WO2021103090A1 - Etching solution for processing cd texture of camera lens, and use method therefor - Google Patents

Etching solution for processing cd texture of camera lens, and use method therefor Download PDF

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Publication number
WO2021103090A1
WO2021103090A1 PCT/CN2019/123279 CN2019123279W WO2021103090A1 WO 2021103090 A1 WO2021103090 A1 WO 2021103090A1 CN 2019123279 W CN2019123279 W CN 2019123279W WO 2021103090 A1 WO2021103090 A1 WO 2021103090A1
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Prior art keywords
parts
acid solution
camera lens
solution
pattern
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PCT/CN2019/123279
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French (fr)
Chinese (zh)
Inventor
郑资来
刘克山
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惠州市清洋实业有限公司
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Publication of WO2021103090A1 publication Critical patent/WO2021103090A1/en

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound

Definitions

  • the invention relates to the technical field of etching solutions, in particular to an etching solution for processing the CD pattern of a camera lens and a use method thereof.
  • Laser technology has the advantages of fast speed, high precision and high efficiency. In recent years, it has gradually been used in the processing of mobile phone lenses.
  • the mobile phone lenses after laser processing need to be thinned.
  • This method has short thinning time, small equipment investment, high product yield, simple composition of thinning liquid and low cost, and has gradually become the mainstream technical method for thinning.
  • the etching solution in the prior art will amplify the defects such as pits and scratches generated on the surface of the mobile phone lens during the laser processing process, and the straight-through rate is low. In the later stage, all the mobile phone lenses need to be polished again to overcome the defects. Surface defects.
  • the commonly used processes for the CD pattern of mobile phone camera lenses are screen printing and transfer printing.
  • the silk screen and transfer printing process Because the ink is used in the manufacturing process, small oil spills will occur. After zooming in, the lines are not neat, the texture of the product is not clear enough, and the precision is not enough.
  • the lines obtained by the silk screen and transfer process are convex, the product life is not long, and there is a hidden danger of texture shedding.
  • the present invention provides an etching solution for processing the CD pattern of a camera lens and a method of use thereof.
  • the method is used to treat the surface of the camera lens product, so that the texture of the camera lens produces metal reflection, so that the texture is clearer and the lines are more perfect. ,
  • the texture is better, the products are more high-end, and the technical solutions are as follows:
  • the purpose of the present invention is to provide an etching solution for processing the CD pattern of a camera lens.
  • the technical point is: the etching solution for processing the CD pattern of a camera lens is calculated in parts by weight, and the preparation raw materials include: 2 to 4 parts Hydrofluoric acid solution, 6-8 parts sulfuric acid solution, 5-6 parts hydrochloric acid solution, 3 parts acetic acid solution and 79-84 parts water.
  • the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10-40% by weight, and the content of chlorides contained in the hydrofluoric acid solution is 0-0.001 wt%, the content of sulfate in the hydrofluoric acid solution is 0 ⁇ 0.002wt%
  • the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75-98.3 wt%
  • the content of HCl molecules in the hydrochloric acid solution is 10 to 38 wt%.
  • the content of acetic acid molecules in the acetic acid solution is 36-38 wt%.
  • Another object of the present invention is to provide a method for processing the CD pattern etching solution of a camera lens.
  • the technical point is that it includes the following steps:
  • the camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 2.5-6 ⁇ m/min.
  • the stirring temperature of the mixed solution in the step S1 is 50-60° C.
  • the stirring time is 10-20 min.
  • the concentration of the CD pattern etching solution of the camera lens after dilution in the step S1 is 10-50wt%.
  • the present invention has the following beneficial effects:
  • the hydrofluoric acid contained in the etching solution used to process the CD pattern of the camera lens of the present invention allows the product lines to be etched to reach the depth of the process design; the sulfuric acid contained in the etching solution in this aspect inhibits the glass raw material The bubble point and repair the tiny scratches generated in the previous process to avoid being magnified and causing defects; the hydrochloric acid contained in the etching solution of the present invention is the glass powder produced when etching glass, and the glass powder in the grain can be peeled off in time , Will not cause roughness; the acetic acid contained in the etching solution of the present invention makes the appearance of the product brighter and makes the CD pattern metal reflection more clear.
  • An etching solution for processing the CD pattern of camera lenses is calculated in parts by weight, and its preparation raw materials include: 2 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 84 parts Of water.
  • the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10wt%
  • the content of chlorides contained in the hydrofluoric acid solution is 0.001wt%
  • the sulfuric acid contained in the hydrofluoric acid solution The content of salt is 0.002wt%
  • the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75wt%
  • the content of HCl molecules in the hydrochloric acid solution is 10 wt%.
  • the content of acetic acid molecules in the acetic acid solution is 36 wt%.
  • a method for processing the CD pattern etching solution of camera lens including the following steps:
  • step S2 The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 2.5 ⁇ m/min.
  • the stirring temperature of the mixed solution in step S1 is 50° C.
  • the stirring time is 20 min.
  • the concentration of the diluted camera lens CD pattern etching solution in step S1 is 10 wt%.
  • An etching solution for processing the CD pattern of camera lenses is calculated in parts by weight, and its preparation raw materials include: 2.5 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 83.5 parts Of water.
  • the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 20wt%
  • the content of chlorides contained in the hydrofluoric acid solution is 0.0005wt%
  • the sulfuric acid contained in the hydrofluoric acid solution The content of salt is 0.001wt%
  • the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 80wt%
  • the content of HCl molecules in the hydrochloric acid solution is 15 wt%.
  • the content of acetic acid molecules in the acetic acid solution is 37 wt%.
  • a method for processing the CD pattern etching solution of camera lens including the following steps:
  • the camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 3 ⁇ m/min.
  • the stirring temperature of the mixed solution in step S1 is 55° C.
  • the stirring time is 15 min.
  • the concentration of the diluted camera lens CD pattern etching solution in step S1 is 20 wt%.
  • An etching solution for processing the CD pattern of camera lenses is calculated in parts by weight, and its preparation raw materials include: 3 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 80 parts Of water.
  • the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 30% by weight
  • the chloride content contained in the hydrofluoric acid solution is 0.001% by weight
  • the sulfuric acid contained in the hydrofluoric acid solution is 0.001% by weight.
  • the content of salt is 0.002wt%
  • the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 90wt%
  • the content of HCl molecules in the hydrochloric acid solution is 20 wt%.
  • the content of acetic acid molecules in the acetic acid solution is 38 wt%.
  • a method for processing the CD pattern etching solution of camera lens including the following steps:
  • the camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 4.5 ⁇ m/min.
  • the stirring temperature of the mixed solution in step S1 is 60° C.
  • the stirring time is 10 min.
  • the concentration of the diluted camera lens CD pattern etching solution in step S1 is 40 wt%.
  • An etching solution for processing the CD pattern of a camera lens is calculated in parts by weight, and its preparation raw materials include: 4 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 79 parts Of water.
  • the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 40% by weight
  • the chloride content contained in the hydrofluoric acid solution is 0.001% by weight
  • the sulfuric acid contained in the hydrofluoric acid solution is 0.001% by weight.
  • the content of salt is 0.002wt%
  • the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 98.3wt%
  • the content of HCl molecules in the hydrochloric acid solution is 38 wt%.
  • the content of acetic acid molecules in the acetic acid solution is 38 wt%.
  • a method for processing the CD pattern etching solution of camera lens including the following steps:
  • the camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 6 ⁇ m/min.
  • the stirring temperature of the mixed solution in step S1 is 60° C.
  • the stirring time is 10 min.
  • the concentration of the diluted camera lens CD pattern etching solution in step S1 is 50 wt%.
  • the CD pattern of the camera lens prepared in Examples 1 to 5 was selected for depth test and appearance test. The test results are shown in Table 1:

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

An etching solution for processing a CD texture of a camera lens, and a use method therefor. A preparation raw material of the etching solution comprises: 2-4 parts of hydrofluoric acid solution, 6-8 parts of sulfuric acid solution, 5-6 parts of hydrochloric acid solution, 3 parts of acetic acid solution, and 79-84 parts of water. When being used for processing the surface of a camera lens product, the etching solution makes the texture of the camera lens produce metal reflection, and makes the texture clearer, the line more perfect, the quality better, and the product more high graded.

Description

一种用于处理摄像头镜片CD纹蚀刻液及其使用方法An etching solution for processing the CD pattern of camera lens and its use method 技术领域Technical field
本发明涉及蚀刻液技术领域，具体涉及一种用于处理摄像头镜片CD纹蚀刻液及其使用方法。The invention relates to the technical field of etching solutions, in particular to an etching solution for processing the CD pattern of a camera lens and a use method thereof.
背景技术Background technique
激光技术具有速度快、精度高和效率高等优点，近几年逐渐用于手机镜片的加工领域，激光加工后的手机镜片需要进行减薄处理。通常使用的减薄方法有两种，一种是物理方法，即使用抛光粉进行研磨抛光，这种方法减薄时间长，精度不好控制，产品良率低；另一种方法为化学蚀刻法，这种方法减薄时间短，设备投入小，产品良率高，且减薄液的成分简单，成本低，逐渐成为了减薄的主流技术方法。现有技术中的蚀刻液，在蚀刻过程中，会把激光加工过程中手机镜片表面产生的凹点和划伤等缺陷放大，直通率低，后期全部需要再次经过研磨处理手机镜片，才能克服其表面缺陷。Laser technology has the advantages of fast speed, high precision and high efficiency. In recent years, it has gradually been used in the processing of mobile phone lenses. The mobile phone lenses after laser processing need to be thinned. There are two commonly used thinning methods, one is the physical method, that is, the use of polishing powder for grinding and polishing, this method has a long thinning time, the accuracy is not well controlled, and the product yield is low; the other method is chemical etching This method has short thinning time, small equipment investment, high product yield, simple composition of thinning liquid and low cost, and has gradually become the mainstream technical method for thinning. The etching solution in the prior art will amplify the defects such as pits and scratches generated on the surface of the mobile phone lens during the laser processing process, and the straight-through rate is low. In the later stage, all the mobile phone lenses need to be polished again to overcome the defects. Surface defects.
现有技术中，在手机摄像头镜片的CD纹，常用的工艺是丝印和转印这两种工艺，首先，丝印和转印工艺，在制程中由于是采用油墨会产生微小溢油，在设备上放大之后，线条不整齐，产品的纹理不够清晰，精密度不够。其次，丝印和转印工艺得到的纹路是凸起的，产品使用寿命不长，存在纹理脱落的隐患。In the prior art, the commonly used processes for the CD pattern of mobile phone camera lenses are screen printing and transfer printing. First of all, the silk screen and transfer printing process. Because the ink is used in the manufacturing process, small oil spills will occur. After zooming in, the lines are not neat, the texture of the product is not clear enough, and the precision is not enough. Secondly, the lines obtained by the silk screen and transfer process are convex, the product life is not long, and there is a hidden danger of texture shedding.
发明内容Summary of the invention
为了解决上述问题，本发明提供一种用于处理摄像头镜片CD纹蚀刻液及其使用方法，该方法用于处理摄像头镜片产品表面，使摄像头镜片纹路产生金属反光，让纹路更清晰、线条更完美，质感更好，产品更高档，具有技术方案如下：In order to solve the above problems, the present invention provides an etching solution for processing the CD pattern of a camera lens and a method of use thereof. The method is used to treat the surface of the camera lens product, so that the texture of the camera lens produces metal reflection, so that the texture is clearer and the lines are more perfect. , The texture is better, the products are more high-end, and the technical solutions are as follows:
本发明的目的在于提供一种用于处理摄像头镜片CD纹蚀刻液，其技术点在于：所述的用于处理摄像头镜片CD纹蚀刻液按重量份数计，其制备原料包括：2～4份的氢氟酸溶液，6～8份的硫酸溶液、5～6份的盐酸溶液、3份的醋酸溶液和79～84份的水。The purpose of the present invention is to provide an etching solution for processing the CD pattern of a camera lens. The technical point is: the etching solution for processing the CD pattern of a camera lens is calculated in parts by weight, and the preparation raw materials include: 2 to 4 parts Hydrofluoric acid solution, 6-8 parts sulfuric acid solution, 5-6 parts hydrochloric acid solution, 3 parts acetic acid solution and 79-84 parts water.
在本发明有的实施例中，所述的氢氟酸溶液中含有的氢氟酸分子的重量分数为10～40wt％，所述的氢氟酸溶液中含有的氯化物的含量为0～0.001wt％，所述的氢氟酸溶液中含有的硫酸盐的含量为0～0.002wt％In some embodiments of the present invention, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10-40% by weight, and the content of chlorides contained in the hydrofluoric acid solution is 0-0.001 wt%, the content of sulfate in the hydrofluoric acid solution is 0～0.002wt%
在本发明有的实施例中，所述的硫酸溶液中含有的硫酸分子的重量分数为75～98.3wt％In some embodiments of the present invention, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75-98.3 wt%
在本发明有的实施例中，所述的盐酸溶液中HCl分子的含量为10～38wt％。In some embodiments of the present invention, the content of HCl molecules in the hydrochloric acid solution is 10 to 38 wt%.
在本发明有的实施例中，所述的醋酸溶液中醋酸分子的含量为36～38wt％。In some embodiments of the present invention, the content of acetic acid molecules in the acetic acid solution is 36-38 wt%.
本发明的另外一个目的在于提供一种用于处理摄像头镜片CD纹蚀刻液的使用方法，其技术点在于：包括以下步骤：Another object of the present invention is to provide a method for processing the CD pattern etching solution of a camera lens. The technical point is that it includes the following steps:
S1.将2～4份的氢氟酸溶液，6～8份的硫酸溶液、5～6份的盐酸溶液、3份的醋酸溶液和79～84份的水加入配料槽中混合均匀得到混合 液，搅拌均匀后稀释得到摄像头镜片CD纹蚀刻液；S1. Add 2~4 parts of hydrofluoric acid solution, 6~8 parts of sulfuric acid solution, 5~6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 79~84 parts of water into the batching tank and mix evenly to obtain a mixed solution , After mixing evenly, dilute to obtain the CD pattern etching solution of the camera lens;
S2.将所述的步骤S2中制备得到的摄像头镜片CD纹蚀刻液以2.5～6μm/min的速率蚀刻所述的摄像头镜片CD纹。S2. The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 2.5-6 μm/min.
在本发明有的实施例中，所述的步骤S1中混合液的搅拌温度为50～60℃，搅拌时间为10～20min。In some embodiments of the present invention, the stirring temperature of the mixed solution in the step S1 is 50-60° C., and the stirring time is 10-20 min.
在本发明有的实施例中，所述的步骤S1中稀释后的摄像头镜片CD纹蚀刻液的浓度为10～50wt％。In some embodiments of the present invention, the concentration of the CD pattern etching solution of the camera lens after dilution in the step S1 is 10-50wt%.
与现有技术相比，本发明的有益效果：Compared with the prior art, the present invention has the following beneficial effects:
本发明的一种用于处理摄像头镜片CD纹蚀刻液里含的氢氟酸，是让产品纹路进行蚀刻，达到工艺设计的深度；本方面的蚀刻液里含的硫酸，是抑制玻璃原材的气泡点和修复在前制程产生的微小划伤，避免被放大，导致不良产生；本发明的蚀刻液里含的盐酸，是让蚀刻玻璃时产生的玻璃粉，能让纹路中的玻璃粉及时脱落，不会造成粗糙不平；本发明的蚀刻液里含的醋酸，是让产品的表观更加光亮，使CD纹金属反光更清晰。The hydrofluoric acid contained in the etching solution used to process the CD pattern of the camera lens of the present invention allows the product lines to be etched to reach the depth of the process design; the sulfuric acid contained in the etching solution in this aspect inhibits the glass raw material The bubble point and repair the tiny scratches generated in the previous process to avoid being magnified and causing defects; the hydrochloric acid contained in the etching solution of the present invention is the glass powder produced when etching glass, and the glass powder in the grain can be peeled off in time , Will not cause roughness; the acetic acid contained in the etching solution of the present invention makes the appearance of the product brighter and makes the CD pattern metal reflection more clear.
具体实施方式Detailed ways
下面将对本发明实施例中的技术方案进行清楚、完整地描述，以使本领域的技术人员能够更好的理解本发明的优点和特征，从而对本发明的保护范围做出更为清楚的界定。本发明所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例，基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be described below clearly and completely, so that those skilled in the art can better understand the advantages and features of the present invention, so as to make a clearer definition of the protection scope of the present invention. The described embodiments of the present invention are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other implementations obtained by those of ordinary skill in the art without creative work Examples are all within the protection scope of the present invention.
实施例1Example 1
一种用于处理摄像头镜片CD纹蚀刻液按重量份数计，其制备原料包括：2份的氢氟酸溶液，6份的硫酸溶液、5份的盐酸溶液、3份的醋酸溶液和84份的水。An etching solution for processing the CD pattern of camera lenses is calculated in parts by weight, and its preparation raw materials include: 2 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 84 parts Of water.
其中，氢氟酸溶液中含有的氢氟酸分子的重量分数为10wt％，所述的氢氟酸溶液中含有的氯化物的含量为0.001wt％，所述的氢氟酸溶液中含有的硫酸盐的含量为0.002wt％Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10wt%, the content of chlorides contained in the hydrofluoric acid solution is 0.001wt%, and the sulfuric acid contained in the hydrofluoric acid solution The content of salt is 0.002wt%
其中，硫酸溶液中含有的硫酸分子的重量分数为75wt％Among them, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75wt%
其中，盐酸溶液中HCl分子的含量为10wt％。Wherein, the content of HCl molecules in the hydrochloric acid solution is 10 wt%.
其中，醋酸溶液中醋酸分子的含量为36wt％。Among them, the content of acetic acid molecules in the acetic acid solution is 36 wt%.
一种用于处理摄像头镜片CD纹蚀刻液的使用方法,包括以下步骤：A method for processing the CD pattern etching solution of camera lens, including the following steps:
S1将2份的氢氟酸溶液，6份的硫酸溶液、5份的盐酸溶液、3份的醋酸溶液和84份的水加入配料槽中混合均匀得到混合液，搅拌均匀后稀释得到摄像头镜片CD纹蚀刻液；S1 Add 2 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 84 parts of water into the batching tank and mix to obtain the mixed solution. After stirring evenly, dilute to obtain the camera lens CD Pattern etching solution;
S2将所述的步骤S2中制备得到的摄像头镜片CD纹蚀刻液以2.5μm/min的速率蚀刻所述的摄像头镜片CD纹。S2 The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 2.5 μm/min.
其中，步骤S1中混合液的搅拌温度为50℃，搅拌时间为20min。Wherein, the stirring temperature of the mixed solution in step S1 is 50° C., and the stirring time is 20 min.
其中，步骤S1中稀释后的摄像头镜片CD纹蚀刻液的浓度为10wt％。Wherein, the concentration of the diluted camera lens CD pattern etching solution in step S1 is 10 wt%.
实施例2Example 2
一种用于处理摄像头镜片CD纹蚀刻液按重量份数计，其制备原 料包括：2.5份的氢氟酸溶液，6份的硫酸溶液、5份的盐酸溶液、3份的醋酸溶液和83.5份的水。An etching solution for processing the CD pattern of camera lenses is calculated in parts by weight, and its preparation raw materials include: 2.5 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 83.5 parts Of water.
其中，氢氟酸溶液中含有的氢氟酸分子的重量分数为20wt％，所述的氢氟酸溶液中含有的氯化物的含量为0.0005wt％，所述的氢氟酸溶液中含有的硫酸盐的含量为0.001wt％Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 20wt%, the content of chlorides contained in the hydrofluoric acid solution is 0.0005wt%, and the sulfuric acid contained in the hydrofluoric acid solution The content of salt is 0.001wt%
其中，硫酸溶液中含有的硫酸分子的重量分数为80wt％Among them, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 80wt%
其中，盐酸溶液中HCl分子的含量为15wt％。Wherein, the content of HCl molecules in the hydrochloric acid solution is 15 wt%.
其中，醋酸溶液中醋酸分子的含量为37wt％。Among them, the content of acetic acid molecules in the acetic acid solution is 37 wt%.
一种用于处理摄像头镜片CD纹蚀刻液的使用方法,包括以下步骤：A method for processing the CD pattern etching solution of camera lens, including the following steps:
S1.将2.5份的氢氟酸溶液，6份的硫酸溶液、5份的盐酸溶液、3份的醋酸溶液和83.5份的水加入配料槽中混合均匀得到混合液，搅拌均匀后稀释得到摄像头镜片CD纹蚀刻液；S1. Add 2.5 parts of hydrofluoric acid solution, 6 parts of sulfuric acid solution, 5 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 83.5 parts of water into the batching tank and mix evenly to obtain a mixed solution, stir evenly and dilute to obtain a camera lens CD pattern etching solution;
S2.将所述的步骤S2中制备得到的摄像头镜片CD纹蚀刻液以3μm/min的速率蚀刻所述的摄像头镜片CD纹。S2. The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 3 μm/min.
其中，步骤S1中混合液的搅拌温度为55℃，搅拌时间为15min。Wherein, the stirring temperature of the mixed solution in step S1 is 55° C., and the stirring time is 15 min.
其中，步骤S1中稀释后的摄像头镜片CD纹蚀刻液的浓度为20wt％。Wherein, the concentration of the diluted camera lens CD pattern etching solution in step S1 is 20 wt%.
实施例3Example 3
一种用于处理摄像头镜片CD纹蚀刻液按重量份数计，其制备原料包括：3份的氢氟酸溶液，8份的硫酸溶液、6份的盐酸溶液、3份的醋酸溶液和80份的水。An etching solution for processing the CD pattern of camera lenses is calculated in parts by weight, and its preparation raw materials include: 3 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 80 parts Of water.
其中，氢氟酸溶液中含有的氢氟酸分子的重量分数为30wt％，所述的氢氟酸溶液中含有的氯化物的含量为0.001wt％，所述的氢氟酸溶液中含有的硫酸盐的含量为0.002wt％Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 30% by weight, the chloride content contained in the hydrofluoric acid solution is 0.001% by weight, and the sulfuric acid contained in the hydrofluoric acid solution is 0.001% by weight. The content of salt is 0.002wt%
其中，硫酸溶液中含有的硫酸分子的重量分数为90wt％Among them, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 90wt%
其中，盐酸溶液中HCl分子的含量为20wt％。Wherein, the content of HCl molecules in the hydrochloric acid solution is 20 wt%.
其中，醋酸溶液中醋酸分子的含量为38wt％。Among them, the content of acetic acid molecules in the acetic acid solution is 38 wt%.
一种用于处理摄像头镜片CD纹蚀刻液的使用方法,包括以下步骤：A method for processing the CD pattern etching solution of camera lens, including the following steps:
S1.将3份的氢氟酸溶液，8份的硫酸溶液、6份的盐酸溶液、3份的醋酸溶液和80份的水加入配料槽中混合均匀得到混合液，搅拌均匀后稀释得到摄像头镜片CD纹蚀刻液；S1. Add 3 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 80 parts of water into the batching tank and mix evenly to obtain a mixed solution, stir evenly and dilute to obtain a camera lens CD pattern etching solution;
S2.将所述的步骤S2中制备得到的摄像头镜片CD纹蚀刻液以4.5μm/min的速率蚀刻所述的摄像头镜片CD纹。S2. The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 4.5 μm/min.
其中，步骤S1中混合液的搅拌温度为60℃，搅拌时间为10min。Wherein, the stirring temperature of the mixed solution in step S1 is 60° C., and the stirring time is 10 min.
其中，步骤S1中稀释后的摄像头镜片CD纹蚀刻液的浓度为40wt％。Wherein, the concentration of the diluted camera lens CD pattern etching solution in step S1 is 40 wt%.
实施例4Example 4
一种用于处理摄像头镜片CD纹蚀刻液按重量份数计，其制备原料包括：4份的氢氟酸溶液，8份的硫酸溶液、6份的盐酸溶液、3份的醋酸溶液和79份的水。An etching solution for processing the CD pattern of a camera lens is calculated in parts by weight, and its preparation raw materials include: 4 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 79 parts Of water.
其中，氢氟酸溶液中含有的氢氟酸分子的重量分数为40wt％，所述的氢氟酸溶液中含有的氯化物的含量为0.001wt％，所述的氢氟酸 溶液中含有的硫酸盐的含量为0.002wt％Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 40% by weight, the chloride content contained in the hydrofluoric acid solution is 0.001% by weight, and the sulfuric acid contained in the hydrofluoric acid solution is 0.001% by weight. The content of salt is 0.002wt%
其中，硫酸溶液中含有的硫酸分子的重量分数为98.3wt％Among them, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 98.3wt%
其中，盐酸溶液中HCl分子的含量为38wt％。Among them, the content of HCl molecules in the hydrochloric acid solution is 38 wt%.
其中，醋酸溶液中醋酸分子的含量为38wt％。Among them, the content of acetic acid molecules in the acetic acid solution is 38 wt%.
一种用于处理摄像头镜片CD纹蚀刻液的使用方法,包括以下步骤：A method for processing the CD pattern etching solution of camera lens, including the following steps:
S1.将4份的氢氟酸溶液，8份的硫酸溶液、6份的盐酸溶液、3份的醋酸溶液和79份的水加入配料槽中混合均匀得到混合液，搅拌均匀后稀释得到摄像头镜片CD纹蚀刻液；S1. Add 4 parts of hydrofluoric acid solution, 8 parts of sulfuric acid solution, 6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 79 parts of water into the batching tank and mix evenly to obtain the mixed solution, stir evenly and dilute to obtain the camera lens CD pattern etching solution;
S2.将所述的步骤S2中制备得到的摄像头镜片CD纹蚀刻液以6μm/min的速率蚀刻所述的摄像头镜片CD纹。S2. The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 6 μm/min.
其中，步骤S1中混合液的搅拌温度为60℃，搅拌时间为10min。Wherein, the stirring temperature of the mixed solution in step S1 is 60° C., and the stirring time is 10 min.
其中，步骤S1中稀释后的摄像头镜片CD纹蚀刻液的浓度为50wt％。Wherein, the concentration of the diluted camera lens CD pattern etching solution in step S1 is 50 wt%.
实验例Experimental example
选取实施例1～5制备得到的摄像头镜片CD纹，进行深度测试和外观测试，测试结果如表1：The CD pattern of the camera lens prepared in Examples 1 to 5 was selected for depth test and appearance test. The test results are shown in Table 1:
表1Table 1
Figure PCTCN2019123279-appb-000001
Figure PCTCN2019123279-appb-000001
在表1中的数据中可以得出结论，实施例4刻蚀液配方中，效果最佳，纹路线条几乎都是完美的，而且配制简单，成本低，可以广泛推广。It can be concluded from the data in Table 1 that in the etching solution formulation of Example 4, the effect is the best, the pattern lines are almost perfect, and the preparation is simple, the cost is low, and it can be widely promoted.
最后应当说明的是，以上实施例仅用以说明本发明的技术方案，而非对本发明保护范围的限制，尽管参照较佳实施例对本发明作了详细地说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或者等同替换，而不脱离本发明技术方案的实质和范围。Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the scope of protection of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand The technical solution of the present invention can be modified or equivalently replaced without departing from the essence and scope of the technical solution of the present invention.

Claims (8)

  1. 一种用于处理摄像头镜片CD纹蚀刻液，其特征在于：按重量份数计，其制备原料包括：2～4份的氢氟酸溶液，6～8份的硫酸溶液、5～6份的盐酸溶液、3份的醋酸溶液和79～84份的水。An etching solution for processing the CD pattern of camera lens, characterized in that: in parts by weight, the preparation raw materials include: 2 to 4 parts of hydrofluoric acid solution, 6 to 8 parts of sulfuric acid solution, and 5 to 6 parts of Hydrochloric acid solution, 3 parts of acetic acid solution and 79 to 84 parts of water.
  2. 根据权利要求1所述的一种用于处理摄像头镜片CD纹蚀刻液，其特征在于：所述的氢氟酸溶液中含有的氢氟酸分子的重量分数为10～40wt％，所述的氢氟酸溶液中含有的氯化物的含量为0～0.001wt％，所述的氢氟酸溶液中含有的硫酸盐的含量为0～0.002wt％The etching solution for processing the CD pattern of a camera lens according to claim 1, wherein the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10-40% by weight, and the hydrogen The chloride content in the hydrofluoric acid solution is 0 to 0.001 wt%, and the sulfate content in the hydrofluoric acid solution is 0 to 0.002 wt%
  3. 根据权利要求1所述的一种用于处理摄像头镜片CD纹蚀刻液，其特征在于：所述的硫酸溶液中含有的硫酸分子的重量分数为75～98.3wt％The etching solution for processing CD pattern of camera lens according to claim 1, wherein the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75-98.3wt%
  4. 根据权利要求1所述的一种用于处理摄像头镜片CD纹蚀刻液，其特征在于：所述的盐酸溶液中HCl分子的含量为10～38wt％。An etching solution for processing CD patterns of camera lenses according to claim 1, wherein the content of HCl molecules in the hydrochloric acid solution is 10 to 38 wt%.
  5. 根据权利要求1所述的一种用于处理摄像头镜片CD纹蚀刻液，其特征在于：所述的醋酸溶液中醋酸分子的含量为36～38wt％。An etching solution for processing CD patterns of camera lenses according to claim 1, wherein the content of acetic acid molecules in the acetic acid solution is 36-38 wt%.
  6. 一种用于处理摄像头镜片CD纹蚀刻液的使用方法，其特征在于：包括以下步骤：A method for processing the CD pattern etching solution of a camera lens, which is characterized in that it comprises the following steps:
    S1.将2～4份的氢氟酸溶液，6～8份的硫酸溶液、5～6份的盐酸溶液、3份的醋酸溶液和79～84份的水加入配料槽中混合均匀得到混合液，搅拌均匀后稀释得到摄像头镜片CD纹蚀刻液；S1. Add 2~4 parts of hydrofluoric acid solution, 6~8 parts of sulfuric acid solution, 5~6 parts of hydrochloric acid solution, 3 parts of acetic acid solution and 79~84 parts of water into the batching tank and mix evenly to obtain a mixed solution , After mixing evenly, dilute to obtain the CD pattern etching solution of the camera lens;
    S2.将所述的步骤S2中制备得到的摄像头镜片CD纹蚀刻液以2.5～6μm/min的速率蚀刻所述的摄像头镜片CD纹。S2. The camera lens CD pattern etching solution prepared in step S2 is used to etch the camera lens CD pattern at a rate of 2.5-6 μm/min.
  7. 根据权利要求6所述的一种用于处理摄像头镜片CD纹蚀刻液的使用方法，其特征在于：所述的步骤S1中混合液的搅拌温度为50～60℃，搅拌时间为10～20min。The method of using the etching solution for treating CD pattern of camera lens according to claim 6, wherein the stirring temperature of the mixed solution in the step S1 is 50-60°C, and the stirring time is 10-20 min.
  8. 根据权利要求6所述的一种用于处理摄像头镜片CD纹蚀刻液的使用方法，其特征在于：所述的步骤S1中稀释后的摄像头镜片CD纹蚀刻液的浓度为10～50wt％。The use method for processing the CD pattern etching solution of a camera lens according to claim 6, wherein the concentration of the CD pattern etching solution of the camera lens diluted in the step S1 is 10-50wt%.
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