WO2016041279A1 - Vapour deposition device and vapour deposition method - Google Patents

Vapour deposition device and vapour deposition method Download PDF

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Publication number
WO2016041279A1
WO2016041279A1 PCT/CN2014/094061 CN2014094061W WO2016041279A1 WO 2016041279 A1 WO2016041279 A1 WO 2016041279A1 CN 2014094061 W CN2014094061 W CN 2014094061W WO 2016041279 A1 WO2016041279 A1 WO 2016041279A1
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Prior art keywords
evaporation
organic vapor
organic
vapor
evaporation source
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PCT/CN2014/094061
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French (fr)
Chinese (zh)
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赵德江
藤野诚治
殷杰
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京东方科技集团股份有限公司
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Publication of WO2016041279A1 publication Critical patent/WO2016041279A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

Definitions

  • Embodiments of the present invention relate to an evaporation apparatus and an evaporation method.
  • OLED Organic Light Emitting Diode
  • the basic structure of an OLED display device mainly includes an anode and a cathode, and an organic material functional layer therebetween.
  • the functional layer of the organic material is a core part of the OLED display device, and the manufacturing method thereof includes inkjet printing, spin coating, evaporation, and the like. Due to the limited equipment and processes, the functional layer of organic materials produced by inkjet printing or spin coating cannot be applied to mass production. Currently, the only method that can achieve mass production is vapor deposition.
  • Embodiments of the present invention provide an evaporation apparatus and an evaporation method.
  • At least one embodiment of the present invention provides an evaporation apparatus including an evaporation source, a power application system, and an electromagnetic control system; the evaporation source is for supplying organic steam; and the power generation system is for charging the organic vapor
  • the electromagnetic control system is for controlling the rate and flow direction of the charged organic vapor, and selecting the organic vapor that enters the predetermined region and moves in a predetermined direction to be deposited on the surface of the substrate.
  • the electromagnetic control system includes an electric field region near a side of the power-on system and a magnetic field region away from a side of the power-on system; in the electric field region, an electric field having a direction of an electric field is a first direction, so that The organic vapor is accelerated; a magnetic field having a magnetic field direction in a second direction is present in the magnetic field region to deflect the organic vapor in a third direction; wherein the first direction is an evaporation direction or a direction of the evaporation source In a reverse direction of the evaporation direction, the second direction is perpendicular to the first direction, and the third direction is perpendicular to both the first direction and the second direction.
  • the electromagnetic control system may further include a screening hole corresponding to the magnetic field region;
  • the electromagnetic control system is configured to deflect the organic vapor entering the magnetic field region toward a side on which the screening aperture is located.
  • the evaporation apparatus may further include a recovery system located on both sides of the screening aperture.
  • the evaporation apparatus can further include a drive system for driving and controlling relative movement between the substrate and the screening aperture.
  • the evaporation source can be a linear evaporation source.
  • the linear evaporation source can include an evaporation vessel and a linear heating source.
  • the evaporation apparatus may further include a crystal oscillator located at an exit position of the linear evaporation source or at an exit position of the screening hole.
  • the evaporation apparatus further includes an injection system between the evaporation source and the power up system.
  • the injection system can include a plurality of identical nozzles.
  • An embodiment of the present invention further provides an evaporation method based on any one of the above vapor deposition apparatuses, comprising: heating an evaporation source to generate organic vapor; charging the organic vapor by a power-on system; and controlling charging by an electromagnetic control system
  • the rate and direction of the organic vapor is such that the organic vapor that enters the predetermined area and moves in a predetermined direction is deposited onto the surface of the substrate.
  • the controlling the rate and direction of the charged organic vapor by the electromagnetic control system such that deposition of the organic vapor entering the predetermined region and moving in a predetermined direction to the surface of the substrate may include: charging the organic vapor through the electric field The electric field in the first direction is accelerated; the accelerated organic gas is deflected in a third direction by the magnetic field in the second direction; the organic vapor reaching the screening hole after being deflected out of the screening hole And depositing to the surface of the substrate; wherein the first direction is an evaporation direction of the evaporation source or a reverse direction of the evaporation direction, and the second direction is perpendicular to the first direction, the third direction It is perpendicular to both the first direction and the second direction.
  • Figure 1 is a schematic diagram of an evaporation device
  • FIG. 2 is a schematic diagram of an evaporation device according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of an evaporation device according to an embodiment of the present invention.
  • FIG. 4 is a flow chart of an evaporation method according to an embodiment of the present invention.
  • FIG. 5 is an example of a power-on component in a power-on system in an evaporation device according to an embodiment of the present invention
  • Fig. 6 is a view showing an example of a combination of energizing elements in a power-on system in an evaporation device according to an embodiment of the present invention.
  • 10-evaporation source 20-injection system; 30-powered system; 40-electromagnetic control system; 401-electric field region; 402-magnetic field region; 403-screening hole; 50-recovery system; 60-crystal oscillator; 80-powered component; 81-wire; 82-powered component combination.
  • a vapor deposition apparatus has a structure as shown in FIG. 1, which mainly includes an evaporation source 10 and an injection system 20.
  • the evaporation source 10 is for supplying organic vapor
  • the injection system 20 is for spraying the organic vapor onto the surface of the substrate 70 to form an organic film layer.
  • the organic vapor generated by the evaporation source 10 disperses the entire cavity, which results in a low utilization rate of the material.
  • the free diffusion of organic vapor also causes serious contamination of the cavity, requiring frequent cleaning of the baffles, thereby resulting in increased costs.
  • Embodiments of the present invention provide an evaporation apparatus and an evaporation method, which can control the flow direction of organic steam, thereby improving the utilization ratio of the organic material, and also preventing the chamber contamination caused by the diffusion of the organic material, thereby reducing the baffle. The number of cleanings and cost savings.
  • Embodiments of the present invention provide an evaporation apparatus, as shown in FIG. 2, which includes an evaporation source 10, a power up system 30, and an electromagnetic control system 40; an evaporation source 10 for supplying organic steam; and a power up system 30 for making The organic vapor is charged; the electromagnetic control system 40 is for controlling the rate and flow direction of the charged organic vapor, and organic vapor that enters the predetermined region and moves in a predetermined direction is deposited onto the surface of the substrate 70.
  • the organic vapor generated by the evaporation source 10 has a specific rate and direction; the evaporation direction of the organic vapor is directed to the power-up system 30, and the evaporation rate of the organic vapor can be adjusted by the components inside the evaporation source 10 to It is better to be able to obtain a uniform rate.
  • power up system 30 is used to charge organic vapor to facilitate control of the rate and direction of organic vapors by electromagnetic control system 40.
  • the organic steam may be positively or negatively charged, and is not specifically limited herein, but it is necessary to ensure that the control mode of the electromagnetic control system 40 is compatible with the type of organic vapor charging.
  • the electromagnetic control system 40 selects organic vapor that enters the predetermined area and moves in a predetermined direction to the surface of the substrate 70, mainly for selecting organic vapor having similar specific energy to be deposited on the surface of the substrate 70, while the substrate 70 needs to be uniform.
  • the area ejected by the organic vapor ensures the uniformity of the film formation and the stability of the bonding strength.
  • Embodiments of the present invention can achieve control of the rate and flow direction of organic vapor generated by the evaporation source 10 by providing the power-up system 30 and the electromagnetic control system 40 in the evaporation apparatus, so that organic vapor having a specific energy is deposited on the substrate. 70 surface, forming a uniform film layer.
  • the rate and flow direction of the organic vapor have certain controllability, the utilization rate of the organic material can be improved, and the chamber pollution caused by the diffusion of the organic material in the organic vapor can be effectively prevented. Thereby reducing the number of times the baffle is cleaned and saving costs.
  • the electromagnetic control system 40 may include an electric field region 401 near one side of the power-on system 30 and a magnetic field region 402 remote from the side of the power-on system 30.
  • the electric field region 401 there is an electric field in which the electric field direction is the first direction to accelerate the organic vapor.
  • the magnetic field region 402 there is a magnetic field in the direction of the magnetic field in the second direction to deflect the organic vapor in the third direction.
  • the first direction may be an evaporation direction of the evaporation source 10 or a reverse direction of the evaporation direction, the second direction being perpendicular to the first direction, and the third direction being perpendicular to both the first direction and the second direction.
  • the electric field region 401 can be generated by two oppositely disposed electrodes, and by applying different voltages to the two electrodes, an electric field from one electrode to the other can be generated.
  • the direction of the electric field formed may depend on the type of charging of the organic vapor.
  • the direction of the electric field may be the evaporation direction of the evaporation source 10
  • the direction of the electric field may be the opposite direction of the evaporation direction of the evaporation source 10.
  • the magnetic field region 402 can be generated by a coil.
  • the organic vapor can be based on the direction of the magnetic field and the organic vapor
  • the charging type is correspondingly deflected, and the deflection direction is the third direction.
  • the deflection direction of the organic vapor can be judged according to the left hand rule. That is, the magnetic induction line passes vertically through the palm, the four fingers point to the direction of motion of the positive charge or the opposite direction of the direction of movement of the negative charge, and the direction of the thumb is the direction of deflection of the charge under the action of the magnetic field. It can be seen that when the first direction and the second direction are determined, the third direction is also determined.
  • the electric field region 401 is close to the power-up system 30, and the magnetic field region 402 is away from the power-up system 30.
  • the organic vapor can be deflected before being accelerated.
  • embodiments of the invention are not limited thereto, and it is also possible that the magnetic field region 402 is adjacent to the power up system 30 and the electric field region 401 is remote from the power up system 30. In this case, the organic vapor can be accelerated after being deflected.
  • the electromagnetic control system 40 can also include a screening aperture 403 corresponding to the magnetic field region. Wherein, the organic vapor entering the magnetic field region 402 is deflected toward the side where the screening hole 403 is located.
  • the electric field direction (ie, the first direction) of the electric field region 401 is directed from the lower side of the cavity to the upper side, and the magnetic field direction of the magnetic field region 402.
  • the second direction (for example, the second direction) is directed to the front side by the rear side of the cavity, and the screening hole 403 is located at a corresponding position on the right side of the magnetic field region 402.
  • the organic vapor After the organic vapor enters the electric field region 401, it accelerates under the action of the electric field, then enters the magnetic field region 402, deflects to the right side of the cavity under the action of the magnetic field, and finally flies out from the screening hole 403, thereby It is deposited on the surface of the substrate 70.
  • the electric field direction of the electric field region ie, the first direction
  • the electric field direction of the electric field region may be changed to be directed from the upper side of the cavity to the lower side, while the screening hole 403 is disposed in the magnetic field region. The corresponding position on the side can be used, and will not be described here.
  • the evaporation apparatus may further include a recovery system 50 located on both sides of the screening hole 403.
  • the rate at which the organic vapor that is energized by the power up system 30 is accelerated after passing through the electric field is also different.
  • the angle at which organic vapors having different rates deflect after passing through the magnetic field must be different. On this basis, only organic vapor corresponding to the position of the screening hole 403 and having a specific energy can be ejected to the surface of the substrate 70, while other organic vapors are deflected to different degrees, wherein the organic vapor with insufficient deflection angle may Attached to the baffle inside the cavity, the organic vapor with excessive deflection angle may re-enter Into the electric field area.
  • the organic vapor is mostly concentrated in the vicinity of the region which can be ejected from the screening hole 403, there is a similar energy, and thus the organic vapor which is not ejected is concentrated in the region on both sides of the screening hole 403.
  • the recovery system 50 By arranging the recovery system 50 in this area, the organic material in the organic vapor can be recovered to the greatest extent, and can be further purified and reused, thereby improving the utilization rate of the organic material and saving costs.
  • the evaporation apparatus may also include a drive system for driving and controlling the relative motion between the substrate 70 and the screening aperture 403.
  • the moving speed and direction of the substrate 70 can be controlled by the driving system so that the substrate 70 passes through the corresponding region of the screening hole 403 at a constant speed, thereby forming a uniform film layer on the surface of the substrate 70.
  • the evaporation source 10 preferably employs a linear evaporation source; the linear evaporation source may include an evaporation container and a linear heating source.
  • the so-called linear or evaporating container produces linear organic vapor in the case where the linear heating source supplies thermal energy, thereby achieving linear evaporation of the organic material.
  • the evaporation vessel can be made of stainless steel and can contain the desired organic material inside.
  • the linear heating source may be composed of a plurality of coils, and an alternating current voltage of a predetermined frequency is applied to the coil by an alternating current power source disposed outside the evaporation vessel, thereby accurately controlling the heating temperature to ensure uniform heating of the organic material.
  • the vapor deposition apparatus may further include a crystal oscillator 60 located at an exit position of the evaporation source 10 or at an exit position of the screening hole 403.
  • the crystal oscillator 60 is used to stabilize the evaporation rate of the organic vapor.
  • the evaporation apparatus can also include an injection system 20 located between the evaporation source 10 and the power up system 30.
  • the injection system 20 can include a plurality of identical nozzles.
  • the injection system 20 between the evaporation source 10 and the power-up system 30 it is possible to The formed organic vapor enters the power-up device 30 relatively stably, and the organic vapor can also enter the power-up system 30 at a uniform rate by adjusting the pressure of each nozzle.
  • the power-on system 30 in the embodiment of the present invention may adopt the power-on component 80 as shown in FIG. 5.
  • the gas passes through the wire 81, the gas is charged, and the wire can select the hot wire.
  • the organic vapor is charged with a charge by adding a single phase (positive or negative) which can be used to positively or negatively charge the vapor deposition unit.
  • a single phase positive or negative
  • FIG. 6 an example of the power-on component combination 82 in the power-on system of the vapor deposition device provided by the embodiment of the present invention is that the power-up components are combined so as to be entirely above the evaporation source, so that The entire evaporation source is powered.
  • the power-on system used in the embodiment of the present invention is not limited thereto. As long as it is a power-up system that can make the organic vapor positively or negatively charged, it can be used.
  • Embodiments of the present invention also provide an evaporation method based on any of the above vapor deposition devices. As shown in FIG. 4, the method may include the following steps.
  • the evaporation source 10 is heated to generate organic vapor.
  • the rate of the organic vapor can be stabilized by the crystal piece 60.
  • the organic vapor is charged by the power up system 30.
  • the organic vapor can be positively charged or negatively charged as needed.
  • the first direction is the evaporation direction of the evaporation source 10 or the opposite direction of the evaporation direction
  • the second direction is perpendicular to the first direction
  • the third direction is perpendicular to both the first direction and the second direction.
  • the electric steam after the electric steam is energized, it can be accelerated by the electric field, and then deflected by the magnetic field; or the deflection can be realized by the magnetic field first, and then accelerated by the electric field, which is not specifically limited herein.
  • the evaporation method of the vapor deposition device provided by the embodiment of the present invention can be realized; since the rate and flow direction of the organic vapor have certain controllability, the organic vapor can be effectively prevented.
  • the diffusion of organic materials spreads, thereby increasing the utilization of organic materials.
  • the number of cleaning of the baffle is reduced, and the cost is saved.
  • only the substrate 70 needs to be moved during the entire evaporation process to control the relative movement between the substrate 70 and the screening hole 403, so that the evaporation of the organic material can be realized, which can significantly reduce the occupation space of the vapor deposition device.
  • the evaporation source 10 does not directly face the substrate 70, which can also effectively reduce the radiation.
  • control of the rate and flow direction of the organic vapor generated by the evaporation source can be achieved, so that organic vapor having a specific energy is deposited on the surface of the substrate to form a uniform film layer.
  • the rate and flow direction of the organic vapor have certain controllability, the utilization rate of the organic material can be improved, and the chamber pollution caused by the diffusion of the organic material in the organic vapor can be effectively prevented. , thereby reducing the number of times the baffle is cleaned and saving costs.

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
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  • Physical Vapour Deposition (AREA)

Abstract

Provided are a vapour deposition device and a vapour deposition method. The vapour deposition device comprises an evaporation source (10), an electrical charging system (30) and an electromagnetic control system (40), wherein the evaporation source (10) is used for providing an organic vapour; the electrical charging system (30) is used for charging the organic vapour; and the electromagnetic control system (40) is used for controlling the flow rate and flow direction of the charged organic vapour and choosing the organic vapour entering a predetermined region and moving toward a predetermined direction to be deposited onto the surface of a substrate. The vapour deposition device can control the flow direction of the organic vapour, improves the utilization rate of the organic material, avoids cavity contaminations caused by the diffusion of the organic material, reduces the number of baffle cleanings, and saves costs.

Description

蒸镀装置以及蒸镀方法Vapor deposition device and evaporation method 技术领域Technical field
本发明的实施例涉及一种蒸镀装置以及蒸镀方法。Embodiments of the present invention relate to an evaporation apparatus and an evaporation method.
背景技术Background technique
有机电致发光器件(Organic Light Emitting Diode，OLED)具有响应速度快、色彩绚丽、温度特性好、视角宽、功耗低、可适用于挠曲性面板等诸多优点，已经成为新一代平面显示装置的重点发展方向之一，受到了日益广泛的关注。Organic Light Emitting Diode (OLED) has many advantages such as fast response, bright color, good temperature characteristics, wide viewing angle, low power consumption, and flexibility for flexible panels. It has become a new generation of flat panel display devices. One of the key development directions has received increasing attention.
通常OLED显示器件的基本结构主要包括阳极和阴极，以及二者之间的有机材料功能层。所述有机材料功能层为所述OLED显示器件的核心部分，其制作方法包括喷墨打印、旋涂和蒸镀等。受限于通常的设备和工艺，通过喷墨打印法或者旋涂法制作有机材料功能层无法应用于量产，目前能够实现量产的方法仅有蒸镀法。In general, the basic structure of an OLED display device mainly includes an anode and a cathode, and an organic material functional layer therebetween. The functional layer of the organic material is a core part of the OLED display device, and the manufacturing method thereof includes inkjet printing, spin coating, evaporation, and the like. Due to the limited equipment and processes, the functional layer of organic materials produced by inkjet printing or spin coating cannot be applied to mass production. Currently, the only method that can achieve mass production is vapor deposition.
发明内容Summary of the invention
本发明的实施例提供一种蒸镀装置以及蒸镀方法。Embodiments of the present invention provide an evaporation apparatus and an evaporation method.
本发明的至少一个实施例提供一种蒸镀装置，其包括蒸发源、加电***和电磁控制***；所述蒸发源用于提供有机蒸汽；所述加电***用于使所述有机蒸汽带电；所述电磁控制***用于控制带电的所述有机蒸汽的速率和流向，并选择进入预定区域并向预定方向运动的所述有机蒸汽沉积至基板表面。At least one embodiment of the present invention provides an evaporation apparatus including an evaporation source, a power application system, and an electromagnetic control system; the evaporation source is for supplying organic steam; and the power generation system is for charging the organic vapor The electromagnetic control system is for controlling the rate and flow direction of the charged organic vapor, and selecting the organic vapor that enters the predetermined region and moves in a predetermined direction to be deposited on the surface of the substrate.
例如，所述电磁控制***包括靠近所述加电***一侧的电场区域和远离所述加电***一侧的磁场区域；在所述电场区域存在电场方向为第一方向的电场，以使所述有机蒸汽进行加速；在所述磁场区域存在磁场方向为第二方向的磁场，以使所述有机蒸汽向第三方向偏转；其中，所述第一方向为所述蒸发源的蒸发方向或所述蒸发方向的反方向，所述第二方向与所述第一方向相互垂直，所述第三方向与所述第一方向和所述第二方向均垂直。For example, the electromagnetic control system includes an electric field region near a side of the power-on system and a magnetic field region away from a side of the power-on system; in the electric field region, an electric field having a direction of an electric field is a first direction, so that The organic vapor is accelerated; a magnetic field having a magnetic field direction in a second direction is present in the magnetic field region to deflect the organic vapor in a third direction; wherein the first direction is an evaporation direction or a direction of the evaporation source In a reverse direction of the evaporation direction, the second direction is perpendicular to the first direction, and the third direction is perpendicular to both the first direction and the second direction.
例如，所述电磁控制***还可包括对应于所述磁场区域的筛选孔；其中， 所述电磁控制***配置来使得进入所述磁场区域的所述有机蒸汽向所述筛选孔所在的一侧偏转。For example, the electromagnetic control system may further include a screening hole corresponding to the magnetic field region; The electromagnetic control system is configured to deflect the organic vapor entering the magnetic field region toward a side on which the screening aperture is located.
例如，所述蒸镀装置还可包括位于所述筛选孔两侧的回收***。For example, the evaporation apparatus may further include a recovery system located on both sides of the screening aperture.
例如，所述蒸镀装置还可包括用于驱动和控制所述基板与所述筛选孔之间的相对运动的驱动***。For example, the evaporation apparatus can further include a drive system for driving and controlling relative movement between the substrate and the screening aperture.
例如，所述蒸发源可为线性蒸发源。For example, the evaporation source can be a linear evaporation source.
例如，所述线性蒸发源可包括蒸发容器和线性加热源。For example, the linear evaporation source can include an evaporation vessel and a linear heating source.
例如，所述蒸镀装置还可包括位于所述线性蒸发源的出口位置处或者位于所述筛选孔的出口位置处的晶振器。For example, the evaporation apparatus may further include a crystal oscillator located at an exit position of the linear evaporation source or at an exit position of the screening hole.
例如，所述蒸镀装置还包括位于所述蒸发源和所述加电***之间的喷射***。For example, the evaporation apparatus further includes an injection system between the evaporation source and the power up system.
例如，所述喷射***可包括多个相同的喷嘴。For example, the injection system can include a plurality of identical nozzles.
本发明的实施例还提供一种基于上述任一的蒸镀装置的蒸镀方法，其包括：加热蒸发源以产生有机蒸汽；通过加电***使所述有机蒸汽带电；通过电磁控制***控制带电的所述有机蒸汽的速率和流向，以使进入预定区域并向预定方向运动的所述有机蒸汽沉积至基板表面。An embodiment of the present invention further provides an evaporation method based on any one of the above vapor deposition apparatuses, comprising: heating an evaporation source to generate organic vapor; charging the organic vapor by a power-on system; and controlling charging by an electromagnetic control system The rate and direction of the organic vapor is such that the organic vapor that enters the predetermined area and moves in a predetermined direction is deposited onto the surface of the substrate.
例如，所述通过电磁控制***控制带电的所述有机蒸汽的速率和流向，以使进入预定区域并向预定方向运动的所述有机蒸汽沉积至基板表面可包括：带电的所述有机蒸汽经过电场方向为第一方向的电场进行加速；加速后的所述有机蒸汽经过磁场方向为第二方向的磁场向第三方向发生偏转；偏转后到达筛选孔的所述有机蒸汽从所述筛选孔飞出，并沉积至基板表面；其中，所述第一方向为所述蒸发源的蒸发方向或所述蒸发方向的反方向，所述第二方向与所述第一方向相互垂直，所述第三方向与所述第一方向和所述第二方向均垂直。For example, the controlling the rate and direction of the charged organic vapor by the electromagnetic control system such that deposition of the organic vapor entering the predetermined region and moving in a predetermined direction to the surface of the substrate may include: charging the organic vapor through the electric field The electric field in the first direction is accelerated; the accelerated organic gas is deflected in a third direction by the magnetic field in the second direction; the organic vapor reaching the screening hole after being deflected out of the screening hole And depositing to the surface of the substrate; wherein the first direction is an evaporation direction of the evaporation source or a reverse direction of the evaporation direction, and the second direction is perpendicular to the first direction, the third direction It is perpendicular to both the first direction and the second direction.
附图说明DRAWINGS
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below. Obviously, the drawings in the following description are only It is a matter of the embodiments of the invention, and is not intended to limit the invention.
图1为一种蒸镀装置的原理图； Figure 1 is a schematic diagram of an evaporation device;
图2为本发明的实施例提供的一种蒸镀装置的原理图；2 is a schematic diagram of an evaporation device according to an embodiment of the present invention;
图3为本发明的实施例提供的一种蒸镀装置的结构示意图；3 is a schematic structural view of an evaporation device according to an embodiment of the present invention;
图4为本发明的实施例提供的一种蒸镀方法流程图；4 is a flow chart of an evaporation method according to an embodiment of the present invention;
图5为本发明的实施例提供的蒸镀装置中加电***中加电元件的一个示例；5 is an example of a power-on component in a power-on system in an evaporation device according to an embodiment of the present invention;
图6为本发明的实施例提供的蒸镀装置中加电***中加电元件组合的一个示例。Fig. 6 is a view showing an example of a combination of energizing elements in a power-on system in an evaporation device according to an embodiment of the present invention.
附图标记：Reference mark:
10-蒸发源；20-喷射***；30-加电***；40-电磁控制***；401-电场区域；402-磁场区域；403-筛选孔；50-回收***；60-晶振器；70-基板；80-加电元件；81-电丝；82-加电元件组合。10-evaporation source; 20-injection system; 30-powered system; 40-electromagnetic control system; 401-electric field region; 402-magnetic field region; 403-screening hole; 50-recovery system; 60-crystal oscillator; 80-powered component; 81-wire; 82-powered component combination.
具体实施方式detailed description
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, but not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts are within the scope of the present invention.
一种蒸镀装置的结构如图1所示，其主要包括蒸发源10和喷射***20。所述蒸发源10用于提供有机蒸汽，所述喷射***20用于将所述有机蒸汽喷射到基板70表面以形成有机膜层。但是，采用蒸镀法制作所述有机材料功能层时，所述蒸发源10产生的有机蒸汽弥散整个腔体，这样便会导致材料的利用率较低。与此同时，有机蒸汽的自由扩散还会造成对腔体的严重污染，需要频繁的清洗挡板，由此导致成本增加。A vapor deposition apparatus has a structure as shown in FIG. 1, which mainly includes an evaporation source 10 and an injection system 20. The evaporation source 10 is for supplying organic vapor, and the injection system 20 is for spraying the organic vapor onto the surface of the substrate 70 to form an organic film layer. However, when the functional layer of the organic material is formed by evaporation, the organic vapor generated by the evaporation source 10 disperses the entire cavity, which results in a low utilization rate of the material. At the same time, the free diffusion of organic vapor also causes serious contamination of the cavity, requiring frequent cleaning of the baffles, thereby resulting in increased costs.
本发明的实施例提供一种蒸镀装置以及蒸镀方法，可控制有机蒸汽的流向，从而提高有机材料的利用率，同时还能防止有机材料四处扩散引起的腔室污染，从而减少挡板的清洗次数，节约成本。Embodiments of the present invention provide an evaporation apparatus and an evaporation method, which can control the flow direction of organic steam, thereby improving the utilization ratio of the organic material, and also preventing the chamber contamination caused by the diffusion of the organic material, thereby reducing the baffle. The number of cleanings and cost savings.
本发明的实施例提供一种蒸镀装置，如图2所示，其包括蒸发源10、加电***30和电磁控制***40；蒸发源10用于提供有机蒸汽；加电***30用于使有机蒸汽带电；电磁控制***40用于控制带电的有机蒸汽的速率和流向，并选择进入预定区域并向预定方向运动的有机蒸汽沉积至基板70表面。 Embodiments of the present invention provide an evaporation apparatus, as shown in FIG. 2, which includes an evaporation source 10, a power up system 30, and an electromagnetic control system 40; an evaporation source 10 for supplying organic steam; and a power up system 30 for making The organic vapor is charged; the electromagnetic control system 40 is for controlling the rate and flow direction of the charged organic vapor, and organic vapor that enters the predetermined region and moves in a predetermined direction is deposited onto the surface of the substrate 70.
需要说明的是，第一，蒸发源10产生的有机蒸汽具有特定的速率和方向；有机蒸汽的蒸发方向指向加电***30，有机蒸汽的蒸发速率可以通过蒸发源10内部的部件进行调节，以能够获得均匀一致的速率为佳。It should be noted that, first, the organic vapor generated by the evaporation source 10 has a specific rate and direction; the evaporation direction of the organic vapor is directed to the power-up system 30, and the evaporation rate of the organic vapor can be adjusted by the components inside the evaporation source 10 to It is better to be able to obtain a uniform rate.
第二，加电***30用于使有机蒸汽带电，以便于通过电磁控制***40实现对有机蒸汽的速率和流向的控制。有机蒸汽可以带正电或者带负电，这里不做具体限定，但需保证电磁控制***40的控制方式与有机蒸汽带电类型相互适应。Second, power up system 30 is used to charge organic vapor to facilitate control of the rate and direction of organic vapors by electromagnetic control system 40. The organic steam may be positively or negatively charged, and is not specifically limited herein, but it is necessary to ensure that the control mode of the electromagnetic control system 40 is compatible with the type of organic vapor charging.
第三，电磁控制***40选择进入预定区域并向预定方向运动的有机蒸汽沉积至基板70的表面，主要是为了选择具有相近特定能量的有机蒸汽沉积在基板70的表面，同时基板70需要匀速的经过有机蒸汽喷出的区域，从而保证成膜的均匀性和结合强度的稳定性。Third, the electromagnetic control system 40 selects organic vapor that enters the predetermined area and moves in a predetermined direction to the surface of the substrate 70, mainly for selecting organic vapor having similar specific energy to be deposited on the surface of the substrate 70, while the substrate 70 needs to be uniform. The area ejected by the organic vapor ensures the uniformity of the film formation and the stability of the bonding strength.
本发明的实施例通过在蒸镀装置中设置加电***30和电磁控制***40，可以实现对蒸发源10产生的有机蒸汽的速率和流向的控制，从而使得具有特定能量的有机蒸汽沉积在基板70表面，形成均匀的膜层。在此基础上，由于有机蒸汽的速率和流向具有一定的可控性，这样便可以提高有机材料的利用率，并能有效防止因有机蒸汽中的有机材料的四处扩散而引起的腔室污染，从而减少挡板的清洗次数，节约成本。Embodiments of the present invention can achieve control of the rate and flow direction of organic vapor generated by the evaporation source 10 by providing the power-up system 30 and the electromagnetic control system 40 in the evaporation apparatus, so that organic vapor having a specific energy is deposited on the substrate. 70 surface, forming a uniform film layer. On this basis, since the rate and flow direction of the organic vapor have certain controllability, the utilization rate of the organic material can be improved, and the chamber pollution caused by the diffusion of the organic material in the organic vapor can be effectively prevented. Thereby reducing the number of times the baffle is cleaned and saving costs.
基于上述描述，例如，参考图2所示，电磁控制***40可以包括靠近加电***30一侧的电场区域401和远离加电***30一侧的磁场区域402。在电场区域401中存在电场方向为第一方向的电场，以使有机蒸汽进行加速。在磁场区域402中存在磁场方向为第二方向的磁场，以使有机蒸汽向第三方向偏转。Based on the above description, for example, referring to FIG. 2, the electromagnetic control system 40 may include an electric field region 401 near one side of the power-on system 30 and a magnetic field region 402 remote from the side of the power-on system 30. In the electric field region 401, there is an electric field in which the electric field direction is the first direction to accelerate the organic vapor. In the magnetic field region 402, there is a magnetic field in the direction of the magnetic field in the second direction to deflect the organic vapor in the third direction.
第一方向可以为蒸发源10的蒸发方向或者蒸发方向的反方向，第二方向与第一方向相互垂直，第三方向与第一方向和第二方向均垂直。The first direction may be an evaporation direction of the evaporation source 10 or a reverse direction of the evaporation direction, the second direction being perpendicular to the first direction, and the third direction being perpendicular to both the first direction and the second direction.
例如，一方面，电场区域401可以由两个相对设置的电极产生，通过向两个电极分别施加不同的电压，便可以产生由一个电极指向另一个电极的电场。所形成的电场方向可以根据有机蒸汽的带电类型而定。例如当有机蒸汽带正电时，电场方向可以为蒸发源10的蒸发方向，当有机蒸汽带负电时，电场方向可以为蒸发源10的蒸发方向的反方向。另一方面，磁场区域402可以通过线圈产生。在此基础上，有机蒸汽便可以根据磁场的方向和有机蒸汽的 带电类型而发生相应的偏转，其偏转方向即为第三方向。For example, on the one hand, the electric field region 401 can be generated by two oppositely disposed electrodes, and by applying different voltages to the two electrodes, an electric field from one electrode to the other can be generated. The direction of the electric field formed may depend on the type of charging of the organic vapor. For example, when the organic vapor is positively charged, the direction of the electric field may be the evaporation direction of the evaporation source 10, and when the organic vapor is negatively charged, the direction of the electric field may be the opposite direction of the evaporation direction of the evaporation source 10. Alternatively, the magnetic field region 402 can be generated by a coil. On this basis, the organic vapor can be based on the direction of the magnetic field and the organic vapor The charging type is correspondingly deflected, and the deflection direction is the third direction.
这里，有机蒸汽的偏转方向可以根据左手定则进行判断。即，磁感线垂直穿过掌心，四指指向正电荷的运动方向或者负电荷的运动方向的反方向，大拇指的方向即为电荷在磁场作用下的偏转方向。由此可知，当第一方向和第二方向确定以后，第三方向也随之确定。Here, the deflection direction of the organic vapor can be judged according to the left hand rule. That is, the magnetic induction line passes vertically through the palm, the four fingers point to the direction of motion of the positive charge or the opposite direction of the direction of movement of the negative charge, and the direction of the thumb is the direction of deflection of the charge under the action of the magnetic field. It can be seen that when the first direction and the second direction are determined, the third direction is also determined.
需要说明的是，在上述实施例中，电场区域401靠近加电***30，磁场区域402远离加电***30。在此情况下，有机蒸汽可以先进行加速后实现偏转。但本发明的实施例并不限于此，其也可以是磁场区域402靠近加电***30，电场区域401远离加电***30。在此情况下，有机蒸汽可以先实现偏转后进行加速。It should be noted that in the above embodiment, the electric field region 401 is close to the power-up system 30, and the magnetic field region 402 is away from the power-up system 30. In this case, the organic vapor can be deflected before being accelerated. However, embodiments of the invention are not limited thereto, and it is also possible that the magnetic field region 402 is adjacent to the power up system 30 and the electric field region 401 is remote from the power up system 30. In this case, the organic vapor can be accelerated after being deflected.
在此基础上，参考图2所示，电磁控制***40还可以包括对应于磁场区域的筛选孔403。其中，进入磁场区域402的有机蒸汽向筛选孔403所在的一侧偏转。In this regard, referring to FIG. 2, the electromagnetic control system 40 can also include a screening aperture 403 corresponding to the magnetic field region. Wherein, the organic vapor entering the magnetic field region 402 is deflected toward the side where the screening hole 403 is located.
下面提供一个具体的实施例对有机蒸汽的运动路线进行说明。如图3所示，在有机蒸汽经过加电***30之后带正电的情况下，电场区域401的电场方向(即第一方向)由腔体的下侧指向上侧，磁场区域402的磁场方向(即第二方向)例如由腔体的后侧指向前侧，筛选孔403位于磁场区域402右侧的相应位置处。此时，有机蒸汽进入电场区域401之后，在电场的作用下便会进行加速，然后进入磁场区域402，在磁场的作用下向腔体的右侧偏转，最终从筛选孔403中飞出，从而沉积在基板70的表面。在有机蒸汽经过加电***30之后带负电的情况下，可以改变电场区域的电场方向(即第一方向)使其由腔体的上侧指向下侧，同时将筛选孔403设置在磁场区域左侧的相应位置处即可，这里不再赘述。A specific embodiment will be described below for the movement route of organic steam. As shown in FIG. 3, in the case where the organic vapor is positively charged after passing through the power-up system 30, the electric field direction (ie, the first direction) of the electric field region 401 is directed from the lower side of the cavity to the upper side, and the magnetic field direction of the magnetic field region 402. The second direction (for example, the second direction) is directed to the front side by the rear side of the cavity, and the screening hole 403 is located at a corresponding position on the right side of the magnetic field region 402. At this time, after the organic vapor enters the electric field region 401, it accelerates under the action of the electric field, then enters the magnetic field region 402, deflects to the right side of the cavity under the action of the magnetic field, and finally flies out from the screening hole 403, thereby It is deposited on the surface of the substrate 70. In the case where the organic vapor is negatively charged after passing through the power-up system 30, the electric field direction of the electric field region (ie, the first direction) may be changed to be directed from the upper side of the cavity to the lower side, while the screening hole 403 is disposed in the magnetic field region. The corresponding position on the side can be used, and will not be described here.
进一步的，蒸镀装置还可以包括位于筛选孔403两侧的回收***50。Further, the evaporation apparatus may further include a recovery system 50 located on both sides of the screening hole 403.
由于蒸发源10产生的有机蒸汽的速率不完全相同，因此通过加电***30进行加电的有机蒸汽在经过电场加速之后的速率也不相同。具有不同速率的有机蒸汽经过磁场之后发生偏转的角度必然随之不同。在此基础上，仅有与筛选孔403的位置对应并且具有特定能量的有机蒸汽可以喷出至基板70的表面，而其它有机蒸汽则会发生不同程度的偏转，其中偏转角度不足的有机蒸汽可能附着在腔体内部的挡板上，偏转角度过大的有机蒸汽可能重新进 入电场区域。基于此，由于有机蒸汽大多集中在能够从筛选孔403喷出的区域附近，其存在一个相近的能量，因此未能喷出的有机蒸汽便会集中落入筛选孔403两侧的区域。通过将回收***50设置在此区域，便可以最大程度的回收有机蒸汽中的有机材料，并可以进一步提纯而再次利用，从而提高有机材料的利用率，节约成本。Since the rate of organic vapor generated by the evaporation source 10 is not completely the same, the rate at which the organic vapor that is energized by the power up system 30 is accelerated after passing through the electric field is also different. The angle at which organic vapors having different rates deflect after passing through the magnetic field must be different. On this basis, only organic vapor corresponding to the position of the screening hole 403 and having a specific energy can be ejected to the surface of the substrate 70, while other organic vapors are deflected to different degrees, wherein the organic vapor with insufficient deflection angle may Attached to the baffle inside the cavity, the organic vapor with excessive deflection angle may re-enter Into the electric field area. Based on this, since the organic vapor is mostly concentrated in the vicinity of the region which can be ejected from the screening hole 403, there is a similar energy, and thus the organic vapor which is not ejected is concentrated in the region on both sides of the screening hole 403. By arranging the recovery system 50 in this area, the organic material in the organic vapor can be recovered to the greatest extent, and can be further purified and reused, thereby improving the utilization rate of the organic material and saving costs.
例如，蒸镀装置还可以包括用于驱动和控制基板70与筛选孔403之间的相对运动的驱动***。For example, the evaporation apparatus may also include a drive system for driving and controlling the relative motion between the substrate 70 and the screening aperture 403.
这里，通过驱动***可以控制基板70的运动速度和方向，以使基板70匀速的经过筛选孔403对应的区域，从而在基板70的表面形成均匀的膜层。Here, the moving speed and direction of the substrate 70 can be controlled by the driving system so that the substrate 70 passes through the corresponding region of the screening hole 403 at a constant speed, thereby forming a uniform film layer on the surface of the substrate 70.
在此基础上，由于整个蒸镀过程中仅需移动基板70以控制基板70与筛选孔403之间的相对运动，即可实现有机材料的蒸镀。因此在蒸发源10的体积一定的情况下，无需设置与基板70面积相同的空间来容纳基板70，从而可以显著的降低蒸镀装置的占用空间。此外，由于基板70位于筛选孔403对应的出口位置处，而非直接设置在蒸发源10的上方，因此还可以有效的降低热辐射。On this basis, since only the substrate 70 needs to be moved during the entire evaporation process to control the relative movement between the substrate 70 and the screening holes 403, vapor deposition of the organic material can be achieved. Therefore, in the case where the volume of the evaporation source 10 is constant, it is not necessary to provide a space equal to the area of the substrate 70 to accommodate the substrate 70, so that the space occupied by the vapor deposition device can be remarkably reduced. In addition, since the substrate 70 is located at the corresponding exit position of the screening hole 403, rather than being disposed directly above the evaporation source 10, heat radiation can also be effectively reduced.
例如，为了提高蒸镀效率以及有机材料的利用率，本发明的实施例中，蒸发源10优选采用线性蒸发源；线性蒸发源可以包括蒸发容器和线性加热源。For example, in order to increase the evaporation efficiency and the utilization of the organic material, in the embodiment of the present invention, the evaporation source 10 preferably employs a linear evaporation source; the linear evaporation source may include an evaporation container and a linear heating source.
这里，所谓线性即蒸发容器在线性加热源提供热能的情况下产生线性的有机蒸汽，从而实现有机材料的线性蒸发。Here, the so-called linear or evaporating container produces linear organic vapor in the case where the linear heating source supplies thermal energy, thereby achieving linear evaporation of the organic material.
例如，蒸发容器可以采用不锈钢材料制作的坩埚，在其内部可以容纳所需的有机材料。线性加热源可以由若干线圈组成，利用设置在蒸发容器外部的交流电源对线圈施加预定频率的交流电压，从而准确地控制加热温度，保证有机材料均匀受热。For example, the evaporation vessel can be made of stainless steel and can contain the desired organic material inside. The linear heating source may be composed of a plurality of coils, and an alternating current voltage of a predetermined frequency is applied to the coil by an alternating current power source disposed outside the evaporation vessel, thereby accurately controlling the heating temperature to ensure uniform heating of the organic material.
在此基础上，蒸镀装置还可以包括位于蒸发源10的出口位置处或者位于筛选孔403的出口位置处的晶振器60。晶振器60用于稳定有机蒸汽的蒸发速率。On this basis, the vapor deposition apparatus may further include a crystal oscillator 60 located at an exit position of the evaporation source 10 or at an exit position of the screening hole 403. The crystal oscillator 60 is used to stabilize the evaporation rate of the organic vapor.
例如，蒸镀装置还可以包括位于蒸发源10和加电***30之间的喷射***20。例如，喷射***20可以包括多个相同的喷嘴。For example, the evaporation apparatus can also include an injection system 20 located between the evaporation source 10 and the power up system 30. For example, the injection system 20 can include a plurality of identical nozzles.
这样，通过在蒸发源10和加电***30之间设置喷射***20，可以使所 形成的有机蒸汽相对稳定集中的进入加电装置30，并且还可以通过调节每个喷嘴的压力以使有机蒸汽匀速的进入加电***30。Thus, by providing the injection system 20 between the evaporation source 10 and the power-up system 30, it is possible to The formed organic vapor enters the power-up device 30 relatively stably, and the organic vapor can also enter the power-up system 30 at a uniform rate by adjusting the pressure of each nozzle.
需要说明的是，本发明实施例中的加电***30可采用如图5所示的加电元件80，当蒸发出的有机气体通过电丝81的时候气体会带电，电丝可选择热电丝，以防止材料在其上凝结。通过加单相电(正或负)使有机蒸汽带一种电荷，其可用于对该蒸镀装置加正电或者负电。如图6所示，为本发明实施例提供的蒸镀装置中加电***中加电元件组合82的一个示例，将加电元件组合，让其整***于蒸发源的上方，这样，便可以给整个蒸发源加电。但本发明实施例中所用的加电***不限于此。只要是能使得有机蒸汽带正电或负电的加电***均可使用。It should be noted that the power-on system 30 in the embodiment of the present invention may adopt the power-on component 80 as shown in FIG. 5. When the evaporated organic gas passes through the wire 81, the gas is charged, and the wire can select the hot wire. To prevent the material from condensing on it. The organic vapor is charged with a charge by adding a single phase (positive or negative) which can be used to positively or negatively charge the vapor deposition unit. As shown in FIG. 6 , an example of the power-on component combination 82 in the power-on system of the vapor deposition device provided by the embodiment of the present invention is that the power-up components are combined so as to be entirely above the evaporation source, so that The entire evaporation source is powered. However, the power-on system used in the embodiment of the present invention is not limited thereto. As long as it is a power-up system that can make the organic vapor positively or negatively charged, it can be used.
本发明的实施例还提供一种基于上述任一蒸镀装置的蒸镀方法，如图4所示，该方法可以包括如下步骤。Embodiments of the present invention also provide an evaporation method based on any of the above vapor deposition devices. As shown in FIG. 4, the method may include the following steps.
S1、加热蒸发源10以使其产生有机蒸汽。S1, the evaporation source 10 is heated to generate organic vapor.
这里，例如可以通过晶振片60来稳定有机蒸汽的速率。Here, for example, the rate of the organic vapor can be stabilized by the crystal piece 60.
S2、通过加电***30使有机蒸汽带电。S2, the organic vapor is charged by the power up system 30.
根据需要，有机蒸汽可以带正电或者带负电。The organic vapor can be positively charged or negatively charged as needed.
S3、通过电磁控制***40控制带电的有机蒸汽的速率和流向，以使进入预定区域并向预定方向运动的有机蒸汽沉积至基板70的表面。S3. Controlling the rate and flow direction of the charged organic vapor by the electromagnetic control system 40 to deposit organic vapor that enters the predetermined region and moves in a predetermined direction onto the surface of the substrate 70.
例如，带电的有机蒸汽可以经过电场方向为第一方向的电场进行加速；加速后的有机蒸汽可以经过磁场方向为第二方向的磁场向第三方向发生偏转；偏转后到达筛选孔403的有机蒸汽从筛选孔403飞出，并沉积至基板70表面。For example, the charged organic vapor can be accelerated by the electric field in the first direction of the electric field; the accelerated organic vapor can be deflected in the third direction by the magnetic field in the second direction of the magnetic field; the organic vapor reaching the screening hole 403 after being deflected The filter holes 403 fly out and are deposited on the surface of the substrate 70.
第一方向为蒸发源10的蒸发方向或蒸发方向的反方向，第二方向与第一方向相互垂直，第三方向与第一方向和第二方向均垂直。The first direction is the evaporation direction of the evaporation source 10 or the opposite direction of the evaporation direction, the second direction is perpendicular to the first direction, and the third direction is perpendicular to both the first direction and the second direction.
需要说明的是，有机蒸汽经过加电之后可以先通过电场进行加速，后通过磁场实现偏转；也可以先通过磁场实现偏转，后通过电场进行加速，这里不做具体限定。It should be noted that after the electric steam is energized, it can be accelerated by the electric field, and then deflected by the magnetic field; or the deflection can be realized by the magnetic field first, and then accelerated by the electric field, which is not specifically limited herein.
通过上述步骤S1-S3，即可实现基于本发明的实施例提供的蒸镀装置的蒸镀方法；由于有机蒸汽的速率和流向具有一定的可控性，这样便可以有效的防止有机蒸汽中的有机材料的四处扩散，从而提高有机材料的利用率。同 时降低有机蒸汽对蒸镀腔室的污染，减少挡板的清洗次数，节约成本。进一步的，在整个蒸镀过程中仅需移动基板70以控制基板70与筛选孔403之间的相对运动，即可实现有机材料的蒸镀，这样可以显著的降低蒸镀装置的占用空间。在此基础上，蒸发源10并未直接面对基板70，这样还可以有效的降低辐射。Through the above steps S1-S3, the evaporation method of the vapor deposition device provided by the embodiment of the present invention can be realized; since the rate and flow direction of the organic vapor have certain controllability, the organic vapor can be effectively prevented. The diffusion of organic materials spreads, thereby increasing the utilization of organic materials. Same When the organic vapor is reduced to the evaporation chamber, the number of cleaning of the baffle is reduced, and the cost is saved. Further, only the substrate 70 needs to be moved during the entire evaporation process to control the relative movement between the substrate 70 and the screening hole 403, so that the evaporation of the organic material can be realized, which can significantly reduce the occupation space of the vapor deposition device. On this basis, the evaporation source 10 does not directly face the substrate 70, which can also effectively reduce the radiation.
通过在蒸镀装置中设置加电***和电磁控制***，可以实现对蒸发源产生的有机蒸汽的速率和流向的控制，从而使得具有特定能量的有机蒸汽沉积在基板表面，形成均匀的膜层。在此基础上，由于有机蒸汽的速率和流向具有一定的可控性，这样便可以提高有机材料的利用率，并能有效的防止因有机蒸汽中的有机材料的四处扩散而引起的腔室污染，从而减少挡板的清洗次数，节约成本。By providing a power-up system and an electromagnetic control system in the vapor deposition apparatus, control of the rate and flow direction of the organic vapor generated by the evaporation source can be achieved, so that organic vapor having a specific energy is deposited on the surface of the substrate to form a uniform film layer. On this basis, since the rate and flow direction of the organic vapor have certain controllability, the utilization rate of the organic material can be improved, and the chamber pollution caused by the diffusion of the organic material in the organic vapor can be effectively prevented. , thereby reducing the number of times the baffle is cleaned and saving costs.
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。The above is only an exemplary embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is defined by the appended claims.
本专利申请要求于2014年9月16日递交的中国专利申请第201410472730.1号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。 The present application claims the priority of the Chinese Patent Application No. 20141047273, filed on Sep. 16, 2014, the entire disclosure of which is hereby incorporated by reference.

Claims (13)

  1. 一种蒸镀装置，其包括：An evaporation device comprising:
    蒸发源，用于提供有机蒸汽；An evaporation source for providing organic steam;
    加电***，用于使所述有机蒸汽带电；以及a power up system for charging the organic vapor;
    电磁控制***，用于控制带电的所述有机蒸汽的速率和流向，并选择进入预定区域并向预定方向运动的所述有机蒸汽沉积至基板表面。An electromagnetic control system for controlling the rate and flow direction of the charged organic vapor, and selecting the organic vapor that enters the predetermined region and moves in a predetermined direction to be deposited on the surface of the substrate.
  2. 根据权利要求1所述的蒸镀装置，其中，所述电磁控制***包括靠近所述加电***一侧的电场区域和远离所述加电***一侧的磁场区域；The vapor deposition device according to claim 1, wherein said electromagnetic control system includes an electric field region on a side close to said power-on system and a magnetic field region on a side away from said power-on system;
    在所述电场区域存在电场方向为第一方向的电场，以使所述有机蒸汽进行加速；An electric field having a direction of electric field in a first direction is present in the electric field region to accelerate the organic vapor;
    在所述磁场区域存在磁场方向为第二方向的磁场，以使所述有机蒸汽向第三方向偏转；a magnetic field having a magnetic field direction in a second direction in the magnetic field region to deflect the organic vapor in a third direction;
    其中，所述第一方向为所述蒸发源的蒸发方向或所述蒸发方向的反方向，所述第二方向与所述第一方向相互垂直，所述第三方向与所述第一方向和所述第二方向均垂直。Wherein the first direction is an evaporation direction of the evaporation source or a reverse direction of the evaporation direction, the second direction is perpendicular to the first direction, and the third direction is opposite to the first direction The second direction is both vertical.
  3. 根据权利要求1或2所述的蒸镀装置，其中，所述电磁控制***还包括对应于所述磁场区域的筛选孔；The vapor deposition device according to claim 1 or 2, wherein the electromagnetic control system further includes a screening hole corresponding to the magnetic field region;
    所述电磁控制***配置来使得进入所述磁场区域的所述有机蒸汽向所述筛选孔所在的一侧偏转。The electromagnetic control system is configured to deflect the organic vapor entering the magnetic field region toward a side on which the screening aperture is located.
  4. 根据权利要求3所述的蒸镀装置，还包括位于所述筛选孔两侧的回收***。The vapor deposition apparatus of claim 3, further comprising a recovery system located on both sides of said screening aperture.
  5. 根据权利要求3或4所述的蒸镀装置，还包括用于驱动和控制所述基板与所述筛选孔之间的相对运动的驱动***。The vapor deposition apparatus according to claim 3 or 4, further comprising a drive system for driving and controlling relative movement between the substrate and the screening hole.
  6. 根据权利要求1至5任一项所述的蒸镀装置，其中，所述蒸发源为线性蒸发源。The vapor deposition device according to any one of claims 1 to 5, wherein the evaporation source is a linear evaporation source.
  7. 根据权利要求6所述的蒸镀装置，其中，所述线性蒸发源包括蒸发容器和线性加热源。The vapor deposition apparatus according to claim 6, wherein the linear evaporation source comprises an evaporation vessel and a linear heating source.
  8. 根据权利要求1至7任一项所述的蒸镀装置，还包括位于所述蒸发源的出口位置处的晶振器。 The vapor deposition device according to any one of claims 1 to 7, further comprising a crystal oscillator located at an exit position of the evaporation source.
  9. 根据权利要求3至5任一项所述的蒸镀装置，还包括位于所述筛选孔的出口位置处的晶振器。The vapor deposition device according to any one of claims 3 to 5, further comprising a crystal oscillator located at an exit position of the screening hole.
  10. 根据权利要求1至9任一项所述的蒸镀装置，还包括位于所述蒸发源和所述加电***之间的喷射***。The vapor deposition apparatus according to any one of claims 1 to 9, further comprising an injection system between the evaporation source and the power application system.
  11. 根据权利要求10所述的蒸镀装置，其中，所述喷射***包括多个相同的喷嘴。The vapor deposition device of claim 10, wherein the injection system comprises a plurality of identical nozzles.
  12. 一种基于权利要求1至11任一项所述的蒸镀装置的蒸镀方法，包括：An evaporation method based on the vapor deposition device according to any one of claims 1 to 11, comprising:
    加热蒸发源以产生有机蒸汽；Heating the evaporation source to produce organic vapor;
    通过加电***使所述有机蒸汽带电；The organic vapor is charged by a power up system;
    通过电磁控制***控制带电的所述有机蒸汽的速率和流向，以使进入预定区域并向预定方向运动的所述有机蒸汽沉积至基板表面。The rate and direction of the charged organic vapor is controlled by an electromagnetic control system to deposit the organic vapor that enters the predetermined region and moves in a predetermined direction to the surface of the substrate.
  13. 根据权利要求12所述的方法，其中，所述通过电磁控制***控制带电的所述有机蒸汽的速率和流向，以使进入预定区域并向预定方向运动的所述有机蒸汽沉积至基板表面包括：The method according to claim 12, wherein said controlling the rate and flow direction of said charged organic vapor by said electromagnetic control system such that said organic vapor entering said predetermined region and moving in a predetermined direction is deposited onto said substrate surface comprises:
    带电的所述有机蒸汽经过电场方向为第一方向的电场进行加速；The charged organic vapor is accelerated by an electric field in a first direction through an electric field direction;
    加速后的所述有机蒸汽经过磁场方向为第二方向的磁场向第三方向发生偏转；The accelerated organic gas is deflected in a third direction by a magnetic field in a second direction through a magnetic field;
    偏转后到达筛选孔的所述有机蒸汽从所述筛选孔飞出，并沉积至基板表面；The organic vapor that reaches the screening hole after being deflected out of the screening hole and deposited on the surface of the substrate;
    所述第一方向为所述蒸发源的蒸发方向或所述蒸发方向的反方向，所述第二方向与所述第一方向相互垂直，所述第三方向与所述第一方向和所述第二方向均垂直。 The first direction is an evaporation direction of the evaporation source or a reverse direction of the evaporation direction, the second direction is perpendicular to the first direction, the third direction is opposite to the first direction The second direction is vertical.
PCT/CN2014/094061 2014-09-16 2014-12-17 Vapour deposition device and vapour deposition method WO2016041279A1 (en)

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