二子像素排布形成直线的不同侧；
    沿所述阵列的列方向，各所述像素单元中的所述第三子像素位于其各自所属所述像素单元中所述第一子像素和所述第二子像素排布形成直线的相同侧。
  6. 根据权利要求4所述的显示面板，其特征在于，所述子像素的形状包括矩形；
    所述第一子像素和所述第二子像素沿所述阵列的列方向排布，沿所述阵列的列方向，各所述像素单元中的所述第三子像素位于其各自所属的所述像素单元中所述第一子像素和所述第二子像素排布形成直线的相同侧。
  7. 根据权利要求5或6所述的显示面板，其特征在于，所述像素单元中，所述第一子像素、所述第二子像素和所述第三子像素相互间隔设置，所述第三子像素对应所述第一子像素和所述第二子像素之间的间隔。
  8. 根据权利要求7所述的显示面板，其特征在于，一列所述像素单元中所述阴极在所述基板上的正投影覆盖一列所述像素单元中的所有所述子像素以及所述子像素之间的间隔。
  9. 根据权利要求4所述的显示面板，其特征在于，所述第一子像素、所述第二子像素和所述第三子像素的颜色不同；
    所述第一子像素的颜色为红、绿、蓝中的任意一种；
    所述第二子像素的颜色为红、绿、蓝中的任意一种；
    所述第三子像素的颜色为红、绿、蓝中的任意一种。
  10. 一种显示装置，其特征在于，包括权利要求1-9任意一项所述的显示面板。
  11. 一种显示面板的制备方法，其特征在于，包括：
    在基板上制备多个像素单元；所述像素单元排布呈阵列，相邻两列所述像素单元相互间隔形成间隔区域；
    制备所述像素单元包括制备像素限定层和子像素，所述子像素形成于所述像素限定层限定的像素区域内；一列所述像素单元中所述子像素的阴极形成为一体；
    所述显示面板的制备方法在形成所述像素限定层之后且在形成所述阴极之前还包括形成透明抑制层，所述透明抑制层形成于所述间隔区域内，且所述透明抑制层在所述基板上的正投影完全覆盖所述间隔区域。
  12. 根据权利要求11所述的显示面板的制备方法，其特征在于，形成所述透明抑制层包括：采用具有部分所述透明抑制层图形的掩膜板蒸镀形成一部分所述透明抑制层的图形；
    移动所述具有部分所述透明抑制层图形的掩膜板，蒸镀形成另一部分所述透明抑制层的图形。
  13. 根据权利要求11所述的显示面板的制备方法，其特征在于，形成所述透明抑制层包括：将具有一部分所述透明抑制层图形的第一掩膜板和具有另一部分所述透明抑制层图形的第二掩膜板进行拼接，使一部分所述透明抑制层图形和另一部分所述透明抑制层图形拼接形成完整的所述透明抑制层的图形；
    蒸镀形成所述透明抑制层的图形。
  14. 根据权利要求13所述的显示面板的制备方法，其特征在于，所述第一掩膜板和所述第二掩膜板上的所述透明抑制层的图形相同，所述第一掩膜板上的一部分所述透明抑制层的图形和所述第二掩膜板上的另一部分所述透明抑制层的图形局部重叠。
  15. 根据权利要求11所述的显示面板的制备方法，其特征在于，形成所述阴极包括：采用具有第一图形的掩膜板蒸镀形成所述阴极的图形；
    其中，所述第一图形为所述基板上所述像素单元所在区域以及所述间隔区域的整体图形。
PCT/CN2021/093339 2020-06-22 2021-05-12 一种显示面板及其制备方法和显示装置 WO2021258886A1 (zh)

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