WO2011040397A1 - Procédé de fabrication d'un dispositif d'affichage à cristaux liquides - Google Patents

Procédé de fabrication d'un dispositif d'affichage à cristaux liquides Download PDF

Info

Publication number
WO2011040397A1
WO2011040397A1 PCT/JP2010/066800 JP2010066800W WO2011040397A1 WO 2011040397 A1 WO2011040397 A1 WO 2011040397A1 JP 2010066800 W JP2010066800 W JP 2010066800W WO 2011040397 A1 WO2011040397 A1 WO 2011040397A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid crystal
wavelength
light
sealing agent
meth
Prior art date
Application number
PCT/JP2010/066800
Other languages
English (en)
Japanese (ja)
Inventor
山口真史
羽田博成
塩谷サユ
矢野一晃
Original Assignee
積水化学工業株式会社
ウシオ電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 積水化学工業株式会社, ウシオ電機株式会社 filed Critical 積水化学工業株式会社
Priority to JP2010541614A priority Critical patent/JPWO2011040397A1/ja
Publication of WO2011040397A1 publication Critical patent/WO2011040397A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
    • G02F1/13775—Polymer-stabilized liquid crystal layers

Definitions

  • the present invention relates to a method of manufacturing a liquid crystal display device that can manufacture a liquid crystal display device that is low in cost and high in efficiency and has almost no liquid crystal contamination.
  • a PSA (Polymer Sustained Alignment) system that regulates the orientation direction of liquid crystal molecules by a polymer structure instead of a rib structure formed inside a cell for the purpose of improving contrast and response speed.
  • a PSA type liquid crystal display panel a liquid crystal material containing a photopolymerizable component is injected into a cell, and an ultraviolet ray is irradiated while applying a voltage to the injected liquid crystal material, whereby a polymer is formed in the cell. A structure is formed.
  • a frame-shaped seal is obtained by applying a photo-curable sealant to the surface of one light-transmitting substrate constituting the cell.
  • the agent layer is formed and the liquid crystal material containing the monomer is applied to the region surrounded by the sealant layer on the surface of the one light-transmitting substrate, the other light-transmitting substrate is overlaid.
  • the sealing agent layer is irradiated with light by a display panel laminating device, the sealing agent is cured, and two light-transmitting substrates are laminated.
  • a polymer structure is formed by irradiating the monomer contained in the liquid crystal material with ultraviolet rays, and a cell into which the liquid crystal material is injected is formed.
  • the sealing agent is cured with visible light, and then the liquid crystal is cured with ultraviolet rays to form a cell, which is common to the blue phase method.
  • a lamp that emits light in the light absorption wavelength region of a photocurable sealing agent as a light source for irradiating the sealing agent layer with light as disclosed in Patent Document 1 And a light irradiation device having a filter that blocks light on the short wavelength side is used.
  • a lamp used in such a light irradiation apparatus a metal halide lamp is generally used.
  • a metal halide lamp is generally used.
  • An object of the present invention is to provide a method of manufacturing a liquid crystal display device that can manufacture a liquid crystal display device that is low in cost and high in efficiency and has almost no liquid crystal contamination.
  • the present invention includes a step 1 of forming a frame-shaped sealant layer on one substrate using a photocurable sealant containing a curable resin and a photopolymerization initiator, and is surrounded by the sealant layer.
  • Step 2 of dropping a liquid crystal material containing a polymerizable material and a photopolymerization initiator in the region, and bonding the one substrate and the other substrate through the sealing agent, and bonding the bonded substrate to the bonded substrate Irradiating light having a wavelength for photocuring the sealing agent to photocure the sealing agent, and irradiating light having a wavelength for photopolymerizing the liquid crystal material to photopolymerize the liquid crystal material.
  • the wavelength of light for photocuring the sealing agent is longer than the wavelength of light for photopolymerizing the liquid crystal material, and the sealing agent is photocured in the step 3.
  • the light of the wavelength is the LED element and the filter
  • the LED element has an emission peak wavelength within a wavelength region for photocuring the sealing agent and outside a wavelength region for photopolymerizing the liquid crystal material, And the half value width of this peak is 30 nm or less, and the filter overlaps with the wavelength for photopolymerizing the liquid crystal material on the shorter wavelength side than the emission peak wavelength in the light irradiated from the LED element.
  • the present inventors first examined the cause of the occurrence of display unevenness when a PSA type liquid crystal display panel was manufactured by a general light irradiation device using a metal halide lamp. As a result, it has been found that the cause is that the metal halide lamp exhibits a broad emission spectrum over a wide range of 200 to 600 nm.
  • the sensitivity wavelength of the photocurable sealant is about 200 to 450 nm
  • the wavelength for photopolymerizing the liquid crystal material is about 200 to 400 nm, depending on the reactive monomer used.
  • a part of the liquid crystal material is cured at the same time, which is considered to cause display unevenness.
  • a filter having a dielectric multilayer film to shield the light on the short wavelength side that cures the liquid crystal material. It is conceivable that the sealing agent is cured by irradiating.
  • a filter having a dielectric multilayer film is extremely dependent on an incident angle, and may not sufficiently shield light in a target wavelength range depending on the incident angle of light.
  • a filter that shields light on a relatively long wavelength side is used.
  • a filter that blocks light in a wide wavelength range most of the light emitted from the metal halide lamp is blocked, and the light utilization efficiency is extremely reduced.
  • the light actually irradiated onto the sealant is only light in a long wavelength region with a low irradiation amount. Since the sealant cannot be cured sufficiently with such low-dose and long-wavelength light, the sealant component elutes into the liquid crystal before the sealant is completely cured, causing liquid crystal contamination. It will cause unevenness.
  • the irradiation intensity of the metal halide lamp is set extremely high in order to secure the irradiation amount of light to the sealing agent, the irradiation amount of light on the short wavelength side that cannot be sufficiently shielded by the filter also increases. It becomes impossible to prevent a part of the liquid crystal material from being cured. In this way, even if an attempt is made to manufacture a PSA type liquid crystal display panel with a general light irradiation device using a metal halide lamp, either a part of the liquid crystal material is cured or liquid crystal contamination is caused by poor curing of the sealant. It is considered that display unevenness has occurred.
  • Metal halide lamps also have a problem in terms of energy saving.
  • the metal halide lamp requires a considerable time from the start of lighting until it reaches a steady lighting state, that is, it is difficult to instantaneously turn on, so in the light irradiation device, the lamp is continuously lit by providing a shutter mechanism. In this state, the irradiation object is irradiated with light when necessary by opening and closing the shutter of the shutter mechanism. Therefore, although the actual use time is extremely short, continuous irradiation is unavoidable and energy efficiency is low. In addition, the movable parts in the shutter mechanism are liable to cause a failure and the reliability of the apparatus is lowered.
  • the present inventor uses a sealant that is cured with light having a wavelength longer than the wavelength of light that photopolymerizes the liquid crystal material, and as a light irradiation device for irradiating light that cures the sealant,
  • An LED element having a light emission peak wavelength within the wavelength region for photocuring the sealant and outside the wavelength region for photopolymerizing the liquid crystal material and having a narrow half-value width of the light emission peak, and the light emission peak of the LED device
  • Manufacturing a low-cost, high-efficiency liquid crystal display device that is almost free from liquid crystal contamination by using a device that has a filter that blocks light in a region overlapping with the wavelength for photopolymerizing the liquid crystal material on the shorter wavelength side than the wavelength.
  • the LED element has an excellent feature that the emission wavelength is extremely sharp compared to a metal halide lamp.
  • the LED element has a very short time from the start of lighting until it reaches a steady lighting state, that is, it can be lit instantaneously, it does not need to be constantly lit like a metal halide lamp, and it also saves energy. Excellent. There is no need to provide a complicated shutter mechanism, and high reliability can be obtained.
  • a frame-shaped sealant layer is formed on one substrate using a photocurable sealant containing a curable resin and a photopolymerization initiator. I do.
  • the sealing agent is cured by light having a wavelength longer than the wavelength of light for photopolymerizing a liquid crystal material described later.
  • the sealing agent contains a curable resin and a photopolymerization initiator.
  • the curable resin preferably has a (meth) acryl group and an epoxy group. By having such a functional group, the resulting sealant can undergo two-stage curing, photocuring and thermal curing.
  • the preferable upper limit of the ratio of the epoxy group with respect to the total amount of a (meth) acryl group and an epoxy group is 40 mol%.
  • the ratio of the epoxy group exceeds 40 mol%, the solubility in the liquid crystal becomes high and the panel may be contaminated with unevenness.
  • a more preferred upper limit is 30 mol%.
  • Such curable resin is not particularly limited, and can be obtained, for example, by reacting (meth) acrylic acid with an ester compound obtained by reacting a compound having a hydroxyl group with (meth) acrylic acid and an epoxy compound.
  • Examples include epoxy (meth) acrylate, urethane (meth) acrylate obtained by reacting isocyanate with a (meth) acrylic acid derivative having a hydroxyl group.
  • the ester compound obtained by reacting the above (meth) acrylic acid with a compound having a hydroxyl group is not particularly limited, and examples of monofunctional compounds include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) ) Acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, isooctyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) ) Acrylate, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, methoxyethylene glycol (meth) acrylate, 2-ethoxyethyl (meth) acrylate, Lahydrofurfuryl (meth) acrylate, benzyl
  • the bifunctional one is not particularly limited.
  • 1,4-butanediol di (meth) acrylate, 1 3-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, 1,10-decanediol di (meth) acrylate 2-n- Butyl-2-ethyl-1,3-propanediol di (meth) acrylate, dipropylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, polypropylene glycol (meth) acrylate, ethylene glycol di (meth) acrylate , Diethylene glycol di (meth) acryl , Tetraethylene glycol di (meth) acryl
  • ester compounds obtained by reacting the above (meth) acrylic acid with a compound having a hydroxyl group those having 3 or more functional groups are not particularly limited.
  • the epoxy (meth) acrylate obtained by reacting the (meth) acrylic acid and the epoxy compound is not particularly limited.
  • an epoxy resin and (meth) acrylic acid are combined in the presence of a basic catalyst according to a conventional method. And the like obtained by reacting with.
  • the epoxy compound used as a raw material for synthesizing the above epoxy (meth) acrylate is not particularly limited, and is bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, 2,2′-diallyl bisphenol A type epoxy.
  • Resin hydrogenated bisphenol type epoxy resin, propylene oxide added bisphenol A type epoxy resin, resorcinol type epoxy resin, biphenyl type epoxy resin, sulfide type epoxy resin, ether type epoxy resin, dicyclopentadiene type epoxy resin, naphthalene type epoxy resin, Phenol novolac type epoxy resin, orthocresol novolak type epoxy resin, dicyclopentadiene novolac type epoxy resin, biphenyl novolac type epoxy resin, naphthalene fe Runoborakku type epoxy resin, glycidyl amine type epoxy resin, alkyl polyol type epoxy resin, rubber modified epoxy resin, glycidyl ester compounds, bisphenol A type episulfide resins.
  • Examples of commercially available resins among the bisphenol A type epoxy resins include Epicoat 828EL, Epicoat 1004 (all manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON EXA-850CRP (manufactured by DIC Corporation), and the like.
  • Examples of commercially available resins among the bisphenol F-type epoxy resins include Epicoat 806, Epicoat 4004 (all manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON EXA-830CRP (manufactured by DIC Corporation), and the like.
  • Examples of the commercially available resin among the bisphenol S type epoxy resins include EPICLON EXA-1514 (manufactured by DIC).
  • Examples of the commercially available resin among the 2,2′-diallylbisphenol A type epoxy resins include RE-810NM (manufactured by Nippon Kayaku Co., Ltd.). Examples of commercially available resins among the above hydrogenated bisphenol type epoxy resins include EPICLON EXA-7015 (manufactured by DIC). Examples of commercially available resins among the propylene oxide-added bisphenol A type epoxy resins include EP-4000S (manufactured by ADEKA). Among the resorcinol type epoxy resins, examples of commercially available resins include EX-201 (manufactured by Nagase ChemteX Corporation).
  • Examples of commercially available resins among the above biphenyl type epoxy resins include Epicoat YX-4000H (manufactured by Japan Epoxy Resin Co., Ltd.). Examples of commercially available resins among the sulfide type epoxy resins include YSLV-50TE (manufactured by Toto Kasei Co., Ltd.). Examples of the commercially available resin among the ether type epoxy resins include YSLV-80DE (manufactured by Tohto Kasei Co., Ltd.). Among the above-mentioned dicyclopentadiene type epoxy resins, commercially available resins include, for example, EP-4088S (manufactured by ADEKA).
  • Examples of the naphthalene type epoxy resin include EPICLON HP4032, EPICLON EXA-4700 (both manufactured by DIC).
  • Examples of commercially available phenol novolac epoxy resins include EPICLON N-770 (manufactured by DIC).
  • Examples of the ortho-cresol novolac type epoxy resins include, for example, EPICLON N-670-EXP-S (manufactured by DIC).
  • Examples of the commercially available resin among the dicyclopentadiene novolac type epoxy resins include EPICLON HP7200 (manufactured by DIC).
  • Examples of commercially available resins among the biphenyl novolac type epoxy resins include NC-3000P (manufactured by Nippon Kayaku Co., Ltd.).
  • examples of commercially available resins include ESN-165S (manufactured by Tohto Kasei Co., Ltd.).
  • Examples of commercially available resins among the glycidylamine type epoxy resins include Epicoat 630 (manufactured by Japan Epoxy Resin), EPICLON 430 (manufactured by DIC), TETRAD-X (manufactured by Mitsubishi Gas Chemical Company), and the like. .
  • alkyl polyol type epoxy resins commercially available resins include, for example, ZX-1542 (manufactured by Toto Kasei), EPICLON 726 (manufactured by DIC), Epolite 80MFA (manufactured by Kyoeisha Chemical Co., Ltd.), Denacol EX-611, (Manufactured by Nagase ChemteX Corporation).
  • commercially available resins include, for example, YR-450, YR-207 (both manufactured by Tohto Kasei Co., Ltd.), Epolide PB (manufactured by Daicel Chemical Industries), and the like.
  • Examples of commercially available compounds among the glycidyl ester compounds include Denacol EX-147 (manufactured by Nagase ChemteX Corporation).
  • Examples of the commercially available resin among the bisphenol A type episulfide resins include Epicoat YL-7000 (manufactured by Japan Epoxy Resin Co., Ltd.).
  • epoxy resins include, for example, YDC-1312, YSLV-80XY, YSLV-90CR (all manufactured by Tohto Kasei Co., Ltd.), XAC4151 (manufactured by Asahi Kasei Co., Ltd.), Epicoat 1031 and Epicoat 1032 ( Any of them may be Japan Epoxy Resin), EXA-7120 (DIC), TEPIC (Nissan Chemical).
  • the epoxy (meth) acrylate obtained by reacting the (meth) acrylic acid with an epoxy compound is, for example, 360 parts by weight of resorcinol type epoxy resin (EX-201, manufactured by Nagase ChemteX Corporation), polymerization It can be obtained by reacting 2 parts by weight of p-methoxyphenol as an inhibitor, 2 parts by weight of triethylamine and 210 parts by weight of acrylic acid as a reaction catalyst for 5 hours while refluxing and stirring at 90 ° C.
  • resorcinol type epoxy resin EX-201, manufactured by Nagase ChemteX Corporation
  • epoxy (meth) acrylate for example, Evecryl 860, Evekril 3200, Evekrill 3201, Evekrill 3412, Evekrill 3700, Evekrill 3700, Evekrill 3702, Evekril 3703, Evekrill 3800, Evekril 6040, RDX63182 (all manufactured by Daicel Cytec), EA-1010, EA-1020, EA-5323, EA-5520, EA-CHD, EMA-1020 (all manufactured by Shin-Nakamura Chemical Co., Ltd.), epoxy ester M-600A, Epoxy ester 40EM, Epoxy ester 70PA, Epoxy ester 200PA, Epoxy ester 80MFA, Epoxy ester 3002M, Epoxy ester 3002A, D Xyester 1600A, Epoxy ester 3000M, Epoxy ester 3000A, Epoxy ester 200EA, Epoxy ester 400EA (all manufactured by Kyoeisha Chemical Co., Ltd.),
  • the urethane (meth) acrylate obtained by reacting the isocyanate with a (meth) acrylic acid derivative having a hydroxyl group is, for example, a (meth) acrylic acid derivative 2 having a hydroxyl group with respect to 1 equivalent of a compound having two isocyanate groups.
  • the equivalent weight can be obtained by reacting in the presence of a catalytic amount of a tin-based compound.
  • Isocyanate that is a raw material for urethane (meth) acrylate obtained by reacting the above-mentioned isocyanate with a (meth) acrylic acid derivative having a hydroxyl group is not particularly limited.
  • the isocyanate used as the raw material of the urethane (meth) acrylate obtained by making the said isocyanate react with the (meth) acrylic acid derivative which has a hydroxyl group is not specifically limited, For example, ethylene glycol, glycerol, sorbitol, a trimethylol propane, Chain-extended isocyanate compounds obtained by reaction of polyols such as (poly) propylene glycol, carbonate diol, polyether diol, polyester diol, polycaprolactone diol and excess isocyanate can also be used.
  • the (meth) acrylic acid derivative having a hydroxyl group which is a raw material for the urethane (meth) acrylate obtained by reacting the isocyanate with a hydroxyl group-containing (meth) acrylic acid derivative, is not particularly limited.
  • 2-hydroxyethyl Commercial products such as (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, ethylene glycol, propylene glycol, 1,3-propanediol, 1 Mono (meth) acrylates of dihydric alcohols such as 1,3-butanediol, 1,4-butanediol, polyethylene glycol, etc., mono (meth) acrylates of trivalent alcohols such as trimethylolethane, trimethylolpropane, glycerin or the like (Meth) acrylates, epoxy acrylates such as bisphenol A-modified epoxy acrylate.
  • Examples of commercially available urethane (meth) acrylates include M-1100, M-1200, M-1210, M-1600 (all manufactured by Toagosei Co., Ltd.), Evecryl 230, Evekril 270, Evekril 4858, Evekril 8402, Evecryl 8804, Evecril 8803, Evecril 8807, Evecril 9260, Evecril 1290, Evecril 5129, Evecril 2102, Evecril 4827, Evecril 6700, Evecril 220, Evecryl 2220 (all manufactured by Daicel Cytec Co., Ltd.), Art Resin U 9 Art Resin UN-9000A, Art Resin UN-7100, Art Resin UN-1255, Art Resin UN-330, Art Resin UN-3320HB, Art Res UN-1200TPK, Art Resin SH-500B (all manufactured by Negami Kogyo Co., Ltd.), U-122P, U-108A, U-340P, U-4HA, U-6HA, U-324
  • the resin having a (meth) acryl group is preferably a resin having a hydrogen bonding unit such as —OH group, —NH— group, —NH 2 group, etc. from the viewpoint of suppressing adverse effects on the liquid crystal. From the above, epoxy (meth) acrylate is particularly preferable.
  • the resin having a (meth) acryl group preferably has 2 to 3 (meth) acryl groups in the molecule because of its high reactivity.
  • the preferable minimum of the light absorption coefficient in the wavelength of 405 nm measured in methanol or acetonitrile solvent is 50 mL / g * cm. If the extinction coefficient at a wavelength of 405 nm is less than 50 mL / g ⁇ cm, the sealing agent may be insufficiently cured and cause liquid crystal contamination.
  • a more preferable lower limit of the extinction coefficient is 70 mL / g ⁇ cm. The higher the extinction coefficient is, the higher the reactivity tends to be, so there is no particular upper limit.
  • the photopolymerization initiator used for the sealing agent is a wavelength region in which the absorption wavelength region when the concentration in methanol or acetonitrile solvent is 0.1% by weight is cut by a filter in the emission wavelength region of the LED element described later It is preferable to have an overlap of 50% or more with the emission wavelength region on the longer wavelength side.
  • the photopolymerization initiator used for the sealing agent is preferably one that does not generate radicals when heated at a temperature of 130 ° C. or lower.
  • the photopolymerization initiator used in the sealing agent generates radicals by heating at a temperature of 130 ° C. or lower, a decomposition product of the photopolymerization initiator is produced during the production of a liquid crystal display device, resulting in liquid crystal contamination. May cause.
  • the long wavelength side end of an absorption wavelength region is less than 450 nm.
  • the photopolymerization initiator used for the sealing agent absorbs light having a wavelength of 450 nm or more, it reacts even under a yellow lamp, and the handling property of the sealing agent may be deteriorated.
  • photopolymerization initiator used for the sealing agent for example, benzophenone compounds, acetophenone compounds, acylphosphine oxide compounds, titanocene compounds, oxime ester compounds, benzoin ether compounds, benzyl, thioxanthone, etc. are suitable. Can be used. These photoinitiators may be used independently and may use 2 or more types together. Examples of commercially available photopolymerization initiators include IRGACURE 379, IRGACURE 819, IRGACURE OXE01, IRGACURE OXE02, IRGACURE 907, DAROCUR TPO, ITX (all of which are manufactured by Ciba Japan). Is mentioned. In addition, when using together 2 or more types of photoinitiators, using IRGACURE907 and ITX together can be considered, for example.
  • a preferable minimum is 0.2 weight% and a preferable upper limit is 10 weight%. If the content of the photopolymerization initiator used in the sealing agent is less than 0.2% by weight, curing may be insufficient. If the content exceeds 10% by weight, liquid crystal contamination may occur or adhesion to the substrate may occur. May decrease.
  • the more preferable lower limit of the content of the photopolymerization initiator used in the sealing agent is 1.0% by weight, and the more preferable upper limit is 5.0% by weight.
  • the sealing agent preferably further contains a thermosetting agent.
  • the said thermosetting agent is not specifically limited, For example, organic acid hydrazide, an imidazole derivative, an amine compound, a polyhydric phenol type compound, an acid anhydride etc. are mentioned. Among these, solid organic acid hydrazide is preferably used.
  • the solid organic acid hydrazide is not particularly limited, and examples thereof include sebacic acid dihydrazide, isophthalic acid dihydrazide, adipic acid dihydrazide, and the like. Examples of commercially available products include Amicure VDH and Amicure UDH (both Ajinomoto Fine Techno Co.), ADH (Otsuka Chemical Co., Ltd.) and the like.
  • the sealing agent may contain a silane coupling agent.
  • the silane coupling agent mainly serves as an adhesion aid for improving the adhesion between the sealing agent and the substrate.
  • the silane coupling agent is not particularly limited, but is excellent in the effect of improving the adhesion to the substrate, and can be prevented from flowing into the liquid crystal material by being chemically bonded to the curable resin.
  • ⁇ -methacryloxy Propyltrimethoxysilane, ⁇ -aminopropyltrimethoxysilane, ⁇ -mercaptopropyltrimethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -isocyanatopropyltrimethoxysilane and the like are preferably used.
  • These silane coupling agents may be used alone or in combination of two or more.
  • the sealing agent may contain a filler for the purpose of improving adhesiveness due to the stress dispersion effect, improving the linear expansion coefficient, and the like.
  • the filler is not particularly limited, for example, talc, asbestos, silica, diatomaceous earth, smectite, bentonite, calcium carbonate, magnesium carbonate, alumina, montmorillonite, diatomaceous earth, zinc oxide, iron oxide, magnesium oxide, tin oxide, titanium oxide, Inorganic fillers such as magnesium hydroxide, aluminum hydroxide, glass beads, silicon nitride, barium sulfate, gypsum, calcium silicate, sericite activated clay, aluminum nitride, polyester fine particles, polyurethane fine particles, vinyl polymer fine particles, acrylic polymer fine particles Organic fillers such as
  • the sealing agent has an upper limit of viscosity of 600,000 mPa ⁇ s measured at 25 ° C. using an E-type viscometer.
  • the minimum with said preferable viscosity is 100,000 mPa * s, and a preferable upper limit is 450,000 mPa * s.
  • the E-type viscometer for measuring the viscosity of the sealant is not particularly limited, and examples thereof include “DV-III” manufactured by Brookfield.
  • the method for producing the sealing agent is not particularly limited, and a predetermined amount of the curable resin, the photopolymerization initiator, and the thermosetting agent, the silane coupling agent, etc., which are blended as necessary, is conventionally used.
  • the method of mixing by a well-known method is mentioned. At this time, in order to remove the ionic impurities contained, it may be brought into contact with an ion-adsorbing solid.
  • step 2 is performed in which a liquid crystal material containing a polymerizable material and a photopolymerization initiator is dropped into a region surrounded by the sealing agent layer.
  • the liquid crystal material contains a polymerizable material and a photopolymerization initiator.
  • a liquid crystal material for example, materials disclosed in Japanese Patent Laid-Open Nos. 2003-307720, 2009-104119, and 2009-132718 can be used.
  • Step 3 is performed to irradiate and photocur the sealing agent.
  • the preferable lower limit is 100 mJ / cm 2 of integrated amount of light at a wavelength of 405nm
  • a preferred upper limit is 5000 mJ / cm 2.
  • the integrated quantity of light is less than 100 mJ / cm 2, not cured sufficiently above sealant, to contaminate the liquid crystal may cause display unevenness, it exceeds 5000 mJ / cm 2, the liquid crystal material one The part may be superposed and cause display unevenness.
  • the minimum with said more preferable integrated light quantity is 1000 mJ / cm ⁇ 2 >, and a more preferable upper limit is 3000 mJ / cm ⁇ 2 >.
  • the light having a wavelength for photocuring the sealant in the step 3 is irradiated by a light irradiation device having an LED element and a filter.
  • the LED element is selected and used within the wavelength range for photocuring the sealant and having an emission peak wavelength outside the wavelength range for photopolymerizing the liquid crystal material. If the emission peak wavelength is outside the wavelength range for photocuring the sealant, the sealant cannot be sufficiently cured. If the emission peak wavelength is within the wavelength range for photopolymerizing the liquid crystal material, the light of the liquid crystal material may be caused by light that cannot be cured sufficiently or completely blocked by a filter. Polymerization proceeds.
  • the half-value width of the light emission peak of the LED element is preferably 30 nm or less. When the half width exceeds 30 nm, the light use efficiency may be lowered, or the photopolymerization of the liquid crystal material may proceed due to light that cannot be completely blocked by the filter. There is no particular lower limit on the half width, and a narrower one is preferable, but a substantial lower limit is about 10 nm.
  • the LED element for example, a conventionally known LED element such as an indium (In) LED element or a gallium nitride (GaN) LED element containing aluminum (Al) can be used.
  • the light emission peak of the said LED element can obtain the LED element which has the light emission peak wavelength from 200 nm to an infrared region by adjusting the composition ratio of In, AlGa, and N in LED.
  • the emission peak wavelength is within the wavelength region for photocuring the sealant and the liquid crystal material is photopolymerized, and the half-value width of the emission peak is narrow.
  • an LED element having an emission peak wavelength of 360 to 420 nm and a half-value width of the emission peak of 30 nm or less may be selected and used.
  • the LED element having an emission peak wavelength of 360 to 420 nm and a half-value width of the emission peak of 10 to 30 nm a commercially available LED element may be used. It may be used.
  • the said filter cuts the light of the area
  • FIG. 5 is a curve diagram schematically showing the relationship between the emission spectrum of the LED element and the spectral characteristics of the filter in the method for manufacturing a liquid crystal display device of the present invention.
  • the LED element has an emission spectrum indicated by a curve (L)
  • the filter has a spectral characteristic indicated by a curve (F), that is, from the LED element.
  • the irradiated light light in a region overlapping with the wavelength for photopolymerizing the liquid crystal material 2 on the shorter wavelength side than the emission peak wavelength of the LED element (light in the hatched portion in FIG. 5) is cut.
  • the light from the LED element having a narrow emission spectrum wavelength region overlaps with the wavelength at which the liquid crystal material is photopolymerized on the shorter wavelength side than the emission peak wavelength. Because the light is irradiated through a filter that cuts the light in the region to be irradiated, the wavelength distribution of the irradiated light becomes extremely narrow. Therefore, by selecting the LED element according to the wavelength region for photocuring the sealing agent and the wavelength region for photopolymerizing the liquid crystal material, the polymerization reaction of the photopolymerizable component in the liquid crystal material does not proceed.
  • the sealing agent layer can be cured with high light utilization efficiency.
  • the said filter will not be specifically limited if it has the said light cut characteristic, For example, what has a dielectric multilayer film can be used. A commercially available filter may be used, but a custom-made product may be used when there is no suitable commercially available filter.
  • the said light irradiation apparatus arrange
  • a light irradiation unit (hereinafter also referred to as a light source segment) having an LED element to be turned on and a filter is selected according to the form of the sealing agent layer, and the sealing agent layer is selected.
  • light can be selectively irradiated. Therefore, higher energy efficiency can be obtained, and it is not necessary to provide a mask for selectively irradiating the sealant layer with light, so that the manufacturing cost can be reduced.
  • one LED element in the light source segment is deteriorated, it is possible to irradiate with a stable amount of light over the entire light source segment by increasing the irradiation intensity of the other LED elements.
  • the said light irradiation apparatus may have an LED package in which the said LED element is accommodated, and the said filter may be provided in this LED package. Since the light irradiation apparatus has such a configuration, it is not necessary to provide a large-area filter, and thus the cost of the filter can be reduced and the productivity can be improved.
  • a step 4 of photopolymerizing the liquid crystal material by irradiating light having a wavelength for photopolymerizing the liquid crystal material is performed.
  • the initial formation angle of the liquid crystal molecules can be controlled by applying a voltage while irradiating light having a wavelength for photopolymerizing the liquid crystal material.
  • FIG. 1 is an explanatory diagram showing an outline of a configuration in an example of a display panel bonding apparatus having the light irradiation device.
  • the display panel bonding apparatus (hereinafter simply referred to as “bonding apparatus”), a stage 10 on which a processing object is placed is provided on a base 11 via a support base 12. Above the stage 10, the light irradiation device 15 is arranged.
  • the processing object 1 of the bonding apparatus includes a liquid crystal material 2 and a sealing agent layer 3 that surrounds the liquid crystal material 2 so as to surround the liquid crystal material 2.
  • the processing object 1 in this example is for manufacturing a total of four display panels. In the processing object 1, as shown in FIG. 2, four liquid crystal materials are arranged vertically and horizontally apart from each other. 2 and four sealant layers 3 each surrounding one liquid crystal material 2 are formed.
  • the light irradiation device 15 is configured such that a plurality of light source segments 20 are arranged vertically and horizontally on an appropriate support (not shown).
  • a plurality of LED elements 25 are arranged on the surface of the same rectangular substrate 21, and a filter 30 is connected to the LED 30 on each surface of the LED elements 25. It is provided so as to cover the element 25.
  • a rectangular cylindrical light guide member 26 whose inner surface is a light reflecting surface is disposed at the peripheral portion of the surface of the substrate 21, and heat generated by the LED elements 25 is radiated to the back surface of the substrate 21.
  • a heat dissipating fin 27 is provided.
  • the number of LED elements 25 in each of the light source segments 20 is, for example, 5 to 16.
  • said light irradiation apparatus 15 when the light source segment 20 selected according to the shape of the sealing agent layer 3 in the process target object 1 among all the light source segments 20 act
  • FIG. 6 is an explanatory diagram showing a configuration of a light source segment in another example of the light irradiation device.
  • a plurality of LED packages 35 are disposed on the surface of the same rectangular substrate 21, and a rectangular cylindrical guide whose inner surface is a light reflecting surface is provided on the peripheral portion of the surface of the substrate 21.
  • the light member 26 is disposed, and on the back surface of the substrate 21, heat radiation fins 27 for radiating the heat generated by the LED package 35 are provided.
  • each of the LED packages 35 has a package substrate 36 having a rectangular recess 37 formed at the center, and the LED element 25 is disposed in the recess 37 of the package substrate 36.
  • a plate-like filter 30 is provided so as to close the recess 37 of the package substrate 36.
  • Reference numeral 28 denotes a light emitting portion of the light guide member 26.
  • the characteristics of the LED element 25 and the filter 30 are the same as those in the light source segment 20 shown in FIG.
  • the light irradiation apparatus can be variously modified as described below.
  • the filter 30 may be hemispherical having a lens function, as shown in FIG. Further, instead of providing the filter 30 in each of the LED elements 25, as shown in FIG. 9, a configuration in which one filter 30 is provided at the center position in the cylindrical hole of the light guide member 26 may be employed. . Furthermore, as shown in FIG. 9, an integrator lens 29 may be disposed at the tip side position in the cylindrical hole of the light guide member 26.
  • the filter 30 provided in the LED package 35 may be a hemispherical lens having a lens function, as shown in FIG. Further, the LED package 35 may be provided with a lens 31 on the surface of the plate-like filter 30 as shown in FIG.
  • the manufacturing method of the liquid crystal display device which can manufacture the liquid crystal display device which is low-cost and highly efficient and hardly has liquid-crystal contamination can be provided.
  • the method for manufacturing a liquid crystal display device of the present invention is particularly suitable for manufacturing a liquid crystal display device of a PSA system or a blue phase system.
  • the modification rate was measured by a method in which the obtained bisphenol F-type epoxy partial acrylate was dissolved in a hydrochloric acid-dioxane solution, and then the amount of hydrochloric acid consumed by the epoxy group was titrated with KOH.
  • Example 1 (Production of sealant) 100 parts by weight of bisphenol A type epoxy acrylate synthesized as a curable resin and 100 parts by weight of a synthesized bisphenol F type epoxy partial acrylate, and bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide ( “IRGACURE 819” manufactured by Ciba Japan, 3 parts by weight of an extinction coefficient of 899 ml / g ⁇ cm at a wavelength of 405 nm measured in a methanol solvent, and ⁇ -methacryloxypropyltrimethoxysilane (Shin-Etsu Silicone) as a silane coupling agent 3 parts by weight, KBM-503), 32 parts by weight of thermosetting agent (Ajinomoto Fine Techno Co., “Amicure VDH”), and spherical silica as a filler (manufactured by Admatechs, “SO-C1”) 40 Combined with parts by weight, a planetary stirrer
  • the obtained sealing agent was applied to one of the alignment film and the substrate with a transparent electrode with a dispenser so as to draw a rectangular frame.
  • an LED element emission peak wavelength is 385 nm, emission peak half-value width is 11 nm
  • a filter 380 nm
  • a light irradiation device having the following light transmittance of 0
  • After irradiating light with an integrated light amount of 3000 mJ / cm 2 and photocuring the sealing agent at 120 ° C. Heat cured for 1 hour.
  • ultraviolet rays were applied while applying a voltage between the substrates, and the liquid crystal material was aligned to produce a liquid crystal display panel.
  • the photopolymerization initiator was 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (manufactured by Ciba Japan, “IRGACURE”). 379 ", an absorption coefficient of 280 ml / g ⁇ cm at a wavelength of 405 nm measured in a methanol solvent), and a sealant and a liquid crystal display panel were obtained in the same manner as in Example 1 except that the weight was changed to 3 parts by weight.
  • Example 3 The photopolymerization initiator was 1- [4- (phenylthio) phenyl] -1,2-octanedione 2- (O-benzoyloxime) (Ciba Japan, “IRGACURE OXE01”, measured at 405 nm in acetonitrile solvent.
  • the sealing agent and the liquid crystal display panel were obtained in the same manner as in Example 1 except that the absorption coefficient was changed to 3 parts by weight.
  • Example 4 2,4,6-trimethylbenzoyldiphenylphosphine oxide (manufactured by Ciba Japan, “DAROCUR TPO”, extinction coefficient 165 ml / g ⁇ cm at a wavelength of 405 nm measured in acetonitrile solvent) 3 weight
  • DAROCUR TPO extinction coefficient 165 ml / g ⁇ cm at a wavelength of 405 nm measured in acetonitrile solvent
  • Example 5 A sealing agent and a liquid crystal display panel were obtained in the same manner as in Example 4 except that the blending amount of the photopolymerization initiator was changed to 1 part by weight.
  • Example 6 A sealing agent and a liquid crystal display panel were obtained in the same manner as in Example 4 except that the blending amount of the photopolymerization initiator was changed to 9 parts by weight.
  • Example 7 Example 4 except that the curable resin was changed to 100 parts by weight of the synthesized bisphenol A type epoxy acrylate, 50 parts by weight of the synthesized bisphenol F type epoxy partial acrylate, and 50 parts by weight of the synthesized ether type epoxy partial acrylate. Similarly, a sealant and a liquid crystal display panel were obtained.
  • Example 1 A sealing agent was obtained in the same manner as in Example 1. Further, a liquid crystal display panel was obtained in the same manner as in Example 1 except that a metal halide lamp was used as the irradiation light source and the light with an integrated light amount of 3000 mJ / cm 2 was irradiated based on a wavelength of 405 nm.
  • Example 2 A sealing agent was obtained in the same manner as in Example 1.
  • a liquid crystal display panel was obtained in the same manner as in Example 2 except that a metal halide lamp was used as the irradiation light source and the light having an accumulated light amount of 500 mJ / cm 2 was irradiated based on the wavelength of 405 nm.
  • Example 3 A sealant was obtained in the same manner as in Example 2. Further, a liquid crystal display panel was obtained in the same manner as in Example 2 except that a metal halide lamp was used as the irradiation light source.
  • Example 4 A sealant was obtained in the same manner as in Example 3.
  • a liquid crystal display panel was obtained in the same manner as in Example 3 except that a metal halide lamp was used as the irradiation light source.
  • Example 5 A sealing agent was obtained in the same manner as in Example 4.
  • a liquid crystal display panel was obtained in the same manner as in Example 4 except that a metal halide lamp was used as the irradiation light source.
  • the photopolymerization initiator was 2,2-dimethoxy-1,2-diphenylethane-1-one (manufactured by Ciba Japan, “IRGACURE 651”, extinction coefficient at a wavelength of 405 nm measured in a methanol solvent, 1 ml / g ⁇
  • the sealant and the liquid crystal display panel were obtained in the same manner as in Example 1 except that a metal halide lamp was used as the irradiation light source.
  • the photopolymerization initiator was 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one (manufactured by Ciba Japan, “IRGACURE 2959”, methanol solvent)
  • the absorption coefficient at less than 1 ml / g ⁇ cm at a wavelength of 405 nm measured in the above was changed to 3 parts by weight, and a sealant and a liquid crystal display panel were obtained in the same manner as in Example 1 except that a metal halide lamp was used as the irradiation light source. It was.
  • Example 8 A sealant was obtained in the same manner as in Example 5.
  • a liquid crystal display panel was obtained in the same manner as in Example 5 except that a metal halide lamp was used as the irradiation light source.
  • Example 9 A sealant was obtained in the same manner as in Example 6.
  • a liquid crystal display panel was obtained in the same manner as in Example 6 except that a metal halide lamp was used as the irradiation light source.
  • Example 10 A sealant was obtained in the same manner as in Example 7. Further, a liquid crystal display panel was obtained in the same manner as in Example 7 except that a metal halide lamp was used as the irradiation light source.
  • the manufacturing method of the liquid crystal display device which can manufacture the liquid crystal display device which is low-cost and highly efficient and hardly has liquid-crystal contamination can be provided.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Sealing Material Composition (AREA)

Abstract

L'invention concerne un procédé de fabrication, avec un coût réduit et un rendement élevé, d'un dispositif d'affichage à cristaux liquides quasiment exempt de contamination des cristaux liquides. Le procédé comporte : une étape (1) lors de laquelle une couche d'agent d'étanchéité en forme de cadre est formée sur un substrat à l'aide d'un agent d'étanchéité photodurcissable contenant une résine durcissable et un initiateur de photopolymérisation ; une étape (2) lors de laquelle un matériau à cristaux liquides contenant un matériau polymérisable et un initiateur de photopolymérisation est lâché sur une région entourée par la couche d'agent d'étanchéité ; une étape (3) lors de laquelle ledit substrat et un autre substrat sont collés l'un à l'autre, l'agent d'étanchéité se situant entre eux, et l'agent d'étanchéité subit un photo-‌durcissement par irradiation d'une lumière dont la longueur d'onde assure le photo-‌durcissement de l'agent d'étanchéité sur les substrats collés ; une étape (4) lors de laquelle le matériau à cristaux liquides est photo-polymérisé par irradiation d'une lumière dont la longueur d'onde photo-polymérise le matériau à cristaux liquides. La longueur d'onde de la lumière assurant le photo-‌durcissement de l'agent d'étanchéité est en outre plus grande que la longueur d'onde de la lumière qui photo-polymérise le matériau à cristaux liquides, et la lumière dont la longueur d'onde assure le photo-‌durcissement de l'agent d'étanchéité à l'étape (3) est rayonnée au moyen d'un appareil de rayonnement de lumière comprenant un élément à DEL et un filtre. L'élément à DEL présente une longueur d'onde de pic d'émission dans une région de longueur d'onde où l'agent d'étanchéité subit un photo-‌durcissement, et se situe en dehors de la région de longueur d'onde où le matériau à cristaux liquides est photo-polymérisé. Au sein de la lumière rayonnée à partir de l'élément à DEL, le filtre arrête la lumière qui se situe dans une région de longueurs d'ondes plus courtes que la longueur d'onde de pic d'émission et qui recouvre la longueur d'onde photo-polymérisant le matériau à cristaux liquides.
PCT/JP2010/066800 2009-10-02 2010-09-28 Procédé de fabrication d'un dispositif d'affichage à cristaux liquides WO2011040397A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010541614A JPWO2011040397A1 (ja) 2009-10-02 2010-09-28 液晶表示装置の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009230300 2009-10-02
JP2009-230300 2009-10-02

Publications (1)

Publication Number Publication Date
WO2011040397A1 true WO2011040397A1 (fr) 2011-04-07

Family

ID=43826212

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2010/066800 WO2011040397A1 (fr) 2009-10-02 2010-09-28 Procédé de fabrication d'un dispositif d'affichage à cristaux liquides

Country Status (3)

Country Link
JP (1) JPWO2011040397A1 (fr)
TW (1) TW201124783A (fr)
WO (1) WO2011040397A1 (fr)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011133889A (ja) * 2009-12-24 2011-07-07 Lg Display Co Ltd 液晶表示装置の製造方法
WO2013027548A1 (fr) * 2011-08-25 2013-02-28 シャープ株式会社 Procédé de fabrication d'un dispositif d'affichage à cristaux liquides
JP2013041063A (ja) * 2011-08-12 2013-02-28 Sekisui Chem Co Ltd 液晶表示素子用シール剤、上下導通材料及び液晶表示素子
US8497124B2 (en) 2011-12-05 2013-07-30 Factor Bioscience Inc. Methods and products for reprogramming cells to a less differentiated state
JP2013218169A (ja) * 2012-04-10 2013-10-24 Sekisui Chem Co Ltd 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP2014038340A (ja) * 2013-09-11 2014-02-27 Sekisui Chem Co Ltd 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
TWI502259B (fr) * 2012-10-11 2015-10-01
JP2016099506A (ja) * 2014-11-21 2016-05-30 東芝ライテック株式会社 光照射装置及び光センサ
WO2017119406A1 (fr) * 2016-01-07 2017-07-13 積水化学工業株式会社 Produit d'étanchéité destiné à un élément d'affichage à cristaux liquides, matériau à conduction verticale, et élément d'affichage à cristaux liquides
JP2017173604A (ja) * 2016-03-24 2017-09-28 東芝ライテック株式会社 液晶パネルの製造装置
CN111338110A (zh) * 2020-04-13 2020-06-26 Tcl华星光电技术有限公司 框胶固化装置及其固化方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003149647A (ja) * 2001-08-31 2003-05-21 Fujitsu Display Technologies Corp 液晶表示装置及びその製造方法
JP2007316624A (ja) * 2006-04-25 2007-12-06 Sekisui Chem Co Ltd 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示装置
JP2007334039A (ja) * 2006-06-15 2007-12-27 Ulvac Japan Ltd 光源装置及びこれを用いた基板の貼り合わせ方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003149647A (ja) * 2001-08-31 2003-05-21 Fujitsu Display Technologies Corp 液晶表示装置及びその製造方法
JP2007316624A (ja) * 2006-04-25 2007-12-06 Sekisui Chem Co Ltd 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示装置
JP2007334039A (ja) * 2006-06-15 2007-12-27 Ulvac Japan Ltd 光源装置及びこれを用いた基板の貼り合わせ方法

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011133889A (ja) * 2009-12-24 2011-07-07 Lg Display Co Ltd 液晶表示装置の製造方法
US8848159B2 (en) 2009-12-24 2014-09-30 Lg Display Co., Ltd. Method of fabricating liquid crystal display device
JP2013041063A (ja) * 2011-08-12 2013-02-28 Sekisui Chem Co Ltd 液晶表示素子用シール剤、上下導通材料及び液晶表示素子
JP5620006B2 (ja) * 2011-08-25 2014-11-05 シャープ株式会社 液晶表示装置の製造方法
WO2013027548A1 (fr) * 2011-08-25 2013-02-28 シャープ株式会社 Procédé de fabrication d'un dispositif d'affichage à cristaux liquides
US9405153B2 (en) 2011-08-25 2016-08-02 Sharp Kabushiki Kaisha Method for manufacturing liquid crystal display device
JPWO2013027548A1 (ja) * 2011-08-25 2015-03-19 シャープ株式会社 液晶表示装置の製造方法
US8497124B2 (en) 2011-12-05 2013-07-30 Factor Bioscience Inc. Methods and products for reprogramming cells to a less differentiated state
JP2013218169A (ja) * 2012-04-10 2013-10-24 Sekisui Chem Co Ltd 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
TWI502259B (fr) * 2012-10-11 2015-10-01
JP2014038340A (ja) * 2013-09-11 2014-02-27 Sekisui Chem Co Ltd 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP2016099506A (ja) * 2014-11-21 2016-05-30 東芝ライテック株式会社 光照射装置及び光センサ
WO2017119406A1 (fr) * 2016-01-07 2017-07-13 積水化学工業株式会社 Produit d'étanchéité destiné à un élément d'affichage à cristaux liquides, matériau à conduction verticale, et élément d'affichage à cristaux liquides
JP2017173604A (ja) * 2016-03-24 2017-09-28 東芝ライテック株式会社 液晶パネルの製造装置
CN111338110A (zh) * 2020-04-13 2020-06-26 Tcl华星光电技术有限公司 框胶固化装置及其固化方法

Also Published As

Publication number Publication date
TW201124783A (en) 2011-07-16
JPWO2011040397A1 (ja) 2013-02-28

Similar Documents

Publication Publication Date Title
WO2011040397A1 (fr) Procédé de fabrication d'un dispositif d'affichage à cristaux liquides
JP5091534B2 (ja) 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示装置
JP5735704B2 (ja) 液晶滴下工法用シール剤
JP6798978B2 (ja) 液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子
JP5759638B1 (ja) 液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子
CN111372952A (zh) 光聚合引发剂、显示元件用密封剂、上下导通材料、显示元件及化合物
WO2015152030A1 (fr) Agent de scellement pour procédés de dépôt en gouttes de cristaux liquides, matériau verticalement conducteur, et élément d'affichage à cristaux liquides
JP5340502B2 (ja) 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP4528358B2 (ja) 液晶滴下工法用シール剤及び液晶表示素子
WO2016186127A1 (fr) Matériau d'étanchéité pour élément d'affichage à cristaux liquides, matériau à conduction verticale et élément d'affichage à cristaux liquides
JP7048314B2 (ja) 液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子
JP2012173488A (ja) 液晶滴下工法用シール剤、及び、液晶表示素子の製造方法
CN107710061B (zh) 液晶显示元件用遮光密封剂、上下导通材料和液晶显示元件
WO2015072416A1 (fr) Produit d'étanchéité pour élément d'affichage à cristaux liquides, matériau conducteur vertical, et élément d'affichage à cristaux liquides
WO2016194871A1 (fr) Agent de scellement pour éléments d'affichage à cristaux liquides, matériau à conduction verticale et élément d'affichage à cristaux liquides
JP5369242B2 (ja) 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
WO2017061255A1 (fr) Agent d'étanchéité pour éléments d'affichage à cristaux liquides, matériau à conduction verticale, et élément d'affichage à cristaux liquides
JP6609164B2 (ja) 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP6046533B2 (ja) 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP7253117B1 (ja) 液晶表示素子用シール剤及び液晶表示素子
JP5400917B2 (ja) 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP7295798B2 (ja) 液晶表示素子
JP4977166B2 (ja) 液晶滴下工法用シール剤、液晶パネル用封口剤、上下導通材料、及び、液晶表示素子
JP6031215B1 (ja) 液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子
WO2019188814A1 (fr) Composition pour matériel électronique, agent d'étanchéité pour élément d'affichage à cristaux liquides, matériau à conduction verticale et élément d'affichage à cristaux liquides

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2010541614

Country of ref document: JP

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10820512

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10820512

Country of ref document: EP

Kind code of ref document: A1