WO2012063853A1 - 窒化アルミニウム単結晶の製造装置及び製造方法 - Google Patents
窒化アルミニウム単結晶の製造装置及び製造方法 Download PDFInfo
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- WO2012063853A1 WO2012063853A1 PCT/JP2011/075793 JP2011075793W WO2012063853A1 WO 2012063853 A1 WO2012063853 A1 WO 2012063853A1 JP 2011075793 W JP2011075793 W JP 2011075793W WO 2012063853 A1 WO2012063853 A1 WO 2012063853A1
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- aluminum nitride
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
- C30B23/066—Heating of the material to be evaporated
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
Definitions
- the present invention relates to an apparatus and a method for manufacturing an aluminum nitride single crystal.
- Aluminum nitride-based semiconductors have a wide band gap of 6.2 eV, and therefore are expected to be used for blue / ultraviolet light emitting elements, white LEDs, high voltage / high frequency power supply ICs, and the like.
- the aluminum nitride single crystal has a small lattice mismatch with gallium nitride of 2.4%, it is also expected as a growth substrate when growing a gallium nitride based semiconductor.
- the flux method is known as the solution method, the MOVPE method as the vapor phase method, the hydride vapor deposition method (Hydride Vapor Phase Epitaxy, HVPE), and the sublimation method.
- the sublimation method is a powerful method for producing a bulk crystal because the growth rate is generally high.
- the crucible which is a growth vessel, is heated to create a temperature difference between the upper and lower parts of the crucible, sublimate the raw material placed on the lower part, and the sublimation gas is regenerated in the upper growth part where the temperature is lower than the lower part.
- aluminum nitride powder is used as a raw material.
- aluminum gas and nitrogen gas are generated.
- the aluminum nitride single crystal is grown around 2000 ° C., but in this temperature range, the corrosiveness of the generated aluminum gas is high. For this reason, the material which can be used for a crucible is limited. As such a material, it is known to use tantalum carbide (TaC) or tungsten (W) (Non-patent Document 1 and Patent Document 1).
- Non-Patent Document 1 discloses that a TaC crucible is installed inside a graphite heating element.
- Patent Document 1 discloses that the crucible is prevented from being broken by using a tungsten crucible including a wall structure that includes a large number of tungsten crystals and is expanded by absorption of aluminum.
- Non-Patent Document 1 when the crucible described in Non-Patent Document 1 is used, there is a problem that a large amount of carbon is mixed in the grown aluminum nitride. Thus, when impurities such as carbon are mixed into the AlN crystal, the crystal quality is deteriorated. In addition, when carbon is mixed in a lump, AlN grows from this carbon as a base point and may be polycrystallized.
- the tungsten crucible reacts with aluminum gas at a high temperature of 2320 ° C.
- a difference in thermal expansion coefficient occurs between the place where the tungsten crucible and the aluminum gas react in the crucible and the place where the aluminum gas does not react, and the crucible may be damaged when the temperature is lowered.
- the crucible is deformed before and after the growth due to the change in the volume of the crucible, making it difficult to use the crucible repeatedly.
- tungsten is more expensive than carbon, which is commonly used as a crucible material in general, so that it cannot be used repeatedly is a problem in industrial use.
- the present invention has been made in view of the above circumstances, and provides an apparatus and a method for manufacturing an aluminum nitride single crystal that can sufficiently reduce the amount of carbon mixed into an aluminum nitride crystal and can be repeatedly used.
- the purpose is to provide.
- Non-Patent Document 1 it was examined whether the carbon mixed in the single crystal of aluminum nitride originated from a TaC crucible as a growth vessel or a graphite heating element provided outside the Tac crucible. According to the initial expectation, the present inventors thought that it is unlikely that carbon from the graphite heating element would be mixed into the aluminum nitride single crystal because the TaC crucible was sealed. Therefore, the present inventors considered that the carbon mixed in the single crystal of aluminum nitride is derived from the TaC crucible.
- the carbon mixed in the single crystal of aluminum nitride was mainly derived from a graphite heating element provided outside the TaC crucible, not the TaC crucible. Therefore, the present inventors considered arranging a heating element made of tungsten as a heating element provided outside the TaC crucible in order to prevent carbon derived from the heating element from being mixed into the aluminum nitride single crystal.
- the carbon of the graphite heating element provided outside the TaC crucible is mixed into the single crystal, the aluminum gas generated in the TaC crucible leaks from the TaC crucible and reacts with the tungsten heating element. As a result, it was considered that the tungsten heating element was damaged. However, unexpectedly, the tungsten heating element was not damaged. Thus, the inventors have completed the present invention.
- the present invention is an aluminum nitride single crystal production apparatus for producing an aluminum nitride single crystal by heating and sublimating an aluminum nitride raw material and recrystallizing the aluminum nitride into a seed crystal, which contains the aluminum nitride raw material And a growth vessel made of a material having corrosion resistance to the aluminum gas generated during sublimation of the aluminum nitride raw material, and the aluminum nitride raw material provided on the outside of the growth vessel and heating the aluminum nitride raw material via the growth vessel.
- a heating element wherein the growth container has a main body part having a storage part for storing the aluminum nitride, and a lid body for sealing the storage part of the main body part, and the heating element contains tungsten.
- This is an apparatus for producing an aluminum nitride single crystal made of a metal material.
- the aluminum nitride raw material is stored in the storage portion in the main body of the growth vessel, the seed crystal is fixed to the lid, and the storage is sealed by the lid. Then, the heating element generates heat, and the aluminum nitride raw material is heated and sublimated through the growth vessel. At this time, aluminum gas and nitrogen gas are generated. Then, aluminum nitride is recrystallized on the seed crystal fixed to the lid, and an aluminum nitride single crystal is manufactured. At this time, the heating element provided outside the growth vessel is made of a metal material containing tungsten. For this reason, mixing of carbon from the heating element into the grown aluminum nitride single crystal is eliminated.
- the growth vessel is made of a material having corrosion resistance against aluminum gas. For this reason, the growth vessel is sufficiently suppressed from being corroded by the aluminum gas. For this reason, leakage of aluminum gas from the growth vessel is sufficiently suppressed, and mixing of aluminum into the heating element is sufficiently suppressed. As a result, in the heating element, the difference in thermal expansion coefficient can be made sufficiently small. For this reason, when the temperature of the heating element is lowered, deformation of the heating element and generation of cracks in the heating element can be sufficiently suppressed.
- the material constituting the growth vessel is a metal carbide or nitride having an ion radius of 1.37 times to 1.85 times the ion radius of aluminum. preferable.
- the metal in the carbide or nitride of the metal since the metal in the carbide or nitride of the metal has an ionic radius larger than that of aluminum as described above, it replaces a part of aluminum in the aluminum gas generated by sublimation of the aluminum nitride raw material. Thus, the formation of a solid solution can be suppressed. For this reason, the metal carbide or nitride of the metal is more excellent in corrosion resistance against aluminum gas. Therefore, there is an advantage that impurities are less likely to be mixed into the aluminum nitride single crystal.
- the material constituting the growth vessel is preferably at least one selected from the group consisting of tantalum carbide, zirconium nitride, tungsten nitride and tantalum nitride.
- the metal material constituting the heating element is tungsten alone.
- the heat resistance of the heating element can be further improved, and repeated use of the aluminum nitride single crystal manufacturing apparatus can be facilitated.
- the heating element and the growth vessel are preferably in contact with each other.
- the heating element and the growth vessel may be separated from each other. Even in this case, the aluminum nitride raw material can be heated through the growth vessel by the radiant heat from the heating element. If the heating element and the growth container are separated from each other, even if the aluminum gas leaks from the growth container, the heating element contacts the heating element after the aluminum gas is diluted. For this reason, the reaction between tungsten and aluminum gas is more sufficiently suppressed than in the case where the heating element and the growth vessel are in contact with each other, and deformation of the heating element when the temperature is lowered and generation of cracks in the heating element are further suppressed. It can be sufficiently suppressed.
- the present invention is also a method for producing an aluminum nitride single crystal using the above-described apparatus for producing an aluminum nitride single crystal, wherein the aluminum nitride is provided in the housing portion of the main body of the growth vessel.
- the heating element provided on the outside of the growth vessel is made of a metal material containing tungsten, carbon is not mixed into the grown aluminum nitride single crystal from the heating element. As a result, carbon can be sufficiently reduced in the aluminum nitride single crystal.
- the growth vessel is made of a material having corrosion resistance against aluminum gas, the growth vessel is sufficiently suppressed from being corroded by the aluminum gas. For this reason, leakage of aluminum gas from the growth vessel is sufficiently suppressed, and mixing of aluminum into the heating element is sufficiently suppressed.
- the difference in thermal expansion coefficient can be made sufficiently small, and the occurrence of cracks in the heating element can be sufficiently suppressed when the temperature of the heating element is lowered.
- an apparatus and a method for manufacturing an aluminum nitride single crystal that can sufficiently reduce the amount of carbon mixed into an aluminum nitride crystal and can be repeatedly used.
- FIG. 1 is a cross-sectional view showing an embodiment of an apparatus for producing an aluminum nitride single crystal according to the present invention.
- an aluminum nitride single crystal manufacturing apparatus (hereinafter simply referred to as “manufacturing apparatus”) 100 accommodates a crystal growth unit 1 in which an aluminum nitride single crystal 19 is grown and a crystal growth unit 1. And a high-frequency coil 3 wound around the housing portion 2.
- a gas introduction port 4 and a gas discharge port 5 are formed in the storage unit 2, and an inert gas is introduced from the inert gas supply device (not shown) through the gas introduction port 4, and the inside of the storage unit 2
- the gas is discharged through the gas discharge port 5 by a decompression device (for example, a vacuum pump).
- nitrogen gas, argon gas, or the like is used as the inert gas.
- an opening (not shown) for accommodating the crystal growth portion 1 is also formed in the accommodating portion 2.
- the crystal growth unit 1 includes a growth container 7 that stores the aluminum nitride raw material 6, a heating element 8 provided outside the growth container 7, and a heat insulating material 9 that covers the heating element 8.
- the growth vessel 7 for example, a crucible is used. Therefore, the growth vessel 7 has a main body portion 11 having a storage portion 10 for storing the aluminum nitride raw material 6 and a lid body 12 for sealing the storage portion 10 of the main body portion 11. A seed crystal 13 is fixed to the surface of the lid 12 on the storage unit 10 side.
- the growth vessel 7 is made of a material having corrosion resistance against aluminum gas. As such a material, a metal carbide or nitride having an ionic radius of 1.37 times to 1.85 times the ionic radius of aluminum is preferable.
- the metal in the carbide or nitride of the metal since the metal in the carbide or nitride of the metal has an ionic radius larger than that of aluminum as described above, it replaces a part of aluminum in the aluminum gas generated by sublimation of the aluminum nitride raw material. Thus, the formation of a solid solution can be suppressed. For this reason, the metal carbide or nitride of the metal is more excellent in corrosion resistance against aluminum gas. Therefore, impurities are less likely to be mixed into the aluminum nitride single crystal.
- the metal carbide or nitride as described above include tantalum carbide (TaC), zirconium nitride, tungsten nitride, and tantalum nitride.
- tantalum carbide is preferable because it is particularly excellent in corrosion resistance against aluminum gas.
- the heating element 8 has a main body portion 14 that houses the growth vessel 7 and a lid body 15 that seals the main body portion 14.
- the heating element 8 functions as a heating element that heats the aluminum nitride raw material 6 via the growth vessel 7 and is in contact with the growth vessel 7.
- the heating element 8 generates heat when an induction current flows when a high frequency magnetic field is applied by the high frequency coil 3.
- the heating element 8 is made of a material having a higher corrosion resistance to the aluminum gas generated during sublimation of the aluminum nitride raw material 6 than that of the growth vessel 7, that is, a metal material containing tungsten.
- a metal material containing tungsten examples include tungsten alone, and an alloy of tungsten and a metal such as rhenium, iron, nickel, or copper. Of these, tungsten is preferable because of its excellent heat resistance.
- the heat insulating material 9 has a main body portion 17 that houses the heating element 8 and a lid body 18 that seals the main body portion 17.
- the heat insulating material 9 is for efficiently transferring the heat of the heating element 8 to the growth vessel 7, and is made of, for example, carbon.
- the cover 18 of the heat insulating material 9 is removed, the cover 15 of the heating element 8 is removed, and the cover 12 of the growth vessel 7 is removed.
- the aluminum nitride raw material 6 is stored in the storage unit 10 of the growth vessel 7.
- the seed crystal 13 is fixed to the lid 12.
- AlN aluminum nitride
- SiC silicon carbide
- the storage unit 10 of the main body 11 of the growth vessel 7 is sealed with the lid 12.
- the lid 12 directs the seed crystal 13 toward the storage unit 10.
- the main body 14 of the heating element 8 is sealed with the lid 15.
- the main body 17 is sealed with the lid 18 (first step).
- the crystal growth part 1 is accommodated inside from the opening of the accommodation part 2.
- the container 2 is evacuated by a decompression device. Thereafter, an inert gas is introduced from the gas introduction port 4 into the accommodation unit 2 and the gas in the accommodation unit 2 is discharged from the gas discharge port 5.
- the periphery of the crystal growth part 1 is placed in an inert gas atmosphere.
- the inert gas include nitrogen gas and argon gas.
- the internal pressure of the accommodating portion 2 is preferably 1.3 to 101 kPa, more preferably 13.3 to 80.0 kPa.
- a high frequency current is applied to the high frequency coil 3, thereby applying a high frequency magnetic field to the heating element 8.
- an induced current flows through the heating element 8 and the heating element 8 generates heat.
- the heat of the lid 15 of the heating element 8 is transmitted to the aluminum nitride raw material 6 through the growth vessel 7, and the aluminum nitride raw material 6 is heated and sublimated.
- the heat of the heating element 8 is efficiently transmitted to the growth container 7 and the aluminum nitride raw material 6 is efficiently heated.
- the temperature of the aluminum nitride raw material 6 (hereinafter referred to as “raw material part temperature”) is higher than the temperature of the aluminum nitride single crystal 19 (hereinafter referred to as “growth part temperature”).
- the raw material part temperature specifically refers to the temperature of the bottom part of the main body part 11, and the growth part temperature specifically refers to the temperature of the lid 12.
- the raw material temperature is preferably 1800 ° C. or higher, more preferably 2000 ° C. or higher.
- the growth rate can be increased more than when the raw material temperature is 1800 ° C. or lower.
- the raw material part temperature is preferably set to a temperature lower than the melting point of the growth vessel 7.
- the growth part temperature may be lower than the raw material part temperature, but is preferably lower by 50 ° C. to 200 ° C. than the raw material part temperature. In this case, a single crystal is easily obtained as compared with a case outside the above range. That is, compared with the case where it is out of the above range, the precipitation of polycrystal is more sufficiently suppressed, or the crystal is likely to grow.
- the raw material part temperature and the growth part temperature are controlled by, for example, measuring the raw material part temperature and the growth part temperature with radiation thermometers provided on the bottom part of the main body part 14 of the heating element 8 and the lid body 15 respectively. Based on this, it can be performed by controlling the output of the high-frequency current flowing in the high-frequency coil 3.
- the heating element 8 provided outside the growth vessel 7 is made of a metal material containing tungsten. For this reason, carbon is not mixed into the aluminum nitride single crystal 19 grown from the heating element 8. As a result, the amount of carbon mixed into the aluminum nitride single crystal 19 can be sufficiently reduced.
- the growth vessel 7 is made of a material having corrosion resistance against aluminum gas, the growth vessel 7 is sufficiently suppressed from being corroded by the aluminum gas. For this reason, leakage of aluminum gas from the growth vessel 7 is sufficiently suppressed, and mixing of aluminum into the heating element 8 is sufficiently suppressed. As a result, the difference in thermal expansion coefficient can be made sufficiently small in the heating element 8, and deformation of the heating element 8 and generation of cracks in the heating element 8 can be sufficiently suppressed when the temperature of the heating element 8 is lowered. Can do. Therefore, the manufacturing apparatus 100 can be used repeatedly as well as once.
- the present invention is not limited to the above embodiment.
- the growth container 7 and the heating element 8 are in contact with each other, but the growth container 7 and the heating element 8 may be separated from each other.
- the aluminum nitride raw material 6 can be heated via the growth vessel 7 by the radiant heat from the heating element 8. If the heating element 8 and the growth container 7 are separated from each other, even if the aluminum gas leaks from the growth container 7, the heating element 8 comes into contact with the heating element 8 after the aluminum gas is diluted. For this reason, the reaction between tungsten and aluminum gas is more sufficiently suppressed than when the heating element 8 and the growth vessel 7 are in contact with each other. Can be more sufficiently suppressed.
- the heat generating body used for this invention does not need to be a crucible, and may have various shapes, such as plate shape, spherical shape, and rod shape.
- the heat generating body is not limited to one, and may have a plurality of heat generating portions.
- the plurality of heat generating portions may be in contact with each other or may be separated from each other.
- the heating element 8 generates heat by induction heating with the high frequency coil 3, but the high frequency coil 3 is not necessarily required. In this case, the heating element 8 can be heated by resistance heating.
- the manufacturing apparatus 100 includes the housing part 2 and the high-frequency coil 3 in addition to the crystal growth part 1, but may be configured by only the crystal growth part 1.
- Example 1 An aluminum nitride single crystal was manufactured as follows using the manufacturing apparatus shown in FIG. That is, first, the cover 18 of the heat insulating material 9 made of carbon was removed, the cover 15 of the heating element 8 made of tungsten alone was removed, and the cover 12 of the growth vessel 7 made of tantalum carbide (TaC) was removed. . And the aluminum nitride powder which is a raw material was accommodated in the accommodating part 10 of the growth container 7. FIG. On the other hand, a seed crystal 13 having a diameter of 2 inches and a thickness of 0.5 mm was supported on the lid 12 by an adhesive. At this time, 6H—SiC (0001) was used as a seed crystal.
- the crystal growth part 1 was installed in the accommodating part 2.
- the inside of the accommodating part 2 was evacuated using the vacuum pump. Thereafter, nitrogen gas was introduced as an inert gas from the gas inlet 4 into the accommodating portion 2 at a flow rate of 500 sccm, and the gas in the accommodating portion 2 was discharged from the gas outlet 5. In this way, the pressure in the container 2 was maintained at 100 Torr.
- the raw material part temperature and the growth part temperature of the growth vessel 7 were set to 1870 ° C. and 1800 ° C., respectively. Then, an aluminum nitride single crystal was grown for 200 hours.
- Example 2 As shown in Table 1, the seed crystal was changed to the aluminum nitride crystal produced in Example 1, the pressure in the container was changed to 250 Torr, and the growth part temperature and the raw material part temperature were changed to 2000 ° C. and 2100 ° C., respectively. An aluminum nitride crystal was grown in the same manner as in Example 1 except that.
- Example 3 As shown in Table 1, the seed crystal was changed to the aluminum nitride single crystal produced in Example 1, the pressure in the accommodating part was changed to 500 Torr, and the growth part temperature and the raw material part temperature were set to 2200 ° C. and 2320 ° C., respectively. An aluminum nitride single crystal was grown in the same manner as in Example 1 except for the change.
- Example 2 As shown in Table 1, an aluminum nitride crystal was grown in the same manner as in Example 2 except that the constituent material of the heating element was changed to graphite and the seed crystal was changed to aluminum nitride.
- Example 3 As shown in Table 1, aluminum nitride crystals were grown in the same manner as in Example 3 except that the constituent material of the growth vessel was changed to tungsten alone and no heating element was used.
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Abstract
Description
図1に示す製造装置を用いて以下のようにして窒化アルミニウム単結晶を製造した。即ち、まずカーボンからなる断熱材9の蓋体18を外し、タングステン単体からなる発熱体8の蓋体15を外し、炭化タンタル(TaC)からなる成長容器7の蓋体12を外した状態にした。そして、成長容器7の収納部10に、原料である窒化アルミニウム粉末を収納した。一方、蓋体12には、接着剤によって、直径2インチ、厚さ0.5mmの種結晶13を担持させた。このとき、種結晶としては、6H-SiC(0001)を用いた。
表1に示すように、種結晶を、実施例1で作製した窒化アルミニウム結晶に変更し、収容部内の圧力を250Torrに変更し、成長部温度と原料部温度をそれぞれ2000℃、2100℃に変更したこと以外は実施例1と同様にして窒化アルミニウム結晶を成長させた。
表1に示すように、種結晶を、実施例1で作製した窒化アルミニウム単結晶に変更し、収容部内の圧力を500Torrに変更し、成長部温度と原料部温度をそれぞれ2200℃、2320℃に変更したこと以外は実施例1と同様にして窒化アルミニウム単結晶を成長させた。
表1に示すように、発熱体の構成材料を黒鉛に変更したこと以外は実施例1と同様にして窒化アルミニウム結晶を成長させた。
表1に示すように、発熱体の構成材料を黒鉛に変更し、種結晶を窒化アルミニウムに変更したこと以外は実施例2と同様にして窒化アルミニウム結晶を成長させた。
表1に示すように、成長容器の構成材料をタングステン単体に変更し、発熱体を使用しなかったこと以外は実施例3と同様にして窒化アルミニウム結晶を成長させた。
窒化アルミニウム単結晶の厚さを測定し、下記式:
成長速度(μm/h)=(窒化アルミニウム単結晶の厚さ)/200h
に基づいて成長速度を算出した。結果を表1に示す。
窒化アルミニウム単結晶について、X線回折装置を用いて窒化アルミニウム(0002)反射のロッキングカーブを得た。そして、このロッキングカーブの半値幅(FWHM:Full Width at Half Maximum)を測定した。結果を表1に示す。
窒化アルミニウム単結晶について、二次イオン質量分析計(SIMS:Secondary Ion Mass Spectrometry)でカーボン濃度の定量分析を行った。結果を表1に示す。
7…成長容器
8…発熱体
10…収納部
11…本体部
12…蓋体
13…種結晶
14…本体部
15…蓋体
19…窒化アルミニウムの単結晶
100…窒化アルミニウム単結晶の製造装置
Claims (7)
- 窒化アルミニウム原料を加熱して昇華させ、種結晶に窒化アルミニウムを再結晶させることにより窒化アルミニウム単結晶を製造する窒化アルミニウム単結晶の製造装置であって、
前記窒化アルミニウム原料を収納し、前記窒化アルミニウム原料の昇華時に発生するアルミニウムガスに対して耐腐食性を有する材料からなる成長容器と、
前記成長容器の外側に設けられ、前記成長容器を介して前記窒化アルミニウム原料を加熱する発熱体とを備え、
前記成長容器が、前記窒化アルミニウムを収納する収納部を有する本体部と、前記本体部の前記収納部を密閉する蓋体とを有し、
前記発熱体が、タングステンを含む金属材料で構成される窒化アルミニウム単結晶の製造装置。 - 前記成長容器を構成する材料が、アルミニウムのイオン半径の1.37倍以上1.85倍以下のイオン半径を有する金属の炭化物または窒化物である請求項1に記載の窒化アルミニウム単結晶の製造装置。
- 前記成長容器を構成する材料が、炭化タンタル、窒化ジルコニウム、窒化タングステン及び窒化タンタルからなる群より選ばれる少なくとも1種である請求項1又は2に記載の窒化アルミニウム単結晶の製造装置。
- 前記発熱体を構成する金属材料がタングステン単体である請求項1~3のいずれか一項に記載の窒化アルミニウム単結晶の製造装置。
- 前記発熱体と前記成長容器とが接触している請求項1~4のいずれか一項に記載の窒化アルミニウム単結晶の製造装置。
- 前記発熱体と前記成長容器とが離間している請求項1~4のいずれか一項に記載の窒化アルミニウム単結晶の製造装置。
- 請求項1~6のいずれか一項に記載の窒化アルミニウム単結晶の製造装置を用いて窒化アルミニウム単結晶を製造する窒化アルミニウム単結晶の製造方法であって、
前記成長容器の前記本体部における前記収納部に前記窒化アルミニウム原料を収納し、前記蓋体に種結晶を固定し、前記蓋体で前記収納部を密閉する第1工程と、
前記発熱体を発熱させ、前記成長容器を介して前記窒化アルミニウム原料を加熱して昇華させ、前記蓋体に固定された前記種結晶に窒化アルミニウムを再結晶させることにより前記窒化アルミニウム単結晶を製造する第2工程とを含む、窒化アルミニウム単結晶の製造方法。
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EP11840361.7A EP2639345A4 (en) | 2010-11-10 | 2011-11-09 | APPARATUS AND METHOD FOR PRODUCING ALUMINUM NITRIDE MONOCRYSTAL |
CN2011800538057A CN103249877A (zh) | 2010-11-10 | 2011-11-09 | 氮化铝单晶的制造装置和制造方法 |
US13/891,536 US20130239878A1 (en) | 2010-11-10 | 2013-05-10 | Apparatus and method for production of aluminum nitride single crystal |
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CN107541783A (zh) * | 2017-08-21 | 2018-01-05 | 苏州奥趋光电技术有限公司 | 一种氮化铝单晶生长方法 |
CN107466122A (zh) * | 2017-08-22 | 2017-12-12 | 苏州三桓电子科技有限公司 | 非接触式电感加热体于制备雾和/或烟生成装置中的用途 |
CN107454700A (zh) * | 2017-08-22 | 2017-12-08 | 苏州三桓电子科技有限公司 | 非接触式电感加热体于制备雾和/或烟生成装置中的用途 |
CN107829134B (zh) * | 2017-11-22 | 2020-06-26 | 北京大学 | 一种无需籽晶粘接技术的氮化铝单晶生长装置及方法 |
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