WO2020064041A1 - Procédé de fabrication d'une couche de protection contre l'érosion et la corrosion présentant plusieurs épaisseurs et pièce comprenant une couche de protection correspondante - Google Patents
Procédé de fabrication d'une couche de protection contre l'érosion et la corrosion présentant plusieurs épaisseurs et pièce comprenant une couche de protection correspondante Download PDFInfo
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- WO2020064041A1 WO2020064041A1 PCT/DE2019/000252 DE2019000252W WO2020064041A1 WO 2020064041 A1 WO2020064041 A1 WO 2020064041A1 DE 2019000252 W DE2019000252 W DE 2019000252W WO 2020064041 A1 WO2020064041 A1 WO 2020064041A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
Definitions
- the present invention relates to a method for producing a multilayered erosion and corrosion protection layer with several metal layers (2, 4) and ceramic layers (3, 5), the metal and ceramic layers being deposited alternately and one on a base material (1)
- One of the metal layers is deposited on the substrate and the deposition of the metal layers and the ceramic layers takes place by physical vapor phase deposition (PVD physical vapor deposition).
- PVD physical vapor deposition physical vapor deposition
- the invention relates to a correspondingly manufactured component, in particular a component of a turbomachine, such as an aircraft engine.
- turbomachines such as stationary gas turbines or aircraft engines, in particular rotor blades, guide vanes or turbine linings (so-called shrouds) are exposed to a variety of influences during operation, which lead to components of this type having to have different properties.
- Such fluid mechanically loaded components are subject to increased wear as a result of oxidation, corrosion and erosion, so that appropriate wear protection coatings are required in order to extend the service life of the appropriate components to increase.
- Various proposals have already been made for this purpose, as described, for example, in document EP 2 398 936 B1.
- anti-wear coatings or anti-erosion coatings usually have multilayer coatings that consist of a sequence of layers of soft and hard materials.
- EP 3 246 430 A1 proposes a layer sequence of a metal layer, a metal alloy layer, a metal-ceramic gradient layer and a nanostructured ceramic layer, which can be deposited by cathode sputtering (sputtering) or by cathodic arc deposition (CatArc) .
- the metal layer can be made of a Cr layer
- the metal alloy layer can be made of a CrNi layer
- the metal-ceramic gradient layer can be made of Cr x Al lx N
- a correspondingly produced coating should have a high resistance to erosion attack or good mechanical properties against fatigue.
- a multi-layer erosion and corrosion protection layer which comprises a plurality of metal layers and a plurality of ceramic layers, the metal and ceramic layers alternatingly following one another and one of the metal layers being deposited on a base material of a substrate or component.
- the coating according to the invention can have a multiplicity of individual metal and ceramic layers which can be deposited alternately one above the other on the substrate or component, but starting with the metal layer.
- the metal layer and the ceramic layer are to be deposited by physical vapor phase deposition, in particular plasma-assisted physical vapor phase deposition, wherein first a plasma-assisted etching of the base material of the component to be coated takes place and then a Cr layer is deposited as a metal layer on the base material and subsequently immediately as a ceramic layer, a layer that predominantly has CrAlN.
- the etching of the base material by means of plasma-assisted etching ensures that the coating is well bonded and thus that the coating adheres well to a wide variety of base materials, such as iron alloy genes, nickel alloys, cobalt alloys or ceramic composite materials such as fiber-reinforced ceramics.
- the plasma-assisted etching can be carried out in a simple manner in the same processing chamber as the subsequent deposition of the coating, in particular by means of plasma-assisted physical vapor phase deposition, so that production is simplified.
- the one or more Cr layers and the one or more CrAlN or ceramic layers of the layer composite, which are alternately deposited offer excellent oxidation and corrosion resistance and erosion resistance.
- the deposition of the metal layer (s) and the ceramic layer (s) can be carried out immediately after the etching, so that the substrate or component no longer has to be exposed to the ambient atmosphere between the etching and the deposition of the coating, so that the surface cannot be oxidized.
- the erosion and corrosion protection layer can in particular be applied to a component which is formed from a base material which is selected from the group comprising Fe, Ni, Co alloys and ceramic composite materials and fiber-reinforced ceramics.
- the erosion and corrosion protection layer can be applied directly to the base material.
- the CrAlN ceramic layer can be embodied with embedded CrN nano-layers, the CrN-nano-layers being able to cause particle solidification of the ceramic layer and at the same time obstacles for can represent a crack progress.
- the plasma-assisted etching before the layers are applied can be carried out by sputtering the substrate, by ion etching, reactive ion etching or ion beam etching. It is particularly advantageous to have a coating system, such as a sputter system or to operate a system for arc evaporation in such a way that cathode sputtering of the substrate or of the base material of the component to be coated can take place for the etching. This can be achieved, for example, by applying a corresponding bias voltage with a negative potential to the substrate, so that positively charged ions from the ignited plasma in the processing chamber are accelerated onto the substrate to be coated and material is removed there.
- the coating of the substrate can be started immediately in a corresponding processing system by lowering the bias voltage and sputtering appropriate targets, ie a Cr target for the coating with a Cr layer and / or a CrAl target for the deposition of a CrAlN layer.
- a Cr target for the production of a Cr layer, a Cr target can be used which consists of technically pure chromium and in particular has at least 95% by weight of chromium, preferably at least 99% by weight of chromium, so that a corresponding Cr layer is formed, in which the proportion of other constituents is less than or equal to 5% by weight or less than or equal to 1% by weight.
- the metal layer can also be designed as a Cr alloy layer with a predominant proportion of chromium, for example a proportion of more than 50% by weight of chromium.
- the ceramic layer can be designed as a CrAlN layer, a CrAl target being able to be sputtered by cathode sputtering or arc evaporation and, at the same time, nitrogen can be let into the processing chamber, so that a corresponding nitride is formed.
- the CrAl target can have a proportion of 64 to 67% by weight of chromium and 33 to 36% by weight of aluminum.
- the CrAlN layer can have a chemical composition with a Cr content of 30 to 34 at.%, An Al content of 18 to 22 at.% And the remainder N, the chemical composition being determined in particular by energy-dispersive X-ray spectroscopy (EDX) .
- EDX energy-dispersive X-ray spectroscopy
- the increased Cr content compared to a CrAl target used can result from introduced nano-layers of CrN.
- the CrN nanolayers in the CrAlN layer can be deposited by sputtering or evaporating the Cr target next to the Cr Al target, wherein the Cr target can be sputtered or evaporated continuously or only temporarily or intermittently.
- CrN nanolayers can form, which are embedded in the ceramic layer as a continuous layer along the component or substrate surface or as isolated nanoparticles, with layer thicknesses or particle sizes in the CrN nanolayer layers in the direction of the layer thickness, i.e. transversely to the component surface , from 1 to 100 nm, preferably 5 to 50 nm.
- the individual layers that is to say the metal layer (s) and the ceramic layer (s), can be continuously deposited in succession or a pause can be inserted in which the processing chamber can be cleaned by evacuation in order to mix the composition of the individual Avoid layers as much as possible.
- the one or more metal layers can each have a layer thickness of 10 nm to 2 pm and the ceramic layers can each have a layer thickness of 200 nm to 20 pm.
- the total layer thickness of the erosion and corrosion protection protective layer can be 2 pm to 100 pm.
- the individual metal layers and ceramic layers can each be deposited in the same way or in a different way, which concerns both the formation of the individual layers and the deposition process.
- FIG. 1 shows a cross section through part of a component with a first embodiment of a coating according to the invention and in FIG. 2 shows a cross section through part of a component with a second embodiment of a coating according to the invention.
- FIG. 1 shows in a purely schematic representation a part of a component on which a coating according to the invention is applied.
- the component has a base material 1 on which a Cr layer 2 is deposited, a ceramic layer 3 made of CrAlN being subsequently formed on the Cr layer 2 in the direction of the outside of the component.
- the partial coating of the metal layer 2 and the ceramic layer 3 is applied several times, so that a second metal layer 4 in the form of a Cr layer and a second ceramic layer 5 made of CrAlN are arranged above the ceramic layer 3.
- FIG. 2 shows a further exemplary embodiment of a coating according to the invention, in which a sequence of alternately arranged metal layers 2, 4 and ceramic layers 3, 5 is again provided on a base material 1.
- a sequence of alternately arranged metal layers 2, 4 and ceramic layers 3, 5 is again provided on a base material 1.
- the metal layers 2, 4 are formed from Cr layers, while the ceramic layer 3, 5 is formed by CrAlN layers.
- 3.5 CrN nanolayers 6 are embedded in the CrAlN layers in the coating in FIG.
- the CrN nano-layers 6 can be present as continuous partial layers along or parallel to the surface of the corresponding component or as individual nanoparticles, so that the CrN-nano-layers 6 are not continuously provided as a layer along or parallel to the surface of the component.
- the corresponding layers can be applied to the substrate to be coated in a plasma-assisted PVD system, for example in a system for cathodic arc evaporation (CatARC) with an additional sputtering function.
- CatARC cathodic arc evaporation
- the method for producing the coating according to the invention first provides for cleaning the base material 1 or the surface of the substrate or component on which the coating is to be applied.
- the cleaning can be done by ultrasound and / or by blowing with inert gases such as argon.
- the surface of the base material to be coated is then subjected to an etching process, in particular an ion etching process.
- the etching can be carried out by plasma-assisted etching, the substrate to which the coating is to be applied, for example, being used as a target for cathode sputtering.
- the etching of the base material 1 can be carried out by ion etching, reactive ion etching or ion beam etching.
- a so-called bias voltage in the range from 400 to 1000 V with negative potential can be applied to the component or substrate with the base material 1 to be coated, so that when the plasma is ignited in the processing chamber, ions of the plasma are accelerated onto the substrate and remove material there when hitting (sputtering).
- one or more targets located in the processing chamber for the subsequent coating can be given a low negative potential in order to avoid unwanted coating of the targets during the etching and to provide further metal ions for the etching process .
- a current of 50 to 200 A can be preselected on a chrome target, which can be provided for the subsequent coating with a Cr layer in the processing chamber, so that a negative Voltage in the range of 10 to 40 V, in particular 13 to 25 V are set.
- a CrAl target which is used for the subsequent coating of a CrAlN layer
- a negative voltage in the range from 0 to 50 V, in particular 13 to 25 V can be applied, so that a current intensity of 50 at the CrAl target up to 31000 A, preferably 110 to 8200 A, so that a negative voltage in the range of 0 to 50 V, in particular 13 to 25 V, arises at the CrAl target.
- the current flow at the chrome target can be in the range from 90 to 185 A, in particular 110 to 150 A can be selected, while a current flow of 15 to 40 A, in particular 5 to 15 A, can be set on the substrate to be coated. This is influenced by the surface of the substrate and can vary accordingly.
- an argon can - atmosphere less than or equal to 0.5 at a pressure * are 10 4 to 5 10 2 mbar is set especially in the range of 0.5 * l0 3 mbar, with a working gonzul of 5 to 200 sccm (Standard cubic centimeters per minute), in particular 10 to 200 sccm can be set in the processing chamber.
- the temperature in the processing chamber can be set between 200 ° C and 500 ° C.
- the deposition of the metal layer 2, that is to say the Cr layer can begin immediately.
- the bias voltage on the substrate to be coated can be reduced to 0 to 500 V, in particular 20 to 100 V, for example by stepwise lowering in steps of 50 to 100 V.
- a current flow on the chrome in the range of 90 can occur at the chrome target up to 250 A, in particular 150 to 220 A, so that a negative voltage in the range of 10 to 50 V, in particular 13 to 25 V, results at the chrome target, while the current flow on the substrate decreases to 5 with the reduced bias voltage up to 40 A, in particular 5 to 15 A.
- an argon atmosphere with a pressure of 5 * 10 2 mbar, in particular in the range from 1 * 10 3 mbar to 5 * 10 2 mbar, with a flow rate of the argon gas in the range from 5 to 200 sccm, in particular 10 to 100 sccm can be set.
- the temperature can be selected in the range from 200 ° C to 500 ° C, in particular 250 ° C to 500 ° C.
- a CrAlN layer 3 is deposited, the processing chamber being able to be evacuated between the deposition of the two layers, for example for a period of 3 h, in order to prevent excessive mixing in the transition region of the Layer compositions takes place.
- the change from the deposition of one layer to the other layer to take place continuously, the deposition conditions being changed continuously or stepwise or one target is switched to the other target, which are advantageously located in the same processing chamber.
- the bias voltage on the substrate is set to a negative voltage of 10 to 100 V, in particular 15 to 40 V and a current flow of 5 to 100 A, preferably 5 to 50 A, while a current of at the CrAl target 10 to 800 A, in particular 150 to 800 A, and a negative potential of 10 to 50 V, in particular 13 to 25 V, are set.
- nitrogen is introduced into the processing chamber for the formation of nitrides.
- the nitrogen can be supplied at an inflow rate of 200 to 1000 sccm, in particular 400 to 800 sccm, while the argon supply is set to 0 to 300 sccm, in particular 0 to 100 sccm.
- the pressure in the processing chamber is in turn selected in the range from less than or equal to 5 * 10 1 mbar, in particular in the range from 1 * 10 3 mbar to 5 * 10 2 mbar, the temperature in the range from 200 ° C. to 500 ° C. is in particular 250 ° to 500 ° C.
- a Cr target can also be sputtered, so that there is a so-called CrN nano-layer, ie the formation of Cr nano-layers 6 in the CrAlN layer 3.
- the Cr target can be operated continuously or only intermittently or intermittently, a current flow at the Cr target of 0 to 250 A, in particular 0 to 200 A, and a negative voltage in the range of 0 to 50 V, in particular 13 to 25 V.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
La présente invention concerne un procédé de fabrication d'une couche de protection contre l'érosion et la corrosion présentant plusieurs couches comprenant plusieurs couches métalliques (2, 4) et couches céramiques (3, 5), les couches métalliques et céramiques étant à tour de rôle déposées et l'une des couches métalliques étant déposée sur un métal de base (1) d'un substrat et le dépôt des couches métalliques et des couches céramiques étant réalisé par dépôt physique en phase vapeur. Une attaque du métal de base (1) assistée par plasma est d'abord réalisée puis, une couche de Cr, en tant que couche métallique (2, 4) et ensuite une couche présentant principalement du CrAlN, en tant que couche céramique (3, 5), sont déposées et la couche céramique (3, 5) sous forme de couche de CrAlN comprenant des microcouches (6) de CrN incorporées, est déposée en ajoutant de l'azote et en utilisant une cible CrAl et une cible Cr, et/ou le métal de base est choisi dans le groupe comprenant des alliages de Fe, Ni et Co et des composites céramiques ainsi que des céramiques renforcées de fibres. L'invention concerne en outre une pièce revêtue de manière correspondante.
Priority Applications (1)
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DE112019004858.9T DE112019004858A5 (de) | 2018-09-27 | 2019-09-25 | Verfahren zur herstellung einer mehrlagigen erosions - und korrosionsschutzschicht und bauteil mit einer entsprechenden schutzschicht |
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DE102018216658.7 | 2018-09-27 | ||
DE102018216658.7A DE102018216658A1 (de) | 2018-09-27 | 2018-09-27 | Verfahren zur Herstellung einer mehrlagigen Erosions- und Korrosionsschutzschicht und Bauteil mit einer entsprechenden Schutzschicht |
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WO2020064041A1 true WO2020064041A1 (fr) | 2020-04-02 |
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PCT/DE2019/000252 WO2020064041A1 (fr) | 2018-09-27 | 2019-09-25 | Procédé de fabrication d'une couche de protection contre l'érosion et la corrosion présentant plusieurs épaisseurs et pièce comprenant une couche de protection correspondante |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN114411095A (zh) * | 2021-11-11 | 2022-04-29 | 国网内蒙古东部电力有限公司电力科学研究院 | 螺栓表面复合抗磨蚀防护涂层及其制备方法 |
EP4350035A1 (fr) * | 2022-10-04 | 2024-04-10 | MAHLE International GmbH | Élément coulissant et son utilisation |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111471969B (zh) * | 2020-03-19 | 2021-07-02 | 北京科技大学 | 一种用于在高温下抗氧化的Cr/CrN/CrAlN梯度涂层及制备方法 |
CN113399683A (zh) * | 2021-06-11 | 2021-09-17 | 上海应用技术大学 | 一种SLM成型18Ni300模具钢注塑模具表面强化方法 |
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WO2004059030A2 (fr) | 2003-04-28 | 2004-07-15 | Unaxis Balzers Ag | Piece a usiner comportant une couche de matiere dure contenant alcr et procede de fabrication associe |
DE102007027335A1 (de) * | 2007-06-14 | 2008-12-18 | Mtu Aero Engines Gmbh | Verschleißschutzbeschichtung und Bauteil mit einer Verschleißschutzbeschichtung |
DE102009010110A1 (de) * | 2009-02-21 | 2010-09-02 | Mtu Aero Engines Gmbh | Erosionsschutz-Beschichtungssystem für Gasturbinenbauteile |
DE102009013129A1 (de) | 2009-03-13 | 2010-09-16 | Mtu Aero Engines Gmbh | Kunststoffbauteil mit Erosionsschutzschicht für Anwendungen mit erosiver Beanspruchung |
EP3246430A1 (fr) | 2016-05-20 | 2017-11-22 | MTU Aero Engines GmbH | Procédé de fabrication d'aubes ou de système d'aubes d'une turbomachine comprenant des couches de protection contre l'érosion et composant ainsi fabriqué |
-
2018
- 2018-09-27 DE DE102018216658.7A patent/DE102018216658A1/de not_active Withdrawn
-
2019
- 2019-09-25 WO PCT/DE2019/000252 patent/WO2020064041A1/fr active Application Filing
- 2019-09-25 DE DE112019004858.9T patent/DE112019004858A5/de active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2004059030A2 (fr) | 2003-04-28 | 2004-07-15 | Unaxis Balzers Ag | Piece a usiner comportant une couche de matiere dure contenant alcr et procede de fabrication associe |
DE102007027335A1 (de) * | 2007-06-14 | 2008-12-18 | Mtu Aero Engines Gmbh | Verschleißschutzbeschichtung und Bauteil mit einer Verschleißschutzbeschichtung |
DE102009010110A1 (de) * | 2009-02-21 | 2010-09-02 | Mtu Aero Engines Gmbh | Erosionsschutz-Beschichtungssystem für Gasturbinenbauteile |
EP2398936B1 (fr) | 2009-02-21 | 2018-03-14 | MTU Aero Engines GmbH | Une système de revêtement résistante à l'érosion pour eléments de turbine |
DE102009013129A1 (de) | 2009-03-13 | 2010-09-16 | Mtu Aero Engines Gmbh | Kunststoffbauteil mit Erosionsschutzschicht für Anwendungen mit erosiver Beanspruchung |
EP3246430A1 (fr) | 2016-05-20 | 2017-11-22 | MTU Aero Engines GmbH | Procédé de fabrication d'aubes ou de système d'aubes d'une turbomachine comprenant des couches de protection contre l'érosion et composant ainsi fabriqué |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114411095A (zh) * | 2021-11-11 | 2022-04-29 | 国网内蒙古东部电力有限公司电力科学研究院 | 螺栓表面复合抗磨蚀防护涂层及其制备方法 |
CN114411095B (zh) * | 2021-11-11 | 2023-08-15 | 国网内蒙古东部电力有限公司电力科学研究院 | 螺栓表面复合抗磨蚀防护涂层及其制备方法 |
EP4350035A1 (fr) * | 2022-10-04 | 2024-04-10 | MAHLE International GmbH | Élément coulissant et son utilisation |
Also Published As
Publication number | Publication date |
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DE112019004858A5 (de) | 2021-08-26 |
DE102018216658A1 (de) | 2020-04-02 |
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