WO2010042460A2 - Intermediate thermal expansion coefficient glass - Google Patents

Intermediate thermal expansion coefficient glass Download PDF

Info

Publication number
WO2010042460A2
WO2010042460A2 PCT/US2009/059607 US2009059607W WO2010042460A2 WO 2010042460 A2 WO2010042460 A2 WO 2010042460A2 US 2009059607 W US2009059607 W US 2009059607W WO 2010042460 A2 WO2010042460 A2 WO 2010042460A2
Authority
WO
WIPO (PCT)
Prior art keywords
percent
glass
glass according
mole percent
less
Prior art date
Application number
PCT/US2009/059607
Other languages
French (fr)
Other versions
WO2010042460A3 (en
Inventor
Bruce G Aitken
Adam J Ellison
Timothy J Kiczenski
Original Assignee
Corning Incorporated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Incorporated filed Critical Corning Incorporated
Priority to KR1020167021282A priority Critical patent/KR20160097385A/en
Priority to EP09793309.7A priority patent/EP2349938B1/en
Priority to CN2009801404052A priority patent/CN102171154A/en
Priority to JP2011531105A priority patent/JP6042613B2/en
Priority to KR1020177030788A priority patent/KR101891459B1/en
Priority to MX2011003630A priority patent/MX2011003630A/en
Priority to AU2009302561A priority patent/AU2009302561A1/en
Priority to CA2739098A priority patent/CA2739098A1/en
Publication of WO2010042460A2 publication Critical patent/WO2010042460A2/en
Publication of WO2010042460A3 publication Critical patent/WO2010042460A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/0272—Selenium or tellurium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03925—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIIBVI compound materials, e.g. CdTe, CdS
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Definitions

  • Embodiments relate generally to aluminoborosilicate glasses and more particularly to low alkali aluminoborosilicate glasses which may be useful in photovoltaic, photochromic, electrochromic, or Organic Light Emitting Diode (OLED) lighting applications.
  • OLED Organic Light Emitting Diode
  • the fusion forming process typically produces flat glass with optimal surface and geometric characteristics useful for many electronics applications, for instance, substrates used in electronics applications, for example, display glass for LCD televisions.
  • Corning fusion glass products include 1737FTM, 1737GTM, Eagle2000FTM, EagleXGTM, JadeTM, and Codes 1317 and 2317 (Gorilla GlassTM) .
  • Efficient melting is generally believed to occur at a temperature corresponding to a melt viscosity of about 200 poise (p) .
  • These glasses share in common 20Op temperatures in excess of 1600 0 C, which can translate to accelerated tank and electrode corrosion, greater challenges for fining due to still more elevated finer temperatures, and/or reduced platinum system life time, particularly around the finer.
  • One embodiment is a glass comprising, in mole percent: 60 to 65 percent SiO 2 ;
  • RO 9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
  • Such glasses address one or more of the above-mentioned disadvantages of conventional glasses and provide one or more of the following advantages: the alkalis added to the glass can greatly accelerate melting, permitting higher pull rates and lower melting temperatures. They can also raise the coefficient of thermal expansion so as to be a better match for, for example, CdTe photovoltaics .
  • Figure 1 is a graph of estimated liquidus viscosity.
  • Figure 2 is an illustration of features of a photovoltaic device according to one embodiment.
  • the term "substrate” can be used to describe either a substrate or a superstrate depending on the configuration of the photovoltaic cell.
  • the substrate is a superstrate, if when assembled into a photovoltaic cell, it is on the light incident side of a photovoltaic cell.
  • the superstrate can provide protection for the photovoltaic materials from impact and environmental degradation while allowing transmission of the appropriate wavelengths of the solar spectrum.
  • multiple photovoltaic cells can be arranged into a photovoltaic module.
  • the term "adjacent" can be defined as being in close proximity. Adjacent structures may or may not be in physical contact with each other.
  • Adjacent structures can have other layers and/or structures disposed between them.
  • the term "planar" can be defined as having a substantially topographically flat surface.
  • each of the ranges can include any numerical value including decimal places within the range including each of the ranges endpoints.
  • multivalent components of the exemplary compositions are represented, for example, as Fe 2 O 3 , SnO 2 , AS 2 O 5 , Sb 2 Os. These materials are batched as said oxides but mixed valences or alternative valences could be used.
  • One embodiment is a glass comprising, in mole percent:
  • RO 9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
  • Another embodiment is a glass comprising, in mole percent:
  • Another embodiment is a glass comprising, in mole percent:
  • RO 9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
  • Another embodiment is a glass comprising, in mole percent:
  • RO 9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
  • M is an alkali metal selected from Li, Na, K, Rb, Cs, and a combination thereof. In some embodiments, M is selected from Li, K, Cs, and a combination thereof.
  • R is selected from Mg, Ca, Sr, Ba, and a combination thereof. In some embodiments, R is selected from Mg, Ca, Sr, and a combination thereof.
  • the glass is substantially free of BaO.
  • the content of BaO can be 0.05 mole percent or less, for example, zero mole percent .
  • the glass is substantially free of Sb 2 ⁇ 3 , AS 2 O 3 , or combinations thereof, for example, the glass comprises 0.05 mole percent or less of Sb 2 ⁇ 3 or As 2 O 3 or a combination thereof.
  • the glass can comprise zero mole percent of Sb 2 O 3 or As 2 O 3 or a combination thereof.
  • the glass comprises 60 to 65 mole percent SiO 2 .
  • the glass comprises 61 to 64 mole percent SiO 2 .
  • the glass comprises 62 to 64 mole percent SiO 2 .
  • the glass comprises 0.01 to 0.4 mole percent Sn ⁇ 2.
  • the glass according to one embodiment comprises in mole percent:
  • M is an alkali metal selected from K, Na, and combinations thereof and wherein, CaO/ (CaO + SrO) is from 0.4 to 1.
  • the glass in one embodiment, is rollable.
  • the glass in one embodiment, is down-drawable.
  • the glass can be slot drawn or fusion drawn, for example.
  • the glass can be float formed.
  • the glass can further comprise 2 mole percent or less of TiO 2 , MnO, ZnO, Nb 2 O 5 , MoO 3 , Ta 2 O 5 , WO 3 , ZrO 2 , Y 2 O 3 , La 2 O 3 , HfO 2 , CdO, SnO 2 , Fe 2 O 3 , CeO 2 , As 2 O 3 , Sb 2 O 3 , Cl, Br, P 2 O 5 , or combinations thereof.
  • the glasses comprise 7 to 15 mole percent, for example, 7 to 11 mole percent B 2 O 3 .
  • B 2 O 3 is added to the glass to reduce melting temperature, to decrease liquidus temperature, to increase liquidus viscosity, and to improve mechanical durability relative to a glass containing no B 2 O 3 .
  • the glasses according to some embodiments, 9 to 15 mole percent RO wherein, R is an alkaline earth metal.
  • the glass can comprise, for example, 1 to 8 mole percent MgO. MgO can be added to the glass to reduce melting temperature and to increase strain point. It can disadvantageously lower CTE relative to other alkaline earths
  • Suitable adjustments include increase SrO at the expense of CaO, increasing alkali oxide concentration, and replacing a smaller alkali oxide (e.g., Na 2 O) in whole or in part with a larger alkali oxide (e.g., K 2 O).
  • a smaller alkali oxide e.g., Na 2 O
  • a larger alkali oxide e.g., K 2 O
  • the glasses in some embodiments, comprise 1 to 9 mole percent CaO.
  • CaO Relative to alkali oxides or SrO, CaO contributes to higher strain point, lower density, and lower melting temperature. It is a primary component of certain possible devitrification phases, particularly anorthite
  • CaAIaSi 2 Os CaAIaSi 2 Os
  • NaAlSisOs an analogous sodium phase, albite
  • High Na and Ca contents taken alone can cause liquidus temperatures to be unacceptably high.
  • the chemical sources for CaO include limestone, a very inexpensive material, so to the extent that high volume and low cost are factors, it is typically useful to make the CaO content as high as can be reasonably achieved relative to other alkaline earth oxides.
  • the glasses can comprise, in some embodiments, 0 to 5 mole percent SrO.
  • the glass contains no deliberately batched SrO, though it may of course be present as a contaminant in other batch materials.
  • SrO contributes to higher coefficient of thermal expansion, and the relative proportion of SrO and CaO can be manipulated to improve liquidus temperature, and thus liquidus viscosity.
  • SrO is not as effective as CaO or MgO for improving strain point, and replacing either of these with SrO tends to cause the melting temperature to increase.
  • the glass satisfies one or more of the following expressions:
  • the ratio (M 2 O + RO) /Al 2 ⁇ 3 is advantageously greater than 1.0 to assist in removing bubbles from the glass during the initial melt step. This occurs because the alkali and alkaline earth metal oxides that are not involved in stabilizing Al 2 O 3 are available to digest the silica source, typically a commercial sand. Surface area that might be sites for bubble nucleation and growth are therefore eliminated early in melting, and a comparatively bubble-free glass is obtained.
  • the ratio CaO/ (CaO+SrO) is advantageously kept between 0.4 and 1 to obtain a good balance between liquidus temperature (and hence liquidus viscosity) and melting temperature.
  • liquidus temperature and hence liquidus viscosity
  • compositions with low alkali concentrations and high SrO concentrations have comparatively high melting temperatures, and if SrO is too high then liquidus temperatures may be elevated as well relative to glasses with more alkali oxide and lower SrO.
  • a local minimum in liquidus temperature is often obtained for CaO/ (CaO+SrO) ratios between 0.4 and 1.
  • the glasses include greater than zero to 8 mole percent M 2 O, for example, 0.05 to 8 mole percent M 2 O, 0.1 to 8 mole percent M 2 O, 0.5 to 8 mole percent M 2 O, 1 to 8 mole percent M 2 O, where M is one or more of the alkali cations Li, Na, K, Rb and Cs.
  • M is one or more of the alkali cations Li, Na, K, Rb and Cs.
  • the alkali cations raise the CTE steeply, but also lower the strain point and, depending upon how they are added, increase melting temperatures.
  • the least effective alkali oxide for CTE is Li 2 ⁇ , and the most effective alkali oxide is CS 2 O.
  • sodium can participate in one of the possible devitrification phases of the inventive glasses, and while adjustments in other components can be used to counteract this, e.g., changing the CaO/ (CaO+SrO) ratio, this tendency may make it advantageous to replace sodium with other alkalis, or to use a mix of alkalis instead of sodium alone. If high volume and low cost are important, then it is desirable to as much as possible confine the alkali oxides to Na 2 ⁇ and K 2 O or combinations thereof.
  • the glasses can further comprise a variety of other components.
  • the glasses can comprise SnC> 2 , Fe 2 ⁇ 3 , MnO, Ce ⁇ 2, AS 2 O 3 , Sb 2 ⁇ 3 , Cl, Br, or combinations thereof. These materials can be added as fining agents (e.g., to facilitate removal of gaseous inclusions from melted batch materials used to produce the glass) and/or for other purposes.
  • the glasses comprise SnO 2 (e.g., as calculated in mole percent on an oxide basis, 0.02 to 0.3 SnO 2 , etc.) and Fe 2 U 3 (e.g., as calculated in mole percent on an oxide basis, 0.005 to 0.08 Fe 2 O 3 , 0.01 to 0.08 Fe 2 O 3 , etc.) .
  • the glasses comprise SnO 2 and Fe 2 O 3 , wherein, in mole percent on an oxide basis:
  • the glasses comprise less than 0.05% mole percent of Sb 2 O 3 , As 2 O 3 , or combinations thereof.
  • the glasses comprise SnO 2 , Fe 2 O 3 , CeO 2 , Cl, Br, or combinations thereof and include less than 0.05% (e.g., less than 0.04%, less than 0.03%, less than 0.02%, less than 0.01%, etc.) mole percent of Sb 2 O 3 , As 2 O 3 , or combinations thereof.
  • the glasses comprise SnO 2 and Fe 2 O 3 and include less than 0.05 mole percent (e.g., less than 0.04 mole percent, less than 0.03 mole percent, less than 0.02 mole percent, less than 0.01 mole percent, etc.) of Sb 2 O 3 , As 2 O 3 , or combinations thereof.
  • the glasses comprise SnO 2 and Fe 2 Os, wherein, in mole percent on an oxide basis:
  • the glasses can include F, Cl, or Br, for example, as in the case where the glasses comprise Cl and/or Br as fining agents.
  • the glass can comprise fluorine, chlorine, and/or bromine, wherein, as calculated in mole percent: F+Cl+Br ⁇ 0.4, such as where F+Cl+Br ⁇ 0.3, F+Cl+Br ⁇ 0.2, F+Cl+Br ⁇ 0.1, 0.001 ⁇ F+Cl+Br ⁇ 0.4, and/or 0.005 ⁇ F+Cl+Br ⁇ 0.4.
  • the glass comprises SnO 2 and Fe 2 O 3 and, optionally, fluorine, chlorine, and/or bromine, such that, as calculated in mole percent on an oxide basis: 0.02 ⁇ SnO 2 ⁇ 0.3, 0.005 ⁇ Fe 2 O 3 ⁇ 0.08, and F+Cl+Br ⁇ 0.4; and, in certain embodiments, the glass comprises SnO 2 and Fe 2 O 3 and, optionally, Sb 2 O 3 , As 2 O 3 , fluorine, chlorine, and/or bromine, such that, as calculated in mole percent on an oxide basis, 0.02 ⁇ SnO 2 ⁇ 0.3, 0.005 ⁇ Fe 2 O 3 ⁇ 0.08, and F+Cl+Br ⁇ 0.4, and such that the glass includes less than 0.05 mole percent (e.g., less than 0.04, less than 0.03, less than 0.02, less than 0.01, etc.) mole percent of Sb 2 ⁇ 3 , AS 2 O 3 3
  • 0.05 mole percent e
  • the glasses comprise BaO. In certain embodiments, the glasses comprise less than 0.1 mole percent of BaO.
  • the glasses can further include contaminants as typically found in commercially prepared glass.
  • a variety of other oxides e.g., TiO 2 , MnO, ZnO, Nb 2 O 5 , MoO 3 , Ta 2 O 5 , WO 3 , ZrO 2 , Y 2 O 3 , La 2 O 3 , P 2 O 5 , and the like
  • TiO 2 , MnO, ZnO, Nb 2 O 5 , MoO 3 , Ta 2 O 5 , WO 3 , ZrO 2 , Y 2 O 3 , La 2 O 3 , P 2 O 5 , and the like can be added, albeit with adjustments to other glass components, without compromising their melting or forming characteristics.
  • each of such other oxides are typically present in an amount not exceeding 2 mole percent, and their total combined concentration is typically less than or equal to 5 mole percent, although higher amounts can be used so long as the amounts used do not place the composition outside of the ranges described above.
  • the glasses can also include various contaminants associated with batch materials and/or introduced into the glass by the melting, fining, and/or forming equipment used to produce the glass (e.g., ZrO 2 ) .
  • the glass is down- drawable; that is, the glass is capable of being formed into sheets using down-draw methods such as, but not limited to, fusion draw and slot draw methods that are known to those skilled in the glass fabrication arts. Such down-draw processes are used in the large-scale manufacture of flat glass, for example, display glass or ion-exchangeable glass.
  • the fusion draw process uses an isopipe that has a channel for accepting molten glass raw material. The channel has weirs that are open at the top along the length of the channel on both sides of the channel. When the channel fills with molten material, the molten glass overflows the weirs.
  • the molten glass flows down the outside surfaces of the isopipe. These outside surfaces extend down and inwardly so that they join at an edge below the drawing tank. The two flowing glass surfaces join at this edge to fuse and form a single flowing sheet.
  • the fusion draw method offers the advantage that, since the two glass films flowing over the channel fuse together, neither outside surface of the resulting glass sheet comes in contact with any part of the apparatus. Thus, the surface properties are not affected by such contact.
  • the slot draw method is distinct from the fusion draw method.
  • the molten raw material glass is provided to a conduit.
  • the bottom of the conduit has an open slot that is wider in one dimension than the other dimension with a nozzle that extends the length of the slot.
  • the molten glass flows through the slot/nozzle and is drawn downward as a continuous sheet therethrough and into an annealing region.
  • the slot draw process provides a thinner sheet, as only a single sheet is drawn through the slot, rather than two sheets being fused together, as in the fusion down-draw process.
  • the aluminoborosilicate glass described herein has a high liquidus viscosity.
  • the glass has a liquidus viscosity of 50,000 poise or greater, for example, 150,000 poise or greater, for example, greater than or equal to 500,000 poise.
  • the liquidus viscosities of the glasses are very closely correlated with the difference between the liquidus temperature and the softening point. This correlation is indicated by line 10 in Figure 1.
  • the glasses preferably have liquidus - softening point less than about 230 0 C, more preferably less than 200 0 C.
  • the glass has a strain point of 600 0 C or greater, for example, 620 0 C or greater. In some embodiments, the glass has a coefficient of thermal expansion of 38 x 10 ⁇ 7 or greater, for example, 40 x 10 ⁇ 7 or greater, for example, 45 x 10 ⁇ 7 or greater.
  • the glass according to one embodiment can have a strain point of 620 °C or greater and/or a coefficient of thermal expansion of 45 x 10 ⁇ 7 or greater.
  • the glass is ion exchanged in a salt bath comprising one or more salts of alkali ions.
  • the glass can be ion exchanged to change its mechanical properties.
  • smaller alkali ions such as lithium or sodium
  • a molten salt containing one or more larger alkali ions such as sodium, potassium, rubidium or cesium. If performed at a temperature well below the strain point for sufficient time, a diffusion profile will form in which the larger alkali moves into the glass surface from the salt bath, and the smaller ion is moved from the interior of the glass into the salt bath.
  • the surface will go under compression, producing enhanced toughness against damage.
  • Such toughness may be desirable in instances where the glass will be exposed to adverse environmental conditions, such as photovoltaic grids exposed to hail.
  • adverse environmental conditions such as photovoltaic grids exposed to hail.
  • a large alkali already in the glass can also be exchanged for a smaller alkali in a salt bath. If this is performed at temperatures close to the strain point, and if the glass is removed and its surface rapidly reheated to high temperature and rapidly cooled, the surface of the glass will show considerable compressive stress introduced by thermal tempering. This will also provide protection against adverse environmental conditions.
  • the glass can be float formed as known in the art of float forming glass.
  • the glass is in the form of a sheet.
  • the glass in the form of a sheet can be thermally tempered.
  • an Organic Light Emitting Diode device comprises the glass in the form of a sheet.
  • a photovoltaic device comprises the glass in the form of a sheet.
  • the photovoltaic device can comprise more than one of the glass sheets, for example, as a substrate and/or as a superstrate.
  • the glass sheet is substantially planar. According to one embodiment, the glass sheet is transparent.
  • the glass sheet has a thickness of 4.0mm or less, for example, 3.5mm or less, for example, 3.2mm or less, for example, 3.0mm or less, for example, 2.5mm or less, for example, 2.0mm or less, for example, 1.9mm or less, for example, 1.8mm or less, for example, 1.5mm or less, for example, 1.1mm or less, for example, 0.5mm to 2.0mm, for example, 0.5mm to 1.1mm, for example, 0.7mm to 1.1mm.
  • the glass sheet can have a thickness of any numerical value including decimal places in the range of from 0.1mm up to and including 4.0mm.
  • the photovoltaic device comprising a glass sheet and an active photovoltaic medium adjacent to the glass sheet.
  • the active photovoltaic medium can comprise multiple layers, for example, an amorphous silicon layer and a microcrystalline silicon layer.
  • the active photovoltaic medium comprises cadmium telluride, copper indium gallium diselenide, amorphous silicon, crystalline silicon, microcrystalline silicon, or combinations thereof.
  • FIG. 2 Another embodiment, as shown in Figure 2 features 200 of a photovoltaic device comprising a glass sheet 12 comprising any of the glass compositions previously described and an active photovoltaic medium 16 adjacent to the glass sheet, wherein the active photovoltaic medium comprises cadmium telluride.
  • the glass sheet has a thickness as previously described.
  • the photovoltaic device can further comprise a conductive layer 14, such as a transparent conductive oxide adjacent to or disposed on the glass sheet.
  • an electrochromic device comprises the glass in the form of a sheet.
  • the electrochromic device can be, for example, an electrochromic window.
  • the total does not add up to 100%, since certain tramp elements are present at non-negligible concentrations .
  • limestone depending on the source can contain tramp elements and/or vary amounts of one or more oxides, for example, MgO and/or BaO.
  • the sand is advantageously beneficiated so that at least 80% by mass passes 60 mesh, for example 80 mesh, for example 100 mesh.
  • the SnO 2 added, in this example, was pre-mixed with sand at a level of 10% by weight so as to ensure homogeneous mixing with the other components.
  • the bottle containing the batch materials was mounted to a tumbler and the batch materials were mixed so as to make a homogeneous batch and to break up soft agglomerates.
  • the mixed batch was transferred to a 1800cc platinum crucible and placed into a high-temperature ceramic backer.
  • the platinum in its backer was loaded into a glo-bar furnace idling at a temperature of 1550 0 C. After 6 hours, the crucible+backer was removed and the glass melt was poured onto a cold surface, such as a steel plate, to form a patty, and then transferred to an annealer held at a temperature of 670 0 C. The glass patty was held at the annealer temperature for 2 hours, then cooled at a rate of 1°C per minute to room temperature.
  • Table 3, Table 4, Table 5, Table 6, Table 7, and Table 8 show exemplary glasses, according to embodiments of the invention, and made according to the above example. Properties data for some glasses are also shown in Table 3, Table 4, Table 5, Table 6, Table 7, and Table 8. [0070] In view of its low liquidus temperature of 940 0 C and, hence, its extremely high liquidus viscosity in excess of 5,000,000 poise, glass 49, shown in Table 8 is an advantageous glass for applications, such as glass for photovoltaics .
  • the exemplary glasses shown in Table 8 comprise, in mole percent: 62 to 64 percent SiO 2 ;
  • the glasses shown in Table 8 have anneal points > 640 0 C, thermal expansion coefficients (CTE) of 40-50 x 10 " 7 /°C, 200 poise temperatures of ⁇ 1550°C, and liquidus viscosities of ⁇ 500,000 poise.
  • Liquidus viscosity may be dependent on the K 2 O content, for example, exemplary glass 49 has a maximum value in excess of 5,000,000 poise for an intermediate K 2 O content when compared to exemplary glasses 48, 50, and 51.
  • the alkalis in the glass according to the present invention and low melting temperature combine to accelerate melting thus enabling high volume, low-cost melting and forming relative to alkali-free alternatives while retaining competitive properties, including in particular mechanical and dimensional stability when reheated to high temperature.
  • These glasses are well suited for large-volume sheet glass applications, particularly OLED lighting and cadmium telluride

Abstract

Aluminoborosilicate glasses which may be useful in photovoltaic, photochromic, electrochromic, or Organic Light Emitting Diode (OLED) lighting applications are described.

Description

Intermediate Thermal Expansion Coefficient Glass
[0001] This application claims the benefit of priority to US Patent Application No. 12/573213 filed on October 5, 2009, which claims priority to US Provisional Application No. 61/103126 filed on October 6, 2008, and US Provisional Application No. 61/177827 filed on May 13, 2009.
BACKGROIMD
Field
[0002] Embodiments relate generally to aluminoborosilicate glasses and more particularly to low alkali aluminoborosilicate glasses which may be useful in photovoltaic, photochromic, electrochromic, or Organic Light Emitting Diode (OLED) lighting applications.
Technical Background
[0003] The fusion forming process typically produces flat glass with optimal surface and geometric characteristics useful for many electronics applications, for instance, substrates used in electronics applications, for example, display glass for LCD televisions.
[0004] Over the last 10 years, Corning fusion glass products include 1737F™, 1737G™, Eagle2000F™, EagleXG™, Jade™, and Codes 1317 and 2317 (Gorilla Glass™) . Efficient melting is generally believed to occur at a temperature corresponding to a melt viscosity of about 200 poise (p) . These glasses share in common 20Op temperatures in excess of 16000C, which can translate to accelerated tank and electrode corrosion, greater challenges for fining due to still more elevated finer temperatures, and/or reduced platinum system life time, particularly around the finer. Many have temperatures at 3000 poise in excess of about 13000C, and since this is a typical viscosity for an optical stirrer, the high temperatures at this viscosity can translate to excessive stirrer wear and elevated levels of platinum defects in the body of the glass. [0005] Many of the above described glasses have delivery temperatures in excess of 12000C, and this can contribute to creep of isopipe refractory materials, particularly for large sheet sizes.
[0006] These attributes combine so as to limit flow (because of slow melt rates) , to accelerate asset deterioration, to force rebuilds on timescales much shorter than product lifetimes, to force unacceptable (arsenic) , expensive (capsule) or unwieldy (vacuum fining) solutions to defect elimination, and thus contribute in significant ways to the cost of manufacturing glass .
[0007] In applications in which rather thick, comparatively low-cost glass with less extreme properties is required, these glasses are not only overkill, but prohibitively expensive to manufacture. This is particularly true when the • competitive materials are made by the float process, a very good process for producing low cost glass with rather conventional properties. In applications that are cost sensitive, such as large-area photovoltaic panels and OLED lighting, this cost differential is so large as to make the price point of LCD- type glasses unacceptable.
[0008] To reduce such costs, it is advantageous to drive down the largest overall contributors (outside of finishing) , and many of these track directly with the temperatures used in the melting and forming process. Therefore, there is a need for a glass that melts at a lower temperature than those aforementioned glasses.
[0009] Further, it would be advantageous to have a glass useful for low • temperature applications, for instance, photovoltaic and OLED light applications. Further, it would be advantageous to have a glass whose processing temperatures were low enough that the manufacturing of the glass would not excessively consume the energy that these applications are aiming to save.
SUMMARY
[0010] One embodiment is a glass comprising, in mole percent: 60 to 65 percent SiO2;
8 to 12 percent Al2O3; 7 to 15 percent B2O3; greater than 0 to 8 percent M2O; and
9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
[0011] Such glasses address one or more of the above-mentioned disadvantages of conventional glasses and provide one or more of the following advantages: the alkalis added to the glass can greatly accelerate melting, permitting higher pull rates and lower melting temperatures. They can also raise the coefficient of thermal expansion so as to be a better match for, for example, CdTe photovoltaics .
[0012] Additional features and advantages will be set forth in the detailed description which follows, and in part will be readily apparent to those skilled in the art from the description or recognized by practicing the invention as described in the written description and claims hereof, as well as the appended drawings.
[0013] It is to be understood that both the foregoing general description and the following detailed description are merely exemplary of the invention, and are intended to provide an overview or framework for understanding the nature and character of the invention as it is claimed. [0014] The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. The drawings illustrate one or more embodiment ( s ) of the invention and together with the description serve to explain the principles and operation of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
[0015] The invention can be understood from the following detailed description either alone or together with the accompanying drawing figures.
[0016] Figure 1 is a graph of estimated liquidus viscosity. [0017] Figure 2 is an illustration of features of a photovoltaic device according to one embodiment.
DETAILED DESCRIPTION
[0018] Reference will now be made in detail to various embodiments of the invention. Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or like features.
[0019] As used herein, the term "substrate" can be used to describe either a substrate or a superstrate depending on the configuration of the photovoltaic cell. For example, the substrate is a superstrate, if when assembled into a photovoltaic cell, it is on the light incident side of a photovoltaic cell. The superstrate can provide protection for the photovoltaic materials from impact and environmental degradation while allowing transmission of the appropriate wavelengths of the solar spectrum. Further, multiple photovoltaic cells can be arranged into a photovoltaic module. [0020] As used herein, the term "adjacent" can be defined as being in close proximity. Adjacent structures may or may not be in physical contact with each other. Adjacent structures can have other layers and/or structures disposed between them. [0021] As used herein, the term "planar" can be defined as having a substantially topographically flat surface. [0022] Although exemplary numerical ranges are described in the embodiments, each of the ranges can include any numerical value including decimal places within the range including each of the ranges endpoints.
[0023] As used herein, multivalent components of the exemplary compositions are represented, for example, as Fe2O3, SnO2, AS2O5, Sb2Os. These materials are batched as said oxides but mixed valences or alternative valences could be used. [0024] One embodiment is a glass comprising, in mole percent:
60 to 65 percent SiO2;
8 to 12 percent Al2O3;
7 to 15 percent B2O3; greater than 0 to 8 percent M2O; and
9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
[0025] Another embodiment is a glass comprising, in mole percent:
61 to 64 percent SiO2;
8 to 12 percent Al2O3;
9 to 15 percent B2O3; greater than 0 to 4 percent M2O; and
12 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
[0026] Another embodiment is a glass comprising, in mole percent:
60 to 65 percent SiO2; 8 to less than 10 percent Al2O3; greater than 11 to 15 percent B2O3; greater than 0 to less than 1 percent M2O; and
9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
[0027] Another embodiment is a glass comprising, in mole percent:
60 to 65 percent SiO2;
10 to 12 percent Al2O3; 7 to 11 percent B2O3;
1 to 8 percent M2O; and
9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
[0028] In one embodiment, M is an alkali metal selected from Li, Na, K, Rb, Cs, and a combination thereof. In some embodiments, M is selected from Li, K, Cs, and a combination thereof.
[0029] In one embodiment, R is selected from Mg, Ca, Sr, Ba, and a combination thereof. In some embodiments, R is selected from Mg, Ca, Sr, and a combination thereof. [0030] According to another embodiment, the glass is substantially free of BaO. For example, the content of BaO can be 0.05 mole percent or less, for example, zero mole percent .
[0031] In some embodiments, the glass is substantially free of Sb2θ3, AS2O3, or combinations thereof, for example, the glass comprises 0.05 mole percent or less of Sb2θ3 or As2O3 or a combination thereof. For example, the glass can comprise zero mole percent of Sb2O3 or As2O3 or a combination thereof. [0032] In some embodiments, the glass comprises 60 to 65 mole percent SiO2. In some embodiments, the glass comprises 61 to 64 mole percent SiO2. In some embodiments, the glass comprises 62 to 64 mole percent SiO2.
[0033] In another embodiment, the glass comprises 0.01 to 0.4 mole percent Snθ2.
[0034] The glass according to one embodiment, comprises in mole percent:
62 to 65 percent SiO2;
10 to 12 percent Al2O3;
7 to 11 percent B2O3;
3 to 8 percent MgO;
3 to 10 percent CaO;
3 to 8 percent SrO; and
1 to 8 percent M2O; wherein, M is an alkali metal selected from K, Na, and combinations thereof and wherein, CaO/ (CaO + SrO) is from 0.4 to 1.
[0035] The glass, in one embodiment, is rollable. The glass, in one embodiment, is down-drawable. The glass can be slot drawn or fusion drawn, for example. According to another embodiment, the glass can be float formed.
[0036] The glass can further comprise 2 mole percent or less of TiO2, MnO, ZnO, Nb2O5, MoO3, Ta2O5, WO3, ZrO2, Y2O3, La2O3, HfO2, CdO, SnO2, Fe2O3, CeO2, As2O3, Sb2O3, Cl, Br, P2O5, or combinations thereof.
[0037] As mentioned above, the glasses, according some embodiments, comprise 7 to 15 mole percent, for example, 7 to 11 mole percent B2O3. B2O3 is added to the glass to reduce melting temperature, to decrease liquidus temperature, to increase liquidus viscosity, and to improve mechanical durability relative to a glass containing no B2O3. [0038] Also as mentioned above, the glasses, according to some embodiments, 9 to 15 mole percent RO wherein, R is an alkaline earth metal. The glass can comprise, for example, 1 to 8 mole percent MgO. MgO can be added to the glass to reduce melting temperature and to increase strain point. It can disadvantageously lower CTE relative to other alkaline earths
(e.g., CaO, SrO, BaO), and so other adjustments may be made to keep the CTE within the desired range. Examples of suitable adjustments include increase SrO at the expense of CaO, increasing alkali oxide concentration, and replacing a smaller alkali oxide (e.g., Na2O) in whole or in part with a larger alkali oxide (e.g., K2O).
[0039] The glasses, in some embodiments, comprise 1 to 9 mole percent CaO. Relative to alkali oxides or SrO, CaO contributes to higher strain point, lower density, and lower melting temperature. It is a primary component of certain possible devitrification phases, particularly anorthite
(CaAIaSi2Os) , and this phase has complete solid solution with an analogous sodium phase, albite (NaAlSisOs) . High Na and Ca contents taken alone can cause liquidus temperatures to be unacceptably high. However, the chemical sources for CaO include limestone, a very inexpensive material, so to the extent that high volume and low cost are factors, it is typically useful to make the CaO content as high as can be reasonably achieved relative to other alkaline earth oxides.
[0040] The glasses can comprise, in some embodiments, 0 to 5 mole percent SrO. In certain embodiments, the glass contains no deliberately batched SrO, though it may of course be present as a contaminant in other batch materials. SrO contributes to higher coefficient of thermal expansion, and the relative proportion of SrO and CaO can be manipulated to improve liquidus temperature, and thus liquidus viscosity. SrO is not as effective as CaO or MgO for improving strain point, and replacing either of these with SrO tends to cause the melting temperature to increase.
[0041] In certain embodiments, the glass satisfies one or more of the following expressions:
1.0 < (M2O + RO) /Al2O3 < 2; and
0.4 < CaO/(CaO+SrO) < 1.
The ratio (M2O + RO) /Al2θ3 is advantageously greater than 1.0 to assist in removing bubbles from the glass during the initial melt step. This occurs because the alkali and alkaline earth metal oxides that are not involved in stabilizing Al2O3 are available to digest the silica source, typically a commercial sand. Surface area that might be sites for bubble nucleation and growth are therefore eliminated early in melting, and a comparatively bubble-free glass is obtained.
[0042] The ratio CaO/ (CaO+SrO) is advantageously kept between 0.4 and 1 to obtain a good balance between liquidus temperature (and hence liquidus viscosity) and melting temperature. For example, compositions with low alkali concentrations and high SrO concentrations have comparatively high melting temperatures, and if SrO is too high then liquidus temperatures may be elevated as well relative to glasses with more alkali oxide and lower SrO. However, for fixed concentrations of all other components, a local minimum in liquidus temperature is often obtained for CaO/ (CaO+SrO) ratios between 0.4 and 1.
[0043] Also as mentioned above, the glasses, according to some embodiments, include greater than zero to 8 mole percent M2O, for example, 0.05 to 8 mole percent M2O, 0.1 to 8 mole percent M2O, 0.5 to 8 mole percent M2O, 1 to 8 mole percent M2O, where M is one or more of the alkali cations Li, Na, K, Rb and Cs. In certain embodiments, it is desirable that the alkalis in question be Li, K and Cs or combinations thereof. The alkali cations raise the CTE steeply, but also lower the strain point and, depending upon how they are added, increase melting temperatures. The least effective alkali oxide for CTE is Li2θ, and the most effective alkali oxide is CS2O. As noted above, sodium can participate in one of the possible devitrification phases of the inventive glasses, and while adjustments in other components can be used to counteract this, e.g., changing the CaO/ (CaO+SrO) ratio, this tendency may make it advantageous to replace sodium with other alkalis, or to use a mix of alkalis instead of sodium alone. If high volume and low cost are important, then it is desirable to as much as possible confine the alkali oxides to Na2θ and K2O or combinations thereof.
[0044] The glasses, according to some embodiments, can further comprise a variety of other components. For example, the glasses can comprise SnC>2, Fe2θ3, MnO, Ceθ2, AS2O3, Sb2θ3, Cl, Br, or combinations thereof. These materials can be added as fining agents (e.g., to facilitate removal of gaseous inclusions from melted batch materials used to produce the glass) and/or for other purposes. In certain embodiments, the glasses comprise SnO2 (e.g., as calculated in mole percent on an oxide basis, 0.02 to 0.3 SnO2, etc.) and Fe2U3 (e.g., as calculated in mole percent on an oxide basis, 0.005 to 0.08 Fe2O3, 0.01 to 0.08 Fe2O3, etc.) . By way of illustration, in certain embodiments, the glasses comprise SnO2 and Fe2O3, wherein, in mole percent on an oxide basis:
0.02 ≤ SnO2 ≤ 0.3; and
0.005 < Fe2O3 < 0.08.
[0045] In certain embodiments, the glasses comprise less than 0.05% mole percent of Sb2O3, As2O3, or combinations thereof. In certain embodiments, the glasses comprise SnO2, Fe2O3, CeO2, Cl, Br, or combinations thereof and include less than 0.05% (e.g., less than 0.04%, less than 0.03%, less than 0.02%, less than 0.01%, etc.) mole percent of Sb2O3, As2O3, or combinations thereof. In certain embodiments, the glasses comprise SnO2 and Fe2O3 and include less than 0.05 mole percent (e.g., less than 0.04 mole percent, less than 0.03 mole percent, less than 0.02 mole percent, less than 0.01 mole percent, etc.) of Sb2O3, As2O3, or combinations thereof. In certain embodiments, the glasses comprise SnO2 and Fe2Os, wherein, in mole percent on an oxide basis:
0.02 < SnO2 < 0.3; and
0.005 < Fe2O3 ≤ 0.08, and include less than 0.05% mole percent of Sb2O3, As2O3, or combinations thereof.
[0046] The glasses, according to some embodiments, (e.g., any of the glasses discussed above) can include F, Cl, or Br, for example, as in the case where the glasses comprise Cl and/or Br as fining agents. For example, the glass can comprise fluorine, chlorine, and/or bromine, wherein, as calculated in mole percent: F+Cl+Br < 0.4, such as where F+Cl+Br < 0.3, F+Cl+Br ≤ 0.2, F+Cl+Br ≤ 0.1, 0.001 ≤ F+Cl+Br < 0.4, and/or 0.005 ≤ F+Cl+Br ≤ 0.4. By way of illustration, in certain embodiments, the glass comprises SnO2 and Fe2O3 and, optionally, fluorine, chlorine, and/or bromine, such that, as calculated in mole percent on an oxide basis: 0.02 ≤ SnO2 ≤ 0.3, 0.005 ≤ Fe2O3 < 0.08, and F+Cl+Br < 0.4; and, in certain embodiments, the glass comprises SnO2 and Fe2O3 and, optionally, Sb2O3, As2O3, fluorine, chlorine, and/or bromine, such that, as calculated in mole percent on an oxide basis, 0.02 < SnO2 ≤ 0.3, 0.005 ≤ Fe2O3 ≤ 0.08, and F+Cl+Br ≤ 0.4, and such that the glass includes less than 0.05 mole percent (e.g., less than 0.04, less than 0.03, less than 0.02, less than 0.01, etc.) mole percent of Sb2θ3, AS2O3, or combinations thereof.
[0047] The glasses, according to some embodiments, comprise BaO. In certain embodiments, the glasses comprise less than 0.1 mole percent of BaO.
[0048] The glasses, according to some embodiments, can further include contaminants as typically found in commercially prepared glass. In addition or alternatively, a variety of other oxides (e.g., TiO2, MnO, ZnO, Nb2O5, MoO3, Ta2O5, WO3, ZrO2, Y2O3, La2O3, P2O5, and the like) can be added, albeit with adjustments to other glass components, without compromising their melting or forming characteristics. In those cases where the glasses, according to some embodiments, further include such other oxide (s), each of such other oxides are typically present in an amount not exceeding 2 mole percent, and their total combined concentration is typically less than or equal to 5 mole percent, although higher amounts can be used so long as the amounts used do not place the composition outside of the ranges described above. The glasses, according to some embodiments, can also include various contaminants associated with batch materials and/or introduced into the glass by the melting, fining, and/or forming equipment used to produce the glass (e.g., ZrO2) .
[0049] The glass, according to some embodiments, is down- drawable; that is, the glass is capable of being formed into sheets using down-draw methods such as, but not limited to, fusion draw and slot draw methods that are known to those skilled in the glass fabrication arts. Such down-draw processes are used in the large-scale manufacture of flat glass, for example, display glass or ion-exchangeable glass. [0050] The fusion draw process uses an isopipe that has a channel for accepting molten glass raw material. The channel has weirs that are open at the top along the length of the channel on both sides of the channel. When the channel fills with molten material, the molten glass overflows the weirs. Due to gravity, the molten glass flows down the outside surfaces of the isopipe. These outside surfaces extend down and inwardly so that they join at an edge below the drawing tank. The two flowing glass surfaces join at this edge to fuse and form a single flowing sheet. The fusion draw method offers the advantage that, since the two glass films flowing over the channel fuse together, neither outside surface of the resulting glass sheet comes in contact with any part of the apparatus. Thus, the surface properties are not affected by such contact.
[0051] The slot draw method is distinct from the fusion draw method. Here the molten raw material glass is provided to a conduit. The bottom of the conduit has an open slot that is wider in one dimension than the other dimension with a nozzle that extends the length of the slot. The molten glass flows through the slot/nozzle and is drawn downward as a continuous sheet therethrough and into an annealing region. Compared to the fusion draw process, the slot draw process provides a thinner sheet, as only a single sheet is drawn through the slot, rather than two sheets being fused together, as in the fusion down-draw process.
[0052] In order to be compatible with down-draw processes, the aluminoborosilicate glass described herein has a high liquidus viscosity. In one embodiment, the glass has a liquidus viscosity of 50,000 poise or greater, for example, 150,000 poise or greater, for example, greater than or equal to 500,000 poise. The liquidus viscosities of the glasses are very closely correlated with the difference between the liquidus temperature and the softening point. This correlation is indicated by line 10 in Figure 1. For downdraw processes, the glasses preferably have liquidus - softening point less than about 2300C, more preferably less than 2000C. [0053] Accordingly, in one embodiment, the glass has a strain point of 6000C or greater, for example, 6200C or greater. In some embodiments, the glass has a coefficient of thermal expansion of 38 x 10~7 or greater, for example, 40 x 10~7 or greater, for example, 45 x 10~7 or greater.
[0054] The glass according to one embodiment can have a strain point of 620 °C or greater and/or a coefficient of thermal expansion of 45 x 10~7 or greater.
[0055] According to one embodiment, the glass is ion exchanged in a salt bath comprising one or more salts of alkali ions. The glass can be ion exchanged to change its mechanical properties. For example, smaller alkali ions, such as lithium or sodium, can be ion-exchanged in a molten salt containing one or more larger alkali ions, such as sodium, potassium, rubidium or cesium. If performed at a temperature well below the strain point for sufficient time, a diffusion profile will form in which the larger alkali moves into the glass surface from the salt bath, and the smaller ion is moved from the interior of the glass into the salt bath. When the sample is removed, the surface will go under compression, producing enhanced toughness against damage. Such toughness may be desirable in instances where the glass will be exposed to adverse environmental conditions, such as photovoltaic grids exposed to hail. A large alkali already in the glass can also be exchanged for a smaller alkali in a salt bath. If this is performed at temperatures close to the strain point, and if the glass is removed and its surface rapidly reheated to high temperature and rapidly cooled, the surface of the glass will show considerable compressive stress introduced by thermal tempering. This will also provide protection against adverse environmental conditions. It will be clear to one skilled in the art that any monovalent cation can be exchanged for alkalis already in the glass, including copper, silver, thallium, etc., and these also provide attributes of potential value to end uses, such as introducing color for lighting or a layer of elevated refractive index for light trapping. [0056] According to another embodiment, the glass can be float formed as known in the art of float forming glass. [0057] In one embodiment, the glass is in the form of a sheet. The glass in the form of a sheet can be thermally tempered. [0058] In one embodiment, an Organic Light Emitting Diode device comprises the glass in the form of a sheet. [0059] In one embodiment, a photovoltaic device comprises the glass in the form of a sheet. The photovoltaic device can comprise more than one of the glass sheets, for example, as a substrate and/or as a superstrate. In one embodiment, the glass sheet is substantially planar. According to one embodiment, the glass sheet is transparent. [0060] According to some embodiments, the glass sheet has a thickness of 4.0mm or less, for example, 3.5mm or less, for example, 3.2mm or less, for example, 3.0mm or less, for example, 2.5mm or less, for example, 2.0mm or less, for example, 1.9mm or less, for example, 1.8mm or less, for example, 1.5mm or less, for example, 1.1mm or less, for example, 0.5mm to 2.0mm, for example, 0.5mm to 1.1mm, for example, 0.7mm to 1.1mm. Although these are exemplary thicknesses, the glass sheet can have a thickness of any numerical value including decimal places in the range of from 0.1mm up to and including 4.0mm. [0061] In another embodiment, the photovoltaic device comprising a glass sheet and an active photovoltaic medium adjacent to the glass sheet.
[0062] The active photovoltaic medium can comprise multiple layers, for example, an amorphous silicon layer and a microcrystalline silicon layer.
[0063] In one embodiment, the active photovoltaic medium comprises cadmium telluride, copper indium gallium diselenide, amorphous silicon, crystalline silicon, microcrystalline silicon, or combinations thereof.
[0064] Another embodiment, as shown in Figure 2 features 200 of a photovoltaic device comprising a glass sheet 12 comprising any of the glass compositions previously described and an active photovoltaic medium 16 adjacent to the glass sheet, wherein the active photovoltaic medium comprises cadmium telluride. According to one embodiment, the glass sheet has a thickness as previously described. The photovoltaic device can further comprise a conductive layer 14, such as a transparent conductive oxide adjacent to or disposed on the glass sheet.
[0065] In one embodiment, an electrochromic device comprises the glass in the form of a sheet. The electrochromic device can be, for example, an electrochromic window.
Examples
[0066] The following is an example of how to fabricate a sample of an exemplary glass, according to one embodiment of the invention, as shown in Table 1. This composition corresponds to composition number 46 shown in Table 7.
Figure imgf000017_0001
Figure imgf000018_0001
Table 1.
In some embodiments, the total does not add up to 100%, since certain tramp elements are present at non-negligible concentrations .
[0067] Batch materials, as shown in Table 2 were weighed and added to a 4 liter plastic container:
Figure imgf000018_0002
Table 2.
[0068] It should be appreciated that in the batch, limestone, depending on the source can contain tramp elements and/or vary amounts of one or more oxides, for example, MgO and/or BaO. The sand is advantageously beneficiated so that at least 80% by mass passes 60 mesh, for example 80 mesh, for example 100 mesh. The SnO2 added, in this example, was pre-mixed with sand at a level of 10% by weight so as to ensure homogeneous mixing with the other components. The bottle containing the batch materials was mounted to a tumbler and the batch materials were mixed so as to make a homogeneous batch and to break up soft agglomerates. The mixed batch was transferred to a 1800cc platinum crucible and placed into a high-temperature ceramic backer. The platinum in its backer was loaded into a glo-bar furnace idling at a temperature of 15500C. After 6 hours, the crucible+backer was removed and the glass melt was poured onto a cold surface, such as a steel plate, to form a patty, and then transferred to an annealer held at a temperature of 6700C. The glass patty was held at the annealer temperature for 2 hours, then cooled at a rate of 1°C per minute to room temperature.
[0069] Table 3, Table 4, Table 5, Table 6, Table 7, and Table 8 show exemplary glasses, according to embodiments of the invention, and made according to the above example. Properties data for some glasses are also shown in Table 3, Table 4, Table 5, Table 6, Table 7, and Table 8. [0070] In view of its low liquidus temperature of 9400C and, hence, its extremely high liquidus viscosity in excess of 5,000,000 poise, glass 49, shown in Table 8 is an advantageous glass for applications, such as glass for photovoltaics . The exemplary glasses shown in Table 8 comprise, in mole percent: 62 to 64 percent SiO2;
8 to 12 percent Al2O3;
9 to 15 percent B2O3; greater than 0 to 4 percent M2O; and 12 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
[0071] Further, the glasses shown in Table 8 have anneal points > 6400C, thermal expansion coefficients (CTE) of 40-50 x 10" 7/°C, 200 poise temperatures of ≤1550°C, and liquidus viscosities of ≥ 500,000 poise. Liquidus viscosity may be dependent on the K2O content, for example, exemplary glass 49 has a maximum value in excess of 5,000,000 poise for an intermediate K2O content when compared to exemplary glasses 48, 50, and 51.
Figure imgf000020_0001
Table 3.
Figure imgf000021_0001
Table 4.
Figure imgf000022_0001
Table 5.
Figure imgf000023_0001
Table 6.
Figure imgf000024_0001
Table 7.
Figure imgf000025_0001
Table 8.
[0072] The alkalis in the glass according to the present invention and low melting temperature combine to accelerate melting thus enabling high volume, low-cost melting and forming relative to alkali-free alternatives while retaining competitive properties, including in particular mechanical and dimensional stability when reheated to high temperature. These glasses are well suited for large-volume sheet glass applications, particularly OLED lighting and cadmium telluride
(CdTe) photovoltaics, for which thermal stability, large volumes, and low cost are desirable substrate attributes. [0073] It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention cover the modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents.

Claims

CLAIMSWhat is claimed is:
1. A glass comprising, in mole percent:
60 to 65 percent SiO2;
8 to 12 percent Al2O3;
7 to 15 percent B2O3; greater than 0 to 8 percent M2O; and
9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
2. The glass according to claim 1, comprising 0.05 mole percent M2O.
3. The glass according to claim 1, comprising 0.1 mole percent M2O.
4. The glass according to claim 1, comprising, in mole percent:
61 to 64 percent SiO2;
8 to 12 percent Al2O3;
9 to 15 percent B2O3; greater than 0 to 4 percent M2O; and 12 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
5. The glass according to claim 1, comprising, in mole percent :
60 to 65 percent SiO2;
8 to less than 10 percent Al2O3; greater than 11 to 15 percent B2O3; greater than 0 to less than 1 percent M2O; and 9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
6. The glass according to claim 1, comprising, in mole percent :
60 to 65 percent SiO2;
10 to 12 percent Al2O3; 7 to 11 percent B2O3;
1 to 8 percent M2O; and 9 to 15 percent RO; wherein, M is an alkali metal and wherein, R is an alkaline earth metal.
7. The glass according to claim 1, wherein M is selected from Li, Na, K, Rb, Cs, and a combination thereof.
8. The glass according to claim 7, wherein M is selected from Li, K, Cs and a combination thereof.
9. The glass according to claim 1, wherein R is selected from Mg, Ca, Sr, Ba, and a combination thereof.
10. The glass according to claim 9, wherein R is selected from Mg, Ca, Sr, and a combination thereof.
11. The glass according to claim 1, comprising 62 to 65 percent SiO2.
12. The glass according to claim 1, further comprising 0.01 to 0.4 percent SnO2.
13. The glass according to claim 1, comprising:
62 to 65 percent SiO2;
10 to 12 percent Al2O3;
7 to 11 percent B2O3;
3 to 8 percent MgO;
3 to 10 percent CaO;
3 to 8 percent SrO; and
1 to 8 percent M2O; wherein, M is an alkali metal selected from K, Na, and combinations thereof and wherein, CaO/ (CaO + SrO) is from 0.4 and 1.
14. The glass according to claim 1, wherein the glass is down- drawable .
15. The glass according to claim 1, wherein the glass is slot drawn or fusion drawn.
16. The glass according to claim 1, wherein the glass is float formed.
17. The glass according to claim 1, wherein the glass is substantially free of BaO.
18. The glass according to claim 1, wherein the glass is substantially free of Sb2Os, As2O3, or combinations thereof.
19. The glass according to claim 1, wherein the glass is ion exchanged in a salt bath comprising one or more salts of alkali ions.
20. The glass according to claim 1, further comprising 2 mole percent or less of TiO2, MnO, ZnO, Nb2O5, MoO3, Ta2O5, WO3, ZrO2, Y2O3, La2O3, P2O5, or combinations thereof.
21. The glass according to claim 1, wherein the glass is in the form of a sheet.
22. The glass according to claim 21, wherein the glass is thermally tempered.
23. An Organic Light Emitting Diode device comprising the glass according to claim 21.
24. A photovoltaic device comprising the glass according to claim 21.
25. The photovoltaic device according to claim 24, further comprising an active photovoltaic medium adjacent to the glass .
26. The photovoltaic device according to claim 25, wherein the active photovoltaic medium comprises cadmium telluride, copper indium gallium diselenide, amorphous silicon, crystalline silicon, microcrystalline silicon, or combinations thereof.
27. The glass according to claim 1, having a strain point of 6000C or greater.
28. The glass according to claim 1, having a coefficient of thermal expansion of 38 x 10~7 or greater.
29. The glass according to claim 1, having a coefficient of thermal expansion of 45 x 10~7 or greater.
30. The glass according to claim 1, having a strain point of 6200C or greater and a coefficient of thermal expansion of 45 x 10~7 or greater.
31. The glass according to claim 1, having a liquidus viscosity of 50,000 poise or greater.
32. The glass according to claim 31, having a liquidus viscosity of 150,000 poise or greater.
PCT/US2009/059607 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass WO2010042460A2 (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
KR1020167021282A KR20160097385A (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass
EP09793309.7A EP2349938B1 (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass
CN2009801404052A CN102171154A (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass
JP2011531105A JP6042613B2 (en) 2008-10-06 2009-10-06 Glass with intermediate thermal expansion coefficient
KR1020177030788A KR101891459B1 (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass
MX2011003630A MX2011003630A (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass.
AU2009302561A AU2009302561A1 (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass
CA2739098A CA2739098A1 (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US10312608P 2008-10-06 2008-10-06
US61/103,126 2008-10-06
US17782709P 2009-05-13 2009-05-13
US61/177,827 2009-05-13
US12/573,213 2009-10-05
US12/573,213 US8445394B2 (en) 2008-10-06 2009-10-05 Intermediate thermal expansion coefficient glass

Publications (2)

Publication Number Publication Date
WO2010042460A2 true WO2010042460A2 (en) 2010-04-15
WO2010042460A3 WO2010042460A3 (en) 2010-06-03

Family

ID=42074832

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/059607 WO2010042460A2 (en) 2008-10-06 2009-10-06 Intermediate thermal expansion coefficient glass

Country Status (11)

Country Link
US (3) US8445394B2 (en)
EP (1) EP2349938B1 (en)
JP (3) JP6042613B2 (en)
KR (3) KR20160097385A (en)
CN (2) CN102171154A (en)
AU (1) AU2009302561A1 (en)
CA (1) CA2739098A1 (en)
MX (1) MX2011003630A (en)
RU (1) RU2011118352A (en)
TW (1) TWI403482B (en)
WO (1) WO2010042460A2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011010067A3 (en) * 2009-07-22 2011-08-11 Saint-Gobain Glass France Electrochromic device
CN103702952A (en) * 2011-07-25 2014-04-02 康宁股份有限公司 Laminated and ion-exchanged strengthened glass laminates and their manufacturing method
US8730552B2 (en) 2005-10-11 2014-05-20 Sage Electrochromics, Inc. Electrochromic devices having improved ion conducting layers
KR20140064860A (en) * 2011-08-12 2014-05-28 코닝 인코포레이티드 Fusion formable alkali-free intermediate thermal expansion coefficient glass
EP2759522A4 (en) * 2011-09-22 2015-05-20 Asahi Glass Co Ltd Glass plate for tempering

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8445394B2 (en) * 2008-10-06 2013-05-21 Corning Incorporated Intermediate thermal expansion coefficient glass
US9371247B2 (en) 2009-05-29 2016-06-21 Corsam Technologies Llc Fusion formable sodium free glass
JP5537144B2 (en) * 2009-12-16 2014-07-02 ＡｖａｎＳｔｒａｔｅ株式会社 Glass composition and glass substrate for flat panel display using the same
US9302937B2 (en) 2010-05-14 2016-04-05 Corning Incorporated Damage-resistant glass articles and method
KR101747057B1 (en) * 2010-06-29 2017-06-13 코닝 인코포레이티드 Multi-Layer Glass Sheet Made by Co-drawing Using the Overflow Downdraw Fusion Process
TWI537231B (en) 2010-07-12 2016-06-11 康寧公司 High static fatigue alumina isopipes
US10421681B2 (en) * 2010-07-12 2019-09-24 Corning Incorporated Alumina isopipes for use with tin-containing glasses
CN107244902B (en) 2011-03-11 2023-03-10 圣戈本陶瓷及塑料股份有限公司 Refractory object
US8785336B2 (en) * 2011-03-14 2014-07-22 Nippon Electric Glass Co., Ltd. Alkali-free glass
RU2570213C2 (en) 2011-03-30 2015-12-10 Сэнт-Гобэн Керамикс Энд Пластикс, Инк. Refractory article and method of moulding and using said article
RU2013148633A (en) 2011-04-13 2015-05-20 Сэнт-Гобэн Керамикс Энд Пластикс, Инк. FIRE-RESISTANT PRODUCT AND METHOD FOR ITS FORMING (OPTIONS)
US20120280373A1 (en) * 2011-05-06 2012-11-08 Jiangwei Feng Active electronics on strengthened glass with alkali barrier
WO2012160572A2 (en) * 2011-05-11 2012-11-29 Sterlite Technologies Ltd Glass composition and glass substrate for display devices
EP3633740A1 (en) * 2011-08-04 2020-04-08 Corning Incorporated Photovoltaic module package
US10347782B2 (en) * 2011-08-04 2019-07-09 Corning Incorporated Photovoltaic module package
US9321669B2 (en) 2011-08-23 2016-04-26 Corning Incorporated Thin glass sheet with tunable coefficient of thermal expansion
WO2013028969A1 (en) * 2011-08-24 2013-02-28 Corning Incorporated Photovoltaic assembly comprising an array of load compensating pv modules
KR20140112539A (en) 2012-01-11 2014-09-23 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 Refractory object and process of forming a glass sheet using the refractory object
WO2013130665A2 (en) 2012-02-29 2013-09-06 Corning Incorporated Low cte, ion-exchangeable glass compositions and glass articles comprising the same
TWI564262B (en) 2012-02-29 2017-01-01 康寧公司 High cte potassium borosilicate core glasses and glass articles comprising the same
US11352287B2 (en) 2012-11-28 2022-06-07 Vitro Flat Glass Llc High strain point glass
US20140238481A1 (en) * 2013-02-28 2014-08-28 Corning Incorporated Sodium out-flux for photovoltaic cigs glasses
US9701567B2 (en) 2013-04-29 2017-07-11 Corning Incorporated Photovoltaic module package
US9359244B2 (en) 2013-05-21 2016-06-07 Colorado School Of Mines Alumina-rich glasses and methods for making the same
US20140356406A1 (en) * 2013-05-31 2014-12-04 Corning Incorporated Antimicrobial Articles and Methods of Making and Using Same
CN105452184B (en) * 2013-06-14 2018-11-23 康宁股份有限公司 Laminated glass product with mar-proof surface
WO2015023561A2 (en) 2013-08-15 2015-02-19 Corning Incorporated Intermediate to high cte glasses and glass articles comprising the same
CN105764865A (en) 2013-08-15 2016-07-13 康宁股份有限公司 Alkali-doped and alkali-free boroaluminosilicate glass
US20160356942A1 (en) * 2013-08-23 2016-12-08 Corning Incorporated Light emitting diode light panels
US9714188B2 (en) 2013-09-13 2017-07-25 Corning Incorporated Ion exchangeable glasses with high crack initiation threshold
US9452946B2 (en) 2013-10-18 2016-09-27 Corning Incorporated Locally-sintered porous soot parts and methods of forming
CN106414358B (en) * 2013-11-20 2021-08-13 康宁股份有限公司 Scratch resistant boroaluminosilicate glass
US10077208B2 (en) * 2014-03-13 2018-09-18 Corning Incorporated Glass article and method for forming the same
CN107074010B (en) * 2014-07-10 2020-08-25 康宁股份有限公司 Cold formed glass trim
US11097974B2 (en) 2014-07-31 2021-08-24 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
WO2016024962A1 (en) * 2014-08-13 2016-02-18 Corning Incorporated Intermediate cte glasses and glass articles comprising the same
CN107001096A (en) 2014-10-07 2017-08-01 康宁股份有限公司 The glassware and its production method of stress distribution with determination
CN107257780A (en) 2015-02-24 2017-10-17 圣戈本陶瓷及塑料股份有限公司 refractory product and preparation method
US11267747B2 (en) * 2015-03-24 2022-03-08 Corning Incorporated High strength, scratch resistant and transparent glass-based materials
US9953912B2 (en) 2015-04-28 2018-04-24 Corning Incorporated Work pieces and methods of laser drilling through holes in substrates using an exit sacrificial cover layer
JP6909162B2 (en) * 2015-06-02 2021-07-28 コーニング インコーポレイテッド Laminated structures including light guide plates and automotive glazing
RU2599265C1 (en) * 2015-09-21 2016-10-10 Юлия Алексеевна Щепочкина Glass
US11167528B2 (en) * 2015-10-14 2021-11-09 Corning Incorporated Laminated glass article with determined stress profile and method for forming the same
KR102492060B1 (en) 2016-01-12 2023-01-26 코닝 인코포레이티드 Thin thermally and chemically strengthened glass-based articles
JP2019070675A (en) * 2016-03-02 2019-05-09 Ａｇｃ株式会社 Multilayer substrate for electrochromic dimmer elements and electrochromic dimmer element manufacturing method
WO2017204167A1 (en) * 2016-05-25 2017-11-30 旭硝子株式会社 Alkali-free glass substrate, laminated substrate, and method for manufacturing glass substrate
WO2017205605A1 (en) 2016-05-27 2017-11-30 Corning Incorporated Fracture and scratch resistant glass articles
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10134657B2 (en) 2016-06-29 2018-11-20 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
EP3512815B1 (en) * 2016-09-16 2023-12-20 Corning Incorporated High transmission glasses with alkaline earth oxides as a modifier
RU2631716C1 (en) * 2016-09-23 2017-09-26 Юлия Алексеевна Щепочкина Glass
JP2019532906A (en) * 2016-11-07 2019-11-14 コーニング インコーポレイテッド Low viscosity glass and manufacturing method and system
US11111173B2 (en) 2016-11-07 2021-09-07 Corning Incorporated Lithium containing glasses
CN110198839A (en) * 2016-11-09 2019-09-03 康宁公司 Adjustable light window glass with reduced bow and the hollow glass unit including the adjustable light window glass
JP6983377B2 (en) * 2016-12-19 2021-12-17 日本電気硝子株式会社 Glass
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
CN107298528B (en) * 2017-06-30 2019-08-30 东旭科技集团有限公司 Aluminium borosilicate glass and its preparation method and application
CN111065609A (en) * 2017-08-24 2020-04-24 康宁股份有限公司 Glass with improved tempering capability
TWI785156B (en) 2017-11-30 2022-12-01 美商康寧公司 Non-iox glasses with high coefficient of thermal expansion and preferential fracture behavior for thermal tempering
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
WO2020112398A1 (en) 2018-11-26 2020-06-04 Ocv Intellectual Capital, Llc High performance fiberglass composition with improved elastic modulus
BR112021010112A2 (en) 2018-11-26 2021-08-24 Owens Corning Intellectual Capital, Llc High performance fiberglass composite with improved specific modulus
CN114514115B (en) 2019-08-06 2023-09-01 康宁股份有限公司 Glass laminate with embedded stress spike for crack prevention and method of making same
WO2023034014A1 (en) * 2021-08-31 2023-03-09 Corning Incorporated Glass compositions and glass laminate articles comprising the same
CN113929107B (en) * 2021-10-18 2022-05-03 北京科技大学 Method and equipment for solidifying sodium element in red mud by virtue of supergravity

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998027019A1 (en) * 1996-12-17 1998-06-25 Corning Incorporated Glasses for display panels and photovoltaic devices
EP1118595A2 (en) * 2000-01-12 2001-07-25 Schott Glas ALkali-free aluminoborosilicate glass and its use
EP1878709A1 (en) * 2005-05-02 2008-01-16 Asahi Glass Company, Limited Alkali-free glass and method for production thereof
WO2008028599A1 (en) * 2006-09-04 2008-03-13 Schott Ag Aluminoborosilicate glass for use as substrate glass
US20080206494A1 (en) * 2007-02-27 2008-08-28 Nh Techno Glass Corporation Glass substrate for display and display

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536607A (en) * 1984-03-01 1985-08-20 Wiesmann Harold J Photovoltaic tandem cell
JP2800176B2 (en) 1987-08-18 1998-09-21 旭硝子株式会社 Glass ceramic composition
JP2743333B2 (en) 1989-10-31 1998-04-22 日本電気硝子株式会社 Glass for substrates
GB9108257D0 (en) * 1991-04-17 1991-06-05 Cookson Group Plc Glaze compositions
JP2574556B2 (en) * 1991-05-29 1997-01-22 クツクソン・グループ・ピーエルシー Glaze composition and glaze method
US5374595A (en) * 1993-01-22 1994-12-20 Corning Incorporated High liquidus viscosity glasses for flat panel displays
JPH07172863A (en) * 1993-10-27 1995-07-11 Central Glass Co Ltd Fireproof plate glass
US5631195A (en) * 1994-09-14 1997-05-20 Asahi Glass Company Ltd. Glass composition and substrate for plasma display
JP2967742B2 (en) * 1995-12-27 1999-10-25 株式会社ノリタケカンパニーリミテド Surface decoration using noble metal usable in microwave oven and method of manufacturing the same
JPH10152339A (en) * 1996-09-27 1998-06-09 Nippon Sheet Glass Co Ltd Heat-resistant class composition
US6137048A (en) * 1996-11-07 2000-10-24 Midwest Research Institute Process for fabricating polycrystalline semiconductor thin-film solar cells, and cells produced thereby
FR2758550B1 (en) 1997-01-17 1999-02-12 Saint Gobain Vitrage SILICO-SODO-CALCIUM GLASS COMPOSITIONS AND THEIR APPLICATIONS
JPH11135819A (en) 1997-10-31 1999-05-21 Matsushita Electric Ind Co Ltd Compound thin-film solar cell
JPH11180727A (en) 1997-12-22 1999-07-06 Central Glass Co Ltd Substrate glass composition for display device
JPH11180728A (en) 1997-12-22 1999-07-06 Central Glass Co Ltd Substrate glass composition for display device
US6313052B1 (en) 1998-02-27 2001-11-06 Asahi Glass Company Ltd. Glass for a substrate
JP4320823B2 (en) 1998-02-27 2009-08-26 旭硝子株式会社 Substrate glass composition
JPH11310433A (en) 1998-04-27 1999-11-09 Central Glass Co Ltd Substrate glass for display device
EP0953549B1 (en) * 1998-04-28 2002-09-11 Asahi Glass Company Ltd. Plate glass and substrate glass for electronics
JPH11335133A (en) 1998-05-27 1999-12-07 Central Glass Co Ltd Substrate glass for display device
CN1160268C (en) * 1998-11-30 2004-08-04 康宁股份有限公司 Glasses for flat panel displays
US6207603B1 (en) * 1999-02-05 2001-03-27 Corning Incorporated Solar cell cover glass
JP3056200B1 (en) * 1999-02-26 2000-06-26 鐘淵化学工業株式会社 Method of manufacturing thin film photoelectric conversion device
DE19934072C2 (en) * 1999-07-23 2001-06-13 Schott Glas Alkali-free aluminoborosilicate glass, its uses and processes for its manufacture
DE19939789A1 (en) * 1999-08-21 2001-02-22 Schott Glas Alkali-free aluminoborosilicate glasses and their uses
DE19942259C1 (en) * 1999-09-04 2001-05-17 Schott Glas Alkaline earth aluminum borosilicate glass and its uses
DE10005088C1 (en) 2000-02-04 2001-03-15 Schott Glas Aluminoborosilicate glass used e.g. as substrate glass in thin layer photovoltaic cells contains oxides of silicon, boron, aluminum, sodium, potassium, calcium, strontium, barium, tin, zirconium, titanium and zinc
WO2001078154A2 (en) * 2000-04-10 2001-10-18 Davis, Joseph & Negley Preparation of cigs-based solar cells using a buffered electrodeposition bath
JP2002025762A (en) 2000-07-04 2002-01-25 Nippon Electric Glass Co Ltd Glass board for inorganic el display
JP2002053340A (en) 2000-08-09 2002-02-19 Nippon Electric Glass Co Ltd Glass substrate of inorganic el display
DE10064804C2 (en) * 2000-12-22 2003-03-20 Schott Glas Alkali-free aluminoborosilicate glasses and their use
JP3995902B2 (en) * 2001-05-31 2007-10-24 Ｈｏｙａ株式会社 Glass substrate for information recording medium and magnetic information recording medium using the same
US6753279B2 (en) * 2001-10-30 2004-06-22 Corning Incorporated Glass composition for display panels
JP2003261352A (en) 2002-03-08 2003-09-16 Asahi Techno Glass Corp Glass for display and glass part for display
US6992030B2 (en) * 2002-08-29 2006-01-31 Corning Incorporated Low-density glass for flat panel display substrates
JP4320772B2 (en) 2003-02-13 2009-08-26 日本電気硝子株式会社 Glass substrate for flat panel display
JP4378152B2 (en) 2003-11-07 2009-12-02 岡本硝子株式会社 Heat resistant glass
DE102004026433A1 (en) * 2004-05-29 2005-12-22 Schott Ag Nanoglass powder and its use
DE102004033653B4 (en) * 2004-07-12 2013-09-19 Schott Ag Use of a glass for EEFL fluorescent lamps
JP2008511137A (en) * 2004-08-18 2008-04-10 コーニング インコーポレイテッド Semiconductor structure on insulator with high strain glass / glass-ceramic
CN1268567C (en) * 2005-02-06 2006-08-09 河南安彩高科股份有限公司 Glass composition without alkali metal and its preparation method and application
CN102249541B (en) * 2005-08-15 2013-03-27 安瀚视特股份有限公司 Glass composition
DE112006004278A5 (en) * 2005-08-15 2015-01-15 AvanStrate Inc., Glass composition and method of making a glass composition
FR2891269B1 (en) * 2005-09-23 2007-11-09 Saint Gobain TRANSPARENT SUBSTRATE WITH ELECTRODE
US8389852B2 (en) * 2006-02-22 2013-03-05 Guardian Industries Corp. Electrode structure for use in electronic device and method of making same
US7235736B1 (en) * 2006-03-18 2007-06-26 Solyndra, Inc. Monolithic integration of cylindrical solar cells
JP2007256764A (en) 2006-03-24 2007-10-04 Okamoto Glass Co Ltd Uv absorbing reflection mirror base plate and reflection mirror using the same
JP2007284307A (en) * 2006-04-19 2007-11-01 Central Glass Co Ltd Substrate glass for display device
CN101454252A (en) * 2006-05-25 2009-06-10 日本电气硝子株式会社 Tempered glass and process for producing the same
US8063886B2 (en) 2006-07-18 2011-11-22 Iee International Electronics & Engineering S.A. Data input device
JP5071878B2 (en) 2006-09-12 2012-11-14 日本電気硝子株式会社 Alkali-free glass and alkali-free glass substrate using the same
JP5589252B2 (en) 2006-10-10 2014-09-17 日本電気硝子株式会社 Tempered glass substrate
CN102718401B (en) 2006-10-10 2015-04-01 日本电气硝子株式会社 Reinforced glass substrate
US20080130171A1 (en) * 2006-11-30 2008-06-05 Francis Martin Behan Calcium aluminosilicate glasses for use as information recording medium substrates
US20080128020A1 (en) * 2006-11-30 2008-06-05 First Solar, Inc. Photovoltaic devices including a metal stack
JP5808069B2 (en) * 2007-02-16 2015-11-10 日本電気硝子株式会社 Glass substrate for solar cell
JP2008280189A (en) 2007-05-08 2008-11-20 Nippon Electric Glass Co Ltd Glass substrate for solar cell, and method of manufacturing the same
US7666511B2 (en) * 2007-05-18 2010-02-23 Corning Incorporated Down-drawable, chemically strengthened glass for cover plate
CN101117270B (en) * 2007-06-07 2016-03-02 河南安彩高科股份有限公司 The aluminium borosilicate glass of high elastic coefficient and application thereof
JP5435394B2 (en) * 2007-06-08 2014-03-05 日本電気硝子株式会社 Tempered glass substrate and manufacturing method thereof
JP5234387B2 (en) 2007-06-12 2013-07-10 日本電気硝子株式会社 Alkali-free glass, alkali-free glass substrate and method for producing the same
US20080308146A1 (en) * 2007-06-14 2008-12-18 Guardian Industries Corp. Front electrode including pyrolytic transparent conductive coating on textured glass substrate for use in photovoltaic device and method of making same
JP5292029B2 (en) * 2008-09-10 2013-09-18 株式会社オハラ Glass
US8445394B2 (en) * 2008-10-06 2013-05-21 Corning Incorporated Intermediate thermal expansion coefficient glass
US8975199B2 (en) * 2011-08-12 2015-03-10 Corsam Technologies Llc Fusion formable alkali-free intermediate thermal expansion coefficient glass
DE102009050987B3 (en) * 2009-05-12 2010-10-07 Schott Ag Planar, curved, spherical or cylindrical shaped thin film solar cell comprises sodium oxide-containing multicomponent substrate glass, which consists of barium oxide, calcium oxide, strontium oxide and zinc oxide
DE102009050988B3 (en) * 2009-05-12 2010-11-04 Schott Ag Thin film solar cell

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998027019A1 (en) * 1996-12-17 1998-06-25 Corning Incorporated Glasses for display panels and photovoltaic devices
EP1118595A2 (en) * 2000-01-12 2001-07-25 Schott Glas ALkali-free aluminoborosilicate glass and its use
EP1878709A1 (en) * 2005-05-02 2008-01-16 Asahi Glass Company, Limited Alkali-free glass and method for production thereof
WO2008028599A1 (en) * 2006-09-04 2008-03-13 Schott Ag Aluminoborosilicate glass for use as substrate glass
US20080206494A1 (en) * 2007-02-27 2008-08-28 Nh Techno Glass Corporation Glass substrate for display and display

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8730552B2 (en) 2005-10-11 2014-05-20 Sage Electrochromics, Inc. Electrochromic devices having improved ion conducting layers
WO2011010067A3 (en) * 2009-07-22 2011-08-11 Saint-Gobain Glass France Electrochromic device
US8824038B2 (en) 2009-07-22 2014-09-02 Jean-Christophe Giron Electrochromic device
CN103702952A (en) * 2011-07-25 2014-04-02 康宁股份有限公司 Laminated and ion-exchanged strengthened glass laminates and their manufacturing method
KR20140064860A (en) * 2011-08-12 2014-05-28 코닝 인코포레이티드 Fusion formable alkali-free intermediate thermal expansion coefficient glass
KR102018833B1 (en) * 2011-08-12 2019-09-05 코닝 인코포레이티드 Fusion Formable Alkali-free Intermediate Thermal expansion coefficient glass
EP2759522A4 (en) * 2011-09-22 2015-05-20 Asahi Glass Co Ltd Glass plate for tempering

Also Published As

Publication number Publication date
JP6042613B2 (en) 2016-12-14
CN105271723A (en) 2016-01-27
JP5883174B2 (en) 2016-03-09
CN102171154A (en) 2011-08-31
CA2739098A1 (en) 2010-04-15
US20160145146A1 (en) 2016-05-26
AU2009302561A1 (en) 2010-04-15
US9266769B2 (en) 2016-02-23
TWI403482B (en) 2013-08-01
US10196297B2 (en) 2019-02-05
KR101647526B1 (en) 2016-08-10
WO2010042460A3 (en) 2010-06-03
RU2011118352A (en) 2012-11-20
JP2016084280A (en) 2016-05-19
KR20170121338A (en) 2017-11-01
US20130255779A1 (en) 2013-10-03
US8445394B2 (en) 2013-05-21
JP6417531B2 (en) 2018-11-07
KR20110066225A (en) 2011-06-16
EP2349938B1 (en) 2018-02-21
EP2349938A2 (en) 2011-08-03
MX2011003630A (en) 2011-05-31
JP2015164893A (en) 2015-09-17
TW201022174A (en) 2010-06-16
KR20160097385A (en) 2016-08-17
JP2012504548A (en) 2012-02-23
US20100084016A1 (en) 2010-04-08
KR101891459B1 (en) 2018-08-23

Similar Documents

Publication Publication Date Title
US8445394B2 (en) Intermediate thermal expansion coefficient glass
US10173919B2 (en) Fusion formable sodium free glass
US9637408B2 (en) Fusion formable sodium containing glass
EP2456727B1 (en) Fusion formable silica and sodium containing glasses

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200980140405.2

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09793309

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 2739098

Country of ref document: CA

WWE Wipo information: entry into national phase

Ref document number: MX/A/2011/003630

Country of ref document: MX

NENP Non-entry into the national phase in:

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2011531105

Country of ref document: JP

Ref document number: 2511/DELNP/2011

Country of ref document: IN

ENP Entry into the national phase in:

Ref document number: 2009302561

Country of ref document: AU

Date of ref document: 20091006

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2009793309

Country of ref document: EP

ENP Entry into the national phase in:

Ref document number: 20117010301

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 2011118352

Country of ref document: RU