WO2020233291A1 - 显示基板及其制备方法、显示面板 - Google Patents
显示基板及其制备方法、显示面板 Download PDFInfo
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- WO2020233291A1 WO2020233291A1 PCT/CN2020/084884 CN2020084884W WO2020233291A1 WO 2020233291 A1 WO2020233291 A1 WO 2020233291A1 CN 2020084884 W CN2020084884 W CN 2020084884W WO 2020233291 A1 WO2020233291 A1 WO 2020233291A1
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- quantum dot
- opening
- display substrate
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- light
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133617—Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
Definitions
- the present disclosure relates to the field of display technology, and in particular to a display substrate, a preparation method thereof, and a display panel.
- Quantum dots refer to semiconductor crystal grains with a particle size ranging from 1 nm to 100 nm. Since the particle size of the quantum dot is smaller than or close to the exciton Bohr radius of its corresponding semiconductor material, it can produce quantum confinement effect. The continuous band structure will be transformed into a discrete energy level structure. Under the excitation of an external light source, the quantum dot The electrons in the dot will transition and emit light in a certain wavelength range.
- the application of quantum dots to the display panel can make the display panel have many advantages such as long life and wide color gamut.
- a display substrate in one aspect, includes: a substrate, a defining layer, and a plurality of quantum dot units.
- the defining layer is disposed on the substrate, and the defining layer has a plurality of openings.
- Each quantum dot unit is arranged in an opening, and the material of the quantum dot unit includes quantum dot material.
- the refractive index of the material of the defining layer is smaller than the refractive index of the quantum dot material in the quantum dot unit.
- the display substrate further includes: a reflective layer covering the sidewall of the opening; the reflective layer surrounds the quantum dot unit.
- the thickness of the reflective layer ranges from 2 ⁇ m to 5 ⁇ m.
- the material of the defining layer includes a reflective material.
- the angle between the axis of the opening and the direction perpendicular to the substrate ranges from 15° to 60°.
- the thickness of the quantum dot unit ranges from 3 ⁇ m to 8 ⁇ m.
- the axes of the openings provided with the quantum dot unit are parallel to each other, or substantially parallel to each other.
- the plurality of quantum dot units includes a plurality of red quantum dot units and a plurality of green quantum dot units.
- the plurality of openings includes a plurality of first openings and a plurality of second openings. Each red quantum dot unit is arranged in a first opening, and each green quantum dot unit is arranged in a second opening.
- the plurality of quantum dot units further includes a plurality of blue quantum dot units, and the plurality of openings further includes a plurality of third openings; each blue quantum dot unit is disposed in one third opening .
- the display substrate further includes a plurality of transparent light-transmitting units, and the plurality of openings further includes a plurality of fourth openings; each light-transmitting unit is disposed in a fourth opening; the axis of the fourth opening is The axis of the first opening or the second opening is parallel or substantially parallel, or the axis of the fourth opening is perpendicular or substantially perpendicular to the substrate.
- the display substrate has a plurality of sub-pixel areas; each sub-pixel area is provided with at least one opening.
- a method for preparing a display substrate includes: forming a defined film on the substrate.
- the delimiting film is patterned, and a plurality of openings are formed in the delimiting film to obtain a delimiting layer; the axis of at least a part of the openings is at an acute angle to a direction perpendicular to the substrate.
- the quantum dot material is used to form a plurality of quantum dot units; each quantum dot unit is formed in one of the at least a part of the openings.
- the opening in which the quantum dot unit is formed is configured such that light incident into the quantum dot unit and directed to the side wall of the opening is reflected in the opening at least once.
- the patterning the delimiting film to form a plurality of openings in the delimiting film includes: curing the delimiting film; and using a laser drilling process to perform the curing process on the delimiting film
- the defining film is patterned, and a plurality of openings are formed in the defining film after curing treatment.
- the forming a plurality of quantum dot units includes: using an inkjet printing process or a coating process to fill the quantum dot material in at least a part of the opening to form the plurality of quantum dot units.
- the quantum dot material includes a photosensitive quantum dot material.
- the forming a plurality of quantum dot units includes: forming a quantum dot film on one side of the delimiting layer; a part of the quantum dot film is located in the at least a part of the opening, and the remaining part covers the delimiting layer and the at least Part of the opening.
- a mask is used to expose and develop the quantum dot film, and the part of the quantum dot film covering the defining layer and the at least a part of the opening is removed, and the quantum dot film remains in the at least a part of the opening
- the inner part forms the plurality of quantum dot units.
- the preparation method before forming the plurality of quantum dot units, further includes: using an inkjet printing process or a photolithography process to fill the at least a part of the opening with a reflective material.
- a laser drilling process is used to remove part of the reflective material, and the remaining part of the reflective material covers the sidewalls of the at least part of the opening to form a reflective layer.
- a display device in another aspect, includes: the display substrate as described in any of the above embodiments.
- Fig. 1 is a structural diagram of a thin film including quantum dot materials according to related technologies
- FIG. 2 is a top view of a display substrate according to some embodiments of the present disclosure.
- FIG. 3 is a top view of a sub-pixel area according to some embodiments of the present disclosure.
- FIG. 4 is a top view of another sub-pixel region in some embodiments of the present disclosure.
- Fig. 5 is a structural diagram of a display substrate according to some embodiments of the present disclosure.
- FIG. 6 is a cross-sectional view of the display substrate in FIG. 5 along the M-M' direction;
- FIG. 7 is another cross-sectional view of the display substrate in FIG. 5 along the M-M' direction;
- FIG. 8 is another cross-sectional view of the display substrate in FIG. 5 along the M-M' direction;
- FIG. 9 is a structural diagram of another display substrate according to some embodiments of the present disclosure.
- FIG. 10 is a cross-sectional view of the display substrate in FIG. 9 along the N-N' direction;
- FIG. 11 is another cross-sectional view of the display substrate in FIG. 9 along the N-N' direction;
- FIG. 12 is another cross-sectional view of the display substrate in FIG. 9 along the N-N' direction;
- FIG. 13 is a flowchart of a method for manufacturing a display substrate according to some embodiments of the present disclosure.
- FIG. 14 is a flowchart of a method for preparing a defined layer according to some embodiments of the present disclosure.
- FIG. 15 is a flowchart of a method for manufacturing a quantum dot unit in some embodiments of the present disclosure
- FIG. 16 is a flowchart of another method for manufacturing a quantum dot unit in some embodiments of the present disclosure.
- FIG. 17 is a flowchart of a method for preparing a reflective layer in some embodiments of the present disclosure.
- FIG. 18 is a flow chart of manufacturing steps of a display substrate according to some embodiments of the present disclosure.
- FIG. 19 is a flowchart of preparation steps of another display substrate according to some embodiments of the present disclosure.
- FIG. 20 is a flow chart of preparation steps of still another display substrate according to some embodiments of the present disclosure.
- FIG. 21 is a flow chart of preparation steps of still another display substrate according to some embodiments of the present disclosure.
- FIG. 22 is a top view of a display device in some embodiments of the present disclosure.
- FIG. 23 is a structural diagram of a display device in some embodiments of the present disclosure.
- FIG. 24 is a structural diagram of another display device in some embodiments of the present disclosure.
- first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined with “first” and “second” may explicitly or implicitly include one or more of these features. In the description of the embodiments of the present disclosure, unless otherwise specified, “plurality” means two or more.
- connection may be used when describing some embodiments to indicate that two or more components are in direct physical or electrical contact with each other.
- the term “if” is optionally interpreted to mean “when” or "when”.
- the exemplary embodiments are described herein with reference to cross-sectional views and/or plan views as idealized exemplary drawings.
- the thickness of layers and regions are exaggerated for clarity. Therefore, variations in the shape with respect to the drawings due to, for example, manufacturing technology and/or tolerances are conceivable. Therefore, the exemplary embodiments should not be construed as being limited to the shape of the area shown herein, but include shape deviation due to, for example, manufacturing.
- the etched area shown as a rectangle will generally have curved features. Therefore, the areas shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shape of the area of the device, and are not intended to limit the scope of the exemplary embodiments.
- the display device may include a substrate and a thin film (as shown in FIG. 1) that is provided on the light-exit side of the substrate and includes quantum dot materials.
- the quantum dot material can emit monochromatic light with a relatively pure color under the irradiation of light emitted from the substrate. This helps to improve the color gamut of the display device, and makes the colors displayed by the display device more vivid.
- the thickness of the film needs to be increased.
- it is difficult to prepare a thin film with a larger thickness which not only increases the difficulty of preparing the thin film, but also easily causes the waste of the quantum dot material.
- the display device 1000 includes: a display substrate 100 and a display panel 200 disposed opposite to the display substrate.
- the display device 1000 has a display area A and a peripheral area B located beside the display area A.
- the peripheral area B may be located on one side, both sides of the display area A, or set around the display area A, for example.
- the display area A includes a plurality of sub-pixel areas S, and each sub-pixel area S is provided with one sub-pixel.
- the sub-pixel can display one color.
- each sub-pixel may display red, green or blue.
- the multiple sub-pixels in the multiple sub-pixel regions S may include: multiple sub-pixels configured to display red, multiple sub-pixels configured to display green And a plurality of sub-pixels configured to display blue; or, each sub-pixel may display magenta, cyan, yellow, or white.
- the plurality of sub-pixels in the plurality of sub-pixel regions S may include: configured to display A plurality of red sub-pixels, a plurality of sub-pixels configured to display cyan, a plurality of sub-pixels configured to display yellow, and a plurality of sub-pixels configured to display white.
- the above-mentioned arrangement of multiple sub-pixels includes multiple, which can be selected and set according to actual needs.
- the above multiple sub-pixels are arranged in a matrix form.
- the types of the display device 1000 provided in the embodiments of the present disclosure include multiple types.
- the display device 1000 may be an OLED (Organic Light Emitting Diode, organic electroluminescent diode) display device.
- the display panel 200 includes, for example, an OLED backplane 210a disposed opposite to the display substrate 100, and a connecting structure 220a (such as acrylic glue) configured to connect the OLED backplane 210a and the display substrate 100.
- the structure of the OLED backplane 210a is schematically described.
- the sub-pixel regions S arranged in a row along the first direction X are referred to as the same row of sub-pixel regions S, and the sub-pixels in the same row of sub-pixel regions S may be connected to a gate line .
- the sub-pixel regions S arranged in a row along the second direction Y are called sub-pixel regions of the same column, and the sub-pixels in the sub-pixel region S of the same column may be connected to one data line.
- each sub-pixel may include a pixel driving circuit, and an OLED device 7 connected to the pixel driving circuit.
- the pixel driving circuit is also electrically connected to the corresponding gate line and data line.
- the pixel driving circuit is composed of multiple thin film transistors (TFT for short) and at least one storage capacitor and other electronic devices.
- the multiple TFTs include one driving TFT and at least one switching TFT, and the driving TFT can be connected to the OLED device 7.
- the aforementioned pixel driving circuit may be a 2T1C structure (T refers to thin film transistor, and C refers to storage capacitor) composed of two TFTs (including a switching TFT and a driving TFT) and a storage capacitor.
- the above pixel circuit can also be composed of two or more TFTs (including multiple switching TFTs and one driving TFT) and at least one storage capacitor to form an mTnC structure (m ⁇ 3, n ⁇ 1, and both m and n are integers) ⁇ Pixel drive circuit.
- the above-mentioned OLED device 7 includes an OLED cathode 72 and an OLED anode 71, and a light-emitting function layer located between the OLED cathode 72 and the OLED anode 71.
- the light-emitting functional layer may include, for example, an organic light-emitting layer 73, a hole transport layer 74 between the organic light-emitting layer 73 and the OLED anode 71, and an electron transport layer 75 between the organic light-emitting layer 73 and the OLED cathode 72.
- the light-emitting functional layer may also include a hole injection layer 76 disposed between the hole transport layer 74 and the OLED anode 71, and an electron injection layer disposed between the electron transport layer 75 and the OLED cathode 72.
- the pixel driving circuit can be connected to the OLED device 7 through the OLED anode 71, for example, and apply a driving voltage to the OLED device 7 to control the light-emitting state of the OLED device 7. After the light emitted by the OLED device 7 passes through the display substrate 100, it can be Make the OLED display device realize image display.
- the OLED backplane 210a may further include, for example, an encapsulation layer configured to encapsulate the OLED device 7.
- the packaging layer may be a thin film packaging layer or a packaging substrate.
- the above-mentioned display device 1000 may be a liquid crystal display device.
- the display panel 200 may include, for example, an array substrate 210b disposed opposite to the display substrate 100 and a liquid crystal layer 220b disposed between the array substrate 210b and the display substrate 100.
- the display panel 200 may also include a backlight module 230b disposed on the side of the array substrate 210b away from the display substrate 100.
- the array substrate 210b and the display substrate 100 may be pasted together by a sealant, and the liquid crystal layer 220b is confined in the area enclosed by the array substrate 210b, the display substrate 100, and the sealant.
- the structure of the array substrate 210a is schematically described.
- the sub-pixel regions S arranged in a row along the first direction X are referred to as the same row of sub-pixel regions S, and the sub-pixels in the same row of sub-pixel regions S may be connected to a gate line .
- the sub-pixel regions S arranged in a row along the second direction Y are called sub-pixel regions of the same column, and the sub-pixels in the sub-pixel region S of the same column may be connected to one data line.
- each sub-pixel may include a TFT and a pixel electrode 8.
- each sub-pixel may also include a liquid crystal capacitor (Capacitor of Liquid Crystal, C LC for short) formed with the pixel electrode 8.
- the common electrode 9 wherein the common electrode 9 can be provided on the array substrate 210b, or can be provided on the display substrate 100.
- the above-mentioned TFT includes a gate electrode, a source electrode and a drain electrode, wherein the gate electrode can be connected to a corresponding gate line, the source electrode can be connected to a corresponding data line, and the drain electrode can be connected to a corresponding pixel electrode 8.
- the pixel electrode 8 and the common electrode 9 can generate an electric field under the action of their respective applied voltages to drive the liquid crystal molecules in the liquid crystal layer 220b to undergo angular deflection, and to control the state of the backlight emitted by the backlight module 230b passing through the liquid crystal layer 220b. After the light passes through the liquid crystal layer 220b and the display substrate 100 sequentially, the liquid crystal display device can realize image display.
- Some embodiments of the present disclosure provide a display substrate 100.
- the display device 1000 has a display area A and a peripheral area B located beside the display area A. Therefore, the display substrate 100 also has a display area A and a peripheral area B located beside the display area A, and The display area A includes a plurality of sub-pixel areas S.
- the arrangement of the display area A, the peripheral area B and the multiple sub-pixel areas S in the display area A in the display substrate 100 is the same as the arrangement in the display device 1000.
- the display substrate 100 includes a substrate 1, a defining layer 2 and a plurality of quantum dot units 3.
- the substrate 1 includes a rigid substrate, such as a glass substrate.
- the substrate 1 includes a flexible substrate, such as a PET (Polyethylene terephthalate, polyethylene terephthalate) substrate, and a PEN (Polyethylene naphthalate two formal acid glycol ester). Ester) substrate or PI (Polyimide, polyimide) substrate.
- the above-mentioned defining layer 2 is disposed on the substrate 1.
- the above-mentioned defining layer 2 may be directly disposed on one side surface of the substrate 1.
- at least one functional film such as a buffer layer or an encapsulation film may also be provided between the above-mentioned defining layer 2 and the substrate 1.
- the above-mentioned defining layer 2 has a plurality of openings K. Among them, the number of openings K can be selected and set according to actual needs.
- the shape of the above-mentioned opening K includes many kinds. Exemplarily, the shape of the above-mentioned opening K may be circular or rectangular as shown in FIG. 5. The shape of the opening K can be selected and set according to actual needs.
- the material of each quantum dot unit 3 includes a quantum dot material.
- the quantum dot material includes a plurality of quantum dots and ligands respectively combined with the plurality of quantum dots, wherein the quantum dots and the photosensitive ligand are usually combined in a coordinated bonding manner.
- the quantum dot when the quantum dot is excited by light from the outside, the electrons therein will undergo a transition, causing the quantum dot to emit light. Therefore, the light incident on the quantum dot unit 3 will excite the quantum dots in the quantum dot unit 3, causing it to emit colored light.
- the wavelength of the light emitted by the quantum dots will change with the change of the particle size of the quantum dots, that is, quantum dots of different particle sizes can emit light of different colors.
- the particle size of the quantum dots can be adjusted so that multiple quantum dot units 3 emit light of different colors.
- the material of the aforementioned quantum dots may be CdSe (cadmium selenide) nanocrystals.
- the aforementioned multiple quantum dot units 3 are configured to emit light of multiple colors.
- the multiple colors include, for example, three primary colors.
- the three primary colors are, for example, red, green, and blue. That is, the plurality of quantum dot units 3 includes: a quantum dot unit configured to emit red light, a quantum dot unit configured to emit green light, and a quantum dot unit configured to emit blue light.
- the particle size of the quantum dots in the quantum dot unit configured to emit red light the particle size of the quantum dots in the quantum dot unit configured to emit green light
- the size of the quantum dots in the quantum dot unit configured to emit blue light The particle size is different from each other.
- the particle size of the quantum dots in the quantum dot unit configured to emit red light may be, for example, 2.4 nm
- the particle size of the quantum dots in the quantum dot unit configured to emit green light may be, for example, 1.7 nm.
- the particle size of the quantum dots in the quantum dot unit that emits blue light may be 1.0 nm, for example.
- each quantum dot unit 3 is disposed in an opening K.
- the multiple quantum dot units 3 can be arranged in multiple ways.
- the plurality of quantum dot units 3 are arranged in the plurality of openings K in a one-to-one correspondence.
- the plurality of quantum dot units 3 are arranged in a part of the openings K in a one-to-one correspondence.
- the axis of the opening K provided with the quantum dot unit 3 has an included angle ⁇ between the axis perpendicular to the substrate 1 and the included angle ⁇ At an acute angle.
- the opening K provided with the quantum dot unit 3 is configured such that the light incident into the quantum dot unit 3 and incident on the side wall of the opening K is reflected in the opening K at least once.
- the quantum dot unit 3 After the light enters the quantum dot unit 3, part of it will be absorbed by the quantum dot unit 3, so that the quantum dots emit light.
- the light incident on the side wall of the opening K provided with the quantum dot unit 3 includes at least a part of the light from outside the quantum dot unit 3.
- the light incident on the side wall of the opening K may also include light emitted by at least a part of the quantum dot material in the quantum dot unit 3.
- the light emitted after passing through the quantum dot unit 3 includes the light emitted by the quantum dots in the quantum dot unit 3.
- the propagation distance of the light in the quantum dot unit 3 can be effectively increased, and the quantum dot unit 3 can be lengthened.
- the interaction time between the quantum dot material in the quantum dot unit 3 and the light beam makes the interaction between the quantum dot material in the quantum dot unit 3 and the light beam relatively sufficient, which improves the utilization rate of the light beam and the quantum dot material.
- the reflection occurring in the opening K may also include total reflection, which is beneficial to further improve the utilization of the light and quantum dot materials.
- the axis of the opening K provided with the quantum dot unit 3 is adjusted so that the angle between the axis of the opening K and the direction perpendicular to the substrate 1 ⁇ is an acute angle, and makes the light incident into the quantum dot unit 3 and directed to the side wall of the opening K to be reflected at least once in the opening K, which can effectively increase the light incident into the quantum dot unit 3 in the quantum dot
- the internal propagation distance of the unit 3 prolongs the interaction time between the quantum dot material in the quantum dot unit 3 and the above light, so that the quantum dot material in the quantum dot unit 3 can interact with the above light more fully. Therefore, the utilization rate of the above-mentioned light and quantum dot materials is improved.
- some embodiments of the present disclosure can improve the utilization rate of light. In this case, it is avoided to increase the thickness L3 of the quantum dot unit 3, thereby reducing the amount of quantum dot material used in the process of preparing the quantum dot unit 3, and avoiding increasing the process difficulty of preparing the quantum dot unit 3.
- the light incident to the quantum dot unit 3 is the light emitted by the backlight module 230b and transmitted through the liquid crystal layer 220b.
- the light incident to the quantum dot unit 3 is the light emitted by the OLED device 7.
- the light incident to the quantum dot unit 3 may be referred to as a backlight.
- the direction in which the backlight enters the quantum dot unit 3 may include multiple, which may be selected and set according to actual needs.
- the backlight may be incident into the quantum dot unit 3 along the direction from the substrate 1 to the boundary layer 2 (as shown in FIG. 6 ).
- the substrate 1 is disposed on the side of the boundary layer 2 close to the display panel 200.
- the backlight can also be incident into the quantum dot unit 3 along the direction from the boundary layer 2 to the substrate 1 (as shown in FIG. 7). At this time, the substrate 1 is disposed on the side of the boundary layer 2 away from the display panel 200. .
- the incident angle of the backlight to the quantum dot unit 3 may include multiple types.
- the backlight may be incident on the quantum dot unit 3 in a direction perpendicular to the substrate 1 (as shown in FIG. 6).
- the incident direction of the backlight to the quantum dot unit 3 may also be an acute angle with the direction perpendicular to the substrate 1.
- the axis of the opening K can also increase the propagation distance of the backlight in the quantum dot unit 3, prolong the interaction time between the quantum dot material in the quantum dot unit 3 and the backlight, and improve the utilization rate of the backlight .
- the light incident on the side wall of any opening K will not pass through the defining layer 2 and be incident on the quantum dot unit 3 in the adjacent opening K, which can avoid the occurrence of quantum dots in the adjacent opening K.
- the unit 3 is ignited by mistake and emits light.
- the light emitted by the quantum dots in each quantum dot unit 3 will be reflected at the side wall of the defining layer 2 and propagate in a direction away from the side where the backlight is incident, so that adjacent quantum dot units 3 can be avoided.
- the emitted light has crosstalk, avoiding color mixing, which is beneficial to improve the color gamut and contrast of the display product to which the display substrate 100 is applied.
- the axis of the opening K of the quantum dot unit 3 is provided with the angle range of the angle ⁇ between the direction perpendicular to the substrate 1 It can be 15° ⁇ 60°.
- the angle of the aforementioned included angle ⁇ may be 15°, 20°, 30°, 45°, or 60°. This is beneficial to enable the light to be reflected once in the opening K provided with the quantum dot unit 3, thereby improving the utilization rate of the light.
- the size of the aforementioned included angle ⁇ can be adjusted according to the light absorption characteristics of the quantum dot material in the quantum dot unit 3. Exemplarily, if the light absorption of the quantum dot material is good, the angle ⁇ may be slightly smaller; if the light absorption of the quantum dot material is weak, the angle ⁇ may be slightly larger.
- the axes of the openings K provided with the quantum dot unit 3 are parallel to each other or substantially parallel to each other. That is, the inclination direction and the inclination angle of the axis of each opening K provided with the quantum dot unit 3 are substantially the same.
- the inclination angle or direction of the axis of each opening K provided with the quantum dot unit 3 may have some changes, but the actual comparison due to the process error Small, which makes the axis tilt direction and tilt angle of each opening approximately the same.
- This is beneficial to simplify the process of preparing the openings K provided with the quantum dot unit 3.
- this is also beneficial to improve the distribution uniformity of the openings K, and improve the distribution uniformity of the light exit area on the light exit side of the display substrate 100.
- the thickness L3 of the quantum dot unit 3 may be 3 ⁇ m-8 ⁇ m along the direction perpendicular to the substrate 1.
- the thickness L3 of the quantum dot unit 3 may be 3 ⁇ m, 4 ⁇ m, 5 ⁇ m, 6 ⁇ m, 7 ⁇ m, or 8 ⁇ m. In this way, while ensuring a high light utilization rate, the quantum dot unit 3 can have a smaller thickness, reduce the amount of quantum dot material used, and avoid increasing the process difficulty of preparing the quantum dot unit 3.
- the refractive index of the material of the defining layer 2 is smaller than the refractive index of the quantum dot material in the quantum dot unit 3. That is, the material of the defining layer 2 is an optically thin medium relative to the quantum dot material in the quantum dot unit 3, and the quantum dot material is an optically dense medium relative to the material of the defining layer 2.
- the material of the defining layer 2 includes multiple types, which can be selected and set according to actual needs.
- the material of the defining layer 2 may be an organic material.
- the display substrate 100 further includes a reflective layer 5 covering the sidewall of the opening K, and the reflective layer 5 surrounds the quantum dot unit 3.
- the opening K covered with the reflective layer 5 is the opening K provided with the quantum dot unit 5.
- the opening K covered with the reflective layer 5 may also include the opening K without the quantum dot unit 5.
- the reflective layer 5 includes multiple materials, which can be selected and set according to actual needs.
- the material of the reflective layer 5 may be a material with a reflectivity greater than or equal to 70%, which can ensure that the reflective layer 5 has a good light reflection effect.
- the material of the reflective layer 5 may be ink or metal material (such as silver, molybdenum, aluminum, nickel, etc.) with higher reflectivity.
- the reflective layer 5 covers the sidewall of the opening K and surrounds the quantum dot unit 3, so that the reflective layer 5 has a tubular structure. In this way, the light incident on the reflective layer 5 at any incident angle can be reflected (or totally reflected), which is beneficial to improve the reflection efficiency of the light and further improve the utilization rate of the light.
- the thickness L5 of the reflective layer 5 can be selected and set according to actual needs.
- the thickness L5 of the reflective layer 5 may be 2 ⁇ m to 5 ⁇ m.
- the thickness L5 of the reflective layer 5 may be 2 ⁇ m, 3 ⁇ m, 4 ⁇ m, or 5 ⁇ m, for example. This can not only ensure that the reflective layer 5 has a good light reflection effect, but also avoid the waste of materials forming the reflective layer 5.
- the material defining the layer 2 may also include a reflective material.
- the reflective material may be, for example, a material with increased reflection function.
- the color of the backlight provided to the display substrate 100 in the above-mentioned display device 1000 includes multiple types, such as white or blue.
- the types of colors to be displayed by the multiple sub-pixels in the above-mentioned display device 1000 include multiple types, such as red, green, and blue, and also magenta, cyan, yellow, and white.
- the quantum dot units 3 in the display substrate 100 have multiple arrangements.
- the backlight provided by the display device 1000 to the display substrate 100 is white light or blue light, and the colors required to be displayed by multiple sub-pixels in the display device 1000 include red, green, and blue as an example.
- the arrangement of the quantum dot unit 3 is schematically illustrated.
- the backlight provided by the display device 1000 to the display substrate 100 is white light.
- the plurality of quantum dot units 3 in the display substrate 100 and the plurality of openings K in the defining layer 2 are arranged in one-to-one correspondence.
- the plurality of quantum dot units 3 includes a plurality of red quantum dot units 31, a plurality of green quantum dot units 32 and a plurality of blue quantum dot units 33.
- the plurality of openings K includes a plurality of first openings K1, a plurality of second openings K2, and a plurality of third openings K3.
- each red quantum dot unit 31 is disposed in a first opening K1
- each green quantum dot unit 32 is disposed in a second opening K2
- each blue quantum dot unit 33 is disposed in a third opening K3 .
- the red quantum dot unit 31 can emit red light when it is excited by the backlight; the green quantum dot unit 32 can emit green light when it is excited by the backlight; the blue quantum dot unit 33 can emit green light when it is excited by the backlight. When excited, blue light can be emitted.
- the backlight provided by the display device 1000 to the display substrate 100 is blue light.
- the plurality of quantum dot units 3 in the display substrate 100 are arranged in a one-to-one correspondence with some of the openings K of the defining layer 2.
- the plurality of quantum dot units 3 includes a plurality of red quantum dot units 31 and a plurality of green quantum dot units 32.
- the plurality of openings K includes a plurality of first openings K1 and a plurality of second openings K2. Wherein, each red quantum dot unit 31 is disposed in a first opening K1, and each green quantum dot unit 32 is disposed in a second opening K2.
- the plurality of red quantum dot units 31 can emit red light when they are excited by the backlight.
- the plurality of green quantum dot units 32 can emit green light when being excited by the backlight.
- the display substrate 100 further includes a plurality of transparent light-transmitting units 4.
- the plurality of openings K further includes a plurality of fourth openings K4.
- Each light transmitting unit 4 is arranged in a fourth opening K4.
- Each light-transmitting unit 4 and between each light-transmitting unit 4 and a plurality of quantum dot units 3 can be separated from each other by a boundary layer 2.
- the plurality of transparent light-transmitting units 4 can allow the backlight to pass through without obstruction. In this way, there is no need to additionally provide a quantum dot unit capable of emitting blue light, which is beneficial to simplify the process of preparing and forming the display substrate 100 and save the amount of quantum dot material used.
- the fourth opening K4 can be arranged in multiple ways, which can be selected and arranged according to actual needs.
- the axis of the fourth opening K4 is parallel or substantially parallel to the axis of the first opening K1 or the second opening K2, that is, the axis of the fourth opening K4 is parallel to the axis of the first opening K1 or the
- the inclination directions and inclination angles of the axes of the two openings K2 are the same or approximately the same.
- the multiple first openings K1, multiple second openings K2, and multiple fourth openings K4 can be prepared and formed simultaneously in a single patterning process, which is beneficial to simplify the process of preparing and forming the display substrate 100 and improve the production efficiency of the display substrate 100 .
- the axis of the fourth opening K4 is perpendicular or substantially perpendicular to the substrate 1. This can make the process of preparing and forming the above-mentioned multiple openings K4 relatively simple and easy to implement, and avoid increasing the difficulty of preparing and forming the display substrate 100.
- the display substrate 100 further includes a protective layer disposed on the side of the defining layer 2 away from the substrate 1, so as to use the protective layer to planarize the surface of the side of the defining layer 2 away from the substrate 1.
- the protective layer and the light-transmitting unit 4 may be an integral structure, that is, the two are made of the same material simultaneously. This is beneficial to simplify the manufacturing process of the display substrate 100.
- the light-transmitting unit 4 can also be separately prepared from transparent materials.
- the material of the light transmission unit 4 may be acrylic glue or organic resin material.
- each sub-pixel region S is provided with at least one opening K.
- an opening K is provided in each sub-pixel area S. That is, the multiple openings K of the display substrate 100 are provided in the multiple sub-pixel regions S in a one-to-one correspondence.
- each quantum dot unit 3 corresponds to the sub-pixels in the above-mentioned display device 1000 one by one.
- multiple openings K are provided in each sub-pixel area S.
- one sub-pixel in the above-mentioned display device 1000 corresponds to a plurality of quantum dot units 3.
- each quantum dot unit 3 is arranged in a one-to-one correspondence with the sub-pixels, the size of the corresponding quantum dot unit 3 will also be relatively large. In this way, after the backlight enters the quantum dot unit 3 and the quantum dot unit 3 is excited, the phenomenon of uneven light emission is likely to occur.
- each sub-pixel in the display device 1000 can be divided into a plurality of sub-sub-pixels arranged at intervals.
- Each sub-pixel area S in the display substrate 100 may be divided into a plurality of sub-sub-pixel areas S0 arranged at intervals.
- the boundary pattern of each sub-sub-pixel area S0 may be a circle (as shown in FIG. 3) or a quadrilateral (as shown in FIG. 4), for example.
- each quantum dot unit 3 corresponds to one sub-sub-pixel arrangement one by one.
- Some embodiments of the present disclosure also provide a method for preparing a display substrate. As shown in Figure 13, the preparation method includes S100-S300.
- a defining film 20 is formed on the substrate 1.
- a coating process may be used to form the defining film 20 on the substrate 1.
- the type of the substrate 1 can refer to the type of the substrate 1 provided in some of the above-mentioned embodiments, which will not be repeated here.
- the defining film 20 is patterned, a plurality of openings K are formed in the defining film 20, and the defining layer 2 is obtained.
- the angle ⁇ between the axis of at least a part of the openings K and the direction perpendicular to the substrate 1 is an acute angle.
- the defining film 20 is patterned, and a plurality of openings K are formed in the defining film 20, including S210 to S220.
- the process of curing the defining film 20 can be selected and set according to the nature of the material of the defining film 20.
- the material of the defining film 20 is sensitive to temperature.
- a thermal strengthening process can be used to cure the defining film 20.
- the material of the defining film 20 is more sensitive to ultraviolet rays.
- an ultraviolet curing process can be used to cure the defining film 20.
- the structure of the defining film 20 can be made more stable.
- the overall shape of the delimiting film 20 can be made relatively stable and not easily deformed.
- a laser drilling process is used to pattern the cured defining film 20 to form a plurality of Opening K.
- each opening K having an included angle ⁇ between the axis and the direction perpendicular to the substrate 1 the axes are parallel to each other or substantially parallel to each other. That is, the inclination direction and the inclination angle of each opening K are the same or approximately the same.
- the inclination angle or direction of each opening K may have some changes, but because the error in the process is actually relatively small, the axis of each opening is The tilt direction and tilt angle are approximately the same.
- the aforementioned included angle ⁇ may range from 15° to 60°.
- the angle ⁇ may be 15°, 20°, 30°, 45°, or 60°. This is beneficial to enable the light to be reflected once in the opening K provided with the quantum dot unit 3, thereby improving the utilization rate of the light.
- the equipment used in the laser drilling process may be a laser, for example.
- the aforementioned angle ⁇ is the angle between the propagation direction of the laser light emitted by the laser and the direction perpendicular to the substrate 1.
- the propagation angle of the laser light emitted by the laser can be adjusted according to the light absorption characteristics of the quantum dot material to be formed into the quantum dot unit 3, and the inclination angle of the opening K can be determined.
- the aperture size of the opening K can be determined by controlling the position of the laser and the punching capability of the laser.
- a plurality of quantum dot units 3 are formed by using a quantum dot material.
- Each quantum dot unit 3 is formed in one of the above-mentioned at least a part of the opening K.
- the opening K in which the quantum dot unit 3 is formed is configured such that light incident into the quantum dot unit 3 and directed to the side wall of the opening K is reflected in the opening K at least once.
- the light incident on the side wall of the opening K provided with the quantum dot unit 3 includes a backlight from outside the quantum dot unit 3 (for example, the backlight provided by the display device 1000 to which the display substrate 100 is applied) and the quantum dot unit The light emitted by the quantum dots in 3.
- a plurality of openings K having an included angle ⁇ between the axis and the direction perpendicular to the substrate 1 are formed on one side of the substrate 1, and
- the quantum dot unit 3 is formed in the opening K, so that the light incident into the quantum dot unit 3 and directed to the sidewalls of the openings K will be reflected at least once in the openings K.
- the axis of all openings K provided with the quantum dot unit 3 is perpendicular to the substrate 1, which increases the propagation distance of the light in the quantum dot unit 3, and extends the interaction between the quantum dot material and the light. Time enables the quantum dot material in the quantum dot unit 3 to have a relatively sufficient interaction with the above-mentioned light, which improves the utilization rate of light and the quantum dot material.
- the embodiments of the present disclosure can avoid Increasing the thickness of the quantum dot unit 3 can further reduce the amount of quantum dot material used in the process of forming the quantum dot unit 3 and avoid increasing the process difficulty of forming the quantum dot unit 3.
- the refractive index of the material defining the layer 2 is less than the refractive index of the quantum dot material.
- the material of the delimiting layer 2 is an optically dense medium relative to the quantum dot material in the quantum dot unit 3
- the quantum dot material of the quantum dot unit 3 is an optically dense medium relative to the material of the delimiting layer 2.
- the light that enters the quantum dot unit 3 and is directed to the side wall of the opening K is equivalent to being directed from the optically dense medium to the lightly thinned medium.
- the material of the defining layer 2 is a reflective material.
- the light-reflecting material may be, for example, a material having an increased reflection function. This can avoid being limited by the size of the material of the defining layer 2 and the refractive index of the quantum dot material, and can also avoid being limited by the size of the incident angle of the light incident on the side wall of the opening K, so that the light is incident on the opening K. After the side wall is on, reflection or total reflection will occur, and the incident light can be basically reflected back to the inside of the quantum dot unit 3. This helps to improve the utilization of light.
- a plurality of quantum dot units 3 are formed, including S310a.
- an inkjet printing process or a coating process is used to fill the quantum dot material in at least a part of the opening K to form a plurality of quantum dot units 3.
- the quantum dot material can be directly formed in at least a part of the opening K, and a plurality of quantum dot units 3 can be directly formed. This is beneficial to simplify the process flow of preparing and forming a plurality of quantum dot units 3, and simplify the process flow of preparing and forming the display substrate 100.
- a plurality of quantum dot units 3 are formed, including S310b to 320b.
- a quantum dot film 30 is formed on one side of the defining layer 2.
- a part of the quantum dot film 30 is located in at least a part of the opening K, and the remaining part covers the defining layer 2 and at least a part of the opening K.
- a coating process (such as a spraying process or a spin coating process) may be used to coat a photosensitive quantum dot material on one side of the defining layer 2 to form the quantum dot film 30.
- a part of the photosensitive quantum dot material will fall into the plurality of openings K (including at least a part of the above-mentioned openings K) in the defining layer 2, and naturally fill the plurality of openings K, Another part of the photosensitive quantum dot material covers the defining layer 2 and the plurality of openings K.
- the quantum dot material in the quantum dot film 30 includes a photosensitive quantum dot material.
- the photosensitive quantum dot material includes a plurality of quantum dots, and photosensitive ligands respectively combined with the plurality of quantum dots.
- the photosensitive ligand has photosensitive properties, that is, under the irradiation of light (such as ultraviolet light), the photosensitive ligand will be cured or degraded according to the material used.
- the material of the photosensitive ligand includes a photocurable material, or the material of the photosensitive ligand includes a photodegradable material.
- the quantum dot film 30 is exposed and developed using a mask, and the part of the quantum dot film 30 covering the defining layer 2 and at least a part of the opening K is removed.
- the quantum dot The portion of the thin film 30 remaining in at least a part of the opening K forms a plurality of quantum dot units 3.
- exposing and developing the quantum dot film 30 is represented by setting a mask on the side of the quantum dot film 30 away from the substrate 1.
- the membrane includes a thin film retention area (the corresponding part of the quantum dot film 30 is not shielded) and a film removal area (the corresponding part of the quantum dot film 30 is shielded), and then the quantum dot film 30 and the film are retained
- the part corresponding to the area is exposed to solidify, and then the quantum dot film 30 is developed to remove the part of the quantum dot film 30 corresponding to the completely removed area.
- the remaining part of the quantum dot film 30 (by The cured part) is a plurality of quantum dot units 3.
- exposing and developing the quantum dot film 30 is expressed as: a mask is provided on the side of the quantum dot film 30 away from the substrate 1.
- the membrane plate includes a thin film retention area (to shield the corresponding part of the quantum dot film 30) and a thin film removal area (not to shield the corresponding part of the quantum dot film 30), and then the quantum dot film 30 and the film are removed Expose the corresponding part of the zone to degrade the part, and then develop the quantum dot film 30 to remove the part of the quantum dot film 30 that corresponds to the film removal zone, so that the quantum dot film 30 is not degraded , That is, multiple quantum dot units 3 are obtained.
- the developing material used is different.
- a post-baking process can also be used to shape the quantum dot unit 3 to stabilize the structure of the quantum dot unit 3.
- the preparation method of the display substrate further includes S250-S260.
- the reflective material when the reflective material is filled in the at least part of the opening K using an inkjet printing process, the reflective material may naturally fall into the at least part of the opening K to fill the at least part of the opening K.
- a reflective film may be formed on one side of the defining layer 2 (a part of the reflective film is located in the at least part of the opening K). Inside, the remaining part covers the defining layer 2 and the above-mentioned at least part of the opening K), and then the reflective film is patterned by a photolithography process, leaving the part of the reflective film in the above-mentioned at least part of the opening K. In this way, the reflective material is filled in at least a part of the opening K.
- a laser drilling process is used to remove a part of the reflective material, and the remaining part of the reflective material covers at least a part of the sidewalls of the opening K to form the reflective layer 5.
- a laser perforating process is used to form the reflective layer 5
- a laser perforating process is used to form at least a portion of the opening K in the defining film 20.
- the incident angle of the laser in the two laser perforating processes is It can be unchanged.
- the reflective layer 5 is formed in at least a part of the opening K, that is, the aperture of the at least part of the opening K is larger than the aperture of the reflective layer 5. Therefore, the laser spot diameter in S260 is smaller than the laser spot diameter in S220.
- the reflective layer 5 in the at least a part of the opening K may cover the sidewall of the at least a part of the opening K.
- the thickness of the reflective layer 3 may be 2 ⁇ m to 5 ⁇ m.
- the thickness L5 of the reflective layer 5 may be 2 ⁇ m, 3 ⁇ m, 4 ⁇ m, or 5 ⁇ m, for example.
- the reflective material may be, for example, ink or metal with higher reflectivity.
- the distribution of the plurality of openings K can be adjusted by referring to the correspondence between the sub-pixel regions S and the openings K in some of the above embodiments. Location, I won’t repeat it here.
- the display device 1000 includes the display substrate 100 provided in some of the above embodiments.
- the above-mentioned display device may be, for example, a liquid crystal display device, or, for example, may be an OLED display device.
- the display substrate 100 when the display substrate 100 is applied to a liquid crystal display device or an OLED display device, the display substrate may further include a black matrix 6, for example.
- the black matrix 6 may be arranged between every two adjacent openings K, between the black matrix 6 and the quantum dot unit 3, or between the black matrix and the light-transmitting unit 4 through a defining layer. 2 separated.
- the display substrate 100 included in the above-mentioned display device 1000 has the same structure and beneficial technical effects as the display substrate 100 provided in some of the above-mentioned embodiments, and will not be repeated here.
- the above-mentioned display device 200 is any product or component with a display function, such as electronic paper, mobile phone, tablet computer, television, display, notebook computer, digital photo frame, navigator, etc.
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Abstract
Description
Claims (17)
- 一种显示基板,包括:衬底;设置于所述衬底上的界定层,所述界定层中具有多个开口;以及,多个量子点单元,每个量子点单元设置在一个开口内,所述量子点单元的材料包括量子点材料;其中,设置有所述量子点单元的开口的轴线与垂直于所述衬底的方向之间呈锐角;所述开口被配置为,使入射至所述量子点单元内并射向所述开口的侧壁的光线,在所述开口内发生至少一次反射。
- 根据权利要求1所述的显示基板,其中,所述界定层的材料的折射率小于所述量子点单元中量子点材料的折射率。
- 根据权利要求1或2所述的显示基板,还包括:覆盖在所述开口的侧壁上的反射层;所述反射层包围所述量子点单元。
- 根据权利要求3所述的显示基板,其中,沿垂直于所述开口的轴线方向,所述反射层的厚度的范围为2μm~5μm。
- 根据权利要求1~4中任一项所述的显示基板,其中,所述界定层的材料包括反光材料。
- 根据权利要求1~5中任一项所述的显示基板,其中,所述开口的轴线与垂直于所述衬底的方向之间的角度的范围为15°~60°。
- 根据权利要求1~6中任一项所述的显示基板,其中,沿垂直于所述衬底的方向,所述量子点单元的厚度的范围为3μm~8μm。
- 根据权利要求1~7中任一项所述的显示基板,其中,设置有所述量子点单元的各开口的轴线相互平行,或大致相互平行。
- 根据权利要求1~8中任一项所述的显示基板,其中,所述多个量子点单元包括多个红色量子点单元和多个绿色量子点单元;所述多个开口包括多个第一开口和多个第二开口;每个红色量子点单元设置于一个第一开口内,每个绿色量子点单元设置于一个第二开口内。
- 根据权利要求9所述的显示基板,其中,所述多个量子点单元还包括多个蓝色量子点单元,所述多个开口还包括多个第三开口;每个蓝色量子点单元设置于一个第三开口内;或者,所述显示基板还包括多个透明的透光单元,所述多个开口还包括多个第四开口;每个透光单元设置在一个第四开口内;所述第四开口的轴线与所述 第一开口或所述第二开口的轴线平行或大致平行,或者,所述第四开口的轴线垂直或大致垂直于所述衬底。
- 根据权利要求1~10中任一项所述的显示基板,其中,所述显示基板具有多个子像素区域;每个子像素区域内设置有至少一个开口。
- 一种显示基板的制备方法,包括:在衬底上形成界定薄膜;图案化所述界定薄膜,在所述界定薄膜中形成多个开口,得到界定层;所述多个开口中的至少一部分开口的轴线与垂直于所述衬底的方向呈锐角;采用量子点材料形成多个量子点单元;每个量子点单元形成在所述至少一部分开口中的一个开口内;其中,形成有所述量子点单元的开口被配置为,使入射至所述量子点单元内并射向所述开口的侧壁的光线,在所述开口内发生至少一次反射。
- 根据权利要求12所述的显示基板的制备方法,其中,所述图案化所述界定薄膜,在所述界定薄膜中形成多个开口,包括:对所述界定薄膜进行固化处理;采用激光打孔工艺对经固化处理后的界定薄膜界定薄膜进行图案化,在所述经固化处理后的界定薄膜中形成多个开口。
- 根据权利要求12或13所述的显示基板的制备方法,其中,所述形成多个量子点单元,包括:采用喷墨打印工艺或涂覆工艺,将所述量子点材料填充在至少一部分开口内,形成所述多个量子点单元。
- 根据权利要求12或13所述的显示基板的制备方法,其中,所述量子点材料包括感光量子点材料;所述形成多个量子点单元,包括:在所述界定层的一侧形成量子点薄膜;所述量子点薄膜的一部分位于所述至少一部分开口内,其余部分覆盖所述界定层和所述至少一部分开口;采用掩膜板对所述量子点薄膜进行曝光和显影,去除所述量子点薄膜中覆盖所述界定层和所述至少一部分开口的部分,所述量子点薄膜中的保留在所述至少一部分开口内的部分,形成所述多个量子点单元。
- 根据权利要求12~15中任一项所述的显示基板的制备方法,其中,在所述形成多个量子点单元之前,所述制备方法还包括:采用喷墨打印工艺或光刻工艺,将反光材料填充在所述至少一部分开口中;采用激光打孔工艺,去除一部分反光材料,剩余部分反光材料覆盖在所述至少一部分开口的侧壁上,形成反射层。
- 一种显示面板,包括:如权利要求1~11中任一项所述的显示基板。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910430826.4A CN110098242B (zh) | 2019-05-22 | 2019-05-22 | 一种彩膜层及其制备方法、显示面板 |
CN201910430826.4 | 2019-05-22 |
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CN110568654A (zh) * | 2019-08-20 | 2019-12-13 | 苏州星烁纳米科技有限公司 | 量子点彩膜及显示装置 |
CN110962427A (zh) * | 2019-11-25 | 2020-04-07 | Tcl华星光电技术有限公司 | 量子点膜 |
CN110738940B (zh) * | 2019-11-28 | 2022-02-01 | 京东方科技集团股份有限公司 | 量子点膜、彩膜层和显示装置 |
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