WO2018210168A1 - 彩膜基板及其制备方法、显示装置 - Google Patents

彩膜基板及其制备方法、显示装置 Download PDF

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Publication number
WO2018210168A1
WO2018210168A1 PCT/CN2018/086133 CN2018086133W WO2018210168A1 WO 2018210168 A1 WO2018210168 A1 WO 2018210168A1 CN 2018086133 W CN2018086133 W CN 2018086133W WO 2018210168 A1 WO2018210168 A1 WO 2018210168A1
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Prior art keywords
pattern
filling
color
color resist
spacer
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PCT/CN2018/086133
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English (en)
French (fr)
Inventor
林海云
赵清辉
李东朝
杜楠楠
董廷泽
李京鹏
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/099,347 priority Critical patent/US10908332B2/en
Publication of WO2018210168A1 publication Critical patent/WO2018210168A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings

Definitions

  • the present disclosure relates to the field of display technologies, and in particular, to a color film substrate, a method for fabricating the same, and a display device.
  • a color filter (CF) substrate is one of the important components in a display panel.
  • the backlight transmitted from the liquid crystal layer or the white light emitted from the organic electroluminescent device passes through the color resistance of red, green, blue and the like arranged in an array on the color filter substrate, thereby emitting various colors such as red, green and blue.
  • a black matrix (abbreviated as BM) is usually disposed on the color filter substrate.
  • the black matrix is formed with a plurality of spaced apart hollow regions arranged in an array, and the color resistance of the adjacent colors is coated in the hollow region of the black matrix to achieve the purpose of preventing crosstalk.
  • the adhesion between the BM material and the substrate of the color filter substrate is weak, the peeling problem easily occurs, which affects the normal display of the display panel. For example, in the liquid crystal display panel, bubble defects in the liquid crystal cell may occur after the BM material is peeled off.
  • Embodiments of the present disclosure provide a method of fabricating a color filter substrate, the method comprising: providing a substrate, the surface of the substrate comprising a plurality of independent color resist regions and a plurality of spacer regions, each interval a region is located between adjacent two color resisting regions; a color resist pattern is formed in the color resisting region, a light transmissive filling pattern is formed in the spacer region; and the filling pattern is blackened to make The filling pattern is converted into an opaque pattern.
  • the step of blackening the filling pattern to convert the filling pattern into an opaque pattern comprises: using a mask, using laser burning, ultraviolet exposure, carbonization, and ion doping Any one of the methods of treating the filling pattern to make the filling pattern opaque; wherein the transparent region of the mask exposes the filling pattern, and the mask is impervious The light region blocks the color resist pattern.
  • a color resist pattern is formed in the color resist region, a light transmissive fill pattern is formed in the spacer region, and a blackening process is performed on the fill pattern such that the fill pattern is changed to no
  • the step of transmitting a light-transmissive pattern includes: forming a color resist pattern in the color resistive region, forming a light-transmissive filling pattern having a predetermined thickness in the spacer region; the filling pattern being a material of the color resist pattern Or a transparent filling material; and blackening the filling pattern such that the filling pattern is converted into an opaque pattern.
  • the fill pattern includes a first fill pattern and a second fill pattern disposed in a stack; a color resist pattern is formed in the color resist region, and a light transmissive fill pattern is formed in the spacer region;
  • the step of performing a blackening process on the filling pattern to convert the filling pattern into an opaque pattern includes: forming a color resist pattern in the color resist region, and forming a predetermined thickness in the spacer region a first filling pattern; the first filling pattern is composed of a material of the color resist pattern or a transparent filling material; forming a protective layer covering the color resist pattern and the first filling pattern; wherein the protective layer covers The portion of the first filling pattern is a second filling pattern; the protective layer is composed of a transparent filling material; and the second filling pattern is blackened so that the filling pattern is converted into an opaque pattern.
  • the fill pattern includes a first fill pattern, a second fill pattern, and a spacer pattern disposed in a stack; a color resist pattern is formed in the color resist region, and light is formed in the spacer region a filling pattern; and a step of blackening the filling pattern to convert the filling pattern into an opaque pattern, comprising: forming a color resist pattern in the color resist region, forming in the spacer region a first filling pattern having a predetermined thickness; the first filling pattern being composed of a material of the color resist pattern or a transparent filling material; forming a protective layer covering the color resist pattern and the first filling pattern; The portion of the protective layer covering the first filling pattern is a second filling pattern; the protective layer is composed of a transparent filling material; a spacer pattern is formed on the second filling pattern; Forming a transparent filling material; blackening the pattern of the spacers to convert the filling pattern into an opaque pattern.
  • a color resist pattern is formed in the color resist region, a light transmissive fill pattern is formed in the spacer region, and a blackening process is performed on the fill pattern such that the fill pattern is changed to no a step of forming a light-transmitting pattern, comprising: forming a color resist pattern in the color resistive region; forming a protective layer covering the color resist pattern and the spacer region; wherein a portion of the protective layer covering the spacer region is a filling pattern; the protective layer is composed of a transparent filling material; the filling pattern is blackened so that the filling pattern is converted into an opaque pattern.
  • the fill pattern includes a first fill pattern and a spacer pattern disposed in a stack; a color resist pattern is formed in the color resist region, and a light transmissive fill pattern is formed in the spacer region;
  • the step of performing a blackening process on the filling pattern to convert the filling pattern into an opaque pattern includes: forming a color resist pattern in the color resist region; forming a color resist pattern and the spacer region a protective layer; the portion of the protective layer covering the spacer region is a first filling pattern; a spacer pattern is formed on the first filling pattern; wherein the spacer pattern is composed of a transparent filling material;
  • the spacer pattern is subjected to a blackening treatment such that the filling pattern is converted into an opaque pattern.
  • Embodiments of the present disclosure provide a color film substrate.
  • the color filter substrate includes: a substrate, the surface of the substrate includes a plurality of independent color resist regions and a plurality of spacer regions, each of the spacer regions being located between two adjacent color resist regions; a color resist pattern in the color resisting region; and a filling pattern formed in the spacer region; the filling pattern being composed of a material of the color resist pattern and/or a transparent filling material; wherein the filling pattern passes through black
  • the processing is such that the filling pattern is converted into an opaque pattern.
  • the filling pattern includes a first filling pattern and a spacer pattern disposed in a stack; the first filling pattern is formed between adjacent two color resist regions, and the spacer pattern covers the a first filling pattern; wherein at least the spacer pattern is subjected to a blackening treatment such that the filling pattern is converted into an opaque pattern.
  • Embodiments of the present disclosure provide a display device including the color filter substrate described in the above embodiments.
  • FIG. 1 is a schematic flow chart of a method for preparing a color filter substrate according to an embodiment of the present disclosure
  • FIG. 2 is a schematic structural diagram of a substrate in a color film substrate according to an embodiment of the present disclosure
  • FIG. 3 is a schematic structural diagram of a color filter substrate according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 5 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 6 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 7 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 8 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 9 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 10 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 11 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 12 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 13 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 14 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 15 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 16 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 17 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 18 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 19 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 20 is a schematic structural diagram of a color filter substrate according to another embodiment of the present disclosure.
  • the terms "first,” “second,” and similar terms used in the specification and claims of the disclosure are not intended to mean any order, quantity, or importance, and are merely used to distinguish different components.
  • the word “comprising” or “comprises” or the like means that the element or item preceding the word is intended to be in the
  • the terminology or positional relationship of the "one side", “the other side” and the like is based on the orientation or positional relationship shown in the drawings, and is merely for the convenience of explaining a simplified description of the technical solution of the present disclosure, rather than indicating or implying
  • the device or component referred to must have a particular orientation, is constructed and operated in a particular orientation, and thus is not to be construed as limiting the disclosure.
  • Embodiments of the present disclosure provide a method of preparing a color film substrate. As shown in FIG. 1, the preparation method includes the following steps.
  • Step S01 providing a substrate, the surface of the substrate comprising a plurality of independent color resist regions and a plurality of spacer regions, each of the spacer regions being located between adjacent two color resist regions.
  • Step S02 forming a color resist pattern in the color resist region, and forming a light transmissive filling pattern in the spacer region.
  • Step S03 performing a blackening process on the filling pattern to convert the filling pattern into an opaque pattern.
  • the color and the arrangement manner of the color resist pattern are not limited, and the corresponding design of the color filter substrate in the related art may be specifically used.
  • the color resist pattern (Red Resin, red color resist; Green Resin, green color resist; Blue Resin, blue color resist) may be arranged in a strip shape, a mosaic shape, a font shape (Delta shape), etc., and the implementation of the present disclosure This will not be repeated here.
  • the spacer area 1B on the substrate 1 is a vacant area in the related art that originally forms a BM.
  • opaque pattern means that the pattern is capable of blocking light rays traveling in a direction perpendicular to the surface of the substrate substrate.
  • the "opaque pattern” is indicated by a black pattern.
  • the BM material is usually composed of an opaque metal Cr, chromium oxide (CrO x ), black graphite, or the like, to which a pigment and/or a dye is added; in the embodiment of the present disclosure, color
  • the material of the resist pattern is usually a light transmissive material such as red, green, blue, etc., which is obviously different from the BM material in the related art. By blackening the material of the color resist pattern and/or the transparent filling material, these light-transmitting materials can be converted into a light-shielding material, thereby functioning as the same color resistance as the BM material.
  • blackening treatment means changing the material of the color resist pattern and/or the transparent filling material by a corresponding chemical means to convert it into a light-shielding material.
  • the embodiment of the present disclosure does not limit the sequence of the step of blackening the filling material located in the spacing region and the step of forming the color resist pattern in the color resisting region, and the filling material located in the spacing region is not limited.
  • the step of performing the blackening treatment may be performed before or after the step of forming the color resist pattern.
  • the filling pattern includes a material having a color resist pattern
  • the material of the color resist pattern is processed by one patterning process.
  • the step of blackening the filling material in the region is after the step of forming the color resist pattern and the filling pattern.
  • the transparent filling material may be a material that forms a protective layer and/or forms a spacer. That is, the above preparation method may further include a step of forming a protective layer or a step of sequentially forming a protective layer and a spacer after the specific step of forming the color resist pattern. Therefore, the transparent filler material may specifically be a portion of the protective layer located in the spacer region, or a portion of the protective layer located in the spacer region and a spacer disposed in the region. Thereby, the production cost can be saved, and the CF manufacturing process can be further simplified.
  • the material of the color resist pattern formed in the spacer region and/or the transparent filler material is blackened to become an opaque material, thereby realizing The effect of preventing the crosstalk caused by the adjacent color resistance; since the BM process is removed in the original process of the color film substrate, the problem of the product due to the BM peeling in the color film substrate can be effectively solved, and the product yield rate is improved. .
  • the step of the blackening process specifically includes: performing masking of an appropriate size by using a mask, and processing the filling pattern by any one of laser burning, ultraviolet exposure, carbonization, and ion doping. In order to make the filling pattern opaque; wherein the light-transmitting region of the mask exposes the filling pattern, and the opaque region of the mask blocks the color resist pattern.
  • laser burning refers to the use of high energy of the laser to heat the color resist pattern material and/or the transparent filling material to cause cauterization, and the color becomes opaque shading material.
  • Ultraviolet exposure refers to a series of chemical reactions between the material of the color resist pattern and/or the photoinitiator in the transparent filler material and the material of the color resist pattern or the host material of the transparent filler material by ultraviolet light irradiation.
  • the material of the resist pattern or the transparent filling material as a whole exhibits an opaque effect.
  • a photoinitiator is also included in the material of the color resist pattern and/or the transparent filler material.
  • Carbonization refers to the high temperature treatment of organic materials containing carbon chains to make their color opaque. Since the material of the color resist pattern is usually an organic material, the treatment method can be applied to the treatment of the material of the color resist pattern, and/or the treatment when the above transparent filler material is specifically an organic transparent filler.
  • the ion doping treatment refers to doping a material of a color resist pattern and/or a transparent filling material, and changing it into a light shielding material by changing the composition of the material.
  • the material of the color resist pattern and/or the transparent fill material may be subjected to hydrogen plasma treatment by plasma chemical vapor deposition or plasma source to make it a light-shielding material.
  • the embodiment of the present disclosure provides a substrate 1 as shown in FIG. 2, the surface of the substrate 1 includes a plurality of independent color resist regions 1A and a plurality of spacer regions 1B, each of which is located adjacent to two Between the color resistive regions 1A; this embodiment provides a specific method for preparing a color filter substrate, which includes, but is not limited to, the following steps.
  • Step S11 as shown in FIG. 3 or FIG. 4, a color resist pattern (indicated by R, G, and B marks in the figure) is formed in the color resistive region 1A, and light transmittance having a predetermined thickness is formed in the spacer region 1B.
  • Step S12 as shown in FIG. 5 or FIG. 6, the filling pattern 2 is subjected to a blackening process so that the filling pattern is converted into an opaque pattern.
  • the first filling pattern 2 has a predetermined thickness, which is specifically the thickness of the BM in the color film substrate having the same size in the related art, so that the thickness of the color filter substrate formed in the embodiment is The thickness of the color film substrate including the BM is related to the related art, and meets the specific application requirements of the product.
  • the filling pattern 2 is composed of a material of a color resist pattern
  • a step of forming a color resist pattern in the color resisting region 1A and a filling pattern 2 having a predetermined thickness in the spacer region 1B are formed.
  • the steps can be formed under the same patterning process.
  • the color resist material for forming the filling pattern 2 may be any one of color resist materials (R/G/B Resin) of a color such as red/green/blue.
  • the color resist material of the color is also retained in the spacer region 1B to form the fill pattern 2.
  • a material having an R color resist may be applied to the spacer region 1B at the time of coating the R color resist, and then coating of the G/B color resist may be performed.
  • the filling pattern 2 can be blackened by the occlusion of the mask to be converted into an opaque pattern, which functions as a BM in the related art.
  • the filling pattern 2 when the filling pattern 2 is formed of another transparent filling material, the filling pattern 2 may be formed first. Thereafter, the filling pattern 2 is blackened by the occlusion of the mask to convert it into an opaque pattern, which functions as a BM in the related art.
  • the color resist pattern of R/G/B can be reformed. Also, in order to prevent light leakage, both ends of the R/G/B color resist pattern may overlap the filling pattern 2.
  • FIG. 2 Another embodiment of the present disclosure provides a substrate 1 as shown in FIG. 2, the surface of which includes a plurality of independent color resist regions 1A and a plurality of spacer regions 1B, each of which is adjacent to each other Between the two color resistive regions 1A; this embodiment provides a specific method for preparing a color filter substrate, which includes, but is not limited to, the following steps.
  • Step S21 as shown in FIG. 7 or FIG. 8, a color resist pattern (indicated by R, G, and B marks in the figure) is formed in the color resistive region 1A, and a first pad having a predetermined thickness is formed in the spacer region 1B.
  • the pattern 21; the first filling pattern 21 is composed of a material of a color resist pattern or a transparent filling material.
  • Step S22 as shown in FIG. 9 or FIG. 10, forming a protective layer (Over Coat, abbreviated as OC) 3 covering the color resist pattern and the first filling pattern 21; wherein the protective layer 3 covers the portion of the first filling pattern 21. It is a second filling pattern 22; the protective layer 3 is composed of a transparent filling material.
  • OC Over Coat, abbreviated as OC
  • Step S23 as shown in FIG. 11 or FIG. 12, the second filling pattern is subjected to a blackening process so that the filling pattern is converted into an opaque pattern.
  • first and the above-described filling patterns 2 include the first filling patterns 21 and the second filling patterns 22 which are stacked.
  • step S21 the structure in which the first filling pattern 21 is composed of the material of the color resist pattern or the transparent filling material can be referred to the foregoing embodiment, which is not described in this embodiment.
  • the embodiment may further include a step of blackening the previously formed first filling pattern 21 to form a structure as shown in FIG. 13, thereby further enhancing the shading effect.
  • a step of blackening the previously formed first filling pattern 21 to form a structure as shown in FIG. 13, thereby further enhancing the shading effect.
  • a further embodiment of the present disclosure provides a substrate 1 as shown in FIG. 2, the surface of which includes a plurality of independent color resist regions 1A and a plurality of spacer regions 1B, each of which is adjacent to each other Between the two color resistive regions 1A; this embodiment provides a specific method for preparing a color filter substrate, which includes, but is not limited to, the following steps.
  • Step S31 referring to FIG. 7 or FIG. 8, forming a color resist pattern (indicated by R, G, and B marks in the figure) in the color resisting region, and forming a first filling pattern having a predetermined thickness in the spacing region;
  • the first filling pattern is composed of a material of a color resist pattern or a transparent filling material.
  • Step S32 referring to FIG. 9 or FIG. 10, forming a protective layer 3 covering the color resist pattern and the first filling pattern 21; wherein the portion of the protective layer 3 covering the first filling pattern 21 is the second filling pattern 22;
  • the protective layer 3 is composed of a transparent filling material.
  • Step S33 as shown in FIG. 14 or FIG. 15, a spacer pattern 4 is formed on the second filling pattern 22; the spacer pattern 4 is composed of a transparent filling material.
  • Step S34 as shown in FIG. 16 or FIG. 17, the above-described spacer pattern 4 is subjected to a blackening process so that the filling pattern is converted into an opaque pattern.
  • first and the above-described filling patterns 2 include the first filling patterns 21, the second filling patterns 22, and the spacer patterns 4 which are stacked.
  • the cross-sectional shape of the spacer pattern 4 may be a long column shape covering the R/G/B color resist pattern.
  • the spacer pattern 4 can increase the support strength between the color filter substrate and the array substrate while exhibiting the occlusion effect of the BM in the related art.
  • the specific preparation process can follow the related art, and the details are not described in this embodiment.
  • the embodiment may further include a step of blackening the second filling pattern 22 and/or the first filling pattern 21 under the spacer pattern 4 to further enhance the shading effect.
  • FIG. 2 Another embodiment of the present disclosure provides a substrate 1 as shown in FIG. 2, the surface of which includes a plurality of independent color resist regions 1A and a plurality of spacer regions 1B, each of which is adjacent to each other Between the two color resistive regions 1A; this embodiment provides a specific method for preparing a color filter substrate, which includes, but is not limited to, the following steps.
  • step S41 as shown in FIG. 18, an R/G/B color resist pattern is formed in the color resistive region 1A.
  • Step S42 as shown in FIG. 18, forming a protective layer 3 covering the R/G/B color resist pattern and the spacer region 1B; wherein, the portion of the protective layer 3 covering the spacer region 1B is a filling pattern; and the protective layer 3 is made of a transparent filling material Composition.
  • step S43 as shown in FIG. 19, the filling pattern is blackened so that the filling pattern is converted into an opaque pattern.
  • the filling pattern is a part of the protective layer covering the spacer area 1B.
  • the specific structure refer to the foregoing embodiment, which is not described in this embodiment.
  • this embodiment directly adopts a part of the protective layer as a filling pattern, and the structure is simpler and easier to implement.
  • FIG. 2 Another embodiment of the present disclosure provides a substrate 1 as shown in FIG. 2, the surface of which includes a plurality of independent color resist regions 1A and a plurality of spacer regions 1B, each of which is adjacent to each other Between the two color resistive regions 1A; this embodiment provides a specific method for preparing a color filter substrate, which includes, but is not limited to, the following steps.
  • step S51 as shown in FIG. 20, an R/G/B color resist pattern is formed in the color resist region.
  • Step S52 as shown in FIG. 20, a protective layer 3 covering the R/G/B color resist pattern and the spacer region 1B is formed; a portion of the protective layer 3 covering the spacer region 1B is a first fill pattern.
  • Step S53 as shown in FIG. 20, a spacer pattern 4 is formed on the first filling pattern; wherein the spacer pattern 4 is composed of a transparent filling material.
  • step S54 as shown in FIG. 20, the spacer pattern 4 is subjected to a blackening process so that the filling pattern is converted into an opaque pattern.
  • the above-mentioned filling pattern 2 includes a first filling pattern and a spacer pattern which are arranged in a stacked manner.
  • a first filling pattern and a spacer pattern which are arranged in a stacked manner.
  • the filling pattern in this embodiment includes a part of the protective layer and a spacer pattern disposed on the original BM area, and the structure is relatively simple and easy to implement.
  • the embodiment of the present disclosure further provides a color film substrate, comprising: a substrate, the surface of the substrate includes a plurality of independent color resist regions and a plurality of spacer regions, each of the spacer regions being located a color resist pattern formed between the adjacent two color resisting regions; a color resist pattern formed in the color resisting region; and a filling pattern formed in the spacer region; the filling pattern being made of the material of the color resisting pattern and/or The transparent filling material is configured; wherein the filling pattern is subjected to a blackening treatment such that the filling pattern is converted into an opaque pattern.
  • the filling pattern includes a first filling pattern and a spacer pattern disposed in a stack; the first filling pattern is formed between adjacent two color resist regions, and the spacer pattern covers the a first filling pattern; wherein at least the spacer pattern is subjected to a blackening treatment such that the filling pattern is converted into an opaque pattern.
  • the material of the protective layer OC may specifically include a host substrate such as an epoxy resin, a PI-type polymer (alicyclic polyimide), or the like; a (carboxyl) curing agent added to the host substrate, Additives such as surfactants.
  • a host substrate such as an epoxy resin, a PI-type polymer (alicyclic polyimide), or the like
  • a (carboxyl) curing agent added to the host substrate
  • Additives such as surfactants.
  • the material of the spacer pattern may specifically be propylene glycol monomethyl ether acetate (PGMEA) or Bis (2-methoxy ethyl ether) (abbreviated as DG).
  • PGMEA propylene glycol monomethyl ether acetate
  • DG Bis (2-methoxy ethyl ether
  • the embodiment of the present disclosure further provides a display device including the above color film substrate.
  • the display device may be specifically a product or a component having any display function, such as a liquid crystal display, a liquid crystal television, an organic electroluminescence display, an organic electroluminescence television, a digital photo frame, a mobile phone, a tablet computer, a digital photo frame, and a navigator.
  • the material of the color resist pattern formed in the spacer region and/or the transparent filler material is blackened to become an opaque material, thereby realizing The effect of preventing the crosstalk caused by the adjacent color resistance; since the BM process is removed in the original process of the color film substrate, the problem of the product due to the BM peeling in the color film substrate can be effectively solved, and the product yield rate is improved. .

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Abstract

一种彩膜基板及其制备方法、显示装置，涉及显示技术领域。通过对形成在间隔区域内的色阻图案的材料和/或透明填充材料进行黑化处理，以使其变为不透光材料，从而实现防止相邻色阻发出的光串扰的效果；由于在彩膜基板的原有制程工序中去除了BM工序，可有效解决产品由于彩膜基板中BM剥离而引起的不良问题，提高了产品良品率。该制备方法包括：提供衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间；在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。

Description

彩膜基板及其制备方法、显示装置
相关申请
本申请要求保护在2017年5月17日提交的申请号为201710351019.4的中国专利申请的优先权，该申请的全部内容以引用的方式结合到本文中。
技术领域
本公开涉及显示技术领域，尤其涉及一种彩膜基板及其制备方法、显示装置。
背景技术
彩膜(Color Filter，简称为CF)基板是显示面板中的重要组成之一。从液晶层透过的背光或从有机电致发光器件发出的白光透过彩膜基板上阵列排布的红、绿、蓝等颜色的色阻，从而发出红、绿、蓝等各种颜色的光，以实现显示面板的彩色显示。为了防止从相邻颜色的色阻透射出的光发生串扰，彩膜基板上通常设置有黑矩阵(Black Matrix，简称为BM)。黑矩阵上形成有阵列排布的间隔开来的多个镂空区域，相邻颜色的色阻涂覆在黑矩阵的镂空区域内，以实现防串扰的目的。
然而，由于BM材料与彩膜基板的衬底之间黏附性较弱，容易发生剥离(Peel off)问题，影响显示面板的正常显示。例如，在液晶显示面板中BM材料剥离后会出现液晶盒内的气泡不良(Bubble)。
公开内容
本公开实施例提供了一种彩膜基板的制备方法，所述制备方法包括：提供衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间；在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：利用掩膜板，采用激光灼烧、紫外曝光、碳化处理和离子掺杂中的任一种方法对所述填充图案进行处理，以使所述填充图案不透光；其中，所述掩膜板的透光区域暴露 所述填充图案，所述掩膜板的不透光区域遮挡所述色阻图案。
在一些实施例中，在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：在所述色阻区域内形成色阻图案，在所述间隔区域内形成具有预设厚度的透光的填充图案；所述填充图案由所述色阻图案的材料或透明填充材料构成；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，所述填充图案包括层叠设置的第一填充图案和第二填充图案；在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：在所述色阻区域内形成色阻图案，在所述间隔区域内形成具有预设厚度的第一填充图案；所述第一填充图案由所述色阻图案的材料或透明填充材料构成；形成覆盖所述色阻图案和所述第一填充图案的保护层；其中，所述保护层覆盖所述第一填充图案的部分为第二填充图案；所述保护层由透明填充材料构成；对所述第二填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，所述填充图案包括层叠设置的第一填充图案、第二填充图案和隔垫物图案；在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：在所述色阻区域内形成色阻图案，在所述间隔区域内形成具有预设厚度的第一填充图案；所述第一填充图案由所述色阻图案的材料或透明填充材料构成；形成覆盖所述色阻图案和所述第一填充图案的保护层；其中，所述保护层覆盖所述第一填充图案的部分为第二填充图案；所述保护层由透明填充材料构成；在所述第二填充图案上形成隔垫物图案；所述隔垫物图案由透明填充材料构成；对所述隔垫物图案进行黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：在所述色阻区域内形成色阻图案；形成覆盖所述色阻图案和所述间隔区域的保护层；其 中，所述保护层覆盖所述间隔区域的部分为填充图案；所述保护层由透明填充材料构成；对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，所述填充图案包括层叠设置的第一填充图案和隔垫物图案；在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：在所述色阻区域内形成色阻图案；形成覆盖所述色阻图案和所述间隔区域的保护层；所述保护层覆盖所述间隔区域的部分为第一填充图案；在所述第一填充图案上形成隔垫物图案；其中，所述隔垫物图案由透明填充材料构成；对所述隔垫物图案进行黑化处理，使得所述填充图案转变为不透光图案。
本公开实施例提供了一种彩膜基板。所述彩膜基板包括：衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间；形成在所述色阻区域内的色阻图案；以及形成在所述间隔区域内的填充图案；所述填充图案由所述色阻图案的材料和/或透明填充材料构成；其中，所述填充图案经过黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，所述填充图案包括层叠设置的第一填充图案和隔垫物图案；所述第一填充图案形成在相邻两个色阻区域之间，所述隔垫物图案覆盖所述第一填充图案；其中，至少所述隔垫物图案经过黑化处理，使得所述填充图案转变为不透光图案。
本公开实施例提供了一种显示装置，包括以上实施例所述的彩膜基板。
附图说明
为了更清楚地说明本公开实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本公开的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本公开实施例提供的彩膜基板的制备方法流程示意图；
图2为本公开实施例提供的彩膜基板中衬底基板的结构示意图；
图3为本公开实施例提供的彩膜基板的结构示意图；
图4为本公开另一实施例提供的彩膜基板的结构示意图；
图5为本公开又一实施例提供的彩膜基板的结构示意图；
图6为本公开另一实施例提供的彩膜基板的结构示意图；
图7为本公开另一实施例提供的彩膜基板的结构示意图；
图8为本公开另一实施例提供的彩膜基板的结构示意图；
图9为本公开另一实施例提供的彩膜基板的结构示意图；
图10为本公开另一实施例提供的彩膜基板的结构示意图；
图11为本公开另一实施例提供的彩膜基板的结构示意图；
图12为本公开另一实施例提供的彩膜基板的结构示意图；
图13为本公开另一实施例提供的彩膜基板的结构示意图；
图14为本公开另一实施例提供的彩膜基板的结构示意图；
图15为本公开另一实施例提供的彩膜基板的结构示意图；
图16为本公开另一实施例提供的彩膜基板的结构示意图；
图17为本公开另一实施例提供的彩膜基板的结构示意图；
图18为本公开另一实施例提供的彩膜基板的结构示意图；
图19为本公开另一实施例提供的彩膜基板的结构示意图；以及
图20为本公开另一实施例提供的彩膜基板的结构示意图。
具体实施方式
下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本公开保护的范围。
需要指出的是，除非另有定义，本公开实施例中所使用的所有术语(包括技术和科学术语)具有与本公开所属领域的普通技术人员共同理解的相同含义。还应当理解，诸如在通常字典里定义的那些术语应当被解释为具有与它们在相关技术的上下文中的含义相一致的含义，而不应用理想化或极度形式化的意义来解释，除非这里明确地这样定义。
例如，本公开专利申请说明书以及权利要求书中所使用的术语“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，仅是用来区分不同的组成部分。“包括”或者“包含”等类似的词语 意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“一侧”、“另一侧”等指示的方位或位置关系的术语为基于附图所示的方位或位置关系，仅是为了便于说明本公开的技术方案的简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本公开的限制。
本公开实施例提供了一种彩膜基板的制备方法。如图1所示，该制备方法包括以下步骤。
步骤S01，提供衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间。
步骤S02，在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案。
步骤S03，对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
需要说明的是，第一、本公开实施例对上述色阻图案的颜色、排布方式均不作限定，具体可沿用相关技术中彩膜基板的相应设计。示例的，色阻图案(Red Resin、红色色阻；Green Resin、绿色色阻；Blue Resin、蓝色色阻)的排列方式可以为条形、马赛克形、品字形(Delta形)等，本公开实施例对此不再赘述。
其中，基板1上的间隔区域1B即相关技术中原本要形成BM的空缺区域。
在本公开的上下文中，“不透光图案”意味着该图案能够遮挡在垂直于衬底基板的表面的方向上行进的光线。例如，在图4、6、11-13、16、17、19和20中，用黑色图案来表示“不透光图案”。
第二、在相关技术中，BM材料通常是由不透明的金属Cr、氧化铬(CrO x)、黑色的石墨等添加有颜料和/或染料的树脂材料构成；而在本公开实施例中，色阻图案的材料通常是红色、绿色、蓝色等光可透过的材料，显然是不同于相关技术中的BM材料的。通过对色阻图案的材料和/或透明填充材料进行黑化处理，可以使得这些透光材料转变为遮光材料，从而起到与BM材料相同的隔离色阻的作用。
这里，上述的“黑化处理”，是指通过相应的化学手段改变色阻图案的材料和/或透明填充材料，以使其转变为遮光材料。
第三、本公开实施例对上述的对位于间隔区域内的填充材料进行黑化处理的步骤和在色阻区域内形成色阻图案的步骤的先后顺序不作限定，对位于间隔区域内的填充材料进行黑化处理的步骤可以在形成色阻图案的步骤之前或之后进行。
例如，当填充图案包括有色阻图案的材料时，即对色阻图案的材料采用一次构图工艺处理。形成位于色阻区域内的色阻图案的同时，还形成了位于间隔区域内的色阻图案的材料；这部分材料构成了间隔区域内的填充图案(或其中一部分)的情况时，对位于间隔区域内的填充材料进行黑化处理的步骤则是在形成色阻图案与填充图案的步骤之后。
并且，在上述填充图案包括有透明填充材料时，该透明填充材料可以为形成保护层和/或形成隔垫物的材料。即，上述制备方法在形成色阻图案的具体步骤之后，还可包括有形成保护层的步骤，或者依次形成保护层和隔垫物的步骤。因此，上述的透明填充材料具体可以为保护层位于该间隔区域内的部分，或者为保护层位于该间隔区域内的部分和设置在该区域内的隔垫物。从而可以节约生产成本，进一步简化CF的制作工序。
基于此，通过本公开实施例提供的上述制备方法，通过对形成在间隔区域内的色阻图案的材料和/或透明填充材料进行黑化处理，以使其变为不透光材料，从而实现防止相邻色阻发出的光串扰的效果；由于在彩膜基板的原有制程工序中去除了BM工序，可有效解决产品由于彩膜基板中BM剥离而引起的不良问题，提高了产品良品率。
进一步的，上述黑化处理的步骤具体包括，利用掩膜板进行适当尺寸的遮挡，采用激光灼烧、紫外曝光、碳化处理和离子掺杂中的任一种方法对所述填充图案进行处理，以使所述填充图案不透光；其中，掩膜板的透光区域暴露填充图案，掩膜板的不透光区域遮挡色阻图案。
其中，激光灼烧是指利用激光的高能量对色阻图案的材料和/或透明填充材料进行加热，以使其发生烧灼，颜色变为不透明的遮光材料。
紫外曝光是指通过紫外光照射的方式使色阻图案的材料和/或透明填充材料中的光引发剂与色阻图案的材料或透明填充材料的主体材料发生一系列的化学反应，从而使色阻图案的材料或透明填充材料整体呈现不透光的效果。在此情况下，色阻图案的材料和/或透明填充材料 中还包括有光引发剂。
碳化处理是指对含碳链的有机材料进行高温处理，以使其颜色变为不透光的材料。由于色阻图案的材料通常为有机材料，该处理方法可适用于对色阻图案的材料的处理，和/或对上述透明填充材料具体为有机透明填充材料时的处理。
离子掺杂处理是指对色阻图案的材料和/或透明填充材料进行掺杂，通过改变材料的组分使其变为遮光材料。示例的，可以通过采用等离子体化学气相沉积或等离子体源对色阻图案的材料和/或透明填充材料进行氢等离子体处理，以使其变为遮光材料。
下面提供5个实施例，用于详细描述上述的制备方法。
本公开实施例提供如图2所示的衬底基板1，所述衬底基板1的表面包括多个独立的色阻区域1A和多个间隔区域1B，每个间隔区域1B位于相邻两个色阻区域1A之间；该实施例提供一种彩膜基板的具体制备方法，该制备方法包括但不限于以下步骤。
步骤S11，如图3或图4所示，在色阻区1A内形成色阻图案(图中以R、G、B标记示意出)，在间隔区域1B内形成具有预设厚度的透光的填充图案2；该填充图案由色阻图案的材料或透明填充材料构成；
步骤S12，如图5或图6所示，对填充图案2进行黑化处理，使得所述填充图案转变为不透光图案。
需要说明的是，第一、填充图案2具有预设厚度，该预设厚度具体为相关技术中具有同等尺寸的彩膜基板中的BM的厚度，以使得本实施例形成的彩膜基板的厚度与相关技术包括有BM的彩膜基板的厚度相同，满足产品的具体应用要求。
第二、参考图3所示，当上述填充图案2由色阻图案的材料构成时，色阻区1A内形成色阻图案的步骤与在间隔区域1B内形成具有预设厚度的填充图案2的步骤可在同一次构图工艺下形成。其中，用于形成填充图案2的色阻材料可以为红/绿/蓝等颜色的色阻材料(R/G/B Resin)中的任一种。
即，在形成红/绿/蓝等任一种颜色的色阻图案时，在间隔区域1B内也保留该颜色的色阻材料，以形成填充图案2。示例的，可以在形成R色阻的工序涂布时在间隔区域1B内也涂布上R色阻的材料，之后再 进行G/B色阻的涂布。
在此之后，参考图5所示，可通过掩膜板的遮挡，对填充图案2进行黑化处理，以使其转变为不透光图案，起到相关技术中BM的作用。
第三、参考图4所示，当上述填充图案2其他透明填充材料构成时，可以先形成填充图案2。之后，再通过掩膜板的遮挡，对填充图案2进行黑化处理，以使其转变为不透光图案，起到相关技术中BM的作用。
在此之后，参考图6所示，可再形成R/G/B的色阻图案。并且，为了防止漏光，R/G/B的色阻图案的两端可以搭接在填充图案2之上。
本公开另一实施例提供如图2所示的衬底基板1，所述衬底基板1的表面包括多个独立的色阻区域1A和多个间隔区域1B，每个间隔区域1B位于相邻两个色阻区域1A之间；该实施例提供一种彩膜基板的具体制备方法，该制备方法包括但不限于以下步骤。
步骤S21，如图7或图8所示，在色阻区域1A内形成色阻图案(图中以R、G、B标记示意出)，在间隔区域1B内形成具有预设厚度的第一填充图案21；该第一填充图案21由色阻图案的材料或透明填充材料构成。
步骤S22，如图9或图10所示，形成覆盖色阻图案和第一填充图案21的保护层(Over Coat，简称为OC)3；其中，该保护层3覆盖第一填充图案21的部分为第二填充图案22；该保护层3由透明填充材料构成。
步骤S23，如图11或图12所示，对第二填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
需要说明的是，第一、上述的填充图案2包括层叠设置的第一填充图案21和第二填充图案22。
第二、在上述步骤S21中，第一填充图案21由色阻图案的材料或透明填充材料构成的结构可参见前述实施例，本实施例对此不做赘述。
第三、本实施例还可以包括对在先形成的第一填充图案21进行黑化处理的步骤，以形成如图13所示的结构，从而进一步加强遮光效果。具体步骤可参考前述描述，本实施例对此不做赘述。
本公开又一实施例提供如图2所示的衬底基板1，所述衬底基板1 的表面包括多个独立的色阻区域1A和多个间隔区域1B，每个间隔区域1B位于相邻两个色阻区域1A之间；该实施例提供一种彩膜基板的具体制备方法，该制备方法包括但不限于以下步骤。
步骤S31，参考图7或图8所示，在色阻区域内形成色阻图案(图中以R、G、B标记示意出)，在间隔区域内形成具有预设厚度的第一填充图案；第一填充图案由色阻图案的材料或透明填充材料构成。
步骤S32，参考图9或图10所示，形成覆盖色阻图案和第一填充图案21的保护层3；其中，保护层3覆盖第一填充图案21的部分为第二填充图案22；所述保护层3由透明填充材料构成。
步骤S33，如图14或图15所示，在第二填充图案22上形成隔垫物图案4；该隔垫物图案4由透明填充材料构成。
步骤S34，如图16或图17所示，对上述的隔垫物图案4进行黑化处理，使得所述填充图案转变为不透光图案。
需要说明的是，需要说明的是，第一、上述的填充图案2包括层叠设置的第一填充图案21、第二填充图案22和隔垫物图案4。
第二、隔垫物图案4(Post Spacer，简称为PS)的横截面形状可以为覆盖在R/G/B色阻图案之间的长条柱状。隔垫物图案4可在起到相关技术中的BM的遮挡效果的同时，增加对于彩膜基板与阵列基板之间的支撑强度。其具体制备过程可沿用相关技术，本实施例对此不再赘述。
此外，本实施例还可包括对隔垫物图案4下方的第二填充图案22和/或第一填充图案21进行黑化处理的步骤，以进一步加强遮光效果。
本公开另一实施例提供如图2所示的衬底基板1，所述衬底基板1的表面包括多个独立的色阻区域1A和多个间隔区域1B，每个间隔区域1B位于相邻两个色阻区域1A之间；该实施例提供一种彩膜基板的具体制备方法，该制备方法包括但不限于以下步骤。
步骤S41，如图18所示，在色阻区域1A内形成R/G/B色阻图案。
步骤S42，如图18所示，形成覆盖R/G/B色阻图案和间隔区域1B的保护层3；其中，保护层3覆盖间隔区域1B的部分为填充图案；保护层3由透明填充材料构成。
步骤S43，如图19所示，对填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
即，填充图案为保护层覆盖间隔区域1B的部分，具体结构可参见前述实施例，本实施例对此不再赘述。
这里，相比于上述实施例，本实施例直接采用保护层的一部分作为填充图案，结构更为简单，更易于实现。
本公开另一实施例提供如图2所示的衬底基板1，所述衬底基板1的表面包括多个独立的色阻区域1A和多个间隔区域1B，每个间隔区域1B位于相邻两个色阻区域1A之间；该实施例提供一种彩膜基板的具体制备方法，该制备方法包括但不限于以下步骤。
步骤S51，如图20所示，在色阻区域内形成R/G/B色阻图案。
步骤S52，如图20所示，形成覆盖R/G/B色阻图案和间隔区域1B的保护层3；保护层3覆盖间隔区域1B的部分为第一填充图案。
步骤S53，如图20所示，在第一填充图案上形成隔垫物图案4；其中，隔垫物图案4由透明填充材料构成。
步骤S54，如图20所示，对隔垫物图案4进行黑化处理，使得所述填充图案转变为不透光图案。
上述的填充图案2包括层叠设置的第一填充图案和隔垫物图案，具体结构可参见前述实施例，本实施例对此不再赘述。
这里，相比于上述几个实施例，本实施例中的填充图案包括保护层的一部分和设置在原本BM区域上的隔垫物图案，结构较为简单，易于实现。
在上述基础上，本公开实施例还提供了一种彩膜基板，包括：衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间；形成在所述色阻区域内的色阻图案；以及形成在所述间隔区域内的填充图案；所述填充图案由所述色阻图案的材料和/或透明填充材料构成；其中，所述填充图案经过黑化处理，使得所述填充图案转变为不透光图案。
在一些实施例中，所述填充图案包括层叠设置的第一填充图案和隔垫物图案；所述第一填充图案形成在相邻两个色阻区域之间，所述隔垫物图案覆盖所述第一填充图案；其中，至少所述隔垫物图案经过黑化处理，使得所述填充图案转变为不透光图案。
其中，保护层OC的材料具体可以包括，主体基材，如环氧树脂、PI-type聚合物(脂环聚酰亚胺)等；添加在主体基材中的如(羧基类) 固化剂、表面活性剂等添加剂。
隔垫物图案的材料具体可以为丙二醇甲醚醋酸酯(propylene glycol monomethyl ether acetate，简称为PGMEA)、二甘醇二甲醚(Bis(2-methoxy ethyl)ether，简称为DG)等。
在上述基础上，本公开实施例还提供了一种显示装置，包括有上述的彩膜基板。上述显示装置具体可以是液晶显示器、液晶电视、有机电致发光显示器、有机电致发光电视、数码相框、手机、平板电脑、数码相框、导航仪等具有任何显示功能的产品或者部件。
基于此，通过本公开实施例提供的上述制备方法，通过对形成在间隔区域内的色阻图案的材料和/或透明填充材料进行黑化处理，以使其变为不透光材料，从而实现防止相邻色阻发出的光串扰的效果；由于在彩膜基板的原有制程工序中去除了BM工序，可有效解决产品由于彩膜基板中BM剥离而引起的不良问题，提高了产品良品率。
以上所述，仅为本公开的具体实施方式，但本公开的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本公开揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应以所述权利要求的保护范围为准。

Claims (10)

  1. 一种彩膜基板的制备方法，包括：
    提供衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间；
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及
    对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
  2. 根据权利要求1所述的制备方法，其中，对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：
    利用掩膜板，采用激光灼烧、紫外曝光、碳化处理和离子掺杂中的任一种方法对所述填充图案进行处理，以使所述填充图案不透光；
    其中，所述掩膜板的透光区域暴露所述填充图案，所述掩膜板的不透光区域遮挡所述色阻图案。
  3. 根据权利要求1所述的制备方法，其中，在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成具有预设厚度的透光的填充图案；所述填充图案由所述色阻图案的材料或透明填充材料构成；以及
    对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
  4. 根据权利要求1所述的制备方法，其中，所述填充图案包括层叠设置的第一填充图案和第二填充图案；
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成具有预设厚度的第一填充图案；所述第一填充图案由所述色阻图案的材料或透明填充材料构成；
    形成覆盖所述色阻图案和所述第一填充图案的保护层；其中，所述保护层覆盖所述第一填充图案的部分为第二填充图案；所述保护层由透明填充材料构成；
    对所述第二填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
  5. 根据权利要求1所述的制备方法，其中，所述填充图案包括层叠设置的第一填充图案、第二填充图案和隔垫物图案；
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成具有预设厚度的第一填充图案；所述第一填充图案由所述色阻图案的材料或透明填充材料构成；
    形成覆盖所述色阻图案和所述第一填充图案的保护层；其中，所述保护层覆盖所述第一填充图案的部分为第二填充图案；所述保护层由透明填充材料构成；
    在所述第二填充图案上形成隔垫物图案；所述隔垫物图案由透明填充材料构成；
    对所述隔垫物图案进行黑化处理，使得所述填充图案转变为不透光图案。
  6. 根据权利要求1所述的制备方法，其中，在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：
    在所述色阻区域内形成色阻图案；
    形成覆盖所述色阻图案和所述间隔区域的保护层；其中，所述保护层覆盖所述间隔区域的部分为填充图案；所述保护层由透明填充材料构成；
    对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案。
  7. 根据权利要求1所述的制备方法，其中，所述填充图案包括层叠设置的第一填充图案和隔垫物图案；
    在所述色阻区域内形成色阻图案，在所述间隔区域内形成透光的填充图案；以及对所述填充图案进行黑化处理，使得所述填充图案转变为不透光图案的步骤，包括：
    在所述色阻区域内形成色阻图案；
    形成覆盖所述色阻图案和所述间隔区域的保护层；所述保护层覆盖所述间隔区域的部分为第一填充图案；
    在所述第一填充图案上形成隔垫物图案；其中，所述隔垫物图案由透明填充材料构成；
    对所述隔垫物图案进行黑化处理，使得所述填充图案转变为不透光图案。
  8. 一种彩膜基板，包括：
    衬底基板，所述衬底基板的表面包括多个独立的色阻区域和多个间隔区域，每个间隔区域位于相邻两个色阻区域之间；
    形成在所述色阻区域内的色阻图案；以及形成在所述间隔区域内的填充图案；所述填充图案由所述色阻图案的材料和/或透明填充材料构成；
    其中，所述填充图案经过黑化处理，使得所述填充图案转变为不透光图案。
  9. 根据权利要求8所述的彩膜基板，其中，所述填充图案包括层叠设置的第一填充图案和隔垫物图案；所述第一填充图案形成在相邻两个色阻区域之间，所述隔垫物图案覆盖所述第一填充图案；
    其中，至少所述隔垫物图案经过黑化处理，使得所述填充图案转变为不透光图案。
  10. 一种显示装置，包括如权利要求8或9所述的彩膜基板。
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