WO2009157496A1 - Method for manufacturing organic el display device - Google Patents

Method for manufacturing organic el display device Download PDF

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Publication number
WO2009157496A1
WO2009157496A1 PCT/JP2009/061543 JP2009061543W WO2009157496A1 WO 2009157496 A1 WO2009157496 A1 WO 2009157496A1 JP 2009061543 W JP2009061543 W JP 2009061543W WO 2009157496 A1 WO2009157496 A1 WO 2009157496A1
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WO
WIPO (PCT)
Prior art keywords
organic compound
layer
pixel
organic
display device
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PCT/JP2009/061543
Other languages
French (fr)
Inventor
Nozomu Izumi
Kazuya Igarashi
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Canon Kabushiki Kaisha
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Publication of WO2009157496A1 publication Critical patent/WO2009157496A1/en

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/32—Stacked devices having two or more layers, each emitting at different wavelengths
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/50—Forming devices by joining two substrates together, e.g. lamination techniques

Definitions

  • the present invention relates to a method for manufacturing an organic EL display device.
  • multicolor light-emitting element disclosed in U.S. Patent No. 5707745, for example, at least two separately drivable light-emitting elements are laminated.
  • respective light-emitting elements are divided off by transparent electrodes so as to be separately drivable. These transparent electrodes are divided off from each other with a gap between adjacent pixels as a boundary line.
  • processing method using laser ablation disclosed in Japanese Patent Application Laid-Open No. H05-003077.
  • An object of the present invention is to provide a method for manufacturing an organic EL display device that can reduce the occurrence of burrs at edges of a processed electrode, eliminate the problem of interelectrode short-circuiting or electrode disconnection, and improve the production yield of the organic EL display device.
  • the present invention provides a method for manufacturing an organic EL display device including: a plurality of sub-pixels, each being formed of at least two electrode layers and an organic compound layer formed between the electrode layers and including at least a light-emitting layer; and a pixel-separating film formed between the sub-pixels so as to define the sub-pixels; the organic EL display device having a display area formed by arranging the sub-pixels, wherein at least one of the electrode layers is divided by performing light irradiation in a region on the pixel- separating film in which the organic compound layer is not formed.
  • the occurrence of burrs at edges of an electrode layer can be suppressed by performing light irradiation and thereby lowering the electrode layer on the pixel-separating film. Consequently, the problem of short-circuiting or disconnection between electrode layers can be eliminated and the production yield of the organic EL display device can be improved. Further features of the present invention will become apparent from the following description of exemplary embodiments (with reference to the attached drawings) .
  • FIGS. IA and IB are schematic views illustrating an organic EL display device manufactured according to a first embodiment in a manufacturing method of the present invention, wherein FIG. IA is a schematic cross-sectional view of the organic EL display device and FIG. IB is a circuit diagram illustrating an equivalent circuit of the organic EL display device.
  • FIGS. 2A, 2B, 2C, 2D, 2E, 2F, 2G, 2H and 21 are schematic cross-sectional views illustrating the first embodiment in the manufacturing method of the present invention.
  • FIG. 3 is a schematic cross-sectional view illustrating an organic EL display device manufactured according to a second embodiment in a manufacturing method of the present invention.
  • FIGS. 4A, 4B and 4C are schematic cross-sectional views illustrating the second embodiment in the manufacturing method of the present invention.
  • An organic EL display device manufactured using a manufacturing method of the present invention is provided with a plurality of sub-pixels and a pixel-separating film formed between the sub-pixels so as to define the sub- pixels.
  • the sub-pixels are formed of at least two electrode layers and an organic compound layer including at least a light-emitting layer formed between the electrode layers. These sub-pixels are arranged in a matrix-like manner, for example, to form a display area.
  • light irradiation is performed in a region on the pixel- separating film in which the organic compound layer is not formed, thereby dividing at least one of the electrode layers .
  • Reference character 1 denotes an organic EL display device
  • reference character 10 denotes a substrate
  • reference characters 11a, lib and lie denote first electrode layers
  • reference character 12 denotes a pixel- separating film
  • reference character 13 denotes a first organic compound layer
  • reference characters 13a, 13b and 13c denote first organic compound layers
  • reference character 14 denotes a second electrode layer
  • reference characters 14a, 14b and 14c denote second electrode layers.
  • Reference character 15 denotes a second organic compound layer
  • reference characters 15a, 15b and 15c denote second organic compound layers
  • reference character 16 denotes a third electrode layer
  • reference characters 16a, 16b and 16c denote third electrode layers
  • reference character 17 denotes a third organic compound layer
  • reference character 18 denotes a fourth electrode layer
  • reference characters 19b, 19c, 20a, 20c, 21a and 21b denote contact holes.
  • Reference character 3 denotes an organic EL display device
  • reference character 30 denotes a substrate
  • reference character 31 denotes a first electrode layer
  • reference character 32 denotes a pixel-separating film
  • reference characters 33a, 33b and 33c denote first organic compound layers
  • reference character 34 denotes a second electrode layer
  • reference characters 34a, 34b and 34c denote second electrode layers.
  • FIGS. IA and IB are schematic views illustrating an organic EL display device manufactured according to a first embodiment in a manufacturing method of the present invention, wherein FIG. IA is a schematic cross-sectional view illustrating one pixel of the organic EL display device and FIG. IB is a circuit diagram illustrating an equivalent circuit of the organic EL display device illustrated in FIG. IA.
  • the organic EL display device illustrated in FIG. IA is a top emission-type organic EL display device.
  • a first sub-pixel Pl, a second sub-pixel P2 and a third sub-pixel P3 are disposed in parallel with one another.
  • One pixel is constituted of these three sub- pixels Pl, P2 and P3.
  • organic compound layers which emit light in different colors are respectively formed between electrode layers . That is, in the first sub-pixel Pl, the first electrode layer 11a, the first organic compound layer 13a, the second electrode layer 14a, the second organic compound layer 15a, the third electrode layer 16a, the third organic compound layer 17 and the fourth electrode layer 18 are formed in this order on the substrate 10.
  • the contact hole 20a is provided in the second organic compound layer 15a, so that the second electrode layer 14a and the third electrode layer 16a can be electrically connected to each other directly.
  • the contact hole 21a is provided in the third organic compound layer 17, so that the third electrode layer 16a and the fourth electrode layer 18 can be electrically connected to each other directly. Consequently, the first sub-pixel Pl forms an equivalent circuit A illustrated in FIG. IB, so that the first organic compound layer 13a emits light when a desired voltage is applied.
  • the first electrode layer lib, the first organic compound layer 13b, the second electrode layer 14b, the second organic compound layer 15b, the third electrode layer 16b, the third organic compound layer 17 and the fourth electrode layer 18 are formed in this order on the substrate 10.
  • the contact hole 19b is provided in the first organic compound layer 13b, so that the first electrode layer lib and the second electrode layer 14b can be electrically connected to each other directly.
  • the contact hole 21b is provided in the third organic compound layer 17, so that the third electrode layer 16b and the fourth electrode layer 18 can be electrically connected to each other directly. Consequently, the second sub-pixel P2 forms an equivalent circuit B illustrated in FIG. IB, so that the second organic compound layer 15b emits light when a desired voltage is applied.
  • the first electrode layer lie, the first organic compound layer 13c, the second electrode layer 14c, the second organic compound layer 15c, the third electrode layer 16c, the third organic compound layer 17 and the fourth electrode layer 18 are formed in this order on the substrate 10.
  • the contact hole 19c is provided in the first organic compound layer 13c, so that the first electrode layer lie and the second electrode layer 14c can be electrically connected to each other directly.
  • the contact hole 21b is provided in the second organic compound layer 15b, so that the second electrode layer 14c and the third electrode layer 16c can be electrically connected to each other directly.
  • one sub-pixel preferably has at least three electrode layers.
  • each of the organic compound layers (13a to 13c, 15a to 15c, and 17) illustrated in FIG. IA is a single-layer thin film including at least a light- emitting layer or a laminated body formed of two or more layers.
  • the organic compound layer when the organic compound layer is a laminated body formed of two or more layers, the organic compound layer includes any of a hole-injection layer, a hole-transport layer, an electron-transport layer and an electron-injection layer, in addition to the light-emitting layer .
  • a switching element (not shown in the figure) , such as a TFT, is formed as necessary on an insulating substrate (substrate 10) and is electrically connected to the first electrode layers 11a to lie.
  • FIGS. 2A, 2B, 2C, 2D, 2E, 2F, 2G, 2H and 21 are schematic cross-sectional views illustrating the first embodiment in the method for manufacturing an organic EL display device of the present invention.
  • first electrode layers 11a to lie and a pixel-separating film 12 are first pattern- formed into a desired shape on a substrate 10. After the pixel-separating film 12 is formed, a first organic compound layer 13 common to a plurality of sub-pixels is formed, so as to cover the first electrode layers 11a to lie and the pixel-separating film 12 (FIG. 2A).
  • the substrate 10 used in the present embodiment can be an insulating substrate, for example, a glass substrate.
  • the constituent material of the first electrode layers 11a to lie examples include a simple substance of metal, such as Cr, Al or Ag, and a transparent conductive compound, such as ITO or IZO.
  • the first electrode layers 11a to lie may be laminated bodies in which a thin film formed of one of the above-described elementary substances of metal and a thin film formed of one of the above-described transparent conductive compounds are laminated.
  • a high-molecular compound such as acrylics or polyimide, or an inorganic compound, such as silicon oxide or silicon nitride can be used.
  • the first organic compound layer 13 is formed of, for example, three layers, i.e., an electron-transport layer, a light-emitting layer and a hole-transport layer, but is not limited to this structure in the present invention.
  • AIq 3 in which 8- hydroxyquinoline trimers are coordinated with aluminum, azomethine-zinc complex, distyrylbiphenyl derivatives, or the like can be used.
  • a luminescence material for constituting the light- emitting layer can be selected as appropriate, according to the color or wavelength of light to be derived.
  • triarylamine derivatives, stilbene derivatives, polyarylene, aromatic condensed polycyclic compound, aromatic heterocyclic compound, aromatic condensed heterocyclic compound, metal complex compound, or a single oligomer or complex oligomer thereof can be used.
  • phthalocyanine compound triarylamine compound, conductive polymer, perylene-based compound, or Eu complex
  • Examples of a method for forming the first electrode layers 11a to lie include a method of patterning a metal film or a transparent conductive compound film formed by a sputtering method or- a vacuum deposition method, using a photolithography method.
  • Examples of a method for forming the pixel-separating film 12 include a method of patterning a high-molecular compound film formed by a coating method or an inorganic compound film formed by a CVD method, using a photolithography method.
  • a vacuum deposition method, a coating method, or the like can be used as the method for forming the first organic compound layer 13.
  • first organic compound layer 13 After the first organic compound layer 13 is formed, light irradiation is performed to a predetermined position in this first organic compound layer 13. Then, a region of the first organic compound layer 13 in which light irradiation has been performed is removed partially (FIG. 2B) . Specifically, a region of the first organic compound layer 13 located on the pixel-separating film 12 is partially light-irradiated and the light-irradiated region (region located on the pixel-separating film 12) is removed.
  • the first organic compound layer 13 is divided into several regions (13a to 13c), and contact holes (19b and 19c) are formed. Concurrently, on the pixel-separating film 12, there is formed a region in which the first organic compound layer 13 is not formed. On the other hand, all of the edges of the divided first organic compound layers 13a to 13c exist on the pixel-separating film 12.
  • examples of a method for forming the contact holes (19b and 19c) and dividing the first organic compound layer 13 as illustrated in FIG. 2B preferably include a method of performing light irradiation to a predetermined position.
  • the light irradiation is preferably laser light irradiation (laser ablation method) .
  • examples of a, laser used for the laser ablation method include a YAG laser and an excimer laser.
  • examples of a method for processing the first organic compound layer 13 into a desired pattern (13a to 13c) by laser light irradiation include a method of scanning laser light condensed to a diameter of several micrometers and a method of irradiating laser light only to a desired region using a mask in which a lightproof film is pattern-arranged.
  • a method for dividing the first organic compound layer 13 into a desired pattern is not limited to light irradiation.
  • a method for dividing the first organic compound layer 13 into a desired pattern is not limited to light irradiation.
  • a second electrode layer 14 is formed on the first organic compound layers 13a to 13c and the pixel- separating film 12, so as to cover these members (FIG. 2C).
  • the second electrode layer 14 is preferably a transparent electrode made of ITO, IZO, or the like.
  • the second electrode layer 14 may be a semi-transmissive Al or Ag thin film, or the like, having a film thickness of 10 to 30 nm.
  • a sputtering method, a vacuum deposition method, or the like can be used as the method for forming the second electrode layer 14.
  • the second electrode layer 14 is divided into a desired pattern (14a to 14c), as illustrated in FIG. 2D.
  • the divided second electrode layers 14a to 14c respectively cover the first organic compound layers 13a to 13c, and the edges of the respective electrode layers 14a to 14c are formed on the pixel-separating film 12.
  • the method for dividing the second electrode layer 14 is specifically a method of performing light irradiation on a region of the second electrode layer 14 on the pixel-separating film 12 in which the first organic compound layer is not formed.
  • the light irradiation is preferably laser light irradiation (laser ablation method) .
  • laser ablation method examples include a YAG laser and an excimer laser.
  • a method for forming a pattern of the second electrode layer 14 using a laser ablation method a method of scanning laser light condensed to a diameter of several micrometers or a method of irradiating laser light only to a desired region using a lightproof mask can be used.
  • laser light is irradiated to the second electrode layer 14
  • laser irradiation is performed in a region in which the second electrode layer 14 and the pixel-separating film 12 are in contact with each other (region on the pixel-separating film 12 in which the first organic compound layer is not formed) .
  • a high-molecular compound such as acrylics or polyimide, or an inorganic film, such as silicon oxide or silicon nitride, which is a constituent material of the pixel-separating film 12
  • an organic compound which is a constituent material of the organic compound layer
  • a second organic compound layer 15 is formed so as to cover the pixel-separating film 12 and the second electrode layers 14a to 14c. Then, contact holes 20a and 20c are formed and the second organic compound layer is patterned in the same way as the first organic compound layers 13a to 13c. Consequently, there is formed the second organic compound layer divided into a desired pattern (15a to 15c) (FIG. 2E) .
  • the second organic compound layers 15a to 15c are respectively formed in regions covering the second electrode layers 14a to 14c. In addition, all of the edges of the second organic compound layers 15a to 15c are formed on the pixel-separating film 12.
  • the same methods as used for the first organic compound layers can be used.
  • a third electrode layer 16 is formed so as to cover the pixel-separating film 12 and the second organic compound layers 15a to 15c (FIG. 2F) .
  • a sputtering method, a vacuum deposition method, or the like can be used as the method for forming the third electrode layer 16.
  • the third electrode layer 16 is divided into a desired pattern (16a to 16c) (FIG. 2G) . Consequently, the third electrode layers 16a to 16c are respectively formed in regions covering the second organic compound layers 15a to 15c. In addition, all of the edges of the third electrode layers 16a to 16c are formed on the pixel- separating film 12.
  • a third organic compound layer 17 is formed so as to cover the pixel-separating film 12 and the third electrode layers 16a to 16c, and contact holes 21a and 21b are formed (FIG. 2H) .
  • methods for forming the third organic compound layer 17 and the contact holes 21a and 21b the same methods as used for the first organic compound layers and the second organic compound layers can be used.
  • a fourth electrode layer 18 is formed on the third organic compound layer 17 (FIG. 21) .
  • a sputtering method, a vacuum deposition method, or the like can be used as the method for forming the fourth electrode layer 18.
  • FIG. 3 is a schematic cross- sectional view illustrating the organic EL display device manufactured according to the second embodiment in the manufacturing method of the present invention.
  • FIGS. 4A, 4B and 4C are schematic cross-sectional views illustrating a method for manufacturing the organic EL display device of the second embodiment of the present invention.
  • the organic EL display device illustrated in FIG. 3 is a top emission-type organic EL display device.
  • a first sub-pixel Ql, a second sub-pixel Q2 and a third sub-pixel Q3 are disposed in parallel with one another.
  • One pixel is constituted of these three sub- pixels Ql, Q2 and Q3.
  • organic compound layers which emit light in different colors are respectively formed between electrode layers.
  • the first electrode layer 31, the first organic compound layer 33a, and the second electrode layer 34a are laminated in this order on the substrate 30.
  • the first electrode layer 31, the first organic compound layer 33b, and the second electrode layer 34b are laminated in this order on the substrate 30.
  • each of the organic compound layers (33a to 33c) illustrated in FIG. 3 is a single-layer thin film including at least a light-emitting layer or a laminated body formed of two or more layers.
  • the organic compound layer includes any of a hole-injection layer, a hole-transport layer, an electron-transport layer and an electron-injection layer, in addition to the light- emitting layer.
  • FIGS. 4A, 4B and 4C are schematic cross-sectional views illustrating the second embodiment in the method for manufacturing an organic EL display device of the present invention.
  • the first electrode layer 31 is first formed on the substrate 30, and then a pixel- separating film 32 is pattern-formed into a desired shape on the first electrode layer 31. After the pixel- separating film 32 is formed, first organic compound layers 33a to 33c having different layer structures are pattern- formed in positions corresponding to the respective sub- pixels Ql to Q3 (FIG. 4A) .
  • the material for the substrate 30 used in the present embodiment the same material as that of the substrate 10 described in the first embodiment can be used.
  • the same material as that of the first electrode layers 11a to lie described in the first embodiment can be used.
  • the constituent material of the pixel-separating film 32 As the constituent material of the pixel-separating film 32, the same material as that of the pixel-separating film 12 described in the first embodiment can be used.
  • the methods for forming the first electrode layer 31 and the pixel-separating film 32 are the same as those of the first electrode layers 11a to lie and the pixel- separating film 12 shown in the first embodiment.
  • the first organic compound layers 33a to 33c are constituted of, for example, three layers of an electron- transport layer, a light-emitting layer and a hole- transport layer.
  • the first organic compound layers 33a to 33c are not limited to this structure in the present invention.
  • the constituent materials of the electron-transport layer, the light- emitting layer and the hole-transport layer the same materials as those of the first organic compound layers 13a to 13c described in the first embodiment can be used.
  • a vacuum deposition method using a metal mask, a coating method using ink jet, or the like can be used as the method for forming the first organic compound layers 33a to 33c.
  • a second electrode layer 34 is formed on the first organic compound layers 33a to 33c and the pixel- separating film 32 so as to cover these members (FIG. 4B) .
  • the constituent material of the second electrode layer 34 and the method for forming the second electrode layer are the same as those of the second electrode layers 14a to 14c described in the first embodiment.
  • the second electrode layer 34 is divided into a desired pattern (34a to 34c), as illustrated in FIG. 4C.
  • the divided second electrode layers 34a to 34c respectively cover the first organic compound layers 33a to 33c, and the edges of the respective electrode layers 34a to 34c are formed on the pixel-separating films 32.
  • the method for dividing the second electrode layer 34 is specifically a method for performing light irradiation in a region of the second electrode layer 34 on the pixel- separating film 32 in which the first organic compound layer is not formed.
  • the light irradiation is preferably laser light irradiation (laser ablation method) .
  • laser ablation method examples include a YAG laser and an excimer laser.
  • a specific method for forming a pattern of the second electrode layer 34 using a laser ablation method for example, a method for scanning laser light condensed to a diameter of several micrometers or a method for irradiating laser light only to a desired region using a lightproof mask can be used.
  • the second electrode layer 34 is irradiated with a laser
  • laser irradiation is performed in a region in which the second electrode layer 34 and the pixel-separating film 32 are in contact with each other
  • burrs can be prevented from occurring at edges of a second electrode layer when the second electrode layer is processed. Accordingly, short- circuiting between electrode layers that may be caused as the result of some of the burrs falling off can be prevented. This can improve the production yield of the organic EL display device.

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Abstract

A method for manufacturing an organic EL display device including: a plurality of sub-pixels, each being formed of at least two electrode layers and an organic compound layer formed between the electrode layers and including at least a light-emitting layer; and a pixel-separating film formed between the sub-pixels so as to define the sub-pixels; the organic EL display device having a display area formed by arranging the sub-pixels, wherein at least one of the electrode layers is divided by performing light irradiation in a region on the pixel-separating film in which the organic compound layer is not formed.

Description

DESCRIPTION
METHOD FOR MANUFACTURING ORGANIC EL DISPLAY DEVICE
TECHNICAL FIELD
The present invention relates to a method for manufacturing an organic EL display device.
BACKGROUND ART Currently, active efforts are being made to develop a multicolor light-emitting element to serve as a constituent member of a display device for colored light emission.
In the multicolor light-emitting element disclosed in U.S. Patent No. 5707745, for example, at least two separately drivable light-emitting elements are laminated. In addition, in the multicolor light-emitting element disclosed in the U.S. Patent, respective light-emitting elements are divided off by transparent electrodes so as to be separately drivable. These transparent electrodes are divided off from each other with a gap between adjacent pixels as a boundary line. Here, as one of methods for dividing an electrode layer formed on an organic compound layer with a gap between adjacent pixels as a boundary line, there has been proposed the processing method using laser ablation disclosed in Japanese Patent Application Laid-Open No. H05-003077. However, if the processing method disclosed in Japanese Patent Application Laid-Open No. H05-003077 is employed to process an electrode material by laser ablation, large burrs are produced in some cases at edges of a processed electrode. These burrs occur as the result that the strength of adhesion between an organic material and the electrode material serving as constituent materials of an organic EL display device is weak and, therefore, separation is caused by laser ablation between an organic compound layer and an electrode layer. In addition, the organic compound layer is also laser-ablated by laser light having transmitted through the electrode. Consequently, the organic compound layer pushes up edges of the electrode layer, thus giving rise to burrs. Here, assume that an electrode having burrs is used as the electrode layer of a multicolor light-emitting element on which light-emitting elements are laminated. Then, there arises such a problem that the burred electrode and an upper-layer electrode short-circuit to each other at the burrs or an electrode located above a processed electrode becomes disconnected. Accordingly, the production yield of the organic EL display device degrades. In addition, some of the burrs may fall off, leading to such a problem that adjacent electrodes short-circuit to each other due to the fallen burrs. DISCLOSURE OF THE INVENTION
The present invention has been accomplished in order to solve the above-described problems. An object of the present invention, therefore, is to provide a method for manufacturing an organic EL display device that can reduce the occurrence of burrs at edges of a processed electrode, eliminate the problem of interelectrode short-circuiting or electrode disconnection, and improve the production yield of the organic EL display device. The present invention provides a method for manufacturing an organic EL display device including: a plurality of sub-pixels, each being formed of at least two electrode layers and an organic compound layer formed between the electrode layers and including at least a light-emitting layer; and a pixel-separating film formed between the sub-pixels so as to define the sub-pixels; the organic EL display device having a display area formed by arranging the sub-pixels, wherein at least one of the electrode layers is divided by performing light irradiation in a region on the pixel- separating film in which the organic compound layer is not formed.
According to the method for manufacturing an organic EL display device of the present invention, the occurrence of burrs at edges of an electrode layer can be suppressed by performing light irradiation and thereby lowering the electrode layer on the pixel-separating film. Consequently, the problem of short-circuiting or disconnection between electrode layers can be eliminated and the production yield of the organic EL display device can be improved. Further features of the present invention will become apparent from the following description of exemplary embodiments (with reference to the attached drawings) .
BRIEF DESCRIPTION OF THE DRAWINGS FIGS. IA and IB are schematic views illustrating an organic EL display device manufactured according to a first embodiment in a manufacturing method of the present invention, wherein FIG. IA is a schematic cross-sectional view of the organic EL display device and FIG. IB is a circuit diagram illustrating an equivalent circuit of the organic EL display device.
FIGS. 2A, 2B, 2C, 2D, 2E, 2F, 2G, 2H and 21 are schematic cross-sectional views illustrating the first embodiment in the manufacturing method of the present invention.
FIG. 3 is a schematic cross-sectional view illustrating an organic EL display device manufactured according to a second embodiment in a manufacturing method of the present invention. FIGS. 4A, 4B and 4C are schematic cross-sectional views illustrating the second embodiment in the manufacturing method of the present invention. BEST MODES FOR CARRYING OUT THE INVENTION
An organic EL display device manufactured using a manufacturing method of the present invention is provided with a plurality of sub-pixels and a pixel-separating film formed between the sub-pixels so as to define the sub- pixels. Here, the sub-pixels are formed of at least two electrode layers and an organic compound layer including at least a light-emitting layer formed between the electrode layers. These sub-pixels are arranged in a matrix-like manner, for example, to form a display area. In addition, light irradiation is performed in a region on the pixel- separating film in which the organic compound layer is not formed, thereby dividing at least one of the electrode layers . Hereinafter, embodiments of the present invention will be described using the accompanying drawings.
Reference character 1 denotes an organic EL display device, reference character 10 denotes a substrate, reference characters 11a, lib and lie denote first electrode layers, reference character 12 denotes a pixel- separating film, reference character 13 denotes a first organic compound layer, reference characters 13a, 13b and 13c denote first organic compound layers, reference character 14 denotes a second electrode layer, and reference characters 14a, 14b and 14c denote second electrode layers.
Reference character 15 denotes a second organic compound layer, reference characters 15a, 15b and 15c denote second organic compound layers, reference character 16 denotes a third electrode layer, reference characters 16a, 16b and 16c denote third electrode layers, reference character 17 denotes a third organic compound layer, reference character 18 denotes a fourth electrode layer, and reference characters 19b, 19c, 20a, 20c, 21a and 21b denote contact holes.
Reference character 3 denotes an organic EL display device, reference character 30 denotes a substrate, reference character 31 denotes a first electrode layer, reference character 32 denotes a pixel-separating film, reference characters 33a, 33b and 33c denote first organic compound layers, reference character 34 denotes a second electrode layer, and reference characters 34a, 34b and 34c denote second electrode layers. [First Embodiment]
FIGS. IA and IB are schematic views illustrating an organic EL display device manufactured according to a first embodiment in a manufacturing method of the present invention, wherein FIG. IA is a schematic cross-sectional view illustrating one pixel of the organic EL display device and FIG. IB is a circuit diagram illustrating an equivalent circuit of the organic EL display device illustrated in FIG. IA.
The organic EL display device illustrated in FIG. IA is a top emission-type organic EL display device. In addition, in the organic EL display device illustrated in FIG. IA, a first sub-pixel Pl, a second sub-pixel P2 and a third sub-pixel P3 are disposed in parallel with one another. One pixel is constituted of these three sub- pixels Pl, P2 and P3.
Incidentally, in the sub-pixels Pl, P2 and P3 illustrated in FIG. IA, organic compound layers which emit light in different colors are respectively formed between electrode layers . That is, in the first sub-pixel Pl, the first electrode layer 11a, the first organic compound layer 13a, the second electrode layer 14a, the second organic compound layer 15a, the third electrode layer 16a, the third organic compound layer 17 and the fourth electrode layer 18 are formed in this order on the substrate 10.
In the first sub-pixel Pl, the contact hole 20a is provided in the second organic compound layer 15a, so that the second electrode layer 14a and the third electrode layer 16a can be electrically connected to each other directly. Likewise, the contact hole 21a is provided in the third organic compound layer 17, so that the third electrode layer 16a and the fourth electrode layer 18 can be electrically connected to each other directly. Consequently, the first sub-pixel Pl forms an equivalent circuit A illustrated in FIG. IB, so that the first organic compound layer 13a emits light when a desired voltage is applied. In the second sub-pixel P2, the first electrode layer lib, the first organic compound layer 13b, the second electrode layer 14b, the second organic compound layer 15b, the third electrode layer 16b, the third organic compound layer 17 and the fourth electrode layer 18 are formed in this order on the substrate 10.
In the second sub-pixel P2, the contact hole 19b is provided in the first organic compound layer 13b, so that the first electrode layer lib and the second electrode layer 14b can be electrically connected to each other directly. Likewise, the contact hole 21b is provided in the third organic compound layer 17, so that the third electrode layer 16b and the fourth electrode layer 18 can be electrically connected to each other directly. Consequently, the second sub-pixel P2 forms an equivalent circuit B illustrated in FIG. IB, so that the second organic compound layer 15b emits light when a desired voltage is applied.
In the third sub-pixel P3, the first electrode layer lie, the first organic compound layer 13c, the second electrode layer 14c, the second organic compound layer 15c, the third electrode layer 16c, the third organic compound layer 17 and the fourth electrode layer 18 are formed in this order on the substrate 10. In the third sub-pixel P3, the contact hole 19c is provided in the first organic compound layer 13c, so that the first electrode layer lie and the second electrode layer 14c can be electrically connected to each other directly. Likewise, the contact hole 21b is provided in the second organic compound layer 15b, so that the second electrode layer 14c and the third electrode layer 16c can be electrically connected to each other directly.
Consequently, the third sub-pixel P3 forms an equivalent circuit C illustrated in FIG. IB, so that the third organic compound layer 17c emits light when a desired voltage is applied. Incidentally, one sub-pixel preferably has at least three electrode layers. For example, it is advantageous to form one sub-pixel of four electrode layers and three organic compound layers each of which is formed between electrode layers, as in the device illustrated in FIG. IA or IB. This is because there is no need to coat the organic compound layers on a color-by-color basis using an expensive metal mask and, therefore, manufacturing costs can be reduced.
On the other hand, each of the organic compound layers (13a to 13c, 15a to 15c, and 17) illustrated in FIG. IA is a single-layer thin film including at least a light- emitting layer or a laminated body formed of two or more layers. Here, when the organic compound layer is a laminated body formed of two or more layers, the organic compound layer includes any of a hole-injection layer, a hole-transport layer, an electron-transport layer and an electron-injection layer, in addition to the light-emitting layer .
A switching element (not shown in the figure) , such as a TFT, is formed as necessary on an insulating substrate (substrate 10) and is electrically connected to the first electrode layers 11a to lie.
Next, a manufacturing method of the present invention will be described while referring to the accompanying drawings. FIGS. 2A, 2B, 2C, 2D, 2E, 2F, 2G, 2H and 21 are schematic cross-sectional views illustrating the first embodiment in the method for manufacturing an organic EL display device of the present invention.
In the present embodiment, first electrode layers 11a to lie and a pixel-separating film 12 are first pattern- formed into a desired shape on a substrate 10. After the pixel-separating film 12 is formed, a first organic compound layer 13 common to a plurality of sub-pixels is formed, so as to cover the first electrode layers 11a to lie and the pixel-separating film 12 (FIG. 2A).
The substrate 10 used in the present embodiment can be an insulating substrate, for example, a glass substrate.
Examples of the constituent material of the first electrode layers 11a to lie include a simple substance of metal, such as Cr, Al or Ag, and a transparent conductive compound, such as ITO or IZO. Note that the first electrode layers 11a to lie may be laminated bodies in which a thin film formed of one of the above-described elementary substances of metal and a thin film formed of one of the above-described transparent conductive compounds are laminated.
As the constituent material of the pixel-separating film 12, a high-molecular compound, such as acrylics or polyimide, or an inorganic compound, such as silicon oxide or silicon nitride can be used.
The first organic compound layer 13 is formed of, for example, three layers, i.e., an electron-transport layer, a light-emitting layer and a hole-transport layer, but is not limited to this structure in the present invention.
As an electron-injection/transport material constituting the electron-transport layer, AIq3 in which 8- hydroxyquinoline trimers are coordinated with aluminum, azomethine-zinc complex, distyrylbiphenyl derivatives, or the like can be used.
A luminescence material for constituting the light- emitting layer can be selected as appropriate, according to the color or wavelength of light to be derived. For example, triarylamine derivatives, stilbene derivatives, polyarylene, aromatic condensed polycyclic compound, aromatic heterocyclic compound, aromatic condensed heterocyclic compound, metal complex compound, or a single oligomer or complex oligomer thereof can be used.
As a hole-injection/transport material for constituting the hole-transport layer, phthalocyanine compound, triarylamine compound, conductive polymer, perylene-based compound, or Eu complex can be used. Examples of a method for forming the first electrode layers 11a to lie include a method of patterning a metal film or a transparent conductive compound film formed by a sputtering method or- a vacuum deposition method, using a photolithography method.
Examples of a method for forming the pixel-separating film 12 include a method of patterning a high-molecular compound film formed by a coating method or an inorganic compound film formed by a CVD method, using a photolithography method.
As the method for forming the first organic compound layer 13, a vacuum deposition method, a coating method, or the like can be used.
After the first organic compound layer 13 is formed, light irradiation is performed to a predetermined position in this first organic compound layer 13. Then, a region of the first organic compound layer 13 in which light irradiation has been performed is removed partially (FIG. 2B) . Specifically, a region of the first organic compound layer 13 located on the pixel-separating film 12 is partially light-irradiated and the light-irradiated region (region located on the pixel-separating film 12) is removed.
With this step, the first organic compound layer 13 is divided into several regions (13a to 13c), and contact holes (19b and 19c) are formed. Concurrently, on the pixel-separating film 12, there is formed a region in which the first organic compound layer 13 is not formed. On the other hand, all of the edges of the divided first organic compound layers 13a to 13c exist on the pixel-separating film 12.
In this step, examples of a method for forming the contact holes (19b and 19c) and dividing the first organic compound layer 13 as illustrated in FIG. 2B preferably include a method of performing light irradiation to a predetermined position. The light irradiation is preferably laser light irradiation (laser ablation method) . Here, examples of a, laser used for the laser ablation method include a YAG laser and an excimer laser. In addition, examples of a method for processing the first organic compound layer 13 into a desired pattern (13a to 13c) by laser light irradiation include a method of scanning laser light condensed to a diameter of several micrometers and a method of irradiating laser light only to a desired region using a mask in which a lightproof film is pattern-arranged.
However, a method for dividing the first organic compound layer 13 into a desired pattern is not limited to light irradiation. Alternatively, there may be used a method in which the first organic compound layer 13 is patterned by performing vacuum deposition using a metal mask or a method in which the first organic compound layer 13 is coated into a desired pattern using a coating method, such as ink jet.
Next, a second electrode layer 14 is formed on the first organic compound layers 13a to 13c and the pixel- separating film 12, so as to cover these members (FIG. 2C). The second electrode layer 14 is preferably a transparent electrode made of ITO, IZO, or the like. Alternatively, the second electrode layer 14 may be a semi-transmissive Al or Ag thin film, or the like, having a film thickness of 10 to 30 nm.
As the method for forming the second electrode layer 14, a sputtering method, a vacuum deposition method, or the like can be used.
After the second electrode layer 14 is formed, the second electrode layer is divided into a desired pattern (14a to 14c), as illustrated in FIG. 2D. Here, the divided second electrode layers 14a to 14c respectively cover the first organic compound layers 13a to 13c, and the edges of the respective electrode layers 14a to 14c are formed on the pixel-separating film 12.
Here, the method for dividing the second electrode layer 14 is specifically a method of performing light irradiation on a region of the second electrode layer 14 on the pixel-separating film 12 in which the first organic compound layer is not formed. The light irradiation is preferably laser light irradiation (laser ablation method) . Examples of a laser used for the laser ablation method include a YAG laser and an excimer laser.
In addition, as a specific method for forming a pattern of the second electrode layer 14 using a laser ablation method, a method of scanning laser light condensed to a diameter of several micrometers or a method of irradiating laser light only to a desired region using a lightproof mask can be used. When laser light is irradiated to the second electrode layer 14, laser irradiation is performed in a region in which the second electrode layer 14 and the pixel-separating film 12 are in contact with each other (region on the pixel-separating film 12 in which the first organic compound layer is not formed) . This is because a high-molecular compound, such as acrylics or polyimide, or an inorganic film, such as silicon oxide or silicon nitride, which is a constituent material of the pixel-separating film 12, has high thermal tolerance, compared with an organic compound which is a constituent material of the organic compound layer, and has a high strength of adhesion to the constituent material of the second electrode layer. Accordingly, even if heat is generated when the second electrode layer 14 is divided by a laser ablation method, the pixel-separating film 12 is only minimally deformed. In addition, peeling of the constituent material of the second electrode layer 14 hardly occurs. Consequently, if the second electrode layer 14 is divided on the pixel- separating film 12, it can prevent burrs from being produced at edges of any of the second electrode layers 14a to 14c.
After the formation and patterning of the second electrode layer 14 are completed, a second organic compound layer 15 is formed so as to cover the pixel-separating film 12 and the second electrode layers 14a to 14c. Then, contact holes 20a and 20c are formed and the second organic compound layer is patterned in the same way as the first organic compound layers 13a to 13c. Consequently, there is formed the second organic compound layer divided into a desired pattern (15a to 15c) (FIG. 2E) .
Here, the second organic compound layers 15a to 15c are respectively formed in regions covering the second electrode layers 14a to 14c. In addition, all of the edges of the second organic compound layers 15a to 15c are formed on the pixel-separating film 12.
As methods for forming the second organic compound layer 15 and the contact holes 20a and 20c and dividing and patterning the second organic compound layer 15, the same methods as used for the first organic compound layers can be used.
Next, a third electrode layer 16 is formed so as to cover the pixel-separating film 12 and the second organic compound layers 15a to 15c (FIG. 2F) . As the method for forming the third electrode layer 16, a sputtering method, a vacuum deposition method, or the like can be used.
Next, the third electrode layer 16 is divided into a desired pattern (16a to 16c) (FIG. 2G) . Consequently, the third electrode layers 16a to 16c are respectively formed in regions covering the second organic compound layers 15a to 15c. In addition, all of the edges of the third electrode layers 16a to 16c are formed on the pixel- separating film 12.
Note that as the method for dividing the third electrode layer 16 into a desired pattern, the same method as used for the second electrode layer can be used. Doing so can prevent burrs from being produced at edges of the respective third electrode layers 16a to 16c, as in the case in which the second electrode layer 14 is divided. Next, a third organic compound layer 17 is formed so as to cover the pixel-separating film 12 and the third electrode layers 16a to 16c, and contact holes 21a and 21b are formed (FIG. 2H) . As methods for forming the third organic compound layer 17 and the contact holes 21a and 21b, the same methods as used for the first organic compound layers and the second organic compound layers can be used.
Next, a fourth electrode layer 18 is formed on the third organic compound layer 17 (FIG. 21) . As the method for forming the fourth electrode layer 18, a sputtering method, a vacuum deposition method, or the like can be used.
In the organic EL display device manufactured in the above-described steps, burrs can be prevented from occurring at the processed edges of the second electrode layers and the third electrode layers. Accordingly, the production yield of the organic EL display device can be improved. In addition, in the manufacturing method of the present embodiment, the processed edges of each electrode layer and each organic compound layer do not coincide with each other. Consequently, short-circuiting between electrode layers due to a patterning failure or the like in the organic compound layer can be reduced. This can improve the production yield of the organic EL display device. [Second Embodiment]
Hereinafter, a second embodiment of the method for . manufacturing the organic EL display device of the present invention will be described while referring to the accompanying drawings. FIG. 3 is a schematic cross- sectional view illustrating the organic EL display device manufactured according to the second embodiment in the manufacturing method of the present invention. In addition, FIGS. 4A, 4B and 4C are schematic cross-sectional views illustrating a method for manufacturing the organic EL display device of the second embodiment of the present invention.
The organic EL display device illustrated in FIG. 3 is a top emission-type organic EL display device. In addition, in the organic EL display device illustrated in FIG. 3, a first sub-pixel Ql, a second sub-pixel Q2 and a third sub-pixel Q3 are disposed in parallel with one another. One pixel is constituted of these three sub- pixels Ql, Q2 and Q3.
Incidentally, in the sub-pixels Ql, Q2 and Q3 illustrated in FIG. 3, organic compound layers which emit light in different colors are respectively formed between electrode layers.
That is, in the first sub-pixel Ql, the first electrode layer 31, the first organic compound layer 33a, and the second electrode layer 34a are laminated in this order on the substrate 30.
In the second sub-pixel Q2, the first electrode layer 31, the first organic compound layer 33b, and the second electrode layer 34b are laminated in this order on the substrate 30.
In the third sub-pixel Q3, the first electrode layer 31, the first organic compound layer 33c, and the second electrode layer 34c are laminated in this order on the substrate 30. Each of the organic compound layers (33a to 33c) illustrated in FIG. 3 is a single-layer thin film including at least a light-emitting layer or a laminated body formed of two or more layers. Here, when the organic compound layer is a laminated body formed of two or more layers, the organic compound layer includes any of a hole-injection layer, a hole-transport layer, an electron-transport layer and an electron-injection layer, in addition to the light- emitting layer.
On the other hand, a switching element (not shown in the figure) , such as a TFT, is formed as necessary on an insulating substrate (substrate 30) and is electrically connected to the first electrode layer 31. Next, the manufacturing method of the present invention will be described with reference to the accompanying drawings. FIGS. 4A, 4B and 4C are schematic cross-sectional views illustrating the second embodiment in the method for manufacturing an organic EL display device of the present invention.
In the present embodiment, the first electrode layer 31 is first formed on the substrate 30, and then a pixel- separating film 32 is pattern-formed into a desired shape on the first electrode layer 31. After the pixel- separating film 32 is formed, first organic compound layers 33a to 33c having different layer structures are pattern- formed in positions corresponding to the respective sub- pixels Ql to Q3 (FIG. 4A) . As the material for the substrate 30 used in the present embodiment, the same material as that of the substrate 10 described in the first embodiment can be used.
As the constituent material of the first electrode layer 31, the same material as that of the first electrode layers 11a to lie described in the first embodiment can be used.
As the constituent material of the pixel-separating film 32, the same material as that of the pixel-separating film 12 described in the first embodiment can be used. The methods for forming the first electrode layer 31 and the pixel-separating film 32 are the same as those of the first electrode layers 11a to lie and the pixel- separating film 12 shown in the first embodiment.
The first organic compound layers 33a to 33c are constituted of, for example, three layers of an electron- transport layer, a light-emitting layer and a hole- transport layer. However, the first organic compound layers 33a to 33c are not limited to this structure in the present invention. In addition, as the constituent materials of the electron-transport layer, the light- emitting layer and the hole-transport layer, the same materials as those of the first organic compound layers 13a to 13c described in the first embodiment can be used.
As the method for forming the first organic compound layers 33a to 33c, a vacuum deposition method using a metal mask, a coating method using ink jet, or the like can be used.
Next, a second electrode layer 34 is formed on the first organic compound layers 33a to 33c and the pixel- separating film 32 so as to cover these members (FIG. 4B) . Note that the constituent material of the second electrode layer 34 and the method for forming the second electrode layer are the same as those of the second electrode layers 14a to 14c described in the first embodiment.
After the second electrode layer 34 is formed, the second electrode layer is divided into a desired pattern (34a to 34c), as illustrated in FIG. 4C. Here, the divided second electrode layers 34a to 34c respectively cover the first organic compound layers 33a to 33c, and the edges of the respective electrode layers 34a to 34c are formed on the pixel-separating films 32.
The method for dividing the second electrode layer 34 is specifically a method for performing light irradiation in a region of the second electrode layer 34 on the pixel- separating film 32 in which the first organic compound layer is not formed. The light irradiation is preferably laser light irradiation (laser ablation method) . Examples of a laser used for the laser ablation method include a YAG laser and an excimer laser.
As a specific method for forming a pattern of the second electrode layer 34 using a laser ablation method, for example, a method for scanning laser light condensed to a diameter of several micrometers or a method for irradiating laser light only to a desired region using a lightproof mask can be used.
Here, when the second electrode layer 34 is irradiated with a laser, laser irradiation is performed in a region in which the second electrode layer 34 and the pixel-separating film 32 are in contact with each other
(region on the pixel-separating film 32 in which the first organic compound layer is not formed) . This is because a high-molecular compound, such as acrylics or polyimide, or an inorganic film, such as silicon oxide or silicon nitride, which is a constituent material of the pixel-separating film 32, has high thermal tolerance, compared with an organic compound which is a constituent material of the organic compound layer, and has a high strength of adhesion to the constituent material of the second electrode layer. Accordingly, even if heat is generated when the second electrode layer 34 is divided by a laser ablation method, the pixel-separating film 32 is only minimally deformed. In addition, peeling of the constituent material of the second electrode layer 34 hardly occurs. Consequently, if the second electrode layer 34 is divided on the pixel- separating film 32, it can prevent burrs from being produced at edges of any of the second electrode layers 34a to 34c.
In the organic EL display device manufactured in the above-described steps, burrs can be prevented from occurring at edges of a second electrode layer when the second electrode layer is processed. Accordingly, short- circuiting between electrode layers that may be caused as the result of some of the burrs falling off can be prevented. This can improve the production yield of the organic EL display device. While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
This application claims the benefit of Japanese Patent Application No. 2008-163314, filed June 23, 2008, which is hereby incorporated by reference in its entirety.

Claims

1. A method for manufacturing an organic EL display device comprising: a plurality of sub-pixels, each being formed of at least two electrode layers and an organic compound layer formed between the electrode layers and including at least a light-emitting layer; and a pixel-separating film formed between the sub-pixels so as to define the sub-pixels; the organic EL display device having a display area formed by arranging the sub-pixels, wherein at least one of the electrode layers is divided by performing light irradiation in a region on the pixel- separating film in which the organic compound layer is not formed.
2. The method for manufacturing an organic EL display device according to claim 1, wherein each of the sub-pixels is formed of at least three electrode layers and an organic compound layer formed between the electrode layers and including at least a light-emitting layer.
3. The method for manufacturing an organic EL display device according to claim 1, wherein the light irradiation is laser light irradiation.
4. The method for manufacturing an organic EL display device according to claim 1, wherein said region on the pixel-separating film in which the organic compound layer is not formed is formed through the steps of: forming an organic compound layer that is common to the plurality of sub-pixels; performing partially light-irradiation on a region of the organic compound layer located on the pixel-separating film; and removing the light-irradiated region of the organic compound layer.
5. The method for manufacturing an organic EL display device according to claim 4, wherein the light irradiation is laser light irradiation.
PCT/JP2009/061543 2008-06-23 2009-06-18 Method for manufacturing organic el display device WO2009157496A1 (en)

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