WO2020139042A3 - 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 - Google Patents

카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 Download PDF

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Publication number
WO2020139042A3
WO2020139042A3 PCT/KR2019/018657 KR2019018657W WO2020139042A3 WO 2020139042 A3 WO2020139042 A3 WO 2020139042A3 KR 2019018657 W KR2019018657 W KR 2019018657W WO 2020139042 A3 WO2020139042 A3 WO 2020139042A3
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WO
WIPO (PCT)
Prior art keywords
same
photopolymerization initiator
photoresist composition
ester derivative
derivative compound
Prior art date
Application number
PCT/KR2019/018657
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English (en)
French (fr)
Other versions
WO2020139042A2 (ko
Inventor
이원중
이득락
오천림
신승림
전근
안경룡
박활기
Original Assignee
주식회사 삼양사
한국화학연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 삼양사, 한국화학연구원 filed Critical 주식회사 삼양사
Priority to JP2021538079A priority Critical patent/JP7263522B2/ja
Priority to CN201980086476.2A priority patent/CN113227050B/zh
Publication of WO2020139042A2 publication Critical patent/WO2020139042A2/ko
Publication of WO2020139042A3 publication Critical patent/WO2020139042A3/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Optical Filters (AREA)

Abstract

본 발명은 하기 화학식 1로 표시되는 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물에 관한 것이다. [화학식 1] 상기 화학식 1에서, A 및 R 1 내지 R 3는 각각 발명의 상세한 설명에서 정의한 바와 같다.
PCT/KR2019/018657 2018-12-28 2019-12-27 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 WO2020139042A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021538079A JP7263522B2 (ja) 2018-12-28 2019-12-27 カルバゾールマルチβ－オキシムエステル誘導体化合物、それを含む光重合開始剤、及びフォトレジスト組成物
CN201980086476.2A CN113227050B (zh) 2018-12-28 2019-12-27 咔唑多β-肟酯衍生化合物以及包含该咔唑多β-肟酯衍生化合物的光聚合引发剂及光刻胶组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020180171703A KR102228630B1 (ko) 2018-12-28 2018-12-28 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물
KR10-2018-0171703 2018-12-28

Publications (2)

Publication Number Publication Date
WO2020139042A2 WO2020139042A2 (ko) 2020-07-02
WO2020139042A3 true WO2020139042A3 (ko) 2020-08-20

Family

ID=71126644

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2019/018657 WO2020139042A2 (ko) 2018-12-28 2019-12-27 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물

Country Status (5)

Country Link
JP (1) JP7263522B2 (ko)
KR (1) KR102228630B1 (ko)
CN (1) CN113227050B (ko)
TW (1) TWI723705B (ko)
WO (1) WO2020139042A2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202307570A (zh) 2021-08-13 2023-02-16 達興材料股份有限公司 感光性樹脂組成物及其用途、顯示裝置、半導體裝置
JP7267533B1 (ja) 2022-04-20 2023-05-02 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP7274078B1 (ja) 2022-04-20 2023-05-16 東洋インキＳｃホールディングス株式会社 感光性着色組成物、及びその用途
JP7267532B1 (ja) 2022-04-20 2023-05-02 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、画像表示装置、及び固体撮像素子
CN117348340A (zh) * 2022-06-24 2024-01-05 常州强力先端电子材料有限公司 负型感光性树脂组合物、固化膜及其制备方法、el元件和显示装置
CN117510396A (zh) * 2022-07-27 2024-02-06 常州强力电子新材料股份有限公司 肟酯光引发剂、其制备方法及应用

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JP2007052140A (ja) * 2005-08-16 2007-03-01 Jsr Corp 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
WO2007062963A1 (en) * 2005-12-01 2007-06-07 Ciba Holding Inc. Oxime ester photoinitiators
JP2010150215A (ja) * 2008-12-26 2010-07-08 Toyo Ink Mfg Co Ltd 光重合開始剤、重合性組成物、および重合物の製造方法
KR20120028384A (ko) * 2009-06-17 2012-03-22 토요잉크Sc홀딩스주식회사 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴

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TW200714651A (en) 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
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PL3451333T3 (pl) 2010-07-08 2023-01-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Koder wykorzystujący kasowanie aliasingu w przód
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JP2015138133A (ja) * 2014-01-22 2015-07-30 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
CN103833872B (zh) * 2014-03-18 2016-04-06 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用
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TWI635079B (zh) * 2016-07-08 2018-09-11 韓國化學研究院 高敏感肟酯光聚合起始劑以及包含該起始劑的光聚合組合物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005099488A (ja) * 2003-09-25 2005-04-14 Toyo Ink Mfg Co Ltd 感光性着色組成物およびカラーフィルタ
JP2007052140A (ja) * 2005-08-16 2007-03-01 Jsr Corp 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
WO2007062963A1 (en) * 2005-12-01 2007-06-07 Ciba Holding Inc. Oxime ester photoinitiators
JP2010150215A (ja) * 2008-12-26 2010-07-08 Toyo Ink Mfg Co Ltd 光重合開始剤、重合性組成物、および重合物の製造方法
KR20120028384A (ko) * 2009-06-17 2012-03-22 토요잉크Sc홀딩스주식회사 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴

Also Published As

Publication number Publication date
JP2022515524A (ja) 2022-02-18
JP7263522B2 (ja) 2023-04-24
KR102228630B1 (ko) 2021-03-16
CN113227050B (zh) 2024-03-12
WO2020139042A2 (ko) 2020-07-02
TWI723705B (zh) 2021-04-01
KR20200081810A (ko) 2020-07-08
TW202039432A (zh) 2020-11-01
CN113227050A (zh) 2021-08-06

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