WO2016056826A1 - Structure de cristal photonique et procédé de fabrication de celle-ci - Google Patents

Structure de cristal photonique et procédé de fabrication de celle-ci Download PDF

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Publication number
WO2016056826A1
WO2016056826A1 PCT/KR2015/010561 KR2015010561W WO2016056826A1 WO 2016056826 A1 WO2016056826 A1 WO 2016056826A1 KR 2015010561 W KR2015010561 W KR 2015010561W WO 2016056826 A1 WO2016056826 A1 WO 2016056826A1
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substrate
photonic crystal
spacer
manufacturing
crystal structure
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PCT/KR2015/010561
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English (en)
Korean (ko)
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이승엽
서한복
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서강대학교 산학협력단
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Publication of WO2016056826A1 publication Critical patent/WO2016056826A1/fr

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Definitions

  • the present invention relates to the production of large-area photonic crystals or photonic crystal structures, and more particularly, to a photonic crystal structure and a method for manufacturing the same, which can simplify the manufacturing process and improve efficiency.
  • Photonic crystals can reflect light of a specific wavelength, and the key property of photonic crystal research is the optical bandgap, the wavelength range of light that can be fully reflected.
  • This optical bandgap may vary depending on the difference in refractive index between the two materials arranged inside the photonic crystal or the period of the grating and the structure in which the materials are arranged.
  • the photonic crystal is a one-dimensional array
  • a specific optical band gap can be obtained only by having a periodic structure.
  • the photonic crystal has a two-dimensional or three-dimensional structure
  • the optical bandgap does not show a complete optical bandgap. That is, in the three-dimensional photonic crystal structure, there is no wavelength band of light having 100% reflectance in all directions, except that the silica is most densely arranged in the plane-centered cubic (FCC) crystal, [111] perpendicular to the plane.
  • the pseudo bandgap can only be seen for light transmitting in the direction.
  • the pseudo bandgap refers to a wavelength range of light that is completely reflected when only reflective light is incident on a specific direction.
  • One of the measures to compensate for the incomplete optical bandgap characteristics in the opal structure as described above is to use an inverse opal structure in which fine particles are arranged in the medium as the crystal lattice of the face center cube. Computation simulation using Maxwell's independent electromagnetic mode, in which the medium does not absorb light, shows that the optical bandgap is in all directions.
  • the refractive index ratio between the medium and the air must be at least 2.8, and such a material is made of titanium dioxide (TiO 2 ) that does not actually absorb light in the visible region.
  • TiO 2 titanium dioxide
  • the inverted opal structure has the possibility of realizing a three-dimensional optical bandgap in the visible region
  • the optical bandgap of the opal has a disadvantage in that the bandgap is not wide enough to be actually applied to an optical device.
  • a sphere has a wider bandgap when a sphere is arranged in a tetrahedral structure such as diamond carbon atoms are arranged rather than a crystal lattice structure of a face centered cube.
  • LiGA Lithographie, Galvanoformung, Abformung
  • Various methods of forming LiGA (Lithographie, Galvanoformung, Abformung) technology may be used as one of methods for forming the lattice structure of the photonic crystal.
  • LiGA technology is a method of manufacturing photonic crystals based on the etching process, which is a microfabrication technique.
  • a pattern is formed to arrange point circles in triangular alignment on the surface of a dielectric having refractive index, and then three different directions on each point source. It is made by drilling through deep x-ray lithography.
  • the areas where the three X-ray beams meet form large air cavities, which are connected to each other, and the large cavities are placed in the same lattice position as the carbon atoms in the diamond.
  • the cavity may have an optical bandgap that is about four times wider than the silicon inverted opal of the face-centered cube in a modified diamond structure rather than an exact sphere.
  • Another method is a method of manufacturing a photonic crystal of a diamond structure using the lamination method of LiGA technology. It is a method of manufacturing points or linear spaces that can actively express optoelectronic functions by stacking layers by layers instead of etching by beams.
  • the bars can be arranged side by side on a plane to form a diamond structure with four layers stacked.
  • heat is applied so that the sticks are bonded to each other in a molten state.
  • repeatedly stacking dielectric bars such that the same structure is repeated every four layers may show a wide optical bandgap such as a diamond structure.
  • the position and width of the bandgap may vary depending on the thickness of the rod, the arrangement period and the refractive index. Therefore, it is possible to manufacture a photonic crystal having a different band gap for each layer.
  • this manufacturing method has the advantage that it is relatively easy to manufacture an optical element such as a wave guide because it can design and manufacture a point and linear space that can easily propagate light.
  • the process is complicated and expensive, there are difficulties in practical use.
  • an etch method is used to create an optical crystal structure by making an interference pattern formed by light emitted from a light source to a photosensitive polymer photoresist (PR) and then selectively dissolving the polymerized or unpolymerized part. have.
  • the light from the four light sources creates an interference contrast pattern of face-centered cubic structure, and when it is projected onto the negative photoresist, photopolymerization occurs due to photosensitivity only in the bright pattern.
  • an opal structure pattern made of a polymer can be obtained.
  • the space between the polymer opals is filled with silicon or titanium dioxide (TiO 2 ) having a high refractive index, and then heat is decomposed and removed to obtain a silicon reverse opal.
  • This method can obtain a single crystal free from defects, and the process is simple and practical.
  • colloidal particles may be used.
  • crystallization through sedimentation and evaporation of colloidal fine particles which is a method that can be obtained by slowly crystallizing colloidal particles of a certain size dispersed in a medium through sedimentation or evaporation.
  • Colloidal particles are generally stabilized without being entangled with each other by an electrostatic repulsive force or a polymer adsorbed on the surface of the particles and are disordered by Brownian motion. Colloids made up of uniformly sized particles spontaneously change into regular crystal structures due to increasing entropy in the disordered array as the concentration of the particles increases.
  • the photonic crystal structure may have a hexagonal dense structure or a face centered cubic structure.
  • the present invention can simplify the providing process, and provides a highly practical photonic crystal structure and its manufacturing method.
  • the present invention provides a photonic crystal structure and a method for manufacturing the same, which can solve a defect on the surface of the photonic crystal by separating the substrate forming the channel for forming the photonic crystal and allowing the solvent remaining in the photonic crystal void to dry.
  • the present invention can enhance the bonding force between the photonic crystal lattice structure, and provides a photonic crystal structure and a method of manufacturing the same that can prevent the occurrence of defects during substrate removal.
  • the present invention can shorten the process time, and provides a photonic crystal structure and its manufacturing method which can improve the stability and reliability.
  • the present invention also provides a photonic crystal structure and a method of manufacturing the same, which can produce a large-area photonic crystal having a channel width of several to several tens of millimeters without a defect.
  • the method for manufacturing a photonic crystal structure the first substrate, the first substrate is spaced apart from the first substrate and mutually cooperatively with the first substrate to form a channel Providing an object including a second substrate and a spacer sealing a side surface between the first substrate and the second substrate; Providing a colloidal solution comprising photoreactive fine particles to the channel; Crystal structuring the photoreactive fine particles; Separating at least one of the first substrate and the second substrate; And drying the solvent remaining in the pores between the photoreactive fine particles through at least one region separated from the first substrate and the second substrate.
  • defects may occur due to the movement or adhesion of the solvent to the local portion of the photonic crystal.
  • a defect may be generated due to the movement or adhesion of the solvent, and thus a forced drying process of the solvent may be necessary.
  • at least one of the first substrate and the second substrate is separated, and the solvent remaining in the pores between the photoreactive fine particles can be quickly dried through the region of the separated substrate.
  • the object may remain stationary or rotated, and when the object is rotated, the photoreaction particles may move along the channel by centrifugal force.
  • the first substrate and the second substrate may be separated by slidingly moving in parallel along the longitudinal direction of the first substrate (or the second substrate), or rotating about one end.
  • a process of heat-treating the spacer may be added, and as the spacer is heat-treated, the structural coupling force with the first substrate and the second substrate may be adjusted.
  • the structural bonding force between the first substrate and the second substrate is controlled as the spacer is heat-treated, and the binding force of the spacer to the first substrate and the second substrate is adjusted as the spacer is heat-treated.
  • the spacer may be heated, and the adhesion of the spacer to the first substrate and the second substrate may be reduced while the spacer is heated.
  • the spacer various materials may be used in which the structural bonding force may be adjusted during the heat treatment process.
  • the spacer may be formed of a parafilm.
  • Heating temperature conditions of the spacer may be variously changed according to the material of the spacer, the characteristics of the solvent.
  • the heating temperature of the spacer may be set to a temperature range that is greater than the minimum temperature at which the adhesion by the spacer can be reduced (heating temperature at which the adhesion of the spacer starts to be lower than the unheated state) and lower than the boiling point of the solvent.
  • a process of heat treating at least one of the first substrate and the second substrate may be added, and as the first substrate and the second substrate are heat treated, The surface tension of the solvent on the first substrate and the second substrate can be adjusted.
  • the heat treatment of the substrate in the present invention can be understood as a concept including the usual heat treatment conditions such as cooling, heating, etc.
  • the present invention is not limited or limited by the heat treatment method of the substrate.
  • the first substrate and the second substrate may be heat treated under different temperature conditions.
  • the first substrate is heated or maintained at room temperature
  • the second substrate is cooled to a relatively lower temperature than the first substrate
  • the first substrate having a relatively high temperature may be separated.
  • the first substrate and the second substrate may be cooled or both heated during the heat treatment of the first substrate and the second substrate.
  • Heat treatment temperature conditions of the first substrate and the second substrate may be variously changed according to the material of the substrate and the characteristics of the solvent.
  • the first substrate may be heated to a temperature lower than the boiling point of the solvent, and the second substrate may be cooled to a temperature higher than the freezing point of the solvent.
  • the solvent remaining in the voids between the photoreactive particles may be dried through at least one of the separated regions of the first substrate and the second substrate. This may be performed while at least one of the second substrates is separated, or after at least one of the first and second substrates is separated.
  • the photonic crystal structure and the manufacturing method thereof according to the present invention it is possible to freely form a photonic crystal with a simple and practical process.
  • the present invention by separating the substrate forming the object, and allowing the solvent remaining in the gap between the photoreaction particles through the separated region of the substrate to be dried, it is possible to significantly shorten the time required for photonic crystal production And defects on the photonic crystal surface can be initialized.
  • according to the present invention can enhance the bonding strength between the photonic crystal lattice structure, it is possible to improve the stability and reliability.
  • a large-area photonic crystal having a channel width of several to several tens of millimeters can be produced without surface defects.
  • FIG. 1 is a view for explaining a method of manufacturing a photonic crystal structure according to the present invention.
  • FIGS. 2 to 6 are diagrams for explaining a step of crystallizing photoreactive fine particles after supplying a colloidal solution to a subject as a method of manufacturing a photonic crystal structure according to the present invention.
  • FIG. 7 is a view for explaining a heat treatment step of a spacer as a method of manufacturing a photonic crystal structure according to the present invention.
  • FIG. 8 is a view for explaining a heat treatment step of a substrate as a method of manufacturing a photonic crystal structure according to the present invention.
  • FIG. 9 is a view for explaining a separation step of a substrate as a method of manufacturing a photonic crystal structure according to the present invention.
  • FIG 10 and 11 are views for explaining a modification of the separation step of the substrate as a method of manufacturing the photonic crystal structure according to the present invention.
  • FIG. 12 is a view for explaining a photonic crystal in which a solvent is dried as a method of manufacturing a photonic crystal structure according to the present invention.
  • FIG. 1 is a view for explaining a method of manufacturing a photonic crystal structure according to the present invention.
  • Figures 2 to 6 is a method for manufacturing a photonic crystal structure according to the present invention, after supplying a colloidal solution to the object, a view for explaining the step of crystal structuring the photoreactive fine particles,
  • Figure 7 according to the present invention FIG. 8 is a view for explaining a heat treatment step of a spacer as a method of manufacturing a photonic crystal structure
  • FIG. 8 is a view for explaining a heat treatment step of a substrate as a method of manufacturing a photonic crystal structure according to the present invention.
  • FIG. 9 is a view for explaining a separation step of a substrate as a method of manufacturing a photonic crystal structure according to the present invention
  • Figures 10 and 11 is a method for manufacturing a photonic crystal structure according to the present invention, a modification of the separation step of a substrate It is a figure for demonstrating an example
  • FIG. 12 is a figure for demonstrating the photonic crystal in which the solvent was dried as a manufacturing method of the photonic crystal structure which concerns on this invention.
  • the first substrate 110 and the first substrate 110 are spaced apart from each other, and the channel 111 is cooperatively cooperated with the first substrate 110.
  • an object 100 is provided.
  • the object 100 may include a first substrate 110, a second substrate 120 stacked on the first substrate 110, and a side surface between the first substrate 110 and the second substrate 120. It may be configured to include a spacer 130 for sealing, the channel consisting of a limited inner space having an opening at least on one side between the first substrate 110 and the second substrate 120 111 is provided.
  • the object 100 may remain stationary or rotated, and when the object 100 is rotated, the photoreactive fine particles 10 may be caused by centrifugal force. May move along channel 111.
  • the object 100 is rotated while crystallizing the photoreactive particles 10 to be described below will be described.
  • the channel 111 is formed such that the width (W) direction is disposed along the rotation axis direction of the object 100 to be described later, and the centrifugal force acts in the longitudinal direction of the object 100 while the object 100 rotates.
  • the centrifugal force as the object 100 rotates has the same direction as a whole along the width of the channel 111.
  • the centrifugal force has the same direction as a whole along the width of the channel 111, regardless of the position along the width direction of the channel 111, the centrifugal force as the object 100 is always rotated in a constant direction (object ( 100) in the longitudinal direction).
  • the first and second substrates 110 and 120 may be formed of various materials according to required conditions and design specifications.
  • the first substrate 110 and the second substrate 120 may be formed of a common glass material, in addition to sapphire, silicon, gallium nitride, gallium arsenide, silicon carbide or zinc oxide. .
  • first coating layer may be formed on an inner surface of the first substrate 110
  • second coating layer may be formed on an inner surface of the second substrate 120.
  • the first coating layer and the second coating layer to remove the surface defects of the photonic crystal that may occur due to the fine bending of the substrate, the surface adhesion and movement of the solvent due to the polarity of the solvent and the surface characteristics of each substrate in the process of manufacturing the photonic crystal may be provided to remove defects that may occur during the drying of the solvent.
  • the first coating layer and the second coating layer may be formed of a material having hydrophobic or hydrophilic characteristics, and gas permeability.
  • the first coating layer and the second coating layer may be a polymer-based and silicon-based material having a hydrophobic surface (low surface energy) such as P or PMMA, a chemical coating material such as OTS, FOTS, or SPFPE, and a coating surface. It may be formed of a material having hydrophobicity by the nanostructure constituting.
  • the first coating layer and the second coating layer may be formed by an immersion method, a doping method, a spin coating method, a chemical vapor deposition method, a plasma treatment method, etc.
  • the present invention is not limited or limited by the formation method.
  • the spacer 130 provides a limited thickness of the photonic crystal formed between the first substrate 110 and the second substrate 120, and provides adhesion between the first substrate 110 and the second substrate 120. Provided to maintain.
  • the spacer 130 may be formed of a material having a unique characteristic according to heat so that the structural coupling force with the first substrate 110 and the second substrate 120 can be adjusted by a heat treatment process to be described later.
  • the spacer 130 may be formed of a parafilm having high elasticity and unique characteristics according to heat, and the first substrate 110 and the second substrate 120 while the spacer 130 is heated. The adhesion of the spacer 130 to the can be reduced.
  • the photoreactive fine particles 10 may be understood as fine particles capable of forming a photonic crystal structure, and the present invention is not limited or limited by the type and characteristics thereof.
  • the photoreactive fine particles 10 may include at least one of polystyrene (PS), polymethyl methacrylate, and silica fine particles.
  • PS polystyrene
  • silica fine particles silica fine particles
  • the diameter of the photoreactive fine particles 10 is selected according to the refractive index (reflective Index) and shape according to the material of each particle to select the size that can exhibit the photonic crystal characteristics of the visible region, infrared region, and ultraviolet region in the photonic crystal manufacturing Can be used.
  • the colloidal solution including the photoreactive fine particles 10 is provided in the channel 111.
  • the manner of providing the colloidal solution on the channel 111 may be variously changed according to the required conditions and design specifications.
  • the photoreactive fine particles are formed at one end (one or both ends) of the object 100 including a channel 111 having a specific thickness T, a width W, and a length L, and an opening capable of contacting the atmosphere.
  • the colloidal solution 10 When the colloidal solution 10 is in contact with the dispersed colloidal solution, the colloidal solution may be filled into the channel 111 of the object 100 by capillary force related to the hydraulic diameter of the cross section of the channel 111.
  • the colloidal solution is filled in the channel 111, when the contact of the object 100 is released from the container containing the colloidal solution, the colloidal solution inside the object 100 does not leak to the outside by capillary force, The photoreactive fine particles 10 dispersed in the solution are blocked by the surface tension and the capillary force of the solvent so that they do not flow out.
  • the solvent starts to evaporate gradually from the surface in contact with the atmosphere.
  • the volume of the colloidal solution present in the channel 111 decreases, and capillary force acts toward the contact surface with the atmosphere to compensate for this and is formed due to the surface tension with the solvent inside the object 100.
  • the curved surface moves together to the atmospheric contact surface.
  • the colloidal solution and the photoreactive fine particles 10 move.
  • the photoreactive particles 10 move to the surface in contact with the atmosphere, and the increase of the concentration of the photoreactive particles 10 and the evaporation of the solvent are appropriate for the photoreaction particles 10 which are regularly crystallized by magnetic bonding.
  • the crystals grow gradually in sequence. If the crystal is continuously grown and the solvent of the colloidal solution is completely evaporated, a photonic crystal having a specific thickness inside the channel 111 may be manufactured.
  • the photoreactive fine particles 10 having a size of 200 ⁇ 300nm may be used as the photoreactive fine particles 10.
  • the photoreactive fine particles 10 in the case of the photonic crystal formed using the photoreactive fine particles 10 of less than about 200nm, the wavelength reflection of the visible light region cannot be expected by reflecting the wavelength of the ultraviolet region, which is the region after purple, and the size of about 300nm or more is used.
  • the photoreaction fine particles 10 are preferably provided in a size of 200 to 300 nm because the reflection of the wavelength of the infrared region cannot be expected.
  • the concentration of the photoreactive fine particles 10 of the colloidal solution is preferably provided to less than 55% by weight. That is, at a concentration of about 55% by weight or more, the photoreactive fine particles 10 are self-assembled and crystallized in the colloidal solution, and are not easily filled in the channel 111 due to the high viscosity. There is a limit to increase the area of the photonic crystal formed in the.
  • a colloid supply unit (not shown) for supplying a colloidal solution to the channel 111 may be connected to the object 100.
  • the colloid supply unit may continuously inject the photoreactive particles 10 into the channel 111 of the object 100 while the photoreactive particles 10 are crystallized.
  • the solvent is evaporated from the surface in which the object 100 contacts the atmosphere, and a portion of the tip is first crystallized so that the solvent flows out to the opening of the object 100. It can form a barrier-seed to prevent it.
  • This makes it possible to prevent the colloidal solution present in the colloid supply part and the channel 111 from flowing out to the outside by the centrifugal force, which will be described later, and allow the photonic crystals to be sequentially formed from the atmospheric contact surface (opening part).
  • the width, length and thickness of the barrier-seed may be appropriately adjusted according to the rotation speed in the subsequent rotation process. In some cases, it is also possible to attach the aforementioned hydrophobic membrane to the opening of the object without forming a separate barrier seed layer.
  • the object 100 may be rotated while the photoreactive fine particles 10 are crystallized.
  • centrifugal force acts along the length direction of the object 100, and the photoreaction fine particles 10 may move along the length L direction of the object 100 by the centrifugal force.
  • the centrifugal force acting on the photoreactive fine particles 10 has the same directivity along the width of the channel 111 irrespective of the position along the width W direction of the channel 111. Defects can be prevented beforehand.
  • the centrifugal force having a constant direction along the width direction of the channel can act, so that defects due to the difference in the centrifugal force direction can be prevented.
  • the channel has a very thin thickness T compared to the width, the difference in the centrifugal force direction along the thickness direction of the channel can be ignored.
  • defects may occur due to the movement or adhesion of the solvent to a local portion of the photonic crystal.
  • a defect may be generated due to the movement or adhesion of the solvent, and thus a forced drying process of the solvent may be necessary.
  • the solvent in the voids may be removed through the opening of the channel while the object is rotated or stopped, such a drying method may take a long time to dry and have a high incidence of defects.
  • At least one of the first substrate 110 and the second substrate 120 is separated, and the solvent remaining in the voids between the photoreaction particles 10 is rapidly dried through the region of the separated substrate. I could do it.
  • the first substrate 110 and the second substrate 120 are separated.
  • the first substrate 110 in a state in which a photonic crystal is formed in the channel 111 will be described.
  • the second substrate may be separated instead of the first substrate, or both the first substrate and the second substrate may be separated.
  • first substrate 110 and the second substrate 120 are separated by slidingly moving in parallel along the longitudinal direction of the first substrate 110 (or the second substrate 120) or around one end. Can rotate and separate.
  • Separation (slide movement or rotation separation) of the first substrate 110 and the second substrate 120 may be made by a common driving source such as a motor, and each substrate may be a suction plate or any other conventional fixing means. Can be connected to the drive source.
  • a process of heat-treating the spacer 130 may be added. As the spacer 130 is heat treated, the structural coupling force between the first substrate 110 and the second substrate 120 may be adjusted.
  • the structural coupling force between the first substrate 110 and the second substrate 120 is controlled as the spacer 130 is heat-treated.
  • the spacer 130 and the first substrate are controlled.
  • the bonding force of the spacer 130 to the 110 and the second substrate 120 is controlled.
  • the spacer 130 may be heated, and the first substrate 110 and the second substrate 120 may be heated while the spacer 130 is heated. Adhesion of the spacer 130 to the can be reduced.
  • the present invention allows the structural bonding force (adhesive force) of the spacer 130 to be weakened through the heat treatment of the spacer 130 while separating the first substrate 110 and the second substrate 120.
  • the first substrate 110 and the second substrate 120 can be separated from the spacer 130 more easily and without coupling.
  • the spacer 130 various materials capable of controlling structural bonding strength during the heat treatment process may be used.
  • the spacer 130 is formed of a parafilm.
  • a process of heat-treating at least one of the first substrate 110 and the second substrate 120 may be added. have. As the first substrate 110 and the second substrate 120 are heat treated, the surface tension of the solvent on the first substrate 110 and the second substrate 120 may be adjusted.
  • the heat treatment of the substrate may be understood as a concept including common heat treatment conditions such as cooling and heating.
  • the present invention is not limited or limited by the heat treatment method of the substrate.
  • the first substrate 110 when the first substrate 110 is heated or maintained at room temperature during the heat treatment of the substrate, and the second substrate 120 is cooled to a relatively lower temperature than the first substrate 110, the relatively high Since the surface tension of the solvent with respect to the first substrate 110 having a temperature may be lowered and the surface tension of the solvent with respect to the second substrate 120 having a relatively low temperature may be increased, the second substrate 120 may be higher. Arrangement of the can be maintained more firmly, the first substrate 110 can be separated more easily.
  • Heat treatment temperature conditions of the first substrate 110 and the second substrate 120 may be variously changed according to the material of the substrate and the characteristics of the solvent.
  • the first substrate 110 may be heated to a temperature lower than the boiling point of the solvent
  • the second substrate 120 may be cooled to a temperature higher than the freezing point of the solvent.
  • the aforementioned heat treatment of the spacer 130 and the substrate may be performed by attaching a common heat source such as a coil or by supplying cold or warm air, and the present invention is not limited or limited by the heat treatment method.
  • the solvent remaining in the gap between the photoreaction particles 10 may be dried through at least one region separated from the first substrate 110 and the second substrate 120.
  • the solvent remaining in the gap between the photoreactive particles 10 is performed while separating at least one of the first substrate 110 and the second substrate 120, or the first substrate 110. And at least one of the second substrates 120 may be separated.
  • the first substrate 110 may be separated by slide movement toward the opening direction in which the first photonic crystal is formed.
  • the first substrate 110 may have the same height condition while the first substrate 110 is separated. Parallel to the photonic crystal) and be able to slide at the same speed.
  • the transfer speed of the substrate may be appropriately adjusted in consideration of ambient temperature and humidity conditions, characteristics of the driving source, evaporation rate of the solvent, and the like.
  • the first substrate 110 may be rotated based on one end and separated. After the first substrate 110 is separated, the solvent remaining in the pores between the photoreactive particles 10 may be rapidly dried through the exposed region.
  • the first substrate 110 is slid along the length direction of the first substrate 110.
  • the first substrate 110 and the second substrate 120 can be separated at the same time by slidingly moving the second substrate 120 in the direction opposite to the sliding direction.
  • the solvent remaining in the gap between the photoreaction particles 10 may be rapidly dried through the exposed area as the first substrate 110 and the second substrate 120 are separated.
  • the photonic crystal in which the solvent remaining in the pores between the photoreaction particles 10 is dried is left on the second substrate 120 through the substrate separation process as described above. Subsequently, a process of removing the second substrate 120 may be performed. In this case, since the solvent is completely dried, it may occur on the surface of the second substrate 120 and the photonic crystal when the second substrate 120 is removed. Faults can be prevented.

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Abstract

L'invention concerne une structure de cristal photonique capable de simplifier un processus de fabrication et d'augmenter l'efficacité, et un procédé de fabrication de celle-ci. Le procédé de fabrication d'une structure de cristal photonique comprend les étapes suivantes : fournir un corps de sujet comprenant un premier substrat, un deuxième substrat empilé sur le premier substrat de manière à être espacé du premier substrat et formant mutuellement et en coopération un canal avec le premier substrat, et un élément d'espacement permettant de sceller une surface latérale entre le premier substrat et le deuxième substrat ; fournir une solution colloïdale contenant des particules photoréactives à un canal ; cristalliser les particules photoréactives ; séparer le premier substrat et/ou le deuxième substrat ; et sécher un solvant restant dans un pore d'air entre les particules photoréactives au travers d'une région du premier substrat et/ou du deuxième substrat séparés.
PCT/KR2015/010561 2014-10-10 2015-10-06 Structure de cristal photonique et procédé de fabrication de celle-ci WO2016056826A1 (fr)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060074233A (ko) * 2004-12-27 2006-07-03 삼성전자주식회사 광전셀 및 그 제조방법
KR20100011184A (ko) * 2008-07-24 2010-02-03 광주과학기술원 나노 다공성 무기막, 상기 무기막의 제조방법, 상기무기막을 포함하는 광촉매층 및 상기 무기막을 포함하는염료감응형 태양전지
US20110272007A1 (en) * 2010-05-06 2011-11-10 Moon-Sung Kang Electrode for dye sensitized solar cell, method of manufacturing the same, and dye sensitized solar cell using the electrode
KR20120001456A (ko) * 2010-06-29 2012-01-04 서강대학교산학협력단 광전극, 이의 제조 방법, 및 이를 포함하는 염료감응 태양전지
KR20140098538A (ko) * 2013-01-31 2014-08-08 서강대학교산학협력단 광결정 구조의 제조방법 및 제조장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060074233A (ko) * 2004-12-27 2006-07-03 삼성전자주식회사 광전셀 및 그 제조방법
KR20100011184A (ko) * 2008-07-24 2010-02-03 광주과학기술원 나노 다공성 무기막, 상기 무기막의 제조방법, 상기무기막을 포함하는 광촉매층 및 상기 무기막을 포함하는염료감응형 태양전지
US20110272007A1 (en) * 2010-05-06 2011-11-10 Moon-Sung Kang Electrode for dye sensitized solar cell, method of manufacturing the same, and dye sensitized solar cell using the electrode
KR20120001456A (ko) * 2010-06-29 2012-01-04 서강대학교산학협력단 광전극, 이의 제조 방법, 및 이를 포함하는 염료감응 태양전지
KR20140098538A (ko) * 2013-01-31 2014-08-08 서강대학교산학협력단 광결정 구조의 제조방법 및 제조장치

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