WO2015033931A1 - 溶融ガラス製造方法およびそれを用いた板ガラスの製造方法 - Google Patents

溶融ガラス製造方法およびそれを用いた板ガラスの製造方法 Download PDF

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Publication number
WO2015033931A1
WO2015033931A1 PCT/JP2014/073071 JP2014073071W WO2015033931A1 WO 2015033931 A1 WO2015033931 A1 WO 2015033931A1 JP 2014073071 W JP2014073071 W JP 2014073071W WO 2015033931 A1 WO2015033931 A1 WO 2015033931A1
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Prior art keywords
molten glass
flow
downstream
bubbler
melting tank
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PCT/JP2014/073071
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English (en)
French (fr)
Japanese (ja)
Inventor
亮介 赤木
信 楜澤
豊作 米津
信 吉川
智之 井出
Original Assignee
旭硝子株式会社
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Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to KR1020167005406A priority Critical patent/KR102196157B1/ko
Priority to JP2015535481A priority patent/JP6304256B2/ja
Priority to CN201480049184.9A priority patent/CN105517963B/zh
Publication of WO2015033931A1 publication Critical patent/WO2015033931A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18—Stirring devices; Homogenisation
    • C03B5/193—Stirring devices; Homogenisation using gas, e.g. bubblers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18—Stirring devices; Homogenisation
    • C03B5/183—Stirring devices; Homogenisation using thermal means, e.g. for creating convection currents
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/235—Heating the glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium

Definitions

  • the present invention relates to a molten glass production method and a plate glass production method using the same. More specifically, the present invention relates to a molten glass manufacturing method for producing high-quality non-alkali glass with high homogeneity and a manufacturing method of plate glass using the same.
  • alkali-free glass that does not substantially contain alkali metal ions in order to increase the insulating properties of the glass substrate.
  • alkali-free glass is preferable for the production of a glass substrate for FPD because it has a small coefficient of thermal expansion.
  • the melting furnace described in Patent Document 1 the melting furnace is divided into an upstream zone and a downstream zone by crossing sill, and a molten glass circulation flow (upstream circulation flow, downstream circulation flow) is formed in each zone. , Melting raw materials and homogenizing molten glass. More specifically, the glass raw material is melted by forming an upstream circulation flow in the upstream zone, and the molten glass is homogenized by forming a downstream circulation flow in the downstream zone.
  • a bubbler is provided on the upstream side of the crossing sill in order to control the upstream circulation flow and the downstream circulation flow.
  • the melting furnace (melting tank) described in Patent Document 2 does not have a structure corresponding to the transverse sill in the melting furnace described in Patent Document 1, but includes at least one row of bubblers and at least two opposite burners. It describes using glass to melt and clarify.
  • the melting furnaces described in Patent Documents 1 and 2 are not necessarily suitable for producing high-quality alkali-free glass.
  • T ⁇ As an index of the melting temperature of glass, T ⁇ , that is, a temperature at which the glass viscosity ⁇ becomes 10 2 [dPa ⁇ S] is used, but non-alkali glass has a T ⁇ of 1500 to 1760 ° C. Compared with alkali-containing glass such as lime glass, T ⁇ is 100 ° C. or higher, and homogenization is difficult.
  • the alkali-free glass has a higher T ⁇ than the alkali-containing glass such as soda lime glass, and therefore the temperature of the molten glass in the melting furnace inevitably increases. If the temperature of the molten glass is high, the erosion action of the molten glass on the in-furnace structure is enhanced accordingly. Therefore, in the case of non-alkali glass, there is a step that affects the flow of the molten glass at the bottom of the melting furnace, such as a crossing threshold in the melting furnace described in Patent Document 1 and a fining table in the melting furnace described in Patent Document 2. Then, the erosion of the level
  • the applicant of the present application has proposed a molten glass manufacturing apparatus described in Patent Document 3.
  • a bubbler first and second bubblers 13 and 14
  • the inside of the melting tank 10 can be provided without providing a step structure that affects the molten glass flow as described in Patent Documents 1 and 2 at the bottom of the molten glass channel.
  • the present invention provides a molten glass production method suitable for producing high-quality non-alkali glass with high homogeneity and a plate glass production method using the same in order to solve the above-described problems of the prior art. For the purpose.
  • the present invention is a molten glass production method for producing molten glass using a molten glass production apparatus having a melting tank for melting glass raw materials,
  • the dissolution tank has a burner for heating the upper space of the dissolution tank, In the vicinity of the bottom of the melting tank, there are a plurality of bubblers over the width direction of the molten glass flow path,
  • the distance from the upstream end of the molten glass flow path to the columns of said plurality of bubblers is 0.4 L F ⁇ 0.55 L F
  • the dissolution A method for producing a molten glass characterized in that the molten glass is produced under a condition that the flow of the molten glass in the tank satisfies the following (1) to (3).
  • the present invention also provides a plate glass manufacturing method in which the molten glass obtained by the molten glass manufacturing method of the present invention is formed into a plate glass.
  • the molten glass manufacturing method of the present invention is suitable for producing high-quality non-alkali glass with high homogeneity. Since the plate glass manufacturing method of this invention can manufacture plate glass with high homogeneity and high transparency, it is suitable for manufacture of the board
  • FIG. 1 is a cross-sectional view of an embodiment of a melting tank used in the molten glass production method of the present invention.
  • FIG. 2 is a plan view of the dissolution tank 10A shown in FIG. However, the upper wall surface of the dissolution tank 10A is omitted.
  • FIG. 3 is a cross-sectional view of another embodiment of the melting tank used in the molten glass production method of the present invention.
  • FIG. 4 is a plan view of the dissolution tank 10B shown in FIG. However, the upper wall surface of the dissolution tank 10B is omitted.
  • FIG. 1 is a cross-sectional view of an embodiment of a melting tank used in the molten glass production method of the present invention.
  • FIG. 2 is a plan view of the dissolution tank 10A shown in FIG. However, the upper wall surface of the dissolution tank 10A is omitted.
  • FIG. 3 is a cross-sectional view of another embodiment of the melting tank used in the molten glass production method of the present invention.
  • FIG. 5 is a graph comparing the frequency of occurrence for each number of bubbles in the molten glass when (V 2C ⁇ V 2S ) / V 2C is less than 0.05 and more than 0.5.
  • FIG. 6 is a graph comparing the frequency of occurrence for each number of bubbles in molten glass when (V 2C ⁇ V 2S ) / V 2C is less than 0.1 and greater than 0.5.
  • FIG. 7 is a graph comparing the frequency of occurrence for each number of bubbles in the molten glass when (V 2C ⁇ V 2S ) / V 2C is less than 0.3 and more than 0.5.
  • FIG. 8 is a graph comparing the frequency of occurrence for each number of bubbles in the molten glass when (V 2C ⁇ V 2S ) / V 2C is less than 0.5 and more than 0.5.
  • FIG. 1 is a cross-sectional view of an embodiment of a melting tank used in the molten glass manufacturing method of the present invention
  • FIG. 2 is a plan view of a melting tank 10A shown in FIG.
  • a glass raw material inlet 11 is provided at the upstream end of the melting tank 10A.
  • the glass raw material charged from the charging port 11 is melted by heating by the burner 15 to become molten glass G, and is held in the melting tank 10A.
  • a discharge port 12 for discharging the molten glass G to the next process is provided at the downstream end 10e of the melting tank 10A.
  • the discharge port 12 communicates with the downstream conduit 20.
  • a plurality of bubblers 13 are provided in the vicinity of the bottom surface of the dissolution tank 10A shown in FIGS.
  • the bubbler 13 is arranged at a predetermined interval (pitch) across the width direction of the melting tank 10A, more specifically, the width direction of the molten glass flow path of the melting tank 10A.
  • pitch a predetermined interval across the width direction of the melting tank 10A, more specifically, the width direction of the molten glass flow path of the melting tank 10A.
  • the suitable range of the pitch of each bubbler in the row direction of the bubbler 13 is mentioned later.
  • the burners 15 are provided at equal intervals over the entire length of the dissolution tank 10A.
  • the melting tank 10A shown in FIGS. 1 and 2 affects the molten glass flow as described in Patent Documents 1 and 2 at the bottom of the molten glass flow path by arranging the bubbler 13 in a specific arrangement described later. Without providing a step structure, it is possible to promote the formation of a circulating flow (the upstream circulating flow 100 and the downstream circulating flow 101) of the molten glass G in the melting tank 10.
  • the melting tank 10A shown in FIGS. 1 and 2 does not need to be provided with a step structure in which erosion by molten glass is a problem at the bottom of the molten glass flow path, so that T ⁇ is 1500 to 1760 ° C. It is suitable for the production of alkali-free glass that is 100 ° C.
  • alkali-free glass having a T ⁇ of 1500 to 1760 ° C. include alkali-free glass compositions 1 to 3 in which the mass percentage display based on the oxide has the following composition.
  • Alkali-free glass composition 1 In mass percentage display based on oxide, SiO 2 : 50 to 73% Al 2 O 3 : 10.5-24% B 2 O 3 : 0 to 12% MgO: 0-8% CaO: 0 to 14.5% SrO: 0-24% BaO: 0 to 13.5% MgO + CaO + SrO + BaO: 8 to 29.5% ZrO 2 : 0 to 5% Alkali-free glass containing
  • Alkali-free glass composition 2 In mass percentage display based on oxide, SiO 2 : 58 to 66% Al 2 O 3 : 15-22% B 2 O 3 : 5-12% MgO: 0-8% CaO: 0-9% SrO: 3 to 12.5% BaO: 0-2% MgO + CaO + SrO + BaO: 9-18% Alkali-free glass containing
  • the alkali-free glass composition 2 has a high strain point and is suitable when considering solubility.
  • Alkali-free glass composition 3 In mass percentage display based on oxide, SiO 2 : 54 to 73% Al 2 O 3 : 10.5 to 22.5% B 2 O 3 : 0 to 5.5% MgO: 0-8% CaO: 0-9% SrO: 0-16% BaO: 0 to 2.5% MgO + CaO + SrO + BaO: 8 to 26% Alkali-free glass containing
  • the alkali-free glass composition 3 is particularly suitable when considering a high strain point.
  • Dissolving tank 10A shown in FIGS. 1 and 2 when the length of molten glass flow path of the dissolution tank 10A and L F, the distance from the upstream end of the molten glass flow path, until row of bubblers 13, 0. 4L F to 0.55L F. Therefore, compared with the conventional melting tank (melting furnace) as described in Patent Documents 1 and 2, the length of the melting tank 10A is short, and the length of the part forming the downstream circulation flow in the melting tank is also short. .
  • the length L F of the molten glass flow path of melting tank 10A of this embodiment is different depending on the width W of the molten glass flow path is 10 ⁇ 30 m, preferably 10 ⁇ 25 m, more preferably 15 ⁇ 22m It is. On the other hand, the width W of the molten glass channel is 5 to 10 m, preferably 5.5 to 9 m, and more preferably 6.5 to 8 m.
  • the pitch p between the individual bubblers in the row direction of the bubblers that is, the distance between the individual bubblers in the width direction of the molten glass flow path of the melting tank 10A is 400 to 700 mm. If the pitch p between the individual bubblers is in the above range, it is excellent in the effect of promoting the formation of a circulating flow (upstream circulating flow 100, downstream circulating flow 101) of the molten glass G in the melting tank 10A, and upstream. It is preferable for controlling the flow rate of the side circulation flow 100 and the flow rate of the downstream circulation flow 101 to a specific range described later, and is excellent in terms of manufacturing cost.
  • the pitch p between the individual bubblers is more than 700 mm, the distance between the individual bubblers is too wide, so the molten glass G circulating flow (upstream circulating flow 100, downstream circulating flow 101) in the melting tank 10A
  • the effect of promoting the formation may be insufficient.
  • a difference occurs in the acceleration, and the flow rate of the circulating flow may be uneven, which is not preferable from the viewpoint of homogenizing the molten glass G.
  • the gas 16 supplied from the bubbler 13 that does not adversely affect the components of the melting tank 10A such as the molten glass G and the bubbler 13.
  • a gas that does not contain oxygen, such as nitrogen, helium, and argon, as the gas 16 supplied from the bubbler 13. Of these, nitrogen is particularly preferred.
  • molten glass is manufactured under the conditions that the flow of the molten glass G in the melting tank 10A shown in FIGS. 1 and 2 satisfies the following (1) to (3).
  • V 1C is set in the above range.
  • V 1C can be measured, for example by taking molten glass surface of bubbles and unmelted raw materials in the camera. However, you may measure in the procedure similar to V2C and V2S mentioned later.
  • the measurement position of V 1C in the flow direction of the molten glass in the melting tank 10A is the upstream end of the molten glass flow channel +500 mm.
  • a position of ⁇ 0.35L F is preferred. This is because it is suitable for capturing only the upstream surface flow that moves in the upstream direction of the melting tank 10A near the surface of the molten glass.
  • the measurement position of the V 1C means an arbitrary position within the described range (hereinafter, the same applies in this specification).
  • V 1C can be adjusted by the flow rate of the gas 16 from the bubbler 13. Specifically, increasing the flow rate of the gas 16 from the bubbler 13 increases V 1C , and decreasing the flow rate of the gas 16 decreases V 1C .
  • V 1C can also be adjusted by the ambient temperature T 1 above the bubbler 13. Specifically, when the ambient temperature T 1 above the bubbler 13 is increased, V 1C increases, and when the ambient temperature T 1 is decreased, V 1C decreases.
  • the average flow rate F of the gas 16 from the bubbler 13 is preferably 0.5 to 20 liters / minute, more preferably 0.7 to 5 liters / minute, More preferably, it is 0.9 to 3 liters / minute.
  • the atmospheric temperature T 1 above the bubbler 13 and T 2 described later are preferably 1590 to 1710 ° C., more preferably 1600 to 1695 ° C.
  • Ambient temperatures T 1 herein for example, the nearest burner upstream of the row of bubblers 13, and the nearest burner located further upstream of the burner, measured at the middle position.
  • the ambient temperature T 1 when adjusting V 1C can be adjusted by heating with the burner 15 upstream of the row of bubblers 13. Combustion in the burner 15 can be performed by mixing the fuel with oxygen gas and burning it, or mixing the fuel with oxygen gas and air and burning it. By using these methods, moisture can be contained in the molten glass. In the post-process of the molten glass sent from the melting tank 10A to the downstream conduit 20, when the bubbles in the molten glass are defoamed by vacuum degassing, it is preferable that the molten glass contains moisture. Therefore, the combustion as described above is preferable.
  • (3) When the average flow velocity of the downstream surface layer flow 103 in the vicinity of the side portion in the width direction of the dissolution tank 10A is V 2S ,
  • 0 to 0.5.
  • the side wall of the melting tank 10A is eroded by the molten glass, and its heat insulating action gradually decreases, so the vicinity of the center and the side in the width direction of the melting tank 10A As a result, a temperature difference occurs in the molten glass. Specifically, the temperature of the molten glass near the side portion is lower than that near the center in the width direction of the melting tank 10A. As a result, a flow velocity difference is generated in the downstream surface layer flow 103 between the vicinity of the center in the width direction of the dissolution tank 10A and the vicinity of the side portion.
  • the flow velocity of the downstream surface layer flow 103 near the side portion is lower than that near the center in the width direction of the dissolution tank 10A.
  • the difference in the flow velocity of the downstream surface layer flow 103 between the vicinity of the center in the width direction of the dissolution tank 10A and the vicinity of the side portion becomes large, the quality of the manufactured glass deteriorates.
  • V 2C exceeds 30 m / h
  • the residence time of the molten glass in the melting tank 10A is shortened, so that the quality of the produced glass is deteriorated.
  • it shall be 30 m / h or less.
  • it is 15 m / h or less, More preferably, it is 10 m / h or less.
  • V2C is less than 0.1 m / h, volatilization from the surface of the molten glass increases, and the quality of the glass to be produced decreases.
  • it is 1 m / h or more, More preferably, it is 2 m / h or more.
  • 0 to 0.01.
  • V 2C and V 2S can be measured by continuously capturing a downstream surface layer flow with a camera and using this image. Specifically, a dynamic region is extracted by performing background difference processing on an image captured by a camera, this is subjected to optical flow processing, and further subjected to geometric correction processing to obtain a real space (three-dimensional) speed. Ask for. However, since this numerical value varies to some extent, V 2C and V 2S are obtained as expected values estimated from the distribution of speeds measured in the specified region.
  • the measurement position of V 2C and V 2S in the molten glass channel direction in the melting tank 10A that is, the position where the downstream surface layer flow is photographed by the camera is the position of the molten glass channel.
  • the position is preferably 0.6 L F to L F ⁇ 500 mm from the upstream end. This is because it is suitable for capturing only the downstream surface layer flow that moves in the vicinity of the surface of the molten glass in the downstream direction of the melting tank 10.
  • the measurement position of V 2C in the width direction of the melting tank 10A is 2/5 W to 3/5 W when the width of the molten glass flow path of the melting tank 10A is W (mm).
  • the position is preferably 9/20 W to 11/20 W.
  • the measurement position of V 2S in the width direction of the dissolution tank 10A is preferably a position of 0 to 1 / 4W.
  • 0 indicates the vicinity of the side wall of the dissolution tank 10, specifically, a position within 20 mm from the side wall.
  • the measurement position of V 1C in the width direction of the dissolution tank 10 is preferably a position of 2 / 5W to 3 / 5W, preferably 9 / 20W to A position of 11/20 W is more preferable.
  • the range to capture the image of the downstream surface current is preferably in the following ranges.
  • Flow path direction of molten glass 100 mm to 3000 mm, more preferably 200 mm to 1000 mm, still more preferably 300 mm to 500 mm Dissolving tank 10A width direction: W / 75 to W / 5, more preferably W / 30 to W / 7, and still more preferably W / 16 to W / 14
  • the range in which the upstream surface flow image is captured is the same as described above.
  • range to capture the image of the downstream surface current is preferably in the following ranges.
  • Flow path direction of molten glass 200 mm to 3000 mm, more preferably 300 mm to 1500 mm, still more preferably 400 mm to 900 mm
  • the width direction of the dissolution tank 10 W / 30 to W / 2, more preferably W / 10 to W / 4, still more preferably W / 7 to W / 5
  • the range in which an image of the downstream surface layer flow is captured is a range that does not involve a drastic change in brightness due to the reflection of the frame.
  • V 2C in the condition (2) can be adjusted by the flow rate of the gas 16 from the bubbler 13. Specifically, when the flow rate of the gas 16 from the bubbler 13 is increased, V 2C increases, and when the flow rate of the gas 16 is decreased, V 2C decreases. V 2C can also be adjusted by the ambient temperature T 2 above the bubbler 13. Specifically, the higher the upper atmospheric temperature T 2 of the bubbler 13, an increase in V 2C, the lower the ambient temperature T 2, V 2C is reduced.
  • Ambient temperature T 2 in regulating V 2C includes a row of bubblers 13, and the nearest burner downstream from said bubbler, measured at an intermediate position.
  • the atmospheric temperature T 2 when adjusting V 2C can be adjusted by heating by the burner 15 on the downstream side of the row of bubblers 13.
  • the combustion in the burner 15 is as described above.
  • V 2C and V 2S in the condition (3) can be adjusted by heating with the burner 15 on the downstream side of the row of bubblers 13.
  • the difference between V 2C and V 2S is caused by a temperature difference in the molten glass between the center in the width direction of the melting tank 10A and the vicinity of the side, specifically, melting. This is because the temperature of the molten glass near the side portion is lower than that near the center in the width direction of the tank 10A.
  • the temperature of the molten glass near the side is increased by heating by the burner 15 on the downstream side of the row of bubblers 13, and the temperature difference between the molten glass near the center and the side in the width direction of the melting tank 10A. Can be reduced. As a result, the difference between V 2C and V 2S decreases, and the value of
  • V 2C and V 2S in the condition (3) can be adjusted by the flow rate of the gas 16 from the bubbler 13. Specifically, by increasing the flow rate of the gas 16 from the bubbler 13 near the side relative to the flow rate of the gas 16 from the bubbler 13 near the center in the width direction of the dissolution tank 10A, V 2C and V 2S And the value of
  • FIG. 3 is a cross-sectional view of another embodiment of the melting tank used in the molten glass production method of the present invention
  • FIG. 4 is a plan view of the melting tank shown in FIG.
  • a plurality of first bubblers 13A having different positions in the molten glass flow path direction of the dissolution tank 10B, and A plurality of second bubblers 13B are provided.
  • the first bubbler 13A is provided on the upstream side of the molten glass flow path with respect to the second bubbler 13B, and a predetermined distance is provided between the first bubbler 13A row and the second bubbler 13B row. Is provided. Note that the pitches of the individual bubblers in the row direction of the first bubbler 13A and the second bubbler 13B are the same as those described for the bubbler 13 of the dissolution tank 10A. A preferable range of the distance between the first bubbler 13A row and the second bubbler 13B row will be described later.
  • burners 15 are arranged on both sides of the melting tank 10B so as to be positioned above the molten glass G held in the melting tank 10B.
  • the burners 15 are provided at regular intervals throughout the entire length of the dissolution tank 10B, except for exceptions described later.
  • the melting tank 10B shown in FIGS. 3 and 4 is described in Patent Documents 1 and 2 at the bottom of the molten glass flow path by arranging the first and second bubblers 13A and 13B and the burner 15 in a specific arrangement described later.
  • the formation of a circulating flow of the molten glass G (upstream circulating flow 100, downstream circulating flow 101) in the melting tank 10B can be promoted without providing a step structure that affects the molten glass flow. It is better in terms.
  • T ⁇ is 1500 to 1760 ° C., which is suitable for the production of alkali-free glass that is 100 ° C. or higher compared to alkali-containing glass such as soda lime glass.
  • Dissolving tank 10B shown in FIGS. 3 and 4 when the length of molten glass flow path of the dissolution tank 10B and L F, the distance from the upstream end of the molten glass flow path to the row of first bubbler 13A, a 0.4L F ⁇ 0.5L F, the distance from the downstream end of the molten glass flow path to the row of the second bubblers 13B is 0.45L F ⁇ 0.55L F. Therefore, similarly to the dissolution tank 10A, the length of the dissolution tank 10B is shorter than the conventional dissolution tank (melting furnace) as described in Patent Documents 1 and 2, and the downstream circulating flow in the dissolution tank is reduced. The length of the site to be formed is also short.
  • the distance from the upstream end of the molten glass channel to the row of the first bubblers 13A is preferably 0.43L F to 0.46L F.
  • the distance from the downstream end to the row of second bubblers 13B is preferably 0.47L F to 0.54L F.
  • L P is 500 to 1000 mm.
  • L P satisfies the above range, it is excellent in the effect of promoting the formation of the circulating flow (upstream circulating flow 100, downstream circulating flow 101) of the molten glass G in the melting tank 10B, and upstream.
  • the flow velocity of the side circulation flow 100 and the flow velocity of the downstream circulation flow 101 can be controlled within a specific range described later.
  • L P is less than 500 mm, the distance between the row of the first bubblers 13A and the row of the second bubblers 13B is too close, so that the circulating flow of the molten glass G in the melting tank 10B (upstream circulating flow 100 In addition, the effect of promoting the formation of the downstream circulation flow 101) is poor, and it is difficult to control the flow rate of the upstream circulation flow 100 and the flow rate of the downstream circulation flow 101 to a specific range described later.
  • L P is preferably 600 to 800 mm.
  • the pitch p between individual bubblers in the row direction of the bubblers is the same as that described for the bubbler 13 of the dissolution tank 10A.
  • the first bubbler 13 ⁇ / b> A and the second bubbler 13 ⁇ / b> B are arranged so as not to be coaxial with respect to the flow direction of the molten glass in the melting tank 10 ⁇ / b> B shown in FIGS.
  • the first bubbler 13A and the second bubbler 13B are arranged in a staggered manner, and the protruding port of the first bubbler 13A and the protruding port of the second bubbler 13B are coaxial. Does not exist above.
  • gases 16A and 16B supplied from the first bubbler 13A and the second bubbler 13B are the same as described for the gas 16 supplied from the bubbler 13 of the dissolution tank 10A.
  • Burners 15 are provided at equal intervals over the entire length of the dissolution tank 10B on both sides of the dissolution tank 10B shown in FIGS. However, the burner 15 is not provided above the second bubbler 13B. This is to be lower than the ambient temperature T 1 of the upper atmosphere temperature T 2 above the second bubbler 13B first bubbler 13A. Thereby, the flow rate per unit time of the downstream circulation flow 101 can be made lower than that of the upstream circulation flow 100. This is because the flow rate per unit time is lower in the downstream circulation flow 101 for the purpose of homogenizing the molten glass than in the upstream circulation flow 100 for the purpose of melting and clarifying the glass raw material. It is because it is preferable.
  • the melt in the melting tank 10B The distance L B1 between the row of first bubblers 13A and the burner 15 closest to the upstream side of the row in the glass flow path direction, and the burner 15 nearest to the row of second bubblers 13B and the downstream side of the row It is necessary that the distance L B2 to be in a relationship of L B2 > L B1 . That is, the burner 15 is provided above the first bubbler 13A, whereas the burner 15 is not provided above the second bubbler 13B.
  • L B2 ⁇ L B1 ⁇ 300 mm is preferable, L B2 ⁇ L B1 ⁇ 500 mm is more preferable, and L B2 ⁇ L B1 ⁇ 800 mm is further preferable.
  • the burner 15 is provided above the row of the first bubblers 13A.
  • the nearest burner 15 may be arranged some distance away from the upstream side of the row.
  • the ambient temperature above the first bubbler 13A becomes too low and the upstream circulation flow 100 becomes weak, and the glass Problems such as insufficient melting of the raw materials and insufficient homogenization of the molten glass G in the downstream region of the melting tank 10 occur.
  • L B1 500 to 1500 mm is preferable.
  • molten glass is manufactured under the condition that the flow of the molten glass G in the melting tank 10B shown in FIGS. 3 and 4 satisfies the following (1) to (3).
  • V 1C is set in the above range to suppress the advance of a heterogeneous layer (scum layer) having a light specific gravity caused by undissolved material in the glass raw material or volatilization on the surface of the molten glass, and to promote homogenization of the molten glass. It is. About the measuring method of V1C and a measurement position, it is the same as having described about 10 A of dissolution tanks.
  • V 1C can be adjusted by the flow rate of the gas 16A from the first bubbler 13A. Specifically, when the flow rate of the gas 16A from the first bubbler 13A is increased, V 1C increases, and when the flow rate of the gas 16A is decreased, V 1C decreases. V 1C can also be adjusted by the ambient temperature T 1 above the first bubbler 13A. Specifically, the higher the ambient temperature T 1 of the upper first bubbler 13A, increased V 1C, the lower the ambient temperatures T 1, V 1C is reduced.
  • the average flow rate F 1 of the gas 16A from the first bubbler 13A is 0.5 to 20 l / min, is from 0.7 to 5 l / min Is more preferably 0.9 to 3 liters / minute.
  • the atmospheric temperature T 1 above the first bubbler 13A is preferably 1590 to 1710 ° C., more preferably 1600 to 1695 ° C.
  • the ambient temperature T 1 in this specification is measured at an intermediate position between, for example, the burner closest to the upstream side of the row of the first bubblers 13A and the burner closest to the upstream side of the burner. .
  • a specific measurement method is as described for the atmospheric temperature T 1 of the melting tank 10A.
  • Ambient temperatures T 1 may be adjusted by heating by the upstream side of the burner 15 than the row of the first bubbler 13A.
  • the combustion in the burner 15 is the same as that described for the dissolution tank 10A.
  • Condition (2) Of the downstream circulating flow 101 of the molten glass formed on the downstream side of the second bubbler 13B, the flow in the vicinity of the surface of the molten glass moving in the downstream direction of the melting tank 10B is the downstream side of the molten glass.
  • V 2C 0.1 to 30 m / h.
  • V 2S 0 to 0.5.
  • V 2C exceeds 30 m / h
  • the residence time of the molten glass in the melting tank 10B is shortened, so that the quality of the produced glass is deteriorated.
  • it shall be 30 m / h or less.
  • it is 15 m / h or less, More preferably, it is 10 m / h or less.
  • V2C is less than 0.1 m / h, volatilization from the surface of the molten glass increases, and the quality of the glass to be produced decreases.
  • it is 1 m / h or more, More preferably, it is 2 m / h or more.
  • V 2C in the condition (2) can be adjusted by the flow rate of the gas 16B from the second bubbler 13B. Specifically, when the flow rate of the gas 16B from the second bubbler 13B is increased, V 2C increases, and when the flow rate of the gas 16B is decreased, V 2C decreases. V 2C can also be adjusted by the ambient temperature T 2 above the second bubbler 13B. Specifically, the higher the upper atmospheric temperature T 2 of the second bubbler 13B, increased V 2C, the lower the ambient temperature T 2, V 2C is reduced.
  • the average flow rate F 2 of the gas 16B from the second bubbler 13B is preferably 0.3 to 19.8 liters / minute, preferably 0.4 to 4.8 liters / minute. More preferably, it is 0.5 to 2 liters / minute.
  • ambient temperature T 2 above the second bubbler 13B is 1590 ⁇ 1710 ° C., and more preferably 1600 ⁇ 1695 ° C..
  • Ambient temperature T 2 in the present specification for example, a column of the second bubbler 13B, the nearest burner downstream from said bubbler, measured at an intermediate position.
  • Ambient temperature T 2 can be adjusted by heating by a burner 15 on the downstream side of the row of the second bubblers 13B.
  • the combustion in the burner 15 is as described above.
  • V 2C and V 2S in condition (3) can be adjusted by heating by the burner 15 on the downstream side of the second bubbler 13B row. Specifically, the temperature of the molten glass near the side is raised by heating by the burner 15 downstream from the row of second bubblers 13B, and the vicinity of the center in the width direction of the melting tank 10B and the vicinity of the side The temperature difference of the molten glass can be reduced. As a result, the difference between V 2C and V 2S decreases, and the value of
  • V 2C and V 2S in the condition (3) can be adjusted by the flow rate of the gas 16B from the second bubbler 13B. Specifically, by increasing the flow rate of the gas 16B from the second bubbler 13B near the side portion relative to the flow rate of the gas 16B from the second bubbler 13B near the center in the width direction of the dissolution tank 10B, The difference between V 2C and V 2S decreases, and the value of
  • the constituent material of the melting tanks 10A and 10B that contact the molten glass G is required to be excellent in heat resistance and corrosion resistance to the molten glass, and thus a refractory brick containing ZrO 2 is used.
  • a refractory brick containing ZrO 2 is used.
  • the portion of 0.1L F to 0.3L F upstream from the row of the bubblers 13 and the first bubblers 13A has a ZrO 2 content of 85% or more and 97% by mass.
  • each hot-melt refractory is preferably 50 to 120 mm, and two to three hot-melt refractories are preferably laminated. Further, 2 to 5 layers of other refractory bricks containing ZrO 2 can be laminated on the outside of the layer of the hot-melt refractory thus formed.
  • each refractory brick can be laminated
  • the plate glass manufacturing method of the present invention the molten glass obtained by the above-described molten glass manufacturing method of the present invention is formed into a plate glass.
  • various forming methods such as a float method and a downdraw method can be used. In the case of a glass having a T ⁇ of 1500 to 1760 ° C., the float method is particularly preferable.
  • bubbles in the molten glass may be degassed by vacuum degassing.
  • the plate glass manufacturing method of the present invention since the molten glass having high homogeneity obtained by the molten glass manufacturing method of the present invention is formed into a plate glass, a plate glass having high homogeneity and high transparency can be obtained.
  • the plate glass production apparatus of the present invention can be applied to the production of plate glass for various uses. However, since a plate glass having high homogeneity and high transparency can be obtained, the homogeneity of the glass substrate for FPD can be obtained. It is particularly preferable to apply it to the production of plate glass for applications in which the demands of these are extremely strict.
  • Glass raw materials are introduced into the inlet of the melting tank 10B shown in FIGS. 3 and 4 so as to have a desired composition, and alkali-free glass having T ⁇ of 1500 to 1760 ° C. is manufactured.
  • the dimensions of each part of the dissolution tank 10B shown in FIGS. 3 and 4 are as follows.
  • Molten glass flow path length L F 16 to 25 m Molten glass channel width: 5.5-9m Distance from the upstream end of the molten glass flow path to the first bubbler 13A row: 0.43L F to 0.46L F Distance from the downstream end of the molten glass flow path to the row of second bubblers 13B: 0.47L F to 0.54L F Distance L P between first row of bubblers 13A and second row of bubblers 13B: 600 to 800 mm Pitch p of individual bubblers 13A and 13B in the row direction of the bubblers: 400 to 700 mm Distance L B1 between the row of first bubblers 13A and the burner 15 closest to the upstream side of the row in the flow direction of the molten glass in the melting tank: 500 to 1500 mm Distance L B2 between the row of second bubblers 13B and the burner 15 closest to the downstream side of the row in the flow direction of the molten glass in the melting tank: 1000 to 2000 mm L B2 -L B1 ⁇ 500mm Distance between individual burners in the flow direction of the
  • V 2C average flow velocity V 2C of the downstream surface layer flow near the center in the width direction of the dissolution tank
  • V 2C 0.1 to 30 m / h.
  • the horizontal axis of FIG. 5 is an index when the predetermined number of bubbles in the molten glass is 1, and the vertical axis is the ratio of the number of measurement data.
  • the number of bubbles in the molten glass is from a drain pipe (not shown) connected in the vertical direction with respect to the conduit 20 communicating with the discharge port 12 provided at the downstream end portion 10e of the melting tank 10.
  • the molten glass under flow was collected as a sample and measured. Specifically: The molten glass was imaged intermittently at a predetermined imaging interval (35 msec) with an inspection device equipped with an electronic camera, and the captured image was binarized to detect a bubble image in the molten glass as a white image.
  • the number of white images, which are defect images, is counted as the number of defects by a calculation unit built in the inspection apparatus. Further, by calculating the amount of movement of bubbles and calculating the flow rate per unit time flowing down from the drain pipe, the number of bubbles was calculated as the number per unit molten glass flowing down. Also, when (V 2C ⁇ V 2S ) / V 2C ⁇ 0.1 and (V 2C ⁇ V 2S ) / V 2C >0.5; (V 2C ⁇ V 2S ) / V 2C ⁇ 0.

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PCT/JP2014/073071 2013-09-06 2014-09-02 溶融ガラス製造方法およびそれを用いた板ガラスの製造方法 WO2015033931A1 (ja)

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JP2015535481A JP6304256B2 (ja) 2013-09-06 2014-09-02 溶融ガラス製造方法およびそれを用いた板ガラスの製造方法
CN201480049184.9A CN105517963B (zh) 2013-09-06 2014-09-02 熔融玻璃制造方法和使用该制造方法的平板玻璃的制造方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230082577A (ko) 2021-12-01 2023-06-08 에이지씨 가부시키가이샤 유리 제조 방법, 가열량 분포 결정 장치, 가열 모델 생성 방법, 가열 모델 생성 장치, 및 프로그램이 저장된 컴퓨터로 읽을 수 있는 기록 매체

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11613487B2 (en) * 2017-09-13 2023-03-28 Nippon Electric Glass Co., Ltd. Method for producing glass article

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218715A (en) * 1975-08-04 1977-02-12 Nippon Electric Glass Co Method of homogenizing glass
WO2011036939A1 (ja) * 2009-09-24 2011-03-31 旭硝子株式会社 溶融ガラス製造装置、溶融ガラス製造方法およびそれらを用いた板ガラスの製造方法
WO2013094313A1 (ja) * 2011-12-19 2013-06-27 旭硝子株式会社 溶融ガラス製造装置、溶融ガラス製造方法およびそれらを用いた板ガラスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375760A (ko) * 1972-06-05 1974-11-27
DE4327237C1 (de) 1993-08-13 1994-08-25 Sorg Gmbh & Co Kg Verfahren zum Schmelzen von Glas in einem Wannenofen und Wannenofen hierfür
FR2737487B1 (fr) 1995-08-03 1998-01-09 Saint Gobain Vitrage Dispositif pour la fusion de matieres vitrifiables
EP2310545B1 (en) 2008-07-31 2013-10-23 The Secretary of State for Defence Super bainite steels and methods of manufacture thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218715A (en) * 1975-08-04 1977-02-12 Nippon Electric Glass Co Method of homogenizing glass
WO2011036939A1 (ja) * 2009-09-24 2011-03-31 旭硝子株式会社 溶融ガラス製造装置、溶融ガラス製造方法およびそれらを用いた板ガラスの製造方法
WO2013094313A1 (ja) * 2011-12-19 2013-06-27 旭硝子株式会社 溶融ガラス製造装置、溶融ガラス製造方法およびそれらを用いた板ガラスの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230082577A (ko) 2021-12-01 2023-06-08 에이지씨 가부시키가이샤 유리 제조 방법, 가열량 분포 결정 장치, 가열 모델 생성 방법, 가열 모델 생성 장치, 및 프로그램이 저장된 컴퓨터로 읽을 수 있는 기록 매체

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