WO2012073851A1 - 接着剤組成物、接着剤シートおよびこれらを用いた半導体装置 - Google Patents
接着剤組成物、接着剤シートおよびこれらを用いた半導体装置 Download PDFInfo
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- WO2012073851A1 WO2012073851A1 PCT/JP2011/077305 JP2011077305W WO2012073851A1 WO 2012073851 A1 WO2012073851 A1 WO 2012073851A1 JP 2011077305 W JP2011077305 W JP 2011077305W WO 2012073851 A1 WO2012073851 A1 WO 2012073851A1
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- 0 *C(*)(*N)S(*)(*)COC(*)(*)*(*)(*)* Chemical compound *C(*)(*N)S(*)(*)COC(*)(*)*(*)(*)* 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C08L101/10—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing hydrolysable silane groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09J179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/10—Block or graft copolymers containing polysiloxane sequences
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2227—Oxides; Hydroxides of metals of aluminium
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/28—Nitrogen-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/2929—Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/29386—Base material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2224/29387—Ceramics, e.g. crystalline carbides, nitrides or oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00013—Fully indexed content
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Definitions
- the present invention relates to an adhesive composition used in electronic parts and electronic materials. More specifically, the present invention relates to a highly heat conductive adhesive composition used for a heat dissipation material or the like.
- thermosetting resin such as an epoxy resin
- the adhesive agent containing a polyimide resin and a polyimide silicone resin the adhesive composition which improved heat conductivity, heat resistance, and adhesiveness by addition of the inorganic filler with high heat dissipation is proposed (for example, patent document) 3 and 4).
- an object of the present invention is to provide an adhesive composition that controls the dispersibility of the thermally conductive filler and is excellent in high thermal conductivity and adhesion to a heating element and a heat sink material.
- the present invention is an adhesive composition containing (A) a soluble polyimide, (B) an epoxy resin, and (C) a thermally conductive filler, wherein (A) the soluble polyimide is represented by the following general formula:
- the structure shown in (1) is contained as a component derived from diamine, and the content of (C) heat conductive filler in the adhesive composition is 60 vol. % Of the adhesive composition.
- the dispersibility of the heat conductive filler is controlled, and an adhesive composition excellent in high heat conductivity, adhesion to the substrate, and insulation can be obtained.
- the adhesive composition of the present invention contains (A) a soluble polyimide, (B) an epoxy resin, (C) a thermally conductive filler, and (A) the structure represented by the following general formula (1) in the diamine is a diamine. It is contained as a component derived, and the content of the (C) heat conductive filler in the adhesive composition is 60 vol. % Of the adhesive composition.
- the soluble polyimide (A) in the present invention is an amide solvent such as N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, N-vinylpyrrolidone, N, N-diethylformamide, ⁇ -butyrolactone, methyl monoglyme, methyl diglyme, methyl triglyme, ethyl monoglyme, ethyl diglyme, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol dimethyl ether, This refers to those that dissolve 1 g or more at 25 ° C. with respect to 100 g of any organic solvent such as ethylene glycol diethyl ether.
- the soluble polyimide (A) in the present invention is obtained mainly by the reaction of tetracarboxylic dianhydride and diamine, and has a residue of tetracarboxylic dianhydride and a residue of diamine.
- (A) soluble polyimide in this invention contains the structure shown by the said General formula (1) in a diamine residue. Since the alkylene oxide skeleton has high flexibility, the adhesive composition obtained using the polyimide having such a structure has improved adhesion to the substrate. From the viewpoint of improving adhesion, the content of the diamine residue having the structure represented by the general formula (1) is preferably 20 mol% or more, more preferably 30 mol% or more in all diamine residues. . Moreover, it is preferable that it is 90 mol% or less from a heat resistant viewpoint, and it is more preferable that it is 80 mol% or less.
- C x H 2x examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, and a nonylene group. Further, it does not have to have a linear structure.
- a propylene group either an n-propylene group or an i-propylene group may be used.
- a butylene group any of an n-butylene group, an i-butylene group, and a t-butylene group may be used. This is also true for alkylene groups with higher carbon numbers.
- Examples of the diamine having the structure represented by the general formula (1) include polyoxyethylene diamine, polyoxypropylene diamine, polyoxybutylene diamine, bis (4-aminophenoxy) methane, and 1,3-bis (4-aminophenoxy) propane. 1,4-bis (4-aminophenoxy) butane, 1,5-bis (4-aminophenoxy) pentane, trimethylene-bis (4-aminobenzoate), tetramethylene-bis (4-aminobenzoate), poly Examples include tetramethylene oxide-bis (4-aminobenzoate), poly (tetramethylene / 3-methyltetramethylene ether) glycol bis (4-aminobenzoate), and the like.
- Products corresponding to these diamines include D230, D400, D2000, T403, T5000 manufactured by BASF Corporation, Elastomer 250P, Elastomer 650P, Elastomer 1000P, Elastomer 1000, Porea SL-100A manufactured by Ihara Chemical Co., Ltd. , CUA-4 and the like.
- the example of the diamine which has a structure shown by General formula (1) used for this invention is not restricted above.
- the (A) soluble polyimide further has a diamine residue represented by the following general formula (2).
- a diamine residue represented by the following general formula (2) By having such a diamine residue, the solubility of the soluble polyimide in an organic solvent is improved. Moreover, since flexibility is imparted to the polyimide skeleton by the siloxane bond, the adhesive composition obtained using the polyimide having such a structure has improved adhesion to the substrate.
- the content of the diamine residue represented by the following general formula (2) is preferably 5 mol% or more in the total diamine residues. Moreover, it is preferable that it is 50 mol% or less from a viewpoint of improving the dispersibility by the hydrophobicity of a siloxane bond part.
- m represents an integer of 1 to 30.
- R 5 and R 6 may be the same or different and each represents an alkylene group having 1 to 30 carbon atoms or a phenylene group.
- R 1 to R 4 may be the same or different and each represents an alkyl group having 1 to 30 carbon atoms, a phenyl group or a phenoxy group.
- the alkyl group having 1 to 30 carbon atoms is not particularly limited, but is preferably a methyl group, an ethyl group, a propyl group, or a butyl group.
- the alkylene group having 1 to 30 carbon atoms is not particularly limited, but a methylene group, an ethylene group, a propylene group, and a butylene group are preferable. As in the description of C x H 2x , the alkyl group and the alkylene group do not need to have a linear structure.
- diamine represented by the general formula (2) examples include 1,1,3,3-tetramethyl-1,3-bis (4-aminophenyl) disiloxane, 1,1,3,3-tetra Phenoxy-1,3-bis (4-aminoethyl) disiloxane, 1,1,3,3,5,5-hexamethyl-1,5-bis (4-aminophenyl) trisiloxane, 1,1,3 3-tetraphenyl-1,3-bis (2-aminoethyl) disiloxane, 1,1,3,3-tetraphenyl-1,3-bis (3-aminopropyl) disiloxane, 1,1,5, 5-tetraphenyl-3,3-dimethyl-1,5-bis (3-aminopropyl) trisiloxane, 1,1,5,5-tetraphenyl-3,3-dimethoxy-1,5-bis (4- Aminobutyl) trisiloxane, 1,1,5, -Tetraphen
- the weight average molecular weight of (A) the soluble polyimide is desirably 5,000 or more and 500,000 or less.
- at least one of the weight average molecular weights may be in the above range.
- the weight average molecular weight is less than 5,000, the mechanical strength may be significantly lowered and the adhesive strength may be lowered.
- the weight average molecular weight exceeds 500,000, the viscosity of the resin composition becomes high, and the dispersibility of the heat conductive filler may decrease.
- it is 100,000 or less.
- the weight average molecular weight in this invention is measured by the gel permeation chromatography method (GPC method), and is computed by polystyrene conversion.
- the soluble polyimide in the present invention may contain other diamine residues to the extent that the effects of the present invention are not impaired in addition to the above diamine residues.
- diamines containing one benzene ring such as 1,4-diaminobenzene, 1,3-diaminobenzene, 2,4-diaminotoluene, 1,4-diamino-2,5-dihalogenobenzene, bis (4 -Aminophenyl) ether, bis (3-aminophenyl) ether, bis (4-aminophenyl) sulfone, bis (3-aminophenyl) sulfone, bis (4-aminophenyl) methane, bis (3- Aminophenyl) methane, bis (4-aminophenyl) sulfide, bis (3-aminophenyl) sulfide, 2,2-bis (4-aminophenyl) propane, 2,2-bis (3
- Diamines containing three benzene rings 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, 2, 2-bis [4- (4-aminophenoxy) phenyl] sulfone, 4,4 ′-(4-aminophenoxy) biphenyl, 9,9-bis (4-aminophenyl) fluore
- residues of diamine compounds such as diamines containing 4 or more benzene rings such as 5,10-bis (4-aminophenyl) anthracene. Examples of other diamine residues are not limited to these.
- the acid dianhydride residue of the soluble polyimide (A) in the present invention is not particularly limited.
- PMDA pyromellitic anhydride
- ODPA oxydiphthalic dianhydride
- BTDA 4,4 '-Benzophenone tetracarboxylic dianhydride
- BPDA 4,4'-biphenyltetracarboxylic dianhydride
- DSDA 2,2′-bis [(dicarboxyphenoxy) phenyl] propane dianhydride (BSAA), 4,4′-hexafluoroisopropylidenediphthalic anhydride (6FDA), 1,2- Residues of acid dianhydrides such as ethylene bis (anhydro trimellitate) (TMEG).
- acid dianhydride residues are not limited to these.
- the tetracarboxylic dianhydride residue and the diamine residue are preferably 1) having a low benzene ring, 2) having a large molecular weight, and being bulky, or 3) having a structure having many bending sites such as an ether bond. .
- the interaction between molecular chains is weakened, and the solubility of soluble polyimide in an organic solvent is improved.
- the soluble polyimide in the present invention may be composed only of a polyimide structural unit, or may be a copolymer having other structures as a copolymerization component in addition to the polyimide structural unit. Moreover, the precursor (polyamic acid structure) of the polyimide structural unit may be contained. Moreover, these mixtures may be sufficient. Furthermore, the polyimide represented by another structure may be mixed with any of these. When the polyimide represented by another structure is mixed, it is preferable to contain 50 mol% or more of the (A) soluble polyimide in the present invention. It is preferable to select the type and amount of the structure used for copolymerization or mixing as long as the effects of the present invention are not impaired.
- the method for synthesizing the soluble polyimide (A) used in the present invention is not particularly limited, and is synthesized by a known method using diamine and tetracarboxylic dianhydride.
- a polyimide precursor using a method such as a method of reacting with a diamine (a part of which may be substituted with an aniline derivative), and synthesizing it using a known imidization method. it can
- the adhesive composition of the present invention contains (B) an epoxy resin.
- an epoxy resin When an epoxy resin is contained, the viscosity of the adhesive composition becomes low until the B stage, so that the thermocompression bonding between the adhesive composition molded into a sheet (adhesive sheet) and the substrate is improved. Further, since the crosslinking reaction proceeds in three dimensions by the curing reaction, the mechanical strength and heat resistance after adhesion and the adhesion to the substrate are improved.
- the (B) epoxy resin used in the present invention is not particularly limited, but a crystalline epoxy resin is preferred from the viewpoint of increasing the flow characteristics at high temperature and the mechanical strength after curing to lower the thermal expansion coefficient.
- the crystalline epoxy resin is an epoxy resin having a mesogen skeleton such as a biphenyl group, a naphthalene skeleton, an anthracene skeleton, a phenylbenzoate group, or a benzanilide group.
- Examples of products corresponding to such epoxy resins include JERYX4000, JERYX4000H, JERYX8800, JERYL6121H, JERYL6640, JERYL6677, and JERYX7399 manufactured by Mitsubishi Chemical Corporation, and NC3000, NC3000H, NC3000L, and CER-3000L manufactured by Nippon Kayaku Co., Ltd. And YSLV-80XY, YDC1312, manufactured by Nippon Steel Chemical Co., Ltd., and HP4032D manufactured by DIC Corporation.
- the (B) epoxy resin used in the present invention is preferably an epoxy resin having a fluorene skeleton from the viewpoint of (C) improving the dispersibility of the thermally conductive filler and improving the insulation after curing.
- examples of such an epoxy resin include PG100, CG500, CG300-M2, EG200, and EG250 manufactured by Osaka Gas Chemical Co., Ltd.
- the (B) epoxy resin used in the present invention is preferably a liquid epoxy resin at room temperature from the viewpoint of flexibility at the B stage and adhesion strength with the substrate.
- the liquid epoxy resin has a viscosity of 150 Pa ⁇ s or less at 25 ° C. and 1.013 ⁇ 10 5 N / m 2 , for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, alkylene Examples thereof include oxide-modified epoxy resins and glycidylamine type epoxy resins.
- the (B) epoxy resin used in the present invention may be one kind or a combination of two or more kinds.
- (B) As for content of an epoxy resin 20 to 800 weight part is preferable with respect to 100 weight part of (A) soluble polyimide. From the viewpoint of thermocompression bonding with the substrate of the adhesive sheet in the B stage, 50 parts by weight or more is more preferable. Moreover, 500 weight part or less is more preferable from a viewpoint of reducing the crosslinking density of the epoxy resin after hardening, and improving the toughness of adhesive composition and the adhesive strength with a board
- the adhesive composition of the present invention may contain a curing agent if necessary.
- a curing agent By combining an epoxy resin and a curing agent, curing of the epoxy resin can be accelerated and cured in a short time.
- the curing agent imidazoles, polyhydric phenols, acid anhydrides, amines, hydrazides, polymercaptans, Lewis acid-amine complexes, latent curing agents and the like can be used.
- imidazoles, polyhydric phenols, and latent curing agents that are excellent in storage stability and heat resistance of the cured product are preferably used. These can be used individually or in mixture of 2 or more types.
- imidazoles examples include Curazole 2MZ, Curazole 2PZ, Curazole 2MZ-A, Curazole 2MZ-OK (trade name, manufactured by Shikoku Kasei Kogyo Co., Ltd.).
- Polyhydric phenols Sumilite Resin PR-HF3, Sumilite Resin PR-HF6 (trade name, manufactured by Sumitomo Bakelite Co., Ltd.) Kayahard KTG-105, Kayahard NHN (trade name, Nippon Kayaku Co., Ltd.) Phenolite TD2131, Phenolite TD2090, Phenolite VH-4150, Phenolite KH-6021, Phenolite KA-1160, Phenolite KA-1165 (above trade name, manufactured by DIC Corporation), and the like.
- the latent curing agent includes dicyandiamide type latent curing agent, amine adduct type latent curing agent, organic acid hydrazide type latent curing agent, aromatic sulfonium salt type latent curing agent, and microcapsule type latent curing agent. And photocurable latent curing agents.
- DICY7, DICY15, DICY50 (above trade name, manufactured by Japan Epoxy Resin Co., Ltd.), Amicure AH-154, Amicure AH-162 (above trade name, manufactured by Ajinomoto Fine Techno Co., Ltd.) Etc.
- examples of the amine adduct type latent curing agent include Amicure PN-23, Amicure PN-40, Amicure MY-24, Amicure MY-H (trade names, manufactured by Ajinomoto Fine Techno Co., Ltd.), and Fujicure FXR-1030 (trade names). , Manufactured by Fuji Kasei Co., Ltd.).
- Examples of the organic acid hydrazide-type latent curing agent include Amicure VDH and Amicure UDH (trade names, manufactured by Ajinomoto Fine Techno Co., Ltd.).
- examples of the aromatic sulfonium salt type latent curing agent include Sun Aid SI100, Sun Aid SI 150, and Sun Aid SI 180 (trade names, manufactured by Sanshin Chemical Industry Co., Ltd.).
- examples of the microcapsule type latent curing agent include those obtained by encapsulating each of the above curing agents with a vinyl compound, a urea compound, and a thermoplastic resin.
- microcapsule type latent curing agent obtained by treating an amine adduct type latent curing agent with isocyanate
- NovaCure HX-3941HP NovaCure HXA3922HP
- NovaCure HXA3932HP NovaCure HXA3042HP
- photocurable latent curing agent examples include optomer SP, optomer CP (manufactured by ADEKA Corporation), and the like.
- the content is preferably 0.1 parts by weight or more and 35 parts by weight or less with respect to 100 parts by weight of the (B) epoxy resin.
- the adhesive composition of the present invention contains (C) a thermally conductive filler.
- the thermally conductive filler refers to a filler having a thermal conductivity of 2 W / m ⁇ K or more at 25 ° C.
- the thermal conductivity of the filler can be determined by measuring according to JIS R1611 (2010) after obtaining a sintered body having a thickness of about 1 mm and a porosity of 10% or less.
- filler there is no restriction, for example, carbon black, silica, magnesium oxide, zinc oxide, alumina, aluminum nitride, boron nitride, silicon carbide, silicon nitride and other inorganic fillers, copper, aluminum, magnesium, silver, Examples thereof include metal fillers such as zinc, iron and lead. These fillers may be used alone or in combination of a plurality of fillers.
- the shape of the filler is not particularly limited, and examples thereof include true sphere, sphere, scale shape, flake shape, foil piece shape, fiber shape, and needle shape. From the viewpoint of containing the thermally conductive filler at a high density, a spherical filler is preferable.
- the content of (C) the heat conductive filler is 60 vol. % Or more. 60 vol. % Or more increases the thermal conductivity of the adhesive composition. More preferably, 65 vol. % Or more.
- seat is 60 vol. % Or more and 65 vol. % Or more is more preferable.
- the volume content of the filler is obtained by calculating the volume content of each component from the weight content and specific gravity of each component contained in the adhesive composition.
- the volume content (vol.%) Of the filler in the adhesive composition and the sheet when the adhesive composition and the sheet include a solvent, the solvent is not included in the calculation. That is, the volume content of the filler is calculated using the total volume content of the components excluding the solvent among the components contained in the adhesive composition or sheet as the denominator.
- the following method using thermogravimetric analysis may be mentioned, but is not limited thereto.
- the cured product of the sheet is heated up to 600 to 900 ° C. to decompose and volatilize the resin component, the weight of the filler contained is measured, and the weight of the resin is calculated. Thereafter, the volume is calculated by dividing by the specific gravity of the filler and the resin, and a method of calculating the volume is mentioned.
- the thermally conductive filler is preferably used in combination of two or more fillers having different average particle diameters. At this time, it is preferable that the average particle diameter of at least one filler is 6 ⁇ m or more. High thermal conductivity can be obtained by containing a thermally conductive filler having an average particle diameter of 6 ⁇ m or more.
- the average particle size is desirably 100 ⁇ m or less. By setting the average particle diameter to 100 ⁇ m or less, the surface roughness of the adhesive resin composition at the B stage can be lowered, and the adhesive strength can be further increased.
- the content of the thermally conductive filler having an average particle diameter of 6 ⁇ m or more is 40 vol.
- the adhesive composition from the viewpoint of improving the thermal conductivity. % Or more, preferably 50 vol. % Or more is more preferable.
- seat is 40 vol. % Or more, preferably 50 vol. % Or more is more preferable.
- the (C) thermally conductive filler used in the present invention contains two or more kinds of fillers having different average particle sizes, and at least (C-1) the average particle size is 6 ⁇ m or more and 15 ⁇ m or less, and (C-2) It is more preferable to contain a filler having an average particle size of 30 ⁇ m or more, more preferably 40 ⁇ m or more.
- the average particle size of the filler (C-1) is more preferably 8 ⁇ m or more as the lower limit, more preferably 12 ⁇ m or less, and still more preferably 10 ⁇ m or less.
- the upper limit of the average particle diameter of the filler (C-2) is not particularly limited, but is preferably 90 ⁇ m or less, more preferably 70 ⁇ m or less, and further preferably 50 ⁇ m or less. Higher thermal conductivity can be obtained by containing the thermally conductive filler in such a combination.
- the content of the heat conductive filler having an average particle size of 30 ⁇ m or more, more preferably 40 ⁇ m or more is 10 vol. % Or more, preferably 20 vol. % Or more is more preferable. Further, from the viewpoint of improving the withstand voltage, 35 vol. % Or less, preferably 30 vol. % Or less is more preferable.
- the heat conductive filler used in combination with the heat conductive filler having an average particle diameter of 6 ⁇ m or more it is desirable to include a filler having an average particle diameter of less than 6 ⁇ m in addition to the above.
- the filler having a small particle size is dispersed in the gaps between the fillers having a large particle size, and the heat conductive filler can be contained at a higher density in the adhesive composition, thereby improving the heat conductivity of the adhesive composition.
- limit especially as a minimum of an average particle diameter 0.01 micrometer or more is preferable and 0.1 micrometer or more is further more preferable.
- the average particle diameter is the average particle diameter of primary particles that are not aggregated, and the aggregate of primary particles is the particle diameter of the aggregates.
- the particles are directly observed by SEM (scanning electron microscope) or TEM (transmission electron microscope), and the number average of the particle sizes is calculated. A method is mentioned.
- the filler having an average particle diameter of 6 ⁇ m or more alumina, boron nitride, aluminum nitride, zinc oxide, magnesium oxide, silica and the like are preferable. This is because the thermal conductivity of the filler is high and the effect of increasing the thermal conductivity of the adhesive resin composition is high.
- the (C) thermally conductive filler used in the present invention preferably has a pH of 6.0 or less when 10 g of the thermally conductive filler is added to 100 g of water.
- thermally conductive filler having a pH of 6.0 or less.
- the soluble polyimide (A) in the adhesive composition has a residue of a basic functional group such as an amine, the dispersibility of the heat conductive filler can be improved by the interaction of acid-base. Thereby, the adhesive force with the board
- Thermally conductive fillers with a pH of 6.0 or less are not limited to the type of filler itself, fillers with many acidic functional groups such as carboxyl groups and hydroxyl groups on the filler surface, and higher fatty acid or silane coupling on the filler surface Examples include fillers treated with an agent. Carbon black and alumina are mentioned as fillers having many acidic functional groups such as carboxyl groups and hydroxyl groups on the filler surface. Alumina is preferred from the viewpoint of insulation. For example, such alumina particles include AO802, AO809, AO820, AO502, AO509, AO520 manufactured by Admatechs Co., Ltd.
- DAW-03, DAM-03, DAW-05, DAM-05 manufactured by Denki Kagaku Kogyo Co., Ltd.
- a heat conductive filler having a pH of 6.0 or less and other fillers may be mixed and used.
- the content of the heat conductive filler having a pH of 6.0 or less is 40 vol. % Or more is preferable. More preferably, 50 vol. % Or more. 40 vol. By being more than%, the dispersibility of the thermally conductive filler can be improved, and higher thermal conductivity can be obtained.
- seat is 40 vol. % Or more, preferably 50 vol. % Or more is more preferable.
- the adhesive composition of the present invention may contain a surfactant as necessary, and can improve the coatability with the substrate. Further, a silane coupling agent such as methylmethacryloxydimethoxysilane or 3-aminopropyltrimethoxysilane, a titanium chelating agent, or the like may be contained in the adhesive composition in an amount of 0.5 to 10% by weight.
- the adhesive composition of the present invention is mixed on a support in a solvent to form a varnish, dried, and processed into a sheet. it can.
- the solvent used here may be appropriately selected from those capable of dissolving the above-mentioned components.
- ketone solvents acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, ether solvents 1,4-dioxane, tetrahydrofuran, Diglyme, glycol ether solvent methyl cellosolve, ethyl cellosolve, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol methyl ethyl ether, other benzyl alcohol, propanol, N-methylpyrrolidone, ⁇ -butyrolactone, acetic acid And ethyl, N, N-dimethylformamide and the like.
- the solvent can be any material having a boiling point of 120 ° C. or lower under atmospheric pressure.
- the method of making the adhesive composition of the present invention into a varnish is not particularly limited, but (A) a soluble polyimide, (B) an epoxy resin, and (C) a thermally conductive filler, and other contained as necessary. After mixing the components in the above solvent using a propeller stirrer, homogenizer, kneader, etc., (C) From the viewpoint of improving the dispersibility of the thermally conductive filler, mixing with a bead mill, ball mill, three roll mill, etc. Is preferred.
- the varnish can be applied to the support by spin coating using a spinner, spray coating, roll coating, screen printing, or blade coater, die coater, calendar coater, meniscus coater, bar coater, roll coater, comma roll coater. And a coating method using a gravure coater, a screen coater, a slit die coater and the like.
- a roll coater As the coating machine, a roll coater, a comma roll coater, a gravure coater, a screen coater, a slit die coater, etc. can be used, but the slit die coater is preferably used because the volatility of the solvent during coating is small and the coating property is stable. Is done.
- the thickness of the adhesive composition (adhesive sheet) formed into a sheet is not particularly limited, but is preferably in the range of 20 to 200 ⁇ m from the viewpoint of insulation such as withstand voltage and heat dissipation characteristics.
- Oven, hot plate, infrared, etc. can be used for drying.
- the drying temperature and the drying time may be in a range where the organic solvent can be volatilized, and it is preferable to appropriately set a range in which the adhesive sheet is in an uncured or semi-cured state (B stage state). Specifically, it is preferable to hold for 1 minute to several tens of minutes in the range of 40 ° C to 120 ° C. Moreover, you may heat up in steps, combining these temperatures, for example, you may heat-process at 70 degreeC, 80 degreeC, and 90 degreeC for 1 minute each.
- the support is not particularly limited, but various commercially available films such as polyethylene terephthalate (PET) film, polyphenylene sulfide film, and polyimide film can be used.
- PET polyethylene terephthalate
- polyphenylene sulfide film polyphenylene sulfide film
- polyimide film can be used.
- the bonding surface of the support with the adhesive composition may be subjected to a surface treatment such as silicone, a silane coupling agent, an aluminum chelating agent, or polyurea in order to improve adhesion and peelability.
- a surface treatment such as silicone, a silane coupling agent, an aluminum chelating agent, or polyurea in order to improve adhesion and peelability.
- the thickness of the support is not particularly limited, but is preferably in the range of 10 to 100 ⁇ m from the viewpoint of workability.
- the adhesive sheet may have a protective film in order to protect its surface. Thereby, the adhesive sheet surface can be protected from contaminants such as dust and dust in the atmosphere.
- the protective film examples include a polyethylene film, a polypropylene (PP) film, and a polyester film. It is preferable that the protective film has a small adhesive force with the adhesive sheet.
- the adhesive composition is preferably used in the form of a varnish as described above.
- an adhesive composition film is formed on one surface of a substrate or member to be bonded using an adhesive composition varnish.
- the substrate and member include a thin plate made of a metal material such as copper or SUS, and a semiconductor device (a lead frame portion or the like) to be bonded thereto.
- the method for applying the adhesive composition varnish include spin coating using a spinner, spray coating, roll coating, and screen printing.
- the coating film thickness varies depending on the coating method, the solid content concentration and the viscosity of the resin composition, etc., but it is usually preferable that the coating film thickness be 50 ⁇ m or more and 300 ⁇ m or less after drying.
- the substrate coated with the adhesive composition varnish is dried to obtain an adhesive composition coating.
- an oven, a hot plate, infrared rays, or the like can be used.
- the drying temperature and the drying time may be in a range where the organic solvent can be volatilized, and it is preferable to appropriately set a range in which the adhesive resin composition film is in an uncured or semi-cured state. Specifically, it is preferably performed in the range of 50 to 150 ° C. for 1 minute to several hours.
- the adhesive sheet has a protective film, it is peeled off, and the adhesive sheet and the substrate are opposed to each other and bonded together by thermocompression bonding.
- the thermocompression bonding can be performed by a heat press process, a heat laminating process, a heat vacuum laminating process or the like.
- the sticking temperature is preferably 40 ° C. or higher from the viewpoint of adhesion to the substrate and embedding.
- the affixing temperature is 250 degrees C or less.
- the support may be peeled off before bonding, or may be peeled off at any point in the thermocompression bonding process or after thermocompression bonding.
- the substrate on which the adhesive composition film thus obtained is formed is thermocompression bonded to the substrate or other member.
- the thermocompression bonding temperature may be not less than the glass transition temperature of the resin, and a temperature range of 100 to 400 ° C. is preferable.
- the pressure during pressure bonding is preferably in the range of 0.01 to 10 MPa.
- the time is preferably 1 second to several minutes.
- a cured film is formed by applying a temperature of 120 to 400 ° C.
- This heat treatment is performed for 5 minutes to 5 hours by selecting a temperature and raising the temperature stepwise or by selecting a certain temperature range and continuously raising the temperature.
- heat treatment is performed at 130 ° C. and 200 ° C. for 30 minutes each.
- a method such as linearly raising the temperature from room temperature to 250 ° C. over 2 hours can be mentioned.
- the heating temperature is preferably 150 ° C. or higher and 300 ° C. or lower, and more preferably 180 ° C. or higher and 250 ° C. or lower.
- the adhesive body obtained by thermocompression bonding in this way preferably has a peel strength of 2 N / mm or more from the viewpoint of adhesion reliability. More desirable is 5 N / mm or more.
- the thickness of the cured film can be arbitrarily set, but is preferably 50 ⁇ m or more and 300 ⁇ m or less.
- the adhesive composition in the present invention can be widely used as an adhesive for semiconductor devices, but is particularly suitable for power IC packages.
- a power IC is an IC for power control. In addition to a conventional Si semiconductor, a SiC semiconductor or the like is also used. It is a large IC.
- An adhesive layer is formed by sticking an adhesive sheet on a heat radiating fin made of a metal substrate, or applying and drying a varnish of an adhesive composition. Thereafter, the power IC package is obtained by thermocompression bonding to the lead frame made of copper of the semiconductor device on which the power IC is mounted, and bonding the radiation fins.
- the semiconductor device referred to in the present invention refers not only to a device in which a semiconductor element is connected to a substrate, a device in which semiconductor elements are connected to each other or to each other, but also a device that can function by utilizing the characteristics of the semiconductor element.
- the electro-optical device, the semiconductor circuit board, and the electronic components including these are all included in the semiconductor device.
- ODPA 4,4'-oxydiphthalic dianhydride
- BAHF 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (manufactured by AZ Electronic Materials Co., Ltd.)
- MBAA [Bis (4-amino-3-carboxy) phenyl] methane (Wakayama Seika Kogyo Co., Ltd.)
- SiDA Bis (3-aminopropyl) tetramethyldisiloxane (manufactured by Shin-Etsu Chemical Co., Ltd.)
- MAP 3-aminophenol (manufactured by Tokyo Chemical Industry Co., Ltd.)
- Elastomer 1000 Polytetramethylene oxide-di-para-aminobenzoate
- EPICLON850S Bisphenol A type liquid epoxy resin
- EXA-4850-150 Oligomer type modified bisphenol A type liquid epoxy resin (manufactured by DIC Corporation).
- NC3000 Epoxy resin having a biphenyl skeleton (manufactured by Nippon Kayaku Co., Ltd.) PG100: Epoxy resin having a fluorene skeleton (Osaka Gas Chemical Co., Ltd.) ⁇ Thermal conductive filler>
- DAW-45 Alumina particles (average particle size: 45 ⁇ m, thermal conductivity: 26 W / m ⁇ K) (manufactured by Denki Kagaku Kogyo Co., Ltd.)
- AO820 Alumina particles (average particle size: 20 ⁇ m, thermal conductivity: 20 W / m ⁇ K) (manufactured by Admatechs Co., Ltd .: trade name Admatechs)
- AO509 Alumina particles (average particle diameter: 9 ⁇ m, thermal conductivity: 20 W / m ⁇ K) (manufactured by Admatechs Co., Ltd .: trade name Admatechs)
- AO502 Alumina particles (
- a weight average molecular weight in terms of polystyrene was calculated using a GPC apparatus Waters 2690 (manufactured by Waters Co., Ltd.) having the structure shown below, using a solution having a solid content concentration of 0.1% by weight obtained by dissolving polyimide in NMP.
- GPC measurement conditions were such that the moving bed was NMP in which LiCl and phosphoric acid were each dissolved at a concentration of 0.05 mol / l, and the development rate was 0.4 ml / min.
- Detector Waters 996 System controller: Waters 2690 Column oven: Waters HTR-B Thermo Controller: Waters TCM Column: TOSOH grand comn Column: THSOH TSK-GEL ⁇ -4000 Column: TOSOH TSK-GEL ⁇ -2500.
- the adhesive composition prepared in each Example and Comparative Example was applied on a PET film having a thickness of 38 ⁇ m using a comma roll coater, dried at 100 ° C. for 30 minutes, and then a protective film having a thickness of 10 ⁇ m.
- the PP film was laminated to obtain an adhesive sheet. Coating was performed such that the film thickness of the adhesive sheet was 120 ⁇ m.
- the protective film was peeled off, and the peeled surface was placed on a copper foil (NA-VLP thickness 15 ⁇ m: manufactured by Mitsui Kinzoku Co., Ltd.) using a laminating apparatus (manufactured by Takatori Co., Ltd., VTM-200M).
- Lamination was performed under the conditions of 130 ° C., roll temperature 130 ° C., sticking speed 2 mm / sec, sticking pressure 0.4 Mpa. And when the support film is peeled off, the adhesive sheet does not remain on the support film, the one attached to the copper foil is good ( ⁇ ), the one that cannot be attached and remains on the support film (No X).
- the protective film of the adhesive sheet obtained by the above method is peeled off, and the peeled surface is laminated on a copper foil using a laminating apparatus with a stage temperature of 130 ° C., a roll temperature of 130 ° C., a sticking speed of 2 mm / sec, and a sticking pressure of 0.4 MPa. Laminated under conditions. After peeling off the support film, the copper foil was placed on a 180 ° C. hot plate and held for 30 seconds. Thereafter, a copper foil was laminated on the heated adhesive composition, and thermocompression bonded at a pressure of 0.2 MPa for 1 minute. Thereafter, it was cured with a hot air circulation dryer at 180 ° C. for 1 hour.
- the copper foil of the laminate thus obtained was removed by etching with a ferric chloride aqueous solution only on one side to perform circuit processing with a line width of 5 mm. Thereafter, a copper foil having a width of 5 mm was lifted and pulled in the direction of 90 ° C. with respect to the laminate with a push gel gauge, and the adhesive strength was measured.
- the protective film of the adhesive sheet obtained by the above method is peeled off, and the peeling surface is laminated on a copper foil using a laminating apparatus, a stage temperature of 130 ° C., a roll temperature of 130 ° C., a sticking speed of 2 mm / sec, and a sticking pressure of 0.4 MPa.
- Lamination was performed under the following conditions. After peeling off the support film, it was heat-cured with a hot air circulating dryer at 180 ° C. for 1 hour. The copper foil of the laminate thus obtained was all removed by etching with an aqueous ferric chloride solution to obtain a cured product of the adhesive composition having a thickness of 120 ⁇ m.
- the thermal diffusivity of the cured product was measured with a laser flash method thermal diffusivity measuring apparatus LFA447 manufactured by Netch Co., Ltd. Further, the specific gravity of the cured product was measured by the Archimedes method, the specific heat of the cured product was measured by the DSC method, and the thermal conductivity was calculated by thermal diffusivity ⁇ specific gravity ⁇ specific heat.
- the volume content of the filler was calculated by dividing the weight of each component of the added resin composition by the specific gravity and calculating the volume.
- a cured product of the adhesive composition was obtained in the same manner as described above except that the thickness of the cured product of the adhesive composition was 200 ⁇ m.
- the withstand voltage in temperature 23 degreeC and humidity 50% RH was measured with the withstand voltage tester TOS5101 by Kikusui Electronics Corporation. The measurement was carried out with an alternating current at a boosting speed of 5.0 kV / sec, and the voltage when a current of 0.2 mA or more flowed was defined as a withstand voltage.
- the polyimide used in each example and comparative example was synthesized by the following method.
- Example 1 A stirrer, a thermometer, a nitrogen introduction tube and a dropping funnel were placed in a 300 ml four-necked flask, charged with 105.68 g of ⁇ BL and 11.79 g of ODPA under a nitrogen atmosphere, and stirred and dissolved at 60 ° C. Thereafter, 29.71 g of Elastomer 1000, 2.98 g of SiDA, and 1.47 g of BAHF were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution A (solid content concentration 30.0 wt%). As a result of measuring the weight average molecular weight of the polyimide, it was 29,000, and as a result of measuring the imidization rate, it was 99%.
- Example 2 A stirrer, a thermometer, a nitrogen introducing tube and a dropping funnel were placed in a 300 ml four-necked flask, charged with 138.53 g of ⁇ BL and 14.74 g of ODPA under a nitrogen atmosphere, and stirred and dissolved at 60 ° C. Thereafter, 37.14 g of Elastomer 1000, 6.53 g of D-400 and 1.83 g of BAHF were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution B (solid content concentration: 30.0 wt%).
- Example 3 A stirrer, a thermometer, a nitrogen introducing tube and a dropping funnel were placed in a 300 ml four-necked flask, charged with 104.94 g of ⁇ BL and 11.79 g of ODPA under a nitrogen atmosphere, and stirred and dissolved at 60 ° C. Thereafter, 29.71 g of elastomer 1000, 2.98 g of SiDA, and 1.15 g of MBAA were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution C (solid content concentration: 30.0 wt%).
- Example 4 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 180 g of DAW-45 was added thereto. 25 g of MBN-010T was added, and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 5 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 180 g of AO509, MBN- 25 g of 010T was added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 6 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 180 g of AO502, MBN- 25 g of 010T was added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 7 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution C obtained in Example 3, and mixed and stirred, and 180 g of AO509, MBN- 25 g of 010T was added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 8 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution C obtained in Example 3, and mixed and stirred, and 180 g of AO509, FAN- 33 g of 30 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 9 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution C obtained in Example 3, and mixed and stirred, and 180 g of AO509, FAN- 66 g of 30 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3-roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 10 A stirrer, a thermometer, a nitrogen inlet tube and a dropping funnel were placed in a 300 ml four-necked flask, charged with 127.61 g of ⁇ BL and 13.18 g of ODPA in a nitrogen atmosphere, and stirred and dissolved at 60 ° C. Thereafter, 37.14 g of elastomer 1000, 3.73 g of SiDA, and 1.43 g of MBAA were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution D (solid content concentration 30.0% by weight).
- a polyimide solution D solid content concentration 30.0% by weight
- Example 11 12.5 g of EPICLON850S, 6.25 g of NC3000, and 0.8 g of 2PZ were added to 20.83 g of the polyimide solution D obtained in Example 10, and mixed and stirred. To this, 180 g of AO509, 66 g of FAN-30, 25 g of MBN-010T was added, and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 12 6.25 g of EPICLON850S, 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution D obtained in Example 10, and mixed and stirred, and 180 g of AO509 was added thereto. 66 g of FAN-30 and 25 g of MBN-010T were added and kneaded repeatedly five times with a three-roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 13 6.25 g of EPICLON850S, 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution D obtained in Example 10, and mixed and stirred, and 180 g of AO509 was added thereto. 99 g of FAN-30 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 14 6.25 g of EPICLON850S, 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution D obtained in Example 10, and mixed and stirred, and 180 g of AO509 was added thereto. 66 g of FAN-50 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 15 6.25 g of EPICLON850S, 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution D obtained in Example 10, and mixed and stirred, and 180 g of AO509 was added thereto. 99 g of FAN-50 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 16 6.25 g of EPICLON850S, 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 180 g of AO509 was added thereto. 66 g of FAN-50 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 17 A stirrer, a thermometer, a nitrogen introducing tube and a dropping funnel were placed in a 300 ml four-necked flask, and charged with 128.53 g of ⁇ BL and 13.18 g of ODPA under a nitrogen atmosphere, and stirred and dissolved at 60 ° C. Thereafter, 37.14 g of elastomer 1000, 3.73 g of SiDA, and 1.83 g of BAHF were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution E (solid content concentration: 30.0 wt%).
- Example 18 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 41.7 g of the polyimide solution D obtained in Example 10, and mixed and stirred.
- Example 19 6.25 g of NC3000, 2.25 g of PG100, 0.8 g of 2PZ were added to 55.0 g of the polyimide solution D obtained in Example 10, and mixed and stirred.
- Example 20 6.25 g of EPICLON 850S, 9.25 g of NC3000, 3.25 g of PG100, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution D obtained in Example 10 and mixed and stirred, and 260 g of AO509 was added thereto. 25 g of MBN-010T was added, and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 21 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150 and 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 180 g of AO820, FAN- 33 g of 30 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 22 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 120 g of AO820, FAN- 33 g of 30 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 23 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 120 g of AO820, FAN- After adding 33 g of 05 and 25 g of MBN-010T, the mixture was repeatedly kneaded five times with a three-roll mill to obtain an adhesive composition which was a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 24 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 140 g of FAN-30 was added thereto. 25 g of MBN-010T was added, and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 25 A stirrer, a thermometer, a nitrogen introducing tube and a dropping funnel were placed in a 300 ml four-necked flask, and 104.00 g of ⁇ BL and 20.63 g of ODPA were charged in a nitrogen atmosphere and dissolved by stirring at 60 ° C. Thereafter, 8.67 g of elastomer 1000, 13.92 g of SiDA, and 2.56 g of BAHF were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution F (solid content concentration: 30.0 wt%).
- Example 26 To 20.83 g of the soluble polyimide solution B obtained in Example 2, 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150 and 0.8 g of 2PZ were mixed and stirred, and 180 g of AO820 was added thereto. 33 g of FAN-30 and 25 g of MBN-010T were added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition as a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Example 27 The adhesive composition obtained in Example 1 was applied onto a copper foil with a bar coater and dried with a hot air dryer at 100 ° C. for 30 minutes. Thus, the laminated body by which the 120-micrometer-thick adhesive composition was laminated
- the adhesive strength to the copper foil was 8.2 N / cm, and the thermal conductivity was 6.6 W / mK, and the same results as in Example 1 were obtained.
- stacked on copper foil was measured.
- the withstand voltage was 2.3 kV, and the same result as in Example 1 was obtained.
- Examples 28-39 The adhesive compositions obtained in Examples 8 to 19 were subjected to the same operations as in Example 27 and evaluated for adhesive strength, thermal conductivity, and withstand voltage. In each of Examples 28 to 39, the same results as in Examples 8 to 19 were obtained.
- Comparative Example 1 A stirrer, a thermometer, a nitrogen introducing tube and a dropping funnel were placed in a 300 ml four-necked flask, and 106.45 g of ⁇ BL and 23.58 g of ODPA were charged under a nitrogen atmosphere, and stirred and dissolved at 60 ° C. Then, 13.92 g of SiDA and 8.79 g of BAHF were added while stirring at 60 ° C., and the mixture was stirred for 1 hour. Thereafter, the temperature was raised to 180 ° C. and stirred for 2 hours, and then cooled to room temperature to obtain a polyimide solution G (solid content concentration: 30.0 wt%).
- Comparative Example 2 180 g of AO820 and 25 g of MBN-010T were added to 83.3 g of the polyimide solution A obtained in Example 1, and the mixture was repeatedly kneaded five times with a three-roll mill to obtain an adhesive composition that was a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, and thermal conductivity were evaluated by the above method, but it could not be stuck to the copper foil. Therefore, the adhesive composition was peeled off from the support substrate and thermally cured on a petri dish made of “Teflon” (registered trademark), and the thermal conductivity and withstand voltage were measured.
- Teflon registered trademark
- Comparative Example 3 12.5 g of EPICLON850S, 6.25 g of EXA-4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, mixed and stirred, and 83 g of AO502 was added thereto. The mixture was repeatedly kneaded five times with a three-roll mill to obtain an adhesive composition that was a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method.
- Comparative Example 4 12.5 g of EPICLON850S, 6.25 g of 4850-150, 0.8 g of 2PZ were added to 20.83 g of the polyimide solution A obtained in Example 1, and mixed and stirred, and 35 g of HP-40 and MBN- 25 g of 010T was added and kneaded repeatedly 5 times with a 3 roll mill to obtain an adhesive composition which is a viscous liquid. About the obtained adhesive composition, the sticking property to copper foil, adhesive strength, thermal conductivity, and withstand voltage were evaluated by said method. However, the dispersibility of the heat conductive filler was poor, and an adhesive sheet having a good surface state could not be obtained.
- Tables 1 to 4 show the compositions of the adhesive compositions obtained in the examples and comparative examples, and Tables 5 to 7 show the evaluation results.
- the adhesive composition or the adhesive sheet contains a thermally conductive filler having an average particle diameter of 6 ⁇ m or more in that the adhesive strength and the thermal conductivity are further improved. It turned out to be preferable.
- Example 22 the content of the heat conductive filler having an average particle diameter of 6 ⁇ m or more was 50 vol. In the adhesive composition or the adhesive sheet. % Or more was found to be more preferable in terms of further improving the thermal conductivity.
- Example 2 when the adhesive composition or the adhesive sheet added 10 g of the thermally conductive filler as 100 (C) thermally conductive filler to 100 g of water, It has been found that inclusion of a material having a pH of 6.0 or less is preferable in terms of further improving the adhesive strength and the thermal conductivity.
- the soluble polyimide is the residue of the diamine represented by the general formula (2). It has been found that having a group is preferable in terms of further improving the adhesive strength.
- the adhesive composition or the adhesive sheet is (A) soluble polyimide, and diamine residues having a structure represented by the general formula (1) are included in all diamine residues. It has been found that having 20 mol% or more is preferable in terms of further improving the adhesive strength.
- the adhesive composition and the adhesive sheet have a filler with an average particle size of 6 ⁇ m or more and 15 ⁇ m or less, and an average particle size of 30 ⁇ m or more, more preferably 40 ⁇ m. It has been found that the inclusion of the above filler is preferable in terms of further improving the thermal conductivity.
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Abstract
Description
本発明における(A)可溶性ポリイミドとは、N-メチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、N-ビニルピロリドン、N,N-ジエチルホルムアミドなどのアミド系溶媒、γ-ブチロラクトン、メチルモノグライム、メチルジグライム、メチルトリグライム、エチルモノグライム、エチルジグライム、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテルなどのエーテル系溶媒のいずれかの有機溶媒100gに対して、25℃で1g以上溶解するものを指す。
ODPA:4,4’-オキシジフタル酸二無水物(マナック(株)製)
BAHF:2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン(AZエレクトロニックマテリアルズ(株)製)
MBAA:[ビス(4-アミノ-3-カルボキシ)フェニル]メタン(和歌山精化工業(株)製)
SiDA:ビス(3-アミノプロピル)テトラメチルジシロキサン(信越化学(株)製)
MAP:3-アミノフェノール(東京化成(株)製)
エラスマー1000:ポリテトラメチレンオキシド-ジ-パラ-アミノベンゾエート
D-400:ポリオキシプロピレンジアミン(BASF(株)製、商品名“ジェファーミン”D-400 一般式(1)のn=5~7)。
EPICLON850S:ビスフェノールA型液状エポキシ樹脂
EXA-4850-150:オリゴマー型変性ビスフェノールA型液状エポキシ樹脂(DIC(株)製)。
PG100:フルオレン骨格を有するエポキシ樹脂(大阪ガスケミカル(株)製)
<熱伝導性フィラー>
DAW-45:アルミナ粒子(平均粒子径:45μm、熱伝導率:26W/m・K)(電気化学工業(株)製)
AO820:アルミナ粒子(平均粒子径:20μm、熱伝導率:20W/m・K)(アドマテックス(株)製:商標名アドマテックス)
AO509:アルミナ粒子(平均粒子径:9μm、熱伝導率:20W/m・K)(アドマテックス(株)製:商標名アドマテックス)
AO502:アルミナ粒子(平均粒子径:0.7μm、熱伝導率:20W/m・K)(アドマテックス(株)製:商標名アドマテックス)
FAN-30:窒化アルミニウム粒子(平均粒子径:30μm、熱伝導率:170W/m・K)(古河電子(株)製)
FAN-50:窒化アルミニウム粒子(平均粒子径:50μm、熱伝導率:170W/m・K)(古河電子(株)製)
FAN-05:窒化アルミニウム(平均粒子径:5μm、熱伝導率:170W/m・K)(古河電子(株)製)
HP-40:窒化ホウ素(平均粒子径:8μm、熱伝導率:40W/m・K)(水島合金鉄(株)製)
MBN-010T:窒化ホウ素(平均粒子径:0.9μm、熱伝導率:40W/m・K)(三井化学(株)製)。
2PZ:2-フェニルイミダゾール。
γBL:γ-ブチロラクトン。
ポリイミドをNMPに溶解した固形分濃度0.1重量%の溶液を用い、下に示す構成のGPC装置Waters2690(Waters(株)製)によりポリスチレン換算の重量平均分子量を算出した。GPC測定条件は、移動層をLiClとリン酸をそれぞれ濃度0.05mol/lで溶解したNMPとし、展開速度を0.4ml/分とした。
検出器:Waters996
システムコントローラー:Waters2690
カラムオーブン:Waters HTR-B
サーモコントローラー:Waters TCM
カラム:TOSOH grard comn
カラム:THSOH TSK-GEL α-4000
カラム:TOSOH TSK-GEL α-2500。
まず、ポリマーの赤外吸収スペクトルを測定し、ポリイミドに起因するイミド構造の吸収ピーク(1780cm-1付近、1377cm-1付近)の存在を確認した。次に、そのポリマーについて、350℃で1時間熱処理した後、再度、赤外吸収スペクトルを測定し、熱処理前と熱処理後の1377cm-1付近のピーク強度を比較した。熱処理後のポリマーのイミド化率を100%として、熱処理前のポリマーのイミド化率を求めた。
各実施例および比較例で作製した接着剤組成物をコンマロールコーターを用いて、厚さ38μmのPETフィルム上に塗布し、100℃で30分間乾燥を行った後、保護フィルムとして、厚さ10μmのPPフィルムをラミネートし、接着剤シートを得た。接着剤シートの膜厚は120μmとなるように塗工を行った。その後保護フィルムを剥離し、該剥離面を、銅箔(NA-VLP厚み15μm:三井金属(株)製)上に、ラミネート装置((株)タカトリ製、VTM-200M)を用いて、ステージ温度130℃、ロール温度130℃、貼付速度2mm/秒、貼付圧力0.4Mpaの条件でラミネートした。そして、支持体フィルムを剥がした時、接着剤シートが支持体フィルムに残らず、銅箔に貼り付けされたものを良(○)、貼り付けできず支持体フィルムに残っているものを否(×)とした。
上記の方法で得られた接着シートの保護フィルムを剥がし、剥離面を銅箔上にラミネート装置を用いて、ステージ温度130℃、ロール温度130℃、貼付速度2mm/秒、貼付圧力0.4Mpaの条件でラミネートした。支持体フィルムを剥がした後、180℃のホットプレート上に銅箔を下にして置き30秒間保持した。その後、加熱された接着剤組成物の上に銅箔を積層して、0.2MPaの圧力で1分間熱圧着した。その後180℃の熱風循環型乾燥機で1時間かけて熱硬化した。このようにして得られた積層体の銅箔を片側のみ第二塩化鉄水溶液でエッチング除去して線幅5mmの回路加工をおこなった。その後、プッシュゲルゲージで5mm幅の銅箔を積層体に対して90℃の方向に持ち上げて引っ張り、接着強度を測定した。
上記の方法で得られた接着シートの保護フィルムを剥がし、剥離面を銅箔上にラミネート装置を用いて、ステージ温度130℃、ロール温度130℃、貼付速度2mm/秒、貼り付け圧力0.4MPaの条件でラミネートした。支持体フィルムを剥がした後、180℃の熱風循環型乾燥機で1時間かけて熱硬化した。このようにして得られた積層体の銅箔を全て第二塩化鉄水溶液でエッチング除去し、厚みが120μmの接着剤組成物の硬化物を得た。その後、ネッチ(株)製のレーザーフラッシュ法熱拡散率測定装置LFA447で硬化物の熱拡散率を測定した。またアルキメデス法で硬化物の比重を測定し、DSC法で硬化物の比熱を測定して、熱拡散率×比重×比熱で熱伝導率を算出した。フィラーの体積含有率は、添加した樹脂組成物の各成分の重量を比重で割って体積を計算して、算出した。
接着剤組成物の硬化物の厚みが200μmとなるようにしたこと以外は上記と同様にして、接着剤組成物の硬化物を得た。これについて、菊水電子工業(株)製の耐電圧試験器TOS5101で温度23℃、湿度50%RHにおける耐電圧を測定した。測定は、交流で昇圧速度5.0kV/秒で実施して、0.2mA以上の電流が流れた時の電圧を耐電圧とした。
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL105.68g、ODPA11.79gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらエラスマー1000 29.71g、SiDA2.98g、BAHF1.47gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液A(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、29,000であり、イミド化率を測定した結果、99%であった。
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL138.53g、ODPA14.74gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらエラスマー1000 37.14g、D-400 6.53g、BAHF1.83gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液B(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、26,800であり、イミド化率を測定した結果、98%であった。このようにして得られたポリイミドB20.83gについて、実施例1と同様の方法で各成分と混合し、接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL104.94g、ODPA11.79gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらエラスマー1000 29.71g、SiDA2.98g、MBAA1.15gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液C(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、30,500であり、イミド化率を測定した結果、99%であった。このようにして得られたポリイミドC20.83gについて、実施例1と同様の方法で各成分と混合し、接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにDAW-45を180g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO502を180g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例3で得られたポリイミド溶液C20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例3で得られたポリイミド溶液C20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-30を33g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例3で得られたポリイミド溶液C20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-30を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL127.61g、ODPA13.18gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらエラスマー1000 37.14g、SiDA3.73g、MBAA1.43gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液D(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、12,000であり、イミド化率を測定した結果、99%であった。このようにして得られたポリイミドD20.83gについて、実施例9と同様の方法で各成分と混合し、接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例10で得られたポリイミド溶液D20.83gにEPICLON850Sを12.5g、NC3000を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-30を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例10で得られたポリイミド溶液D20.83gにEPICLON850Sを6.25g、NC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-30を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例10で得られたポリイミド溶液D20.83gにEPICLON850Sを6.25g、NC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-30を99g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例10で得られたポリイミド溶液D20.83gにEPICLON850Sを6.25g、NC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-50を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例10で得られたポリイミド溶液D20.83gにEPICLON850Sを6.25g、NC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-50を99g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例16
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを6.25g、NC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-50を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例17
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL128.53g、ODPA13.18gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらエラスマー1000 37.14g、SiDA3.73g、BAHF1.83gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液E(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、13,000であり、イミド化率を測定した結果、99%であった。このようにして得られたポリイミドE20.83gについて、実施例14と同様の方法で各成分と混合し、接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例18
実施例10で得られたポリイミド溶液D41.7gにNC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-50を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例19
実施例10で得られたポリイミド溶液D55.0gにNC3000を6.25g、PG100を2.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を180g、FAN-50を66g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例10で得られたポリイミド溶液D20.83gにEPICLON850Sを6.25g、NC3000を9.25g、PG100を3.25g、2PZを0.8gを添加して混合撹拌し、これにAO509を260g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO820を180g、FAN-30を33g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO820を120g、FAN-30を33g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO820を120g、FAN-05を33g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにFAN-30を140g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL104.00g、ODPA20.63gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらエラスマー1000 8.67g、SiDA13.92g、BAHF2.56gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液F(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、31,400であり、イミド化率を測定した結果、98%であった。このようにして得られたポリイミドF20.83gについて、実施例1と同様の方法で各成分と混合し、接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例2で得られた可溶性ポリイミド溶液B20.83gに、EPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO820を180g、FAN-30を33g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られた接着剤組成物を銅箔の上にバーコーターで塗布して、100℃の熱風乾燥機で30分間乾燥した。このようにして120μm厚みの接着剤組成物が銅箔上に積層された積層体を得た。この積層体を130℃のホットプレート上に銅箔を下にしておいて、接着剤組成物の上に銅箔をのせて0.4MPaで5分間プレスした。その後、この積層体を180℃で60分間熱硬化した。このようにして得られた積層体を上記の方法で接着強度、熱伝導率の評価をおこなった。銅箔への接着強度は8.2N/cm、熱伝導率は6.6W/mKであり、実施例1と同等の結果が得られた。また、上記と同様の方法で得られた200μm厚みの接着剤組成物が銅箔上に積層された積層体の耐電圧を測定した。耐電圧は2.3kVであり、実施例1と同等の結果が得られた。
実施例8~19で得られた接着剤組成物について、実施例27と同様の操作を行い接着強度、熱伝導率および耐電圧の評価をおこなった。実施例28~39のそれぞれにおいて、実施例8~19と同等の結果が得られた。
300mlの4つ口フラスコに撹拌機、温度計、窒素導入管および滴下ロートを設置して、窒素雰囲気下、γBL106.45g、ODPA23.58gを仕込み、60℃で撹拌溶解させた。その後、60℃で撹拌しながらSiDAを13.92g、BAHFを8.79gを添加して1時間撹拌した。その後180℃まで昇温させて2時間撹拌した後、室温まで冷却してポリイミド溶液G(固形分濃度30.0重量%)を得た。ポリイミドの重量平均分子量を測定した結果、26,700であり、イミド化率を測定した結果、99%であった。このようにして得られたポリイミドG20.83gについて、実施例1と同様の方法で各成分と混合し、接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率熱の評価を行ったが、銅箔に貼り付けることができなかった。そこで接着剤組成物を支持基板から剥がして、“テフロン”(登録商標)製のシャーレの上で熱硬化して、熱伝導率および耐電圧を測定した。
実施例1で得られたポリイミド溶液A83.3gにAO820を180g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度および熱伝導率の評価を行ったが、銅箔に貼り付けることができなかった。そこで接着剤組成物を支持基板から剥がして、“テフロン”(登録商標)製のシャーレの上で熱硬化して、熱伝導率および耐電圧を測定した。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、EXA-4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにAO502を83g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。
実施例1で得られたポリイミド溶液A20.83gにEPICLON850Sを12.5g、4850-150を6.25g、2PZを0.8gを添加して混合撹拌し、これにHP-40を35g、MBN-010Tを25g添加して3本ロールミルで5回繰り返し混練して、粘性液体である接着剤組成物を得た。得られた接着剤組成物について、上記の方法で、銅箔への貼り付け性、接着強度、熱伝導率および耐電圧の評価を行った。しかし熱伝導性フィラーの分散性が悪く、良好な表面状態の接着シートが得られなかった。
Claims (14)
- (C)熱伝導性フィラーが異なる平均粒子径のフィラーを2種以上含み、少なくとも1種のフィラーの平均粒子径が6μm以上である請求項1に記載の接着剤組成物。
- (C)熱伝導性フィラーが、異なる平均粒子径のフィラーを2種以上含み、少なくとも平均粒子径が6μm以上15μm以下のフィラーと平均粒子径が30μm以上のフィラーを含有することを特徴とする請求項1または2に記載の接着剤組成物。
- (C)熱伝導性フィラーが、該熱伝導性フィラー10gを水100g中に添加した際、その液のpHが6.0以下を示すものを含む請求項1~3のいずれかに記載の接着剤組成物。
- (C)熱伝導性フィラーがアルミナを含む請求項1~4のいずれかに記載の接着剤組成物。
- (C)熱伝導性フィラーが異なる平均粒子径のフィラーを2種以上含み、少なくとも1種のフィラーの平均粒子径が6μm以上である請求項7に記載の接着剤シート。
- (C)熱伝導性フィラーが異なる平均粒子径のフィラーを2種以上含み、少なくとも平均粒子径が6μm以上15μm以下のフィラーと平均粒子径が30μm以上のフィラーを含有することを特徴とする請求項7または8に記載の接着剤シート。
- (C)熱伝導性フィラーが、該熱伝導性フィラー10gを水100g中に添加した際、そのpHが6.0以下を示すものを含む請求項7~9のいずれかに記載の接着剤シート。
- (C)熱伝導性フィラーがアルミナを含む請求項7~10のいずれかに記載の接着剤シート。
- 請求項1~6のいずれかに記載の接着剤組成物または請求項7~12のいずれかに記載の接着剤シートの硬化物。
- 請求項1~6のいずれかに記載の接着剤組成物または請求項7~12のいずれかに記載の接着剤シートの硬化物を有する半導体装置。
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EP (1) | EP2647685B1 (ja) |
JP (1) | JP5853704B2 (ja) |
KR (1) | KR101957532B1 (ja) |
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KR20150100727A (ko) * | 2012-12-27 | 2015-09-02 | 도레이 카부시키가이샤 | 접착제, 접착 필름, 반도체 장치 및 그의 제조 방법 |
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JPWO2014115637A1 (ja) * | 2013-01-22 | 2017-01-26 | 東レ株式会社 | 接着剤組成物、接着剤シートならびにこれらを用いた硬化物および半導体装置 |
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JP2016194055A (ja) * | 2015-03-31 | 2016-11-17 | 荒川化学工業株式会社 | 接着剤組成物、フィルム状接着材、接着層、接着シート、樹脂付銅箔、銅張積層板、フレキシブル銅張積層板、プリント配線板、フレキシブルプリント配線板、多層配線板、プリント回路板、及びフレキシブルプリント回路板 |
JP2017095566A (ja) * | 2015-11-20 | 2017-06-01 | 株式会社巴川製紙所 | 熱伝導性熱硬化型接着剤組成物及び熱伝導性熱硬化型接着シート |
JP2018022767A (ja) * | 2016-08-03 | 2018-02-08 | 三菱瓦斯化学株式会社 | 熱伝導シートの製造方法 |
WO2022220261A1 (ja) * | 2021-04-14 | 2022-10-20 | 積水化学工業株式会社 | 絶縁樹脂シート、積層体、及び半導体装置 |
US11976236B2 (en) | 2022-01-26 | 2024-05-07 | Halliburton Energy Services, Inc. | Methods and compositions for enhancing integrity and thermal conductivity of wellbores in geothermal operations |
WO2023181905A1 (ja) * | 2022-03-22 | 2023-09-28 | 日本発條株式会社 | 積層体の製造方法 |
TWI839160B (zh) * | 2022-03-22 | 2024-04-11 | 日商日本發條股份有限公司 | 積層體的製造方法 |
Also Published As
Publication number | Publication date |
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JP5853704B2 (ja) | 2016-02-09 |
TWI571501B (zh) | 2017-02-21 |
US20130245160A1 (en) | 2013-09-19 |
SG190423A1 (en) | 2013-06-28 |
EP2647685B1 (en) | 2018-02-28 |
EP2647685A1 (en) | 2013-10-09 |
JPWO2012073851A1 (ja) | 2014-05-19 |
CN103228753B (zh) | 2015-07-22 |
TW201233762A (en) | 2012-08-16 |
CN103228753A (zh) | 2013-07-31 |
KR101957532B1 (ko) | 2019-03-12 |
KR20130141530A (ko) | 2013-12-26 |
EP2647685A4 (en) | 2014-09-17 |
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