WO2016068586A1 - Chambre de chauffe, générateur de plasma, et procédé de génération de plasma - Google Patents

Chambre de chauffe, générateur de plasma, et procédé de génération de plasma Download PDF

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Publication number
WO2016068586A1
WO2016068586A1 PCT/KR2015/011394 KR2015011394W WO2016068586A1 WO 2016068586 A1 WO2016068586 A1 WO 2016068586A1 KR 2015011394 W KR2015011394 W KR 2015011394W WO 2016068586 A1 WO2016068586 A1 WO 2016068586A1
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WO
WIPO (PCT)
Prior art keywords
plasma
ignition
chamber
fire chamber
source
Prior art date
Application number
PCT/KR2015/011394
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English (en)
Korean (ko)
Inventor
최도현
Original Assignee
주식회사 뉴파워 프라즈마
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Publication of WO2016068586A1 publication Critical patent/WO2016068586A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32807—Construction (includes replacing parts of the apparatus)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present invention relates to a plasma generator and a plasma generating method, and more particularly, to a fire chamber for generating a plasma, a plasma generator having the same, and a plasma generating method.
  • Plasma discharges are used for gas excitation to generate active gases containing ions, free radicals, atoms, molecules.
  • the active gas is widely used in various fields, and typically, variously used in semiconductor manufacturing processes such as etching, deposition, cleaning, and ashing.
  • various plasma sources are used according to the plasma generation method.
  • inductively coupled plasma sources capacitively coupled plasma sources, microwave plasma sources, and the like are used in remote plasma generators.
  • a method employing a transformer is particularly called a transformer coupled plasma.
  • the remote plasma generator using a transformer coupled plasma source has a structure in which a magnetic core having a primary winding coil is mounted on a chamber body of a toroidal structure.
  • the initial ignition performance is a very important factor in the remote plasma generator. Failure or delay of initial ignition renders the process inoperable in the process chamber in which the remote plasma generator is mounted. As a result, research and development efforts on the initial ignition technology are continuously made in the remote plasma generator. However, there is a situation in which a remote plasma generator having a high initial ignition capability has not been provided under various conditions such as gas flow rate, gas flow rate, type of process gas, and plasma generation capacity.
  • the ignition technology of the remote plasma generator thus far is such that arc discharge for initial ignition is made by an electrode which is capacitively coupled directly to the plasma channel formed inside the plasma chamber body of the remote plasma generator. This inevitably provides a problem that the interior of the plasma chamber body may be damaged. It can also cause particles due to internal damage.
  • the present invention provides a fire chamber capable of independently igniting a plasma, a plasma generator having the same, and a plasma generating method using the same.
  • the fire chamber of the present invention comprises: a hollow fire chamber body having a plasma ignition region; A gas flow channel connected to the plasma ignition region and a plasma discharge channel of a plasma chamber; And an ignition plasma source for igniting a plasma in the plasma ignition region, wherein after the plasma is ignited in the plasma ignition region, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to supply the plasma. Plasma is generated in the chamber.
  • the ignition plasma source comprises a capacitively coupled electrode for inducing a plasma discharge capacitively coupled to the plasma ignition region.
  • the Fire chamber body includes an opening and an insulating window disposed in the opening, wherein the capacitive coupling electrode is provided on the insulating window outside the plasma ignition region.
  • the ignition plasma source comprises an induction antenna coil for inducing a plasma discharge inductively coupled to the plasma ignition region.
  • the Fire chamber includes a dielectric window, and the induction antenna coil is installed over the insulating window outside of the plasma ignition region.
  • the ignition plasma source comprises a light source for igniting the plasma by irradiating light to the plasma ignition region.
  • the Fire chamber comprises a light transmissive window, wherein the light source is installed above the light transmissive window outside of the plasma ignition region.
  • the fire chamber includes a gas inlet through which gas is supplied, and gas introduced into the plasma ignition region through the gas inlet is supplied to the plasma discharge channel through the gas distribution channel.
  • the Fire chamber is provided with gas introduced into the plasma discharge channel through the gas flow channel.
  • a plasma generator includes: a hollow plasma chamber having a plasma discharge channel; A main plasma source for generating plasma in the plasma discharge channel; And a fire chamber comprising a hollow fire chamber body having a plasma ignition region, a gas flow channel connected to said plasma ignition region and said plasma discharge channel, and an ignition plasma source for igniting a plasma in said plasma ignition region. After plasma ignition in the plasma ignition region, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to generate plasma in the plasma discharge channel.
  • the main plasma source is a transformer coupled plasma source.
  • the main plasma source is an inductively coupled plasma source.
  • the main plasma source is a capacitively coupled plasma source.
  • the main plasma source is a microwave plasma source.
  • Plasma generating method comprises the steps of: plasma ignition in the Fire chamber; Flowing the plasma gas through a gas flow path connected between the Fire chamber and the plasma chamber; And generating plasma in the plasma chamber.
  • the ignition plasma source for the Fire chamber is turned off.
  • the ignition plasma source for the fire chamber remains on in a section maintained after the plasma is generated in the plasma chamber.
  • the fire chamber and the plasma generator of the present invention after the plasma is ignited in the plasma ignition region of the fire chamber, plasma gas is supplied from the plasma ignition region to the plasma discharge channel through the gas flow channel to generate plasma in the plasma chamber. Therefore, since the initial plasma ignition is not performed in the plasma discharge channel, particle generation due to damage to the inside of the plasma chamber body is reduced by arcuate discharge that may occur during the initial ignition.
  • FIG. 1 is a schematic diagram showing an overall configuration of a plasma processing system according to a preferred embodiment of the present invention.
  • FIG. 2 is a view showing a cross-sectional structure of the plasma chamber.
  • 3 and 4 are exploded perspective and sectional views showing the structure of the fire chamber.
  • FIG. 5 is a partial cross-sectional view showing a modification of the electrode mounting structure of the fire chamber.
  • 6 to 8 show variations of the gas flow holes of the fire chamber.
  • FIG. 9 is a view showing a modification of the fire chamber in which two capacitive coupling electrodes are installed.
  • 13 to 15 are diagrams showing examples of the gas supply paths of the fire chamber and the plasma generator.
  • 17 to 21 are diagrams showing plasma generators that may be employed in the plasma generator of the present invention.
  • 22 and 23 are flowcharts illustrating the generation method of the present invention.
  • FIG. 1 is a schematic view showing an overall configuration of a plasma processing system according to a preferred embodiment of the present invention
  • FIG. 2 is a diagram showing a cross-sectional structure of a plasma chamber.
  • a plasma processing system includes a process chamber 10, a plasma generator 20, and a fire chamber 30. Initial plasma ignition takes place in the fire chamber 30. Subsequently, the plasma gas generated inside the fire chamber 30 is supplied to the plasma generator 20 through the gas flow channel 40 to generate plasma in the plasma generator 20. The plasma gas generated in the plasma generator 20 is remotely supplied to the process chamber 10 through the adapter 42.
  • the plasma generator 20 has a transformer coupled plasma source structure in which a plasma chamber 21 having an annular plasma discharge channel 22 and a transformer 23 are coupled to each other.
  • the main plasma source mounted to the plasma generator 20 illustrates a transformer coupled plasma source, but various types of plasma sources may be employed as described below.
  • the plasma chamber 21 has a plasma chamber body 24 that forms an annular discharge channel 22.
  • the plasma chamber body 24 includes one or more insulating gaps 26 when composed of a conductor material. For example, four insulation gaps 26 may be provided when four hollow discharge tubes are combined in an annular structure. If the plasma chamber body 24 is made of a non-conductive material, it does not have an insulating gap 26.
  • One or more magnetic cores 25 that make up the transformer 23 are mounted to be crosslinked to the annular plasma chamber body 24.
  • the primary winding coil (not shown) is wound around the magnetic core 25.
  • the plasma generated in the plasma discharge channel 22 forms the secondary side of the transformer 23.
  • the plasma chamber body 24 is provided with a gas outlet 27 and a gas flow hole 28.
  • 3 and 4 are exploded perspective and sectional views showing the structure of the fire chamber.
  • the fire chamber 30 has a hollow fire chamber body 32 having a plasma ignition region 31.
  • the fire chamber body 32 is assembled with an upper plate 32a and a lower body 32b with an o-ring (not shown) therebetween.
  • a gas flow hole 33 is formed in the lower body 32b to form a gas flow channel 40 connected to the plasma ignition region 31 and the plasma discharge channel 22 of the plasma chamber 21.
  • An opening 34 is formed in the upper plate 32a, and an insulating window 35 is provided in the opening 34 with the O-ring 37 interposed therebetween.
  • the capacitive coupling electrode 36 is provided on the insulating window 35 outside the plasma ignition region 31.
  • the capacitive coupling electrode 36 functions as an ignition plasma source for igniting the plasma in the plasma ignition region 31.
  • the gas flow hole 28 of the plasma chamber 21 and the gas flow hole 33 of the fire chamber 30 constitute a gas flow channel 40 connecting the plasma ignition region 31 and the plasma discharge channel.
  • the plasma gas is transferred from the plasma ignition region 31 to the plasma discharge channel 22 through the gas flow channel 40. Supplied to generate plasma in the plasma chamber 21. Since the initial plasma ignition is not performed in the plasma discharge channel 22, the generation of particles due to damage inside the plasma chamber body 24 is reduced by the arcous discharge that may be generated during the initial ignition.
  • the fire chamber body 32 is made of a conductive material and is capacitively coupled with the capacitive coupling electrode 36 and the insulating window 35 interposed therebetween.
  • an insulating window 35 is installed to block the opening 33 and an O-ring at an edge thereof. 37 and an insulating protective ring 38 are configured.
  • the capacitive coupling electrode 36 is provided thereon.
  • an insulating cover may be installed to completely surround the capacitive coupling electrode 36.
  • 6 to 8 show variations of the gas flow holes of the fire chamber.
  • the gas flow hole 33 of the fire chamber body 32 constituting the gas flow channel 40 may have a porous hole structure.
  • the porous holes of the gas flow holes 33 can be arranged in parallel to the plasma discharge channels 22 or perpendicular to the plasma discharge channels 22. It is also possible for the plasma discharge channel 22 and the opening 34 of the fire chamber 30 to face or deflect.
  • FIG. 9 is a view showing a modification of the fire chamber in which two capacitive coupling electrodes are installed.
  • the fire chamber 30 according to the modification may be installed such that two capacitive coupling electrodes 36 face each other.
  • the two capacitive coupling electrodes 36 may be supplied with alternating current power having the same phase or with alternating current power having different phases, respectively.
  • the ignition plasma source provided in the fire chamber 30 may be modified in various ways.
  • an induction antenna coil 39 may be mounted to the Fire chamber body 32 in a helical fashion.
  • one side of the fire chamber body 32 may be mounted in a spiral shape.
  • a dielectric window (not shown) is installed in the fire chamber body 32.
  • the fire chamber body 32 may be entirely composed of a dielectric material.
  • the ignition plasma source of the fire chamber 30 may be a structure that is ignited by light.
  • the fire chamber 30 is provided with a light transmissive window 46 and a light source 47 for irradiating light to the plasma ignition region 31 of the fire chamber 30 thereon.
  • 13 to 15 are diagrams showing examples of the gas supply paths of the fire chamber and the plasma generator.
  • the process gas supplied from the gas supply source (not shown) is supplied to the plasma generator 20 through the first gas supply channel 43 in which the gas valve 44 is installed and the gas flow channel 30 is closed.
  • a portion of the fire chamber 30 may be supplied through the fire chamber 30.
  • a gas valve 45 may be added to the gas flow channel 40.
  • the gas valve 45 may be opened in the plasma ignition operation section and may be closed when the plasma ignition is completed.
  • a process gas supplied from a gas supply source may be supplied to the Fire chamber 30 through the first gas supply channel 43 in which the gas valve 44 is installed.
  • the gas supplied to the fire chamber 30 is again supplied to the plasma generator 20 through the gas flow channel 40.
  • process gas supplied from a gas supply source (not shown) is supplied to the fire chamber 30 through the first gas supply channel 43 in which the gas valve 44 is installed, and together with the gas valve 49. Is supplied to the plasma generator 20 through the second gas supply channel 45 is installed.
  • the process valves are simultaneously supplied to the fire chamber 30 and the plasma chamber 20, and after the plasma is ignited, the gas valves 43 and 49 are supplied to supply the process gas only to the plasma generator. Switching operation can be performed.
  • 17 to 21 are diagrams showing plasma generators that may be employed in the plasma generator of the present invention.
  • the plasma generator 20 may employ a transformer coupled plasma source having a transformer 23 coupled to the plasma chamber 22 as a main plasma source.
  • the primary winding coil 29 of the transformer 23 is connected to the AC switching power supply 50 to receive AC power for plasma generation.
  • the ignition controller 52 supplies ignition power to the ignition plasma source provided in the fire chamber 30.
  • the power supplied from the ignition controller 52 may be supplied from the AC switching power supply 50 or may include a separate power supply source.
  • the plasma generator 20 may employ a transformer coupled plasma source having a transformer 23 coupled to a plasma chamber 22 in which yarn ends are connected to the process chamber 10 as a main plasma source.
  • the plasma generator 20 may employ an inductively coupled plasma source in which an induction antenna coil 29 is mounted in the plasma chamber 22 as a main plasma source.
  • the plasma chamber 22 includes a dielectric window (not shown).
  • the plasma chamber 22 may be made of a dielectric material.
  • the plasma generator 20 may employ a microwave plasma source having the microwave generator 60 as a main plasma source.
  • the plasma chamber 21 may be configured as a waveguide.
  • 22 and 23 are flowcharts illustrating a plasma generating method of the present invention.
  • a process of generating plasma using the Fire chamber 30 and the plasma generator 20 of the present invention is controlled by a controller (not shown).
  • the ignition controller 52 for plasma ignition is driven in the fire chamber 30.
  • step S12 it is determined whether or not plasma ignition has occurred in the fire chamber 30.
  • the plasma ignition is performed in the fire chamber chamber 30, the plasma ignition is maintained in the fire chamber 30 in step S14.
  • step S16 it is determined whether the plasma is ignited and generated in the plasma generator 20.
  • the plasma ignition is turned off in the fire chamber in step S18.
  • the plasma ignition of the fire chamber 30 may be maintained as shown in FIG. 23 even after the plasma is generated in the plasma generator 20. That is, a section in which the ignition plasma source for the fire chamber 30 is maintained in an on state may be present in a section maintained after the plasma is generated in the plasma chamber 21.
  • Embodiments of the fire chamber, the plasma generator, and the plasma generating method of the present invention described above are merely exemplary, and those skilled in the art to which the present invention pertains have various modifications and equivalent embodiments. You can see that it is possible. Therefore, it will be understood that the present invention is not limited only to the form mentioned in the above detailed description. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims. It is also to be understood that the present invention includes all modifications, equivalents, and substitutes within the spirit and scope of the invention as defined by the appended claims.
  • process chamber 20 plasma generator

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention concerne une chambre de chauffe qui comprend : un corps de chambre de chauffe creux qui comporte une zone d'allumage de plasma ; un canal d'écoulement de gaz raccordé à la zone d'allumage de plasma et un canal de décharge de plasma d'une chambre de plasma ; et une source d'allumage de plasma qui allume un plasma dans la zone d'allumage de plasma, un gaz de plasma étant introduit de la zone d'allumage de plasma dans le canal de décharge de plasma à travers le canal d'écoulement de gaz après l'allumage du plasma dans la zone d'allumage de plasma de sorte qu'un plasma est généré dans la chambre de plasma. Après l'allumage du plasma dans la zone d'allumage de plasma de la chambre de chauffe, un gaz de plasma est introduit de la zone d'allumage de plasma dans le canal de décharge de plasma à travers le canal d'écoulement de gaz de sorte qu'un plasma est généré dans la chambre de plasma. En conséquence, l'allumage de plasma initial n'est pas réalisé dans le canal de décharge de plasma, ce qui réduit les particules causées par les dégâts à l'intérieur de la chambre de plasma en raison d'une décharge d'arc qui peut être générée pendant l'allumage de plasma initial.
PCT/KR2015/011394 2014-10-27 2015-10-27 Chambre de chauffe, générateur de plasma, et procédé de génération de plasma WO2016068586A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2014-0145714 2014-10-27
KR1020140145714A KR101718515B1 (ko) 2014-10-27 2014-10-27 화이어 챔버, 플라즈마 발생기, 플라즈마 발생 방법

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WO2016068586A1 true WO2016068586A1 (fr) 2016-05-06

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Publication number Priority date Publication date Assignee Title
WO2019108855A1 (fr) * 2017-11-30 2019-06-06 Corning Incorporated Source de plasma rf linéaire à pression atmosphérique de modification et de traitement de surface
TWI829156B (zh) * 2021-05-25 2024-01-11 大陸商北京屹唐半導體科技股份有限公司 電漿源陣列、電漿處理設備、電漿處理系統以及用於在電漿處理設備中加工工件的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02151021A (ja) * 1988-12-02 1990-06-11 Agency Of Ind Science & Technol プラズマ加工堆積装置
JP2000150194A (ja) * 1998-11-10 2000-05-30 Kawasaki Heavy Ind Ltd 電子ビーム励起プラズマ発生装置
JP2009283435A (ja) * 2008-05-20 2009-12-03 New Power Plasma Co Ltd 内蔵変圧器を有するプラズマ反応器
KR20110135783A (ko) * 2010-06-11 2011-12-19 주식회사 밀레니엄투자 플라즈마를 이용한 선형 기화증착기
KR20120086135A (ko) * 2011-01-25 2012-08-02 피에스케이 주식회사 플라스마 생성 유닛 및 이를 이용하는 기판 처리 장치 및 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02151021A (ja) * 1988-12-02 1990-06-11 Agency Of Ind Science & Technol プラズマ加工堆積装置
JP2000150194A (ja) * 1998-11-10 2000-05-30 Kawasaki Heavy Ind Ltd 電子ビーム励起プラズマ発生装置
JP2009283435A (ja) * 2008-05-20 2009-12-03 New Power Plasma Co Ltd 内蔵変圧器を有するプラズマ反応器
KR20110135783A (ko) * 2010-06-11 2011-12-19 주식회사 밀레니엄투자 플라즈마를 이용한 선형 기화증착기
KR20120086135A (ko) * 2011-01-25 2012-08-02 피에스케이 주식회사 플라스마 생성 유닛 및 이를 이용하는 기판 처리 장치 및 방법

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KR101718515B1 (ko) 2017-03-22
KR20160049220A (ko) 2016-05-09
TW201628053A (zh) 2016-08-01

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