WO2018072446A1 - 非对称式光学干涉测量方法及装置 - Google Patents

非对称式光学干涉测量方法及装置 Download PDF

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WO2018072446A1
WO2018072446A1 PCT/CN2017/086321 CN2017086321W WO2018072446A1 WO 2018072446 A1 WO2018072446 A1 WO 2018072446A1 CN 2017086321 W CN2017086321 W CN 2017086321W WO 2018072446 A1 WO2018072446 A1 WO 2018072446A1
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imaging lens
reference mirror
measured
interference image
mirror
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PCT/CN2017/086321
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English (en)
French (fr)
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雷枫
边心田
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淮阴师范学院
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Priority to US16/326,848 priority Critical patent/US10989524B2/en
Publication of WO2018072446A1 publication Critical patent/WO2018072446A1/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G01B9/02044—Imaging in the frequency domain, e.g. by using a spectrometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers

Definitions

  • the present invention relates to the field of optical precision measurement technology, and in particular to an asymmetric optical interferometry method and apparatus.
  • Optical interferometry uses the interference fringes generated by two beams to accurately measure the three-dimensional shape of the surface of the object.
  • Optical interferometry has the characteristics of non-contact measurement and high measurement accuracy. It is widely used to measure the surface three-dimensional fine-shaped structure of precision integrated industrial products such as semiconductor integrated circuits, flat panel display panels (LCD, PDP, EL), MEMS substrates, etc.
  • LCD flat panel display panels
  • PDP flat panel display panels
  • EL flat panel display panels
  • MEMS substrates etc.
  • a key supporting technology that is indispensable in the processing industry.
  • NewView8000 developed by ZYGO in the United States, BW-S500 from Nikon of Japan, and ContourGT-K from Bruker of Germany represent today's optical three-dimensional precision measurement.
  • the highest level of the instrument, the measuring instrument has the following main features: the measurement accuracy reaches the nanometer level, the operation is convenient, and the application software has complete functions.
  • the measuring instrument adopts the symmetric optical interference system and the stepping scanning method, there is a measurement speed. Shortcomings such as slowness and narrow measurement range.
  • the symmetrical optical interference system that is, the test optical system and the reference optical system are symmetrical, as shown in Fig. 1, which is a schematic diagram of the structure of the symmetrical optical interference system. If it is necessary to expand the test range, it is necessary to expand the reference datum surface, and design a large area. Reference datums require high precision machining and assembly techniques at a high cost, and currently only a handful of companies around the world can make large-area reference datums that are difficult to operate.
  • the technical problem to be solved by the present invention is to solve the problem that the existing optical interferometry method has a slow measurement speed, a narrow measurement range, high cost, and difficulty in operation.
  • the technical solution adopted by the present invention provides an asymmetric optical interferometry method, which includes the following steps:
  • the incident light source is divided into two beams by a beam splitter, and is respectively projected onto the surface of the object to be tested and the surface of the reference mirror, and respectively passes through the first imaging lens on the side of the object to be measured having a larger area, and the second on the side of the reference mirror having a smaller area.
  • An imaging lens is superimposed on the photosensor by a third imaging lens to form at least one interference image; a magnification of the first imaging lens is smaller than a magnification of the second imaging lens;
  • the corresponding interference image signal is parsed to obtain a three-dimensional shape of the surface of the object to be tested.
  • a collimating lens, a right angle turning mirror and a 180 degree retroreflecting mirror are inserted between the second imaging lens and the reference mirror, and the between the right angle turning mirror and the 180 degree retroreflecting mirror are adjusted.
  • the distance compensates for the optical path difference between the optical path of the reference mirror side and the optical path of the object side to be measured due to changing the imaging position of the object to be measured.
  • the photodetector is an area array camera photoelectric sensor.
  • the corresponding interference image signal is parsed by a phase shift algorithm or a white light interferometry.
  • the invention also provides an asymmetric optical interferometry device, including a beam splitter, to be tested a first imaging lens on the side of the object to be measured having a larger area, a reference mirror, a second imaging lens on the side of the reference mirror having a smaller area, a third imaging lens, and a photosensor, wherein the magnification of the first imaging lens is smaller than Magnification of the second imaging lens;
  • the incident light source is divided into two beams by the beam splitter, and is respectively projected onto the surface of the object to be tested and the surface of the reference mirror, and passes through the first imaging lens and the second imaging lens respectively through the third imaging lens. At least one interference image is superimposed on the photosensor.
  • the reference mirror is located at a back focal plane of the second imaging lens.
  • the invention provides an asymmetric optical interferometry method and device with a simple measuring method and a large measuring range, and adopts different magnifications and uses a small-area reference mirror to obtain interference of a large area of the surface of the object to be tested.
  • the image is obtained according to one or more interference images, and obtains a three-dimensional shape of the surface of the object to be tested, which has reasonable structural design, convenient operation, low cost, short data sampling time, strong anti-interference ability of the measuring instrument, high measurement precision, and measurement
  • the range is large and the work stability is good.
  • 1 is a schematic structural view of a symmetric optical interference system
  • FIG. 2 is a flow chart of an asymmetric optical interferometry method provided by the present invention.
  • FIG. 3 is a schematic structural diagram of an asymmetric optical interferometry device according to Embodiment 1 of the present invention.
  • FIG. 4 is a schematic structural diagram of an asymmetric optical interferometry device according to Embodiment 2 of the present invention.
  • FIG. 5 is an image of a reference mirror M1 formed by a measuring instrument on the side of the reference mirror M1 provided by the present invention
  • FIG. 6 is an image of an object 2 to be tested formed by a measuring instrument on the side of the object 2 to be tested provided by the present invention
  • Figure 7 is a measuring instrument for simultaneously using the reference mirror M1 side and the object 2 to be tested side provided by the present invention The resulting interference image.
  • the invention provides an asymmetric optical interferometry method and device with a simple measuring method and a measuring range up to a diameter of 1000 mm, and adopts different magnifications and uses a small-area reference mirror to obtain a large-area object to be tested.
  • the interference image of the surface analyzes the three-dimensional shape of the surface of the object to be tested according to one or more interference images, and has the advantages of reasonable structure design, convenient operation, low cost, short data sampling time, strong anti-interference ability of the measuring instrument and high measurement precision. , the measurement range is large and the work stability is good.
  • the invention provides an asymmetric optical interferometry method, as shown in FIG. 2, comprising the following steps:
  • the incident light source is divided into two light beams, a detection light and a reference light, by a beam splitter (beam splitter), and respectively projected onto the surface of the object to be tested and the surface of the reference mirror, wherein the detection light reflected by the surface of the object to be measured passes through a larger area.
  • the first imaging lens on the object side is measured, the reference light reflected by the reference mirror surface passes through the second imaging lens on the reference mirror side of the smaller area, and finally the at least one interference image is superimposed on the area camera photoelectric sensor via the third imaging lens.
  • the magnification of the first imaging lens on the side of the object to be measured is smaller than the magnification of the second imaging lens on the side of the reference mirror.
  • S2 Input a corresponding interference image into a computer to obtain a corresponding interference image signal.
  • the optical path of the reference mirror side is changed.
  • the optical path difference between the optical paths on the object side is measured, and a plurality of interference images are formed on the photosensor.
  • the compensation is changed due to the change
  • the optical path difference between the optical path on the reference mirror side and the optical path on the object side to be measured caused by the imaging position of the object.
  • Embodiment 1 of the present invention provides an asymmetric optical interferometry device, as shown in FIG. 3, including a beam splitter 1, an object to be tested 2, and a first imaging lens L1 on the side of the object 2 to be measured having a larger area.
  • the mirror M1 (the reference mirror M1 is located on the back focal plane of the second imaging lens L2), the second imaging lens L2 on the side of the reference mirror M1 having a smaller area, the third imaging lens L3, and the area camera photoelectric sensor 3, the first imaging lens
  • the magnification of L1 is smaller than the magnification of the second imaging lens L2;
  • the incident light source (light source with high coherence such as laser light) is split into two beams of detection light and reference light by the beam splitter 1 and respectively projected onto the surface of the object 2 to be tested and
  • the surface of the reference mirror M1 wherein the detection light reflected from the surface of the object 2 to be measured passes through the first imaging lens L1, the reference light reflected from the surface of the reference mirror M1 passes through the second imaging lens L2, and finally passes through the third imaging lens L3 in the area array camera At least one interference image is superimposed on the sensor 3.
  • the first imaging lens L1 on the side of the object to be tested 2 has a small magnification, and a large area of the surface of the object to be measured can be imaged onto the surface of the area camera photoelectric sensor 3, and conversely, the second imaging lens on the side of the reference mirror M1 L2 has a large magnification, and the surface of the small-area reference mirror M1 can be imaged onto the surface of the area camera photosensor 3, since the surface of the object to be tested 2 and the surface of the reference mirror M1 are completely coincident with the image of the surface sensor 3 of the area sensor.
  • An interference image can be formed on the surface of the area camera photosensor 3, thereby realizing large-area interference imaging of the high coherence illumination source.
  • Embodiment 2 of the present invention further optimizes Embodiment 1, and provides an asymmetric optical interferometry device, which can use a light source such as a laser or the like with a high coherence source as an incident light source, or a coherence of a halogen white light source.
  • the lower light source as shown in FIG. 4, includes a beam splitter 1, an object to be tested 2, a first imaging lens L1 on the side of the object 2 to be measured, and a reference mirror M1.
  • the right angle turning mirror M2 and the 180 degree retroreflecting mirror M3 are disposed between the collimating lens L4 and the reference mirror M1. By adjusting the distance between the right angle turning mirror M2 and the 180 degree retroreflecting mirror M3, the compensation is changed due to the change.
  • the optical path difference between the optical path of the reference mirror M1 side and the optical path of the object 2 to be measured caused by the imaging position of the object 2 is measured.
  • the imaging position of the object 2 to be measured is closely related to the measurement range. If the distance between the object 2 to be measured and the first imaging lens L1 is increased, the measurement range of the object 2 to be measured is increased, and the object to be tested is also increased.
  • Side optical path so it is necessary to ensure that the optical path on the side of the object to be tested 2 and the optical path on the side of the reference mirror M1 have the same optical path to achieve large-area interference imaging of the low coherence illumination source.
  • the implementation of an asymmetric optical interferometry method provided by the present invention is described below using a semiconductor laser source as an incident light source.
  • the center wavelength of the semiconductor laser source used is 670 nm, and the output power is 0.8 MW.
  • the diameter of the reference mirror M1 is 3.15mm, the surface precision is ⁇ /20 (@633nm); the magnification of the reference mirror M1 side is 1.0; the object to be tested 2 is flat glass, the diameter is 45.0mm; the magnification of the side of the object to be tested is 0.07,
  • the area sensor photoelectric sensor used is an area array CCD industrial camera produced by Opteon Corporation of the United States.
  • the image of the reference mirror M1 formed by the measuring instrument on the side of the reference mirror M1 is used alone; as shown in FIG. 6, the object to be tested 2 formed by the measuring instrument on the side of the object 2 to be measured is used alone. As shown in FIG. 7, an interference image formed by using a measuring instrument on the side of the reference mirror M1 and the side of the object to be tested 2 at the same time.
  • the reference mirror and the object to be tested form the same size image on the surface of the array CCD industrial camera; as can be seen from FIG. 7, if the reference mirror M1 side is used simultaneously Measuring instruments on the side of the object 2, the two images will coincide on the surface of the area CCD industrial camera to form an interference image.

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  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

一种非对称式光学干涉测量方法，包括：入射光源经过分光镜分为两束光，分别投射到待测物体表面和参考镜表面，并分别通过面积较大的待测物体侧的第一成像透镜、面积较小的参考镜侧的第二成像透镜，经第三成像透镜在光电传感器上叠加形成至少一个干涉图像（S1）；第一成像透镜的放大倍率小于第二成像透镜的放大倍率；将相应干涉图像输入计算机获得相应干涉图像信号(S2)；对干涉图像信号进行解析，获得待测物体表面的三维形貌(S3)。还提供一种非对称式光学干涉测量装置。该方法和装置采用不同的放大倍率，使用小面积的参考镜面，得到大面积的待测物体表面的干涉图像，具有操作方便、成本较低、数据采样时间短、测量仪器抗干扰能力强、测量精度高、测量范围大和工作稳定性能好等优点。

Description

非对称式光学干涉测量方法及装置 技术领域
本发明涉及光学精密测量技术领域，具体涉及非对称式光学干涉测量方法及装置。
背景技术
近年来，随着精密制造技术的进步与发展，检测物体表面形状的技术已得到日益广泛的应用，光学干涉测量利用两束光所产生的干涉条纹，精密测量物体表面的三维形貌结构，由于光学干涉测量具有非接触式测量和测量精度高等特点，被广泛应用于测量半导体集成电路、平板显示器面板(LCD、PDP、EL)、MEMS基板等精密工业制品的表面三维立体细微形状结构，是精密加工领域不可缺少的关键支撑技术。
随着计算机数据处理技术和自动控制技术的飞速发展，光学干涉测量技术也在不断进步，美国ZYGO公司研制的NewView8000、日本Nikon的BW-S500以及德国Bruker公司的ContourGT-K代表当今光学三维精密测量仪器的最高水平，该测量仪器具有以下主要特点：测量精度达到纳米量级，操作方便，应用软件功能齐全，但是，由于该测量仪器采用对称式光学干涉***和步进式扫描方法，存在测量速度慢和测量范围狭小等缺点。
对称式光学干涉***即测试光学***和参考光学***对称，如图1所示，为对称式光学干涉***的结构示意图，若需要扩大测试范围，则需要扩大参考基准面，而设计加工大面积的参考基准面需要较高的精密加工和装配技术，成本较高，且目前全世界只有为数不多的公司可以制作大面积的参考基准面，难以操作。
有鉴于此，急需解决现有光学干涉测量方法存在的测量速度慢、测量 范围狭小、成本较高和难以操作问题。
发明内容
本发明所要解决的技术问题是解决现有光学干涉测量方法存在测量速度慢、测量范围狭小、成本较高和难以操作问题。
为了解决上述技术问题，本发明所采用的技术方案是提供一种非对称式光学干涉测量方法，包括以下步骤：
入射光源经过分光镜分为两束光，分别投射到待测物体表面和参考镜表面，并分别通过面积较大的待测物体侧的第一成像透镜、面积较小的参考镜侧的第二成像透镜，经第三成像透镜在光电传感器上叠加形成至少一个干涉图像；所述第一成像透镜的放大倍率小于所述第二成像透镜的放大倍率；
将相应干涉图像输入计算机，获得相应的干涉图像信号；
对相应的干涉图像信号进行解析，获得待测物体表面的三维形貌。
在上述技术方案中，通过同时调整所述第二成像透镜与分光镜之间的距离、所述参考镜与分光镜之间的距离，并保持所述第二成像透镜与参考镜之间的距离不变，以改变所述参考镜侧的光路和所述待测物体侧的光路之间的光程差，在所述光电传感器上形成多个干涉图像。
在上述技术方案中，在所述第二成像透镜和参考镜之间***准直透镜、直角转向反射镜和180度回射反射镜，通过调整直角转向反射镜和180度回射反射镜之间的距离，补偿由于改变待测物体的成像位置所引起的所述参考镜侧的光路和所述待测物体侧的光路之间的光程差。
在上述技术方案中，所述光电探测器为面阵相机光电传感器。
在上述技术方案中，利用相移算法或白光干涉法对相应的干涉图像信号进行解析。
本发明还提供了一种非对称式光学干涉测量装置，包括分光镜、待测 物体、面积较大的待测物体侧的第一成像透镜、参考镜、面积较小的参考镜侧的第二成像透镜、第三成像透镜和光电传感器，所述第一成像透镜的放大倍率小于所述第二成像透镜的放大倍率；
入射光源经所述分光镜分为两束光，分别投射到待测物体表面和参考镜表面，并分别通过所述第一成像透镜和所述第二成像透镜，经所述第三成像透镜在所述光电传感器上叠加形成至少一个干涉图像。
在上述技术方案中，所述参考镜位于所述第二成像透镜的后焦面。
本发明提供了一种测量方式简单易操作、测量范围较大的非对称式光学干涉测量方法及装置，采用不同的放大倍率，使用小面积的参考镜面，得到大面积的待测物体表面的干涉图像，根据一个或者多个干涉图像，解析获得待测物体表面的三维形貌，具有结构设计合理、操作方便、成本较低、数据采样时间短、测量仪器抗干扰能力强、测量精度高、测量范围大和工作稳定性能好等优点。
附图说明
图1为对称式光学干涉***的结构示意图；
图2为本发明提供的一种非对称式光学干涉测量方法流程图；
图3为本发明实施例1提供的一种非对称式光学干涉测量装置结构示意图；
图4为本发明实施例2提供的一种非对称式光学干涉测量装置结构示意图；
图5为本发明提供的单独使用参考镜M1侧的测量仪器所形成的参考镜M1的像；
图6为本发明提供的单独使用待测物体2侧的测量仪器所形成的待测物体2的像；
图7为本发明提供的同时使用参考镜M1侧和待测物体2侧的测量仪器 所形成的干涉图像。
具体实施方式
本发明提供了一种测量方式简单易操作、测量范围最大可达直径1000mm的非对称式光学干涉测量方法及装置，采用不同的放大倍率，使用小面积的参考镜面，得到大面积的待测物体表面的干涉图像，根据一个或者多个干涉图像，解析待测物体表面的三维形貌，具有结构设计合理、操作方便、成本较低、数据采样时间短、测量仪器抗干扰能力强、测量精度高、测量范围大和工作稳定性能好等优点。
下面结合说明书附图和具体实施方式对本发明做出详细的说明。
本发明提供了一种非对称式光学干涉测量方法，如图2所示，包括以下步骤：
S1、入射光源经过分光镜(分束镜)分为检测光和参考光两束光，分别投射到待测物体表面和参考镜表面，其中待测物体表面反射的检测光通过面积较大的待测物体侧的第一成像透镜，参考镜表面反射的参考光通过面积较小的参考镜侧的第二成像透镜，最后经第三成像透镜在面阵相机光电传感器上叠加形成至少一个干涉图像。
上述待测物体侧的第一成像透镜的放大倍率小于参考镜侧的第二成像透镜的放大倍率。
S2、将相应干涉图像输入计算机，获得相应的干涉图像信号。
S3、利用相移算法或白光干涉法对相应的干涉图像信号进行解析，获得待测物体表面的三维形貌。
通过同时调整第二成像透镜与分光镜之间的距离、参考镜与分光镜之间的距离，并保持第二成像透镜与参考镜之间的距离不变，以改变参考镜侧的光路和待测物体侧的光路之间的光程差，在光电传感器上形成多个干涉图像。
在第二成像透镜和参考镜之间***准直透镜、直角转向反射镜和180度回射反射镜，通过调整直角转向反射镜和180度回射反射镜之间的距离，补偿由于改变待测物体的成像位置所引起的参考镜侧的光路和待测物体侧的光路之间的光程差。
实施例1。
本发明实施例1提供了一种非对称式光学干涉测量装置，如图3所示，包括分光镜1、待测物体2、面积较大的待测物体2侧的第一成像透镜L1、参考镜M1(参考镜M1位于第二成像透镜L2的后焦面)、面积较小的参考镜M1侧的第二成像透镜L2、第三成像透镜L3和面阵相机光电传感器3，第一成像透镜L1的放大倍率小于第二成像透镜L2的放大倍率；入射光源(激光等相干性较高的光源)经分光镜1分为检测光和参考光两束光，分别投射到待测物体2表面和参考镜M1表面，其中，待测物体2表面反射的检测光通过第一成像透镜L1，参考镜M1表面反射的参考光通过第二成像透镜L2，最后经第三成像透镜L3在面阵相机光电传感器3上叠加形成至少一个干涉图像。
待测物体2侧的第一成像透镜L1具有较小的放大倍率，可以将大面积的待测物体表面成像到面阵相机光电传感器3表面，与此相反，参考镜M1侧的第二成像透镜L2具有较大的放大倍率，可以将小面积的参考镜M1表面成像到面阵相机光电传感器3表面，由于待测物体2表面和参考镜M1表面在面阵相机光电传感器表面3的成像完全重合，可以在面阵相机光电传感器3表面形成干涉图像，从而实现高相干性照明光源的大面积干涉成像。
实施例2。
本发明实施例2对实施例1进一步优化，提供了一种非对称式光学干涉测量装置，该装置既可以使用激光等相干性较高的光源作为入射光源，也可以使用卤素白光光源等相干性较低的光源，如图4所示，包括分光镜1、待测物体2、面积较大的待测物体2侧的第一成像透镜L1、参考镜M1、面 积较小的参考镜M1侧的第二成像透镜L2、第三成像透镜L3、面积较小的参考镜M1侧的准直透镜L4、面阵相机光电传感器3、直角转向反射镜M2和180度回射反射镜M3。
直角转向反射镜M2和180度回射反射镜M3设置在准直透镜L4和参考镜M1之间，通过调整直角转向反射镜M2和180度回射反射镜M3之间的距离，补偿由于改变待测物体2的成像位置所引起的参考镜M1侧的光路和待测物体2侧的光路之间的光程差。待测物体2的成像位置与测量范围密切相关，如果待测物体2与第一成像透镜L1之间的距离增大，则会增加待测物体2的测量范围，同时也增加了待测物体2侧光程，所以需要保证待测物体2侧的光路和参考镜M1侧的光路具有相同的光程，以实现低相干性照明光源的大面积干涉成像。
下面采用半导体激光光源作为入射光源对本发明提供的一种非对称式光学干涉测量方法的实现进行说明，所采用的半导体激光光源的中心波长为670nm，输出功率为0.8MW；参考镜M1的直径为3.15mm，表面精度为λ/20(@633nm)；参考镜M1侧的放大倍率为1.0；待测物体2为平板玻璃，其直径为45.0mm；待测物体2侧的放大倍数为0.07，所使用的面阵相机光电传感器为美国Opteon公司生产的面阵CCD工业相机。
如图5所示，为单独使用参考镜M1侧的测量仪器所形成的参考镜M1的像；如图6所示，为单独使用待测物体2侧的测量仪器所形成的待测物体2的像；如图7所示，为同时使用参考镜M1侧和待测物体2侧的测量仪器所形成的干涉图像。
由图5和图6可知，通过采用两个不同的放大倍率，参考镜和待测物体在面阵CCD工业相机表面形成大小相同的像；由图7可知，如果同时使用参考镜M1侧和待测物体2侧的测量仪器，这两幅像会在面阵CCD工业相机表面重合，形成干涉图像。
本发明不局限于上述最佳实施方式，任何人在本发明的启示下作出的结构变化，凡是与本发明具有相同或相近的技术方案，均落入本发明的保护范围之内。

Claims (7)

  1. 一种非对称式光学干涉测量方法，其特征在于，包括以下步骤：
    入射光源经过分光镜分为两束光，分别投射到待测物体表面和参考镜表面，并分别通过面积较大的待测物体侧的第一成像透镜、面积较小的参考镜侧的第二成像透镜，经第三成像透镜在光电传感器上叠加形成至少一个干涉图像；所述第一成像透镜的放大倍率小于所述第二成像透镜的放大倍率；
    将相应干涉图像输入计算机，获得相应的干涉图像信号；
    对相应的干涉图像信号进行解析，获得待测物体表面的三维形貌。
  2. 如权利要求1所述的非对称式光学干涉测量方法，其特征在于，通过同时调整所述第二成像透镜与分光镜之间的距离、所述参考镜与分光镜之间的距离，并保持所述第二成像透镜与参考镜之间的距离不变，以改变所述参考镜侧的光路和所述待测物体侧的光路之间的光程差，在所述光电传感器上形成多个干涉图像。
  3. 如权利要求2所述的非对称式光学干涉测量方法，其特征在于，在所述第二成像透镜和参考镜之间***准直透镜、直角转向反射镜和180度回射反射镜，通过调整直角转向反射镜和180度回射反射镜之间的距离，补偿由于改变待测物体的成像位置所引起的所述参考镜侧的光路和所述待测物体侧的光路之间的光程差。
  4. 如权利要求1所述的非对称式光学干涉测量方法，其特征在于，所述光电探测器为面阵相机光电传感器。
  5. 如权利要求1所述的非对称式光学干涉测量方法，其特征在于，利用相移算法或白光干涉法对相应的干涉图像信号进行解析。
  6. 一种非对称式光学干涉测量装置，其特征在于，包括分光镜、待测物体、面积较大的待测物体侧的第一成像透镜、参考镜、面积较小的参考镜侧的第二成像透镜、第三成像透镜和光电传感器，所述第一成像透镜的 放大倍率小于所述第二成像透镜的放大倍率；
    入射光源经所述分光镜分为两束光，分别投射到待测物体表面和参考镜表面，并分别通过所述第一成像透镜和所述第二成像透镜，经所述第三成像透镜在所述光电传感器上叠加形成至少一个干涉图像。
  7. 如权利要求6所述的非对称式光学干涉测量装置，其特征在于，所述参考镜位于所述第二成像透镜的后焦面。
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