WO2021248542A1 - Oled 显示面板 - Google Patents

Oled 显示面板 Download PDF

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Publication number
WO2021248542A1
WO2021248542A1 PCT/CN2020/096950 CN2020096950W WO2021248542A1 WO 2021248542 A1 WO2021248542 A1 WO 2021248542A1 CN 2020096950 W CN2020096950 W CN 2020096950W WO 2021248542 A1 WO2021248542 A1 WO 2021248542A1
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WO
WIPO (PCT)
Prior art keywords
layer
light
display panel
electrode
oled display
Prior art date
Application number
PCT/CN2020/096950
Other languages
English (en)
French (fr)
Inventor
王雷
Original Assignee
武汉华星光电半导体显示技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/980,878 priority Critical patent/US11626579B2/en
Priority to EP20940233.8A priority patent/EP4163980A4/en
Publication of WO2021248542A1 publication Critical patent/WO2021248542A1/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light

Definitions

  • This application relates to the field of display technology, in particular to an OLED display panel.
  • OLED Organic Light-Emitting Diode
  • touch screens are more and more commonly used in display devices such as smart phones and tablets.
  • the touch technology with OLED display is mainly in-cell touch technology, that is, the touch function is realized by integrating the touch structure into the display panel.
  • the in-cell touch screen usually adopts a capacitive touch structure. Since the touch electrode layer in the touch structure is mostly made of metal, the light projected to the metal film layer in the presence of OLED light-emitting elements and ambient light Light reflection will occur, which directly affects the display effect of the display panel.
  • the present application provides an OLED display panel to solve the technical problem of light reflection of the metal film layer in the touch structure.
  • the application provides an OLED display panel, which includes:
  • An array substrate the array substrate includes a light-shielding layer and a first conductive layer, the first conductive layer includes an anode, a source, a drain, and a plurality of bridges, and the anode, the source, and the drain are all It is arranged on the same layer as the bridge, and the anode is insulated from the bridge; and
  • a touch structure the touch structure is integrated on the array substrate;
  • the light shielding layer is disposed on the touch control structure.
  • the array substrate includes a first flat layer, a second conductive layer, and a pixel definition layer that are sequentially arranged on the first conductive layer;
  • the second conductive layer includes a plurality of first electrodes and second electrodes arranged in the same layer, and the adjacent first electrodes are electrically connected by the bridge, and the first electrode and the second electrode are electrically connected to each other through the bridge.
  • the electrode and the bridge constitute the touch control structure
  • the light shielding layer is the pixel definition layer.
  • the OLED display panel further includes:
  • a light-emitting functional layer is disposed on the array substrate, and the light-emitting functional layer includes a plurality of light-emitting pixels;
  • An encapsulation layer is disposed on the light-emitting function layer;
  • a color filter structure layer is integrated on the encapsulation layer, the color filter structure layer includes a plurality of color resists, and the color resists are arranged on the light-emitting pixels in a one-to-one correspondence.
  • the encapsulation layer includes a first inorganic layer, an organic layer, and a second inorganic layer arranged in sequence, and the color filter structure layer is arranged between the first inorganic layer and the organic layer. between.
  • the array substrate further includes a substrate, a buffer layer, an active layer, a first insulating layer, a first gate metal layer, a second insulating layer, and a second gate metal which are arranged in sequence.
  • the materials of the first flat layer, the second flat layer and the dielectric insulating layer are all black materials.
  • a plurality of first openings are opened on the first flat layer, the first openings expose the anode, and the light-emitting pixels are arranged in the first openings;
  • a plurality of second openings are opened on the pixel definition layer, and the second openings are connected to one of the first openings in a one-to-one correspondence;
  • the light-emitting function layer further includes a cathode layer disposed on the pixel defining layer and covering the second opening.
  • the second conductive layer further includes an anode, which is arranged in the same layer as the first electrode and the second electrode, and the anode is respectively connected to the first electrode and the second electrode.
  • the second electrode is insulated.
  • the bridge and the drain are integrally formed.
  • the present application also provides an OLED display panel, which includes:
  • An array substrate including a light shielding layer
  • a touch structure the touch structure is integrated on the array substrate;
  • the light shielding layer is disposed on the touch control structure.
  • the array substrate includes a first conductive layer, a first flat layer, a second conductive layer, and a pixel definition layer that are sequentially arranged;
  • the first conductive layer includes a plurality of bridges
  • the second conductive layer includes a plurality of first electrodes and second electrodes arranged in the same layer, and the adjacent first electrodes are electrically connected by the bridge, and the first electrode and the second electrode are electrically connected to each other through the bridge.
  • the electrode and the bridge constitute the touch control structure
  • the light shielding layer is the pixel definition layer.
  • the OLED display panel further includes:
  • a light-emitting functional layer is disposed on the array substrate, and the light-emitting functional layer includes a plurality of light-emitting pixels;
  • An encapsulation layer is disposed on the light-emitting function layer;
  • a color filter structure layer is integrated on the encapsulation layer, the color filter structure layer includes a plurality of color resists, and the color resists are arranged on the light-emitting pixels in a one-to-one correspondence.
  • the encapsulation layer includes a first inorganic layer, an organic layer, and a second inorganic layer arranged in sequence, and the color filter structure layer is arranged between the first inorganic layer and the organic layer. between.
  • the first conductive layer further includes an anode, and the anode is in the same layer as the bridge and is insulated.
  • the array substrate further includes a substrate, a buffer layer, an active layer, a first insulating layer, a first gate metal layer, a second insulating layer, and a second gate metal which are arranged in sequence.
  • the materials of the first flat layer, the second flat layer and the dielectric insulating layer are all black materials.
  • a plurality of first openings are opened on the first flat layer, the first openings expose the anode, and the light-emitting pixels are arranged in the first openings;
  • a plurality of second openings are opened on the pixel definition layer, and the second openings are connected to one of the first openings in a one-to-one correspondence;
  • the light-emitting function layer further includes a cathode layer disposed on the pixel defining layer and covering the second opening.
  • the first conductive layer further includes a source electrode and a drain electrode, and the source electrode and the drain electrode are both arranged in the same layer as the bridge;
  • the second conductive layer further includes an anode, which is provided in the same layer as the first electrode and the second electrode, and the anode is insulated from the first electrode and the second electrode, respectively.
  • the bridge and the drain are integrally formed.
  • the array substrate further includes a substrate, a buffer layer, an active layer, a first insulating layer, a first gate metal layer, a second insulating layer, and a second gate metal which are arranged in sequence.
  • the materials of the first flat layer and the dielectric insulating layer are black materials.
  • a plurality of first openings are opened on the pixel definition layer, the first openings expose the anode, and the light-emitting pixels are arranged on the anode;
  • the light-emitting function layer further includes a cathode layer disposed on the pixel defining layer and covering the first opening.
  • the cathode layer and the touch control structure are arranged staggered.
  • the OLED display panel provided by the present application is provided with a light shielding layer on the touch structure, thereby effectively shielding the light directed to the touch structure and avoiding the metal film layer in the touch structure.
  • the occurrence of the light reflection phenomenon further improves the display effect of the display panel.
  • FIG. 1 is a schematic structural diagram of an OLED display panel provided by the first embodiment of the present application.
  • FIG. 2 is a schematic structural diagram of an OLED display panel provided by a second embodiment of the present application.
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features. In the description of the present application, "a plurality of" means two or more than two, unless otherwise specifically defined.
  • connection should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be mechanically connected, it can be electrical connection or it can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction of two components relation.
  • connection should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be mechanically connected, it can be electrical connection or it can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction of two components relation.
  • the "above” or “below” of the first feature of the second feature may include direct contact between the first and second features, or may include the first and second features Not in direct contact but through other features between them.
  • “above”, “above” and “above” the second feature of the first feature include the first feature being directly above and obliquely above the second feature, or merely indicating that the level of the first feature is higher than that of the second feature.
  • the “below”, “below” and “below” of the second feature of the first feature include the first feature directly below and obliquely below the second feature, or it simply means that the level of the first feature is smaller than the second feature.
  • FIG. 1 is a schematic structural diagram of an OLED display panel provided by a first embodiment of the application.
  • the OLED display panel 100 provided by the first embodiment of the present application includes an array substrate 10, a light-emitting function layer 12, and an encapsulation layer 13 arranged in sequence.
  • the array substrate 10 includes a light shielding layer 10A.
  • the OLED display panel 100 further includes a touch control structure 14 and a color filter structure layer 15.
  • the touch structure 14 is integrated on the array substrate 10.
  • the color film structure layer 15 is integrated on the packaging layer 13.
  • the light shielding layer 10A is disposed on the touch structure 14.
  • the light shielding layer 10A is provided on the touch structure 14, thereby effectively shielding the light directed to the touch structure 14 and avoiding the metal film layer in the touch structure 14.
  • the occurrence of the light reflection phenomenon further improves the display effect of the display panel.
  • the thickness of the display panel can also be reduced, thereby improving the bending performance of the OLED display panel, which is conducive to the development of dynamic bending OLED products. application.
  • the array substrate 10 includes a substrate 101, a buffer layer 102, an active layer 103, a first insulating layer 104, a first gate metal layer 105, a second insulating layer 106, and a second insulating layer 106 arranged in sequence.
  • the first conductive layer 111 includes a plurality of bridges 1111.
  • the second conductive layer 113 includes a plurality of first electrodes 1131 and second electrodes 1132 arranged in the same layer.
  • the adjacent first electrodes 1131 are electrically connected through a bridge 1111.
  • the first electrode 1131, the second electrode 1132 and the bridge 1111 constitute the touch structure 14.
  • the light shielding layer 10A is the pixel definition layer 114.
  • the light-shielding layer 10A can also be provided in other film layers of the array substrate 10, and the specific position of the light-shielding layer 10A can be selected according to the position of the touch structure 14, which is not limited in this application.
  • the first electrode 1131 is a driving electrode and the second electrode 1132 is a sensing electrode, or the first electrode 1131 is a sensing electrode and the second electrode 1132 is a driving electrode.
  • the first electrode 1131 is a driving electrode
  • the second electrode 1132 is a sensing electrode.
  • the first electrode 1131 and the second electrode 1132 are insulated and arranged.
  • the touch structure 14 in the first embodiment of the present application may be a mutual-capacitive type or a self-capacitive type, which is not limited in the present application.
  • the bridge 1111 is only used to connect the adjacent first electrodes 1131, and the bridge 1111 can be arranged above or below the first electrode 1131. In the first embodiment of the present application, only the bridge 1111 is arranged on the first electrode 1131. Below the electrode 1131 is described as an example, but it is not limited to this.
  • the materials of the first electrode 1131, the second electrode 1132, and the bridge 1111 are all one or a combination of metals such as silver, gold, copper, or aluminum.
  • the materials of the first electrode 1131, the second electrode 1132, and the bridge 1111 may also be metal oxides such as indium tin oxide, indium zinc oxide, antimony tin oxide, or antimony zinc oxide, or other metal oxides. Transparent conductive materials will not be repeated here.
  • the materials of the first electrode 1131, the second electrode 1132, and the bridge 1111 may be the same or different, which is not limited in this application.
  • the material of the light-shielding layer 10A is black ink, organic photoresist or other black materials with light-shielding effect.
  • the pixel definition layer 114 is used as the light-shielding layer 10A, the light directed to the touch structure 14 can be effectively shielded, and the reflected light from the first electrode 1131, the second electrode 1132 and the bridge 1111 is prevented from being projected to the panel display.
  • the area affects the display effect, thereby improving the display quality of the display panel.
  • the first conductive layer 111 further includes an anode 1112.
  • the anode 1112 and the bridge 1111 are on the same layer and insulated from each other. This arrangement reduces the thickness of the array substrate 10 by arranging the bridge 1111 and the anode 1112 in the same layer, thereby further reducing the thickness of the display panel.
  • the light-emitting function layer 12 includes a plurality of light-emitting pixels 121.
  • the color film structure layer 15 includes a plurality of color resists 15A.
  • the color resistors 15A are arranged on the light-emitting pixels 121 in a one-to-one correspondence.
  • the color filter structure layer 15 is usually disposed above the encapsulation layer 13.
  • the color filter structure layer 15 includes a color resist 15A and a black matrix located between the color resist 15A. Because the refractive index of each film layer in the encapsulation layer 13 is different, when the light emitted by the light-emitting pixel 121 is emitted through the encapsulation layer 13 with different refractive index, there will usually be obvious dispersion phenomenon, which directly affects the light output of the light-emitting pixel 121 Effect.
  • the color filter structure layer 15 is integrated on the encapsulation layer 13, so that the distance between the color resist 15A and the light-emitting pixel 121 can be reduced, the light exit path in the light-emitting pixel 121 is reduced, and the dispersion phenomenon is reduced.
  • the generation probability of the light-emitting pixel 121 improves the light-emitting effect of the light-emitting pixel 121.
  • the above arrangement can also reduce the probability that the light emitted by the light-emitting pixel 121 is absorbed by the black matrix in the color filter structure layer 15, thereby improving the light utilization rate.
  • the light output rate of the light-emitting pixel 121 is improved.
  • the above configuration can also reduce the opening size of the film layer where the color resist 15A is located, thereby meeting the design requirements of a high pixel density display panel, and further improving the display effect of the display panel. .
  • the encapsulation layer 13 includes a first inorganic layer 131, an organic layer 132, and a second inorganic layer 133 arranged in sequence.
  • the color filter structure layer 15 is disposed between the first inorganic layer 131 and the organic layer 132.
  • the pixel definition layer 114 is used as the light-shielding layer 10A, that is, the pixel definition layer 114 is used to replace the black matrix in the color film structure layer 15, thereby eliminating the need for black.
  • the preparation process of the matrix simplifies the process of the display panel and reduces the production cost.
  • the black matrix occupies a relatively large area in the entire color filter structure layer 15, this arrangement can also save panel space, which is beneficial to realize a thin and light design of the display panel.
  • the thickness of the display panel can be further reduced, thereby further improving the bending performance of the OLED display panel.
  • the materials of the first flat layer 112, the second flat layer 110, and the dielectric insulating layer 108 are all black materials.
  • the black material may be an organic photoresist, an inorganic material, or other materials with a light-shielding effect, and this application does not specifically limit the black material.
  • the materials of the first flat layer 112, the second flat layer 110, and the dielectric insulating layer 108 are set to black materials, which can effectively prevent the reflected light of the metal film from entering the light-emitting pixel 121 and affecting the light output of the light-emitting pixel 121 Effect.
  • this setting can also reduce the probability of color mixing between different light-emitting pixels 121, so that the color displayed on the display screen is more pure, and the display effect of the display panel is further improved.
  • the materials of the first flat layer 112, the second flat layer 110, and the dielectric insulating layer 108 are all set to black materials, so as to achieve the effect of completely shielding the metal film layer from reflecting light.
  • only the materials of the first flat layer 112 and the second flat layer 110 may be set to black materials, which will not be repeated here.
  • the first opening 112A exposes the anode 1112.
  • the light-emitting pixel 121 is disposed in the first opening 112A.
  • the pixel definition layer 114 is provided with a plurality of second openings 114A.
  • the second opening 114A communicates with a first opening 112A in a one-to-one correspondence.
  • the light-emitting functional layer 12 further includes a cathode layer 122.
  • the cathode layer 122 is disposed on the pixel definition layer 114 and covers the second opening 114A.
  • the cathode layer 122 and the touch structure 14 are arranged staggered.
  • the cathode layer 122 covers the second opening 114A and is located on a portion of the pixel definition layer 114 close to the second opening 114A.
  • the cathode layer 122 is staggered from the first electrode 1131, the second electrode 1132 and the bridge 1111. This arrangement can effectively prevent the touch signal generated in the touch structure 14 from being shielded by the entire cathode layer 122, thereby improving the touch sensitivity.
  • the film layer where the cathode layer 122 is located is patterned by using an etching process to form a patterned cathode layer 122.
  • the specific etching process can refer to the prior art, which will not be repeated here.
  • the OLED display panel 100 provided by the first embodiment of the present application is provided with a light shielding layer 10A on the touch structure 14, thereby effectively shielding the light directed to the touch structure 14 and avoiding the reflection of the metal film in the touch structure 14 Occurs, thereby improving the display effect of the display panel.
  • FIG. 2 is a schematic structural diagram of an OLED display panel provided by a second embodiment of the application.
  • the OLED display panel 200 provided by the second embodiment of the present application includes an array substrate 20, a light-emitting function layer 22, and an encapsulation layer 23 that are sequentially arranged.
  • the array substrate 20 includes a light shielding layer 20A.
  • the OLED display panel 200 further includes a touch control structure 24 and a color filter structure layer 25.
  • the touch structure 24 is integrated on the array substrate 20.
  • the color film structure layer 25 is integrated on the packaging layer 23.
  • the light shielding layer 20A is disposed on the touch structure 24.
  • the light shielding layer 20A is provided on the touch structure 24, thereby effectively shielding the light directed to the touch structure 24 and avoiding the metal film layer in the touch structure 24.
  • the occurrence of the light reflection phenomenon further improves the display effect of the display panel.
  • the second embodiment of the present application can also reduce the thickness of the display panel by integrating the touch structure 24 in the array substrate 20, thereby improving the bending performance of the OLED display panel, which is beneficial to the development of dynamic bending OLED products. application.
  • the array substrate 20 includes a substrate 201, a buffer layer 202, an active layer 203, a first insulating layer 204, a first gate metal layer 205, a second insulating layer 206, and a second insulating layer 206, which are sequentially arranged.
  • the first conductive layer 211 includes a plurality of bridges 2111.
  • the second conductive layer 213 includes a plurality of first electrodes 2131 and second electrodes 2132 arranged in the same layer.
  • the adjacent first electrodes 2131 are electrically connected by a bridge 2111.
  • the first electrode 2131, the second electrode 2132 and the bridge 2111 constitute the touch structure 24.
  • the light shielding layer 20A is the pixel definition layer 214.
  • the light-shielding layer 20A can also be provided in other film layers of the array substrate 20, and the specific position of the light-shielding layer 20A can be selected according to the position of the touch structure 24, which is not limited in this application.
  • the first electrode 2131 is a driving electrode and the second electrode 2132 is a sensing electrode, or the first electrode 2131 is a sensing electrode and the second electrode 2132 is a driving electrode.
  • the first electrode 2131 is a driving electrode
  • the second electrode 2132 is a sensing electrode.
  • the first electrode 2131 and the second electrode 2132 are insulated and arranged.
  • the touch structure 24 in the second embodiment of the present application may be of a mutual capacitance type or a self-capacitance type, which is not limited in the present application.
  • the bridge 2111 is only used to connect the adjacent first electrodes 2131, and the bridge 2111 can be arranged above or below the first electrode 2131. In the second embodiment of the present application, only the bridge 2111 is arranged on the first electrode 2131. Below the electrode 2131 is described as an example, but it is not limited to this.
  • the materials of the first electrode 2131, the second electrode 2132, and the bridge 2111 are all one or more combinations of metals such as silver, gold, copper, or aluminum.
  • the materials of the first electrode 2131, the second electrode 2132, and the bridge 2111 may also be metal oxides such as indium tin oxide, indium zinc oxide, antimony tin oxide, or antimony zinc oxide, or other metal oxides. Transparent conductive materials will not be repeated here.
  • the materials of the first electrode 2131, the second electrode 2132, and the bridge 2111 may be the same or different, which is not limited in this application.
  • the material of the light-shielding layer 20A is black ink, organic photoresist or other black materials with light-shielding effect.
  • the pixel definition layer 214 is used as the light shielding layer 20A, the light directed to the touch structure 24 can be effectively shielded, and the reflected light of the first electrode 2131, the second electrode 2132 and the bridge 2111 is prevented from being projected to the panel display.
  • the area affects the display effect, thereby improving the display quality of the display panel.
  • the first conductive layer 211 further includes a source 2112 and a drain 2113.
  • the source 2112 and the drain 2113 are both arranged on the same layer as the bridge 2111.
  • the second conductive layer 213 further includes an anode 2133.
  • the anode 2133 is arranged in the same layer as the first electrode 2131 and the second electrode 2132.
  • the anode 2133 is insulated from the first electrode 2131 and the second electrode 2132, respectively.
  • the above arrangement can further reduce the thickness of the display panel, thereby further improving the bending performance of the OLED display panel.
  • the above arrangement reduces a masking process in the touch structure 24 by using the first flat layer 212 as an insulating layer between the electrode and the bridge in the touch structure 24, thereby reducing the process cost.
  • the bridge 2111 and the drain 2113 are integrally formed.
  • a mask process in the touch structure 24 is further omitted, thereby further reducing the process cost.
  • the bridge 2111 and the drain 2113 may be insulated, which will not be repeated here.
  • the light-emitting functional layer 22 includes a plurality of light-emitting pixels 221.
  • the color film structure layer 25 includes a plurality of color resists 25A.
  • the color resistors 25A are arranged on the light-emitting pixels 221 in a one-to-one correspondence.
  • the color filter structure layer 25 is usually disposed above the encapsulation layer 23, and the color filter structure layer 25 includes a color resistor 25A and a black matrix located between the color resistors 25A. Since the refractive index of each film layer in the encapsulation layer 23 is different, when the light emitted by the light-emitting pixel 221 is emitted through the encapsulation layer 23 with different refractive index, there will usually be obvious dispersion phenomenon, which directly affects the light output of the light-emitting pixel 221 Effect.
  • the second embodiment of the present application integrates the color filter structure layer 25 on the encapsulation layer 23, which can reduce the distance between the color resist 25A and the light-emitting pixel 221, reduce the light exit path in the light-emitting pixel 221, and thereby reduce the dispersion phenomenon.
  • the generation probability of the light-emitting pixel 221 improves the light-emitting effect of the light-emitting pixel 221.
  • the above arrangement can also reduce the probability that the light emitted by the light-emitting pixel 221 is absorbed by the black matrix in the color filter structure layer 15, thereby improving the light utilization rate.
  • the light output rate of the light-emitting pixel 221 is improved.
  • the above-mentioned configuration can also reduce the opening size of the film layer where the color resist 25A is located, thereby meeting the design requirements of high-pixel-density display panels, and further improving the display effect of the display panel. .
  • the encapsulation layer 23 includes a first inorganic layer 231, an organic layer 232, and a second inorganic layer 233 arranged in sequence.
  • the color filter structure layer 25 is disposed between the first inorganic layer 231 and the organic layer 232.
  • the pixel definition layer 214 is used as the light-shielding layer 20A, that is, the pixel definition layer 214 is used to replace the black matrix in the color film structure layer 25, thereby eliminating the need for black.
  • the preparation process of the matrix simplifies the process of the display panel and reduces the production cost.
  • the black matrix occupies a relatively large area in the entire color filter structure layer 25, this arrangement can also save panel space, which is beneficial to realize a thin and light design of the display panel.
  • the thickness of the display panel can be further reduced, thereby further improving the bending performance of the OLED display panel.
  • the materials of the first flat layer 212 and the dielectric insulating layer 208 are both black materials.
  • the black material may be an organic photoresist, an inorganic material, or other materials with a light-shielding effect, and this application does not specifically limit the black material.
  • the ambient light and the light emitted by the light-emitting pixel 221 will pass through the anode 2133 and other film layers and be injected into the metal film layer of the array substrate 20, such as the first gate metal layer 205, the second gate metal layer 207 and the first conductive layer 2111.
  • the materials of the first flat layer 212 and the dielectric insulating layer 208 to black materials, the light reflected by the metal film layer can be effectively prevented from entering the light-emitting pixel 221 and affecting the light-emitting effect of the light-emitting pixel 221.
  • this setting can also reduce the probability of color mixing between different light-emitting pixels 221, thereby making the color displayed on the display screen more pure, and further improving the display effect of the display panel.
  • the materials of the first flat layer 212 and the dielectric insulating layer 208 are both set to black materials, so as to achieve the effect of completely shielding the metal film layer from reflecting light.
  • only the material of the first flat layer 212 may be set to a black material, which will not be repeated here.
  • the pixel definition layer 214 is provided with a plurality of first openings 214A.
  • the first opening 214A exposes the anode 2133.
  • the light-emitting pixel 221 is disposed on the anode 2133.
  • the light-emitting functional layer 22 further includes a cathode layer 222.
  • the cathode layer 222 is disposed on the pixel definition layer 214 and covers the first opening 214A.
  • the cathode layer 222 and the touch structure 24 are staggered.
  • the cathode layer 222 covers the first opening 214A and is located on a portion of the pixel definition layer 214 close to the first opening 214A.
  • the cathode layer 222 is staggered from the first electrode 2131, the second electrode 2132 and the part of the bridge 2111 away from the first opening 214A. This arrangement can prevent the touch signal generated in the touch structure 24 from being shielded by the entire cathode layer 222, thereby improving the touch sensitivity.
  • the film layer where the cathode layer 222 is located is patterned by using an etching process to form a patterned cathode layer 222.
  • the specific etching process can refer to the prior art, which will not be repeated here.
  • the OLED display panel 200 provided by the second embodiment of the present application is provided with a light shielding layer 20A on the touch structure 24, thereby effectively shielding the light directed to the touch structure 24 and avoiding the phenomenon of light reflection by the metal film layer in the touch structure 24 Occurs, thereby improving the display effect of the display panel.
  • the bridge 2111 and the source 2112 and the drain 2113 in the same layer, the first electrode 2131 and the second electrode 2132 and the anode 2133 are arranged in the same layer, thereby reducing the thickness of the display panel and improving the OLED display panel. Bending performance.
  • the OLED display panel provided by the present application is provided with a light shielding layer on the touch structure, thereby effectively shielding the light directed to the touch structure and avoiding the metal film layer in the touch structure.
  • the occurrence of the light reflection phenomenon further improves the display effect of the display panel.

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Abstract

一种OLED显示面板（100），该OLED显示面板（100）包括阵列基板（10）和触控结构（14），所述阵列基板（10）包括遮光层（10A），所述触控结构（14）集成在所述阵列基板（10）上；其中，所述遮光层（10A）设置在所述触控结构（14）上。

Description

OLED显示面板 技术领域
本申请涉及显示技术领域，具体涉及一种OLED显示面板。
 背景技术
随着OLED（Organic Light-Emitting Diode，有机发光二极管）显示技术的不断发展，触控屏越来越普遍应用于智能手机、平板电脑等显示设备中。
目前搭配OLED显示屏的触控技术以内嵌式触控技术为主，即通过将触控结构整合到显示面板中以实现触控功能。
 技术问题
内嵌式触控屏通常采用电容式触控结构，由于该触控结构中的触控电极层大多采用金属制作而成，在OLED发光元件和环境光的存在下，投射至金属膜层的光线会发生反光现象，从而直接影响了显示面板的显示效果。
 技术解决方案
本申请提供一种OLED显示面板，以解决触控结构中金属膜层反光的技术问题。
本申请提供一种OLED显示面板，其包括：
阵列基板，所述阵列基板包括遮光层和第一导电层，所述第一导电层包括阳极、源极、漏极和多个架桥，所述阳极、所述源极和所述漏极均与所述架桥同层设置，且所述阳极与所述架桥绝缘设置；以及
触控结构，所述触控结构集成在所述阵列基板上；
所述遮光层设置在所述触控结构上。
在本申请的OLED显示面板中，所述阵列基板包括依次设置在所述第一导电层上的第一平坦层、第二导电层和像素定义层；
所述第二导电层包括同层设置的多个第一电极和第二电极，相邻的所述第一电极之间通过所述架桥电性连接，所述第一电极、所述第二电极和所述架桥构成所述触控结构；
所述遮光层为所述像素定义层。
在本申请的OLED显示面板中，所述OLED显示面板还包括：
发光功能层，所述发光功能层设置在所述阵列基板上，所述发光功能层包括多个发光像素；
封装层，所述封装层设置在所述发光功能层上；以及
彩膜结构层，所述彩膜结构层集成在所述封装层上，所述彩膜结构层包括多个色阻，所述色阻一一对应设置于所述发光像素上。
在本申请的OLED显示面板中，所述封装层包括依次设置的第一无机层、有机层和第二无机层，所述彩膜结构层设置在所述第一无机层和所述有机层之间。
在本申请的OLED显示面板中，所述阵列基板还包括依次设置的衬底、缓冲层、有源层、第一绝缘层、第一栅极金属层、第二绝缘层、第二栅极金属层、介电绝缘层、源漏极金属层和第二平坦层，所述第一平坦层、所述第二平坦层以及所述介电绝缘层的材料均为黑色材料。
在本申请的OLED显示面板中，所述第一平坦层上开设有多个第一开口，所述第一开口裸露出所述阳极，所述发光像素设置在所述第一开口内；所述像素定义层上开设有多个第二开口，所述第二开口一一对应连通于一所述第一开口；
所述发光功能层还包括阴极层，所述阴极层设置在所述像素定义层上并覆盖所述第二开口。
在本申请的OLED显示面板中，所述第二导电层还包括阳极，所述阳极与所述第一电极和所述第二电极同层设置，所述阳极分别与所述第一电极和所述第二电极绝缘设置。
在本申请的OLED显示面板中，所述架桥与所述漏极一体成型。
本申请还提供一种OLED显示面板，其包括：
阵列基板，所述阵列基板包括遮光层；以及
触控结构，所述触控结构集成在所述阵列基板上；
所述遮光层设置在所述触控结构上。
在本申请的OLED显示面板中，所述阵列基板包括依次设置的第一导电层、第一平坦层、第二导电层和像素定义层；
所述第一导电层包括多个架桥；
所述第二导电层包括同层设置的多个第一电极和第二电极，相邻的所述第一电极之间通过所述架桥电性连接，所述第一电极、所述第二电极和所述架桥构成所述触控结构；
所述遮光层为所述像素定义层。
在本申请的OLED显示面板中，所述OLED显示面板还包括：
发光功能层，所述发光功能层设置在所述阵列基板上，所述发光功能层包括多个发光像素；
封装层，所述封装层设置在所述发光功能层上；以及
彩膜结构层，所述彩膜结构层集成在所述封装层上，所述彩膜结构层包括多个色阻，所述色阻一一对应设置于所述发光像素上。
在本申请的OLED显示面板中，所述封装层包括依次设置的第一无机层、有机层和第二无机层，所述彩膜结构层设置在所述第一无机层和所述有机层之间。
在本申请的OLED显示面板中，所述第一导电层还包括阳极，所述阳极与所述架桥同层且绝缘设置。
在本申请的OLED显示面板中，所述阵列基板还包括依次设置的衬底、缓冲层、有源层、第一绝缘层、第一栅极金属层、第二绝缘层、第二栅极金属层、介电绝缘层、源漏极金属层和第二平坦层，所述第一平坦层、所述第二平坦层以及所述介电绝缘层的材料均为黑色材料。
在本申请的OLED显示面板中，所述第一平坦层上开设有多个第一开口，所述第一开口裸露出所述阳极，所述发光像素设置在所述第一开口内；所述像素定义层上开设有多个第二开口，所述第二开口一一对应连通于一所述第一开口；
所述发光功能层还包括阴极层，所述阴极层设置在所述像素定义层上并覆盖所述第二开口。
在本申请的OLED显示面板中，所述第一导电层还包括源极和漏极，所述源极和所述漏极均与所述架桥同层设置；
所述第二导电层还包括阳极，所述阳极与所述第一电极和所述第二电极同层设置，所述阳极分别与所述第一电极和所述第二电极绝缘设置。
在本申请的OLED显示面板中，所述架桥与所述漏极一体成型。
在本申请的OLED显示面板中，所述阵列基板还包括依次设置的衬底、缓冲层、有源层、第一绝缘层、第一栅极金属层、第二绝缘层、第二栅极金属层和介电绝缘层，所述第一平坦层和所述介电绝缘层的材料均为黑色材料。
在本申请的OLED显示面板中，所述像素定义层上开设有多个第一开口，所述第一开口裸露出所述阳极，所述发光像素设置在所述阳极上；
所述发光功能层还包括阴极层，所述阴极层设置在所述像素定义层上并覆盖所述第一开口。
在本申请的OLED显示面板中，所述阴极层与所述触控结构相错设置。
 有益效果
相较于现有技术中的OLED显示面板，本申请提供的OLED显示面板通过在触控结构上设置遮光层，从而有效遮蔽了射向触控结构的光线，避免了触控结构中金属膜层反光现象的发生，进而提高了显示面板的显示效果。
 附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本申请第一实施例提供的OLED显示面板的结构示意图；
图2是本申请第二实施例提供的OLED显示面板的结构示意图。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接或可以相互通讯；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
在本申请中，除非另有明确的规定和限定，第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触，也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且，第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方，或仅仅表示第一特征水平高度小于第二特征。
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开，下文中对特定例子的部件和设置进行描述。当然，它们仅仅为示例，并且目的不在于限制本申请。此外，本申请可以在不同例子中重复参考数字和/或参考字母，这种重复是为了简化和清楚的目的，其本身不指示所讨论各种实施方式和/或设置之间的关系。此外，本申请提供了的各种特定的工艺和材料的例子，但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。
请参阅图1，图1为本申请第一实施例提供的OLED显示面板的结构示意图。
本申请第一实施例提供的OLED显示面板100包括依次设置的阵列基板10、发光功能层12和封装层13。阵列基板10包括遮光层10A。OLED显示面板100还包括触控结构14和彩膜结构层15。触控结构14集成在阵列基板10上。彩膜结构层15集成在封装层13上。其中，遮光层10A设置在触控结构14上。
由此，本申请第一实施例提供的OLED显示面板100通过在触控结构14上设置遮光层10A，从而有效遮蔽了射向触控结构14的光线，避免了触控结构14中金属膜层反光现象的发生，进而提高了显示面板的显示效果。
此外，本申请第一实施例通过将触控结构14集成在阵列基板10中，还可以降低显示面板的厚度，进而提高了OLED显示面板的弯折性能，有利于实现动态弯折OLED产品的开发应用。
在本申请第一实施例中，阵列基板10包括依次设置的衬底101、缓冲层102、有源层103、第一绝缘层104、第一栅极金属层105、第二绝缘层106、第二栅极金属层107、介电绝缘层108、源漏极金属层109和第二平坦层110、第一导电层111、第一平坦层112、第二导电层113和像素定义层114。
具体的，第一导电层111包括多个架桥1111。第二导电层113包括同层设置的多个第一电极1131和第二电极1132。相邻的第一电极1131之间通过架桥1111电性连接。第一电极1131、第二电极1132和架桥1111构成触控结构14。其中，遮光层10A为像素定义层114。
需要说明的是，遮光层10A还可以设置于阵列基板10的其他膜层中，遮光层10A的具***置可以根据触控结构14的位置进行选择，本申请对此不作限定。
可选的，第一电极1131为驱动电极，第二电极1132为感应电极，或者，第一电极1131为感应电极，第二电极1132为驱动电极。
在本申请第一实施例中，第一电极1131为驱动电极，第二电极1132为感应电极。第一电极1131和第二电极1132绝缘设置。
需要说明的是，本申请第一实施例中的触控结构14可以为互电容式，也可以为自电容式，本申请对此不作限定。
需要说明的是，架桥1111仅用于连通相邻的第一电极1131，架桥1111可以设置于第一电极1131的上方或者下方，本申请第一实施例仅以架桥1111设置在第一电极1131的下方为例进行说明，但并不限于此。
在本申请第一实施例中，第一电极1131、第二电极1132以及架桥1111的材料均为银、金、铜或铝等金属中的一种或多种的组合。在一些实施例中，第一电极1131、第二电极1132以及架桥1111的材料也可以为氧化铟锡、氧化铟锌、氧化锑锡或氧化锑锌等金属氧化物，或者，还可以为其他透明导电材料，在此不再赘述。
此外，第一电极1131、第二电极1132以及架桥1111的材料可以相同，也可以不同，本申请对此不作限定。
可选的，遮光层10A的材料为黑色油墨、有机光阻或其他具有遮光效果的黑色材料。
可以理解的是，以像素定义层114为遮光层10A时，可以有效遮蔽射向触控结构14的光线，避免了第一电极1131、第二电极1132以及架桥1111的反射光线投射至面板显示区而影响显示效果，进而提高了显示面板的显示质量。
在本申请第一实施例中，第一导电层111还包括阳极1112。阳极1112与架桥1111同层且绝缘设置。该设置通过将架桥1111与阳极1112同层设置，降低了阵列基板10的厚度，从而进一步降低了显示面板的厚度。
进一步的，发光功能层12包括多个发光像素121。彩膜结构层15包括多个色阻15A。色阻15A一一对应设置于发光像素121上。
在现有的OLED显示面板中，彩膜结构层15通常设置在封装层13的上方，彩膜结构层15包括色阻15A以及位于色阻15A之间的黑色矩阵。由于封装层13中的各膜层折射率不同，当发光像素121发出的光线经过具有不同折射率的封装层13射出时，通常会有明显的色散现象发生，进而直接影响到发光像素121的出光效果。本申请第一实施例通过将彩膜结构层15集成在封装层13上，可以降低色阻15A与发光像素121之间的距离，减少了发光像素121中光线的出射路径，进而降低了色散现象的产生几率，提高了发光像素121的出光效果。
另外，上述设置通过降低发光像素121与彩膜结构层15之间的距离，还可以降低发光像素121的出射光线被彩膜结构层15中的黑色矩阵吸收的几率，进而可以提高光线利用率，提高了发光像素121的出光率。
进一步的，在维持发光像素121出光率的前提下，上述设置还可以降低色阻15A所在膜层的开孔尺寸，进而满足了高像素密度显示面板的设计需求，以进一步提升显示面板的显示效果。
具体的，封装层13包括依次设置的第一无机层131、有机层132和第二无机层133。彩膜结构层15设置在第一无机层131和有机层132之间。
可以理解的是，在本申请第一实施例中，通过将像素定义层114作为遮光层10A，也即，以像素定义层114代替了彩膜结构层15中的黑色矩阵，进而可以省去黑色矩阵的制备工艺，简化了显示面板的工艺制程，降低了生产成本。此外，由于黑色矩阵在整个彩膜结构层15中的占用面积较大，该设置还可以节省面板空间，有利于实现显示面板的轻薄化设计。
另外，本申请第一实施例通过将彩膜结构层15集成在封装层13中，还可以进一步降低显示面板的厚度，从而进一步提高了OLED显示面板的弯折性能。
在本申请第一实施例中，第一平坦层112、第二平坦层110以及介电绝缘层108的材料均为黑色材料。
具体的，该黑色材料可以为有机光阻、无机材料或其他具有遮光效果的材料，本申请对该黑色材料不作具体限定。
由于环境光和发光像素121发出的光会透过阳极1112等膜层射入阵列基板10的金属膜层中，如第一栅极金属层105、第二栅极金属层107和源漏极金属层109。上述设置通过将第一平坦层112、第二平坦层110以及介电绝缘层108的材料设置为黑色材料，可以有效避免因金属膜层的反射光线射入发光像素121而影响发光像素121的出光效果。同时，该设置还可以降低不同发光像素121之间混色现象的发生几率，从而使得显示屏显示出的色彩更加纯净，进一步提高了显示面板的显示效果。
需要说明的是，本申请第一实施例将第一平坦层112、第二平坦层110和介电绝缘层108的材料均设置为黑色材料，以达到完全遮蔽金属膜层反射光线的效果。在一些实施例中，也可以仅将第一平坦层112和第二平坦层110的材料设置为黑色材料，在此不再赘述。
进一步的，第一平坦层112上开设有多个第一开口112A。第一开口112A裸露出阳极1112。发光像素121设置在第一开口112A内。像素定义层114上开设有多个第二开口114A。第二开口114A一一对应连通于一第一开口112A。发光功能层12还包括阴极层122。阴极层122设置在像素定义层114上并覆盖第二开口114A。
在本申请第一实施例中，阴极层122与触控结构14相错设置。
具体的，阴极层122覆盖第二开口114A，且位于像素定义层114靠近第二开口114A的部分上。阴极层122与第一电极1131、第二电极1132以及架桥1111错开设置。该设置可以有效防止触控结构14中产生的触控信号被整面的阴极层122屏蔽，进而提高了触控灵敏度。
进一步的，采用刻蚀工艺对阴极层122所在的膜层进行图形化处理，以形成图案化的阴极层122，具体刻蚀工艺可以参照现有技术，在此不再赘述。
本申请第一实施例提供的OLED显示面板100通过在触控结构14上设置遮光层10A，从而有效遮蔽了射向触控结构14的光线，避免了触控结构14中金属膜层反光现象的发生，进而提高了显示面板的显示效果。
请参阅图2，图2为本申请第二实施例提供的OLED显示面板的结构示意图。
本申请第二实施例提供的OLED显示面板200包括依次设置的阵列基板20、发光功能层22和封装层23。阵列基板20包括遮光层20A。OLED显示面板200还包括触控结构24和彩膜结构层25。触控结构24集成在阵列基板20上。彩膜结构层25集成在封装层23上。其中，遮光层20A设置在触控结构24上。
由此，本申请第二实施例提供的OLED显示面板200通过在触控结构24上设置遮光层20A，从而有效遮蔽了射向触控结构24的光线，避免了触控结构24中金属膜层反光现象的发生，进而提高了显示面板的显示效果。
此外，本申请第二实施例通过将触控结构24集成在阵列基板20中，还可以降低显示面板的厚度，进而提高了OLED显示面板的弯折性能，有利于实现动态弯折OLED产品的开发应用。
在本申请第二实施例中，阵列基板20包括依次设置的衬底201、缓冲层202、有源层203、第一绝缘层204、第一栅极金属层205、第二绝缘层206、第二栅极金属层207、介电绝缘层208、第一导电层211、第一平坦层212、第二导电层213和像素定义层214。
具体的，第一导电层211包括多个架桥2111。第二导电层213包括同层设置的多个第一电极2131和第二电极2132。相邻的第一电极2131之间通过架桥2111电性连接。第一电极2131、第二电极2132和架桥2111构成触控结构24。其中，遮光层20A为像素定义层214。
需要说明的是，遮光层20A还可以设置于阵列基板20的其他膜层中，遮光层20A的具***置可以根据触控结构24的位置进行选择，本申请对此不作限定。
可选的，第一电极2131为驱动电极，第二电极2132为感应电极，或者，第一电极2131为感应电极，第二电极2132为驱动电极。
在本申请第二实施例中，第一电极2131为驱动电极，第二电极2132为感应电极。第一电极2131和第二电极2132绝缘设置。
需要说明的是，本申请第二实施例中的触控结构24可以为互电容式，也可以为自电容式，本申请对此不作限定。
需要说明的是，架桥2111仅用于连通相邻的第一电极2131，架桥2111可以设置于第一电极2131的上方或者下方，本申请第二实施例仅以架桥2111设置在第一电极2131的下方为例进行说明，但并不限于此。
在本申请第二实施例中，第一电极2131、第二电极2132以及架桥2111的材料均为银、金、铜或铝等金属中的一种或多种的组合。在一些实施例中，第一电极2131、第二电极2132以及架桥2111的材料也可以为氧化铟锡、氧化铟锌、氧化锑锡或氧化锑锌等金属氧化物，或者，还可以为其他透明导电材料，在此不再赘述。
此外，第一电极2131、第二电极2132以及架桥2111的材料可以相同，也可以不同，本申请对此不作限定。
可选的，遮光层20A的材料为黑色油墨、有机光阻或其他具有遮光效果的黑色材料。
可以理解的是，以像素定义层214为遮光层20A时，可以有效遮蔽射向触控结构24的光线，避免了第一电极2131、第二电极2132以及架桥2111的反射光线投射至面板显示区而影响显示效果，进而提高了显示面板的显示质量。
在本申请第二实施例中，第一导电层211还包括源极2112和漏极2113。源极2112和漏极2113均与架桥2111同层设置。第二导电层213还包括阳极2133。阳极2133与第一电极2131和第二电极2132同层设置。阳极2133分别与第一电极2131和第二电极2132绝缘设置。
上述设置可以进一步减薄显示面板的厚度，从而进一步提高了OLED显示面板的弯折性能。此外，上述设置通过以第一平坦层212作为触控结构24中电极与架桥之间的绝缘层，减少了触控结构24中的一道掩膜工艺，进而降低了工艺成本。
进一步的，架桥2111与漏极2113一体成型。该设置通过将漏极2113作为架桥2111，进一步省去了触控结构24中的一道掩膜工艺，从而进一步降低了工艺成本。
另外，在一些实施例中，架桥2111与漏极2113之间可以为绝缘设置，在此不再赘述。
在本申请第二实施例中，发光功能层22包括多个发光像素221。彩膜结构层25包括多个色阻25A。色阻25A一一对应设置于发光像素221上。
在现有的OLED显示面板中，彩膜结构层25通常设置在封装层23的上方，彩膜结构层25包括色阻25A以及位于色阻25A之间的黑色矩阵。由于封装层23中的各膜层折射率不同，当发光像素221发出的光线经过具有不同折射率的封装层23射出时，通常会有明显的色散现象发生，进而直接影响到发光像素221的出光效果。本申请第二实施例通过将彩膜结构层25集成在封装层23上，可以降低色阻25A与发光像素221之间的距离，减少了发光像素221中光线的出射路径，进而降低了色散现象的产生几率，提高了发光像素221的出光效果。
另外，上述设置通过降低发光像素221与彩膜结构层25之间的距离，还可以降低发光像素221的出射光线被彩膜结构层15中的黑色矩阵吸收的几率，进而可以提高光线利用率，提高了发光像素221的出光率。
进一步的，在维持发光像素221出光率的前提下，上述设置还可以降低色阻25A所在膜层的开孔尺寸，进而满足了高像素密度显示面板的设计需求，以进一步提升显示面板的显示效果。
具体的，封装层23包括依次设置的第一无机层231、有机层232和第二无机层233。彩膜结构层25设置在第一无机层231和有机层232之间。
可以理解的是，在本申请第二实施例中，通过将像素定义层214作为遮光层20A，也即，以像素定义层214代替了彩膜结构层25中的黑色矩阵，进而可以省去黑色矩阵的制备工艺，简化了显示面板的工艺制程，降低了生产成本。此外，由于黑色矩阵在整个彩膜结构层25中的占用面积较大，该设置还可以节省面板空间，有利于实现显示面板的轻薄化设计。
另外，本申请第二实施例通过将彩膜结构层25集成在封装层23中，还可以进一步降低显示面板的厚度，从而进一步提高了OLED显示面板的弯折性能。
在本申请第二实施例中，第一平坦层212和介电绝缘层208的材料均为黑色材料。
具体的，该黑色材料可以为有机光阻、无机材料或其他具有遮光效果的材料，本申请对该黑色材料不作具体限定。
由于环境光和发光像素221发出的光会透过阳极2133等膜层射入阵列基板20的金属膜层中，如第一栅极金属层205、第二栅极金属层207和第一导电层2111。上述设置通过将第一平坦层212和介电绝缘层208的材料设置为黑色材料，可以有效避免因金属膜层的反射光线射入发光像素221而影响发光像素221的出光效果。同时，该设置还可以降低不同发光像素221之间混色现象的发生几率，从而使得显示屏显示出的色彩更加纯净，进一步提高了显示面板的显示效果。
需要说明的是，本申请第二实施例将第一平坦层212和介电绝缘层208的材料均设置为黑色材料，以达到完全遮蔽金属膜层反射光线的效果。在一些实施例中，也可以仅将第一平坦层212的材料设置为黑色材料，在此不再赘述。
进一步的，像素定义层214上开设有多个第一开口214A。第一开口214A裸露出阳极2133。发光像素221设置在阳极2133上。发光功能层22还包括阴极层222。阴极层222设置在像素定义层214上并覆盖第一开口214A。
在本申请第二实施例中，阴极层222与触控结构24相错设置。
具体的，阴极层222覆盖第一开口214A，且位于像素定义层214靠近第一开口214A的部分上。阴极层222与第一电极2131、第二电极2132以及架桥2111远离第一开口214A的部分错开设置。该设置可以防止触控结构24中产生的触控信号被整面的阴极层222屏蔽，进而提高了触控灵敏度。
进一步的，采用刻蚀工艺对阴极层222所在的膜层进行图形化处理，以形成图案化的阴极层222，具体刻蚀工艺可以参照现有技术，在此不再赘述。
本申请第二实施例提供的OLED显示面板200通过在触控结构24上设置遮光层20A，从而有效遮蔽了射向触控结构24的光线，避免了触控结构24中金属膜层反光现象的发生，进而提高了显示面板的显示效果。此外，通过将架桥2111与源极2112和漏极2113同层设置，第一电极2131和第二电极2132与阳极2133同层设置，从而减薄了显示面板的厚度，提高了OLED显示面板的弯折性能。
相较于现有技术中的OLED显示面板，本申请提供的OLED显示面板通过在触控结构上设置遮光层，从而有效遮蔽了射向触控结构的光线，避免了触控结构中金属膜层反光现象的发生，进而提高了显示面板的显示效果。
以上对本申请实施例进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的方法及其核心思想；同时，对于本领域的一般技术人员，依据本申请的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本申请的限制。

Claims (20)

  1. 一种OLED显示面板，其包括：
    阵列基板，所述阵列基板包括遮光层和第一导电层，所述第一导电层包括阳极、源极、漏极和多个架桥，所述阳极、所述源极和所述漏极均与所述架桥同层设置，且所述阳极与所述架桥绝缘设置；以及
    触控结构，所述触控结构集成在所述阵列基板上；
    所述遮光层设置在所述触控结构上。
  2. 根据权利要求1所述的OLED显示面板，其中，所述阵列基板包括依次设置在所述第一导电层上的第一平坦层、第二导电层和像素定义层；
    所述第二导电层包括同层设置的多个第一电极和第二电极，相邻的所述第一电极之间通过所述架桥电性连接，所述第一电极、所述第二电极和所述架桥构成所述触控结构；
    所述遮光层为所述像素定义层。
  3. 根据权利要求2所述的OLED显示面板，其中，所述OLED显示面板还包括：
    发光功能层，所述发光功能层设置在所述阵列基板上，所述发光功能层包括多个发光像素；
    封装层，所述封装层设置在所述发光功能层上；以及
    彩膜结构层，所述彩膜结构层集成在所述封装层上，所述彩膜结构层包括多个色阻，所述色阻一一对应设置于所述发光像素上。
  4. 根据权利要求3所述的OLED显示面板，其中，所述封装层包括依次设置的第一无机层、有机层和第二无机层，所述彩膜结构层设置在所述第一无机层和所述有机层之间。
  5. 根据权利要求3所述的OLED显示面板，其中，所述阵列基板还包括依次设置的衬底、缓冲层、有源层、第一绝缘层、第一栅极金属层、第二绝缘层、第二栅极金属层、介电绝缘层、源漏极金属层和第二平坦层，所述第一平坦层、所述第二平坦层以及所述介电绝缘层的材料均为黑色材料。
  6. 根据权利要求5所述的OLED显示面板，其中，所述第一平坦层上开设有多个第一开口，所述第一开口裸露出所述阳极，所述发光像素设置在所述第一开口内；所述像素定义层上开设有多个第二开口，所述第二开口一一对应连通于一所述第一开口；
    所述发光功能层还包括阴极层，所述阴极层设置在所述像素定义层上并覆盖所述第二开口。
  7. 根据权利要求3所述的OLED显示面板，其中，所述第二导电层还包括阳极，所述阳极与所述第一电极和所述第二电极同层设置，所述阳极分别与所述第一电极和所述第二电极绝缘设置。
  8. 根据权利要求7所述的OLED显示面板，其中，所述架桥与所述漏极一体成型。
  9. 一种OLED显示面板，其包括：
    阵列基板，所述阵列基板包括遮光层；以及
    触控结构，所述触控结构集成在所述阵列基板上；
    所述遮光层设置在所述触控结构上。
  10. 根据权利要求9所述的OLED显示面板，其中，所述阵列基板包括依次设置的第一导电层、第一平坦层、第二导电层和像素定义层；
    所述第一导电层包括多个架桥；
    所述第二导电层包括同层设置的多个第一电极和第二电极，相邻的所述第一电极之间通过所述架桥电性连接，所述第一电极、所述第二电极和所述架桥构成所述触控结构；
    所述遮光层为所述像素定义层。
  11. 根据权利要求10所述的OLED显示面板，其中，所述OLED显示面板还包括：
    发光功能层，所述发光功能层设置在所述阵列基板上，所述发光功能层包括多个发光像素；
    封装层，所述封装层设置在所述发光功能层上；以及
    彩膜结构层，所述彩膜结构层集成在所述封装层上，所述彩膜结构层包括多个色阻，所述色阻一一对应设置于所述发光像素上。
  12. 根据权利要求11所述的OLED显示面板，其中，所述封装层包括依次设置的第一无机层、有机层和第二无机层，所述彩膜结构层设置在所述第一无机层和所述有机层之间。
  13. 根据权利要求11所述的OLED显示面板，其中，所述第一导电层还包括阳极，所述阳极与所述架桥同层且绝缘设置。
  14. 根据权利要求13所述的OLED显示面板，其中，所述阵列基板还包括依次设置的衬底、缓冲层、有源层、第一绝缘层、第一栅极金属层、第二绝缘层、第二栅极金属层、介电绝缘层、源漏极金属层和第二平坦层，所述第一平坦层、所述第二平坦层以及所述介电绝缘层的材料均为黑色材料。
  15. 根据权利要求14所述的OLED显示面板，其中，所述第一平坦层上开设有多个第一开口，所述第一开口裸露出所述阳极，所述发光像素设置在所述第一开口内；所述像素定义层上开设有多个第二开口，所述第二开口一一对应连通于一所述第一开口；
    所述发光功能层还包括阴极层，所述阴极层设置在所述像素定义层上并覆盖所述第二开口。
  16. 根据权利要求11所述的OLED显示面板，其中，所述第一导电层还包括源极和漏极，所述源极和所述漏极均与所述架桥同层设置；
    所述第二导电层还包括阳极，所述阳极与所述第一电极和所述第二电极同层设置，所述阳极分别与所述第一电极和所述第二电极绝缘设置。
  17. 根据权利要求16所述的OLED显示面板，其中，所述架桥与所述漏极一体成型。
  18. 根据权利要求16所述的OLED显示面板，其中，所述阵列基板还包括依次设置的衬底、缓冲层、有源层、第一绝缘层、第一栅极金属层、第二绝缘层、第二栅极金属层和介电绝缘层，所述第一平坦层和所述介电绝缘层的材料均为黑色材料。
  19. 根据权利要求18所述的OLED显示面板，其中，所述像素定义层上开设有多个第一开口，所述第一开口裸露出所述阳极，所述发光像素设置在所述阳极上；
    所述发光功能层还包括阴极层，所述阴极层设置在所述像素定义层上并覆盖所述第一开口。
  20. 根据权利要求15或19所述的OLED显示面板，其中，所述阴极层与所述触控结构相错设置。
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