WO2011130925A1 - 聚光装置、其制造方法和太阳能电池*** - Google Patents
聚光装置、其制造方法和太阳能电池*** Download PDFInfo
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- WO2011130925A1 WO2011130925A1 PCT/CN2010/072162 CN2010072162W WO2011130925A1 WO 2011130925 A1 WO2011130925 A1 WO 2011130925A1 CN 2010072162 W CN2010072162 W CN 2010072162W WO 2011130925 A1 WO2011130925 A1 WO 2011130925A1
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- conversion
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/0547—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means comprising light concentrating means of the reflecting type, e.g. parabolic mirrors, concentrators using total internal reflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/0549—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means comprising spectrum splitting means, e.g. dichroic mirrors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/055—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means where light is absorbed and re-emitted at a different wavelength by the optical element directly associated or integrated with the PV cell, e.g. by using luminescent material, fluorescent concentrators or up-conversion arrangements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
Definitions
- the upconversion material in the upconversion layer 200 can include halides, oxides, sulfides, or combinations thereof that are single or double doped with rare earth ions.
- the halide is preferably a fluoride
- the oxide may be a rare earth oxide, zinc oxide, zirconium oxide or a composite oxide
- the sulfide may be a rare earth sulfide.
- the up-conversion material may be, for example but not limited to, BaY 2 F 8 , KZnF 3 , NaYF 4 , NaYb(WO 4 ) 2 , Ga 2 S 3 -La 2 O 3 , CaS, which are doped with or doped with rare earth ions.
- the solar cell system 30 includes the concentrating device 10 and the solar cell device 20 described above.
- the structure of the concentrating device 10 is as described above.
- the same components in FIG. 2 and FIG. 1 have substantially the same structure and composition, and are not described herein again.
- the concentrating device 10 mainly combines the wavelength conversion function of the up-conversion material, the reflection effect of the photonic crystal on the light, and the convergence of the concave object on the light. Specifically, as shown in FIG. 2, under the illumination of the sun light 40, first incident on the up-conversion layer 200, the long-wavelength light in the solar ray 40 is absorbed by the light-converting material in the up-conversion layer 200, and emits short-wavelength light. The remaining portion of the light that is not absorbed by the light-converting material will pass through the up-converting layer, and both of the light reach the surface of the photonic crystal layer 300, and both pass through the reflection of the photonic crystal of the layer, and then pass through the concave parabolic concave.
- a method for fabricating a concentrating device includes the following steps:
- S01 selecting a concentrating substrate, the concentrating substrate having a rotating parabolic concave surface
- a concentrating substrate 100 having a uniform thickness such as a glass substrate or the like, is selected.
- the concentrating substrate 100 may also be subjected to pretreatment, such as cleaning the substrate and drying for use.
- the rotating parabolic concave surface 101 may be subjected to a buffing treatment or a plating (e.g., aluminum film) treatment or the like.
- the photonic crystal layer 300 may employ, for example, vacuum ion plating, ultra-high vacuum electron beam evaporation, vacuum magnetron sputtering, vacuum evaporation, chemical vapor deposition, sol-gel method, self-assembly method, and nature.
- a deposition method, coating, painting, spraying, nanoimprinting or the like is formed on the rotating parabolic concave surface 101 and then dried. The specific method can be selected according to the material of the photonic crystal.
- the up-conversion layer 200 can be formed on the photonic crystal by using, but not limited to, vacuum ion plating, vacuum magnetron sputtering, vacuum evaporation, chemical vapor deposition, sol-gel method, coating, painting, spraying, and the like.
- the surface of layer 300 can be formed on the photonic crystal by using, but not limited to, vacuum ion plating, vacuum magnetron sputtering, vacuum evaporation, chemical vapor deposition, sol-gel method, coating, painting, spraying, and the like.
- the surface of layer 300 is not limited to, vacuum ion plating, vacuum magnetron sputtering, vacuum evaporation, chemical vapor deposition, sol-gel method, coating, painting, spraying, and the like.
- the method of forming the up-conversion layer 200 may include the following steps: using the source compound of each element in the above conversion material as a raw material
- the sol-gel method is used to form the up-converting material nanoparticles, and the up-converting material nanoparticles are uniformly dispersed in the organic material, and after being uniformly stirred, the organic material in which the up-converting material nanoparticles are dispersed is applied to the photonic crystal layer 200.
- the film is cured at a temperature of 40-80 ° C for 10-30 hours to form an up-converting film layer of a desired thickness.
- the prepared photonic crystal film is formed by in-situ curing at 80 ° C for 10 hours to form an up-conversion film having a thickness of about 0.1 ⁇ m, which converts 980 nm infrared light into a peak of about 500 nm. Visible light.
- the photons in this band can be absorbed and utilized by the organic solar cell more efficiently, and the efficiency and life of the solar cell can be effectively improved by the reflection of the photonic crystal film and the convergence of the concave glass to the sunlight.
- ultra-high vacuum electron beam evaporation is used to alternately grow SiO 2 and TiO 2 films on the substrate, 8 layers each, and SiO 2 and TiO 2 are designed to have a thickness of 30 Nm, forming a total reflection visible light photonic crystal layer having a thickness of about 480 nm;
- step (2) uniformly disperse 3 g of BaY 2 F 8 : Yb 3+ /Er 3+ nanoparticles (particle size of about 15 nm) in 10 g of polyurethane, stir them evenly, and then paint them in step (2).
- the prepared photonic crystal layer was formed by in-situ curing at 60 ° C for 24 hours to form an up-conversion film having a thickness of about 10 ⁇ m, which can convert infrared light of 950-1000 nm into a peak of about 500-520. Visible light in nm.
- the photons in this band can be absorbed and utilized by the organic solar cell more efficiently, and the efficiency and life of the solar cell can be effectively improved by the reflection of the photonic crystal layer and the convergence of the concave plexiglass to the sunlight.
- the structure of the concentrating device of this embodiment is as shown in FIG. 1 , wherein the concentrating substrate 100 is a concave ceramic having a rotating parabolic concave surface 101, the photonic crystal layer 300 is made of silicone rubber and TiO 2 , and the photonic crystal layer 300 has a thickness of 5 About ⁇ m, the up-conversion material of the up-conversion layer 200 is ZrF 2 -SiO 2 : Er 3+ , and the thickness of the up-conversion layer 200 is about 15 ⁇ m.
- the polymer polymer matrix material silicone rubber is first coated on the substrate, and then the monodisperse colloidal particles TiO having a particle diameter of 200 nm are nano-imprinted. 2 Filling into the polymer polymer matrix silicone rubber, the monodisperse colloidal particles form a face-centered cubic structure in the polymer matrix material to form a total reflection visible light photonic crystal layer having a thickness of about 5 ⁇ m. And drying it;
- the structure of the concentrating device of this embodiment is as shown in FIG. 1 , wherein the concentrating substrate 100 is a concave aluminum plate having a rotating parabolic concave surface 101, and the photonic crystal layer 300 is made of polymethyl methacrylate and SiO 2 , and the photonic crystal layer 300 is used.
- the thickness of the up-conversion layer 200 is about 1500 nm
- the up-conversion material of the up-conversion layer 200 is CaS:Eu 3+ /Sm 3+
- the thickness of the up-conversion layer 200 is about 1 ⁇ m.
- the high molecular polymer matrix material polymethyl methacrylate is coated on the substrate, and then the monodispersion particle size is 300 nm by nanoimprinting.
- the colloidal particles SiO 2 are filled into the high molecular polymer matrix material polymethyl methacrylate, so that the monodisperse colloidal particles form a face-centered cubic structure in the polymer matrix material to form a total reflection of about 10 ⁇ m in thickness. a photonic crystal layer of all visible light and dried;
- the prepared photonic crystal layer is formed by in-situ solidification at 70 ° C for 12 hours to form an up-conversion layer having a thickness of about 1 ⁇ m, and the up-conversion film can convert infrared light of 800 nm to 1600 nm into a peak value. Visible at 625 nm.
- the photons in this band can be absorbed and utilized by the organic solar cell more efficiently, and the efficiency and life of the solar cell can be effectively improved by the reflection of the photonic crystal layer and the convergence of the concave plexiglass to the sunlight.
- the up-conversion layer can convert infrared light of different wavelength bands into visible light of a specific wavelength, thereby allowing the organic solar cell to fully absorb and utilize the solar energy utilization rate.
- the layer can reflect light of a specific frequency and totally reflect all visible light, so that the reflection and the convergence of the concave plexiglass to sunlight can effectively improve the efficiency and life of the solar cell.
- this layered structure is simple and does not require complicated fittings. In the concentrating device manufacturing method, each layer structure is formed according to a predetermined step, and the process steps are simple, the production cost is low, and the application prospect is broad.
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- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Photovoltaic Devices (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
Claims (10)
- 一种聚光装置,其包括聚光基片,所述聚光基片具有一旋转抛物凹面,其特征在于,所述旋转抛物凹面上形成有光子晶体层,所述光子晶体层上形成有上转换层,所述上转换层包括对光谱具有上转换功能的上转换材料。
- 如权利要求1所述的聚光装置,其特征在于,所述上转换材料包括单掺或双掺稀土离子的卤化物、氧化物、硫化物或者它们的组合物。
- 如权利要求1所述的聚光装置,其特征在于,所述上转换材料包括单掺或双掺稀土离子的BaY2F8、KZnF3、NaYF4、NaYb(WO4)2、Ga2S3-La2O3、CaS、Cs3Lu2Br9、Y2O3、Gd2O3、ZrO2、ZnO、BaTiO3、ZrF2-SiO2或ZnO-SiO2。
- 如权利要求2或3所述的聚光装置,其特征在于,所述单掺或双掺的稀土离子包括Er3+、Ho3+、Tm3+、Pr3+、Yb3+/Ho3+、Yb3+/Tm3+、Yb3+/Pr3+、Yb3+/Er3+或Tb3+/Er3+。
- 如权利要求1所述的聚光装置,其特征在于,所述上转换层为包括有机材料及分散于有机材料中的上转换材料的薄膜,或者采用氧化物薄膜包覆上转换材料的复合结构;所述光子晶体层和上转换层均为顺沿所述旋转抛物凹面的凹状。
- 如权利要求1所述的聚光装置,其特征在于,所述光子晶体层的厚度为100纳米-2000纳米;所述上转换层的厚度为0.1微米-20微米。
- 一种聚光装置制造方法,其包括如下步骤:选取聚光基片,所述聚光基片具有一旋转抛物凹面;在所述旋转抛物凹面上形成光子晶体层;在所述光子晶体层上形成上转换层,所述上转换层包括对光谱具有上转换功能的上转换材料。
- 如权利要求7所述的聚光装置制造方法,其特征在于,所述上转换材料包括单掺或双掺稀土离子的卤化物、氧化物、硫化物或者它们的组合物,所述单掺或双掺的稀土离子包括Er3+、Ho3+、Tm3+、Pr3+、Yb3+/Ho3+、Yb3+/Tm3+、Yb3+/Pr3+、Yb3+/Er3+或Tb3+/Er3+。
- 如权利要求7所述的聚光装置制造方法,其特征在于,所述上转换层通过将溶胶-凝胶法形成的上转换材料颗粒分散于有机材料中后一起涂覆于所述光子晶体层上,或者采用化学共沉淀法将氧化物薄膜包覆上转换材料形成于所述光子晶体层上。
- 一种太阳能电池***,其包括太阳能电池装置以及如权利要求1-6任一项所述的聚光装置,所述太阳能电池设置于所述聚光装置的旋转抛物凹面对光汇聚形成的聚光平面上。
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CN102753886B (zh) | 2014-07-02 |
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