WO2020193494A1 - Dispositif de chauffage destiné à un suscepteur d'un réacteur cvd - Google Patents

Dispositif de chauffage destiné à un suscepteur d'un réacteur cvd Download PDF

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Publication number
WO2020193494A1
WO2020193494A1 PCT/EP2020/058049 EP2020058049W WO2020193494A1 WO 2020193494 A1 WO2020193494 A1 WO 2020193494A1 EP 2020058049 W EP2020058049 W EP 2020058049W WO 2020193494 A1 WO2020193494 A1 WO 2020193494A1
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WO
WIPO (PCT)
Prior art keywords
heating
elements
legs
heating elements
another
Prior art date
Application number
PCT/EP2020/058049
Other languages
German (de)
English (en)
Inventor
Honggen JIANG
Fred Michael Andrew Crawley
Original Assignee
Aixtron Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron Se filed Critical Aixtron Se
Priority to CN202080036724.5A priority Critical patent/CN113840944B/zh
Publication of WO2020193494A1 publication Critical patent/WO2020193494A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/06—Heater elements structurally combined with coupling elements or holders
    • H05B3/08—Heater elements structurally combined with coupling elements or holders having electric connections specially adapted for high temperatures
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/145—Carbon only, e.g. carbon black, graphite
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H05B3/262—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an insulated metal plate

Definitions

  • the invention relates to a device for heating a susceptor of a CVD reactor with at least three, preferably identically designed, electrically conductive, each arranged in a common plane, meandering in the plane with the formation of side-by-side legs, each preferably on Heating elements of the same size, regularly distributed around a center and separated from one another by radial delimitation lines, have a first connection contact at a first end and a second connection contact at a second end and are connected to the first and second connection contacts with electrically conductive Stromver sub-elements.
  • the invention also relates to a CVD reactor with such heating elements and a heating element for a heating device.
  • Such a device is described in WO 2006/060134 A2.
  • a heating device is described there with several electrically conductive heating elements arranged in one plane.
  • the heating elements form a radially outer zone and a radially inner zone.
  • Arched outer heating elements surround the inner zone, in which a Schuele extends element, which has a plurality of arcuate legs.
  • the legs are connected to one another with 180 degree arcuate sections, so that the legs run next to one another in one plane.
  • Similar heating elements are also described in US 5,759,281, US 2016/0270150 A1 and DE 10 2013 113 049 A1.
  • WO 2004/089039 describes a heating device with a total of four heating surfaces which are separated from one another by radial boundary lines.
  • the four pie-like heating surfaces each have a heating element which has a radially outer connection contact and a radially inner connection contact, the radially inner connection contact being arranged in the vicinity of the center.
  • the heating element extends between the connection contacts with the formation of curved legs running next to one another.
  • the invention is based on the object of optimizing a generic heating element for or on a CVD reactor.
  • the legs consist of leg sections extending parallel to the boundary lines. At least the legs directly adjacent to the boundary lines preferably run in a straight line. As a result, two legs of different heating elements can run parallel to one another. It is provided in particular that at least some, preferably all of the legs consist of leg sections running parallel to the boundary lines. It can be provided that each leg has two leg sections.
  • the heating surfaces are of a uniform size and each extend over a sector around a center extend, so that each heating surface has two radial boundary lines standing at an angle of, for example, 120 degrees, 90 degrees or 72 degrees to one another and an arcuate boundary line extending on a circular arc line around the center.
  • Each heating surface thus has the shape of a gate ten Kirs.
  • At least the longest of the leg sections run parallel to the straight radial boundary lines.
  • Two leg sections running parallel to one another are preferably each connected to one another with a 180 degree arc section, with a gap running between the leg sections running parallel to one another. The gap width of this gap increases in the region of the gap ends, so that there are, for example, circular disk-shaped gap end surfaces.
  • Two leg sections forming a leg can also form an angle section in which the two leg sections are at a 120 degree angle, 90 degree angle or 72 degree angle to one another.
  • the inner leg area can form an angular recess so that the gap is enlarged here as well.
  • the heating elements are cut out of a plate, for example a graphite or metal plate, for example by laser cutting.
  • the material of the plate is electrically conductive and has a high temperature stability.
  • the heating device can be heated to over 2000 ° C. by passing an electric current through it.
  • Each heating element has a first connection contact and a second connection contact. A first connection contact is connected to the shortest of the legs.
  • a second connection contact is connected to the longest of the legs of a heating element and connects the respective end of the heating element to a current distribution element.
  • the power distribution elements can extend in a common plane and can be formed by plates which are spaced apart from one another by an insulation gap. The plates run in a plane parallel to the heating elements.
  • Isolation elements can be provided between the heating elements and the Stromver sub-elements.
  • the Isolationsele elements can be a plate made of a ceramic material and which is arranged between the heating elements and the power distribution elements.
  • the insulation elements are formed by lugs which only extend between the heating element and the current distribution element at certain points spaced apart from one another.
  • the three central heating elements in particular form a central heating zone which is surrounded by a radially outer heating zone.
  • the radially outer heating zone is preferably formed by arcuate second heating elements. These bogenför mig extending heating elements can form the circular arc-shaped boundary line of the heating surfaces. It is also provided that all heating elements of the central heating zone are connected electrically in parallel and / or that all heating elements of the radially outer heating zone are connected electrically in parallel.
  • the one or more heating elements forming the radially outer heating zone each have two legs. The legs run next to one another, so that a gap is formed between two leg sections connected to one another by an arched section.
  • the gap can widen at the end of the gap.
  • the gap can widen towards the end of the gap with the formation of an enlarged area, this enlarged area having a peripheral edge which is circular, triangular, trapezoidal or generally polygonal.
  • enlarged recesses are also provided in the region of the shortest leg.
  • the second heating elements have legs lying one above the other. The legs then have a congruent shape. The legs of the second heating element can thus extend over two levels. These levels can be offset from the common level in which the first heating elements extend.
  • the inner heating element can, for example, be offset from an upper leg of the outer heating element by the material thickness of the outer heating element in the direction of the lower outer heating element.
  • the Stromverteilele elements and / or insulation elements between the Stromverteilemia and the heating elements are arranged, can form a support element which carries the heating elements. It can be provided that the heating elements are connected to the support element exclusively by means of the connection contacts. But it is also provided that fastening elements, for example made of ceramic material, are used to fasten the heating elements to the support element.
  • a fastener may have a head attached to a reduced diameter shaft. The shaft can reach through an opening in the heating element and be attached to the support element. The head then preferably lies on an upwardly facing surface of the heating element.
  • fastening elements can be provided, which can also be arranged in the region of a gap between two heating elements.
  • a straight gap is formed between two leg sections adjoining a boundary line and two heating elements which are different from one another and which has a constant gap width over its entire length.
  • This gap preferably runs on a radial line - based on the center - of the heating device.
  • This gap is preferably only slightly larger than the gap between two legs belonging to a heating element. All gaps preferably have approximately the same gap width.
  • FIG. 1 shows a perspective illustration of a heating device 1 of a first exemplary embodiment
  • Fig. 2 shows a representation according to Figure 1, but with a breakout to
  • Clarification of the vertical structure of the heating device 1, 3 shows a top view of the heating device 1 with drawn radial boundary lines a, b, c,
  • FIG. 9 shows an illustration according to FIG. 8, but with an opening to illustrate the vertical structure of the heating device 1,
  • FIG. 14 shows a representation according to FIG. 1, but with hidden edges of a third exemplary embodiment, 15 shows an outbreak XV in FIG. 14,
  • FIG. 16 shows an outbreak XVI in FIG. 14,
  • FIG. 20 shows the section along the line XX-XX in FIG. 17,
  • FIG. 22 schematically shows a CVD reactor 10, in which a gas inlet element 11 is arranged in a gas-tight housing, in particular made of stainless steel, which has a gas outlet surface designed like a shower head, through the plurality of gas outlet openings of which a process gas, which is fed into the gas inlet element 11 can exit into a process chamber 14.
  • the process gas contains in particular a carrier gas, for example hydrogen, an organometallic component, in particular an organometallic compound of an element of main group III, for example trimethylgallium or trimethylindium and a hydride of an element of main group V, for example ammonia, arsenic or phosphine.
  • a carrier gas for example hydrogen
  • an organometallic component in particular an organometallic compound of an element of main group III, for example trimethylgallium or trimethylindium
  • a hydride of an element of main group V for example ammonia, arsenic or phosphine.
  • the bottom of the process chamber 14 is formed by a susceptor 12, which forms a plurality of storage pockets, each of which can accommodate a substrate 13 that is to be coated by means of the process gases fed in.
  • the susceptor 12 is heated from below with a heating device 1, which is an infrared radiator.
  • Figures 1 to 21 show various embodiments of heating devices 1 according to the invention, as they can be used in a CVD reactor 10.
  • the heating devices 1 of the embodiments 1 to 3 initially have the following common properties:
  • the heating device 1 is a multilayered, circular disk-shaped body. On its side facing upwards, the body forming the Bankein direction 1 has several heating elements 3 which are distributed over heating surfaces 2 of equal size. Starting from the center Z of the heating device 1, three radial lines a, b, c, each offset at an angle of 120 degrees, indicate the imaginary radial boundary lines of three heating surfaces 2. The heating surfaces 2 are delimited in the radially outward direction by three arc-shaped second heating elements 21 located radially on the outside. All Schuelemen te 21 of the heater 1 can be made of temperature-resistant material. It is provided in particular that the heating elements consist of metal or graphite.
  • Each heating surface 2 preferably has exactly one heating element 3 with a first end 3 'and a second end 3 ".
  • the first end 3' is connected to a connection contact 6 with one of several power distribution elements 15, 15 ', 16, 17
  • the second end 3 "of the heating element 3 has a second connection Closing contact 7, with which it is connected to another of the power distribution elements 15 to 17.
  • the second end 3 ′′ is formed by one end of a leg 4 of the heating element 3, the heating element 3 having a plurality of legs 4 running next to one another.
  • Two legs 4 running next to one another each have leg sections 5 which are at the same angle to one another which are also the two radial delimitation lines a, b, c to each other, which delimit the respective heating surface 2.
  • the second connection contact 7 is followed by a longest leg section 5 directly adjacent to the radial delimitation line a, b, c, which is called Aus Formation of an angle in an angular section 9 merges into a further leg section 5, which merges into a curved section 8.
  • the curved section 8 in turn merges into two leg sections 5, which are of the same design and form an angle section 9 between them.
  • the meandering legs 4 has a shortest leg, which the first end 3 'of the heating element a educates.
  • each heating surface 2 thus has a plurality of leg sections 5 which run parallel to one another and parallel to a radial boundary line a, b, c.
  • a fastening element 27 In the center Z there is a fastening element 27, as is also shown in FIG. 4, for example.
  • This fastening element 27 overlaps the three tips of the angle sections 9 of the heating elements 3 that are adjacent to one another there.
  • second heating elements 21 are provided which extend over the same sectors over which the first heating elements 3 also extend. In each case a second heating element 21 surrounds an inner heating element 3 in the shape of an arc.
  • These radially outer second heating elements 21 have two adjacent legs 22, the two ends 21 ', 21 "of the second heating element 21 and the leg 22 each having connection contacts 23, 24 with power distribution elements 15, 15 ', 16, 17 are connected.
  • FIGS 2 and 4 show the vertical structure of the heating device 1. At the top is the heating element 3 or the heating element 21. At the bottom there are power distribution elements 15, 15 ', 16, 17, which together form a circular plate separated by gaps. Between tween the power distribution elements 15, 15 ', 16, 17 and the heating elements 3, 21 extends an insulation element, which in the first embodiment is designed as an insulation plate 25 which has openings through which the connection contacts penetrate.
  • FIG. 4 shows a connection contact 7 which is connected to a power distribution element 15 via a contact sleeve 25, which can also perform the function of a spacer sleeve.
  • FIG. 4 also shows one of a plurality of fastening elements 27 with which the heating element 3 is connected to a power distribution element 15, 15 ', 16, 17.
  • the fastening element 27 is an insulating body, for example a ceramic body, which has a head which rests on the heating element 3, 21.
  • a shaft of the fasteners 27 reaches through the insulating element and is secured below the power distribution element 16 with a split pin.
  • Figure 5 shows an alternative design of a contact 24, with which a second heating element 21 is connected to a power distribution element 15 '.
  • FIG. 6 shows a fastening screw 28, which is located below a heating element 3 and with which the insulation element, here the insulation plate 25, is connected to the power distribution element 16.
  • the head of the fastening screw 28 is inserted in a recess.
  • a nut screwed onto the threaded shaft of the fastening screw 28 is supported on the underside of the power distribution element 15 '.
  • the first connection contacts 6 and the second connection contacts 7 of the first heating element 3 are located in the radially outer area of the respective heating surface 2.
  • the radially outer area, in which the connection contacts 6, 7 are located preferably has a radial extension, which is less than the width of one of the legs 5.
  • the lowest level of the heating device 1 is formed by an arrangement of a total of five power distribution elements 15, 15 ', 16, 17.
  • a power distribution element 16 extends over three 60 degree segments. Between the three segments of the power distribution element 16, power distribution element 15, 15 ', 16, 17 extend.
  • the power distribution elements have an outer bow-shaped power distribution element 17 which extends over more than 180 degrees around the center Z.
  • the power distribution element 16 is a common power distribution element to which heating elements are connected.
  • the inner heating elements 3 can be individually supplied with power via the power distribution elements 15, 15 ′.
  • the radially outer heating elements 21 can be supplied with power individually via the radially outer power distribution element 17. It is but it is preferably provided that all inner heating elements 3 are electrically connected in parallel and that all outer heating elements 21 are electrically connected in parallel. However, the outer and inner heating elements 3, 21 can be energized separately from one another.
  • the second heating elements 21 run side by side in a common plane in which the heating elements 3 also extend.
  • a narrow gap extends between the two legs 22 thus formed.
  • the second embodiment shown in Figures 8 to 13 has, as a special feature, alternatively configured insulation bodies.
  • the Iso lationsterrorism are formed here by lugs 29, 30, which have a cuboid Ge shape. These lugs 29, 30 extend between the Stromver sub-elements 15, 15 ', 16, 17 and the heating elements 3, 21.
  • the insulating bodies 29, 30 On their upward-facing surface, the insulating bodies 29, 30 have pins that are in the inter mediate spaces between adjacent legs 4, respectively 22 can intervene.
  • the second embodiment also differs from the first embodiment by angular recesses 20.
  • the leg sections 5 of the longest leg 4, which are directly adjacent to the radial loading lines a, b, c, have an angular portion 9, which has a recess on its inner angle. This recess is sits rectilinear edge edges and widens the gap 18 between two side-by-side leg sections in the angular section 9.
  • the third exemplary embodiment of the invention shown in FIGS. 14 to 21 has insulating bodies which correspond to those of the second exemplary embodiment, which is why reference is made to the relevant statements.
  • the legs 22 of the second heating elements 21 do not run in a common plane, but in planes that are offset from one another.
  • the plane in which the Schuelemen te 3 run is offset from the plane of the legs 22.
  • the legs 22 of the second heating element 21 run congruently one above the other.
  • a respective connection contact 23, 24 connects two legs 22 of the second heating element 21 to one another.
  • the spacer sleeves can be electrically conductive or electrically insulating.
  • the contact web 32 runs like a hook in this embodiment.
  • An approximately triangular angular recess 20 ′ is formed between a radially outer leg and the contact web 32.
  • the contact web 32 runs, so to speak, between two legs of the heating element 3.
  • the arcuate sections of the heating elements 3 lying in the radially outer region surround an approximately trapezoidal free space which forms the gap end 19.
  • FIG. 18 shows a contact web 31 which connects the connection contact 23 to a power distribution element 16.
  • the connection contact 23 is vertical Kal arranged above a power distribution element 17, but not connected to the power distribution element 17. Rather, the contact web 31 bridges a gap between the current distribution element 17 and an adjacent current distribution element 16 to which the contact web 31 is connected.
  • the contact web 31 has a Z-shape.
  • 19 shows a further, also a Z-shape having contact web 32, which connects a connection contact 6 of a first heating element 3, which is located above a power distribution element 16, with another power distribution element 15 ', the contact web 32 here too a gap between the two power distribution elements 16 and 15 'bridged.
  • the contact bars 31, 32 can be connected to them assigned power distribution elements with screws, not shown.
  • a device which is characterized in that the legs 4 consist of leg sections 5 running parallel to the boundary lines a, b, c.
  • each leg 4 has two leg sections 5 which each run parallel to one of the boundary lines a, b, c which are at an angular distance from one another.
  • the first and second connection contacts 6, 7 are in a radially outermost zone of the heating surface 2 and / or that the radially outermost zone of the heating surface 2 has two elements arranged one above the other.
  • two leg sections 5 running parallel next to one another are connected to one another with 180 degree arcuate sections 8 of the heating element 3.
  • leg sections 5 each extend between an arched section 8 and an angular section 9.
  • a device which is characterized in that the heating elements 3 are cut out from a flat blank, in particular graphite or a piece of metal.
  • a device which is characterized in that the first connection contact 6 is assigned to a shortest of the legs 4 and the second connection contact 7 is assigned to a longest of the legs 4 with two leg sections 5 of the same length.
  • a device which is characterized by a gap 18 between two leg sections 5 running parallel to one another, the gap 18 widening in the area of an arcuate section 8 to form an area-enlarged gap end 19, the area formed thereby having an edge that is circular arc-shaped, polygonal, in particular triangular or trapezoidal.
  • a device which is characterized in that the Winkelab section 9 of two V-shaped abutting leg portions 5 has an angular recess 20 on the inside, it being provided in particular that the angular recess 20 is only provided for the longest of the legs 4.
  • a device which is characterized in that the heating elements 3 of the heating surfaces 2 lie in a common plane and / or the second heating elements 21 are arranged in the same plane or offset thereto.
  • a device which is characterized in that the second heating element 21 has two arc-shaped legs 22 which run next to one another or congruently one above the other in a plane.
  • a device which is characterized by insulating elements 25, 29,

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Abstract

L'invention concerne un dispositif (1) permettant de chauffer un suscepteur d'un réacteur CVD (10). Trois surfaces de chauffage (2) de taille sensiblement identique et agencées autour d'un centre (Z) sont prévues. Les surfaces de chauffage (2) sont constituées par des éléments de chauffage (3) électroconducteurs s'étendant en forme de méandres dans un plan en formant des branches s'étendant l'un à côté de l'autre (4). Il est essentiel que les branches (4) présentent des sections de branche (5) parallèles à des lignes de délimitation (a, b, c) qui sont orientées le long des délimitations s'étendant en direction radiale entre deux surfaces de chauffage (2). Un agencement de zones de chauffage constitué ainsi est entouré par un second agencement de chauffage circulaire.
PCT/EP2020/058049 2019-03-27 2020-03-24 Dispositif de chauffage destiné à un suscepteur d'un réacteur cvd WO2020193494A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202080036724.5A CN113840944B (zh) 2019-03-27 2020-03-24 用于cvd反应器的基座的加热装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019107857.1 2019-03-27
DE102019107857.1A DE102019107857A1 (de) 2019-03-27 2019-03-27 Heizvorrichtung für einen Suszeptor eines CVD-Reaktors

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Publication Number Publication Date
WO2020193494A1 true WO2020193494A1 (fr) 2020-10-01

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CN (1) CN113840944B (fr)
DE (1) DE102019107857A1 (fr)
TW (1) TW202041707A (fr)
WO (1) WO2020193494A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2621859A (en) * 2022-08-24 2024-02-28 Dyson Technology Ltd Heating element, heating system & manufacturing method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020107552A1 (de) 2020-03-19 2021-09-23 AIXTRON Ltd. Heizvorrichtung für einen Suszeptor eines CVD-Reaktors
DE102020130339A1 (de) 2020-11-17 2022-05-19 Aixtron Se Heizeinrichtung für einen CVD-Reaktor

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