WO2014017448A1 - 積層体 - Google Patents
積層体 Download PDFInfo
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- WO2014017448A1 WO2014017448A1 PCT/JP2013/069829 JP2013069829W WO2014017448A1 WO 2014017448 A1 WO2014017448 A1 WO 2014017448A1 JP 2013069829 W JP2013069829 W JP 2013069829W WO 2014017448 A1 WO2014017448 A1 WO 2014017448A1
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- Prior art keywords
- layer
- silver
- light absorption
- thickness
- laminate
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2419/00—Buildings or parts thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12542—More than one such component
- Y10T428/12549—Adjacent to each other
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the present invention relates to a laminate in which a laminate film having at least a silver layer and a light absorption layer is formed on a transparent substrate.
- the silver layer has a transparent color, a neutral color (neutral color) and a low resistivity in the visible range.
- a silver layer having a geometric thickness of about 10 nm has little absorption in the visible range, and its reflectance is several tens of percent. The reflectance increases as the wavelength becomes longer, and shows a high reflectance in the infrared region.
- a silver multilayer film with a silver layer sandwiched between dielectric layers with low reflectivity in the visible region and high reflectivity in the infrared region shows the same appearance as general glass, and exhibits low emissivity and high heat ray reflectivity. Therefore, it is used for high heat insulation Low-E glass and high transmittance heat ray reflective glass. In recent years, the demand for these glasses has increased with the increasing awareness of energy conservation. Moreover, since it is low resistance, it can also be used as a transparent conductive film.
- Tempered glass may be used for Low-E glass, for example, window glass for buildings. Further, bent glass is used for the window glass for automobiles. Both tempered glass and bent glass are heat-treated at a temperature of 550 ° C. to 750 ° C.
- the first method is a method of forming a film on tempered glass or bent glass.
- the second method is a method in which a film is formed on a large-sized flat glass, cut into a product-sized glass plate, and then subjected to heat treatment for strengthening or bending.
- a Low-E glass or the like one that uses a light absorption layer in combination with a silver layer is known in order to reduce the transmittance and improve the heat ray shielding characteristics.
- a thing using a light absorption layer together with a silver layer for example, providing a light absorption layer directly on a silver layer (for example, refer to patent documents 2 or patent documents 3).
- a light absorption layer when used together with a silver layer, it is not easy to maintain desired optical characteristics and the like when heat treatment is performed, for example, transmittance, reflectance, color tone of transmitted light and reflected light, etc. It is easy to deviate from the predetermined range, and haze and the like are likely to occur.
- a light absorption layer is provided immediately above the silver layer disclosed in Patent Document 2
- the silver layer and the metal layer that is the light absorption layer are alloyed during the heat treatment, so that there are visible defects or unevenness. May occur.
- An object of the present invention is to use a light absorption layer together with a silver layer, and an object of the present invention is to provide a laminate in which changes in optical properties and haze generation due to heat treatment are suppressed.
- the laminate of the present invention has a transparent substrate and a laminated film provided on the transparent substrate.
- the laminated film includes, in order from the transparent substrate side, a layer formed by contacting two layers of a first dielectric layer and a silver layer in this order, a light absorption layer, a first barrier layer, and a second layer.
- the dielectric layer includes three layers formed in contact with each other in this order.
- a change in optical characteristics and a change in appearance due to heat treatment can be suppressed by providing predetermined constituent layers in a predetermined order.
- Sectional drawing which shows one Embodiment of the laminated body of this invention.
- the partial cross section figure which shows one Embodiment of the multilayer glass using the laminated body of this invention.
- FIG. 1 is a cross-sectional view showing an embodiment of a laminate.
- the laminate 10 has a laminate film 12 on a transparent substrate 11.
- the laminated film 12 includes, in order from the transparent substrate 11 side, a first dielectric layer 13, a silver layer 14, a second barrier layer 15, a light absorption layer 16, a first barrier layer 17, and a second dielectric layer. It has a body layer 18.
- the second dielectric layer 18 includes a lower dielectric layer 181 and an upper dielectric layer 182 in order from the transparent substrate 11 side.
- the laminated film 12 includes, in order from the transparent substrate 11 side, a layer formed by contacting two layers of the first dielectric layer 13 and the silver layer 14 in this order, a light absorption layer 16, and a first barrier layer 17. , And three layers of the second dielectric layer 18 are formed at least in contact with each other in this order. That is, the first dielectric layer 13 and the silver layer 14 are formed in contact with each other. Further, the light absorption layer 16 and the first barrier layer 17 are formed in contact with each other, and the first barrier layer 17 and the second dielectric layer 18 are formed in contact with each other. With such a configuration, it is possible to suppress changes in optical characteristics and appearance due to heat treatment.
- positioned between the silver layer 14 and the light absorption layer 16 may be provided as needed, and does not need to be provided.
- the silver layer 14 and the second barrier layer 15 are formed in contact with each other, and the second barrier layer 15 and the light absorption layer 16 are formed in contact with each other. It is preferable.
- the second barrier layer 15 is not provided, for example, the film is formed so that the silver layer 14 and the light absorption layer 16 are in contact with each other.
- the light absorption layer means a layer having absorption in the visible light region.
- the barrier layer is a layer that suppresses deterioration of the silver layer or the like due to oxidation by oxidation of a part or all of itself during film formation or heat treatment, or a silver layer and other metal layers. It means the layer which suppresses reaction with.
- the transparent substrate 11 is not particularly limited.
- a glass plate having an inorganic transparency such as a window glass for buildings, a commonly used float glass, or soda lime glass produced by a roll-out method.
- the glass plate can be used with colorless glass such as clear glass and high transmission glass, green such as heat-absorbing glass, and other colored ones. Colorless glass such as transmission glass is preferred.
- Various tempered glasses such as air-cooled tempered glass and chemically tempered glass can also be used.
- various glasses such as borosilicate glass, low expansion glass, zero expansion glass, low expansion crystallized glass, and zero expansion crystallized glass can be used.
- the geometric thickness of the transparent substrate 11 is not necessarily limited, but is preferably 1 to 20 mm, for example.
- the first dielectric layer 13 is provided in order to adjust the reflectance and transmittance in the visible region by the interference effect with the silver layer 14 or the like, so that the optical characteristics of the laminate 10 become desired optical characteristics.
- the first dielectric layer 13 preferably has a refractive index of 1.7 to 2.5, more preferably 1.8 to 2.2, and preferably 1.9 to 2.1. Further preferred. By setting such a refractive index, it is easy to adjust the reflectance and transmittance in the visible region by the interference effect with the silver layer 14 and the like, and to make the optical characteristics of the laminate 10 desired optical characteristics. Become.
- the refractive index means the refractive index at a wavelength of 550 nm.
- the constituent material of the first dielectric layer 13 is not particularly limited as long as the refractive index can be obtained, and various metal oxides and metal nitrides can be used.
- the metal oxide include those containing as a main component an oxide of at least one metal selected from the group consisting of zinc, tin, niobium, and titanium.
- a metal nitride what has as a main component the nitride of the at least 1 sort (s) of metal chosen from silicon and aluminum is mentioned.
- zinc oxide doped with aluminum and zinc oxide doped with tin are particularly preferable.
- the zinc oxide doped with aluminum is preferably such that the ratio of aluminum to the total amount of zinc and aluminum is 1 to 10 atomic%, more preferably 3 to 7 atomic%.
- the zinc oxide doped with tin is preferably one in which the ratio of tin to the total amount of zinc and tin is 10 to 80% by mass, more preferably 20 to 80% by mass.
- the first dielectric layer 13 may be a single layer as shown, or may be a plurality of layers although not shown.
- zinc oxide doped with aluminum is preferable.
- the zinc oxide doped with aluminum is preferably such that the ratio of aluminum to the total amount of zinc and aluminum is 1 to 10 atomic%, more preferably 3 to 7 atomic%.
- the layer disposed at the position closest to the silver layer 14 is preferably zinc oxide doped with aluminum.
- the zinc oxide doped with aluminum is preferably such that the ratio of aluminum to the total amount of zinc and aluminum is 1 to 10 atomic%, more preferably 3 to 7 atomic%.
- the layers other than the layer disposed closest to the silver layer 14 are not necessarily limited, but zinc oxide doped with tin is preferable.
- the tin-doped zinc oxide preferably has a tin ratio of 10 to 90% by mass, more preferably 20 to 80% by mass with respect to the total amount of zinc and tin.
- the geometric thickness of the first dielectric layer 13 is preferably 25 to 50 nm, more preferably 25 to 45 nm, and further preferably 25 to 40 nm as the total thickness of the first dielectric layer 13.
- the silver layer 14 is composed mainly of silver and is composed of only silver or a silver alloy containing a metal element such as palladium.
- the content of metal elements other than silver is preferably 10% by mass or less, more preferably 5% by mass or less, and still more preferably 3% by mass or less in the entire silver alloy. It is preferable that the silver layer 14 consists essentially of silver.
- the geometric thickness of the silver layer 14 is preferably 5 to 25 nm, more preferably 7 to 20 nm, and even more preferably 9 to 17 nm. By making the geometrical thickness of the silver layer 14 relatively large, it is easy to improve the heat ray shielding characteristics by reducing the transmittance and to make the optical characteristics of the laminate 10 desired optical characteristics. .
- the second barrier layer 15 is not necessarily an essential component, and can be appropriately provided according to the constituent material of the light absorption layer 16 and the like.
- the second barrier layer 15 is provided to suppress oxidation or the like of the silver layer 14 and to prevent the silver layer 14 and the light absorption layer 16 from reacting during heat treatment. That is, when another layer such as the second dielectric layer 18 is formed on the silver layer 14 or when heat treatment for post-strengthening or post-bending treatment, the silver layer 14 may be oxidized. In addition, the silver layer 14 and the absorption layer 16 may react.
- the constituent material of the second barrier layer 15 is not particularly limited as long as the oxidation of the silver layer 14 and the like can be effectively suppressed, and various metals and metal nitrides can be used.
- the metal is at least one selected from the group consisting of titanium, zirconium, hafnium, chromium, molybdenum, tungsten, vanadium, niobium, tantalum, zinc, nickel, palladium, platinum, aluminum, indium, tin, and silicon.
- the thing which has a metal as a main component is mentioned.
- the metal nitride include those containing a nitride of these metals as a main component. It is preferable to use these as constituent materials because sufficient antioxidant performance and the like can be obtained.
- titanium, zinc, tin, or a zinc tin alloy is particularly preferable.
- the zinc-tin alloy for example, an alloy having a tin ratio of 10 to 90% by mass with respect to the total amount of zinc and tin is preferable, and an alloy having 20 to 80% by mass is more preferable.
- the geometric thickness is preferably 1 to 10 nm, and more preferably 1 to 5 nm.
- the geometric thickness of the second barrier layer 15 is preferably 1 to 10 nm, and more preferably 1 to 5 nm.
- the second barrier layer 15 is basically formed as a metal film or a metal nitride film, but when another layer is subsequently formed in an oxidizing atmosphere, or after strengthening or after bending. In the case of heat treatment for treatment, part of the film or the whole film may be oxidized to be changed into a metal oxide film. For this reason, the second barrier layer 15 does not necessarily exist as a metal film or a metal nitride film in the state of the laminated body 10 or in a state after the heat treatment for the post-strengthening or post-bending treatment. .
- the light absorption layer 16 is provided to assist absorption of visible light and reduce visible light transmittance and the like.
- a known light absorption layer can be applied.
- the constituent material of the light absorption layer 16 include a metal, metal oxide, or metal nitride that absorbs light in the visible region.
- a nickel chromium alloy and a nickel aluminum alloy are preferable.
- a nickel aluminum alloy is particularly preferable, and the ratio of nickel to the total amount of nickel and aluminum is preferably 50 to 90% by mass, and more preferably 60 to 80% by mass.
- the light absorption layer 16 is made of metal, in particular, when it is made of a nickel aluminum alloy, it is preferable to provide the second barrier layer 15 between the silver layer 14 and the light absorption layer 16.
- the second barrier layer 15 By providing the second barrier layer 15, the oxidation of the silver layer 14 can be suppressed, or the reaction between the silver layer 14 and the light absorption layer 16 can be prevented, so that a decrease in optical characteristics can be suppressed.
- the second barrier layer 15 is interposed between the silver layer 14 and the light absorption layer 16.
- the second barrier layer 15 is not necessarily provided. By not providing the 2nd barrier layer 15, it becomes easy to make the optical characteristic of the laminated body 10 into a desired optical characteristic.
- the geometric thickness of the light absorption layer 16 is preferably 1 to 10 nm. By setting the thickness to 1 nm or more, visible light transmittance and the like can be effectively reduced by assisting absorption of visible light. By setting the thickness to 10 nm or less, excessive absorption of visible light can be suppressed, and the optical characteristics of the laminate 10 can be easily set to desired optical characteristics.
- the geometric thickness of the light absorption layer 16 is preferably 1 to 9 nm, more preferably 1 to 8 nm, and further preferably 1 to 5 nm.
- the first barrier layer 17 is an indispensable structure and is provided in order to suppress oxidation and the like of the silver layer 14 and the light absorption layer 16. That is, when another layer such as the second dielectric layer 18 is formed on the silver layer 14 and the light absorption layer 16, or during heat treatment for post-strengthening or post-bending treatment, the silver layer 14 and the light Although the absorption layer 16 may be oxidized, by providing the first barrier layer 17, the oxidation of the silver layer 14 and the light absorption layer 16 is suppressed, and the optical characteristics of the stacked body 10 are set to desired optical characteristics. It becomes easy.
- the constituent material of the first barrier layer 17 is not particularly limited as long as it can effectively suppress the oxidation of the silver layer 14 and the light absorption layer 16, and various metals and metal nitrides are exemplified.
- the metal is at least one selected from the group consisting of titanium, zirconium, hafnium, chromium, molybdenum, tungsten, vanadium, niobium, tantalum, zinc, nickel, palladium, platinum, aluminum, indium, tin, and silicon.
- the thing which has a metal as a main component is mentioned.
- the metal nitride include those containing a nitride of these metals as a main component. It is preferable to use these as constituent materials because sufficient antioxidant performance can be obtained.
- titanium, zinc, tin, or a zinc tin alloy is particularly preferable.
- the zinc-tin alloy for example, an alloy having a tin ratio of 10 to 90% by mass with respect to the total amount of zinc and tin is preferable, and an alloy having 20 to 80% by mass is more preferable.
- the geometric thickness of the first barrier layer 17 is preferably 1 to 10 nm, and more preferably 1 to 5 nm. Sufficient antioxidant performance can be obtained by setting the geometric thickness of the first barrier layer 17 to 1 nm or more. Moreover, the fall of the original optical characteristic of the laminated body 10 can be suppressed because it shall be 10 nm or less.
- the first barrier layer 17 is basically formed as a metal film or a metal nitride film. However, when another layer is subsequently formed in an oxidizing atmosphere, or after strengthening or after bending. In the case of heat treatment for treatment, part of the film or the whole film may be oxidized to be changed into a metal oxide film. For this reason, the first barrier layer 17 does not necessarily exist as a metal film or a metal nitride film in the state of the laminated body 10 or in a state after the heat treatment for the post-strengthening or post-bending treatment. .
- the second dielectric layer 18, that is, the lower dielectric layer 181 and the upper dielectric layer 182 adjust the reflectance and transmittance in the visible region by the interference effect with the silver layer 14, etc. It is provided in order to make the optical characteristics desired optical characteristics.
- the second dielectric layer 18, that is, the lower dielectric layer 181 and the upper dielectric layer 182 preferably have a refractive index of 1.7 to 2.5, and is preferably 1.8 to 2.2. More preferably, it is more preferably 1.9 to 2.1. By setting such a refractive index, it is easy to adjust the reflectance and transmittance in the visible region by the interference effect with the silver layer 14 and the like, and to make the optical characteristics of the laminate 10 desired optical characteristics. Become.
- the lower dielectric layer 181 and the upper dielectric layer 182 are not particularly limited as long as the above refractive index can be obtained, and various metal oxides and metal nitrides can be used.
- the metal oxide include those containing as a main component an oxide of at least one metal selected from the group consisting of zinc, tin, niobium, and titanium.
- a metal nitride what has as a main component the nitride of the at least 1 sort (s) of metal chosen from silicon and aluminum is mentioned.
- zinc oxide doped with aluminum and zinc oxide doped with tin are particularly preferable.
- the zinc oxide doped with aluminum is preferably such that the ratio of aluminum to the total amount of zinc and aluminum is 1 to 10 atomic%, more preferably 3 to 7 atomic%.
- the zinc oxide doped with tin is preferably one in which the ratio of tin to the total amount of zinc and tin is 10 to 90% by mass, and more preferably 20 to 80% by mass.
- the second dielectric layer 18 does not necessarily have a two-layer structure of the lower dielectric layer 181 and the upper dielectric layer 182 as illustrated, and may be a single layer although not illustrated. It may be a plurality of layers.
- zinc oxide doped with aluminum or zinc oxide doped with tin is preferable.
- the stacking order is not particularly limited.
- zinc oxide doped with aluminum and zinc oxide doped with tin may be used.
- Doped zinc oxide and aluminum doped zinc oxide may be used.
- the geometric thickness of the second dielectric layer 18 is preferably 25 to 50 nm, more preferably 25 to 45 nm, and further preferably 25 to 40 nm as the total thickness of the second dielectric layer 18.
- an upper barrier layer On the second dielectric layer 18, an upper barrier layer, an upper protective layer for improving scratch resistance, and the like can be further provided as necessary and within the limits not departing from the spirit of the present invention.
- the upper barrier layer examples include various metals and metal nitrides.
- the metal is at least one selected from the group consisting of titanium, zirconium, hafnium, chromium, molybdenum, tungsten, vanadium, niobium, tantalum, zinc, nickel, palladium, platinum, aluminum, indium, tin, and silicon.
- the thing which has a metal as a main component is mentioned.
- the metal nitride include those containing a nitride of these metals as a main component.
- the metal nitride may be one that depends on the metal side from stoichiometry.
- the upper barrier layer may be a metal oxide that depends on the metal side from stoichiometry.
- the upper barrier layer may be a single layer or a plurality of layers.
- the geometric thickness of the upper barrier layer is preferably 1 to 10 nm, more preferably 1 to 5 nm, as the total thickness of the upper barrier layer.
- the upper barrier layer is basically formed as a metal film or a metal nitride film, but a part of the film or the entire film is oxidized during the post-strengthening or post-bending process to change into a metal oxide film. There is a case. For this reason, the upper barrier layer does not necessarily have to exist as a metal film or a metal nitride film in a state after the heat treatment for the post-strengthening or post-bending treatment.
- the upper protective layer is not particularly limited as long as it can improve the scratch resistance, but, for example, a layer made of carbon is preferable.
- the geometric thickness of the upper protective layer is preferably 1 to 10 nm, and more preferably 1 to 5 nm. By setting the geometric thickness of the upper protective layer to 1 nm or more, the scratch resistance can be effectively improved. Moreover, it becomes easy to make the optical characteristic of the laminated body 10 into a desired optical characteristic by the geometric thickness of the upper protective layer being 10 nm or less.
- the upper protective layer is made of carbon, it is oxidized during the heat treatment for post-strengthening or post-bending treatment, and part or all of it disappears. Accordingly, the upper protective layer is not necessarily present after the heat treatment for post-strengthening or post-bending treatment.
- the geometric thickness of the first dielectric layer 13 is 10 to 50 nm
- the geometric thickness of the silver layer 14 is 5 to 30 nm
- the geometric thickness of the second barrier layer 15 is 0.
- the geometric thickness of the light absorbing layer 16 is 1 to 10 nm
- the geometric thickness of the first barrier layer 17 is 1 to 5 nm
- the geometric thickness of the lower dielectric layer 181 is 1 to 5 nm.
- the geometric thickness of the upper dielectric layer 182 is preferably 100 to 100 nm.
- the second barrier layer 15 and the first barrier layer 17 in the first specific example are made of zinc-tin alloy. That is, on the transparent substrate 11 made of a glass plate, the first dielectric layer 13 made of zinc oxide doped with aluminum, the silver layer 14 made of silver, and the zinc-tin alloy are formed in this order from the transparent substrate 11 side.
- a second dielectric layer 18 having an upper dielectric layer 182 made of zinc oxide is included.
- the geometric thickness of the first dielectric layer 13 is 10 to 50 nm
- the geometric thickness of the silver layer 14 is 5 to 30 nm
- the geometric thickness of the second barrier layer 15 is 0. 5 to 20 nm
- the geometric thickness of the light absorption layer 16 is 1 to 10 nm
- the geometric thickness of the first barrier layer 17 is 1 to 5 nm
- the geometric thickness of the lower dielectric layer 181 is 1 to
- the geometric thickness of the upper dielectric layer 182 is preferably 100 to 100 nm.
- the third specific example is a first dielectric layer 13 made of zinc oxide doped with aluminum and a silver layer made of silver on the transparent substrate 11 made of a glass plate in this order from the transparent substrate 11 side.
- first barrier layer 17 made of titanium
- lower dielectric made of zinc oxide doped with tin
- a second dielectric layer 18 having a layer 181 and an upper dielectric layer 182 made of zinc oxide doped with aluminum, an upper barrier layer made of a titanium nitride (TiN) layer, and a titanium oxide (TiO 2 ) layer
- an upper protective layer made of a titanium nitride (TiN) layer, and a titanium oxide (TiO 2 ) layer
- TiN titanium nitride
- TiO 2 titanium oxide
- the geometric thickness of the first dielectric layer 13 is 10 to 50 nm
- the geometric thickness of the silver layer 14 is 5 to 30 nm
- the geometric thickness of the light absorption layer 16 is 1 to 5 nm
- the geometric thickness of the first barrier layer 17 is 1 to 5 nm
- the geometric thickness of the lower dielectric layer 181 is 1 to 100 nm
- the geometric thickness of the upper dielectric layer 182 is 1 to 100 nm
- the upper The geometric thickness of the barrier layer is preferably 1 to 5 nm
- the geometric thickness of the upper protective layer is preferably 1 to 10 nm.
- the fourth specific example is different from the third specific example in the configuration of the first dielectric layer 13, the second dielectric layer 18, the upper barrier layer, and the upper protective layer.
- the configuration of the fourth specific example is particularly preferable because the change in optical characteristics and the generation of haze accompanying heat treatment can be effectively suppressed.
- the fourth specific example is a first dielectric comprising a zinc oxide layer doped with tin and a zinc oxide layer doped with aluminum on the transparent substrate 11 made of a glass plate in this order from the transparent substrate 11 side.
- the geometric thickness of the zinc oxide layer doped with tin of the first dielectric layer 13 is 1 to 50 nm
- the geometric thickness of the zinc oxide layer doped with aluminum is 1 to 50 nm.
- the geometric thickness of the silver layer 14 is 5 to 30 nm
- the geometric thickness of the light absorption layer 16 is 1 to 5 nm
- the geometric thickness of the first barrier layer 17 is 1 to 5 nm
- the lower dielectric has a geometric thickness of 1 to 100 nm
- the upper dielectric layer 182 has a geometric thickness of 1 to 100 nm
- the chemical thickness is preferably 1 to 10 nm.
- Such a laminate 10 preferably has the following optical characteristics, and particularly preferably has the following optical characteristics after heat treatment at 730 ° C. in air for 4 minutes.
- the heat treatment is generally performed in air at 650 to 750 ° C. for 1 to 10 minutes.
- the solar heat gain coefficient (SHGC) is preferably 0.35 to 0.45.
- Solar heat gain (SHGC) is a measure of how much heat generated by sunlight is blocked. That is, the solar heat gain rate (SHGC) is the fraction of incident solar radiation that is incident, directly transmitted, and absorbed and then released inward.
- the solar heat gain rate (SHGC) is expressed as a number between 0 and 1. The smaller the solar heat gain rate (SHGC), the less solar heat is transmitted.
- the solar heat gain rate (SHGC) is calculated, for example, in the form of a multi-layer glass composed of a glass plate (thickness 3 mm) -air layer (thickness 12 mm) -glass plate (thickness 6 mm). The laminate 10 is placed on the air layer side of the glass plate (3 mm).
- the visible light transmittance (Tv) is preferably 60 to 75%. Further, the visible light reflectance (Rv) on the transparent substrate 11 side (hereinafter simply referred to as the substrate side) is preferably 2 to 30%, more preferably 15 to 26%. The visible light reflectance (Rv) on the side opposite to the substrate side (hereinafter simply referred to as the film side) is preferably 2 to 30%, more preferably 12 to 21%. The difference between the visible light reflectance (Rv) on the substrate side and the visible light reflectance (Rv) on the film side is preferably 5% or more.
- the visible light transmittance (Tv) and the visible light reflectance (Rv) are both defined in JIS R3106: 1998.
- the transmitted light and reflected light of the laminate 10 preferably have the following color tone. That is, in the L * a * b * color system, the transmitted light preferably has a * smaller than 0 and b * smaller than 9. Further, the reflected light on the substrate side preferably has both a * and b * smaller than 0. In the reflected light on the film side, a * is preferably smaller than 5, and b * is preferably smaller than 0.
- glass plates for buildings it is required that the solar heat acquisition rate is low from the viewpoint of cooling efficiency and the like, and the color tone of transmitted light and reflected light is important from the viewpoint of design.
- glass plates for high-rise buildings that have a relatively low visible light transmittance are preferred for purposes such as anti-glare.
- the visible light transmittance is relatively low, and the visible light reflectance (Rv) on the substrate side and the visible light reflectance (Rv) on the film side are relatively large. Therefore, it is suitably used for glass plates for high-rise buildings, specifically, window glass for buildings and the like.
- the laminate 10 preferably has a haze of 0 to 1.0%, particularly a haze after heat treatment.
- the haze is obtained according to JIS K6714.
- the laminate 10 preferably has a sheet resistance, particularly a sheet resistance after heat treatment of 0.1 to 20 ⁇ / ⁇ . The sheet resistance indicates how much infrared energy is reflected.
- Each layer on the transparent substrate 11 can be formed by conventional physical and chemical vapor deposition methods.
- a suitable forming method is a sputtering method.
- Sputtering methods include DC sputtering using a metal target, AC and RF sputtering using metal and non-metal targets. In all cases, magnetron sputtering can be used. Sputtering is performed in an inert gas or in a reactive gas as required.
- the laminated body 10 of the present invention can be suitably used as a multi-layer glass.
- FIG. 2 shows an example of the multilayer glass 20.
- the multilayer glass 20 is, for example, arranged such that the laminated body 10 and the glass plate 21 are arranged at a predetermined interval via a spacer 22.
- a primary sealant 23 seals between the laminate 10 and the spacer 22 and between the glass plate 21 and the spacer 22.
- the peripheral edge between the laminate 10 and the glass plate 21 is sealed with a secondary sealing material 24.
- the spacer 22 is filled with a desiccant 27 for suppressing condensation in the hollow layer 26 through the through hole 25.
- the hollow layer 26 is filled with air or argon gas.
- the laminate 10 is disposed on the outdoor side with respect to the glass plate 21 so that the transparent substrate 11 side is opposite to the hollow layer.
- the laminated body is not necessarily restricted to what has only one silver layer, The thing which has two or more silver layers may be sufficient.
- the constituent films of the first dielectric layer 13, the silver layer 14, the light absorption layer 16, and the first barrier layer 17 are sequentially formed from the transparent substrate 11 side.
- stacked once more and made the silver layer into 2 layers is mentioned.
- a laminated body is suitable for buildings, it is not necessarily limited to buildings, and can be used for vehicles such as automobiles to the extent applicable.
- Example 1 A laminate having the film configuration shown in Table 1 was manufactured by a sputtering method.
- the sputtering apparatus an in-line type sputtering apparatus equipped with a target for forming each layer in the sputtering chamber was used.
- a washed soda lime glass plate having a geometric thickness of 3 mm was introduced into an in-line type sputtering apparatus, and evacuated until the degree of vacuum was 2 ⁇ 10 ⁇ 6 Torr or less in the load lock chamber. Subsequently, a glass plate was introduced into the sputtering chamber, and the films were sequentially formed so as to have the film configuration shown in Table 1.
- a titanium oxide (TiO 2 ) layer as a first dielectric layer and a zinc oxide layer doped with aluminum on the glass plate surface (the ratio of aluminum to the total amount of aluminum and zinc is 5.0 Atomic percent)
- a silver layer a titanium layer as a second barrier layer, a nickel aluminum alloy layer as a light absorption layer (a ratio of nickel to the total amount of nickel and aluminum is 80% by mass)
- Titanium layer as the first barrier layer
- zinc oxide layer doped with tin as the lower dielectric layer of the second dielectric layer the ratio of tin to the total amount of tin and zinc is 50% by mass
- zinc oxide layer doped with aluminum as the upper dielectric layer (the ratio of aluminum to the total amount of zinc and aluminum is 5.0 atomic%)
- To produce a laminated body are sequentially deposited shall).
- the zinc oxide layer doped with aluminum uses a zinc and aluminum alloy target (the ratio of aluminum to the total amount of zinc and aluminum is 5.0 atomic%), and the gas flow rate ratio is Ar.
- the silver layer was formed using a silver target, an introduced gas of Ar 100%, and a power density of 4.0 W / cm 2 .
- the titanium layer was formed using a titanium target with an introduction gas of Ar 100% and a power density of 0.7 W / cm 2 .
- the nickel aluminum alloy layer uses a nickel aluminum alloy target (the ratio of nickel to the total amount of nickel and aluminum is 80% by mass), the introduced gas is Ar 100%, and the power density is 0.7 W / cm 2. Film formation was performed.
- the laminate was heat-treated at 730 ° C. for 4 minutes in air.
- the visible light transmittance (Tv: unit%), the visible light reflectance (Rv: unit%) on the substrate side, and the visible light reflectance (Rv: unit%) on the film side were determined.
- the color tone of the transmitted light, the reflected light on the substrate side, and the reflected light on the film side of the laminate after the heat treatment was determined by a * b * in the CIE-Lab colorimetric method.
- the visible light transmittance (Tv) and the visible light reflectance (Rv) were measured according to JIS R3106: 1998 by measuring the visible light transmittance at a wavelength of 300 to 2500 nm using a Hitachi U-4100 spectrophotometer. Asked.
- the solar transmittance (Te: unit%) was determined according to the provisions of JIS R3106: 1998 by measuring the solar transmittance at a wavelength of 300 to 2100 nm.
- the color tone of transmitted light and reflected light was determined by measuring a * and b * in the L * a * b * color system based on JIS Z8722, and a * and b * were calculated according to JIS Z8729. The results are shown in Table 2.
- the solar heat gain rate is a measure of how much heat is shielded, that is, how much heat generated by sunlight is blocked. Specifically, it is the ratio of incident solar radiation that enters from the glass side, directly transmits, and is absorbed and then released to the film surface side.
- the solar heat acquisition rate is represented by a number between 0 and 1. The smaller the solar heat gain rate, the less solar heat is transmitted.
- SHGC solar heat gain rate
- the solar heat acquisition rate is a laminated glass with an air layer of 12 mm, and one of the opposing glass plates is the laminated body of Example 1 (the thickness of this glass plate is 3 mm, laminated film) Is placed on the air layer side), the other glass plate is a clear glass plate (the thickness of this glass plate is 6 mm), and the calculation is based on the aspect where sunlight enters from the 3 mm glass plate side of the laminate. did.
- haze (unit%) was measured in accordance with JIS K6714 for the laminate before heat treatment and the laminate after heat treatment. Further, the sheet resistance (unit ⁇ / ⁇ ) of the laminate before heat treatment and the laminate after heat treatment was measured by a four-terminal method. The results are shown in Table 3.
- Example 2 A laminate having the film configuration shown in Table 4 was produced by a sputtering method. That is, in the first barrier layer, instead of the titanium layer in the laminate of Example 1, a zinc-tin alloy layer (the ratio of tin to 50% by mass with respect to the total amount of zinc and tin) was formed.
- Other layers were formed under the same conditions as in Example 1. Thereafter, in the same manner as in Example 1, after heat treatment, optical properties, haze, and sheet resistance were measured. The results are shown in Tables 5 and 6.
- Example 3 A laminate having the film configuration shown in Table 7 was manufactured by a sputtering method.
- the film was formed as follows.
- Other layers were formed under the same conditions as in Example 1. Thereafter, in the same manner as in Example 1, after heat treatment, optical properties, haze, and sheet resistance were measured. The results are shown in Tables 8 and 9.
- Example 4 A laminate having the film configuration shown in Table 10 was manufactured by a sputtering method. That is, it formed on the conditions similar to Example 3 except having changed the thickness of the one part layer. Thereafter, in the same manner as in Example 1, after heat treatment, optical properties, haze, and sheet resistance were measured. The results are shown in Tables 11 and 12.
- Example 5 A laminate having the film configuration shown in Table 13 was manufactured by a sputtering method. That is, it formed on the conditions similar to Example 3 except having changed the thickness of the one part layer. Thereafter, in the same manner as in Example 1, after heat treatment, optical properties, haze, and sheet resistance were measured. The results are shown in Tables 14 and 15.
- Example 6 A laminate having the film configuration shown in Table 16 was manufactured by a sputtering method.
- the film was formed as follows.
- the carbon layer as the protective layer was formed using a carbon target with an introduction gas of Ar 100% and a power density of 2.1 W / cm 2 .
- the other layers were formed under the same conditions as in the other examples. Thereafter, in the same manner as in Example 1, after heat treatment, optical properties, haze, and sheet resistance were measured. The results are shown in Tables 17 and 18.
- Example 1 A laminate having the film configuration shown in Table 19 was manufactured by a sputtering method.
- the film was formed as follows.
- the carbon layer as the protective layer was formed using a carbon target with an introduction gas of Ar 100% and a power density of 2.1 W / cm 2 .
- Other layers were formed under the same conditions as in other examples, for example, example 6. Thereafter, heat treatment was performed in the same manner as in Example 1, and then optical properties, haze, and sheet resistance were measured. The results are shown in Tables 20 and 21.
- the first dielectric layer, the silver layer, the second barrier layer, the light absorption layer, the first barrier layer, and the second dielectric layer are sequentially formed from the transparent substrate side. Or the first dielectric layer, the silver layer, the light absorption layer, the first barrier layer, and the second dielectric layer, the deterioration of optical characteristics and the generation of haze due to heat treatment Can be suppressed.
- SYMBOLS 10 Laminated body, 11 ... Transparent base
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Abstract
Description
図1は、積層体の一実施形態を示す断面図である。
図2は、複層ガラス20の一例を示したものである。複層ガラス20は、例えば積層体10とガラス板21とがスペーサ22を介して所定の間隔となるように配置されたものである。積層体10とスペーサ22との間、およびガラス板21とスペーサ22との間は、1次シール材23によりシールされている。また、積層体10とガラス板21との間の周縁部は2次シール材24によりシールされている。スペーサ22内には、貫通孔25を通して中空層26内の結露を抑制するための乾燥剤27が充填されている。また、中空層26には、空気またはアルゴンガス等が封入されている。通常、積層体10は、透明基体11側が中空層と反対側となるようにしてガラス板21に対して室外側に配置される。
表1に示す膜構成を有する積層体をスパッタリング法により製造した。スパッタ装置としては、スパッタ室に各層を形成するためのターゲットが装着されたインライン型スパッタ装置を使用した。
表4に示す膜構成を有する積層体をスパッタリング法により製造した。すなわち、第1のバリア層において、実施例1の積層体におけるチタン層の代わりに亜鉛スズ合金層(亜鉛とスズとの合計量に対するスズの割合が50質量%であるもの)を形成した。亜鉛スズ合金層は、亜鉛スズ合金ターゲット(亜鉛とスズとの合計量に対するスズの割合が50質量%であるもの)を用いて、ガス流量比をAr/O2=10/9、パワー密度を3.6W/cm2として成膜を行った。その他の層については、実施例1と同様の条件で形成した。その後、実施例1と同様にして、熱処理を行ってから、光学特性、ヘイズ、シート抵抗を測定した。結果を表5、6に示す。
表7に示す膜構成を有する積層体をスパッタリング法により製造した。光吸収層としてのクロム窒化物(CrNx(x=1.0))層は、Crターゲットを用いて、ガス流量比をAr/N2=80/20、パワー密度を1.4W/cm2として成膜を行った。上部バリア層としてのチタン窒化物層は、Tiターゲットを用いて、ガス流量比をAr/N2=70/30、パワー密度を3.6W/cm2として成膜を行った。上部保護層としてのチタン酸化物層は、Tiターゲットを用いて、ガス流量比をAr/N2=60/40、パワー密度を3.6W/cm2として成膜を行った。その他の層については、実施例1と同様の条件で形成した。その後、実施例1と同様にして、熱処理を行ってから、光学特性、ヘイズ、シート抵抗を測定した。結果を表8、9に示す。
表10に示す膜構成を有する積層体をスパッタリング法により製造した。すなわち、一部の層の厚みを変更した以外は実施例3と同様の条件で形成した。その後、実施例1と同様にして、熱処理を行ってから、光学特性、ヘイズ、シート抵抗を測定した。結果を表11、12に示す。
表13に示す膜構成を有する積層体をスパッタリング法により製造した。すなわち、一部の層の厚みを変更した以外は実施例3と同様の条件で形成した。その後、実施例1と同様にして、熱処理を行ってから、光学特性、ヘイズ、シート抵抗を測定した。結果を表14、15に示す。
表16に示す膜構成を有する積層体をスパッタリング法により製造した。上部バリア層としてのチタン窒化物(TiNx(x=1.0))層は、Tiターゲットを用いて、ガス流量比をAr/N2=70/30、パワー密度を3.6W/cm2として成膜を行った。保護層としての炭素層は、炭素ターゲットを用いて、導入ガスをAr100%、パワー密度を2.1W/cm2として成膜を行った。その他の層については、他の実施例と同様の条件で形成した。その後、実施例1と同様にして、熱処理を行ってから、光学特性、ヘイズ、シート抵抗を測定した。結果を表17、18に示す。
表19に示す膜構成を有する積層体をスパッタリング法により製造した。上部バリア層としてのチタン窒化物(TiNx(X=1.0))層は、Tiターゲットを用いて、ガス流量比をAr/N2=70/30、パワー密度を3.6W/cm2として成膜を行った。保護層としての炭素層は、炭素ターゲットを用いて、導入ガスをAr100%、パワー密度を2.1W/cm2として成膜を行った。その他の層については、他の実施例、例えば実施例6と同様の条件で形成した。その後、実施例1と同様にして熱処理を行ってから、光学特性、ヘイズ、シート抵抗を測定した。結果を表20および21に示す。
なお、2012年7月24日に出願された日本特許出願2012-163954号の明細書、特許請求の範囲、図面および要約書の全内容をここに引用し、本発明の開示として取り入れるものである。
Claims (10)
- 透明基体と、前記透明基体上に設けられた積層膜とを有する積層体であって、
前記積層膜は、前記透明基体側から順に、第1の誘電体層、および銀層の2層がこの順に接して成膜された層、さらに光吸収層、第1のバリア層、および第2の誘電体層の3層がこの順に接して成膜されてなる層を含むことを特徴とする積層体。 - 前記光吸収層は、金属からなり、前記積層膜は、さらに前記銀層と前記光吸収層との間に互いと接した第2のバリア層を有する請求項1に記載の積層体。
- 前記光吸収層は、ニッケルアルミニウム合金からなる請求項1、または2に記載の積層体。
- 前記光吸収層は、金属窒化物からなる請求項1に記載の積層体。
- 前記光吸収層は、クロム窒化物からなる請求項1、または4に記載の積層体。
- 前記第1のバリア層は、チタンまたは亜鉛スズ合金からなる請求項1乃至5のいずれか1項に記載の積層体。
- 前記積層体は、熱処理した後の可視光透過率が60~75%である請求項1乃至6のいずれか1項に記載の積層体。
- 前記積層体は、熱処理した後の前記透明基体側の可視光反射率が15~26%、前記積層膜側の可視光反射率が12~21%、かつ前記透明基体側の可視光反射率と前記積層膜側の可視光反射率との差が5%以上である請求項1乃至7のいずれか1項に記載の積層体。
- 第1の誘電体層の厚さが25~50nm、銀層の厚さが5~25nm、光吸収層の厚さが1~10nm、第1のバリア層の厚さが1~10nm、第2の誘電体層の厚さが25~50nmである請求項1乃至8のいずれか1項に記載の積層体。
- 第1の誘電体層の厚さが25~50nm、銀層の厚さが5~25nm、第2のバリア層の厚さが1~10nm、光吸収層の厚さが1~10nm、第1のバリア層の厚さが1~10nm、第2の誘電体層の厚さが25~50nmである請求項2、6乃至8のいずれか1項に記載の積層体。
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Also Published As
Publication number | Publication date |
---|---|
JPWO2014017448A1 (ja) | 2016-07-11 |
US20150140355A1 (en) | 2015-05-21 |
JP6090322B2 (ja) | 2017-03-08 |
SG11201500461WA (en) | 2015-04-29 |
US9555600B2 (en) | 2017-01-31 |
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