WO2017140077A1 - 可切换防窥装置及其制备方法、显示装置 - Google Patents

可切换防窥装置及其制备方法、显示装置 Download PDF

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Publication number
WO2017140077A1
WO2017140077A1 PCT/CN2016/087063 CN2016087063W WO2017140077A1 WO 2017140077 A1 WO2017140077 A1 WO 2017140077A1 CN 2016087063 W CN2016087063 W CN 2016087063W WO 2017140077 A1 WO2017140077 A1 WO 2017140077A1
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Prior art keywords
substrate
layer
light
light directing
switchable
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PCT/CN2016/087063
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English (en)
French (fr)
Inventor
李文波
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京东方科技集团股份有限公司
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Priority to US15/534,301 priority Critical patent/US20180059450A1/en
Priority to EP16890309.4A priority patent/EP3418797B1/en
Publication of WO2017140077A1 publication Critical patent/WO2017140077A1/zh
Priority to US16/677,119 priority patent/US11231605B2/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1323Arrangements for providing a switchable viewing angle
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1334Constructional arrangements; Manufacturing methods based on polymer dispersed liquid crystals, e.g. microencapsulated liquid crystals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336Illuminating devices
    • G02F1/133602Direct backlight
    • G02F1/133606Direct backlight including a specially adapted diffusing, scattering or light controlling members
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1347Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells
    • G02F1/13476Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells in which at least one liquid crystal cell or layer assumes a scattering state
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133524Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • G02F1/133548Wire-grid polarisers

Definitions

  • At least one embodiment of the present invention relates to a switchable anti-spy device, a method of fabricating the same, and a display device.
  • the common anti-spyware technology includes glasses-type and naked-eye, and the glasses-type anti-spyware technology protects the separation of confidential information by assisting external devices.
  • the naked-eye anti-spyware technology realizes anti-peeping by controlling the angle of incident light incident on the display panel. .
  • the technology for realizing the anti-peep and normal display switching is relatively small, and the use of the director backlight technology can realize the switching of the wide viewing angle and the narrow viewing angle, but the technology has extremely high requirements for the manufacture of the light guide plate and the light source, and the general backlight manufacturer compares Difficult to meet design requirements.
  • the light source includes, for example, a Light Emitting Diode (LED) lighting bar.
  • the anti-spy film can only realize the anti-peep display, and the anti-peep switch can be realized in combination with other auxiliary devices, but the cost of the anti-spy film and the cost of the auxiliary device are high, and mass production has great difficulty.
  • At least one embodiment of the present invention relates to a switchable anti-spy device, a method for fabricating the same, and a display device.
  • the switchable anti-spy device can realize switching between a wide viewing angle and a narrow viewing angle to meet real-time needs of people in different occasions.
  • At least one embodiment of the present invention provides a switchable anti-spy device, including a first substrate and a second substrate disposed opposite to each other, and a dimming layer between the first substrate and the second substrate, the first The substrate includes a first substrate and a first light alignment layer and a first electrode layer disposed on the first substrate, the second substrate includes a second substrate, and is disposed on the second substrate a second electrode layer on the substrate, the first light directing layer defines an exit angle of light passing through the first light directing layer, and the light adjusting layer is switchable between a transparent state and a scattering state.
  • At least one embodiment of the present invention further provides a display device, including a display panel, a backlight module, and any switchable anti-spy device according to the embodiment of the present invention, wherein the switchable anti-spy device is located in the backlight module Between the display panel and the display panel.
  • At least one embodiment of the present invention also provides a method for preparing a switchable anti-spy device, including: Forming a first light directing layer and a first electrode layer on the first base substrate to prepare a first substrate, the first light directing layer defining an exit angle of light passing through the first light directing layer; Forming a second electrode layer on the base substrate to prepare a second substrate; and providing a dimming layer between the first substrate and the second substrate, the dimming layer being switchable between a transparent state and a scattering state.
  • FIG. 1 is a schematic diagram of a switchable anti-spy device according to an embodiment of the present invention (a schematic diagram of a wide viewing angle optical path);
  • FIG. 2 is a schematic diagram of a switchable anti-spy device according to an embodiment of the present invention (a schematic diagram of a narrow viewing angle optical path);
  • FIG. 3 is a schematic diagram of another switchable anti-spy device according to an embodiment of the present invention.
  • FIG. 4 is a schematic plan view of a first light directing layer or a second light directing layer in a switchable anti-spy device according to an embodiment of the present invention
  • FIG. 5 is a schematic diagram of a first substrate and a second substrate electrically connected by a conductive structure in a switchable anti-spy device according to an embodiment of the present invention
  • Figure 6 is a cross-sectional view taken along line A-A' of Figure 5;
  • FIG. 7a is a schematic diagram of a display device according to an embodiment of the present invention.
  • FIG. 7b is a schematic diagram of a black matrix pattern in a display panel in a display device according to an embodiment of the invention.
  • FIG. 8 is a schematic diagram of another display device according to an embodiment of the present invention.
  • 9a is a schematic diagram of forming a first light alignment layer on a first substrate in a method for fabricating a switchable anti-spy device according to an embodiment of the present invention
  • 9b is a schematic diagram of forming an insulating layer on a first photo alignment layer in a method for fabricating a switchable anti-spy device according to an embodiment of the present invention
  • 9c is a schematic diagram of forming a first electrode layer on an insulating layer in a method for fabricating a switchable anti-spy device according to an embodiment of the present invention
  • FIG. 10 is a schematic diagram of a method for preparing a switchable anti-spy device according to an embodiment of the present invention. A schematic diagram of forming a second electrode layer on two substrate substrates;
  • FIG. 11a illustrates a first photo-alignment film formed on a first substrate in a method for fabricating a switchable anti-spy device according to an embodiment of the present invention
  • FIG. 11b is a schematic diagram of a method for fabricating a switchable anti-spy device according to an embodiment of the present invention, forming a first photoresist on a first photo-alignment film;
  • 11c is a first photoresist in which a first photoresist is exposed and developed to form a pattern in a method for preparing a switchable anti-spy device according to an embodiment of the present invention
  • FIG. 11 is a method for fabricating a switchable anti-spy device according to an embodiment of the present invention, wherein the first photo-alignment film is etched by using a patterned first photoresist as a mask.
  • 12-switchable anti-spy device 10-first substrate; 20-second substrate; 30-dimming layer; 40-conductive structure; 50-seal structure; 101-first substrate; 102-first light orientation Layer; 1021 - first photoresist wall; 103 - first electrode layer; 104 - insulating layer; 105 - second light directing layer; 1051 - second photoresist wall; 201 - second substrate; Second electrode layer; 106-lead; 67-display panel; 60-lower substrate; 601-wire grid polarizing film; 70-upper substrate; 701-black matrix pattern; 76-liquid crystal layer; 89-backlight module; Light guide plate; 892-light source; 893-diffusion film; 894-prism film; 895-reflector; 7011-first black matrix; 7012-second black matrix; 90-sub-pixel; 1023-first light-oriented film; a first photoresist; 1028 - a patterned first photoresist.
  • the photolithography process in the embodiment of the present invention refers to a process including film formation, exposure, development, and the like, and forms a pattern by using a photoresist, a mask, an exposure machine, or the like.
  • At least one embodiment of the present invention provides a switchable anti-spy device, including a first substrate and a second substrate disposed opposite to each other, and a light control layer between the first substrate and the second substrate, the first substrate including the first substrate a substrate and a first light alignment layer and a first electrode layer disposed on the first substrate; the second substrate includes a second substrate and a second electrode layer disposed on the second substrate, the first light orientation
  • the layer defines an exit angle of light passing through the first light directing layer, and the dimming layer is switchable between a transparent state and a scattering state.
  • the switchable anti-spy device can realize wide-angle and narrow-angle switching by one-touch switching, and meets real-time needs of people in different occasions. When sharing information with everyone, a wide viewing angle mode (normal display) can be adopted; When you need to use it personally or close it, you can use the narrow viewing angle mode (anti-peep mode), which has strong economic value and market value.
  • At least one embodiment of the present invention further provides a method for fabricating a switchable anti-spying device, the method comprising: forming a first photo-alignment layer and a first electrode layer on a first substrate to prepare a first substrate, the first light
  • the alignment layer defines an exit angle of the light passing through the first light alignment layer; forming a second electrode layer on the second substrate to prepare a second substrate; and providing a dimming layer between the first substrate and the second substrate
  • the light layer can switch between a transparent state and a scattering state.
  • the preparation method of the switchable anti-spying device can utilize the production line process of a liquid crystal display (LCD), and can greatly utilize the own equipment and process of the production line to reduce the product cost.
  • LCD liquid crystal display
  • the embodiment provides a switchable anti-spying device 12, as shown in FIG. 1, including a first substrate 10 and a second substrate 20 disposed opposite to each other, and a dimming layer 30 between the first substrate 10 and the second substrate 20.
  • the first substrate 10 includes a first substrate 101 and a first light alignment layer 102 and a first electrode layer 103 disposed on the first substrate 101
  • the second substrate 20 includes a second substrate 201, and is disposed at The second electrode layer 202 on the second substrate 201
  • the first light alignment layer 102 defines the passage
  • the dimming layer 30 can switch between a transparent state and a scattering state.
  • the dimming layer includes a liquid crystal dimming layer, but is not limited thereto.
  • the first light directing layer 102 defines an exit angle of light passing through the first light directing layer 102 that is less than 180°.
  • the light adjustment layer 30 is in a transparent state.
  • the dimming layer 30 is in a scattering state.
  • the exit angle of the light passing through the switchable anti-spying device 12 corresponds to the angle of incident light incident on the display panel.
  • the first base substrate 101 and the second base substrate 201 may include a glass substrate or a resin substrate, but are not limited thereto.
  • the dimming layer 30 is in a scattering state, and the light incident on the switchable anti-spying device passes through the first light aligning layer 102, and the exit angle is limited. However, the light whose output angle is limited is dimmed by the scattering state. After the layer 30, the directional light is evenly scattered, and the exit angle is no longer limited, but is emitted in various directions, so that the light passing through the switchable anti-spying device can be changed into non-directional light, so that the switchable anti-track is included.
  • the display screen of the display device of the peek device 12 is a wide viewing angle (non-narrow viewing angle) screen, and realizes wide viewing angle display, and presents a non-anti-peep state.
  • the light-adjusting layer 30 is in a transparent state. After the light incident on the switchable anti-spying device 12 passes through the first light-aligning layer 102, the exit angle is limited, and the light whose output angle is limited passes through the transparent light-adjusting layer 30. After that, the exit angle is still limited. Thereby, the light passing through the switchable anti-spying device 12 can be changed into directional light, so that the display screen of the display device including the switchable anti-spy device 12 is a narrow viewing angle picture, and the narrow viewing angle display is realized, and the anti-spy state is presented.
  • an electric field is formed or not formed between the first electrode layer 103 and the second electrode layer 202, so that the dimming layer 30 is switched between the transparent state and the scattering state, so that the display device including the switchable anti-spy device 12 is Switch between the anti-spy state and the non-peep state.
  • the dimming layer 30 can adopt a liquid crystal dimming film.
  • a polymer dispersible liquid crystal (PDLC) can be used, and the PDLC mainly works in transparent.
  • State or scattering state for example, PDLC is a method of mixing low molecular liquid crystal and prepolymer glue, and polymerizing to form micron-sized liquid crystal droplets uniformly dispersed in a polymer network, and then utilizing dielectric anisotropy of liquid crystal molecules. A material having the corresponding properties of electro-optical light is obtained.
  • the material of the liquid crystal dimming layer is not limited thereto, as long as it can be in a transparent state and a scattering state.
  • the liquid crystal that switches between them can be used.
  • the liquid crystal in the light adjustment layer 30 may be a smectic liquid crystal, but is not limited thereto.
  • a second light is further disposed on the first substrate 101, on the opposite side of the first light directing layer 102.
  • the alignment layer 105, the second light alignment layer 105 defines an exit angle of light passing through the second light alignment layer 105.
  • the second light directing layer 105 defines an exit angle of light passing through the second light directing layer 105 of less than 180°.
  • the arrangement of the second light directing layer 105 can further limit the exit angle of the light and enhance the orientation effect of the light.
  • the first light directing layer 102 is located on the side of the first substrate facing the second substrate, and the second light directing layer 105 is located on the side of the first substrate facing away from the second substrate. Not limited to this.
  • the first light directing layer 102 may also be located on a side of the first substrate that faces away from the second substrate.
  • the second light alignment layer 105 may also be disposed on the same side of the first substrate 101, which is not limited by the embodiment of the present disclosure.
  • the switchable anti-spy device includes a plurality of parallel first photoresist walls 1021.
  • the number of the first photoresist wall surface 1021 shown in the figure is not limited, and FIG. 4 is only a schematic description.
  • the first resistive wall surface 1021 can define an exit angle of the light passing through the first light directing layer, and is not limited to the case of being parallel to each other.
  • the shape may be other shapes, which is not limited in this embodiment.
  • the exit angle of the light passing through the first light directing layer 102 can be adjusted by adjusting the height of the first photoresist wall surface 1021 and/or the distance of the adjacent two first resistive wall surfaces 1021 can be adjusted to adjust the passage.
  • the angle of exit of the light behind the first light directing layer 102 may be limited to 60°, further limited to, for example, within 45°, and further limited to, for example, within 30°, but Not limited to this.
  • the exit angle ⁇ refers to, for example, the outgoing light passing through the intersection of the center line of the distance between the adjacent two first photoresist walls and the side of the first base substrate facing away from the second substrate.
  • the maximum exit angle behind the first photoresist wall may also refer to the maximum angle of the exiting light after the light passes through the adjacent two first photoresist walls.
  • the second light directing layer 105 includes a plurality of parallel second photoresist walls 1051.
  • the second photoresist wall surface 1051 can define an exit angle of the light passing through the first light directing layer, and is not limited to being parallel to each other.
  • other shapes may be used, which are not limited in this embodiment.
  • the projection of each of the first photoresist walls 1021 on the first substrate 101 may coincide with the projection of each of the second photoresist walls 1051 on the first substrate 1011.
  • Such a setting can be easily fabricated, for example, the same mask can be used in the case of fabrication by a photolithography process.
  • the exit angle ⁇ ' of light after passing through the first light directing layer 102 and the second light directing layer 105 in the case where the first light directing layer 102 and the second light directing layer 105 are disposed is shown in FIG.
  • the exit angle ⁇ ' refers to, for example, the exit light passing through the adjacent two second photoresist walls and corresponding to the midpoint of the side of the adjacent two second photoresist walls facing away from the first photoresist wall surface. The maximum exit angle behind the first photoresist wall at the location.
  • the exit angle of the light passing through the second light directing layer 105 can be adjusted by adjusting the height of the second photoresist wall surface 1051 and/or adjusted by adjusting the distance between the adjacent two second photoresist walls 1051.
  • the projection of each of the first photoresist walls 1021 on the first substrate 101 and the projection of the second photoresist walls 1051 on the first substrate 1011 may not coincide.
  • the exit angle ⁇ ′ may also refer to the outgoing light after the light passes through two adjacent second photoresist walls and two adjacent first photoresist walls corresponding to the adjacent two second photoresist walls. The maximum angle.
  • the number of the first photoresist wall surface 1021 and/or the second photoresist wall surface 1051 is not limited to the number shown in the figure, and the figure is only schematic. Description.
  • the material of the first light aligning layer 102 may include metal (Cr), chrome oxide, or black resin, but is not limited thereto.
  • the material of the second light directing layer 105 may include metal chromium (Cr), chromium oxide or black resin, but is not limited thereto.
  • the first electrode layer 103 may include a planar electrode
  • the second electrode layer 202 may include a planar electrode
  • the first electrode layer 103 and the second electrode layer 202 is not limited to a planar electrode
  • the materials of the first electrode layer 103 and the second electrode layer 202 are all transparent conductive materials.
  • ITO Indium Tin Oxide
  • the first electrode layer 103 is closer to the dimming layer 30 than the first light directing layer 102.
  • the first electrode layer 103 can be brought closer to the second electrode layer 202, so that the electric field formed by the two is easier and faster to switch the dimming layer into a transparent state.
  • the first light directing layer 102 and the first electrode layer 103 are located on the same side of the first substrate 101, and the first light directing layer 102
  • An insulating layer 104 is disposed between the first electrode layer 103 and the first electrode layer 103.
  • the first light directing layer 102 is closer to the first base substrate 101 than the first electrode layer 103, and the insulating layer 104 has a substantially flat surface.
  • the material of the insulating layer may include a resin, but is not limited thereto.
  • the switchable anti-spy device includes a second electrode layer 202 via a conductive structure 40 disposed between the first substrate 10 and the second substrate 20 .
  • the leads 106 of the second electrode layer 202 on the first substrate 10 are electrically connected, but are not limited thereto.
  • the lead 106 may be disposed in the same layer as the first electrode layer 103, but is not limited thereto.
  • the first electrode layer 103 is disposed in the display area 1011 of the switchable anti-spy device, and the lead 106 is disposed in the peripheral area 1012 of the switchable anti-spy device.
  • the peripheral region 1012 can be located on at least one side of the display region 1011, for example, as shown in FIG. 5, the peripheral region 1012 can be disposed around the display region 1011.
  • the display area 1011 and the peripheral area 1012 of the switchable anti-spy device correspond to, for example, the display area and the peripheral area of the display panel.
  • the conductive structure 40 may be an anisotropic conductive paste, but is not limited thereto.
  • the anisotropic conductive paste is non-conductive in a direction parallel to the first substrate, and is electrically conductive in a direction perpendicular to the first substrate.
  • the conductive structure 40 may be a conductive silver paste, but is not limited thereto.
  • it may be electrically connected to the lead 106 on the first base substrate by screen printing, but is not limited thereto.
  • the material of the lead 106 may include metal, but is not limited thereto.
  • the first substrate 10 and the second substrate 20 may be integrated by the sealing structure 50.
  • the sealing structure 50 can be, for example, a frame sealant, but is not limited thereto.
  • the switchable anti-spy device can integrate the first substrate and the second substrate and the dimming layer therebetween to achieve better optical effects and save cost.
  • the embodiment provides a display device, as shown in FIG. 7a, including a display panel 67, a backlight module 89, and any switchable anti-spy device 12 according to the first embodiment.
  • the switchable anti-spy device 12 is located in the backlight mode. Between group 89 and display panel 67.
  • the backlight module 89 provides backlight for the display panel, and the backlight is incident on the display panel 67 via the switchable anti-spy device 12.
  • the emitted light after the backlight passes through the switchable anti-spying device 12 corresponds to the incident light incident on the display panel 67.
  • the display panel 67 includes a liquid crystal display panel.
  • the lower substrate 60 may be an array substrate
  • the upper substrate 70 may be a color film substrate, an upper substrate and a lower substrate.
  • the liquid crystal layer 76 is interposed.
  • a gate line, a data line, a Thin Film Transistor (TFT), a pixel electrode, and the like may be disposed on the array substrate.
  • a black matrix pattern, a color film layer, and the like can be disposed on the color filter substrate.
  • the common electrode may be disposed on the array substrate or on the color filter substrate.
  • the liquid crystal display panel is not limited to the structure described above.
  • the display panel may be a Vertical Alignment (VA) display mode, or may be a Twisted Nematic (TN) display mode, an Advanced-Super Dimensional Switching (ADS) display mode, or In-Plane Switching (IPS) display mode, which is not limited.
  • VA Vertical Alignment
  • TN Twisted Nematic
  • ADS Advanced-Super Dimensional Switching
  • IPS In-Plane Switching
  • the backlight module 89 may include a light guide plate 891, a light source 892 disposed on one side of the light guide plate 891, and a diffusion film 893 and a prism disposed on a side of the light guide plate 891 near the display panel 67.
  • a reflection plate 895 may be further disposed on the side of the light guide plate 891 away from the display panel 67. It should be noted that the backlight module 89 is not limited to the structure given above.
  • the first light alignment layer 102 includes a plurality of parallel first photoresist walls 1021 (see FIG. 4), and the upper substrate or the lower substrate may include a black matrix pattern 701. (See Fig. 7a), the projection of the plurality of parallel first photoresist walls 1021 on the first substrate 101 is within the projection of the black matrix pattern 701 on the first substrate 101.
  • a plan view of the black matrix pattern may be as shown in FIG. 7b, including a plurality of first black matrices 7011 that are parallel to each other in the lateral direction and a plurality of second black matrices 7012 that are parallel to each other in the longitudinal direction, transverse to the longitudinal direction.
  • the projections of the plurality of parallel first photoresist walls 1021 on the first substrate 101 are located on the first substrate 101 in a plurality of parallel second black matrices 7012 arranged longitudinally in the black matrix pattern 701.
  • the projection of the plurality of parallel first photoresist walls 1021 on the first substrate 101 may be located on a portion of the longitudinally arranged plurality of parallel second black matrices 7012 on the first substrate 101.
  • the adjacent two first photoresist walls 1021 may be disposed every other column or columns of sub-pixels, which is not limited herein. It should be noted that the rows in this embodiment can be replaced by columns.
  • the second photoresist wall surface 1051 in the second light alignment layer 105 can be disposed with reference to the first photoresist surface 1021 in the first light alignment layer 102.
  • the display panel 67 includes an upper substrate 70 and a lower substrate 60, and the lower substrate 60 can be multiplexed into a second lining of the switchable anti-spy device.
  • Base substrate 201 With this arrangement, the thickness of the entire display device can be further reduced.
  • a wire grid polarizing film 601 is disposed on the lower substrate 60, and the wire grid polarizing film 601 can be multiplexed into a second electrode layer of the switchable anti-spy device. 202.
  • This arrangement can further reduce the thickness of the entire display device.
  • the wire grid polarizing film 601 includes a plurality of metal wires arranged in parallel.
  • each metal wire may have a width of 30 nm to 50 nm, a distance between adjacent two metal wires may be 100-150 nm, and a height of each metal wire may be 100-300 nm, but is not limited thereto.
  • the properties of the wire grid polarizing film are as follows: for natural light to be irradiated onto the wire grid polarizing film, linearly polarized light parallel to the direction of the metal line is almost completely reflected back, and linearly polarized light perpendicular to the direction of the metal line can be transmitted through.
  • the wire grid polarizing film can serve as a lower polarizing plate of the display panel at the same time.
  • the wire grid polarizing film 601 is a Wire Grid Polarizer (WGP). Since the wire grid polarizing film 601 has a small gap at the nanometer level, the effect can be substantially similar to that of the planar electrode, and thus can be multiplexed into the second electrode layer 202 of the switchable anti-spying device.
  • WGP Wire Grid Polarizer
  • the embodiment provides a method for preparing a switchable anti-spy device, and the method may include the following steps:
  • first light directing layer 102 and a first electrode layer 103 Forming a first light directing layer 102 and a first electrode layer 103 on the first base substrate 101 to prepare a first substrate 10, the first light directing layer 102 defining an exit angle of light passing through the first light directing layer 102;
  • a dimming layer 30 is disposed between the first substrate 10 and the second substrate 20, and the dimming layer 30 is switchable between a transparent state and a scattering state.
  • the preparation method of the switchable anti-spying device can utilize the production line process of a liquid crystal display (LCD), and can greatly utilize the own equipment and process of the production line to reduce the product cost.
  • LCD liquid crystal display
  • the method of preparing the switchable anti-spy device may include the following steps:
  • the first substrate 10 is prepared.
  • a first light directing layer 102 is formed on the first base substrate 101, and the first light directing layer 102 defines an exit angle of the light passing through the first light directing layer 102; as shown in FIG. 9b, An insulating layer 104 is formed on the first photo alignment layer 102; as shown in FIG. 9c, a first electrode layer 103 is formed on the insulating layer 104.
  • a second electrode layer 202 is formed on the second base substrate 201.
  • the first photo alignment layer 102 may be formed by a photolithography process.
  • forming the first light directing layer 102 includes forming a plurality of parallel first photoresist walls 1021.
  • forming the first photo-alignment layer 102 by a photolithography process includes the following steps:
  • a first light directing film 1023 is formed on the first substrate 101;
  • a first photoresist 1026 is formed on the first photo-alignment film 1023;
  • the first photoresist 1026 is exposed and developed to form a patterned first photoresist 1028;
  • the first photo-alignment film 1023 is etched using the patterned first photoresist 1028 as a mask.
  • the patterned first photoresist 1028 is stripped to form, for example, the first photo alignment layer 102 as shown in FIG.
  • a negative photoresist may be used to form the first light alignment layer 102, but is not limited thereto.
  • the first photo-alignment film 1023 can also be formed by using a black negative photoresist. Thus, after exposing and developing the first photo-alignment film 1023, for example, the first image as shown in FIG. 9 can be obtained.
  • Light directing layer 102 is provided.
  • the method further includes forming a second photo-alignment layer 105 formed on the first substrate 101 and formed on the first substrate
  • a substrate substrate 101 is formed with an opposite side of the first light directing layer 102, and the second light directing layer 105 defines an exit angle of light passing through the second light directing layer 105.
  • forming the second light directing layer 105 includes forming a plurality of parallel second photoresist walls 1051, a projection of each of the first photoresist walls 1021 on the first substrate 101 and each second light The projections of the barrier wall surface 1051 on the first base substrate 101 coincide.
  • the second photo-alignment layer 105 is formed by a photolithography process.
  • forming the second light directing layer by a photolithography process includes the following steps:
  • the patterned second photoresist is stripped to form a second photo alignment layer.
  • a negative photoresist may be used to form the second light alignment layer 105, but is not limited thereto.
  • the second photo-alignment film can also be formed by using a black negative photoresist, so that after the second photo-alignment film is exposed and developed, the second photo-alignment layer can be obtained.
  • the preparation of the second photo-alignment layer can be referred to the drawings for preparing the first photo-alignment layer.
  • the substrate substrate 201 and the like can be referred to the description in the previous embodiment, and details are not described herein again.

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Abstract

一种可切换防窥装置及其制备方法、显示装置。该可切换防窥装置包括相对设置的第一基板(10)和第二基板(20)以及位于第一基板(10)和第二基板(20)之间的调光层(30),第一基板(10)包括第一衬底基板(101)和设置在第一衬底基板(101)上的第一光定向层(102)和第一电极层(103),第二基板(20)包括第二衬底基板(201)以及设置在第二衬底基板(201)上的第二电极层(202),第一光定向层(102)限定经过第一光定向层(102)后的光线的出射角度,调光层(30)可在透明态和散射态之间进行切换。该可切换防窥装置可实现宽视角和窄视角的切换,满足人们不同场合下的实时需求。

Description

可切换防窥装置及其制备方法、显示装置 技术领域
本发明至少一实施例涉及一种可切换防窥装置及其制备方法、显示装置。
背景技术
通常的防窥技术包括眼镜式和裸眼式,眼镜式防窥技术通过辅助外部器件来进行保密信息的分离保护,裸眼式防窥技术通过对入射到显示面板的入射光角度的控制来实现防窥。
而可实现防窥与正常显示切换的技术相对较少,利用指向矢背光技术可实现宽视角和窄视角的切换,但该技术对导光板的制作及光源的要求极高,一般背光制造商较难满足设计要求。光源例如包括有机发光二极管(Light Emitting Diode,LED)灯条(lighting Bar)。而利用防窥膜只能实现防窥显示,结合其它辅助器件可实现防窥切换,但防窥膜的成本及辅助器件的成本都很高,量产有较大的困难。
发明内容
本发明的至少一实施例涉及一种可切换防窥装置及其制备方法、显示装置,该可切换防窥装置可实现宽视角和窄视角的切换,满足人们不同场合下的实时需求。
本发明至少一实施例提供一种可切换防窥装置,包括相对设置的第一基板和第二基板以及位于所述第一基板和所述第二基板之间的调光层,所述第一基板包括第一衬底基板和设置在所述第一衬底基板上的第一光定向层和第一电极层,所述第二基板包括第二衬底基板以及设置在所述第二衬底基板上的第二电极层,所述第一光定向层限定经过所述第一光定向层后的光线的出射角度,所述调光层可在透明态和散射态之间进行切换。
本发明至少一实施例还提供一种显示装置,包括显示面板、背光模组以及本发明实施例中所述的任一可切换防窥装置,所述可切换防窥装置位于所述背光模组和所述显示面板之间。
本发明至少一实施例还提供一种可切换防窥装置的制备方法,包括:在 第一衬底基板上形成第一光定向层和第一电极层以制备第一基板,所述第一光定向层限定经过所述第一光定向层后的光线的出射角度;在第二衬底基板上形成第二电极层以制备第二基板;在所述第一基板和所述第二基板之间设置调光层,所述调光层可在透明态和散射态之间进行切换。
附图说明
为了更清楚地说明本发明实施例的技术方案,下面将对实施例的附图作简单地介绍,显而易见地,下面描述中的附图仅仅涉及本发明的一些实施例,而非对本发明的限制。
图1为本发明一实施例提供的一种可切换防窥装置示意图(宽视角光路原理示意图);
图2为本发明一实施例提供的一种可切换防窥装置示意图(窄视角光路原理示意图);
图3为本发明一实施例提供的另一种可切换防窥装置示意图;
图4为本发明一实施例提供的可切换防窥装置中第一光定向层或第二光定向层的平面示意图;
图5为本发明一实施例提供的可切换防窥装置中第一基板和第二基板通过导电结构电连接的示意图;
图6为图5中A-A’向的剖视示意图;
图7a为本发明一实施例提供的一种显示装置示意图;
图7b为本发明一实施例提供的一种显示装置中显示面板中的黑矩阵图形的示意图;
图8为本发明一实施例提供的另一种显示装置示意图;
图9a为本发明一实施例提供的一种可切换防窥装置的制备方法中在第一衬底基板上形成第一光定向层的示意图;
图9b为本发明一实施例提供的一种可切换防窥装置的制备方法中在第一光定向层上形成绝缘层的示意图;
图9c为本发明一实施例提供的一种可切换防窥装置的制备方法中在绝缘层上形成第一电极层的示意图;
图10为本发明一实施例提供的一种可切换防窥装置的制备方法中在第 二衬底基板上形成第二电极层的示意图;
图11a为本发明一实施例提供的一种可切换防窥装置的制备方法中在第一衬底基板上形成第一光定向薄膜;
图11b为本发明一实施例提供的一种可切换防窥装置的制备方法中在第一光定向薄膜上形成第一光刻胶;
图11c为本发明一实施例提供的一种可切换防窥装置的制备方法中对第一光刻胶进行曝光、显影,形成图案化的第一光刻胶;
图11d为本发明一实施例提供的一种可切换防窥装置的制备方法中以图案化的第一光刻胶为掩模,对第一光定向薄膜进行刻蚀。
附图标记:
12-可切换防窥装置;10-第一基板;20-第二基板;30-调光层;40-导电结构;50-密封结构;101-第一衬底基板;102-第一光定向层;1021-第一光阻墙面;103-第一电极层;104-绝缘层;105-第二光定向层;1051-第二光阻墙面;201-第二衬底基板;202-第二电极层;106-引线;67-显示面板;60-下基板;601-线栅偏光膜;70-上基板;701-黑矩阵图形;76-液晶层;89-背光模组;891-导光板;892-光源;893-扩散膜;894-棱镜膜;895-反射板;7011-第一黑矩阵;7012-第二黑矩阵;90-子像素;1023-第一光定向薄膜;1026-第一光刻胶;1028-图案化的第一光刻胶。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例的附图,对本发明实施例的技术方案进行清楚、完整地描述。显然,所描述的实施例是本发明的一部分实施例,而不是全部的实施例。基于所描述的本发明的实施例,本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例,都属于本发明保护的范围。
除非另外定义,本公开使用的技术术语或者科学术语应当为本发明所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。同样,“一个”、“一”或者“该”等类似词语也不表示数量限制,而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出现 该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接,而是可以包括电性的连接,不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系,当被描述对象的绝对位置改变后,则该相对位置关系也可能相应地改变。
需要说明的是,本发明实施例中的光刻工艺例如是指包括成膜、曝光、显影等工艺过程,利用光刻胶、掩模板、曝光机等形成图形。
本发明至少一实施例提供一种可切换防窥装置,包括相对设置的第一基板和第二基板以及位于第一基板和第二基板之间的调光层,第一基板包括第一衬底基板和设置在第一衬底基板上的第一光定向层和第一电极层,第二基板包括第二衬底基板以及设置在第二衬底基板上的第二电极层,第一光定向层限定经过第一光定向层后的光线的出射角度,调光层可在透明态和散射态之间进行切换。该可切换防窥装置可通过一键式切换可实现宽视角和窄视角的切换,满足人们不同场合下的实时需求,需要和大家进行信息分享的时候,可采用宽视角模式(正常显示);需要个人使用或密用的时候,可采用窄视角模式(防窥模式),具有极强的经济价值和市场价值。
本发明至少一实施例还提供一种可切换防窥装置的制备方法,该方法包括:在第一衬底基板上形成第一光定向层和第一电极层以制备第一基板,第一光定向层限定经过第一光定向层后的光线的出射角度;在第二衬底基板上形成第二电极层以制备第二基板;在第一基板和第二基板之间设置调光层,调光层可在透明态和散射态之间进行切换。该可切换防窥装置的制备方法可利用液晶显示器(Liquid Crystal Display,LCD)的产线工艺,可极大程度利用产线自有设备及工艺,降低产品成本。
下面通过几个实施例进行说明。
实施例一
本实施例提供一种可切换防窥装置12,如图1所示,包括相对设置的第一基板10和第二基板20以及位于第一基板10和第二基板20之间的调光层30,第一基板10包括第一衬底基板101和设置在第一衬底基板101上的第一光定向层102和第一电极层103,第二基板20包括第二衬底基板201以及设置在第二衬底基板201上的第二电极层202,第一光定向层102限定经过第 一光定向层102后的光线的出射角度,调光层30可在透明态和散射态之间进行切换。例如,调光层包括液晶调光层,但不限于此。例如,第一光定向层102限定经过第一光定向层102后的光线的出射角度小于180°。例如,第一电极层103和第二电极层202之间形成电场的情况下,调光层30呈透明态。第一电极层103和第二电极层202没有电场的情况下,调光层30呈散射态。经过可切换防窥装置12后的光线的出射角度即对应于入射到显示面板的入射光角度。例如,第一衬底基板101和第二衬底基板201可包括玻璃基板或树脂基板,但不限于此。
图1中调光层30呈散射态,入射到可切换防窥装置的光虽然经过第一光定向层102后,出射角度受到限制,但是,该出射角度受到限制的光经过散射态的调光层30后,定向光线被均匀的散射,出射角度不再受限,而是向各个方向出射,从而,可使得经过可切换防窥装置后的光变为非定向光,使得包括该可切换防窥装置12的显示装置的显示画面为宽视角(非窄视角)画面,实现宽视角显示,呈现非防窥状态。此状态下,第一电极层103和第二电极层202之间没有电场,可不对第一电极层103和第二电极层202施加电压,或者第一电极层103和第二电极层202等电位。
图2中调光层30呈透明态,入射到可切换防窥装置12的光经过第一光定向层102后,出射角度受到限制,该出射角度受到限制的光经过透明态的调光层30后,出射角度依然受到限制。从而,可使得经过可切换防窥装置12后的光变为定向光,使得包括该可切换防窥装置12的显示装置的显示画面为窄视角画面,实现窄视角显示,呈现防窥状态。故而,第一电极层103和第二电极层202之间形成或者不形成电场,使得调光层30在透明态和散射态之间进行切换,从而使得包括可切换防窥装置12的显示装置在防窥状态和非防窥状态之间进行切换。
例如,本实施例的一个示例提供的可切换防窥装置中,调光层30可采用液晶调光膜,例如,可采用聚合物分散液晶(Polymer Dispersed Liquid Crystal,PDLC),PDLC主要工作在透明态或散射态,例如,PDLC是将低分子液晶与预聚物胶混合,经聚合反应,形成微米级的液晶微滴均匀的分散在高分子网络中,再利用液晶分子的介电各向异性获得具有电光相应特性的材料。需要说明的是,液晶调光层的材质不限于此,只要是能够在透明态和散射态之 间进行切换的液晶即可。例如,调光层30中的液晶可采用近晶相液晶,但不限于此。
例如,如图3所示,本实施例的一个示例提供的可切换防窥装置中,在第一衬底基板101上,与第一光定向层102的相反侧上,还设置有第二光定向层105,第二光定向层105限定经过第二光定向层105后的光线的出射角度。例如,第二光定向层105限定经过第二光定向层105后的光线的出射角度小于180°。第二光定向层105的设置,可以进一步限制光的出射角度,增强光的定向效果。本示例中,以第一光定向层102位于第一衬底基板朝向第二基板的一侧,第二光定向层105位于第一衬底基板背离第二基板的一侧为例进行说明,但不限于此。例如,只包括第一光定向层102的情况下,第一光定向层102也可位于第一衬底基板背离第二基板的一侧。需要说明的是,第二光定向层105亦可设置在第一衬底基板101的同一侧,本公开的实施例对此不作限定。
例如,如图4所示,本实施例的一个示例提供的可切换防窥装置中,第一光定向层102包括多个平行的第一光阻墙面1021。需要说明的是,不以图中显示的第一光阻墙面1021的个数为限,图4只是示意性的描述。第一光阻墙面1021能限定经过所述第一光定向层后的光线的出射角度即可,不限于互相平行的情况,例如,还可为其它形状,本实施例对此不作限定。例如,可以通过调节第一光阻墙面1021的高度来调节经过第一光定向层102后的光线的出射角度和/或者通过调整相邻两个第一光阻墙面1021的距离来调节经过第一光定向层102后的光线的出射角度。例如,可使得经过第一光定向层102后的光线的出射角度θ(如图2所示)限制在60°以内,进一步例如限制在45°以内,更进一步例如限制在30°以内,但并不限于此。出射角度θ例如是指经过相邻两个第一光阻墙面之间的距离的中线与第一衬底基板的背离第二衬底基板的一侧的交点处的出射光经该相邻两个第一光阻墙面后的最大出射角度。例如,出射角度θ还可以指光经过相邻两个第一光阻墙面后的出射光的最大夹角。
例如,如图4所示,本实施例的一个示例提供的可切换防窥装置中,第二光定向层105包括多个平行的第二光阻墙面1051。第二光阻墙面1051能限定经过所述第一光定向层后的光线的出射角度即可,不限于互相平行的情 况,例如,还可为其它形状,本实施例对此不作限定。如图3所示,各第一光阻墙面1021在第一衬底基板101上的投影可与各第二光阻墙面1051在第一衬底基板1011上的投影相重合。如此设置,可易于制作,例如采用光刻工艺制备的情况下可使用同一掩模板。另外,还可以进一步减小经过第一光定向层后的光的出射角度。图3中示出了设置第一光定向层102和第二光定向层105的情况下,经过第一光定向层102和第二光定向层105后的光的出射角度θ’。出射角度θ’例如是指经过相邻两个第二光阻墙面的远离第一光阻墙面的一侧的中点处的出射光经该相邻两个第二光阻墙面和对应位置处的第一光阻墙面后的最大出射角度。例如,可以通过调节第二光阻墙面1051的高度来调节经过第二光定向层105后的光线的出射角度和/或者通过调整相邻两个第二光阻墙面1051的距离来来调节经过第二光定向层105后的光线的出射角度。各第一光阻墙面1021在第一衬底基板101上的投影与各第二光阻墙面1051在第一衬底基板1011上的投影亦可不相重合,在此不作限定。例如,出射角度θ’还可以指光经过相邻两个第二光阻墙面以及与该相邻两个第二光阻墙面对应的相邻两个第一光阻墙面后的出射光的最大夹角。
需要说明的是,本实施例中,第一光阻墙面1021和/或第二光阻墙面1051的个数不以图中示出的个数为限,附图中仅为示意性的说明。
例如,第一光定向层102的材质可包括金属(Cr)、氧化铬或黑色树脂,但不限于此。例如,第二光定向层105的材质可包括金属铬(Cr)、氧化铬或黑色树脂,但不限于此。
例如,本实施例的一个示例提供的可切换防窥装置中,第一电极层103可包括面状电极,第二电极层202可包括面状电极,但第一电极层103和第二电极层202并不限于面状电极。例如,第一电极层103和第二电极层202的材质均为透明导电材料,例如,可采用氧化铟锡(Indium Tin Oxide,ITO),但不限于此。
例如,本实施例的一个示例提供的可切换防窥装置中,第一电极层103比第一光定向层102更靠近调光层30。如此设置,可以使得第一电极层103更靠近第二电极层202,从而使得两者形成的电场更容易、更快速的使得调光层切换为透明态。例如,一个示例提供的可切换防窥装置中,第一光定向层102和第一电极层103位于第一衬底基板101的同一侧,第一光定向层102 和第一电极层103之间设置有绝缘层104。例如,一个示例提供的可切换防窥装置中,第一光定向层102比第一电极层103更靠近第一衬底基板101,绝缘层104具有基本平坦的表面。例如,绝缘层的材质可包括树脂,但不限于此。当第一光定向层102和第一电极层103分别位于第一衬底基板101的两侧时,可不设置绝缘层。
例如,如图5、图6所示,本实施例的一个示例提供的可切换防窥装置中,第二电极层202经设置在第一基板10和第二基板20之间的导电结构40与第一基板10上的第二电极层202的引线106电连接,但不限于此。例如,引线106可与第一电极层103同层设置,但不限于此。例如,第一电极层103设置在可切换防窥装置的显示区域1011中,引线106设置在可切换防窥装置的周边区域1012中。周边区域1012可位于显示区域1011的至少一侧,例如,如图5所示,周边区域1012可围绕显示区域1011设置。可切换防窥装置的显示区域1011和周边区域1012例如对应于显示面板的显示区域和周边区域。例如,导电结构40可为各向异性导电胶,但不限于此。例如,该各向异性导电胶在平行于第一衬底基板的方向上不导电,在垂直于第一衬底基板的方向上导电。例如,导电结构40可为导电银胶,但不限于此。例如,可通过丝网印刷的方式与第一衬底基板上引线106电连接,但不限于此。引线106的材质可包括金属,但不限于此。
例如,如图6所示,本实施例的一个示例提供的可切换防窥装置中,第一基板10和第二基板20可通过密封结构50集成在一起。密封结构50例如可采用封框胶,但不限于此。该可切换防窥装置可将第一基板和第二基板以及其间的调光层集成在一起,取得较好的光学效果,还可以节省成本。
实施例二
本实施例提供一种显示装置,如图7a所示,包括显示面板67、背光模组89以及实施例一所述的任意一种可切换防窥装置12,可切换防窥装置12位于背光模组89和显示面板67之间。背光模组89为显示面板提供背光,背光经可切换防窥装置12后入射到显示面板67。背光经可切换防窥装置12后的出射光对应于入射到显示面板67的入射光。
例如,一个示例提供的显示装置中,显示面板67包括液晶显示面板。例如,下基板60可为阵列基板,上基板70可为彩膜基板,上基板和下基板之 间夹设液晶层76。阵列基板上可设置栅线、数据线、薄膜晶体管(Thin Film Transistor,TFT)以及像素电极等。彩膜基板上可设置黑矩阵图形和彩膜层等。公共电极可设置在阵列基板上,也可设置在彩膜基板上。通过控制显示面板中液晶分子的偏转,从而实现对光线强弱的控制,然后通过彩膜基板的滤光作用,实现彩色图像显示。但液晶显示面板并不限于上述描述的结构。例如,显示面板可为垂直取向(Vertical Alignment,VA)显示模式,也可为扭曲向列相(Twisted Nematic,TN)显示模式、超维场转换技术(Advanced-super Dimensional Switching,ADS)显示模式或面内开关(In-Plane Switching,IPS)显示模式,对此不作限定。
例如,如图7a所示,一个示例中,背光模组89可包括导光板891、设置在导光板891一侧的光源892、在导光板891靠近显示面板67一侧设置的扩散膜893和棱镜膜894,在导光板891远离显示面板67一侧还可设置反射板895。需要说明的是,背光模组89不限于上述给出的结构。
例如,本实施例的一个示例提供的显示装置中,第一光定向层102包括多个平行的第一光阻墙面1021(可参见图4),上基板或下基板可包括黑矩阵图形701(可参见图7a),多个平行的第一光阻墙面1021在第一衬底基板101上的投影位于黑矩阵图形701在第一衬底基板101上的投影内。例如,黑矩阵图形的平面示意图可如图7b所示,包括在横向上相互平行的多个第一黑矩阵7011和在纵向上相互平行的多个第二黑矩阵7012,横向垂直于纵向。例如,多个平行的第一光阻墙面1021在第一衬底基板101上的投影位于黑矩阵图形701中纵向排布的多个平行的第二黑矩阵7012在第一衬底基板101上的投影内,但不限于此。例如,还可以多个平行的第一光阻墙面1021在第一衬底基板101上的投影位于部分纵向排布的多个平行的第二黑矩阵7012在第一衬底基板101上的投影内。例如,因黑矩阵图形大多对应于子像素90设置,从而,相邻的两个第一光阻墙面1021可每隔一列或多列子像素设置,在此不作限定。需要说明的是,可将本实施例中的行换为列。同样,第二光定向层105中的第二光阻墙面1051可参照第一光定向层102中的第一光阻墙面1021设置方式来设置。
例如,如图8所示,本实施例的一个示例提供的显示装置中,显示面板67包括上基板70和下基板60,下基板60可复用为可切换防窥装置的第二衬 底基板201。如此设置,可进一步减小整个显示装置的厚度。
例如,如图8所示,本实施例的一个示例提供的显示装置中,下基板60上设置有线栅偏光膜601,线栅偏光膜601可复用为可切换防窥装置的第二电极层202。该设置可进一步减小整个显示装置的厚度。例如,线栅偏光膜601包括多条平行设置的金属线。例如,每条金属线的宽度可以为30nm-50nm,相邻两条金属线之间的距离可以为100-150nm,每条金属线的高度可以为100-300nm,但不限于此。该线栅偏光膜性质如下:对于自然光照射到线栅偏光膜上,平行于金属线方向的线偏振光几乎全被反射回来,而垂直于金属线方向的线偏振光可以透射过去。线栅偏光膜例如可同时作为显示面板的下偏振片。例如,线栅偏光膜601为线栅偏振片(Wire Grid Polarizer,WGP)。因线栅偏光膜601在纳米级别,间隙小,其效果可基本类似于面状电极,故而可复用为可切换防窥装置的第二电极层202。
实施例三
本实施例提供一种可切换防窥装置的制备方法,该方法可包括如下的步骤:
在第一衬底基板101上形成第一光定向层102和第一电极层103以制备第一基板10,第一光定向层102限定经过第一光定向层102后的光线的出射角度;
在第二衬底基板201上形成第二电极层202以制备第二基板20;
在第一基板10和第二基板20之间设置调光层30,调光层30可在透明态和散射态之间进行切换。
该可切换防窥装置的制备方法可利用液晶显示器(Liquid Crystal Display,LCD)的产线工艺,可极大程度利用产线自有设备及工艺,降低产品成本。
例如,一个示例中,可切换防窥装置的制备方法可包括如下步骤:
首先,制备第一基板10。
如图9a所示,在第一衬底基板101上形成第一光定向层102,第一光定向层102限定经过第一光定向层102后的光线的出射角度;如图9b所示,在第一光定向层102上形成绝缘层104;如图9c所示,在绝缘层104上形成第一电极层103。
其次,制备第二基板20。
如图10所示,在第二衬底基板201上形成第二电极层202。
例如,本实施例的一个示例提供的可切换防窥装置的制备方法中,可通过光刻工艺形成第一光定向层102。例如,一个示例中,形成第一光定向层102包括形成多个平行的第一光阻墙面1021。
例如,如图11a-d所示,本实施例的一个示例提供的可切换防窥装置的制备方法中,通过光刻工艺形成第一光定向层102包括如下步骤:
如图11a所示,在第一衬底基板101上形成第一光定向薄膜1023;
如图11b所示,在第一光定向薄膜1023上形成第一光刻胶1026;
如图11c所示,对第一光刻胶1026进行曝光、显影,形成图案化的第一光刻胶1028;
如图11d所示,以图案化的第一光刻胶1028为掩模,对第一光定向薄膜1023进行刻蚀。
然后,剥离图案化的第一光刻胶1028,可形成例如如图9所示的第一光定向层102。
例如,可采用负性光刻胶来形成第一光定向层102,但不限于此。
需要说明的是,也可以采用黑色的负性光刻胶形成第一光定向薄膜1023,这样,对第一光定向薄膜1023进行曝光、显影后,即可得到例如如图9所示的第一光定向层102。
例如,本实施例的一个示例提供的可切换防窥装置的制备方法中,还包括形成第二光定向层105,第二光定向层105形成在第一衬底基板101上,并形成在第一衬底基板101的形成有第一光定向层102的相反侧,第二光定向层105限定经过第二光定向层105后的光线的出射角度。例如,一个示例中,形成第二光定向层105包括形成多个平行的第二光阻墙面1051,各第一光阻墙面1021在第一衬底基板101上的投影与各第二光阻墙面1051在第一衬底基板101上的投影相重合。
例如,本实施例的一个示例提供的可切换防窥装置的制备方法中,通过光刻工艺形成第二光定向层105。例如,一个示例中,通过光刻工艺形成所述第二光定向层包括如下步骤:
形成第二光定向薄膜;
在第二光定向薄膜上形成第二光刻胶;
对第二光刻胶进行曝光、显影,形成图案化的第二光刻胶;
以图案化的第二光刻胶为掩模,对第二光定向薄膜进行刻蚀;
剥离图案化的第二光刻胶,形成第二光定向层。
例如,可采用负性光刻胶来形成第二光定向层105,但不限于此。
需要说明的是,也可以采用黑色的负性光刻胶形成第二光定向薄膜,这样,对第二光定向薄膜进行曝光、显影后,即可得到第二光定向层。第二光定向层的制备可参照制备第一光定向层的附图。
例如,本实施例中第一光定向层102、第二光定向层105、调光层30、第一电极层103、第二电极层202、绝缘层104、第一衬底基板101和第二衬底基板201等可参照之前实施例中的描述,在此不再赘述。
有以下几点需要说明:
(1)本发明实施例附图中,只涉及到与本发明实施例涉及到的结构,其他结构可参考通常设计。
(2)为了清晰起见,在用于描述本发明的实施例的附图中,层或区域的厚度被放大。可以理解,当诸如层、膜、区域或基板之类的元件被称作位于另一元件“上”或“下”时,该元件可以“直接”位于另一元件“上”或“下”,或者可以存在中间元件。
(3)在不冲突的情况下,本发明不同的实施例及同一实施例中的特征可以相互组合。
(4)说明书以及附图中,除非另作定义,同一附图标记表示同一元件/部件。
以上所述,仅为本发明的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本发明的保护范围之内。因此,本发明的保护范围应以所述权利要求的保护范围为准。
本专利申请要求于2016年2月19日递交的中国专利申请第201610094364.X号的优先权,在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (20)

  1. 一种可切换防窥装置,包括相对设置的第一基板和第二基板以及位于所述第一基板和所述第二基板之间的调光层,
    其中,所述第一基板包括第一衬底基板和设置在所述第一衬底基板上的第一光定向层和第一电极层,
    所述第二基板包括第二衬底基板以及设置在所述第二衬底基板上的第二电极层,
    所述第一光定向层限定经过所述第一光定向层后的光线的出射角度,所述调光层可在透明态和散射态之间进行切换。
  2. 根据权利要求1所述的可切换防窥装置,其中,在所述第一衬底基板上,与所述第一光定向层的相反侧上,还设置有第二光定向层,所述第二光定向层限定经过所述第二光定向层后的光线的出射角度。
  3. 根据权利要求2所述的可切换防窥装置,其中,所述第一光定向层包括多个平行的第一光阻墙面。
  4. 根据权利要求3所述的可切换防窥装置,其中,所述第二光定向层包括多个平行的第二光阻墙面,各所述第一光阻墙面在所述第一衬底基板上的投影与各所述第二光阻墙面在所述第一衬底基板上的投影相重合。
  5. 根据权利要求1-4任一项所述的可切换防窥装置,其中,所述第一电极层和所述第二电极层之间形成电场的情况下,所述调光层呈透明态;所述第一电极层和所述第二电极层没有电场的情况下,所述调光层呈散射态。
  6. 根据权利要求1-4任一项所述的可切换防窥装置,其中,所述第一电极层包括面状电极,和/或,所述第二电极层包括面状电极。
  7. 根据权利要求1-4任一项所述的可切换防窥装置,其中,所述第一电极层比所述第一光定向层更靠近所述调光层。
  8. 根据权利要求1-4任一项所述的可切换防窥装置,其中,所述第一光定向层和所述第一电极层位于所述第一衬底基板的同一侧,所述第一光定向层和所述第一电极层之间设置有绝缘层。
  9. 根据权利要求8所述的可切换防窥装置,其中,所述第一光定向层比所述第一电极层更靠近所述第一衬底基板,所述绝缘层具有基本平坦的表面。
  10. 根据权利要求1-4任一项所述的可切换防窥装置,其中,所述第二电极层经设置在所述第一基板和所述第二基板之间的导电结构与所述第一基板上的第二电极层的引线电连接。
  11. 根据权利要求1-4任一项所述的可切换防窥装置,其中,所述第一基板和所述第二基板通过密封结构集成在一起。
  12. 一种显示装置,包括显示面板、背光模组以及权利要求1-11任一项所述的可切换防窥装置,其中,所述可切换防窥装置位于所述背光模组和所述显示面板之间。
  13. 根据权利要求12所述的显示装置,其中,所述显示面板包括上基板和下基板,所述下基板复用为所述可切换防窥装置的所述第二衬底基板。
  14. 根据权利要求13所述的显示装置,其中,所述下基板上设置有线栅偏光膜,所述线栅偏光膜复用为所述可切换防窥装置的所述第二电极层。
  15. 根据权利要求14所述的显示装置,其中,所述第一光定向层包括多个平行的第一光阻墙面,所述上基板或下基板包括黑矩阵图形,所述多个平行的第一光阻墙面在所述第一衬底基板上的投影位于所述黑矩阵图形在所述第一衬底基板上的投影内。
  16. 一种可切换防窥装置的制备方法,包括:
    在第一衬底基板上形成第一光定向层和第一电极层以制备第一基板,所述第一光定向层限定经过所述第一光定向层后的光线的出射角度;
    在第二衬底基板上形成第二电极层以制备第二基板;
    在所述第一基板和所述第二基板之间设置调光层,所述调光层可在透明态和散射态之间进行切换。
  17. 根据权利要求16所述的可切换防窥装置的制备方法,其中,通过光刻工艺形成所述第一光定向层。
  18. 根据权利要求16或17所述的可切换防窥装置的制备方法,还包括形成第二光定向层,其中,所述第二光定向层形成在所述第一衬底基板的形成有所述第一光定向层的相反侧,所述第二光定向层限定经过所述第二光定向层后的光线的出射角度。
  19. 根据权利要求18所述的可切换防窥装置的制备方法,其中,形成所述第一光定向层包括形成多个平行的第一光阻墙面,形成所述第二光定向层 包括形成多个平行的第二光阻墙面,各所述第一光阻墙面在所述第一衬底基板上的投影与各所述第二光阻墙面在所述第一衬底基板上的投影相重合。
  20. 根据权利要求18所述的可切换防窥装置的制备方法,其中,通过光刻工艺形成所述第二光定向层。
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