WO2016151786A1 - 電子顕微鏡 - Google Patents
電子顕微鏡 Download PDFInfo
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- WO2016151786A1 WO2016151786A1 PCT/JP2015/059019 JP2015059019W WO2016151786A1 WO 2016151786 A1 WO2016151786 A1 WO 2016151786A1 JP 2015059019 W JP2015059019 W JP 2015059019W WO 2016151786 A1 WO2016151786 A1 WO 2016151786A1
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- electron microscope
- objective lens
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- detector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/002—Cooling arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
- H01J2237/0264—Shields magnetic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
- H01J2237/24415—X-ray
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24485—Energy spectrometers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Definitions
- the present invention relates to an electron microscope for observing a sample by irradiating the sample with an electron beam, and an elemental analyzer using X-rays generated by the irradiation of the electron beam.
- EDS Energy Dispersive X-ray Spectrometry
- TES superconducting transition edge sensor
- an electromagnetic lens In an electron microscope, it is common to use an electromagnetic lens as an objective lens. In this case, in order to focus an electron beam on the sample, a strong magnetic field penetrates in the vicinity of the sample. On the other hand, when performing EDS with an electron microscope, it is desirable to bring the detection element closer to the electron beam irradiation position from the viewpoint of X-ray yield.
- the present inventors have found a problem that when a micro calorimeter using a SQUID type current detection circuit is used for this EDS, a strong DC bias is generated by the objective lens magnetic field and the current detection circuit is saturated.
- SQUID is an element suitable for detecting a minute magnetic field, and a minute change in resistance value of a microcalorimeter becomes difficult to detect under a strong magnetic field bias. In other words, the SQUID microcalorimeter is very susceptible to the influence of the surrounding magnetic field, so it is difficult to apply it directly to an electron microscope that forms a strong magnetic field near the sample in order to observe the sample with high resolution. It was
- Patent Document 2 discloses a technique for arranging an X-ray lens between a sample and a detection element in an electron microscope using a microcalorimeter.
- the apparatus of Patent Document 2 is an apparatus dedicated to X-ray analysis. Since there is no part that forms a strong magnetic field in the vicinity of the sample like an objective lens, the arrangement of detection elements that are not affected by the magnetic field is not taken into consideration at all.
- An object of the present invention is to provide a technique for avoiding the influence of the magnetic field of the objective lens as described above and using a microcalorimeter in an electron microscope.
- an object of the present invention is to achieve both high-resolution image observation using an electron microscope and high-energy resolution X-ray analysis using a microcalorimeter.
- the X-ray detector is disposed in a space where the magnetic field intensity formed by the objective lens is less than a predetermined magnetic field intensity. More specifically, the X-ray detector is disposed at a position where the magnetic field strength of the objective lens is less than the critical magnetic field of the material used for the superconducting transition edge sensor or the thermal insulation shield of the microcalorimeter. Furthermore, an optical system that transmits X-rays to the detector may be inserted between the sample and the detector. Alternatively, a magnetic field shield that shields the X-ray detector may be used.
- the present invention it is possible to avoid the influence of the magnetic field while avoiding a decrease in the X-ray yield, and it is possible to perform elemental analysis using a microcalorimeter even in an electron microscope having a strong magnetic field strength near the sample. This makes it possible to achieve both high-resolution image observation with an electron microscope and high-energy resolution X-ray analysis with a microcalorimeter.
- FIG. 2 is an explanatory diagram showing configurations of an electron microscope and a microcalorimeter of Example 1. Explanatory drawing of the structure of the detector of a micro calorimeter, and a refrigerator.
- FIG. 3 is a schematic diagram showing the distribution of a magnetic field generated around the detector of the microcalorimeter in the objective lens of the electron microscope of Example 1. It is explanatory drawing which showed the relationship between a detector and a magnetic field distribution at the time of making the detector of the micro calorimeter of Example 1 into a snout shape. It is explanatory drawing which showed the relationship between the detector of Example 2, and magnetic field distribution. It is explanatory drawing which showed the structure of the electron microscope of Example 3, and a micro calorimeter.
- FIG. 3 is a schematic diagram showing the distribution of a magnetic field generated around the detector of the microcalorimeter in the objective lens of the electron microscope of Example 1. It is explanatory drawing which showed the relationship between a detector and a magnetic field distribution at the time of making the detector of the micro calori
- FIG. 6 is a schematic diagram showing the distribution of a magnetic field generated around the detector of the microcalorimeter in the objective lens of the electron microscope of Example 3. It is explanatory drawing which showed the structure of the electron microscope in Example 4, and a micro calorimeter. It is the schematic diagram which showed distribution of the magnetic field produced around the detector of a micro calorimeter in the objective lens of the electron microscope of Example 4.
- FIG. 6 is a schematic diagram showing the distribution of a magnetic field generated around the detector of the microcalorimeter in the objective lens of the electron microscope of Example 3. It is explanatory drawing which showed the structure of the electron microscope in Example 4, and a micro calorimeter. It is the schematic diagram which showed distribution of the magnetic field produced around the detector of a micro calorimeter in the objective lens of the electron microscope of Example 4.
- an example using a scanning electron microscope as an example of an electron microscope will be described.
- the term “electron microscope” includes a wide range of apparatuses that capture an image of a sample using an electron beam.
- the present invention can be applied to a general-purpose scanning electron microscope, a sample processing apparatus equipped with a scanning electron microscope, and a sample analysis apparatus.
- an inspection apparatus, a review apparatus, and a pattern measurement apparatus using a scanning electron microscope can be given as an example of an X-ray analysis system using an electron microscope.
- an X-ray analysis system using an electron microscope includes a system in which devices including the electron microscope are connected via a network and a device in which the devices are combined.
- sample includes a wide range of objects to be observed and analyzed.
- a semiconductor wafer formed of silicon or the like a highly functional material such as a lithium battery, a biological sample, or the like is also included.
- FIG. 1-1 shows the configuration of an electron microscope and a microcalorimeter in this example.
- An electron beam 101 generated by an electron source (not shown) is deflected and focused by an electron optical system and irradiated onto a sample. More specifically, it is deflected by a scanning deflector (not shown) so as to scan the sample, is focused by a magnetic field formed by the objective lens 102, and is irradiated onto the sample 105.
- the electron optical system includes the above-described scanning deflector and objective lens, but may include other lenses, aligners, electrodes, and detectors.
- the electron microscope includes a control unit that controls the operation of each part and an image generation unit that generates an image based on a signal output from the detector (not shown).
- the control unit and the image generation unit may be configured as hardware by a dedicated circuit board, or may be configured by software executed by a computer connected to the electron microscope.
- When configured by hardware it can be realized by integrating a plurality of arithmetic units for executing processing on a wiring board or in a semiconductor chip or package.
- When configured by software it can be realized by mounting a high-speed general-purpose CPU on a computer and executing a program for executing desired arithmetic processing. It is also possible to upgrade an existing apparatus with a recording medium in which this program is recorded.
- An image processing unit including a computer or an image processing substrate forms an image of a sample by associating a signal from the detector with an irradiation point of an electron beam on the sample.
- the sample image may be displayed on a display connected to a computer, or may be output as digital data to a storage device such as a hard disk or a memory.
- the surface of the sample 105 is excited and characteristic X-rays specific to the excited element are generated.
- the characteristic X-rays are irradiated to the micro calorimeter detector 107 through the X-ray optical system 106.
- the X-ray optical system 106 transmits X-rays generated from the sample to the detector 107 so as to move away from the tip of the magnetic path of the objective lens 102.
- the detector 107 detects X-rays generated from the sample and performs energy spectroscopy.
- a space is provided between the X-ray optical system and the detector of the microcalorimeter, but this may be fixed in contact.
- the detector of the microcalorimeter is arranged outside the objective lens.
- the detector is You may arrange
- the detector can be installed at a position below the critical magnetic field of the thermal insulation shield of the microcalorimeter, the detector can be arranged directly even in the objective lens. On the other hand, even if there is no region that is below the critical magnetic field in the objective lens, the magnetic field strength around the detector can be suppressed by providing a magnetic field shield as shown in FIG.
- a TES 112 a heat sink 113, a power source 114, an inductor 115, a SQUID 116, and the like are provided in the housing 111 of the detector 107.
- the refrigerator 108 cools the TES 112 to a cryogenic temperature at which the TES 112 becomes superconductive.
- a power source 114 and an inductor 115 are connected to the TES 112 to constitute a circuit.
- the SQUID circuit is connected to the analyzer 117.
- the analyzer 117 uses the current value detected by the SQUID 116 to obtain the wavelength of the characteristic X-ray incident on the TES 112 by reverse calculation and performs element identification of the sample. Note that after the TES 112 rises in temperature, it is necessary to cool it again to the superconducting state in order to be able to perform the next measurement, so heat release is promoted by the heat sink 113 and the cooling time is shortened. ing.
- the housing 111 is made of a metal having good thermal conductivity such as copper and is connected to the refrigerator 108 to keep the inside of the detector 107 (inside the housing 111) in a superconducting state.
- a heat insulation shield 118 is provided outside the housing 111 so as to cover the housing 111, and the inside of the detector is thermally shielded from the outside.
- the thermal insulation shield is provided with an opening in front so that X-rays can enter the TES 112, and a window 119 is disposed to maintain an internal vacuum.
- the detector 107 is disposed at a position sufficiently away from the magnetic field formed by the objective lens.
- a sufficiently distant position is a position where the magnetic field strength is less than a predetermined magnetic field strength. More specifically, for example, it is a position where the magnetic field strength is less than the critical magnetic field strength at which the TES superconducting state is destroyed.
- the microcalorimeter has a heat insulation shield, and a superconductor (for example, niobium) is used as the shielding material. In this case, it may be a position where the magnetic field strength is less than the critical magnetic field strength at which the superconducting state of the thermal insulation shield is broken.
- the SQUID signal detected as a change in current amount by the circuit using SQUID is transmitted to an analyzer (not shown), and the characteristic X-ray energy is calculated based on this signal. Since characteristic X-rays have energy peaks specific to the elements, what elements are present at the irradiation position of the electron beam 101 of the sample 105 by summing up as a spectrum plotting the energy and the number of X-ray photons. Can be analyzed. The result of elemental analysis such as spectrum may be displayed on a display connected to the analyzer, or may be output as digital data to a storage device such as a hard disk or memory.
- the analyzer may be a hardware board, for example, or may be realized by a program on a computer.
- Magnetic field lines generated by the objective lens 102 pass through the upper magnetic pole 103 and the lower magnetic pole 104 and are emitted to the vicinity of the sample 105 to form an electromagnetic lens.
- the X-ray optical system 106 is inserted so as to pass between the upper magnetic pole 103 and the lower magnetic pole 104.
- the light receiving unit may be a window or an opening.
- the X-ray optical system 106 may be a component having a light receiving unit on which X-rays from a sample are incident and means for transmitting X-rays in the vicinity of the sample to the detector 107 or a combination of such components.
- the X-ray optical system 106 can be a polycapillary lens in which glass capillaries having extremely smooth inner walls are bundled. X-rays incident on the polycapillary lens are transmitted to the detector 107 of the microcalorimeter through the glass capillary tube. Since the refractive index of X-rays is slightly smaller than 1, X-rays incident on the polycapillary inner wall at a low angle cause total reflection and can be transmitted without losing intensity.
- a polycapillary lens is preferable in that the critical angle at which total reflection occurs depends on the energy of X-rays but is as wide as several degrees to 10 degrees, so that a wide energy band can be converged by the same optical system.
- a polycapillary lens has been shown for the X-ray optical system, a plurality of zone plates and total reflection mirrors that concentric X-rays using diffraction are provided by concentrating circular grooves on a quartz plate.
- An X-ray optical system may be configured in combination.
- FIG. 2A is a schematic diagram showing a magnetic field strength distribution between the upper magnetic pole 103 and the lower magnetic pole 104.
- the lines of magnetic force generated by the objective lens 102 are emitted to the vicinity of the sample 105 through the upper magnetic pole 103 and the lower magnetic pole 104. Accordingly, both the upper magnetic pole 103 and the lower magnetic pole 104 have higher magnetic field strength as they approach the tip of the sample 105 side.
- FIG. 2A shows that the magnetic field contour lines 201 are connected in the vertical direction on the paper surface along the upper magnetic pole 103 and the lower magnetic pole 104, and the magnetic field strength decreases as the magnetic field recedes from the tip of the magnetic pole.
- FIG. 2-2 shows an example in which the micro calorimeter detector 107 is formed into a snout shape that is elongated and the TES and SQUID are arranged close to the sample 105.
- FIG. 2-2 shows a comparative reference example with the present embodiment.
- the snout detector 202 is cooled by the refrigerator 108. If the X-ray optical system 106 is not used, the detector should be placed as close to the sample 105 as possible to compensate for the X-ray yield, but at the same time the detector is affected by the strong magnetic field of the objective lens 102, A strong DC bias is generated on the SQUID, making it difficult to detect minute magnetic field changes due to changes in the resistance value of the TES.
- the present invention is that the influence of the magnetic field can be avoided by arranging the microcalorimeter sufficiently far from the tip of the magnetic pole, and that the X-ray optical system 106 can avoid the decrease in the X-ray yield. Is the advantage.
- the molecular structure of the material may easily change due to damage caused by electron beam irradiation, such as a resist material for exposing a semiconductor circuit pattern.
- high resolution is required for electron microscopes due to miniaturization of semiconductor patterns. Therefore, in order to obtain a high resolution while suppressing damage to the material, it is necessary to reduce the irradiation energy of the electron beam and reduce the working distance of the objective lens as much as possible to improve the focusing performance of the lens. In such a case, an objective lens shape as shown in this embodiment may be used.
- the lower magnetic pole 104 of the objective lens 102 it is preferable to arrange the lower magnetic pole 104 of the objective lens 102 so as to be parallel to the sample 105 and to make the space between the lower magnetic pole 104 and the sample 105 as small as possible.
- the objective lens having such a structure it is physically difficult to provide an X-ray optical system for transmitting to the micro calorimeter detector 107 between the lower magnetic pole 104 and the sample 105. Therefore, in such a case, as shown in the present embodiment, X-rays are transmitted from between the upper magnetic pole 103 and the lower magnetic pole 104, or X-rays are transmitted from above the upper magnetic pole 103 shown in the third embodiment. It is desirable to adopt a method.
- the second embodiment uses a magnetic field shield that covers the detector, shields the detector from the magnetic field formed by the objective lens, and inserts the detector directly between the upper magnetic pole and the lower magnetic pole of the objective lens. It is.
- description of the same parts as those in the first embodiment will be omitted.
- FIG. 3 shows an example in which the magnetic field shield 301 is arranged so as to cover the snout detector 202 of FIG. 2-2. At least a part of the snout detector 202 (that is, a snout-shaped part) is disposed between the upper magnetic pole and the lower magnetic pole of the objective lens. Even if the detector has a snout shape, the shape and arrangement of components such as TES and SQUID contained in the detector are not substantially changed and are as shown in FIG.
- the magnetic field shield 301 in FIG. 3 covers at least the entire portion of the snout detector 202 disposed between the magnetic poles of the objective lens, and only the tip of the snout detector 202 near the sample is incident with X-rays.
- the shape of the magnetic field shield is not limited to the shape shown in the figure, and may be any shape as long as a magnetic field having a strength that is affected by the TES in the magnetic field shield 301 does not enter the magnetic field shield. Specifically, calculation may be performed by obtaining a magnetic field strength distribution such as the contour line 302 using a magnetic field simulator.
- Example 1 by extending the microcalorimeter detector 107 into a snout shape, TES and SQUID can be brought closer to the sample 105, and an improvement in X-ray yield can be expected.
- a metal having a high magnetic permeability such as permalloy is used for the magnetic field shield 301 so as to cover the entire snout type detector 202, so that the magnetic field is generated by the magnetic field shield 301 as indicated by the contour line 302 of the magnetic field in FIG. The intensity of the magnetic field applied to the snout detector 202 is reduced by being blocked.
- the installation range in which the operation of the microcalorimeter can be made closer to the sample, and an improvement in the X-ray yield can be expected.
- the installation range in which the microcalorimeter can operate is, as described in the first embodiment, the magnetic field strength is less than the critical magnetic field of the TES superconducting state or the superconducting thermal insulation shield. It is a range.
- the installable range of the tip of the snout detector 202 may be calculated together with the shape of the magnetic field shield 301 by obtaining a magnetic field intensity distribution such as the contour line 302 using a magnetic field simulator.
- the detector of the microcalorimeter can be arranged in a strong magnetic field, elemental analysis can be performed with a high X-ray yield without using an X-ray optical system.
- the third embodiment is an example in which the X-ray optical system is disposed on the upper magnetic path (electron source side) of the objective lens.
- description of the same parts as those in the first or second embodiment will be omitted.
- FIG. 4A shows an example in which a micro calorimeter detector is arranged so as to transmit X-rays from above the upper magnetic pole 103.
- the X-ray optical system 106 is disposed closer to the electron source than the objective lens (more specifically, closer to the electron source than the upper magnetic pole of the objective lens). Further, as can be seen from FIG. 4B, the X-ray optical system 106 is disposed in the magnetic field formed by the upper magnetic pole 103.
- FIG. 4A shows an example in which the X-ray optical system 106 is arranged in the direction along the upper magnetic pole 103 immediately above the upper magnetic pole 103 of the objective lens. It is not limited to this.
- the microcalorimeter is disposed at a position sufficiently separated from the magnetic pole tip (position where the magnetic field strength is less than the predetermined magnetic field strength) in order to avoid the influence of the objective lens magnetic field.
- FIG. 4B is a schematic diagram showing the intensity distribution of the objective lens magnetic field leaking above the upper magnetic pole 103.
- the contour 401 shows a distribution in which the magnetic field strength increases as it approaches the tip of the magnetic pole. Therefore, when the detector 107 is made to be close to the sample 105 with a snout shape, even from the upper side of the upper magnetic pole of the objective lens, as described with reference to FIG. The calorimeter becomes difficult to operate.
- the arrangement of the X-ray optical system 106 is restricted by the physical dimensions of the objective lens and the distance between the X-ray optical system 106 and the sample 105 becomes longer than in the case of the first embodiment.
- This is disadvantageous in terms of linear yield.
- the X-ray extraction angle to a high angle, there is an advantage that X-rays with little absorption in the sample can be detected.
- the fourth embodiment is an embodiment of an electron microscope having an out-lens type objective lens that is an objective lens shape.
- description of the same parts as those in the first to third embodiments will be omitted.
- Fig. 5-1 shows the configuration of the electron microscope and the microcalorimeter in this example.
- an electron beam 501 emitted from an electron source (not shown) is focused by a magnetic field generated by the objective lens 502 and irradiated onto the sample 505.
- Characteristic X-rays generated from the sample 505 are transmitted by the X-ray optical system 506 and enter the detector 507 of the microcalorimeter.
- the X-ray optical system 506 is disposed on the sample side of the objective lens (more specifically, on the sample side of the lower magnetic pole 504 of the objective lens).
- the X-ray optical system 506 is disposed in the magnetic field formed between the lower magnetic pole 504 and the sample 505.
- the detector 507 is cooled by the refrigerator 508.
- the magnetic pole of the objective lens 502 is arranged downward, and has an out-lens type lens shape in which the electron beam 501 receives a focusing action below the tip of the magnetic pole.
- the sample stage (not shown) on which the sample is placed has a tilting mechanism
- the sample 505 is placed on the sample stage by arranging the upper magnetic pole 503 and the lower magnetic pole 504 at an angle with respect to the sample 505. It is characterized in that tilted observation can be performed.
- a microcalorimeter is disposed so as to transmit X-rays from below the lower magnetic pole 504 (sample side).
- the microcalorimeter is disposed at a position sufficiently separated from the magnetic pole tip (position where the magnetic field strength is less than the predetermined magnetic field strength) in order to avoid the influence of the objective lens magnetic field.
- the X-ray optical system 506 is inserted between the sample 505 and the detector 507, so that a decrease in the X-ray yield can be avoided.
- FIG. 5-2 is a schematic diagram showing the intensity distribution of the objective lens magnetic field in the present example. Similar to Examples 1 and 3, a contour line 509 shows a distribution in which the magnetic field strength increases as it approaches the tip of the magnetic pole. Therefore, if the detector 507 is made to be a snout shape and approaches the sample 505, even if it is from below the lower magnetic pole of the objective lens, the influence of the magnetic field formed by the objective lens is the same as described with reference to FIG. The operation of the microcalorimeter becomes difficult.
- the working distance of the objective lens 502 is increased by adopting the out-lens shape, and there is a possibility that the focusing performance of the lens, that is, the resolution of the electron microscope, may be more disadvantageous than those of the first to third embodiments. is there.
- the focusing performance of the lens that is, the resolution of the electron microscope
- the resolution of the electron microscope may be more disadvantageous than those of the first to third embodiments. is there.
- the light receiving part of the X-ray optical system 506 of the microcalorimeter can be widened, and the sample 505 is inclined. This is advantageous in that the apparent penetration length of the electron beam 501 can be reduced and the amount of characteristic X-rays generated from the surface of the sample 505 can be increased.
- this invention is not limited to the above-mentioned Example, Various modifications are included.
- the above-described embodiments have been described in detail for easy understanding of the present invention, and are not necessarily limited to those having all the configurations described.
- a part of the configuration of one embodiment can be replaced with the configuration of another embodiment, and the configuration of another embodiment can be added to the configuration of one embodiment.
- FIGS. 1, 4, and 5 an example in which the detector of the microcalorimeter is arranged outside the objective lens is shown, but if the position is below the critical magnetic field of the superconducting shield of the microcalorimeter, the detector is You may arrange
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Abstract
Description
102 対物レンズ
103 上部磁極
104 下部磁極
105 試料
106 X線光学系
107 検出器
108 冷凍機
111 ハウジング
112 TES
113 ヒートシンク
114 電源
115 インダクタ
116 SQUID
117 アナライザ
118 熱絶縁シールド
119 ウィンドウ
201 磁場の等高線
202 スナウト型検出器
301 磁場シールド
302 磁場の等高線
401 磁場の等高線
501 電子線
502 対物レンズ
503 上部磁極
504 下部磁極
505 試料
506 X線光学系
507 検出器
508 冷凍機
509 磁場の等高線
Claims (15)
- 電子線を発生させる電子源と、
前記電子線を試料上に集束する対物レンズと、
前記試料から発生するX線を検出しエネルギー分光を行うX線検出器と、
前記対物レンズの磁路の先端から遠ざかるように、前記試料から発生するX線を前記X線検出器まで伝達するX線光学系と、を備え、
前記X線検出器は、前記対物レンズが形成する磁場強度が所定の磁場強度未満となる空間に配置される電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記X線検出器は超電導転移端センサを含む電子顕微鏡。 - 請求項2に記載の電子顕微鏡において、
前記所定の磁場強度は、前記超電導転移端センサの超電導状態が破壊される臨界磁場強度である電子顕微鏡。 - 請求項2に記載の電子顕微鏡において、
前記X線検出器は超電導材料からなる熱絶縁シールドを有し、
前記所定の磁場強度は、前記熱絶縁シールドの超電導状態が破壊される臨界磁場強度である電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記X線検出器はマイクロカロリメータである電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記X線光学系はポリキャピラリレンズである電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記X線光学系は前記対物レンズの上部磁路と下部磁路との間に配置される電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記X線光学系は前記対物レンズの上部磁路より前記電子源側であって、前記上部磁路が形成する磁場内に配置される電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記X線光学系は前記対物レンズの下部磁路より前記試料側であって、前記下部磁路が形成する磁場内に配置される電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記対物レンズの下部磁路は前記試料に平行に配置される電子顕微鏡。 - 電子線を発生させる電子源と、
前記電子線を試料上に集束する対物レンズと、
前記試料から発生するX線を検出しエネルギー分光を行うX線検出器と、
前記対物レンズが形成する磁場から前記X線検出器をシールドする磁場シールドと、を備え、
前記X線検出器は、前記磁場シールドにより前記対物レンズが形成する磁場強度が所定の磁場強度未満とされた空間に配置される電子顕微鏡。 - 請求項11に記載の電子顕微鏡において、
前記X線検出器の少なくとも一部は前記対物レンズの上部磁路と下部磁路の間に配置される電子顕微鏡。 - 請求項11に記載の電子顕微鏡において、
前記X線検出器は超電導転移端センサを含む電子顕微鏡。 - 請求項13に記載の電子顕微鏡において、
前記所定の磁場強度は、前記超電導転移端センサの超電導状態が破壊される臨界磁場強度である電子顕微鏡。 - 請求項13に記載の電子顕微鏡において、
前記X線検出器は超電導材料からなる熱絶縁シールドを有し、
前記所定の磁場強度は、前記熱絶縁シールドの超電導状態が破壊される臨界磁場強度である電子顕微鏡。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5773858U (ja) * | 1980-10-22 | 1982-05-07 | ||
JPH0883588A (ja) * | 1994-09-13 | 1996-03-26 | Hitachi Ltd | X線分析装置 |
JP2008039500A (ja) * | 2006-08-03 | 2008-02-21 | Sii Nanotechnology Inc | 放射線検出装置及び放射線分析装置 |
JP2009175117A (ja) * | 2007-12-25 | 2009-08-06 | Sii Nanotechnology Inc | X線分析装置 |
WO2013018594A1 (ja) * | 2011-08-03 | 2013-02-07 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2582114B2 (ja) | 1988-04-01 | 1997-02-19 | 日本電子株式会社 | 電子顕微鏡におけるx線分析装置 |
JPH05182625A (ja) | 1991-12-27 | 1993-07-23 | Jeol Ltd | 対物レンズ |
US5903004A (en) | 1994-11-25 | 1999-05-11 | Hitachi, Ltd. | Energy dispersive X-ray analyzer |
JP3776887B2 (ja) * | 2003-01-07 | 2006-05-17 | 株式会社日立ハイテクノロジーズ | 電子線装置 |
JP2005214792A (ja) * | 2004-01-29 | 2005-08-11 | Sii Nanotechnology Inc | 超伝導x線検出装置及びそれを用いた超伝導x線分析装置 |
JP2005257349A (ja) | 2004-03-10 | 2005-09-22 | Sii Nanotechnology Inc | 超伝導x線分析装置 |
JP5089048B2 (ja) | 2006-01-17 | 2012-12-05 | セイコーインスツル株式会社 | 多重信号読み出し回路 |
DE102008062612B4 (de) | 2007-12-25 | 2018-10-25 | Hitachi High-Tech Science Corporation | Röntgenstrahlen-Analysator |
JP5449679B2 (ja) * | 2008-02-15 | 2014-03-19 | 株式会社日立製作所 | 電子線観察装置および試料観察方法 |
DE112010000799B4 (de) * | 2009-01-15 | 2020-12-17 | Hitachi High-Tech Corporation | Ionenstrahlvorrichtung |
CN102575994B (zh) * | 2009-05-15 | 2016-08-17 | Fei公司 | 带集成探测器的电子显微镜 |
US8049182B2 (en) * | 2010-01-12 | 2011-11-01 | Oxford Instruments Nanotechnology Tools Limited | Charged particle filter |
JP6177915B2 (ja) * | 2013-08-02 | 2017-08-09 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
JP2015170593A (ja) * | 2014-03-04 | 2015-09-28 | 株式会社東芝 | 分析装置 |
JP6404736B2 (ja) * | 2015-02-06 | 2018-10-17 | 株式会社日立ハイテクノロジーズ | 複合荷電粒子線装置 |
CN107785220A (zh) * | 2016-08-25 | 2018-03-09 | Fei 公司 | 具有可交换极片延伸元件的带电粒子显微镜 |
-
2015
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5773858U (ja) * | 1980-10-22 | 1982-05-07 | ||
JPH0883588A (ja) * | 1994-09-13 | 1996-03-26 | Hitachi Ltd | X線分析装置 |
JP2008039500A (ja) * | 2006-08-03 | 2008-02-21 | Sii Nanotechnology Inc | 放射線検出装置及び放射線分析装置 |
JP2009175117A (ja) * | 2007-12-25 | 2009-08-06 | Sii Nanotechnology Inc | X線分析装置 |
WO2013018594A1 (ja) * | 2011-08-03 | 2013-02-07 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
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