CN109305759A - TFT glass thinning etching solution that can be anti-dazzle - Google Patents
TFT glass thinning etching solution that can be anti-dazzle Download PDFInfo
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- CN109305759A CN109305759A CN201811287914.5A CN201811287914A CN109305759A CN 109305759 A CN109305759 A CN 109305759A CN 201811287914 A CN201811287914 A CN 201811287914A CN 109305759 A CN109305759 A CN 109305759A
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- etching solution
- dazzle
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Life Sciences & Earth Sciences (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
TFT glass thinning etching solution that can be anti-dazzle, it is characterized in that the etching solution is composed of the following components: the hydrochloric acid of weight percent content 4~7% (in terms of HCl), the nitric acid of weight percent content 1-2% (in terms of HNO3), the hydrofluoric acid of weight percent content 2%~5% (in terms of HF), the ammonium fluoride of weight percent 1%~1.5%, the zinc chloride of weight percent 0.1%~0.3%, the hydroxypropyl methyl cellulose (HPMC) of weight percent content 1~2%, the glycerine of weight ratio 3%~5% and the water of surplus.
Description
Technical field
The present invention relates to be used for TFT glass substrate etching composition.
Background technique
To meet the requirement for making ultra-thin TFT (ThinFilmTransistor, thin film transistor (TFT)) display screen, need to existing
There is specification glass substrate to carry out thinning processing.The etching solution based on hydrofluoric acid currently generallyd use carries out TFT glass substrate
Thinning is etched, but conventional etching mode can generate local defect, need to carry out prolonged polishing treatment after the completion of thinning,
The glass baseplate surface of polishing is also easy to produce dazzle, needs to carry out additional non-glare treated.As Chinese patent 2016112686887 is public
TFT glass substrate thinning technique pretreating agent is opened, formula is with TFT glass substrate thinning technique pretreating agent, feature
Be that the pretreating agent is composed of the following components: the hydrochloric acid (HCl) of mass percentage content 8~12%, mass percent contains
Measure the nitric acid of 3-5%, the hydrofluoric acid (HF) of mass percentage content 2%~5%, the chlorination of mass percentage 0.1~0.2%
Calcium, the hydroxypropyl methyl cellulose (HPMC) of mass percentage content 1~2%, the knot of mass percentage content 0.5~1% are cold
The water of glue and surplus.It is reported that after being pre-processed using the pretreating agent to liquid crystal glass base, then carry out thinning processing
Thinning can be improved afterwards and go out the quality handled.But either as thinning pretreating agent still directly as thinning etching solution,
Use the pretreatment can not form mist degree appropriate in glass surface with anti-dazzle.Chinese patent literature CN2011102930815
A kind of etching solution of anti-dazzle glas is disclosed, but is found under study for action, anti-dazzle glas obtained is being only capable of using in this way
In to TFT substrate carry out surface handle, cannot be used directly for thinning, especially cannot achieve improved while thinning it is thin
Change the surface quality of metacoxal plate, and glass baseplate surface can be made to generate mist degree appropriate to generate antiglare effect.Therefore it provides
TFT glass thinning etching solution that can be anti-dazzle can make surface generate suitable mist degree while glass substrate carries out thinning
To realize antiglare effect, become urgent problem to be solved in the prior art.
Summary of the invention
For solve aforementioned technical problem, the present invention provides for can be anti-dazzle TFT glass thinning etching solution, by excellent
Select the prescription of composition, and use thinning treatment process appropriate, can while the carry out thinning to TFT glass substrate,
Realize the effect that anti-dazzle antireflective processing is carried out to substrate surface.To solve aforementioned technical problem the technical solution adopted by the present invention
Are as follows:
TFT glass thinning etching solution that can be anti-dazzle is provided, it is characterized in that the etching solution is composed of the following components:
The hydrochloric acid (in terms of HCl) of weight percent content 4~7%, the nitric acid (in terms of HNO3) of weight percent content 1-2%, weight
The hydrofluoric acid (in terms of HF) of degree 2%~5%, the ammonium fluoride of weight percent 1%~1.5%, weight percent
0.1%~0.3% zinc chloride, the hydroxypropyl methyl cellulose (HPMC) of weight percent content 1~2%, weight ratio 3%~
5% glycerine and the water of surplus.
The TFT glass thinning etching solution that can be anti-dazzle, it is characterized in that the etching solution is composed of the following components:
The hydrochloric acid (in terms of HCl) of weight percent content 5%~6%, the nitric acid of weight percent content 1-2% is (with HNO3Meter), weight
Measure the hydrofluoric acid (in terms of HF) of degree 3%~4%, the ammonium fluoride of weight percent 1%~1.5%, weight percent
0.2%~0.3% zinc chloride, the hydroxypropyl methyl cellulose (HPMC) of weight percent content 1.5%~2%, weight ratio
3%~5% glycerine and the water of surplus.The viscosity specification of the hydroxypropyl methyl cellulose is 3000~6000.It is preferred that institute
The viscosity specification for stating hydroxypropyl methyl cellulose is 4000.
The TFT glass thinning etching solution that can be anti-dazzle, it is characterised in that it prepares in the following manner,
1) recipe quantity hydrochloric acid, nitric acid and hydrofluoric acid are mixed, be added suitable quantity of water dilution after, be added recipe quantity ammonium fluoride,
Zinc chloride dissolution,
2) it is mixed after the hydroxypropyl methyl cellulose of recipe quantity (HPMC) and glycerine being dissolved in water respectively；
3) mixed liquor of step 2) is slowly added into the mixed liquor of step 1) under agitation and is uniformly mixed.
Under study for action we have found that will the pretreating agent disclosed in Chinese patent 2016112686887 formula on the basis of, will
Calcium chloride is changed to zinc chloride, removes gellan gum, ammonium fluoride and glycerine is added, and after carrying out appropriate adjustment to the dosage of ingredient,
Obtained etching solution to TFT glass substrate carry out thinning processing after, improve thinning processing quality simultaneously, when can etch
In the suitable mist degree of glass substrate table surface production, to realize antiglare effect.In prescription screening it was found that above-mentioned prescription
In each ingredient in thinning etching process play synergistic effect, changing prescription will lead to the anti-dazzle glass for being unable to get high-transmittance
Glass.
Specific embodiment
TFT glass substrate thinning etching solution provided by the invention, is prepared in the following manner,
1) recipe quantity hydrochloric acid, nitric acid and hydrofluoric acid are mixed, be added suitable quantity of water dilution after, be added recipe quantity ammonium fluoride,
Zinc chloride dissolution,
2) it is mixed after the hydroxypropyl methyl cellulose of recipe quantity (HPMC) and glycerine being dissolved in water respectively；
3) mixed liquor of step 2) is slowly added into the mixed liquor of step 1) under agitation and is uniformly mixed.
The viscosity specification of the hydroxypropyl methyl cellulose is 4000mpa.s, and range of viscosities is 3500~5600mpa.s
(20 DEG C of 2% solution of Brookfield viscometer) is purchased from Enrique Miguez Gómez chemical industry (Shandong) Co., Ltd
The formula of embodiment and comparative example see the table below (mass percent wt%)
The method for carrying out thin processingization to the etching liquor that embodiment and comparative example obtain is as follows
Taking raw material is glass substrate of the identical producer of plate nitre NA35 with batch, with a thickness of 1.000mm, having a size of
100mm×100mm。
Etch process is
1) thinning of TFT glass substrate is prepared with etching solution 10L (hereinafter referred to as etching solution)
2) etching solution is squeezed into etching machine acid tank and controls pretreating agent temperature at 30 DEG C ± 2 DEG C, using as experimental group
The glass substrate of sample is immersed in etching solution, and removal glass surface is thinned to 0.5mm；
3) glass surface is cleaned with clear water.
Detect embodiment
Glossiness, mist degree and the transmitance of TFT glass substrate sample by thinning processing are detected, wherein mist degree
Using WGW photoelectricity mist degree instrument, transmitance using BTR-1 type visible light thoroughly/reflectance test instrument, glossiness detection uses glossiness
It is tested under the conditions of instrument, with 60 °
Detection method should meet the GBT_36260_20189 electronical display regulation of anti-dazzle anti reflection glass
Inspection result is as follows
Comparative example 1~5 is added without glycerine (suitably increase HPMC) respectively on the basis of 2/3/6/7 prescription of embodiment,
HPMC (suitably increase glycerine), ammonium fluoride, zinc chloride, ammonium fluoride and zinc chloride.
It should be less than 70 with the glossiness of anti-dazzle anti reflection glass according to regulation electronical display in GBT_36260_2018, mist degree
Should be less than 4%, it is seen that luminous transmittance (being equivalent to glossiness) should be about 98%, the experimental results showed that, only mentioned when using the present invention
The etching solution of confession carries out glass substrate when thinning processing to glass substrate, after the completion of thinning processing, can substantially conform to
The regulation of GBT_36260_20189.While keeping high-permeability energy, ideal anti-dazzle effect is realized in glass surface
Fruit.And the sample that embodiment 2/3/6/7 obtains, then better light transmittance is shown while realizing anti-dazzle.And comparative example
Obtained glass is not able to satisfy above-mentioned standard then, illustrates that each component is produced when being etched in technical solution of the present invention prescription
Synergistic effect also achieves antiglare effect to make the glass substrate after etching while meeting thinning requirement, substantially can be with
Meet the regulation of GBT_36260_2018.
Claims (4)
1. TFT glass thinning etching solution that can be anti-dazzle, it is characterized in that the etching solution is composed of the following components: weight percent
Than the hydrochloric acid (in terms of HCl) of content 4~7%, the nitric acid (in terms of HNO3) of weight percent content 1-2%, weight percent contains
The hydrofluoric acid (in terms of HF) of amount 2%~5%, the ammonium fluoride of weight percent 1%~1.5%, weight percent 0.1%~
0.3% zinc chloride, the hydroxypropyl methyl cellulose (HPMC) of weight percent content 1~2%, the third of weight ratio 3%~5%
The water of triol and surplus.
2. TFT glass thinning etching solution that as described in claim 1 can be anti-dazzle, it is characterized in that the etching solution is by following
Group is grouped as: the hydrochloric acid (in terms of HCl) of weight percent content 5%~6%, the nitric acid of weight percent content 1-2% (with
HNO3 meter), the hydrofluoric acid (in terms of HF) of weight percent content 3%~4%, the ammonium fluoride of weight percent 1%~1.5%,
The zinc chloride of weight percent 0.2%~0.3%, the hydroxypropyl methyl cellulose of weight percent content 1.5%~2%
(HPMC), the glycerine of weight ratio 3%~5% and the water of surplus.
3. TFT glass thinning etching solution that as claimed in claim 1 or 2 can be anti-dazzle, it is characterized in that the hydroxypropyl methyl
The viscosity specification of cellulose is 3000~6000.
4. TFT glass thinning etching solution that as claimed in claim 3 can be anti-dazzle, it is characterized in that the hydroxypropyl methyl fiber
The viscosity specification 4000 of element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811287914.5A CN109305759A (en) | 2018-10-31 | 2018-10-31 | TFT glass thinning etching solution that can be anti-dazzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811287914.5A CN109305759A (en) | 2018-10-31 | 2018-10-31 | TFT glass thinning etching solution that can be anti-dazzle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109305759A true CN109305759A (en) | 2019-02-05 |
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ID=65222736
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811287914.5A Withdrawn CN109305759A (en) | 2018-10-31 | 2018-10-31 | TFT glass thinning etching solution that can be anti-dazzle |
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| Country | Link |
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| CN (1) | CN109305759A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101131546A (en) * | 2006-08-21 | 2008-02-27 | 第一毛织株式会社 | Wet etching solution |
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Etching liquid and etching process for anti-dazzle glass product |
| CN107076878A (en) * | 2014-10-31 | 2017-08-18 | 康宁股份有限公司 | Anti-glare base material and its manufacture method with homogeneous texture surface and low glittering |
-
2018
- 2018-10-31 CN CN201811287914.5A patent/CN109305759A/en not_active Withdrawn
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101131546A (en) * | 2006-08-21 | 2008-02-27 | 第一毛织株式会社 | Wet etching solution |
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Etching liquid and etching process for anti-dazzle glass product |
| CN107076878A (en) * | 2014-10-31 | 2017-08-18 | 康宁股份有限公司 | Anti-glare base material and its manufacture method with homogeneous texture surface and low glittering |
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| PB01 | Publication | ||
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| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20190205 |
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| WW01 | Invention patent application withdrawn after publication |