WO2018076817A1 - 触控面板及其制备方法和显示装置 - Google Patents

触控面板及其制备方法和显示装置 Download PDF

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Publication number
WO2018076817A1
WO2018076817A1 PCT/CN2017/093317 CN2017093317W WO2018076817A1 WO 2018076817 A1 WO2018076817 A1 WO 2018076817A1 CN 2017093317 W CN2017093317 W CN 2017093317W WO 2018076817 A1 WO2018076817 A1 WO 2018076817A1
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WIPO (PCT)
Prior art keywords
signal transmission
layer
touch
transmission line
electrode
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Application number
PCT/CN2017/093317
Other languages
English (en)
French (fr)
Inventor
李宁
江建明
顾伟
王腾利
孙大庆
阮甘林
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/745,041 priority Critical patent/US10599241B2/en
Publication of WO2018076817A1 publication Critical patent/WO2018076817A1/zh

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416Control or interface arrangements specially adapted for digitisers
    • G06F3/04164Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/047Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present disclosure relates to the field of display technologies, and in particular, to a touch panel, a method of fabricating the same, and a display device.
  • the border of the touch panel is increasingly moving toward a narrow border.
  • the touch panel on the market basically uses a metal lead as a signal transmission line, and the metal lead has an opaque characteristic, and the touch signal transmission lines in the touch panel on the market are all laid one layer, in order to ensure the stability of signal transmission. Sex, the metal lead must have a certain width, but this makes the border of the touch panel unable to achieve a true narrow border.
  • the touch panel of the OGS (One Glass Solution) on the market currently uses a metal lead as a signal transmission line, and the narrowest frame also needs 2 mm. Therefore, while ensuring the stability of signal transmission, how to make the touch panel have a true narrow border has become an urgent problem to be solved.
  • the present disclosure provides a touch panel including a substrate, a touch electrode disposed in the touch area on the substrate, and a plurality of signal transmission lines disposed in the non-touch frame trace area disposed on the substrate,
  • the signal transmission line is connected to the touch electrode for transmitting a touch signal
  • the signal transmission line in the frame routing area is distributed in at least two layers overlapping each other, and the adjacent layer is
  • the signal transmission lines are insulated from each other.
  • the touch electrode may include a plurality of first electrode strips and a plurality of second electrode strips, the first electrode strips and the second electrode strips crossing each other, and mutually overlapping at the intersection a signal transmission line is connected to the first electrode strip and the second electrode strip one-to-one, a part of the signal transmission line is distributed in the first layer in the frame routing area, and the other part is The signal transmission line is distributed in the second layer in the frame routing area, and a first insulating layer is interposed between the signal transmission line of the first layer and the signal transmission line of the second layer.
  • the touch electrode may include a plurality of first electrode strips and a plurality of second electrode strips, the first electrode strips and the second electrode strips crossing each other and insulated from each other at the intersection, each of the The first electrode strip connects two of the signal transmission lines, each of the second electrode strips connects two of the signal transmission lines, and the two signal transmission lines connected to the first electrode strip are respectively connected to the first electrode Two ends of the strip, the two signal transmission lines connecting the second electrode strips are respectively connected to two ends of the second electrode strip, and a part of the signal transmission lines are distributed in the first layer in the border line area And another part of the signal transmission line is distributed in the second layer in the frame routing area, and a first insulating layer is further interposed between the signal transmission line of the first layer and the signal transmission line of the second layer.
  • a half of the number of the signal transmission lines connecting the first electrode strip and the second electrode strip may be located in the first layer, and the other half is connected to the first electrode strip and the second electrode
  • the signal transmission line of the strip is located in the second layer, and the orthographic projection of the first layer of the signal transmission line and the second layer of the signal transmission line on the substrate completely coincides.
  • the touch panel may further include a black matrix disposed in the frame routing area, and the second layer of the signal transmission line is located on a side of the first layer of the signal transmission line away from the substrate.
  • the black matrix is located on a side of the first layer of the signal transmission line adjacent to the substrate.
  • the first electrode strip may include a first electrode strip for connecting the first electrode sheet to form the first electrode strip, and a first connecting strip, wherein the second electrode strip includes a first electrode strip a second electrode strip for connecting the second electrode sheet to form the second electrode strip, wherein the first electrode strip is disposed in the same layer as the second electrode sheet,
  • the second connecting line is located on a side of the first connecting line away from the substrate, and intersects with the first connecting line, in the A second insulating layer is also interposed between a connecting line and the second connecting line.
  • the touch panel may further include a non-touch connection area, the first layer of the signal transmission line and the second layer of the signal transmission line further extending to the connection area, the first layer of the signal transmission line and the second layer
  • the signal transmission line is connected to the peripheral circuit board in the connection area, the first layer of the signal transmission line and the second layer of the signal transmission line are located in the same layer in the connection area, and the black matrix further extends to the A connection region, and an orthographic projection of the black matrix on the substrate covers the connection region.
  • the touch panel may further include an insulating protective layer disposed on a side of the touch electrode and the signal transmission line away from the substrate, and the insulating protective layer is positive on the substrate A projection covers the touch area and the border trace area.
  • the present disclosure also provides a display device including the above touch panel.
  • the present disclosure further provides a method for fabricating the above touch panel, comprising the steps of: forming a pattern including a touch electrode in a touch area on a substrate by using a patterning process; and using a non-touch border on the substrate by a patterning process A pattern including at least two layers of signal transmission lines superposed on each other is formed in the routing area, wherein the signal transmission lines in the adjacent layers are insulated from each other, and the signal transmission line is connected to the touch electrode for transmitting touch Control signal.
  • Forming, by using a patterning process, a pattern including at least two layers of signal transmission lines superimposed on each other in a non-touch frame trace area on the substrate may include: step S10, forming the inclusion in the frame trace area by a patterning process a pattern of the first layer of the signal transmission line; step S11, forming a pattern including the first insulating layer in the frame routing area of the step S10 by a patterning process; and step S12, completing the pattern by a patterning process A pattern including the second layer of the signal transmission line is formed in the frame routing area of step S11.
  • the preparation method may further include: forming a pattern including a black matrix in the frame trace region by using a patterning process before the step S10.
  • the step S10 may further include: forming a pattern including the first layer of the signal transmission line in the non-touch connection region, and the first layer in the connection region is The signal transmission line and the first layer of the signal transmission line in the frame routing area are simultaneously formed by one patterning process.
  • the step S11 may further include: forming a first insulating layer on the signal transmission line of the first layer in the connection region, and forming a portion on the portion other than the signal transmission line of the first layer in the connection region The first insulating layer is described.
  • the step S12 may further include: forming a pattern including the second layer of the signal transmission line on a portion other than the first layer of the signal transmission line in the connection region, and the second layer in the connection region is The signal transmission line and the second layer of the signal transmission line in the frame routing area are simultaneously formed by one patterning process.
  • the preparation method further includes removing the first insulating layer on the signal transmission line of the first layer in the connection region after the step S12.
  • the preparation method further includes: before the step S10, forming a pattern including the black matrix in the connection region, and the black matrix in the connection region and a location in the border of the frame The black matrix is simultaneously formed by one patterning process.
  • the touch electrode may include a plurality of first electrode strips and a plurality of second electrode strips, the first electrode strip includes a first electrode sheet and a first connecting line, and the second electrode strip includes a second electrode sheet and
  • the forming a pattern including the touch electrode in the touch area on the substrate by using the patterning process may include: step S20, forming the first electrode strip and the ground in the touch area by using a patterning process a pattern of the second electrode sheet; in step S21, forming a pattern including the second insulating layer in the touch region of the step S20 by one patterning process; and step S22, completing the step S21 by one patterning process A pattern including the second connecting line is formed in the touch area.
  • the second connection line and the second layer of the signal transmission line may be formed of the same material and simultaneously in one patterning process.
  • the touch electrode may include a plurality of first electrode strips and a plurality of second electrode strips, and forming a pattern including the touch electrodes in the touch area on the substrate by using a patterning process may include: step S20', Forming a pattern including the first electrode strip in the touch area in one patterning process; step S21', passing a patterning Forming a pattern including the second insulating layer in the touch area of the step S20'; and forming a step in the touch area of the step S21' by using a patterning process The pattern of the second electrode strip.
  • the preparation method may further include: forming a pattern including the touch electrode in the touch area, and forming a pattern including at least two layers of the signal transmission lines superimposed on each other in the frame trace area, A pattern including an insulating protective layer is formed by one patterning process, and an orthographic projection of the insulating protective layer on the substrate covers the touch area and the border wiring area.
  • FIG. 1 is a top plan view showing a structure of a touch panel according to a first embodiment of the present disclosure
  • FIG. 2 is a cross-sectional view of the touch panel of FIG. 1 along a section line A-A1-A2-A;
  • FIG. 3 is a top plan view showing a structure of a black matrix pattern in the touch panel of the first embodiment of the present disclosure
  • FIG. 4 is a cross-sectional view of the touch panel of FIG. 3 along a section line A-A1-A2-A;
  • FIG. 5 is a top plan view showing a structure of a signal transmission line connecting the first electrode strips in the touch panel of the first embodiment of the present disclosure
  • FIG. 6 is a cross-sectional view of the touch panel of FIG. 5 along a section line A-A1-A2-A;
  • FIG. 7 is a top plan view showing a structure of a first insulating layer in a touch panel according to a first embodiment of the present disclosure
  • Figure 8 is a cross-sectional view of the touch panel of Figure 7 taken along line A-A1-A2-A;
  • FIG. 9 is a top plan view showing a pattern of a first electrode strip and a second electrode sheet in the touch panel of the first embodiment of the present disclosure.
  • Figure 10 is a cross-sectional view of the touch panel of Figure 9 taken along line A-A1-A2-A;
  • FIG. 11 is a second insulating layer in the touch panel of the first embodiment of the present disclosure a top view of the structure of the graphic;
  • Figure 12 is a cross-sectional view of the touch panel of Figure 11 taken along line A-A1-A2-A;
  • FIG. 13 is a top plan view showing a pattern of a second connection line and a pattern of a signal transmission line connecting the second electrode strips in the touch panel of the first embodiment of the present disclosure
  • Figure 14 is a cross-sectional view of the touch panel of Figure 13 taken along line A-A1-A2-A;
  • FIG. 15 is a top plan view showing a structure of an insulating protective layer in a touch panel according to a first embodiment of the present disclosure
  • Figure 16 is a cross-sectional view of the touch panel of Figure 15 taken along line A-A1-A2-A;
  • FIG. 17 is a top plan view showing the structure of a touch panel according to a second embodiment of the present disclosure.
  • the touch panel includes a substrate 1 , a touch electrode 2 disposed in the touch area 11 on the substrate 1 , and a touch panel 2 disposed on the substrate 1 , as shown in FIG. 1 and FIG.
  • signal transmission lines 3 in adjacent layers are insulated from each other.
  • the signal transmission lines 3 are distributed in at least two layers overlapping each other, which means that the signal transmission lines 3 are located in at least two different layers, and the signal transmission lines 3 in the at least two different layers are on the substrate 1.
  • the orthographic projections are at least partially coincident, the signal transmission line 3 is located in at least two different layers, and the signal transmission line 3 in the at least two different layers is on the substrate 1 compared to the signal transmission line 3 being laid in the same layer. At least partial overlap of the upper orthographic projections reduces the footprint of the signal transmission line 3.
  • the touch panel in this embodiment can reduce the occupation of the signal transmission line 3 in the frame routing area 12 by distributing the signal transmission lines 3 in the frame routing area 12 in at least two layers overlapping each other.
  • the area is such that the frame routing area 12 of the touch panel can be made narrower, thereby enabling the touch panel to have a true narrow border.
  • the frame routing area 12 generally only occupies a part of the border of the touch panel. As shown in FIG. 1 , the frame routing area 12 occupies the three-sided border of the rectangular touch panel, and the signal transmission line 3 is disposed through In at least two layers, the occupied area of the signal transmission line 3 is greatly reduced, the three-sided frame of the touch panel is made narrower, and the other side frame of the touch panel is used to connect the signal transmission line 3 with the peripheral circuit board.
  • the touch electrode 2 may include a plurality of first electrode strips 21 and a plurality of second electrode strips 22, the first electrode strips 21 and the second electrode strips 22 intersecting each other and insulated from each other at the intersection, each The first electrode strip 21 is connected to the two signal transmission lines 3, and each of the second electrode strips 22 is connected to the two signal transmission lines 3.
  • the two signal transmission lines 3 connected to the first electrode strip 21 are respectively connected to the two ends of the first electrode strip 21, and are connected.
  • the two signal transmission lines 3 of the second electrode strip 22 are respectively connected to two ends of the second electrode strip 22, a part of the signal transmission lines 3 are distributed in the first layer in the frame wiring area 12, and the other part of the signal transmission lines 3 are distributed in the frame wiring.
  • a first insulating layer 4 is further provided between the first layer signal transmission line 3 and the second layer signal transmission line 3.
  • the first insulating layer 4 can insulate the first layer signal transmission line 3 from the second layer signal transmission line 3 from each other.
  • the signal transmission line 3 is distributed in the two layers in the frame wiring area 12 so that the signal transmission line 3 is in the frame routing area.
  • the occupied area in 12 is greatly reduced, so that the frame wiring area 12 can be made narrower, thereby enabling the touch panel to have a narrow bezel.
  • each of the first electrode strips 21 and each of the second electrode strips 22 are respectively connected to the two signal transmission lines 3, which can effectively reduce the square resistance and make the touch panel have better touch effects.
  • the number of signal transmission lines 3 respectively distributed in two layers may be The area occupied by the signal transmission line 3 in the frame wiring area 12 can be reduced to some extent by equal or unequal, whether equal or not.
  • the first electrode strip 21 is a driving electrode for mutual capacitance touch
  • the second electrode strip 22 is a sensing electrode for mutual capacitance touch, or vice versa.
  • the signal transmission line 3 connected to the first electrode strip 21 is used to apply a touch driving signal to the first electrode strip 21, and the signal transmission line 3 connected to the second electrode strip 22 is used to transmit the touch sensing signal of the second electrode strip 22.
  • half of the number of signal transmission lines 3 connecting the first electrode strip 21 and the second electrode strip 22 may be located in the first layer, and the other half of the first electrode strip 21 and the second electrode strip 22 are connected.
  • the signal transmission line 3 may be located in the second layer, and the orthographic projections of the first layer signal transmission line 3 and the second layer signal transmission line 3 on the substrate 1 completely coincide. In this way, the width of the border wiring area 12 can be reduced by half, so that the touch panel has a true narrow border.
  • the touch panel may further include a black matrix 5 disposed in the frame trace area 12, and the second layer signal transmission line 3 is located on a side of the first layer signal transmission line 3 away from the substrate 1, and the black matrix 5 is located on one side of the first layer signal transmission line 3 adjacent to the substrate 1.
  • the black matrix 5 can block the frame routing area 12 of the touch panel, thereby preventing the signal transmission line 3 from affecting the display of the display panel corresponding to the touch panel.
  • the first electrode strip 21 may include a plurality of first electrode sheets 211 and a plurality of first connecting lines 212, and the first connecting lines 212 are used to connect the first electrode sheets 211 to form the first electrode strips 21,
  • the second electrode strip 22 may include a plurality of second electrode sheets 221 and a plurality of second connecting lines 222 for connecting the second electrode sheets 221 to form the second electrode strips 22.
  • the first electrode strip 21 is disposed in the same layer as the second electrode strip 221 , and the second connecting line 222 is located on a side of the first connecting line 212 away from the substrate 1 and intersects the first connecting line 212 at the first connecting line 212 .
  • a second insulating layer 6 is further interposed between the second connecting layer 222 and the second connecting layer 222 to insulate the first connecting line 212 from the second connecting line 222.
  • the touch panel may further include a non-touch connection area 13 .
  • the first layer signal transmission line 3 and the second layer signal transmission line 3 also extend to the connection region 13, in which the first layer signal transmission line 3 and the second layer signal transmission line 3 are connected to the peripheral circuit board, and the first layer signal transmission line 3 and the second layer signal transmission line 3 are located on the same layer in the connection region 13, the black matrix 5 also extends to the connection region 13, and the front projection of the black matrix 5 on the substrate 1 covers the connection region 13. All of the signal transmission lines 3 in the connection area 13 are located in the same layer due to the connection, so that the signal transmission line 3 is connected to a peripheral circuit board (such as a touch driving chip).
  • a peripheral circuit board such as a touch driving chip
  • the touch panel may further include an insulating protective layer 7 disposed on a side of the touch electrode 2 and the signal transmission line 3 away from the substrate 1 , and an orthographic projection of the insulating protective layer 7 on the substrate 1 The touch area 11 and the frame routing area 12.
  • the insulating protective layer 7 can protect the touch electrodes 2 and the signal transmission lines 3 provided on the substrate 1 from external damage.
  • the present embodiment further provides a method for fabricating the touch panel.
  • the preparation method includes: using a patterning process on the substrate 1 Forming a pattern including the touch electrodes 2 in the touch area 11; forming a pattern including at least two layers of signal transmission lines 3 superimposed on each other in the non-touch frame trace area 12 on the substrate 1 by a patterning process, wherein The signal transmission lines 3 in the adjacent layers are insulated from each other, and the signal transmission lines 3 are connected to the touch electrodes 2 for transmitting touch signals.
  • forming a pattern including at least two layers of signal transmission lines 3 superposed on each other in the non-touch frame trace area 12 on the substrate 1 by a patterning process includes the following steps S10 to S12.
  • Step S10 forming a first layer of signal transmission line film, and forming a pattern including the first layer signal transmission line 3 in the frame wiring area 12 by one patterning process (as shown in FIGS. 5 and 6).
  • the first layer of the signal transmission line film is made of a metal material
  • the patterning process in the step S10 includes a process step of photoresist coating, exposure, development, etching (wet etching), and photoresist stripping, etc. The individual process steps are not described again.
  • Step S10 may further include: forming a pattern including the first layer signal transmission line 3 in the non-touch connection area 13, and transmitting the first layer signal in the connection area 13.
  • the transmission line 3 and the first layer signal transmission line 3 in the frame wiring area 12 are simultaneously formed by one patterning process.
  • Step S11 A pattern including the first insulating layer 4 is formed in the frame wiring region 12 in which the step S10 is completed by one patterning process (as shown in FIGS. 7 and 8).
  • the first insulating layer 4 is made of an inorganic insulating material such as a silicon nitride material (SiNx).
  • the patterning process in step S11 includes process steps such as film formation (such as coating film formation), exposure, development, and etching (dry etching), and the specific process steps are not described again.
  • the first insulating layer 4 may also be an organic insulating material such as an optical transparent (OC) material or the like.
  • Step S11 may further include forming the first insulating layer 4 on the first layer signal transmission line 3 in the connection region 13 without forming the first insulating layer 4 on a portion other than the first layer signal transmission line 3 in the connection region 13 so that Subsequently, the second layer signal transmission line 3 located in the connection region 13 and the first layer signal transmission line 3 can be placed in the same layer.
  • Step S12 A pattern including the second layer signal transmission line 3 is formed in the frame wiring region 12 in which the step S11 is completed by one patterning process (as shown in FIGS. 13 and 14).
  • step S12 the material and patterning process steps of the second layer signal transmission line 3 may be the same as the material and patterning process steps of the first layer signal transmission line 3, and are not described herein again.
  • Step S12 may further include forming a pattern including the second layer signal transmission line 3 on a portion other than the first layer signal transmission line 3 in the connection region 13, and the second layer signal transmission line 3 and the frame wiring region in the connection region 13
  • the second layer signal transmission line 3 of 12 is simultaneously formed by one patterning process.
  • the preparation method may further include the step of removing the first insulating layer 4 on the first layer signal transmission line 3 in the connection region 13.
  • the first layer signal transmission line 3 and the second layer signal transmission line 3 located in the same layer can be formed in the connection region 13.
  • the preparation method may further include: Step: A pattern including the black matrix 5 is formed in the frame trace area 12 by a patterning process (as shown in FIGS. 3 and 4).
  • the patterning process in this step includes process steps such as film formation, exposure, and development, and the specific process steps are not described again.
  • the preparation method may further include: forming a pattern including the black matrix 5 in the connection region 13, and the black matrix 5 in the connection region 13 and the black matrix 5 in the frame trace region 12 pass a patterning process At the same time formed.
  • forming a pattern including the touch electrodes 2 in the touch region 11 on the substrate 1 by using a patterning process includes the following steps S20 to S22.
  • Step S20 forming a pattern including the first electrode strip 21 and the second electrode sheet 221 in the touch region 11 by one patterning process (as shown in FIGS. 9 and 10).
  • the first electrode strip 21 and the second electrode sheet 221 are made of a transparent conductive material such as indium tin oxide material (ITO) or the like.
  • the patterning process in step S20 includes steps of film formation, exposure, development, and etching (wet etching), and the specific process steps are not described again.
  • Step S21 forming a pattern including the second insulating layer 6 in the touch region 11 in which the step S20 is completed by one patterning process (as shown in FIGS. 11 and 12).
  • the second insulating layer 6 is made of an insulating light-transmitting material, such as a photoresist material, and the photoresist material can make the second insulating layer 6 both insulated and transparent.
  • the patterning process in step S21 includes process steps such as film formation, exposure, and development, and specific process steps are not described again.
  • Step S22 forming a pattern including the second connecting line 222 in the touch region 11 of the step S21 by a patterning process (as shown in FIGS. 13 and 14).
  • the second connection line 222 and the second layer signal transmission line 3 may be formed of the same material (for example, a metal material) and simultaneously in one patterning process. This can reduce the number of patterning process steps. At the same time, since the surface of the second connecting line 222 of the metal material is actively small, the normal display of the display panel corresponding to the touch panel is not substantially affected.
  • the preparation method may further include : Passing a composition worker
  • the art forms a pattern including the insulating protective layer 7 (as shown in FIGS. 15 and 16).
  • the patterning process in this step includes steps of film formation, exposure, development, and etching (dry etching), and the specific process steps are not described again.
  • the insulating protective layer 7 is made of an inorganic insulating material such as silicon nitride or silicon oxynitride.
  • the orthographic projection of the insulating protective layer 7 on the substrate 1 covers the touch area 11 and the frame trace area 12.
  • each of the patterning processes in the embodiment may be a patterning method such as printing, vapor deposition, or printing, as long as the final desired pattern can be formed.
  • the touch panel is different from the first embodiment.
  • the signal transmission line 3 in the touch panel of the embodiment is combined with the first electrode strip 21 and the second electrode strip 22 .
  • Connected to a ground that is, each of the first electrode strips 21 is connected to one signal transmission line 3
  • each of the second electrode strips 22 is connected to one signal transmission line 3
  • a part of the signal transmission lines 3 are distributed in the first layer in the frame wiring area 12.
  • Another part of the signal transmission line 3 is distributed in the second layer in the frame wiring area 12, and a first insulating layer 4 is interposed between the first layer signal transmission line 3 and the second layer signal transmission line 3.
  • the embodiment of the present invention provides a touch panel.
  • the structure of the touch panel is the same as that of the touch panel of the first embodiment or the second embodiment.
  • forming a pattern including the touch electrodes in the touch region on the substrate by using a patterning process includes the following step S20 'To S22'.
  • Step S20' forming a pattern including the first electrode strip in the touch area by one patterning process.
  • the first electrode strip is made of a transparent conductive material such as indium tin oxide material (ITO) or the like.
  • ITO indium tin oxide material
  • the patterning process in step S20' includes steps of film formation, exposure, development, and etching (wet etching), and the specific process steps are not described again.
  • Step S21' forming a pattern including the second insulating layer in the touch region in which the step S20' is completed by one patterning process.
  • the second insulating layer is made of an insulating light-transmitting material, such as a photoresist material, and the photoresist material can make the second insulating layer both insulated and transparent.
  • the patterning process in step S21' includes process steps such as film formation, exposure, and development, and the specific process steps are not described again.
  • Step S22' a pattern including the second electrode strip is formed in the touch region in which the step S21' is completed by one patterning process.
  • the second electrode strip is made of a transparent conductive material such as indium tin oxide material (ITO) or the like.
  • ITO indium tin oxide material
  • the patterning process in step S22' includes steps of film formation, exposure, development, and etching (wet etching), and the specific process steps are not described again.
  • the second electrode strip (including the second electrode sheet and the second connecting line) in the touch area of the touch panel is formed by one patterning process.
  • the first embodiment to the third embodiment have the advantages that the touch panels provided in the first embodiment to the third embodiment are distributed in at least two layers overlapping each other by the signal transmission lines in the frame routing area.
  • the area occupied by the signal transmission line in the border area of the frame can be reduced, so that the border area of the touch panel can be narrower, and the touch panel has a true narrow border.
  • the embodiment provides a display device including the touch panel in any one of the first embodiment to the third embodiment.
  • the touch panel in any one of the first embodiment to the third embodiment, not only the display device can implement the touch function, but also the frame of the display device can be It becomes narrower enough to make the display device have a true narrow border.
  • the display device provided by the present disclosure may be any product or component having a display function such as a liquid crystal panel, a liquid crystal television, an OLED panel, an OLED television, a display, a mobile phone, a navigator or the like.

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Abstract

一种触控面板及其制备方法和显示装置。该触控面板包括基板(1)、设置在基板(1)上的触控区域(11)中的触控电极(2)和设置在基板(1)上的非触控的边框走线区域(12)中的多条信号传输线(3),信号传输线(3)与触控电极(2)连接,用于传输触控信号,边框走线区域(12)中的信号传输线(3)分布在相互叠覆的至少两层中,且相邻层中的信号传输线(3)之间相互绝缘。

Description

触控面板及其制备方法和显示装置 技术领域
本公开涉及显示技术领域,具体地,涉及触控面板及其制备方法、和显示装置。
背景技术
随着技术的发展以及市场的需求,触控面板的边框越来越向窄边框发展。
目前市场上的触控面板基本采用金属引线作为信号传输线,金属引线具有不透明的特点,且目前市场上的触控面板中的触控信号传输线均为一层铺设而成,为了保证信号传输的稳定性,金属引线须具有一定的宽度,但是,这使得触控面板的边框不能实现真正意义上的窄边框。
例如,目前市场上的单玻璃方案(OGS,One Glass Solution)的触控面板均以金属引线作为信号传输线,其最窄的边框也需要2mm。因此,在保证信号传输稳定性的同时,如何使触控面板具有真正意义上的窄边框已成为目前亟需解决的问题。
发明内容
本公开提供一种触控面板,包括基板、设置在所述基板上的触控区域中的触控电极和设置在所述基板上的非触控的边框走线区域中的多条信号传输线,所述信号传输线与所述触控电极连接,用于传输触控信号,所述边框走线区域中的所述信号传输线分布在相互叠覆的至少两层中,且相邻层中的所述信号传输线之间相互绝缘。
所述触控电极可以包括多个第一电极条和多个第二电极条,所述第一电极条和所述第二电极条相互交叉,且在交叉处相互绝 缘,所述信号传输线与所述第一电极条和所述第二电极条一对一地连接,一部分所述信号传输线分布在所述边框走线区域中的第一层中,另一部分所述信号传输线分布在所述边框走线区域中的第二层中,在第一层所述信号传输线和第二层所述信号传输线之间还夹设有第一绝缘层。
作为替换,所述触控电极可以包括多个第一电极条和多个第二电极条,所述第一电极条和所述第二电极条相互交叉,且在交叉处相互绝缘,每个所述第一电极条连接两条所述信号传输线,每个所述第二电极条连接两条所述信号传输线,连接所述第一电极条的两条所述信号传输线分别连接所述第一电极条的两端,连接所述第二电极条的两条所述信号传输线分别连接所述第二电极条的两端,一部分所述信号传输线分布在所述边框走线区域中的第一层中,另一部分所述信号传输线分布在所述边框走线区域中的第二层中,在第一层所述信号传输线和第二层所述信号传输线之间还夹设有第一绝缘层。
一半数量的连接所述第一电极条和连接所述第二电极条的所述信号传输线可以位于所述第一层中,另一半数量的连接所述第一电极条和连接所述第二电极条的所述信号传输线位于所述第二层中,且第一层所述信号传输线和第二层所述信号传输线在所述基板上的正投影完全重合。
所述触控面板还可以包括黑矩阵,所述黑矩阵设置在所述边框走线区域中,第二层所述信号传输线位于第一层所述信号传输线的远离所述基板的一侧,所述黑矩阵位于第一层所述信号传输线的邻近所述基板的一侧。
所述第一电极条可以包括第一电极片和第一连接线,所述第一连接线用于将所述第一电极片连接形成所述第一电极条,所述第二电极条包括第二电极片和第二连接线,所述第二连接线用于将所述第二电极片连接形成所述第二电极条,所述第一电极条与所述第二电极片同层设置,所述第二连接线位于所述第一连接线的远离所述基板的一侧,且与所述第一连接线相交叉,在所述第 一连接线与所述第二连接线之间还夹设有第二绝缘层。
所述触控面板还可以包括非触控的连接区域,第一层所述信号传输线和第二层所述信号传输线还延伸至所述连接区域,第一层所述信号传输线和第二层所述信号传输线在所述连接区域中与***电路板连接,第一层所述信号传输线和第二层所述信号传输线在所述连接区域中位于同一层中,所述黑矩阵还延伸至所述连接区域,且所述黑矩阵在所述基板上的正投影覆盖所述连接区域。
所述触控面板还可以包括绝缘保护层,所述绝缘保护层设置在所述触控电极和所述信号传输线的远离所述基板的一侧,所述绝缘保护层在所述基板上的正投影覆盖所述触控区域和所述边框走线区域。
本公开还提供一种显示装置,包括上述触控面板。
本公开还提供一种上述触控面板的制备方法,包括步骤:采用构图工艺在基板上的触控区域中形成包括触控电极的图形;采用构图工艺在所述基板上的非触控的边框走线区域中形成包括相互叠覆的至少两层信号传输线的图形,其中,相邻层中的所述信号传输线之间相互绝缘,所述信号传输线与所述触控电极连接,用于传输触控信号。
采用构图工艺在所述基板上非触控的边框走线区域中形成包括相互叠覆的至少两层信号传输线的图形可以包括:步骤S10,通过一次构图工艺在所述边框走线区域中形成包括第一层所述信号传输线的图形;步骤S11,通过一次构图工艺在完成所述步骤S10的所述边框走线区域中形成包括第一绝缘层的图形;步骤S12,通过一次构图工艺在完成所述步骤S11的所述边框走线区域中形成包括第二层所述信号传输线的图形。
所述制备方法还可以包括:在所述步骤S10之前,采用构图工艺在所述边框走线区域中形成包括黑矩阵的图形。
所述步骤S10还可以包括:在非触控的连接区域中形成包括第一层所述信号传输线的图形,且所述连接区域中的第一层所述 信号传输线与所述边框走线区域中的第一层所述信号传输线通过一次构图工艺同时形成。
所述步骤S11还可以包括:在所述连接区域中的第一层所述信号传输线上形成第一绝缘层,而不在所述连接区域中的第一层所述信号传输线以外的部分上形成所述第一绝缘层。
所述步骤S12还可以包括:在所述连接区域中的第一层所述信号传输线以外的部分上形成包括第二层所述信号传输线的图形,且所述连接区域中的第二层所述信号传输线与所述边框走线区域中的第二层所述信号传输线通过一次构图工艺同时形成。
所述制备方法还包括:在所述步骤S12之后,将所述连接区域中的第一层所述信号传输线上的第一绝缘层去除。
所述制备方法还包括:在所述步骤S10之前,在所述连接区域中形成包括所述黑矩阵的图形,且所述连接区域中的所述黑矩阵与所述边框走线区域中的所述黑矩阵通过一次构图工艺同时形成。
所述触控电极可以包括多个第一电极条和多个第二电极条,所述第一电极条包括第一电极片和第一连接线,所述第二电极条包括第二电极片和第二连接线,采用构图工艺在基板上的触控区域中形成包括触控电极的图形可以包括:步骤S20,通过一次构图工艺在所述触控区域中形成包括所述第一电极条和所述第二电极片的图形;步骤S21,通过一次构图工艺在完成所述步骤S20的所述触控区域中形成包括第二绝缘层的图形;步骤S22,通过一次构图工艺在完成所述步骤S21的所述触控区域中形成包括所述第二连接线的图形。
所述第二连接线和第二层所述信号传输线可以采用相同材料且在一次构图工艺中同时形成。
作为替换,所述触控电极可以包括多个第一电极条和多个第二电极条,采用构图工艺在基板上的触控区域中形成包括触控电极的图形可以包括:步骤S20′,通过一次构图工艺在所述触控区域中形成包括所述第一电极条的图形;步骤S21′,通过一次构图 工艺在完成所述步骤S20′的所述触控区域中形成包括第二绝缘层的图形;步骤S22′,通过一次构图工艺在完成所述步骤S21′的所述触控区域中形成包括所述第二电极条的图形。
所述制备方法还可以包括:在所述触控区域中形成包括所述触控电极的图形以及在所述边框走线区域中形成包括相互叠覆的至少两层所述信号传输线的图形之后,通过一次构图工艺形成包括绝缘保护层的图形,所述绝缘保护层在所述基板上的正投影覆盖所述触控区域和所述边框走线区域。
附图说明
图1为本公开的第一实施例的触控面板的结构俯视图;
图2为图1中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图3为本公开的第一实施例的触控面板中的黑矩阵图形的结构俯视图;
图4为图3中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图5为本公开的第一实施例的触控面板中的连接第一电极条的信号传输线的图形的结构俯视图;
图6为图5中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图7为本公开的第一实施例的触控面板中的第一绝缘层的图形的结构俯视图;
图8为图7中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图9为本公开的第一实施例的触控面板中的第一电极条和第二电极片的图形的结构俯视图;
图10为图9中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图11为本公开的第一实施例的触控面板中的第二绝缘层的 图形的结构俯视图;
图12为图11中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图13为本公开的第一实施例的触控面板中的第二连接线的图形和连接第二电极条的信号传输线的图形的结构俯视图;
图14为图13中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图15为本公开的第一实施例的触控面板中的绝缘保护层的图形的结构俯视图;
图16为图15中的触控面板沿剖切线A-A1-A2-A的结构剖视图;
图17为本公开的第二实施例的触控面板的结构俯视图。
具体实施方式
为使本领域的技术人员更好地理解本公开的技术方案,下面结合附图和具体实施方式对本公开所提供的触控面板及其制备方法和显示装置作进一步详细描述。
第一实施例
本实施例提供一种触控面板,如图1和图2所示,该触控面板包括基板1、设置在基板1上的触控区域11中的触控电极2和设置在基板1上的非触控区域的边框走线区域12中的多条信号传输线3,信号传输线3连接触控电极2,用于传输触控信号,边框走线区域12中的信号传输线3分布在相互叠覆的至少两层中,且相邻层中的信号传输线3之间相互绝缘。
本实施例中,信号传输线3分布在相互叠覆的至少两层中是指信号传输线3位于至少两个不同的层中,且所述至少两个不同的层中的信号传输线3在基板1上的正投影至少部分重合,与信号传输线3铺设在同一层中相比,信号传输线3位于至少两个不同的层中、且所述至少两个不同的层中的信号传输线3在基板1 上的正投影至少部分重合减小了信号传输线3的占用面积。
也就是说,本实施例中的触控面板通过使边框走线区域12中的信号传输线3分布在相互叠覆的至少两层中,能够减小信号传输线3在边框走线区域12中的占用面积,从而使触控面板的边框走线区域12能够变得更窄,进而能够使触控面板具有真正意义上的窄边框。
需要说明的是,边框走线区域12通常只占用触控面板的部分边框,如图1中所示,边框走线区域12占用了矩形触控面板的三边边框,通过将信号传输线3设置在至少两层中,大大减小了信号传输线3的占用面积,使触控面板的三边边框变得更窄,触控面板的另外一边边框用于将信号传输线3与***电路板进行连接。
本实施例中,触控电极2可以包括多个第一电极条21和多个第二电极条22,第一电极条21和第二电极条22相互交叉,且在交叉处相互绝缘,每个第一电极条21连接两条信号传输线3,每个第二电极条22连接两条信号传输线3,连接第一电极条21的两条信号传输线3分别连接第一电极条21的两端,连接第二电极条22的两条信号传输线3分别连接第二电极条22的两端,一部分信号传输线3分布在边框走线区域12中的第一层中,另一部分信号传输线3分布在边框走线区域12中的第二层中,在第一层信号传输线3与第二层信号传输线3之间还设有第一绝缘层4。第一绝缘层4能使第一层信号传输线3与第二层信号传输线3之间相互绝缘。相比于将所有信号传输线3都分布在边框走线区域12中的同一层中的情况,将信号传输线3分布在边框走线区域12中的两层中能使信号传输线3在边框走线区域12中的占用面积大大减小,从而能使边框走线区域12变得更窄,进而能够使触控面板具有窄边框。另外,每个第一电极条21和每个第二电极条22分别连接两条信号传输线3,可以有效降低方阻,使触控面板具有更好的触控效果。
需要说明的是,分别分布在两层中的信号传输线3的数量可 以相等、也可以不等,无论相等或不等,都能在一定程度上减小信号传输线3在边框走线区域12中的占用面积。
本实施例中,第一电极条21为用于互电容触控的驱动电极,第二电极条22为用于互电容触控的感应电极,或者反之。连接第一电极条21的信号传输线3用于向第一电极条21施加触控驱动信号,连接第二电极条22的信号传输线3用于传送第二电极条22的触控感应信号。
本实施例中,一半数量的连接第一电极条21和连接第二电极条22的信号传输线3可以位于第一层中,另一半数量的连接第一电极条21和连接第二电极条22的信号传输线3可以位于第二层中,且第一层信号传输线3和第二层信号传输线3在基板1上的正投影完全重合。如此设置,能使边框走线区域12的宽度减小一半,从而使触控面板具有真正意义上的窄边框。
本实施例中,触控面板还可以包括黑矩阵5,黑矩阵5设置在边框走线区域12中,第二层信号传输线3位于第一层信号传输线3的远离基板1的一侧,黑矩阵5位于第一层信号传输线3的邻近基板1的一侧。黑矩阵5能够对触控面板的边框走线区域12进行遮挡,从而避免信号传输线3对与触控面板对应设置的显示面板的显示造成影响。
本实施例中,第一电极条21可以包括多个第一电极片211和多条第一连接线212,第一连接线212用于将各第一电极片211连接形成第一电极条21,第二电极条22可以包括多个第二电极片221和多条第二连接线222,第二连接线222用于将各第二电极片221连接形成第二电极条22。第一电极条21与第二电极片221同层设置,第二连接线222位于第一连接线212的远离基板1的一侧,且与第一连接线212相交叉,在第一连接线212与第二连接线222之间还夹设有第二绝缘层6,第二绝缘层6能使第一连接线212与第二连接线222之间相互绝缘。利用上述结构设置,能通过第一电极条21和第二电极条22实现互电容触控。
本实施例中,触控面板还可以包括非触控的连接区域13, 第一层信号传输线3和第二层信号传输线3还延伸至连接区域13,在连接区域13中,第一层信号传输线3和第二层信号传输线3与***电路板连接,第一层信号传输线3和第二层信号传输线3在连接区域13中位于同一层上,黑矩阵5还延伸至连接区域13,且黑矩阵5在基板1上的正投覆盖连接区域13。连接区域13中所有的信号传输线3均位于同一层中是由于连接的需要,这样便于信号传输线3与***电路板(如触控驱动芯片)连接。
本实施例中,触控面板还可以包括绝缘保护层7,绝缘保护层7设置在触控电极2和信号传输线3的远离基板1的一侧,绝缘保护层7在基板1上的正投影覆盖触控区域11和边框走线区域12。绝缘保护层7能够对设置在基板1上的触控电极2和信号传输线3形成保护,使其免受外界损坏。
基于本实施例的触控面板的上述结构,本实施例还提供一种该触控面板的制备方法,如图3-图16所示,所述制备方法包括:采用构图工艺在基板1上的触控区域11中形成包括触控电极2的图形;采用构图工艺在基板1上的非触控的边框走线区域12中形成包括相互叠覆的至少两层信号传输线3的图形,其中,相邻层中的信号传输线3之间相互绝缘,且信号传输线3与触控电极2连接,用于传输触控信号。
本实施例中,采用构图工艺在基板1上的非触控的边框走线区域12中形成包括相互叠覆的至少两层信号传输线3的图形包括以下步骤S10至S12。
步骤S10:形成第一层信号传输线薄膜,通过一次构图工艺在边框走线区域12中形成包括第一层信号传输线3的图形(如图5和图6所示)。
本实施例中,第一层信号传输线薄膜采用金属材料制成,步骤S10中的构图工艺包括光刻胶涂敷、曝光、显影、刻蚀(湿刻)和光刻胶剥离等工艺步骤,具体各个工艺步骤不再赘述。
步骤S10还可以包括:在非触控的连接区域13中形成包括第一层信号传输线3的图形,且连接区域13中的第一层信号传 输线3与边框走线区域12中的第一层信号传输线3通过一次构图工艺同时形成。
步骤S11:通过一次构图工艺在完成步骤S10的边框走线区域12中形成包括第一绝缘层4的图形(如图7和图8所示)。
本实施例中,第一绝缘层4采用无机绝缘材料,如氮化硅材料(SiNx)。步骤S11中的构图工艺包括成膜(如涂布成膜)、曝光、显影和刻蚀(干刻)等工艺步骤,具体各个工艺步骤不再赘述。
需要说明的是,第一绝缘层4也可以采用有机绝缘材料,如光学透明(Optical Clear,OC)材料等。
步骤S11还可以包括在连接区域13中的第一层信号传输线3上形成第一绝缘层4,而不在连接区域13中的第一层信号传输线3以外的部分上形成第一绝缘层4,以便后续能使位于连接区域13中的第二层信号传输线3和第一层信号传输线3处于同一层中。
步骤S12:通过一次构图工艺在完成步骤S11的边框走线区域12中形成包括第二层信号传输线3的图形(如图13和图14所示)。
步骤S12中,第二层信号传输线3的材料和构图工艺步骤可以与第一层信号传输线3的材料和构图工艺步骤相同,这里不再赘述。
步骤S12还可以包括:在连接区域13中的第一层信号传输线3以外的部分上形成包括第二层信号传输线3的图形,且连接区域13中的第二层信号传输线3与边框走线区域12中的第二层信号传输线3通过一次构图工艺同时形成。
在步骤S12之后,所述制备方法还可以包括步骤:将连接区域13中的第一层信号传输线3上的第一绝缘层4去除。
通过步骤S10至S12,能在连接区域13中形成位于同一层中的第一层信号传输线3和第二层信号传输线3。
本实施例中,在步骤S10之前,所述制备方法还可以包括步 骤:采用构图工艺在边框走线区域12中形成包括黑矩阵5的图形(如图3和图4所示)。该步骤中的构图工艺包括成膜、曝光和显影等工艺步骤,具体各个工艺步骤不再赘述。
在步骤S10之前,所述制备方法还可以包括:在连接区域13中形成包括黑矩阵5的图形,且连接区域13中的黑矩阵5与边框走线区域12中的黑矩阵5通过一次构图工艺同时形成。
本实施例中,采用构图工艺在基板1上的触控区域11中形成包括触控电极2的图形包括以下步骤S20至S22。
步骤S20:通过一次构图工艺在触控区域11中形成包括第一电极条21和第二电极片221的图形(如图9和图10所示)。
本实施例中,第一电极条21和第二电极片221采用透明导电材料,如氧化铟锡材料(ITO)等。步骤S20中的构图工艺包括成膜、曝光、显影和刻蚀(湿刻)等步骤,具体各个工艺步骤不再赘述。
步骤S21:通过一次构图工艺在完成步骤S20的触控区域11中形成包括第二绝缘层6的图形(如图11和图12所示)。
本实施例中,第二绝缘层6采用绝缘透光材料,如光刻胶材料,光刻胶材料能使第二绝缘层6既绝缘又透光。步骤S21中的构图工艺包括成膜、曝光和显影等工艺步骤,具体各个工艺步骤不再赘述。
步骤S22:通过一次构图工艺在完成步骤S21的触控区域11中形成包括第二连接线222的图形(如图13和图14所示)。
例如,第二连接线222和第二层信号传输线3可以采用相同材料(例如金属材料)且在一次构图工艺中同时形成。这样能够减少一次构图工艺步骤。同时,由于金属材料的第二连接线222的面积极小,所以基本不会影响与触控面板对应设置的显示面板的正常显示。
本实施例中,在触控区域11中形成包括触控电极2的图形以及在边框走线区域12中形成包括相互叠覆的至少两层信号传输线3的图形之后,所述制备方法还可以包括:通过一次构图工 艺形成包括绝缘保护层7的图形(如图15和图16所示)。该步骤中的构图工艺包括成膜、曝光、显影和刻蚀(干刻)等步骤,具体各个工艺步骤不再赘述。
本实施例中,绝缘保护层7采用无机绝缘材料,如氮化硅或氮氧化硅材料。绝缘保护层7在基板1上的正投影覆盖触控区域11和边框走线区域12。
需要说明的是,本实施例中的各构图工艺也可以为打印、蒸镀或印刷等构图方式,只要能够形成最终需要的图形即可。
第二实施例
本实施例提供一种触控面板,与第一实施例不同的是,如图17所示,本实施例的触控面板中的信号传输线3与第一电极条21和第二电极条22一对一地连接,即每个第一电极条21连接一条信号传输线3,每个第二电极条22连接一条信号传输线3,一部分信号传输线3分布在边框走线区域12中的第一层中,另一部分信号传输线3分布在边框走线区域12中的第二层中,在第一层信号传输线3与第二层信号传输线3之间还夹设有第一绝缘层4。
本实施例的触控面板中的其他结构以及其制备方法与第一实施例中的相同,此处不再赘述。
第三实施例
本实施例提供一种触控面板,该触控面板的结构与第一实施例或第二实施例中的触控面板的结构相同,本实施例的触控面板的制备方法与第一实施例和第二实施例的触控面板的制备方法不同的是,本实施例的触控面板的制备方法中,采用构图工艺在基板上的触控区域中形成包括触控电极的图形包括以下步骤S20′至S22′。
步骤S20′:通过一次构图工艺在触控区域中形成包括第一电极条的图形。
本实施例中,第一电极条采用透明导电材料,如氧化铟锡材料(ITO)等。步骤S20′中的构图工艺包括成膜、曝光、显影和刻蚀(湿刻)等步骤,具体各个工艺步骤不再赘述。
步骤S21′:通过一次构图工艺在完成步骤S20′的触控区域中形成包括第二绝缘层的图形。
本实施例中,第二绝缘层采用绝缘透光材料,如光刻胶材料,光刻胶材料能使第二绝缘层既绝缘又透光。步骤S21′中的构图工艺包括成膜、曝光和显影等工艺步骤,具体各个工艺步骤不再赘述。
步骤S22′:通过一次构图工艺在完成步骤S21′的触控区域中形成包括第二电极条的图形。
本实施例中,第二电极条采用透明导电材料,如氧化铟锡材料(ITO)等。步骤S22′中的构图工艺包括成膜、曝光、显影和刻蚀(湿刻)等步骤,具体各个工艺步骤不再赘述。
本实施例的触摸面板的制备方法中的其他步骤与第一实施例中的相同,此处不再赘述。
本实施例中,触控面板的触控区域中的第二电极条(包括第二电极片和第二连接线)通过一次构图工艺形成。
第一实施例至第三实施例的有益效果:第一实施例至第三实施例所提供的触控面板均通过使边框走线区域中的信号传输线分布在相互叠覆的至少两层中,能够减小信号传输线在边框走线区域中的占用面积,从而使触控面板的边框走线区域能够变得更窄,进而使触控面板具有真正意义上的窄边框。
第四实施例
本实施例提供一种显示装置,包括第一实施例至第三实施例中任意一个中的触控面板。
通过采用第一实施例至第三实施例任意一个中的触控面板,不仅使该显示装置能实现触控功能,而且使该显示装置的边框能 够变得更窄,从而使该显示装置具有真正意义上的窄边框。
本公开所提供的显示装置可以为液晶面板、液晶电视、OLED面板、OLED电视、显示器、手机、导航仪等具有显示功能的任何产品或部件。
可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。

Claims (20)

  1. 一种触控面板,包括基板、设置在所述基板上的触控区域中的触控电极和设置在所述基板上的非触控的边框走线区域中的多条信号传输线,所述信号传输线与所述触控电极连接,用于传输触控信号,其中,所述边框走线区域中的所述信号传输线分布在相互叠覆的至少两层中,且相邻层中的所述信号传输线之间相互绝缘。
  2. 根据权利要求1所述的触控面板,其中,所述触控电极包括多个第一电极条和多个第二电极条,所述第一电极条和所述第二电极条相互交叉,且在交叉处相互绝缘;
    所述信号传输线与所述第一电极条和所述第二电极条一对一地连接;
    一部分所述信号传输线分布在所述边框走线区域中的第一层中,另一部分所述信号传输线分布在所述边框走线区域中的第二层中,在第一层所述信号传输线和第二层所述信号传输线之间还夹设有第一绝缘层。
  3. 根据权利要求1所述的触控面板,其中,所述触控电极包括多个第一电极条和多个第二电极条,所述第一电极条和所述第二电极条相互交叉,且在交叉处相互绝缘;
    每个所述第一电极条连接两条所述信号传输线,每个所述第二电极条连接两条所述信号传输线,连接所述第一电极条的两条所述信号传输线分别连接所述第一电极条的两端,连接所述第二电极条的两条所述信号传输线分别连接所述第二电极条的两端;
    一部分所述信号传输线分布在所述边框走线区域中的第一层中,另一部分所述信号传输线分布在所述边框走线区域中的第二层中,在第一层所述信号传输线和第二层所述信号传输线之间还夹设有第一绝缘层。
  4. 根据权利要求2或3所述的触控面板,其中,一半数量的连接所述第一电极条和连接所述第二电极条的所述信号传输线位于所述第一层中,另一半数量的连接所述第一电极条和连接所述第二电极条的所述信号传输线位于所述第二层中,且第一层所述信号传输线在所述基板上的正投影和第二层所述信号传输线在所述基板上的正投影完全重合。
  5. 根据权利要求2或3所述的触控面板,还包括黑矩阵,所述黑矩阵设置在所述边框走线区域中,第二层所述信号传输线位于第一层所述信号传输线的远离所述基板的一侧,所述黑矩阵位于第一层所述信号传输线的邻近所述基板的一侧。
  6. 根据权利要求2或3所述的触控面板,其中,所述第一电极条包括第一电极片和第一连接线,所述第一连接线用于将所述第一电极片连接形成所述第一电极条,所述第二电极条包括第二电极片和第二连接线,所述第二连接线用于将所述第二电极片连接形成所述第二电极条;
    所述第一电极条与所述第二电极片同层设置,所述第二连接线位于所述第一连接线的远离所述基板的一侧,且与所述第一连接线相交叉,在所述第一连接线与所述第二连接线之间还夹设有第二绝缘层。
  7. 根据权利要求5所述的触控面板,还包括非触控的连接区域,第一层所述信号传输线和第二层所述信号传输线还延伸至所述连接区域,第一层所述信号传输线和第二层所述信号传输线在所述连接区域中与***电路板连接;
    第一层所述信号传输线和第二层所述信号传输线在所述连接区域中位于同一层中,所述黑矩阵还延伸至所述连接区域,且所述黑矩阵在所述基板上的正投影覆盖所述连接区域。
  8. 根据权利要求1所述的触控面板,还包括绝缘保护层,所述绝缘保护层设置在所述触控电极和所述信号传输线的远离所述基板的一侧,所述绝缘保护层在所述基板上的正投影覆盖所述触控区域和所述边框走线区域。
  9. 一种显示装置,包括权利要求1至8中任意一项所述的触控面板。
  10. 一种根据权利要求1至8中任意一项所述的触控面板的制备方法,包括步骤:
    采用构图工艺在基板上的触控区域中形成包括触控电极的图形;
    采用构图工艺在所述基板上的非触控的边框走线区域中形成包括相互叠覆的至少两层信号传输线的图形,其中,相邻层中的所述信号传输线之间相互绝缘,所述信号传输线与所述触控电极连接,用于传输触控信号。
  11. 根据权利要求10所述的制备方法,其中,采用构图工艺在所述基板上的非触控的边框走线区域中形成包括相互叠覆的至少两层信号传输线的图形包括:
    步骤S10,通过一次构图工艺在所述边框走线区域中形成包括第一层所述信号传输线的图形;
    步骤S11,通过一次构图工艺在完成所述步骤S10的所述边框走线区域中形成包括第一绝缘层的图形;
    步骤S12,通过一次构图工艺在完成所述步骤S11的所述边框走线区域中形成包括第二层所述信号传输线的图形。
  12. 根据权利要求11所述的制备方法,还包括:在所述步骤S10之前,采用构图工艺在所述边框走线区域中形成包括黑矩 阵的图形。
  13. 根据权利要求12所述的制备方法,其中,所述步骤S10还包括:在非触控的连接区域中形成包括第一层所述信号传输线的图形,且所述连接区域中的第一层所述信号传输线与所述边框走线区域中的第一层所述信号传输线通过一次构图工艺同时形成。
  14. 根据权利要求13所述的制备方法,其中,所述步骤S11还包括:在所述连接区域中的第一层所述信号传输线上形成第一绝缘层,而不在所述连接区域中的第一层所述信号传输线以外的部分上形成所述第一绝缘层;
    所述步骤S12还包括:在所述连接区域中的第一层所述信号传输线以外的部分上形成包括第二层所述信号传输线的图形,且所述连接区域中的第二层所述信号传输线与所述边框走线区域中的第二层所述信号传输线通过一次构图工艺同时形成。
  15. 根据权利要求14所述的制备方法,还包括:在所述步骤S12之后,将所述连接区域中的第一层所述信号传输线上的第一绝缘层去除。
  16. 根据权利要求13所述的制备方法,还包括:在所述步骤S10之前,在所述连接区域中形成包括所述黑矩阵的图形,且所述连接区域中的所述黑矩阵与所述边框走线区域中的所述黑矩阵通过一次构图工艺同时形成。
  17. 根据权利要求10所述的制备方法,其中,所述触控电极包括多个第一电极条和多个第二电极条,所述第一电极条包括第一电极片和第一连接线,所述第二电极条包括第二电极片和第二连接线;
    采用构图工艺在基板上的触控区域中形成包括触控电极的图形包括:
    步骤S20,通过一次构图工艺在所述触控区域中形成包括所述第一电极条和所述第二电极片的图形;
    步骤S21,通过一次构图工艺在完成所述步骤S20的所述触控区域中形成包括第二绝缘层的图形;
    步骤S22,通过一次构图工艺在完成所述步骤S21的所述触控区域中形成包括所述第二连接线的图形。
  18. 根据权利要求17所述的制备方法,其中,所述第二连接线和第二层所述信号传输线采用相同材料且在一次构图工艺中同时形成。
  19. 根据权利要求10所述的制备方法,其中,所述触控电极包括多个第一电极条和多个第二电极条;
    采用构图工艺在基板上的触控区域中形成包括触控电极的图形包括:
    步骤S20′,通过一次构图工艺在所述触控区域中形成包括所述第一电极条的图形;
    步骤S21′,通过一次构图工艺在完成所述步骤S20′的所述触控区域中形成包括第二绝缘层的图形;
    步骤S22′,通过一次构图工艺在完成所述步骤S21′的所述触控区域中形成包括所述第二电极条的图形。
  20. 根据权利要求10所述的制备方法,还包括:在所述触控区域中形成包括所述触控电极的图形以及在所述边框走线区域中形成包括相互叠覆的至少两层所述信号传输线的图形之后,通过一次构图工艺形成包括绝缘保护层的图形,
    所述绝缘保护层在所述基板上的正投影覆盖所述触控区域和所述边框走线区域。
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