WO2010134760A2 - Heat-source concentrating device and a waste-treatment device and method using multi-plasma - Google Patents

Heat-source concentrating device and a waste-treatment device and method using multi-plasma Download PDF

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WO2010134760A2
WO2010134760A2 PCT/KR2010/003176 KR2010003176W WO2010134760A2 WO 2010134760 A2 WO2010134760 A2 WO 2010134760A2 KR 2010003176 W KR2010003176 W KR 2010003176W WO 2010134760 A2 WO2010134760 A2 WO 2010134760A2
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plasma
waste
process chamber
gas
present
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PCT/KR2010/003176
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French (fr)
Korean (ko)
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WO2010134760A3 (en
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김익년
장홍기
지영연
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트리플코어스코리아
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G5/00—Incineration of waste; Incinerator constructions; Details, accessories or control therefor
    • F23G5/08—Incineration of waste; Incinerator constructions; Details, accessories or control therefor having supplementary heating
    • F23G5/085—High-temperature heating means, e.g. plasma, for partly melting the waste
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G2202/00—Combustion
    • F23G2202/70—Combustion with application of specific energy

Definitions

  • the present invention relates to a heat source concentrator, a waste treatment apparatus, and a method using multi-plasma, and more particularly, a plasma torch that can be stably generated and maintained as a heat source, and a plurality of heat sources in the process chamber are installed in the process chamber.
  • the present invention relates to a heat source concentrator, a waste treatment apparatus, and a method using a multi-plasma capable of maintaining a high temperature and allowing stable operation and effective heat source application.
  • plasma Various application devices using the plasma have been continuously developed and applied.
  • One such plasma application is the treatment of waste, which occurs essentially in semiconductors, chemical processes and the like.
  • the waste disposal method according to the prior art (herein, the waste includes all of gaseous, liquid, and solid phases, and refers to all target materials for thermal decomposition by plasma) is a gas that initially generates plasma (hereinafter, referred to as a first gas).
  • a gas that initially generates plasma hereinafter, referred to as a first gas.
  • inert gas such as helium and argon and air
  • process gas waste
  • the prior art has an advantage of effectively pyrolyzing a gas to be treated, such as CF4, in a plasma generation region.
  • the conventional technology does not maintain a constant plasma state due to changes in process conditions, such as an increase in processing capacity, a change in gas type and a gas supply amount, and in severe cases, plasma generation is stopped.
  • the capacity of the gas to be increased increases the outer wall temperature of the plasma chamber in which the process gas is pyrolyzed, the process gas passing through the portion is not processed and is discharged to the atmosphere as it is.
  • Prior Art 1 Korean Patent Laid-Open Publication No. 10-2009-0014687 (hereinafter referred to as Prior Art 1) discloses a scrubber technique using a plasma arc torch.
  • 1 is a configuration diagram of the prior art 1.
  • the prior art 1 is a technique of directly injecting waste into a torch flame generated in a plasma arc, and includes a structure for dispersing an arc flame and a cooling unit to prevent overheating.
  • the prior art 1 discloses a configuration in which the plasma arc flame is partially sacrificed through the dispersion of the flame, the separate provision of the cooling unit, and the like, and when the flame is moved to the rear end of the reactor, a sudden temperature decrease occurs to increase the overall temperature in the chamber. There is a problem that cannot be maintained uniformly. Therefore, there is a problem that the prior art 1 is not suitable for the process gas to be treated at a high temperature. Further, when the dispersion radius of the flame decreases as the capacity increases, the temperature drop in the outer wall is inevitably inevitable, and there is a problem that the process gas treatment efficiency is not uniform throughout the chamber.
  • the present invention has been made to solve the above problems, and to provide a heat source concentrating device capable of achieving stable and effective high temperature conditions in a more stable and efficient manner.
  • the present invention also provides an effective waste treatment method and apparatus using the heat source concentrator.
  • the present invention is a process chamber; And a plurality of plasma units connected to the process chamber and introducing a plurality of plasma torches into the process chamber, wherein the plasma unit comprises a microwave generator; A first gas inlet plasmalated by the generated microwaves; And a torch discharge part for introducing the plasma torch generated by the plasma first gas into the process chamber.
  • the plurality of plasma addition is configured such that each plasma torch is introduced in the same point direction of the process chamber.
  • the present invention comprises a process chamber into which waste is introduced; And a plurality of plasma units connected to the process chamber and introducing a plurality of plasma torches into the process chamber.
  • the plasma torch is generated by plasmaization of a first gas of a kind other than the waste material
  • the plasma unit comprises: a microwave generator; A first gas inlet plasmalated by the generated microwaves; And a torch discharge part for introducing the plasma torch generated by the plasma first gas into the process chamber.
  • the plurality of plasma units are configured to allow each plasma torch to flow in the same point direction of the process chamber.
  • the plurality of plasma units may have a multi-stage structure facing each other. And the waste is introduced between the plurality of plasma units.
  • the present invention comprises the steps of introducing waste into the process chamber; And decomposing the waste by the combined heat of the plurality of plasma torches simultaneously introduced into the process chamber.
  • the plasma torch is generated by plasmaization of a first gas of a kind other than the waste, and the plasmaation of the first gas is performed by microwaves.
  • the plurality of plasma torch is introduced by orientating the same point in the process chamber, in another embodiment of the present invention the plurality of plasma torch has a multi-stage structure facing each other Waste is introduced between the opposing plasma torch, so that the waste can flow continuously between the plurality of plasma torch.
  • the heat source concentrator according to the present invention concentrates the heat sources generated from the plurality of plasma torches in one process chamber, thereby improving the process efficiency of the entire chamber. Furthermore, according to the configuration of the plasma torch, it is also possible to easily change and apply the heat source profile of the entire chamber. Furthermore, when the heat source concentrator is applied to waste treatment, it is possible to effectively overcome the disadvantages of the existing plasma apparatus, namely, plasma instability and low removal efficiency of waste due to capacity increase and capacity change. Furthermore, depending on the configuration of the plasma torch, the process gas can be decomposed and removed with a homogeneous efficiency as a whole, and by focusing the plasma torch, high-temperature conditions at specific points or areas can be formed very economically. It can be directly applied to a large capacity scrubber, a high temperature melting furnace, and the like.
  • FIG. 1 is a block diagram of a plasma processing apparatus according to the prior art.
  • FIG. 2 is a block diagram of a heat source concentrating device according to an embodiment of the present invention.
  • FIG. 3 is a configuration diagram of a plasma unit according to an embodiment of the present invention.
  • FIG. 4 is a schematic view of a waste treatment apparatus according to an embodiment of the present invention.
  • FIG. 5 is a schematic view of a waste treatment apparatus according to another embodiment of the present invention.
  • the present invention discloses a heat source concentrating device having a structure in which a hot plasma torch (flame) generated by plasma of a gas other than a process gas, for example, a swirl gas, is concentrated in one chamber in a plasma generation region.
  • a heat source concentrator refers to an apparatus for concentrating a plurality of heat sources into one region.
  • FIG. 2 is a schematic diagram showing a heat source concentrating device according to an embodiment of the present invention.
  • a process chamber in the present specification, a chamber or a process chamber constitutes a system in which the interior is closed and separated from the outside, and means any configuration in which the interior is thermally blocked from the outside by the chamber).
  • a plurality of plasma units are provided in the plasma torch, and the plasma torch generated from each of the plasma units is introduced into the chamber.
  • the plurality of plasma torches may be arranged in a direction in which the plurality of plasma torches are concentrated and merged at one or more points, or may be arranged to have a predetermined interval in the entire chamber area.
  • the plurality of plasma torches introduced into the plasma chamber may form a uniform temperature region in the entire region of the process chamber.
  • the inventors of the present invention concentrate the orientation of the plurality of plasma torches at a specific point or region in the chamber, where each heat generated from the plasma torch is a point or region in which the orientation directions of the plasma torch are merged (orientation direction).
  • the merging of means merging and concentrating in each direction of the plasma torch to form a high temperature, especially in a point or region where the high temperature is formed by a plurality of plasma torch (decomposition of waste,
  • the present invention has been made by focusing on the possibility of melting and the like).
  • the waste treatment apparatus according to the present invention generates a plasma by using an inert gas such as argon or helium and a gas other than the process gas to be treated to generate the plasma torch.
  • the process gas is prevented from being discharged by being untreated by the non-uniform plasma formation of the process gas resulting from the plasma generation step, and a uniform high temperature is formed at an early stage, thereby allowing process gas treatment without the unprocessed process gas.
  • An apparatus configuration for generating such plasma is referred to as a plasma unit, and in one embodiment of the present invention, a plasma generation apparatus using microwaves as shown in FIG. 3 is used as a plasma unit.
  • the plasma unit 200 of the heat source concentrator in particular, the waste treatment apparatus using the heat source concentrator includes a microwave generator 210 and the microwave generator 210.
  • Waveguide 220 is applied to the microwave generated by the).
  • the plasma unit is provided at the rear end of the waveguide 220 and the inlet portion (1, where the first gas is different from the waste 280 when the waste is decomposed) is introduced into the plasma (particularly, when the waste is decomposed).
  • the plasma torch 250 generated in the plasma chamber 240 is discharged through the discharge unit 260 discharged in a desired direction.
  • the process chamber (not shown).
  • the waste 280 flows directly into the plasma torch or to a point spaced apart from the plasma torch at a predetermined interval so that the process gas is processed in the heat source region concentrated by the plasma torch, not in the plasma generation region. .
  • the present invention provides a device (system) that includes a plurality of plasma units illustrated in FIG. 3 and concentrates and merges heat sources generated from a plasma torch, which will be described in more detail with reference to the accompanying drawings.
  • FIG. 4 is a configuration diagram illustrating a gas processing apparatus according to an embodiment of the present invention.
  • a waste treatment apparatus is configured and disposed with a plasma torch such that the plasma torch faces the same point (center point in FIG. 3) of the process chamber.
  • the plasma torch generated from the plasma unit merges the generated heat source to the same point or the same region in the process chamber, and as a result, the temperature in the region rises to a very high temperature. Therefore, in the above embodiment of the present invention, a process gas flows into the region and is decomposed.
  • the plasma torches may overlap each other or may be spaced at appropriate intervals.
  • An advantage of this arrangement is that it can first form a uniform temperature gradient in the process chamber.
  • the prior art has a problem in that the overall temperature is partially sacrificed and decreased with increasing capacity (for example, when increasing the radius of the torch flame of the prior art 1).
  • increasing capacity for example, when increasing the radius of the torch flame of the prior art 1.
  • Another advantage of the above configuration is that economic process gas treatment is possible. That is, in the prior art, when the processing capacity is increased, the amount of the plasma generating device and the gas supplied thereto must be increased.
  • the present invention makes it possible to manufacture a waste treatment apparatus that generates a considerably high heat source by simply configuring a plurality of household microwave generators, for example.
  • process gas having a desired capacity can be efficiently processed by changing the configuration (for example, changing the number of plasma torches).
  • FIG. 5 is a schematic view of a waste treatment apparatus according to another embodiment of the present invention.
  • the plurality of plasma units 200 face each other and have a multi-stage structure with respect to a waste 280 inflow direction.
  • the multi-stage structure is a structure in which the introduced waste passes between a plurality of plasma torches which are continuously opposed to each other, and the multi-stage means a structure arranged sequentially with respect to the flow direction of the waste. That is, in the above embodiment, the waste introduced initially passes through the first stage plasma unit 280a and then passes continuously between the next stage plasma unit 280b.
  • the plasma torch generated from the plasma unit is also concentrated and merged in mutually opposite directions, and the waste 280 is introduced between the opposing plasma units (particularly, the plasma torch).
  • the advantage of the above configuration is that the continuous high temperature treatment of the waste is possible.
  • the solid suspended solids will accumulate in the chamber or cover the plasma generating part when the waste gas treatment apparatus such as a conventional gas scrubber is processed. Problems such as failure and incomplete waste disposal arise.
  • the waste does not pass into the plasma generating unit, it is possible to prevent a problem occurring when the plasma apparatus and the plasma are formed by the suspended solids such as powder, and also by using a plurality of plasma torches to keep the suspended solids such as powder continuously at a high temperature.
  • the treatment has the advantage of being able to continuously remove the solid suspended solids.

Abstract

The present invention relates to a heat-source concentrating device using multi-plasma and to a waste-treatment device and method using the same. The heat-source concentrating device according to the present invention comprises: a processing chamber; and a plurality of plasma units which are connected to the processing chamber and cause a plurality of plasma torches to flow into the processing chamber, and the heat-source concentrating device according to the present invention can effectively overcome the problems of processing treatment devices such as plasma scrubbing devices of the prior art, namely the instability of the plasma and low elimination efficiency due to volume increases and volume changes. Further, because of the plasma torch configuration, the processing gas can be broken down and eliminated with homogeneous efficiency overall. Further, the heat-source concentrating device according to the present invention can create high temperature conditions very economically by concentrating plasma torches and can therefore be employed directly in waste treatment, large-volume scrubbers, high-temperature melting furnaces and the like.

Description

멀티 플라즈마를 이용한 열원 집중 장치, 폐기물 처리 장치 및 방법Heat source concentrator, waste treatment device and method using multi-plasma
본 발명은 멀티 플라즈마를 이용한 열원 집중 장치, 폐기물 처리 장치 및 방법에 관한 것으로, 보다 상세하게는 안정적으로 발생, 유지될 수 있는 플라즈마 토치를 열원으로 하여, 이를 공정 챔버에 복수 개 설치하여 챔버 내에 열원을 집중시킴으로써 고온을 유지할 수 있으며, 안정적인 운전과 효과적인 열원 응용이 가능한 멀티 플라즈마를 이용한 열원 집중 장치, 폐기물 처리 장치 및 방법에 관한 것이다.The present invention relates to a heat source concentrator, a waste treatment apparatus, and a method using multi-plasma, and more particularly, a plasma torch that can be stably generated and maintained as a heat source, and a plurality of heat sources in the process chamber are installed in the process chamber. The present invention relates to a heat source concentrator, a waste treatment apparatus, and a method using a multi-plasma capable of maintaining a high temperature and allowing stable operation and effective heat source application.
기체 상태의 물질에 계속 열을 가하여 온도를 올려주면, 이온핵과 자유전자로 이루어진 입자들의 집합체가 만들어진다. 물질의 세 가지 형태인 고체, 액체, 기체와 더불어 '제4의 물질상태'로 불리며, 이러한 상태의 물질을 플라즈마라고 한다. 이러한 플라즈마를 이용하는 다양한 응용 장치들이 지속적으로 개발, 적용되고 있다. 이러한 플라즈마 응용예 중 하나는 반도체, 화학 공정 등에 필수적으로 발생하는 폐기물의 처리이다. If you heat up a gaseous substance and raise the temperature, you'll create an aggregate of particles that consist of an ion nucleus and free electrons. Along with the three forms of matter, solid, liquid and gas, it is called the 'fourth state of matter' and this state of matter is called plasma. Various application devices using the plasma have been continuously developed and applied. One such plasma application is the treatment of waste, which occurs essentially in semiconductors, chemical processes and the like.
종래 기술에 의한 폐기물 처리 방법(여기에서 폐기물은 기상, 액상, 고상을 모두 포함하며, 플라즈마에 의한 열 분해의 대상 물질을 모두 지칭한다)은 플라즈마를 초기 생성시키는 가스(이하, 제 1 가스라 지칭되며, 일반적으로 헬륨, 아르곤과 같은 비활성 가스 및 공기)와 폐기물(이하 공정가스라 한다)를 마이크로 웨이브 등이 인가되는 경로인 도파관 중심으로 주입하거나 별도의 포트를 만들어 주입하는 방식을 따른다. 하지만, 상기 종래 기술은 CF4 등과 같이 처리될 가스를 플라즈마 생성 영역에서 효과적으로 열분해시키는 장점이 있다. 하지만, 상기 종래 기술은 처리 용량의 증가, 가스 종류 및 가스 공급량의 변화 등과 같은 공정 조건의 변화에 의해 플라즈마 상태가 일정하게 유지되지 않으며, 심한 경우 플라즈마 생성이 멈추게 된다. 또한 처리할 가스의 용량이 증가하게 되면 공정가스가 열분해되는 플라즈마 챔버의 외벽 온도가 낮아지므로, 그 부분을 지나는 공정 가스는 처리 되지 않고 그대로 대기로 배출되는 문제가 있었다. The waste disposal method according to the prior art (herein, the waste includes all of gaseous, liquid, and solid phases, and refers to all target materials for thermal decomposition by plasma) is a gas that initially generates plasma (hereinafter, referred to as a first gas). In general, inert gas such as helium and argon and air) and waste (hereinafter referred to as process gas) are injected into the center of the waveguide, through which microwave is applied, or by making a separate port. However, the prior art has an advantage of effectively pyrolyzing a gas to be treated, such as CF4, in a plasma generation region. However, the conventional technology does not maintain a constant plasma state due to changes in process conditions, such as an increase in processing capacity, a change in gas type and a gas supply amount, and in severe cases, plasma generation is stopped. In addition, when the capacity of the gas to be increased increases the outer wall temperature of the plasma chamber in which the process gas is pyrolyzed, the process gas passing through the portion is not processed and is discharged to the atmosphere as it is.
이러한 문제를 개선하기 위하여, 대한민국 공개특허공보 10-2009-0014687(이하 종래기술 1)은 플라즈마 아크 토치를 이용한 스크러버 기술을 개시한다. 도 1은 종래 기술 1의 구성도이다. In order to improve this problem, Korean Patent Laid-Open Publication No. 10-2009-0014687 (hereinafter referred to as Prior Art 1) discloses a scrubber technique using a plasma arc torch. 1 is a configuration diagram of the prior art 1.
도 1을 참조하면, 상기 종래기술 1은 플라즈마 아크에서 발생하는 토치 화염에 직접 폐기물을 주입하는 기술로서, 아크 화염을 분산시키는 구성, 및 과열을 방지하는 냉각부를 포함한다. 하지만, 상기 종래기술 1은 화염의 분산, 냉각부의 별도 구비 등을 통하여 플라즈마 아크 화염을 일부 희생시키는 구성을 개시하고, 화염이 반응기 후단으로 이동될 경우 급격한 온도 저감이 발생하게 되어 챔버 내의 전체 온도를 균일하게 유지할 수 없는 문제점을 가지고 있다. 따라서 고온에서 처리하여야 하는 공정 가스의 경우 상기 종래 기술 1은 적합하지 않다는 문제가 있다. 더 나아가, 용량 증가에 따라 화염의 분산반경이 줄게되는 경우 결국 외벽에서의 온도 저하는 불가피할 수 밖에 없으며, 공정가스 처리 효율도 챔버 전체적으로 균일하지 않게 된다는 문제가 있다. Referring to FIG. 1, the prior art 1 is a technique of directly injecting waste into a torch flame generated in a plasma arc, and includes a structure for dispersing an arc flame and a cooling unit to prevent overheating. However, the prior art 1 discloses a configuration in which the plasma arc flame is partially sacrificed through the dispersion of the flame, the separate provision of the cooling unit, and the like, and when the flame is moved to the rear end of the reactor, a sudden temperature decrease occurs to increase the overall temperature in the chamber. There is a problem that cannot be maintained uniformly. Therefore, there is a problem that the prior art 1 is not suitable for the process gas to be treated at a high temperature. Further, when the dispersion radius of the flame decreases as the capacity increases, the temperature drop in the outer wall is inevitably inevitable, and there is a problem that the process gas treatment efficiency is not uniform throughout the chamber.
따라서, 본 발명은 상기 문제를 개선하기 위하여 안출된 것으로서, 보다 안정적이고 효율적인 방식으로 고온의 조건을 안정적이고, 효과적으로 달성할 수 있는 열원 집중 장치를 제공하는 데 있다. Accordingly, the present invention has been made to solve the above problems, and to provide a heat source concentrating device capable of achieving stable and effective high temperature conditions in a more stable and efficient manner.
본 발명은 또한, 상기 열원 집중 장치를 이용한, 효과적인 폐기물 처리 방법 및 장치를 제공하는 데 있다.The present invention also provides an effective waste treatment method and apparatus using the heat source concentrator.
상기 첫 번째 과제를 해결하기 위하여, 본 발명은 공정 챔버; 및 상기 공정 챔버에 연결되며, 상기 공정 챔버 내로 복수의 플라즈마 토치를 유입시키는 복수의 플라즈마 부를 포함하는 것을 특징으로 하는 열원 집중 장치를 제공하며, 상기 플라즈마 부는 마이크로 웨이브 생성부; 상기 생성된 마이크로 웨이브에 의하여 플라즈마화되는 제 1 가스 유입부; 및 상기 플라즈마화된 제 1 가스에 의하여 발생한 플라즈마 토치가 상기 공정 챔버 내로 유입되기 위한 토치 토출부를 포함한다. 본 발명의 일 실시예에서 상기 공정 챔버의 동일 지점 방향으로 각각의 플라즈마 토치가 유입되도록 상기 복수의 플라즈마 부가 구성된다. In order to solve the first problem, the present invention is a process chamber; And a plurality of plasma units connected to the process chamber and introducing a plurality of plasma torches into the process chamber, wherein the plasma unit comprises a microwave generator; A first gas inlet plasmalated by the generated microwaves; And a torch discharge part for introducing the plasma torch generated by the plasma first gas into the process chamber. In one embodiment of the invention the plurality of plasma addition is configured such that each plasma torch is introduced in the same point direction of the process chamber.
상기 두 번째 과제를 해결하기 위하여, 본 발명은 폐기물이 유입되는 공정 챔버; 및 상기 공정 챔버에 연결되며, 상기 공정 챔버 내로 복수의 플라즈마 토치를 유입시키는 복수의 플라즈마 부를 포함하는 것을 특징으로 하는 폐기물 처리 장치를 제공한다. In order to solve the second problem, the present invention comprises a process chamber into which waste is introduced; And a plurality of plasma units connected to the process chamber and introducing a plurality of plasma torches into the process chamber.
본 발명의 일 실시예에서 상기 플라즈마 토치는 상기 페기물이 아닌 종류인 제 1 가스의 플라즈마화에 의하여 발생하며, 상기 플라즈마 부는 마이크로 웨이브 생성부; 상기 생성된 마이크로 웨이브에 의하여 플라즈마화되는 제 1 가스 유입부; 및 상기 플라즈마화된 제 1가스에 의하여 발생한 플라즈마 토치가 상기 공정 챔버 내로 유입되기 위한 토치 토출부를 포함한다. 본 발명의 일 실시예에서 상기 공정 챔버의 동일 지점 방향으로 각각의 플라즈마 토치가 유입되도록 상기 복수의 플라즈마 부가 구성되며, 본 발명의 또 다른 일 실시예에서 상기 복수의 플라즈마 부는 상호 대향하는 다단 구조를 가지며, 상기 복수의 플라즈마 부 사이로 상기 폐기물이 유입된다. In one embodiment of the present invention, the plasma torch is generated by plasmaization of a first gas of a kind other than the waste material, wherein the plasma unit comprises: a microwave generator; A first gas inlet plasmalated by the generated microwaves; And a torch discharge part for introducing the plasma torch generated by the plasma first gas into the process chamber. In one embodiment of the present invention, the plurality of plasma units are configured to allow each plasma torch to flow in the same point direction of the process chamber. In another embodiment of the present invention, the plurality of plasma units may have a multi-stage structure facing each other. And the waste is introduced between the plurality of plasma units.
상기 세 번째 과제를 해결하기 위하여, 본 발명은 폐기물을 공정 챔버에 유입시키는 단계; 및 상기 폐기물을 상기 공정 챔버에 동시에 유입되는 복수의 플라즈마 토치의 병합된 열에 의하여 분해시키는 단계를 포함하는 것을 특징으로 하는 폐기물 처리 방법을 제공한다. 본 발명의 일 실시예에서 상기 플라즈마 토치는 상기 페기물이 아닌 종류인 제 1 가스의 플라즈마화에 의하여 발생하며, 상기 제 1 가스의 플라즈마화는 마이크로 웨이브에 의하여 수행된다.  In order to solve the third problem, the present invention comprises the steps of introducing waste into the process chamber; And decomposing the waste by the combined heat of the plurality of plasma torches simultaneously introduced into the process chamber. In one embodiment of the present invention, the plasma torch is generated by plasmaization of a first gas of a kind other than the waste, and the plasmaation of the first gas is performed by microwaves.
또한, 본 발명의 일 실시예에서, 상기 복수의 플라즈마 토치는 상기 공정 챔버 내의 동일 지점을 배향하여 유입되며, 본 발명의 또 다른 일 실시예에서는 상기 복수의 플라즈마 토치는 상호 대향하는 다단 구조를 가지며, 상기 대향하는 플라즈마 토치 사이로 폐기물이 유입되어, 상기 폐기물이 상기 복수의 플라즈마 토치 사이로 연속적으로 흐를 수 있다. In addition, in one embodiment of the present invention, the plurality of plasma torch is introduced by orientating the same point in the process chamber, in another embodiment of the present invention the plurality of plasma torch has a multi-stage structure facing each other Waste is introduced between the opposing plasma torch, so that the waste can flow continuously between the plurality of plasma torch.
본 발명에 따른 열원 집중 장치는 복수의 플라즈마 토치로부터 발생하는 열원을 하나의 공정 챔버 내에 집중시키므로, 챔버 전체적으로 공정 효율이 향상되는 효과가 있다. 더 나아가, 상기 플라즈마 토치의 구성에 따라 챔버 전체의 열원 프로파일을 용이하게 변경, 응용할 수 있는 효과 또한 있다. 더 나아가 상기 열원 집중 장치를 폐기물 처리에 응용하는 경우, 기존의 플라즈마 장치의 단점, 즉 용량 증가 및 용량 변화에 따른 플라즈마의 불안정성 및 폐기물의 낮은 제거효율을 효과적으로 극복할 수 있다. 더 나아가, 플라즈마 토치 구성에 따라 공정 가스를 전체적으로 균일한(homogeneous) 효율로 분해, 제거할 수 있으며, 플라즈마 토치를 집중시킴으로써 특정 지점 또는 영역에서의 고온 조건을 매우 경제적으로 형성할 수 있으므로, 폐기물 처리에 사용되는 대용량 스크러버, 고온 용융로 등에 직접 적용할 수 있다. The heat source concentrator according to the present invention concentrates the heat sources generated from the plurality of plasma torches in one process chamber, thereby improving the process efficiency of the entire chamber. Furthermore, according to the configuration of the plasma torch, it is also possible to easily change and apply the heat source profile of the entire chamber. Furthermore, when the heat source concentrator is applied to waste treatment, it is possible to effectively overcome the disadvantages of the existing plasma apparatus, namely, plasma instability and low removal efficiency of waste due to capacity increase and capacity change. Furthermore, depending on the configuration of the plasma torch, the process gas can be decomposed and removed with a homogeneous efficiency as a whole, and by focusing the plasma torch, high-temperature conditions at specific points or areas can be formed very economically. It can be directly applied to a large capacity scrubber, a high temperature melting furnace, and the like.
도 1은 종래 기술에 따른 플라즈마 처리 장치의 구성도이다. 1 is a block diagram of a plasma processing apparatus according to the prior art.
도 2는 본 발명의 일 실시예에 따른 열원 집중 장치의 구성도이다. 2 is a block diagram of a heat source concentrating device according to an embodiment of the present invention.
도 3은 본 발명의 일 실시예에 따른 플라즈마 부의 구성도이다. 3 is a configuration diagram of a plasma unit according to an embodiment of the present invention.
도 4는 본 발명의 일 실시예에 따른 폐기물 처리 장치의 모식도이다.4 is a schematic view of a waste treatment apparatus according to an embodiment of the present invention.
도 5는 본 발명의 또 다른 일 실시예에 따른 폐기물 처리 장치의 모식도이다.5 is a schematic view of a waste treatment apparatus according to another embodiment of the present invention.
이하, 본 발명의 도면을 참조하여 상세하게 설명하고자 한다. 다음에 소개되는 실시예들은 당업자에게 본 발명의 사상이 충분히 전달될 수 있도록 하기 위해 예로서 제공되어지는 것이다. 따라서 본 발명은 이하 설명된 실시예들에 한정되지 않고 다른 형태로 구체화될 수도 있다. 그리고 도면들에 있어서, 구성요소의 폭, 길이, 두께 등은 편의를 위하여 과장되어 표현될 수도 있다. 명세서 전체에 걸쳐서 동일한 참조번호들은 동일한 구성요소들을 나타낸다. Hereinafter, with reference to the drawings of the present invention will be described in detail. The following embodiments are provided as examples to sufficiently convey the spirit of the present invention to those skilled in the art. Therefore, the present invention is not limited to the embodiments described below and may be embodied in other forms. In the drawings, the width, length, thickness, etc. of the components may be exaggerated for convenience. Like numbers refer to like elements throughout.
본 발명은 플라즈마 생성 영역에 공정 가스가 아닌 종류의 가스, 예를 들면, 스월 가스의 플라즈마화에 의하여 발생한 고온의 플라즈마 토치(화염)를 하나의 챔버 내에 집중시킨 구조의 열원 집중 장치를 개시한다. 본 명세서 전반에 걸쳐 사용되는 열원 집중 장치는 복수의 열원을 하나의 영역 내에 집중시키는 장치를 지칭한다. The present invention discloses a heat source concentrating device having a structure in which a hot plasma torch (flame) generated by plasma of a gas other than a process gas, for example, a swirl gas, is concentrated in one chamber in a plasma generation region. As used throughout this specification, a heat source concentrator refers to an apparatus for concentrating a plurality of heat sources into one region.
도 2는 본 발명의 일 실시예에 따른 열원 집중 장치를 나타내는 모식도이다. 2 is a schematic diagram showing a heat source concentrating device according to an embodiment of the present invention.
도 2를 참조하면, 공정 챔버(본 명세서에서 챔버 또는 공정 챔버는 외부로부터 내부가 폐쇄, 구분되는 시스템을 구성하며, 상기 챔버에 의하여 내부가 열적으로 외부로부터 차단된 임의의 모든 구성을 의미한다)에 복수의 플라즈마 부가 구비되며, 상기 플라즈마 부 각각으로부터 발생하는 플라즈마 토치가 상기 챔버 내로 유입되는 것을 알 수 있다. 이 경우, 상기 복수의 플라즈마 토치는 하나 이상의 지점에 집중, 병합되는 방향으로 배치되거나, 아니면 전체 챔버 영역에 일정한 간격을 갖도록 배치될 수 있다. 이와 같이 플라즈마 챔버 내로 유입되는 복수의 플라즈마 토치는 상기 공정 챔버의 전체 영역에서 균일한 온도 영역을 형성할 수 있다. 더 나아가, 본 발명자는 상기 복수의 플라즈마 토치의 배향을 챔버 내의 특정 지점 또는 영역에 집중시키는 경우, 상기 플라즈마 토치로부터의 발생한 각각의 열이 상기 플라즈마 토치의 배향 방향이 병합된 지점 또는 영역(배향 방향의 병합이란, 상기 플라즈마 토치 각각의 방향이 모이는 형식을 의미한다)에서 병합, 집중되어 고온을 형성하게 되며, 특히 복수의 플라즈마 토치에 의하여 고온이 형성된 지점 또는 영역에서 열원의 다양한 응용(폐기물 분해, 용융 등)이 가능하다는 점에 착안하여 본 발명에 이르게 되었다. 더 나아가 본 발명에 따른 폐기물처리 장치는 상기 플라즈마 토치 발생을 위하여, 처리되는 공정 가스가 아닌 종류의 가스, 예를 들면, 아르곤, 헬륨과 같은 비활성 기체 및 공기를 이용하여 플라즈마를 발생시킨다. 이 경우, 종래 기술과 같이 플라즈마 발생 단계에서 초래되는 공정 가스의 불균일 플라즈마화 등에 의해 공정가스가 미처리되어 배출되는 것을 방지하여, 초기 단계부터 균일한 고온을 형성하여 미처리 공정 가스 없이 공정 가스 처리가 가능하다. 이러한 플라즈마 발생을 위한 장치 구성은 이하 플라즈마 부라 지칭되며 본 발명의 일 실시예에서는 도 3에 도시된 바와 같은 마이크로 웨이브에 의한 플라즈마 발생장치를 플라즈마 부로 활용한다. Referring to FIG. 2, a process chamber (in the present specification, a chamber or a process chamber constitutes a system in which the interior is closed and separated from the outside, and means any configuration in which the interior is thermally blocked from the outside by the chamber). It can be seen that a plurality of plasma units are provided in the plasma torch, and the plasma torch generated from each of the plasma units is introduced into the chamber. In this case, the plurality of plasma torches may be arranged in a direction in which the plurality of plasma torches are concentrated and merged at one or more points, or may be arranged to have a predetermined interval in the entire chamber area. As such, the plurality of plasma torches introduced into the plasma chamber may form a uniform temperature region in the entire region of the process chamber. Furthermore, the inventors of the present invention concentrate the orientation of the plurality of plasma torches at a specific point or region in the chamber, where each heat generated from the plasma torch is a point or region in which the orientation directions of the plasma torch are merged (orientation direction). The merging of means merging and concentrating in each direction of the plasma torch to form a high temperature, especially in a point or region where the high temperature is formed by a plurality of plasma torch (decomposition of waste, The present invention has been made by focusing on the possibility of melting and the like). Furthermore, the waste treatment apparatus according to the present invention generates a plasma by using an inert gas such as argon or helium and a gas other than the process gas to be treated to generate the plasma torch. In this case, as in the prior art, the process gas is prevented from being discharged by being untreated by the non-uniform plasma formation of the process gas resulting from the plasma generation step, and a uniform high temperature is formed at an early stage, thereby allowing process gas treatment without the unprocessed process gas. Do. An apparatus configuration for generating such plasma is referred to as a plasma unit, and in one embodiment of the present invention, a plasma generation apparatus using microwaves as shown in FIG. 3 is used as a plasma unit.
도 3을 참조하면, 본 발명의 일 실시예에 따른 열원 집중 장치, 특히 상기 열원 집중 장치를 이용한 폐기물 처리 장치의 플라즈마 부(200)는 마이크로 웨이브 발생부(210), 상기 마이크로 웨이브 발생부(210)에 의하여 발생된 마이크로 웨이브가 인가되는 도파관(220)을 구비한다. 더 나아가, 상기 플라즈마 부는 상기 도파관(220)의 후단에 구비되며 플라즈마화되는 제 1 가스(특히 폐기물 등을 분해하는 경우 상기 제 1 가스는 폐기물(280)과 다른 종류)가 소량 유입되는 유입부(230) 및 상기 제 1 가스의 플라즈마화가 이루어지는 플라즈마 챔버(240)를 구비하며, 상기 플라즈마 챔버(240) 내에서 발생하는 플라즈마 토치(250)는 이를 원하는 방향으로 토출되는 토출부(260)를 통하여 토출되어, 상기 공정 챔버(미도시) 내로 유입된다. 상기 공정 챔버 내에는 폐기물(280)은 상기 플라즈마 토치로 직접 또는 상기 플라즈마 토치로부터 소정 간격으로 이격된 지점으로 유입되며, 그 결과 플라즈마 생성 영역이 아닌, 플라즈마 토치에 의해 집중된 열원 영역에서 공정 가스가 처리된다. Referring to FIG. 3, the plasma unit 200 of the heat source concentrator, in particular, the waste treatment apparatus using the heat source concentrator includes a microwave generator 210 and the microwave generator 210. Waveguide 220 is applied to the microwave generated by the). Further, the plasma unit is provided at the rear end of the waveguide 220 and the inlet portion (1, where the first gas is different from the waste 280 when the waste is decomposed) is introduced into the plasma (particularly, when the waste is decomposed). 230 and a plasma chamber 240 in which the first gas is converted into plasma, the plasma torch 250 generated in the plasma chamber 240 is discharged through the discharge unit 260 discharged in a desired direction. And into the process chamber (not shown). In the process chamber, the waste 280 flows directly into the plasma torch or to a point spaced apart from the plasma torch at a predetermined interval so that the process gas is processed in the heat source region concentrated by the plasma torch, not in the plasma generation region. .
하지만, 도 3의 구성은 모두 본 발명을 예시하기 위한 것으로, 플라즈마 토치를 발생시킬 수 있는 어떠한 구성도 모두 본 발명의 범위에 속하며, 본 발명은 상기 예에 의하여 발명의 범위가 제한, 한정되지 않는다. However, all of the configuration of Figure 3 is intended to illustrate the invention, any configuration that can generate a plasma torch all fall within the scope of the present invention, the present invention is not limited to the scope of the invention by the above examples. .
본 발명은 상기 도 3에서 예시한 플라즈마 부를 복수 개 구비하여, 플라즈마 토치로부터 발생하는 열원을 집중 및 병합하는 장치(시스템)를 제공하는데, 이하 도면을 이용하여 보다 상세히 설명한다. The present invention provides a device (system) that includes a plurality of plasma units illustrated in FIG. 3 and concentrates and merges heat sources generated from a plasma torch, which will be described in more detail with reference to the accompanying drawings.
도 4는 본 발명의 일 실시예에 따른 가스 처리 장치를 나타내는 구성도이다. 4 is a configuration diagram illustrating a gas processing apparatus according to an embodiment of the present invention.
도 4를 참조하면, 본 발명의 일 실시예에 따른 폐기물 처리 장치는 플라즈마 토치가 공정 챔버의 동일지점(도 3에서는 중심점)을 향하도록 플라즈마 부가 구성, 배치된다. 이 경우 상기 플라즈마 부로부터 발생하는 플라즈마 토치는 공정 챔버 내의 동일 지점 또는 동일 영역으로 발생 열원을 병합시키게 되며, 그 결과 상기 영역 내의 온도는 매우 높은 온도로 상승하게 된다. 따라서, 본 발명의 상기 실시예에서 상기 영역으로 공정 가스가 유입되어, 분해된다. 상기 플라즈마 토치는 상호 중첩되거나, 또는 적절한 간격으로 이격될 수 있다.Referring to FIG. 4, a waste treatment apparatus according to an embodiment of the present invention is configured and disposed with a plasma torch such that the plasma torch faces the same point (center point in FIG. 3) of the process chamber. In this case, the plasma torch generated from the plasma unit merges the generated heat source to the same point or the same region in the process chamber, and as a result, the temperature in the region rises to a very high temperature. Therefore, in the above embodiment of the present invention, a process gas flows into the region and is decomposed. The plasma torches may overlap each other or may be spaced at appropriate intervals.
상기 구성의 장점은, 우선 공정 챔버 내의 균일한 온도 구배를 형성할 수 있다는 점에 있다. 상술한 바와 같이 종래 기술은 용량 증가(예를 들면, 종래 기술 1의 토치 화염의 반경을 증가시키는 경우)에 따라 전체적인 온도가 부분적으로 희생, 감소되는 문제가 있지만, 본 발명은 상기 플라즈마 부를 집중, 특히 복수의 플라즈마 토치를 1개의 챔버 내에 집중함으로써, 공정 가스가 유입되는 영역 내에서의 균일한 온도 구배를 달성할 수 있다. 상기 구성의 또 다른 장점으로는 경제적인 공정 가스 처리가 가능하다는 점에 있다. 즉, 종래 기술의 경우 처리 용량이 증가하는 경우 플라즈마 발생 장치 및 이에 공급되는 가스의 양이 필수적으로 증가하여야 한다. 이 경우, 상당히 많은 구성 장치가 요구되며, 더 나아가, 단일 플라즈마로 많은 용량의 가스를 효과적으로 처리하기 위한 엄격한 공정 조건 설정이 요구되는 문제가 있다. 하지만, 본 발명은 간단한 구성, 예를 들면 가정용 마이크로 웨이브 발생기를 간단히 복수 개로 구성함으로써, 상당히 높은 열원을 발생하는 폐기물 처리 장치를 제조할 수 있다. 또한, 이러한 구성의 변경(예를 들면, 플라즈마 토치의 수 변경)을 통하여, 원하는 용량의 공정 가스를 효율적으로 처리할 수 있는 장점이 있다.An advantage of this arrangement is that it can first form a uniform temperature gradient in the process chamber. As described above, the prior art has a problem in that the overall temperature is partially sacrificed and decreased with increasing capacity (for example, when increasing the radius of the torch flame of the prior art 1). In particular, by concentrating a plurality of plasma torches in one chamber, it is possible to achieve a uniform temperature gradient in the region into which the process gas flows. Another advantage of the above configuration is that economic process gas treatment is possible. That is, in the prior art, when the processing capacity is increased, the amount of the plasma generating device and the gas supplied thereto must be increased. In this case, a considerable number of components are required, and furthermore, there is a problem in that a strict process condition setting for effectively treating a large amount of gas with a single plasma is required. However, the present invention makes it possible to manufacture a waste treatment apparatus that generates a considerably high heat source by simply configuring a plurality of household microwave generators, for example. In addition, there is an advantage in that process gas having a desired capacity can be efficiently processed by changing the configuration (for example, changing the number of plasma torches).
도 5는 본 발명의 또 다른 일 실시예에 따른 폐기물 처리 장치의 모식도이다.5 is a schematic view of a waste treatment apparatus according to another embodiment of the present invention.
도 5를 참조하면, 상기 복수 개의 플라즈마 부(200)는 상호 대향하며, 폐기물(280) 유입 방향에 대하여 다단 구조를 갖는다. 여기에서 다단 구조는 상기 유입된 폐기물이 연속하여 상호 대향하는 복수 개의 플라즈마 토치 사이를 지나는 구조로서, 상기 다단은 폐기물의 흐름방향에 대하여 순차적으로 배치된 구조를 의미한다. 즉, 상기 실시예에서 초기 유입되는 폐기물은 최초 1단의 플라즈마 부(280a) 사이를 지난 후, 다시 그 다음 단의 플라즈마 부(280b) 사이를 지나는 연속적으로 지나게 된다. Referring to FIG. 5, the plurality of plasma units 200 face each other and have a multi-stage structure with respect to a waste 280 inflow direction. Here, the multi-stage structure is a structure in which the introduced waste passes between a plurality of plasma torches which are continuously opposed to each other, and the multi-stage means a structure arranged sequentially with respect to the flow direction of the waste. That is, in the above embodiment, the waste introduced initially passes through the first stage plasma unit 280a and then passes continuously between the next stage plasma unit 280b.
즉, 상기 실시예에서 상기 플라즈마 부로부터 발생하는 플라즈마 토치 또한 상호 대향하는 방향으로 집중, 병합되며, 폐기물(280)은 상기 대향하는 플라즈마 부(특히 플라즈마 토치) 사이로 유입되게 된다. 상기 구성의 장점은 폐기물의 연속적인 고온 처리가 가능하다는 점에 있다. 특히, 반도체 공정 중 CVD 공정 등에서 생성되는 분말과 같은 부유물이 있는 경우, 기존의 가스 스크러버 등의 폐가스 처리 장치를 이용하여 처리할 경우, 고체 부유물이 챔버 내에 쌓이게 되거나 플라즈마 발생부를 덮게 되므로, 장비의 잦은 고장 및 불완전한 폐기물 처리 등의 문제가 발생한다. 하지만, 본 발명에서는 플라즈마 발생부 내로 폐기물을 통과시키지 않기 때문에 분말과 같은 부유물에 의해 플라즈마 장치 및 플라즈마 형성시 일어나는 문제를 방지할 수 있으며 또한 복수의 플라즈마 토치를 사용함으로써 분말과 같은 부유물을 지속적으로 고온처리 함으로써 고체 부유물을 연속적으로 제거할 수 있는 장점을 가지고 있다. That is, in the embodiment, the plasma torch generated from the plasma unit is also concentrated and merged in mutually opposite directions, and the waste 280 is introduced between the opposing plasma units (particularly, the plasma torch). The advantage of the above configuration is that the continuous high temperature treatment of the waste is possible. In particular, if there are suspended solids such as powder generated in the CVD process, etc. during the semiconductor process, the solid suspended solids will accumulate in the chamber or cover the plasma generating part when the waste gas treatment apparatus such as a conventional gas scrubber is processed. Problems such as failure and incomplete waste disposal arise. However, in the present invention, since the waste does not pass into the plasma generating unit, it is possible to prevent a problem occurring when the plasma apparatus and the plasma are formed by the suspended solids such as powder, and also by using a plurality of plasma torches to keep the suspended solids such as powder continuously at a high temperature. The treatment has the advantage of being able to continuously remove the solid suspended solids.
하지만, 이상의 구성은 모두 본 발명을 이용하여 달성할 수 있는 가스 처리 장치의 일 예일 뿐이다. 따라서, 복수의 플라즈마 열원을 집중, 병합하는 임의의 모든 구성이 본 발명의 범위에 속하며, 본 발명은 이에 제한, 한정되지 않는다. However, all of the above configurations are merely examples of the gas treating apparatus which can be achieved using the present invention. Therefore, any configuration for concentrating and merging a plurality of plasma heat sources is within the scope of the present invention, and the present invention is not limited thereto.

Claims (14)

  1. 공정 챔버; 및  Process chambers; And
    상기 공정 챔버에 연결되며, 상기 공정 챔버 내로 복수의 플라즈마 토치를 유입시키는 복수의 플라즈마 부를 포함하는 것을 특징으로 하는 열원 집중 장치. And a plurality of plasma units connected to the process chamber and introducing a plurality of plasma torches into the process chamber.
  2. 제 1항에 있어서,The method of claim 1,
    상기 플라즈마 부는 The plasma blowing
    마이크로 웨이브 생성부; A microwave generator;
    상기 생성된 마이크로 웨이브에 의하여 플라즈마화되는 제 1 가스 유입부; 및  A first gas inlet plasmalated by the generated microwaves; And
    상기 플라즈마화된 제 1 가스에 의하여 발생한 플라즈마 토치가 상기 공정 챔버 내로 유입되기 위한 토치 토출부를 포함하는 것을 특징으로 하는 열원 집중 장치. And a torch discharge portion for introducing the plasma torch generated by the plasma first gas into the process chamber.
  3. 제 1항에 있어서,  The method of claim 1,
    상기 공정 챔버의 동일 지점 방향으로 각각의 플라즈마 토치가 유입되도록 상기 복수의 플라즈마 부가 정렬된 것을 특징으로 하는 열원 집중 장치. And the plurality of plasma units are arranged such that each plasma torch flows in the same point direction of the process chamber.
  4. 폐기물이 유입되는 공정 챔버; 및 A process chamber into which waste is introduced; And
    상기 공정 챔버에 연결되며, 상기 공정 챔버 내로 복수의 플라즈마 토치를 유입시키는 복수의 플라즈마 부를 포함하는 것을 특징으로 하는 폐기물 처리 장치 And a plurality of plasma units connected to the process chamber and introducing a plurality of plasma torches into the process chamber.
  5. 제 4항에 있어서,  The method of claim 4, wherein
    상기 플라즈마 토치는 상기 페기물이 아닌 종류인 제 1 가스의 플라즈마화에 의하여 발생하는 것을 특징으로 하는 폐기물 처리 장치. The plasma torch is a waste treatment apparatus, characterized in that generated by the plasma of the first gas of the kind other than the waste.
  6. 제 5항에 있어서,  The method of claim 5,
    상기 플라즈마 부는 The plasma blowing
    마이크로 웨이브 생성부;A microwave generator;
    상기 생성된 마이크로 웨이브에 의하여 플라즈마화되는 제 1 가스 유입부; 및  A first gas inlet plasmalated by the generated microwaves; And
    상기 플라즈마화된 제 1 가스에 의하여 발생한 플라즈마 토치가 상기 공정 챔버 내로 유입되기 위한 토치 토출부를 포함하는 것을 특징으로 하는 페기물 처리 장치. And a torch discharge portion for introducing the plasma torch generated by the plasma first gas into the process chamber.
  7. 제 4항에 있어서,  The method of claim 4, wherein
    상기 공정 챔버의 동일 지점 방향으로 각각의 플라즈마 토치가 유입되도록 상기 복수의 플라즈마 부가 정렬된 것을 특징으로 하는 폐기물 처리 장치. And the plurality of plasma units are arranged such that each plasma torch flows in the same point direction of the process chamber.
  8. 제 4항에 있어서,  The method of claim 4, wherein
    상기 복수의 플라즈마 부는 상호 대향하는 다단 구조를 가지며, 상기 복수의 플라즈마 부 사이로 상기 폐기물이 유입되는 것을 특징으로 하는 폐기물 처리 장치. The plurality of plasma units have a multi-stage structure facing each other, the waste treatment apparatus characterized in that the waste flows between the plurality of plasma units.
  9. 폐기물을 공정 챔버에 유입시키는 단계; 및 Introducing waste into the process chamber; And
    상기 폐기물을 상기 공정 챔버에 동시에 유입되는 복수의 플라즈마 토치의 병합된 열에 의하여 분해시키는 단계를 포함하는 것을 특징으로 하는 폐기물 처리 방법. Decomposing the waste by the combined heat of the plurality of plasma torches simultaneously entering the process chamber.
  10. 제 9항에 있어서,  The method of claim 9,
    상기 플라즈마 토치는 상기 페기물이 아닌 종류인 제 1 가스의 플라즈마화에 의하여 발생하는 것을 특징으로 하는 폐기물 처리 방법.  The plasma torch is a waste treatment method, characterized in that generated by the plasma of the first gas of a kind other than the waste.
  11. 제 10항에 있어서,  The method of claim 10,
    상기 제 1 가스의 플라즈마화는 마이크로 웨이브에 의하여 수행되는 것을 특징으로 하는 폐기물 처리 방법. The plasma treatment of the first gas is a waste treatment method, characterized in that performed by microwave.
  12. 제 9항에 있어서,  The method of claim 9,
    상기 복수의 플라즈마 토치는 상기 공정 챔버 내의 동일 지점을 배향하여 유입되는 것을 특징으로 하는 폐기물 처리 방법. And the plurality of plasma torches are introduced at the same point in the process chamber.
  13. 제 9항에 있어서,  The method of claim 9,
    상기 복수의 플라즈마 토치는 상호 대향하는 다단 구조를 가지며, 상기 대향하는 플라즈마 토치 사이로 폐기물이 유입되는 것을 특징으로 하는 폐기물 처리 방법. The plurality of plasma torch has a multi-stage structure facing each other, waste is characterized in that the waste flows between the opposed plasma torch.
  14. 제 13항에 있어서,  The method of claim 13,
    상기 폐기물이 상기 복수의 플라즈마 토치 사이로 연속적으로 흐르는 것을 특징으로 하는 폐기물 처리 방법.And said waste flows continuously between said plurality of plasma torches.
PCT/KR2010/003176 2009-05-22 2010-05-20 Heat-source concentrating device and a waste-treatment device and method using multi-plasma WO2010134760A2 (en)

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