WO2020040082A1 - Co-BASED ALLOY FOR USE IN SOFT MAGNETIC LAYER OF MAGNETIC RECORDING MEDIUM - Google Patents

Co-BASED ALLOY FOR USE IN SOFT MAGNETIC LAYER OF MAGNETIC RECORDING MEDIUM Download PDF

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Publication number
WO2020040082A1
WO2020040082A1 PCT/JP2019/032255 JP2019032255W WO2020040082A1 WO 2020040082 A1 WO2020040082 A1 WO 2020040082A1 JP 2019032255 W JP2019032255 W JP 2019032255W WO 2020040082 A1 WO2020040082 A1 WO 2020040082A1
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Prior art keywords
soft magnetic
magnetic layer
based alloy
recording medium
magnetic recording
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PCT/JP2019/032255
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French (fr)
Japanese (ja)
Inventor
優衣 田中
夢樹 新村
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山陽特殊製鋼株式会社
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Priority to SG11202101584XA priority Critical patent/SG11202101584XA/en
Priority to CN201980054140.8A priority patent/CN112585285A/en
Publication of WO2020040082A1 publication Critical patent/WO2020040082A1/en

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Definitions

  • the present invention relates to a soft magnetic layer of a magnetic recording medium. Specifically, the present invention relates to a Co-based alloy suitable for a soft magnetic layer of a magnetic recording medium.
  • Perpendicular magnetic recording medium a medium adopting a perpendicular magnetic recording method (perpendicular magnetic recording medium) instead of this medium is becoming widespread.
  • the easy axis of magnetization is oriented perpendicular to the medium surface in the magnetic film.
  • Perpendicular magnetic recording media are suitable for high recording densities.
  • the perpendicular magnetic recording medium has a magnetic recording layer and a soft magnetic layer.
  • the perpendicular magnetic recording medium further has a seed layer, a base film layer, and the like between the magnetic recording layer and the soft magnetic layer.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2006-294090 discloses a soft magnetic layer whose material is an Fe—Co alloy.
  • Patent Document 2 Japanese Patent Application Laid-Open No. 2008-299905 discloses a soft magnetic layer that is a Co-based alloy containing an amorphization promoting element such as Zr, Hf, Nb, and Ta.
  • the saturation magnetic flux density of this Co-based alloy is large. A large saturation magnetic flux density can contribute to a high recording density.
  • Patent Document 3 Japanese Patent Application Laid-Open No. 2011-68985 discloses a soft magnetic layer whose material is a Co-based alloy containing Y and containing Ta or Nb. The saturation magnetic flux density of this Co-based alloy is large. A large saturation magnetic flux density can contribute to a high recording density.
  • Patent Document 4 Japanese Patent Application Laid-Open No. 2011-99166 discloses a soft magnetic layer whose material is a Co-based alloy containing Zr, Hf, Y, Ta, Nb and the like. The saturation magnetic flux density of this Co-based alloy is large. A large saturation magnetic flux density can contribute to a high recording density.
  • a large saturation magnetic flux density is the cause of “writing blur”.
  • the “writing blur” is a phenomenon in which, in a state in which the alloy is magnetized by the writing head, the surrounding area is magnetically affected more than necessary. In a magnetic recording medium in which “writing blur” occurs, the space required for writing per unit recording information is large. “Writing blur” impairs the high recording density of the magnetic recording medium.
  • Patent Document 5 JP-A-2015-144032 discloses a soft magnetic layer having a saturation magnetic flux density of 0.5T-1.1T.
  • Patent Document 6 Japanese Patent Application Laid-Open No. 2016-84538 discloses a soft magnetic layer having a saturation magnetic flux density of 0.34T-1.18T.
  • An object of the present invention is to provide a Co-based alloy capable of obtaining a target having excellent toughness and obtaining a soft magnetic layer having a small saturation magnetic flux density.
  • the present invention provides a Co-based alloy for a soft magnetic layer of a magnetic recording medium.
  • the Co-based alloy for a soft magnetic layer of the magnetic recording medium according to the present invention includes one or more elements XA selected from the group consisting of Nb, Mo, Ta, and W: 11 at% to 25 at%, and One or more elements XB selected from the group consisting of V, Cr, Mn, Ni, Cu and Zn: contain 0.4 at% or more and 10 at% or less.
  • the balance is Co, Fe and inevitable impurities, and the total content of the elements XA and XB is less than 30 at%.
  • the present invention provides a sputtering target for a soft magnetic layer of a magnetic recording medium.
  • the material of the sputtering target for the soft magnetic layer of the magnetic recording medium according to the present invention comprises the Co-based alloy according to the present invention. That is, the material of the sputtering target for the soft magnetic layer of the magnetic recording medium according to the present invention is a Co-based alloy, and the Co-based alloy is one or two selected from the group consisting of Nb, Mo, Ta and W.
  • At least one kind of element XA 11 to 25 at%, and one or more kinds of element XB selected from the group consisting of V, Cr, Mn, Ni, Cu and Zn: 0.4 at% to 10 at% Contains: In this alloy, the balance is Co, Fe and inevitable impurities, and the total content of the elements XA and XB is less than 30 at%.
  • the present invention provides a magnetic recording medium.
  • the magnetic recording medium according to the present invention has a soft magnetic layer, and the soft magnetic layer contains the Co-based alloy according to the present invention.
  • the soft magnetic layer in the magnetic recording medium according to the present invention is obtained by sputtering using a target whose material is a Co-based alloy, and the Co-based alloy is selected from the group consisting of Nb, Mo, Ta and W.
  • a target having excellent crack resistance can be obtained from the Co-based alloy according to the present invention. Further, a magnetic recording medium in which “writing blur” is unlikely to occur can be obtained from the Co-based alloy according to the present invention.
  • the Co-based alloy for a soft magnetic layer of a magnetic recording medium according to the present invention is suitable for a sputtering target.
  • the composition of this Co-based alloy is Element XA: 11 at% or more and 25 at% or less, Element XB: 0.4 at% or more and 10 at% or less, and The balance: Co, Fe and unavoidable impurities.
  • [Base element] Elements that are the bases of the Co-based alloy are Fe and Co.
  • the soft magnetic layer containing Fe and Co exhibits sufficient magnetism. With this soft magnetic layer, the magnetization of the magnetic recording layer is stabilized.
  • the ratio between the Fe content (at%) and the Co content (at%) is preferably from 10:90 to 90:10.
  • the saturation magnetic flux density can be suppressed.
  • the ratio is particularly preferably equal to or greater than 20:80.
  • a soft magnetic layer made of an alloy having this ratio of 90:10 or less can contribute to a high recording density of a magnetic recording medium. In this respect, the ratio is particularly preferably equal to or less than 80:20.
  • Element XA is selected from group A consisting of Nb, Mo, Ta and W. As the element XA, one element may be selected from the group A, or two or more elements may be selected. The element XA can contribute to the amorphous property of the soft magnetic layer. Element XA can further contribute to suppressing the saturation magnetic flux density. From these viewpoints, the content of the element XA in the Co-based alloy is preferably at least 11 at%, more preferably at least 13 at%, and particularly preferably at least 15 at%. Element XA forms an intermetallic compound with Fe or Co. This intermetallic compound is brittle. A target obtained from an alloy containing this intermetallic compound is easily cracked during sputtering.
  • the content of the element XA is preferably equal to or less than 25 at%, more preferably equal to or less than 23 at%, and particularly preferably equal to or less than 21 at%.
  • the “content of the element XA” means the total content of the two or more elements.
  • Element XB is selected from group B consisting of V, Cr, Mn, Ni, Cu and Zn. As the element XB, one element may be selected from the group B, or two or more elements may be selected. Element XB can suppress the saturation magnetic flux density. Element XB is a fourth period element. On the other hand, bases Fe and Co are also the fourth period elements. Therefore, even if the element XB is added, almost no intermetallic compound of Fe and the element XB is generated, and almost no intermetallic compound of Co and the element XB is generated. Element XB hardly embrittles the target. By adding the element XB, both a low saturation magnetic flux density and a high-strength target can be achieved.
  • the content of the element XB in the Co-based alloy is preferably 0.4% or more, more preferably 1 at% or more, and particularly preferably 3 at% or more. From the viewpoint that the saturation magnetic flux density is not excessively small, the content of the element XB is preferably equal to or less than 10 at%.
  • the “content of element XB” means the total content of the two or more elements.
  • Total content of element XA and element XB the total of the content of the element XA and the content of the element XB is preferably less than 30 at%, more preferably 28 at% or less, and particularly preferably 26 at% or less.
  • the powder comprising the alloy according to the present invention can be obtained by atomization.
  • Preferred atomizing is gas atomizing. If necessary, the powder is classified (for example, particles having a particle size of 500 ⁇ m or less are extracted).
  • the powder after classification is filled in a carbon steel can.
  • the can is evacuated and sealed to obtain a billet.
  • the billet is subjected to HIP molding (hot isostatic pressing).
  • the preferable pressure of the HIP molding is 50 MPa or more and 300 MPa or less, and the preferable sintering temperature is 800 ° C. or more and 1350 ° C. or less.
  • a molded article is obtained by HIP molding.
  • the formed body is processed to obtain a target. By subjecting this target to sputtering, a soft magnetic layer having the same components as those of the target can be obtained. This soft magnetic layer is incorporated in a magnetic recording medium.
  • the soft magnetic layer is formed by sputtering a target having the same component as the component.
  • This soft magnetic layer is obtained by rapid cooling and solidification. Since a great deal of labor is required for forming the soft magnetic layer, a test piece obtained by a single roll method is used in the following evaluation.
  • the single-roll method has a quenching and solidifying step as in the case of sputtering. By employing the single roll method, the evaluation of the soft magnetic layer that will be obtained by sputtering can be easily performed.
  • Hot water nozzle diameter 1mm Atmospheric pressure: 61 kPa Spray differential pressure: 69 kPa Roll material: copper Roll diameter: 300 mm Roll rotation speed: 3000 rpm Gap between roll and tapping nozzle: 0.3mm
  • the balance of the alloys described in each table is an unavoidable impurity.
  • the conditions for HIP molding are as follows. Temperature: 1000 ° C Pressure: 120MPa Holding time: 2 hours From the obtained molded body, a test piece having a length of 20 mm, a width of 1.8 mm, and a height of 1.8 mm was collected. This test piece was subjected to a three-point bending test. The transverse rupture strength was calculated from the load when the test piece was broken or bent. Based on the transverse rupture strength, a rating was made according to the following criteria. The results are shown in Tables 1 and 2 below. A: Bending force is 600 MPa or more B: Bending force is 450 MPa or more and less than 600 MPa C: Bending force is less than 450 MPa
  • the Co-based alloy described above is suitable for soft magnetic layers of various magnetic recording media.

Abstract

The present invention addresses the problem of providing a Co-based alloy with which it is possible to produce a target exhibiting excellent toughness and to obtain a soft magnetic layer having a low saturation magnetic flux density. With a view to solving said problem, the present invention provides a Co-based alloy for use in a soft magnetic layer of a magnetic recording medium, said alloy comprising 11-25 at% of one or more types of element XA selected from the group consisting of Nb, Mo, Ta, and W, 0.4-10 at% of one or more types of element XB selected from the group consisting of V, Cr, Mn, Ni, Cu, and Zn, with the remainder being Co, Fe, and unavoidable impurities, wherein the total content of the element XA and the element XB is less than 30 at%.

Description

磁気記録媒体の軟磁性層用Ｃｏ系合金Co-based alloy for soft magnetic layer of magnetic recording medium
　本発明は、磁気記録媒体の軟磁性層に関する。詳細には、本発明は、磁気記録媒体の軟磁性層に適したＣｏ系合金に関する。 << The present invention relates to a soft magnetic layer of a magnetic recording medium. Specifically, the present invention relates to a Co-based alloy suitable for a soft magnetic layer of a magnetic recording medium.
　磁気記録媒体にとって、大容量は重要である。大容量の達成には、高記録密度化が必要である。 大 Large capacity is important for magnetic recording media. To achieve a large capacity, high recording density is required.
　面内磁気記録方式が採用された媒体が、普及している。近年は、この媒体に代えて、垂直磁気記録方式が採用された媒体（垂直磁気記録媒体）が普及しつつある。垂直磁気記録媒体では、磁化容易軸は、磁性膜中の媒体面に対して垂直方向に配向する。垂直磁気記録媒体は、高記録密度に適している。 媒体 Media adopting the in-plane magnetic recording system has become widespread. In recent years, a medium adopting a perpendicular magnetic recording method (perpendicular magnetic recording medium) instead of this medium is becoming widespread. In a perpendicular magnetic recording medium, the easy axis of magnetization is oriented perpendicular to the medium surface in the magnetic film. Perpendicular magnetic recording media are suitable for high recording densities.
　垂直磁気記録媒体は、磁気記録層と軟磁性層とを有している。垂直磁気記録媒体はさらに、磁気記録層と軟磁性層との間に、シード層、下地膜層等を有している。 The perpendicular magnetic recording medium has a magnetic recording layer and a soft magnetic layer. The perpendicular magnetic recording medium further has a seed layer, a base film layer, and the like between the magnetic recording layer and the soft magnetic layer.
　軟磁性層は、記録時にヘッドから発生する磁束の広がりを防止して、垂直方向の磁界を確保する。特許文献１（特開２００６－２９４０９０公報）には、その材質がＦｅ－Ｃｏ系合金である軟磁性層が開示されている。 (4) The soft magnetic layer prevents a magnetic flux generated from the head during recording from spreading, and secures a vertical magnetic field. Patent Document 1 (Japanese Patent Application Laid-Open No. 2006-294090) discloses a soft magnetic layer whose material is an Fe—Co alloy.
　特許文献２（特開２００８－２９９９０５公報）には、Ｚｒ、Ｈｆ、Ｎｂ、Ｔａ等の非晶質化促進元素を含有するＣｏ系合金である軟磁性層が、開示されている。このＣｏ系合金の飽和磁束密度は、大きい。大きな飽和磁束密度は、高記録密度に寄与しうる。 Patent Document 2 (Japanese Patent Application Laid-Open No. 2008-299905) discloses a soft magnetic layer that is a Co-based alloy containing an amorphization promoting element such as Zr, Hf, Nb, and Ta. The saturation magnetic flux density of this Co-based alloy is large. A large saturation magnetic flux density can contribute to a high recording density.
　特許文献３（特開２０１１－６８９８５公報）には、その材質が、Ｙを含有しかつＴａ又はＮｂを含有するＣｏ系合金である、軟磁性層が開示されている。このＣｏ系合金の飽和磁束密度は、大きい。大きな飽和磁束密度は、高記録密度に寄与しうる。 Patent Document 3 (Japanese Patent Application Laid-Open No. 2011-68985) discloses a soft magnetic layer whose material is a Co-based alloy containing Y and containing Ta or Nb. The saturation magnetic flux density of this Co-based alloy is large. A large saturation magnetic flux density can contribute to a high recording density.
　特許文献４（特開２０１１－９９１６６公報）には、その材質がＺｒ、Ｈｆ、Ｙ、Ｔａ、Ｎｂ等を含有するＣｏ系合金である、軟磁性層が開示されている。このＣｏ系合金の飽和磁束密度は、大きい。大きな飽和磁束密度は、高記録密度に寄与しうる。 Patent Document 4 (Japanese Patent Application Laid-Open No. 2011-99166) discloses a soft magnetic layer whose material is a Co-based alloy containing Zr, Hf, Y, Ta, Nb and the like. The saturation magnetic flux density of this Co-based alloy is large. A large saturation magnetic flux density can contribute to a high recording density.
　大きな飽和磁束密度は、「書き滲み」の原因である。この「書き滲み」は、書き込み用ヘッドにより合金が着磁された状態において、必要以上に周囲の広範囲に磁気的な影響が及ぶ現象である。「書き滲み」が生じる磁気記録媒体では、単位記録情報あたりの書き込みに必要なスペースは、大きい。「書き滲み」は、磁気記録媒体の高記録密度を阻害する。 A large saturation magnetic flux density is the cause of “writing blur”. The “writing blur” is a phenomenon in which, in a state in which the alloy is magnetized by the writing head, the surrounding area is magnetically affected more than necessary. In a magnetic recording medium in which “writing blur” occurs, the space required for writing per unit recording information is large. “Writing blur” impairs the high recording density of the magnetic recording medium.
　「書き滲み」の抑制の観点から、飽和磁束密度が調整された軟磁性層が、提案されている。特許文献５（特開２０１５－１４４０３２公報）には、飽和磁束密度が０．５Ｔ－１．１Ｔである軟磁性層が開示されている。特許文献６（特開２０１６－８４５３８公報）には、飽和磁束密度が０．３４Ｔ－１．１８Ｔである軟磁性層が開示されている。 軟 From the viewpoint of suppressing "writing blur", a soft magnetic layer in which the saturation magnetic flux density is adjusted has been proposed. Patent Document 5 (JP-A-2015-144032) discloses a soft magnetic layer having a saturation magnetic flux density of 0.5T-1.1T. Patent Document 6 (Japanese Patent Application Laid-Open No. 2016-84538) discloses a soft magnetic layer having a saturation magnetic flux density of 0.34T-1.18T.
特開２００６－２９４０９０公報JP 2006-294090 A 特開２００８－２９９９０５公報JP 2008-299905 A 特開２０１１－６８９８５公報JP 2011-68985 A 特開２０１１－９９１６６公報JP 2011-99166 A 特開２０１５－１４４０３２公報JP-A-2015-144032 特開２０１６－８４５３８公報JP 2016-84538 A
　前述の通り、「書き滲み」の抑制の観点から、近年、飽和磁束密度が小さな軟磁性層が指向されている。飽和磁束密度の抑制には、合金への元素の添加が有効である。しかし、合金に添加された元素は、Ｆｅ及びＣｏと共に、金属間化合物を形成しうる。このような金属間化合物を含むターゲットは、脆く、スパッタリング中に割れやすい。 As described above, in recent years, from the viewpoint of suppressing "writing blur", soft magnetic layers having a small saturation magnetic flux density have been used. To suppress the saturation magnetic flux density, the addition of an element to the alloy is effective. However, elements added to the alloy may form intermetallics with Fe and Co. A target containing such an intermetallic compound is brittle and easily cracks during sputtering.
　本発明の目的は、強靱性に優れたターゲットが得られうるとともに、飽和磁束密度が小さな軟磁性層が得られうる、Ｃｏ系合金の提供にある。 目的 An object of the present invention is to provide a Co-based alloy capable of obtaining a target having excellent toughness and obtaining a soft magnetic layer having a small saturation magnetic flux density.
　１つの観点によれば、本発明は、磁気記録媒体の軟磁性層用Ｃｏ系合金を提供する。本発明に係る磁気記録媒体の軟磁性層用Ｃｏ系合金は、Ｎｂ、Ｍｏ、Ｔａ及びＷからなる群から選択される１種又は２種以上の元素ＸＡ：１１ａｔ％以上２５ａｔ％以下、並びに、Ｖ、Ｃｒ、Ｍｎ、Ｎｉ、Ｃｕ及びＺｎからなる群から選択される１種又は２種以上の元素ＸＢ：０．４ａｔ％以上１０ａｔ％以下を含有する。この合金において、残部は、Ｃｏ、Ｆｅ及び不可避的不純物であり、元素ＸＡと元素ＸＢとの合計含有率は、３０ａｔ％未満である。 According to one aspect, the present invention provides a Co-based alloy for a soft magnetic layer of a magnetic recording medium. The Co-based alloy for a soft magnetic layer of the magnetic recording medium according to the present invention includes one or more elements XA selected from the group consisting of Nb, Mo, Ta, and W: 11 at% to 25 at%, and One or more elements XB selected from the group consisting of V, Cr, Mn, Ni, Cu and Zn: contain 0.4 at% or more and 10 at% or less. In this alloy, the balance is Co, Fe and inevitable impurities, and the total content of the elements XA and XB is less than 30 at%.
　他の観点によれば、本発明は、磁気記録媒体の軟磁性層用スパッタリングターゲットを提供する。本発明に係る磁気記録媒体の軟磁性層用スパッタリングターゲットの材質は、本発明に係るＣｏ系合金からなる。すなわち、本発明に係る磁気記録媒体の軟磁性層用スパッタリングターゲットの材質は、Ｃｏ系合金であり、このＣｏ系合金は、Ｎｂ、Ｍｏ、Ｔａ及びＷからなる群から選択される１種又は２種以上の元素ＸＡ：１１ａｔ％以上２５ａｔ％以下、並びに、Ｖ、Ｃｒ、Ｍｎ、Ｎｉ、Ｃｕ及びＺｎからなる群から選択される１種又は２種以上の元素ＸＢ：０．４ａｔ％以上１０ａｔ％以下を含有する。この合金において、残部は、Ｃｏ、Ｆｅ及び不可避的不純物であり、元素ＸＡと元素ＸＢとの合計含有率は、３０ａｔ％未満である。 According to another aspect, the present invention provides a sputtering target for a soft magnetic layer of a magnetic recording medium. The material of the sputtering target for the soft magnetic layer of the magnetic recording medium according to the present invention comprises the Co-based alloy according to the present invention. That is, the material of the sputtering target for the soft magnetic layer of the magnetic recording medium according to the present invention is a Co-based alloy, and the Co-based alloy is one or two selected from the group consisting of Nb, Mo, Ta and W. At least one kind of element XA: 11 to 25 at%, and one or more kinds of element XB selected from the group consisting of V, Cr, Mn, Ni, Cu and Zn: 0.4 at% to 10 at% Contains: In this alloy, the balance is Co, Fe and inevitable impurities, and the total content of the elements XA and XB is less than 30 at%.
　さらに他の観点によれば、本発明は、磁気記録媒体を提供する。本発明に係る磁気記録媒体は、軟磁性層を有し、この軟磁性層は、本発明に係るＣｏ系合金を含有する。本発明に係る磁気記録媒体における軟磁性層は、その材質がＣｏ系合金であるターゲットが用いられたスパッタリングで得られ、このＣｏ系合金は、Ｎｂ、Ｍｏ、Ｔａ及びＷからなる群から選択される１種又は２種以上の元素ＸＡ：１１ａｔ％以上２５ａｔ％以下、並びに、Ｖ、Ｃｒ、Ｍｎ、Ｎｉ、Ｃｕ及びＺｎからなる群から選択される１種又は２種以上の元素ＸＢ：０．４ａｔ％以上１０ａｔ％以下を含有する。この合金において、残部は、Ｃｏ、Ｆｅ及び不可避的不純物であり、元素ＸＡと元素ＸＢとの合計含有率は、３０ａｔ％未満である。 According to yet another aspect, the present invention provides a magnetic recording medium. The magnetic recording medium according to the present invention has a soft magnetic layer, and the soft magnetic layer contains the Co-based alloy according to the present invention. The soft magnetic layer in the magnetic recording medium according to the present invention is obtained by sputtering using a target whose material is a Co-based alloy, and the Co-based alloy is selected from the group consisting of Nb, Mo, Ta and W. One or more elements XA: 11 at% or more and 25 at% or less, and one or more elements XB selected from the group consisting of V, Cr, Mn, Ni, Cu and Zn: 0. Contains at least 4 at% and at most 10 at%. In this alloy, the balance is Co, Fe and inevitable impurities, and the total content of the elements XA and XB is less than 30 at%.
　本発明に係るＣｏ系合金から、耐割れ性に優れたターゲットが得られうる。また、本発明に係るＣｏ系合金から、「書き滲み」が生じにくい磁気記録媒体が得られうる。 タ ー ゲ ッ ト A target having excellent crack resistance can be obtained from the Co-based alloy according to the present invention. Further, a magnetic recording medium in which “writing blur” is unlikely to occur can be obtained from the Co-based alloy according to the present invention.
　以下、好ましい実施形態に基づいて、本発明が詳細に説明される。 Hereinafter, the present invention will be described in detail based on preferred embodiments.
［合金］
　本発明に係る磁気記録媒体の軟磁性層用Ｃｏ系合金は、スパッタリングターゲットに適している。このＣｏ系合金の組成は、
　元素ＸＡ：１１ａｔ％以上２５ａｔ％以下、
　元素ＸＢ：０．４ａｔ％以上１０ａｔ％以下、及び、
　残部：Ｃｏ、Ｆｅ及び不可避的不純物
である。 [alloy]
The Co-based alloy for a soft magnetic layer of a magnetic recording medium according to the present invention is suitable for a sputtering target. The composition of this Co-based alloy is
Element XA: 11 at% or more and 25 at% or less,
Element XB: 0.4 at% or more and 10 at% or less, and
The balance: Co, Fe and unavoidable impurities.
［ベース元素］
　Ｃｏ系合金のベースである元素は、Ｆｅ及びＣｏである。Ｆｅ及びＣｏを含有する軟磁性層では、十分な磁性が発揮される。この軟磁性層により、磁気記録層の磁化が安定する。Ｆｅの含有率（ａｔ％）とＣｏの含有率（ａｔ％）との比は、１０：９０以上９０：１０以下が好ましい。この比が１０：９０以上である合金からなる軟磁性層では、飽和磁束密度が抑制されうる。この観点から、この比は２０：８０以上が特に好ましい。この比が９０：１０以下である合金からなる軟磁性層は、磁気記録媒体の高記録密度に寄与しうる。この観点から、この比は８０：２０以下が特に好ましい。 [Base element]
Elements that are the bases of the Co-based alloy are Fe and Co. The soft magnetic layer containing Fe and Co exhibits sufficient magnetism. With this soft magnetic layer, the magnetization of the magnetic recording layer is stabilized. The ratio between the Fe content (at%) and the Co content (at%) is preferably from 10:90 to 90:10. In a soft magnetic layer made of an alloy having this ratio of 10:90 or more, the saturation magnetic flux density can be suppressed. In this respect, the ratio is particularly preferably equal to or greater than 20:80. A soft magnetic layer made of an alloy having this ratio of 90:10 or less can contribute to a high recording density of a magnetic recording medium. In this respect, the ratio is particularly preferably equal to or less than 80:20.
［元素ＸＡ］
　元素ＸＡは、Ｎｂ、Ｍｏ、Ｔａ及びＷからなる群Ａから選択される。元素ＸＡとして、群Ａから、１種の元素が選択されてもよく、２種以上の元素が選択されてもよい。元素ＸＡは、軟磁性層のアモルファス性に寄与しうる。元素ＸＡはさらに、飽和磁束密度の抑制に寄与しうる。これらの観点から、Ｃｏ系合金における元素ＸＡの含有率は１１ａｔ％以上が好ましく、１３ａｔ％以上がより好ましく、１５ａｔ％以上が特に好ましい。元素ＸＡは、Ｆｅ又はＣｏと共に、金属間化合物を形成する。この金属間化合物は、脆い。この金属間化合物を含有する合金から得られたターゲットは、スパッタリング時に割れやすい。ターゲットの耐割れ性の観点から、元素ＸＡの含有率は２５ａｔ％以下が好ましく、２３ａｔ％以下がより好ましく、２１ａｔ％以下が特に好ましい。なお、群Ａから、２種以上の元素が選択される場合、「元素ＸＡの含有率」は、当該２種以上の元素の合計含有率を意味する。 [Element XA]
Element XA is selected from group A consisting of Nb, Mo, Ta and W. As the element XA, one element may be selected from the group A, or two or more elements may be selected. The element XA can contribute to the amorphous property of the soft magnetic layer. Element XA can further contribute to suppressing the saturation magnetic flux density. From these viewpoints, the content of the element XA in the Co-based alloy is preferably at least 11 at%, more preferably at least 13 at%, and particularly preferably at least 15 at%. Element XA forms an intermetallic compound with Fe or Co. This intermetallic compound is brittle. A target obtained from an alloy containing this intermetallic compound is easily cracked during sputtering. In light of the crack resistance of the target, the content of the element XA is preferably equal to or less than 25 at%, more preferably equal to or less than 23 at%, and particularly preferably equal to or less than 21 at%. When two or more elements are selected from the group A, the “content of the element XA” means the total content of the two or more elements.
［元素ＸＢ］
　元素ＸＢは、Ｖ、Ｃｒ、Ｍｎ、Ｎｉ、Ｃｕ及びＺｎからなる群Ｂから選択される。元素ＸＢとして、群Ｂから、１種の元素が選択されてもよく、２種以上の元素が選択されてもよい。元素ＸＢは、飽和磁束密度を抑制しうる。元素ＸＢは、第４周期元素である。一方、ベースであるＦｅ及びＣｏも、第４周期元素である。従って、元素ＸＢが添加されても、Ｆｅと元素ＸＢとの金属間化合物はほとんど生成せず、Ｃｏと元素ＸＢとの金属間化合物もほとんど生成しない。元素ＸＢは、ターゲットを脆化させにくい。元素ＸＢの添加により、低い飽和磁束密度と高強度なターゲットとが、両立されうる。 [Element XB]
Element XB is selected from group B consisting of V, Cr, Mn, Ni, Cu and Zn. As the element XB, one element may be selected from the group B, or two or more elements may be selected. Element XB can suppress the saturation magnetic flux density. Element XB is a fourth period element. On the other hand, bases Fe and Co are also the fourth period elements. Therefore, even if the element XB is added, almost no intermetallic compound of Fe and the element XB is generated, and almost no intermetallic compound of Co and the element XB is generated. Element XB hardly embrittles the target. By adding the element XB, both a low saturation magnetic flux density and a high-strength target can be achieved.
　飽和磁束密度が抑制されうるとの観点から、Ｃｏ系合金における元素ＸＢの含有率は０．４％以上が好ましく、１ａｔ％以上がより好ましく、３ａｔ％以上が特に好ましい。飽和磁束密度が過小ではないとの観点から、元素ＸＢの含有率は１０ａｔ％以下が好ましい。なお、群Ｂから、２種以上の元素が選択される場合、「元素ＸＢの含有率」は、当該２種以上の元素の合計含有率を意味する。 From the viewpoint that the saturation magnetic flux density can be suppressed, the content of the element XB in the Co-based alloy is preferably 0.4% or more, more preferably 1 at% or more, and particularly preferably 3 at% or more. From the viewpoint that the saturation magnetic flux density is not excessively small, the content of the element XB is preferably equal to or less than 10 at%. When two or more elements are selected from Group B, the “content of element XB” means the total content of the two or more elements.
［元素ＸＡと元素ＸＢとの合計含有率］
　飽和磁束密度が過小ではないとの観点から、元素ＸＡの含有率と元素ＸＢの含有率との合計は、３０ａｔ％未満が好ましく、２８ａｔ％以下がより好ましく、２６ａｔ％以下が特に好ましい。 [Total content of element XA and element XB]
In light of the fact that the saturation magnetic flux density is not excessively small, the total of the content of the element XA and the content of the element XB is preferably less than 30 at%, more preferably 28 at% or less, and particularly preferably 26 at% or less.
［磁気記録媒体の製造］
　本発明に係る合金からなる粉末は、アトマイズによって得られうる。好ましいアトマイズは、ガスアトマイズである。この粉末に、必要に応じ、分級（例えば粒子径が５００μｍ以下の粒子を抽出）がなされる。分級後の粉末が、炭素鋼製の缶に充填される。この缶が真空脱気され、封止されてビレットが得られる。このビレットに、ＨＩＰ成形（熱間等方圧プレス）が施される。ＨＩＰ成形の、好ましい圧力は５０ＭＰａ以上３００ＭＰａ以下であり、好ましい焼結温度は８００℃以上１３５０℃以下である。ＨＩＰ成形により、成形体が得られる。この成形体に加工が施され、ターゲットが得られる。このターゲットにスパッタリングが施されることで、このターゲットの成分と同じ成分を有する軟磁性層が得られる。磁気記録媒体には、この軟磁性層が組み込まれる。 [Manufacture of magnetic recording medium]
The powder comprising the alloy according to the present invention can be obtained by atomization. Preferred atomizing is gas atomizing. If necessary, the powder is classified (for example, particles having a particle size of 500 μm or less are extracted). The powder after classification is filled in a carbon steel can. The can is evacuated and sealed to obtain a billet. The billet is subjected to HIP molding (hot isostatic pressing). The preferable pressure of the HIP molding is 50 MPa or more and 300 MPa or less, and the preferable sintering temperature is 800 ° C. or more and 1350 ° C. or less. A molded article is obtained by HIP molding. The formed body is processed to obtain a target. By subjecting this target to sputtering, a soft magnetic layer having the same components as those of the target can be obtained. This soft magnetic layer is incorporated in a magnetic recording medium.
　以下、実施例によって本発明の効果が明らかにされるが、この実施例の記載に基づいて本発明が限定的に解釈されるべきではない。 Hereinafter, although the effects of the present invention will be clarified by examples, the present invention should not be construed as being limited based on the description of the examples.
　前述の通り軟磁性層は、その成分と同じ成分を有するターゲットにスパッタリングが施されることで、成膜される。この軟磁性層は、急冷・凝固により得られる。軟磁性層の形成には多大の労力を要するので、以下の評価では、単ロール法により得られた試験片を用いる。単ロール法は、スパッタリングと同様、急冷・凝固の工程を有する。単ロール法を採用することで、スパッタリングで得られるであろう軟磁性層の評価が、簡易的に行われうる。 の 通 り As described above, the soft magnetic layer is formed by sputtering a target having the same component as the component. This soft magnetic layer is obtained by rapid cooling and solidification. Since a great deal of labor is required for forming the soft magnetic layer, a test piece obtained by a single roll method is used in the following evaluation. The single-roll method has a quenching and solidifying step as in the case of sputtering. By employing the single roll method, the evaluation of the soft magnetic layer that will be obtained by sputtering can be easily performed.
［アモルファス性］
　下記の表１及び２に示された組成となるように秤量した３０ｇの原料を、直径が１０ｍｍであり長さが４０ｍｍである水冷銅鋳型に投入した。この鋳型を減圧し、アルゴンガス雰囲気中でアーク溶解し、溶解母材を得た。この母材を直径が１５ｍｍである石英缶中に投入し、ノズルから出湯させ、単ロール法に供して試験片を得た。この単ロール法の条件は、以下の通りである。
　　出湯ノズルの直径：１ｍｍ
　　雰囲気の気圧：６１ｋＰａ
　　噴霧差圧：６９ｋＰａ
　　ロールの材質：銅
　　ロールの直径：３００ｍｍ
　　ロールの回転速度：３０００ｒｐｍ
　　ロールと出湯ノズルとのギャップ：０．３ｍｍ
　なお、各表に記載された合金の残部は、不可避的不純物である。 [Amorphous]
30 g of the raw material weighed so as to have the composition shown in Tables 1 and 2 below was charged into a water-cooled copper mold having a diameter of 10 mm and a length of 40 mm. This mold was depressurized and arc-melted in an argon gas atmosphere to obtain a molten base material. This base material was put into a quartz can having a diameter of 15 mm, and the hot water was discharged from a nozzle, and subjected to a single roll method to obtain a test piece. The conditions of the single roll method are as follows.
Hot water nozzle diameter: 1mm
Atmospheric pressure: 61 kPa
Spray differential pressure: 69 kPa
Roll material: copper Roll diameter: 300 mm
Roll rotation speed: 3000 rpm
Gap between roll and tapping nozzle: 0.3mm
The balance of the alloys described in each table is an unavoidable impurity.
　測定面が銅ロールとの接触面となるように、ガラス板に試験片を両面テープで貼り付けた。Ｘ線回折装置にて、この試験片の回折パターンを得た。回折の条件は、下記の通りである。
　　Ｘ線源：Ｃｕ－Ｋα線
　　スキャンスピード：４°／ｍｉｎ
　アモルファス材料のＸ線回折パターンでは、回折ピークが見られず、特有のハローパターンが得られる。不完全なアモルファス材料のＸ線回折パターンでは、回折ピークは見られるが、結晶材料のピークと比較するとピークの高さが低く、かつハローパターンも見られる。そこで、下記の基準に基づき、格付けを行った。この結果が、下記の表１及び２に示されている。
　　Ａ：ハローパターンが見られる
　　Ｃ：ハローパターンが見られない A test piece was stuck to the glass plate with a double-sided tape so that the measurement surface was in contact with the copper roll. The diffraction pattern of this test piece was obtained with an X-ray diffractometer. The diffraction conditions are as follows.
X-ray source: Cu-Kα ray Scan speed: 4 ° / min
In the X-ray diffraction pattern of the amorphous material, no diffraction peak is observed, and a unique halo pattern is obtained. In the X-ray diffraction pattern of an incomplete amorphous material, a diffraction peak is seen, but the height of the peak is lower and a halo pattern is also seen as compared with the peak of the crystalline material. Therefore, ratings were based on the following criteria. The results are shown in Tables 1 and 2 below.
A: Halo pattern is seen C: Halo pattern is not seen
［飽和磁束密度］
　前述のアモルファス性の評価で述べた方法と同様の方法により、試験片を得た。この試験片の飽和磁束密度を、振動試料型磁力計（ＶＳＭ）にて測定した。測定条件は、以下の通りである。
　　印加磁場：１２００ｋＡ／ｍ
　　試験片の質量：約１５ｍｇ
下記の基準に基づき、格付けを行った。この結果が、下記の表１及び２に示されている。
　　Ａ：０．３Ｔ以上１．０Ｔ未満
　　Ｂ：１．０Ｔ以上１．３Ｔ以下
　　Ｃ：０．３Ｔ未満又は１．３Ｔ超 [Saturation magnetic flux density]
A test piece was obtained by the same method as that described in the evaluation of the amorphous property. The saturation magnetic flux density of this test piece was measured with a vibrating sample magnetometer (VSM). The measurement conditions are as follows.
Applied magnetic field: 1200 kA / m
Test piece mass: about 15mg
Ratings were based on the following criteria. The results are shown in Tables 1 and 2 below.
A: 0.3 T or more and less than 1.0 T B: 1.0 T or more and 1.3 T or less C: Less than 0.3 T or more than 1.3 T
［耐割れ性］
　下記の表１及び２に示された組成となるように秤量した３０ｇの原料を、直径が４０ｍｍであり長さが５０ｍｍである水冷銅鋳型に投入した。この鋳型を減圧し、アルゴンガス雰囲気中でアーク溶解し、溶解母材を得た。この溶解母材を直径が８ｍｍであるノズルから出湯し、直後にこの溶解母材に高圧のＡｒガスを噴霧し、粉末を得た。この粉末を、５００μｍ以下に分級した。分級後の粉末を、炭素鋼製の缶に充填した。この缶を真空脱気し、封止して、ビレットを得た。このビレットに、ＨＩＰ成形（熱間等方圧プレス）を施した。ＨＩＰ成形の条件は、以下の通りである。
　　温度：１０００℃
　　圧力：１２０ＭＰａ
　　保持時間：２時間
　得られた成形体から、縦が２０ｍｍであり、横が１．８ｍｍであり、高さが１．８ｍｍである試験片を採取した。この試験片を、３点曲げ試験に供した。試験片が破断したとき又は曲がったときの荷重から、抗折力を算出した。この抗折力に基づき、下記の基準に従って、格付けを行った。この結果が、下記の表１及び２に示されている。
　　Ａ：抗折力が６００ＭＰａ以上
　　Ｂ：抗折力が４５０ＭＰａ以上６００ＭＰａ未満
　　Ｃ：抗折力が４５０ＭＰａ未満 [Crack resistance]
30 g of the raw material weighed so as to have the composition shown in Tables 1 and 2 below was charged into a water-cooled copper mold having a diameter of 40 mm and a length of 50 mm. This mold was depressurized and arc-melted in an argon gas atmosphere to obtain a molten base material. The molten base material was discharged from a nozzle having a diameter of 8 mm, and immediately thereafter, high-pressure Ar gas was sprayed on the molten base material to obtain a powder. This powder was classified to 500 μm or less. The powder after classification was filled in a carbon steel can. This can was evacuated and sealed to obtain a billet. This billet was subjected to HIP molding (hot isostatic pressing). The conditions for HIP molding are as follows.
Temperature: 1000 ° C
Pressure: 120MPa
Holding time: 2 hours From the obtained molded body, a test piece having a length of 20 mm, a width of 1.8 mm, and a height of 1.8 mm was collected. This test piece was subjected to a three-point bending test. The transverse rupture strength was calculated from the load when the test piece was broken or bent. Based on the transverse rupture strength, a rating was made according to the following criteria. The results are shown in Tables 1 and 2 below.
A: Bending force is 600 MPa or more B: Bending force is 450 MPa or more and less than 600 MPa C: Bending force is less than 450 MPa
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
　表１及び２に示されるように、本発明に係るＣｏ系合金から、諸性能に優れた軟磁性層が得られうる。この評価結果から、本発明の優位性は明らかである。 軟 As shown in Tables 1 and 2, a soft magnetic layer excellent in various performances can be obtained from the Co-based alloy according to the present invention. From the evaluation results, the superiority of the present invention is clear.
　以上説明されたＣｏ系合金は、種々の磁気記録媒体の軟磁性層に適している。 The Co-based alloy described above is suitable for soft magnetic layers of various magnetic recording media.

Claims (3)

  1. 　Ｎｂ、Ｍｏ、Ｔａ及びＷからなる群から選択される１種又は２種以上の元素ＸＡ：１１ａｔ％以上２５ａｔ％以下、並びに、
    　Ｖ、Ｃｒ、Ｍｎ、Ｎｉ、Ｃｕ及びＺｎからなる群から選択される１種又は２種以上の元素ＸＢ：０．４ａｔ％以上１０ａｔ％以下
    を含有し、
    　残部がＣｏ、Ｆｅ及び不可避的不純物であり、
    　前記元素ＸＡと前記元素ＸＢとの合計含有率が３０ａｔ％未満である、磁気記録媒体の軟磁性層用Ｃｏ系合金。     One or more elements XA selected from the group consisting of Nb, Mo, Ta and W: 11 at% or more and 25 at% or less;
    One or more elements XB selected from the group consisting of V, Cr, Mn, Ni, Cu and Zn: containing 0.4 at% or more and 10 at% or less;
    The balance is Co, Fe and inevitable impurities,
    A Co-based alloy for a soft magnetic layer of a magnetic recording medium, wherein the total content of the element XA and the element XB is less than 30 at%.
  2. 　請求項１に記載のＣｏ系合金からなる、磁気記録媒体の軟磁性層用スパッタリングターゲット。 A sputtering target for a soft magnetic layer of a magnetic recording medium, comprising the Co-based alloy according to claim 1.
  3. 　軟磁性層を有する磁気記録媒体であって、
    　前記軟磁性層が、請求項１に記載のＣｏ系合金を含有する、磁気記録媒体。     A magnetic recording medium having a soft magnetic layer,
    A magnetic recording medium, wherein the soft magnetic layer contains the Co-based alloy according to claim 1.
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