WO2018176783A1 - 掩膜板及其制造方法以及显示装置 - Google Patents

掩膜板及其制造方法以及显示装置 Download PDF

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WO2018176783A1
WO2018176783A1 PCT/CN2017/104765 CN2017104765W WO2018176783A1 WO 2018176783 A1 WO2018176783 A1 WO 2018176783A1 CN 2017104765 W CN2017104765 W CN 2017104765W WO 2018176783 A1 WO2018176783 A1 WO 2018176783A1
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WIPO (PCT)
Prior art keywords
region
transmittance
center
edge
mask
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PCT/CN2017/104765
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English (en)
French (fr)
Inventor
宋萍
李红敏
董职福
薛伟
廖力勍
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京东方科技集团股份有限公司
合肥京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/771,278 priority Critical patent/US10890789B2/en
Publication of WO2018176783A1 publication Critical patent/WO2018176783A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present disclosure relates to a mask, a method of manufacturing the same, and a display device.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • the TFT-LCD panel is mainly made up of a color film substrate and an array substrate, and a space spacer (Photo Spacer, PS for short) is used to isolate the gap into which the liquid crystal is injected.
  • the PS is usually obtained by exposing a photoresist layer deposited on a color filter substrate using a mask.
  • the mask is an assembly for patterning in a photolithography process of a TFT-LCD, and the mask is mainly composed of a transparent substrate and an opaque region having a specific pattern formed on the transparent substrate.
  • an opaque film layer for example, a chrome layer
  • a specific pattern is patterned on the opaque film layer.
  • the PS height uniformity is a key parameter that affects the optical characteristics of the product.
  • proximity exposure when proximity exposure is used, the height of the PS obtained by the exposure is not uniform, and the process margin of the liquid crystal instillation amount is reduced, resulting in problems such as high temperature yellowing, yellowing adsorption, and excessive bubbles.
  • a mask including a light transmissive substrate and formed in the transparent A mask pattern on the light substrate, wherein the transmittance of the light-permeable substrate decreases from the edge to the center.
  • the light-permeable substrate includes a transparent substrate having uniform transmittance and a compensation layer covering the transparent substrate from a margin to a center, and the mask is removed.
  • a pattern is formed on one side of the transparent substrate, and the compensation layer covers the other side of the transparent substrate.
  • the transmittance decreases from edge to center to decrease from 100% to 70%.
  • the decreasing extent of the edge-to-center transmittance is adjusted according to the magnitude of the change in the exposure distance of the mask from the edge to the center to the exposure machine.
  • the compensation layer comprises at least one of: polypropylene, polyethylene, polyvinyl chloride, polyethylene terephthalate.
  • the materials of the first region to the Nth region are the same, and the thickness of the ith region is smaller than the i+1 region.
  • each of the first to Nth regions is painted differently in color.
  • the permeable substrate is composed of a first region to an Nth region from the edge to the center, and the ith region surrounds the i+1 region, and the transmittance of the ith region is greater than
  • the first region to the Nth region have the same material, and the ith region has a thickness smaller than the (i+1)th region.
  • each of the first to Nth regions is painted differently in color.
  • a method of fabricating a mask comprising: providing a transparent substrate having a uniform transmittance; and covering a side of the transparent substrate with a compensation layer having a transmittance decreasing from an edge to a center; A mask pattern is formed on the other side of the transparent substrate.
  • the transmittance of the compensation layer decreases from edge to center to decrease from 100% to 70%.
  • a display device comprising a spacer made of a mask as described above.
  • FIG. 1 is a schematic view showing a column spacer obtained by exposing a mask in the related art
  • FIG. 2 is a schematic structural view of a mask provided according to some embodiments of the present disclosure.
  • FIG. 3 is a schematic view of a mask provided according to further embodiments of the present disclosure.
  • FIG. 4 is a schematic diagram of applying a mask provided after exposure according to some embodiments of the present disclosure to obtain a column spacer.
  • the mask 20 is fixed by the mask holder 30, and the mask 20 exposes the photoresist layer deposited on the color filter substrate to develop a column spacer. 40. Since the mask 20 is bent by its own weight, the curvature increases as the size of the mask increases. The physical bending of the mask causes the mask to be different from the exposure machine (for supporting the glass substrate). As can be seen from Fig. 1, the distance between the mask and the exposure machine is usually 200 to 300 um. However, the distance between the central area and the exposure machine table due to bending is reduced by about 50 um, and the specific gravity is relatively large.
  • the PS is greatly affected by Gap, and the Gap is different, so that the Panel on the glass substrate 10 exhibits a significant difference in PS height due to the position of the mask.
  • the bending causes the PS height of the central region of the mask to be exposed to be high, while the peripheral PS height is low, showing a significant gradient distribution.
  • the actual test found that the height of the PS at the center of the mask is about 0.1 ⁇ m higher than the surrounding.
  • the height of the PS is uneven, and the process margin of the liquid crystal dropping amount is reduced, resulting in high temperature Low reliability problems such as yellow, yellowing, and excessive bubbles greatly affect product quality.
  • adjusting the transmittance of the mask, using the transmittance to the exposure distance Compensation is made to make the height of the column spacers more uniform. Since the exposure distance of the edge of the mask is the longest, the exposure distance of the center is the shortest, and the exposure distance from the edge to the center is decreasing. Therefore, the transmittance of the edge of the mask is set to be the largest, the transmittance of the center is the smallest, and the transmittance is from the edge. Increasing to the center to compensate for the inconsistent height of the column spacers due to inconsistent exposure distances makes the column spacers more uniform in height.
  • Some embodiments of the present disclosure provide a mask comprising a permeable substrate, the transmittance of the permeable substrate decreasing from edge to center.
  • a mask pattern is formed on one side of the light transmissive substrate.
  • the transmittance refers to the ratio of the radiant energy projected and transmitted through the object to the total radiant energy projected onto the object during the process in which the incident light flux exits from the illuminated surface or the medium incident surface to the other side.
  • the different transmittances of the permeable substrate from edge to center can be achieved in a variety of ways.
  • the edge-to-center transmittance is different, or a two-layer structure is used, one layer is a transparent substrate with uniform transmittance, and the other layer is The compensation layer with decreasing transmittance; or, the thickness of the permeable substrate is changed such that the transmittance of the light-permeable substrate from the edge to the center is different, or the material having different transmittance is used from the edge to the center, and the like.
  • some embodiments of the present disclosure provide a mask panel including a transparent substrate 50 having uniform transmittance, and a compensation layer 60 covering the transparent substrate 50, the compensation The transmittance of layer 60 decreases from edge 70 to center 80.
  • the mask pattern is on one side of the transparent substrate 50
  • the compensation layer 60 is on the other side of the transparent substrate 50 opposite to the mask pattern.
  • the edge 70 refers to the edge of the effective area of the mask, that is, the edge of the area for exposing the columnar spacer, and the transmittance of the position outside the effective area can be the edge of the effective area.
  • the transmission rate is consistent and can be inconsistent.
  • the material of the transparent substrate 50 may include quartz, but is not limited thereto.
  • the transmittance of the compensation layer 60 may be divided into a plurality of regions from the edge to the center, and the region near the edge surrounds the region near the center, and the transmittance near the edge region is smaller than the region near the center.
  • the transmission rate in one area is the same.
  • An exemplary division manner is as shown in FIG. 3, which includes a first region 61, a second region 62, a third region 63, and a fourth region 64 in order from the edge to the center, and the transmittances in the same region are consistent, and the first The transmittance of the region 61 is greater than the second region 62, the transmittance of the second region 62 is greater than the third region 63, and the transmittance of the third region 63 is greater than the fourth region 64.
  • the area 65 shown in FIG. 3 is an inactive area, that is, an area that does not participate in exposure, which is transmitted through
  • the rate is not limited and may be identical to the first area 61 or may be inconsistent.
  • the fourth area 64 is a rectangular area of 500*300 centered
  • the third area 63 is a rectangular area of 700*450.
  • the second region 62 is a region other than the third region 63 and the fourth region 64 among the rectangular regions of 900*600
  • the first region 61 is a rectangular region of 1100*750 except the second A region outside the region 62, the third region 63, and the fourth region 64.
  • the area division manner shown in FIG. 3 is only an example, and may be actually divided into fewer areas, for example, divided into three areas, or divided into more areas, for example, the compensation layer 60.
  • the first region to the Nth region from the edge to the center, and the i-th region surrounds the i+1th region, and the transmittance of the i-th region is larger than the i+1th region, and the transmittance in each region is uniform.
  • the i 1, . . . , N-1, wherein the N is a natural number and N>1.
  • the shape of the area may also be changed, such as a circular or elliptical shape or an irregular shape, etc., and the size of each area may also be divided as needed.
  • the compensation layer 60 is made of a material having a high surface flatness, a high transmittance, and a high electrostatic conductivity, such as a film made of a polymer material.
  • the polymer material includes at least one of the following: PP (polypropylene) / PVC (polyvinyl chloride) / PE (polyethylene) / PET (polyethylene terephthalate), etc., here only For example, other polymeric materials can also be used to make the compensation layer 60.
  • the compensation layer 60 in order to achieve a decrease in transmittance from edge to center, may be made of the same material, but with increasing thickness from the center to the edge, thereby achieving the purpose of decreasing transmission.
  • the first region 61 of the compensation layer 60 may not cover the film
  • the second region 62 is covered with a film
  • the third region 63 is covered with a film having a thickness exceeding the second region 62
  • the fourth region 64 is covered with a film.
  • a film having a layer thickness exceeding the third region since the materials are the same, and the thickness is increased, the transmittance is decreased, thereby achieving the purpose of decreasing from the edge to the center.
  • the compensation layer 60 may also be made of materials having the same thickness but different transmittances.
  • the first region 61 may not cover the film, and the second region 62, the third region 63, and the fourth region 64 respectively cover films made of different materials, and the transmittance of materials of each region satisfies: The second region 62 > the third region 63 > the fourth region 64.
  • the first region 61 is not covered with a film.
  • the first region 61 may also be covered with a film.
  • the second region 62 is covered with a film having a thickness greater than that of the first region 61
  • the third region 63 is covered with a layer having a thickness exceeding the second region.
  • 62 film, fourth region 64 covered with a layer thickness The film exceeding the third region 63 is such that the transmittance satisfies the first region 61 > the second region 62 > the third region 63 > the fourth region 64.
  • the change in transmittance can also be achieved by applying a different color to each of the first to Nth regions.
  • the magnitude of the decrease in the transmittance of the compensation layer 60 from the edge to the center is adjusted according to the magnitude of the change in the exposure distance of the mask from the edge to the center to the machine of the exposure machine. Because the transmittance is the compensation of the exposure distance, the longer the exposure distance is, the larger the transmittance is, the smaller the exposure distance is, and the smaller the transmittance is, the smaller the transmittance can be, according to the variation range of the exposure distance. modulation. Therefore, the transmittance of the compensation layer 60 can be set according to the difference in exposure distance due to the degree of bending.
  • the transmittance reduction from edge to center can be set to decrease from 100% to 70%.
  • the transmittance of the first region 61 can be set to 100%
  • the transmittance of the fourth region 64 can be set to 70%
  • the PS heights of the center and the edge are substantially the same.
  • the transmittance of other regions can be set according to the degree of bending of the mask in this region.
  • the transmittance of the second region 62 may be set to 90%
  • the transmittance of the third region 63 may be set to 80%.
  • the above transmittance values are only examples, and may be set to other values as needed to make the PS heights more uniform.
  • the size and weight of the mask are changed, resulting in a change in the degree of bending of the mask, it is necessary to change the transmittance of each region accordingly.
  • a transmittance that makes the PS height more uniform can be obtained by testing, or the relationship between the transmittance, the exposure distance, and the PS height can be estimated first, and the transmittance is determined according to the relationship, and then tested, according to The test results adjust the transmittance of each area.
  • it can also be simplified by directly setting the transmittance to be evenly decremented from the edge to the center.
  • the transmittance is decreased from the edge to the center, thereby compensating for the curvature of the mask due to the self-weight of the mask.
  • the edge-to-center exposure distance is reduced, so that the shape of the column spacer obtained by exposure of the mask is more uniform, and the quality of the liquid crystal panel is improved.
  • the embodiment described with reference to FIG. 3 is described with respect to the division of the compensation layer 60, embodiments of the present disclosure are not limited thereto.
  • the area division described with respect to FIG. 3 can be performed directly on the permeable substrate.
  • the edge-to-center transmittance is different based on similar area division of the permeable substrate, for example by applying different colors to different areas of the permeable substrate. For example, in some embodiments, each of the first to Nth regions is painted differently in color.
  • the edge-to-center transmittance is different based on similar area division of the permeable substrate, for example by achieving different thicknesses in different areas of the permeable substrate.
  • the materials of the first region to the Nth region are the same, and the thickness of the i-th region is smaller than the (i+1)th region.
  • FIG. 4 a schematic diagram of exposure for use with a mask provided by some embodiments of the present disclosure.
  • the transmittance from the edge to the center is decreased, although the exposure distance of the edge is large, the transmittance of the edge is large, and the light transmitted by the light is more, and the exposure is performed. Compensation, while the center has a small exposure distance, but its transmittance is small. Therefore, the difference in PS height between the edge and the center exposure is reduced, and the uniformity of the PS height is enhanced.
  • Some embodiments of the present disclosure also provide a method of fabricating a mask comprising: providing a transparent substrate having uniform transmittance; covering a side of the transparent substrate with a compensation layer having a transmittance decreasing from an edge to a center; A mask pattern is formed on the other side of the transparent substrate.
  • the transmittance of the compensation layer decreases from edge to center to decrease from 100% to 70%.
  • the mask is not limited to exposure to the PS, and may be applied to other patterns that require exposure using a mask, and the transmittance may be changed according to the needs of the pattern.
  • a display device comprising a spacer made of a mask as described above.
  • the display device can be, but is not limited to, a liquid crystal display panel, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like, and any product or component having a display function.

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  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
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  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
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Abstract

一种掩膜板及其制造方法以及显示装置，该掩膜板包括可透光基板以及形成在该可透光基板上的掩膜图形，其中该可透光基板的透过率从边缘到中心递减。

Description

掩膜板及其制造方法以及显示装置
相关申请的交叉引用
本申请要求于2017年3月30日提交的中国专利申请第201710200644.9号的优先权，该申请的公开通过引用被全部结合于此。
技术领域
本公开涉及掩膜板及其制造方法以及显示装置。
背景技术
随着液晶显示技术的发展，大尺寸，高品质，低成本成为未来发展方向。目前，随着对大尺寸的追求，TFT-LCD(Thin Film Transistor Liquid Crystal Display，薄膜场效应晶体管液晶显示器)制造不断向高世代发展。
TFT-LCD面板主要由彩膜基板和阵列基板对盒而成，两者间以柱状隔垫物(Photo Spacer，简称PS)隔离出注入液晶的空隙。PS通常是使用掩膜板对沉积在彩膜基板上的光刻胶层进行曝光之后进行显影得到。掩膜板是在TFT-LCD的光刻工艺中用于进行图形制作的一种组件，掩膜板主要由透明基板和形成在该透明基板上的具有特定图形的不透光区域组成。通常制作掩膜板时，主要是在透明基板上沉积一层不透光膜层(例如铬层)，然后在该不透光膜层上刻画特定图形。
在TFT_LCD成盒工艺中PS高度均一性是影响产品光学特性非常关键的参数，PS高度均一性越好，对液晶滴入量变化要求越低，液晶填入量margin(波动范围)越大，从而能够更好地控制盒厚，同时在信赖性评价方面可以保证玻璃基板上所有Panel(液晶面板)光学及相关特性一致，没有玻璃面取向之差，提高良率。相关技术中，采用接近式曝光时，曝光所得的PS高度不均，造成液晶滴入量的工艺margin缩小，导致出现高温发黄、吸附发黄、气泡偏多等信赖性不良问题。
发明内容
根据本公开的一些实施例，提供了一种掩膜板，包括可透光基板以及形成在所述可透 光基板上的掩膜图形，其中所述可透光基板的透过率从边缘到中心递减。
在本公开的一些实施例中，所述可透光基板包括透过率一致的透明基板和覆盖在所述透明基板上的透过率从边缘到中心递减的补偿层，且，所述掩膜图形形成在所述透明基板的一侧，所述补偿层覆盖在所述透明基板的另一侧。
在本公开的一些实施例中，所述透过率从边缘到中心递减为从100％到70％递减。
在本公开的一些实施例中，所述从边缘到中心的透过率递减时其递减幅度根据所述掩膜板从边缘到中心到曝光机的机台的曝光距离的变化幅度进行调整。
在本公开的一些实施例中，所述补偿层包括如下至少之一：聚丙烯、聚乙烯、聚氯乙烯、聚对苯二甲酸乙二醇酯。
在本公开的一些实施例中，所述补偿层由从边缘到中心的第1区域至第N区域组成，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。在本公开的一些实施例中，所述第1区域至第N区域的材料相同，且第i区域的厚度小于第i+1区域。在另一些实施例中，所述第1区域至第N区域中的每个区域涂的颜色不同。
在本公开的一些实施例中，所述可透光基板由从边缘到中心的第1区域至第N区域组成，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。在一些实施例中，所述第1区域至第N区域的材料相同，且第i区域的厚度小于第i+1区域。在另一些实施例中，所述第1区域至第N区域中的每个区域涂的颜色不同。
根据本公开的一些实施例，提供一种掩膜板的制造方法，包括：提供透过率一致的透明基板；在所述透明基板的一侧覆盖透过率从边缘到中心递减的补偿层；在所述透明基板的另一侧形成掩膜图形。
在本公开的一些实施例中，所述补偿层的透过率从边缘到中心递减为从100％到70％递减。
在本公开的一些实施例中，按如下方式覆盖形成所述补偿层：在所述透明基板的一侧从边缘到中心依次覆盖第1区域至第N区域，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。
根据本公开的一些实施例，还提供一种显示装置，包括隔垫物，该隔垫物是采用如上所述的掩膜板制作的。
附图说明
附图用来提供对本公开技术方案的进一步理解，并且构成说明书的一部分，与本申请的实施例一起用于解释本公开的技术方案，并不构成对本公开技术方案的限制。
图1为相关技术中掩膜板曝光得到柱状隔垫物示意图；
图2为根据本公开一些实施例提供的掩膜板结构示意图；
图3为根据本公开另一些实施例提供的掩膜板示意图；
图4为应用根据本公开的一些实施例提供的掩膜板后进行曝光得到柱状隔垫物的示意图。
具体实施方式
为使本公开的目的、技术方案和优点更加清楚明白，下文中将结合附图对本公开的实施例进行详细说明。需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互任意组合。
在附图的流程图示出的步骤可以在诸如一组计算机可执行指令的计算机***中执行。并且，虽然在流程图中示出了逻辑顺序，但是在某些情况下，可以以不同于此处的顺序执行所示出或描述的步骤。
如图1所示，在接近式曝光工艺中，掩膜板20由掩膜架30固定，掩膜板20对沉积在彩膜基板上的光刻胶层进行曝光之后进行显影得到柱状隔垫物40。由于掩膜板20自重导致掩膜板弯曲，随着掩膜板的尺寸增大，该弯曲随之增大。掩膜板物理弯曲导致掩膜板同曝光机机台(用于支撑玻璃基板)距离(Gap)不同，从图1中可以看到，掩膜板与曝光机机台的距离通常为200～300um，而由于弯曲导致的中心区域同曝光机机台的距离减少约50um，比重比较大。PS受Gap影响较大，Gap不同从而造成玻璃基板10上的Panel因所处掩膜板位置不同PS高度呈现明显的差异。该弯曲导致掩膜板曝光中心区域的PS高度偏高，而周边PS高度偏低，呈明显梯度分布。实际测试发现，掩膜板中心处的PS高度比周边高0.1um左右。此种PS高度不均造成液晶滴入量的工艺margin缩小导致出现高温发 黄、吸附发黄、气泡偏多等信赖性不良问题，大大影响产品品质。
本公开的一些实施例中，为了改善由于掩膜板自重出现弯曲从而曝光距离不一致导致曝光形成的柱状隔垫物高度不一致的问题，调整掩膜板的透过率，用透过率对曝光距离进行补偿，进而使得柱状隔垫物的高度更为均一。由于掩膜板边缘的曝光距离最长，中心的曝光距离最短，从边缘到中心曝光距离递减，因此，设置掩膜板边缘的透过率最大，中心的透过率最小，透过率从边缘到中心递增，从而补偿由于曝光距离不一致导致的柱状隔垫物高度不一致，使得柱状隔垫物高度更为均一。
本公开的一些实施例提供一种掩膜板，包括可透光基板，该可透光基板的透过率从边缘到中心递减。该可透光基板的一侧形成有掩膜图形。其中，透过率是指在入射光通量自被照面或介质入射面至另外一面离开的过程中，投射并透过物体的辐射能与投射到物体上的总辐射能之比。该可透光基板从边缘到中心的不同透过率可以通过多种方式达到。比如，通过将可透光基板从边缘到中心涂上不同的颜色，使得边缘到中心的透过率不同，或者，采用双层结构，一层为透过率一致的透明基板，另一层为透过率递减的补偿层；或者，改变可透光基板的厚度，使得可透光基板从边缘到中心的透过率不同，或者，从边缘到中心采用透过率不同的材料，等等。
如图2所示，本公开的一些实施例提供一种掩膜板，该掩膜板包括透过率一致的透明基板50，以及，覆盖在所述透明基板50上的补偿层60，该补偿层60的透过率从边缘70到中心80递减。其中，掩膜图形在透明基板50的一侧，补偿层60在透明基板50的另一侧，与掩模图形相对。需要说明的是，所述边缘70是指该掩膜板的有效区域的边缘，即用于曝光形成柱状隔垫物的区域的边缘，有效区域外的位置其透过率可以和有效区域的边缘的透过率一致，也可以不一致。所述透明基板50的材料可以包括石英，但不限于此。
补偿层60的透过率从边缘到中心递减可以是从边缘到中心划分为多个区域，靠近边缘的区域包围靠近中心的区域，且靠近边缘的区域的透过率小于靠近中心的区域，同一个区域内的透过率一致。一种示例性划分方式如图3所示，从边缘到中心依次包括第一区域61、第二区域62、第三区域63和第四区域64，同一区域内的透过率一致，且第一区域61的透过率大于第二区域62，第二区域62的透过率大于第三区域63，第三区域63的透过率大于第四区域64。图3中示出的区域65为非有效区域，即不参与曝光的区域，其透过 率不限，可以和第一区域61一致，也可以不一致。如图3所示，掩膜板大小为1200*850时，各区域的一个划分示例为：第四区域64为中心的500*300的矩形区域，第三区域63为700*450的矩形区域中除第四区域64外的区域，第二区域62为900*600的矩形区域中除第三区域63和第四区域64外的区域，第一区域61为1100*750的矩形区域中除第二区域62、第三区域63和第四区域64外的区域。需要说明的是，图3所示的区域划分方式仅为一示例，实际上可以划分为更少区域，比如，划分为三个区域，或者，划分为更多区域，比如，所述补偿层60由从边缘到中心的第1区域至第N区域组成，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。另外，区域的形状也可以改变，比如为圆形或椭圆形或不规则形状等等，各区域的大小也可以根据需要划分。
在本公开的一些实施例中，补偿层60由表面平整度高、透过率较高、导静电能力高的材料制成，比如由高分子材料制成的薄膜。所述高分子材料至少包括如下之一：PP(聚丙烯)/PVC(聚氯乙烯)/PE(聚乙烯)/PET(聚对苯二甲酸乙二醇酯)，等等，此处仅为示例，其他高分子材料也可用来制作所述补偿层60。
在本公开的一些实施例中，为了实现透过率从边缘到中心递减，补偿层60可以采取相同材料制成，但从中心到边缘厚度递增，从而达到透过率递减的目的。以图3为例，补偿层60的第一区域61可以不覆盖薄膜，第二区域62覆盖一层薄膜，第三区域63覆盖一层厚度超过第二区域62的薄膜，第四区域64覆盖一层厚度超过第三区域的薄膜，由于材料相同，厚度增加时，透过率递减，从而达到从边缘到中心递减的目的。
在本公开的一些实施例中，为了实现透过率从边缘到中心递减，补偿层60也可以采取厚度相同但透过率不同的材料制成。以图3为例，第一区域61可以不覆盖薄膜，第二区域62、第三区域63和第四区域64分别覆盖不同材料制成的薄膜，且各区域的材料的透过率满足：第二区域62＞第三区域63＞第四区域64。
当然，也可以上述两种方式的结合，通过材料和厚度相结合来达到透过率从边缘到中心递减。另外，上述实施例中，第一区域61未覆盖一层薄膜。在本申请其他实施例中，第一区域61也可以覆盖一层薄膜，相应的，第二区域62覆盖一层厚度大于第一区域61的薄膜，第三区域63覆盖一层厚度超过第二区域62的薄膜，第四区域64覆盖一层厚度 超过第三区域63的薄膜，使得透过率满足第一区域61＞第二区域62＞第三区域63＞第四区域64即可。
在一些实施例中，透过率的改变也可以通过在第1区域至第N区域中的每个区域涂不同的颜色来实现。
在本公开的一些实施例中，补偿层60从边缘到中心的透过率递减时其递减幅度根据所述掩膜板从边缘到中心到曝光机的机台的曝光距离的变化幅度进行调整。因为，透过率是对曝光距离的补偿，因此，曝光距离越长，透过率越大，曝光距离越小，透过率越小，透过率的递减幅度可以根据曝光距离的变化幅度进行调制。因此，补偿层60的透过率可以根据弯曲程度导致的曝光距离不同进行设定。经测试可知，中心区域弯曲最大为50um时，其造成的中心和边缘的PS高度差值约为0.15um，而实际测试可知，当边缘和中心的透过率分别设置为100％和70％时，中心和边缘的PS高度比较一致。因此，从边缘到中心的透过率递减可以设置为从100％到70％递减。以图3为例，可以将第一区域61的透过率设置为100％，第四区域64的透过率设置为70％，此时中心和边缘的PS高度基本一致。其他区域的透过率可以根据掩膜板在该区域的弯曲程度设定。实际应用中，可以在各区域设置不同的透过率进行测试，使得各区域其曝光所得的PS高度基本一致。在本公开的一个可选实施例中，第二区域62的透过率可以设置为90％，第三区域63的透过率可以设置为80％。当然，上述透过率数值仅为示例，可以根据需要设置为其他值，使得PS高度更为一致即可。另外，当掩膜板尺寸和重量改变，导致掩膜板弯曲程度改变时，需要相应的改变各区域的透过率。具体的，可以通过测试获得使得PS高度更为一致的透过率，也可以先推算透过率、曝光距离及PS高度之间的关系，根据该关系确定透过率，然后再进行测试，根据测试结果再调整各区域的透过率。当然，也可以进行简化，直接设置为透过率从边缘到中心均匀递减。
在本公开的一些实施例中，通过改变掩膜板的可透光基板的透过率，将透过率从边缘到中心递减，从而补偿由于掩膜板自重导致的掩膜板弯曲造成的从边缘到中心曝光距离的递减，使得由该掩膜板进行曝光得到的柱状隔垫物的形状更为均一，提高液晶面板品质。
尽管参考图3描述的实施例是针对补偿层60的划分来描述的，但是本公开的实施例并不限于此。例如，针对图3描述的区域划分可以直接针对可透光基板进行。例如，类似 地，所述可透光基板从边缘到中心的第1区域至第N区域组成，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。
基于对可透光基板的类似的区域划分，例如通过在可透光基板的不同的区域涂上不同的颜色，来实现边缘到中心的透光率不同。例如，在一些实施例中，第1区域至第N区域中的每个区域涂的颜色不同。
基于对可透光基板的类似的区域划分，例如通过在可透光基板的不同区域实现不同的厚度，来实现边缘到中心的透光率的不同。例如，在一些实施例中，所述第1区域至第N区域的材料相同，且第i区域的厚度小于第i+1区域。
本领域技术人员基于本公开的教导能够想到的其他替代实施方式均落入本公开的保护范围。
如图4所示，为使用本公开的一些实施例提供的掩膜板进行曝光的示意图。采用本公开的一些实施例提供的掩膜板后，由于从边缘到中心透过率递减，尽管边缘的曝光距离大，但边缘的透过率大，透光的光线更多，对曝光进行了补偿，而中心虽然曝光距离小，但其透过率小，因此，边缘和中心曝光所得的PS高度的差距缩小，增强了PS高度的均一性。
本公开的一些实施例还提供一种掩膜板的制造方法，包括：提供透过率一致的透明基板；在所述透明基板的一侧覆盖透过率从边缘到中心递减的补偿层；以及在所述透明基板的另一侧形成掩膜图形。
在本公开的一些实施例中，所述补偿层的透过率从边缘到中心递减为从100％到70％递减。
在本公开的一些实施例中，按如下方式覆盖形成所述补偿层：在所述透明基板的一侧从边缘到中心依次覆盖第1区域至第N区域，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。
需要说明的是，上述掩膜板不限于用于对PS进行曝光，对其他需要使用掩膜板来进行曝光生成图案也可适用，根据图案的需要相应更改透过率即可。
根据本公开的一些实施例，还提供一种显示装置，包括隔垫物，该隔垫物采用如上所述的掩膜板制作。本领域技术人员可以理解，采用如上所述的掩膜板制作的隔垫物的高度比较均一。显示装置可以但不限于是液晶显示面板、电子纸、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
虽然本公开所揭露的实施方式如上，但所述的内容仅为便于理解本公开而采用的实施方式，并非用以限定本公开。任何本公开所属领域内的技术人员，在不脱离本公开所揭露的精神和范围的前提下，可以在实施的形式及细节上进行任何的修改与变化，但本公开的专利保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (15)

  1. 一种掩膜板，包括可透光基板，形成在所述可透光基板上的掩膜图形，其中，所述可透光基板的透过率从边缘到中心递减。
  2. 如权利要求1所述的掩膜板，其中，所述可透光基板包括透过率一致的透明基板和覆盖在所述透明基板上的透过率从边缘到中心递减的补偿层，且，所述掩膜图形形成在所述透明基板的一侧，所述补偿层覆盖在所述透明基板的另一侧。
  3. 如权利要求1或2所述的掩膜板，其中，所述透过率从边缘到中心递减为从100％到70％递减。
  4. 如权利要求1或2所述的掩膜板，其中，所述从边缘到中心的透过率递减时其递减幅度根据所述掩膜板从边缘到中心到曝光机的机台的曝光距离的变化幅度进行调整。
  5. 如权利要求2至4任一项所述的掩膜板，其中，所述补偿层包括如下至少之一：聚丙烯、聚乙烯、聚氯乙烯、聚对苯二甲酸乙二醇酯。
  6. 如权利要求2至5任一项所述的掩膜板，其中，所述补偿层由从边缘到中心的第1区域至第N区域组成，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。
  7. 如权利要求6所述的掩膜板，其中，所述第1区域至第N区域的材料相同，且第i区域的厚度小于第i+1区域。
  8. 如权利要求6所述的掩膜板，其中，所述第1区域至第N区域中的每个区域涂的颜色不同。
  9. 如权利要求1所述的掩膜板，其中，所述可透光基板由从边缘到中心的第1区域至第N区域组成，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。
  10. 如权利要求9所述的掩膜板，其中，所述第1区域至第N区域的材料相同，且第i区域的厚度小于第i+1区域。
  11. 如权利要求9所述的掩膜板，其中，所述第1区域至第N区域中的每个区域涂的颜色不同。
  12. 一种掩膜板的制造方法，包括：
    提供透过率一致的透明基板；
    在所述透明基板的一侧覆盖透过率从边缘到中心递减的补偿层；
    在所述透明基板的另一侧形成掩膜图形。
  13. 如权利要求12所述的方法，其中，所述补偿层的透过率从边缘到中心递减为从100％到70％递减。
  14. 如权利要求12或13所述的方法，其中，按如下方式覆盖形成所述补偿层：在所述透明基板的一侧从边缘到中心依次覆盖第1区域至第N区域，且第i区域包围第i+1区域，第i区域的透过率大于第i+1区域，每个区域内的透过率一致，所述i＝1，…，N-1，所述N为自然数且N＞1。
  15. 一种显示装置，包括隔垫物，所述隔垫物是采用如权利要求1-11中任一项所述的掩膜板制作的。
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