JP2002110345A - Manufacturing method of mask and organic el display element using the same - Google Patents
Manufacturing method of mask and organic el display element using the sameInfo
- Publication number
- JP2002110345A JP2002110345A JP2000299219A JP2000299219A JP2002110345A JP 2002110345 A JP2002110345 A JP 2002110345A JP 2000299219 A JP2000299219 A JP 2000299219A JP 2000299219 A JP2000299219 A JP 2000299219A JP 2002110345 A JP2002110345 A JP 2002110345A
- Authority
- JP
- Japan
- Prior art keywords
- organic
- display element
- mask
- light emitting
- shadow mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 20
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 9
- 239000012044 organic layer Substances 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 3
- 238000010030 laminating Methods 0.000 abstract description 7
- 238000007796 conventional method Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 37
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 238000003475 lamination Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 101100321669 Fagopyrum esculentum FA02 gene Proteins 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、有機ＥＬ表示素子
の製造用マスク、及びそれを用いた有機ＥＬ表示素子の
製造方法に関する。The present invention relates to a mask for manufacturing an organic EL display device and a method for manufacturing an organic EL display device using the same.
【０００２】[0002]
【従来の技術】携帯機器等をはじめとして幅広く用いら
れているフラットパネル表示素子において、現在主流で
あるのは液晶表示素子である。しかし、液晶表示素子に
は、以下に示すようないくつかの課題が存在する。2. Description of the Related Art Among flat panel display elements widely used in portable devices and the like, liquid crystal display elements are currently the mainstream. However, the liquid crystal display element has some problems as described below.
【０００３】（１）視野角が狭い。 （２）応答速度が遅い。 （３）バックライトを必要とするため、消費電力が大き
い。 （４）バックライトを必要とするため、画素表示部以外
のサイズ縮小に限界がある。 これらの問題に対して、様々な対策が検討されてきた。(1) The viewing angle is narrow. (2) The response speed is slow. (3) Since a backlight is required, power consumption is large. (4) Since a backlight is required, there is a limit in reducing the size of the area other than the pixel display section. Various countermeasures have been considered for these problems.
【０００４】先ず、視野角に関しては、画素分割方式に
よる高視野角化がなされているが、工程数が増えること
からコスト増を招き、得策とはいえない。First, as for the viewing angle, the viewing angle is increased by the pixel division method. However, the number of steps is increased, so that the cost is increased, and it cannot be said that it is an advantageous measure.
【０００５】また、視野角補償板を表示面側に貼ること
も考えられるが、十分な視野角は得られていない。Further, it is conceivable to attach a viewing angle compensating plate to the display surface side, but a sufficient viewing angle has not been obtained.
【０００６】視野角と応答速度との両方を解決する手段
として、ＭＶＡ（垂直配向）型の表示方式が提案されて
いるが、焼き付け等の問題がある。As a means for solving both the viewing angle and the response speed, an MVA (vertical alignment) type display system has been proposed, but there is a problem such as printing.
【０００７】消費電力に関しては、低電圧駆動の液晶材
料、あるいは駆動回路の双方からのアプローチが進めら
れているが、いずれも限界がある。With respect to power consumption, approaches are being pursued from both a low-voltage driven liquid crystal material and a drive circuit, but all have limitations.
【０００８】これに対し、最近では上記問題を全て解決
できる表示素子として、有機エレクトロ・ルミネッセン
ス（以下、有機ＥＬという）表示素子に注目が集まって
いる。On the other hand, an organic electroluminescence (hereinafter, referred to as an organic EL) display element has recently attracted attention as a display element capable of solving all of the above problems.
【０００９】有機ＥＬ表示素子は、自発光性素子である
ことから、視野角が広くかつバックライトを必要としな
いため薄型・小型化が可能である。また、応答速度が液
晶より３桁以上速い。Since the organic EL display element is a self-luminous element, it has a wide viewing angle and does not require a backlight, so that it can be made thin and small. In addition, the response speed is three orders of magnitude faster than the liquid crystal.
【００１０】このように優れた表示素子であるにもかか
わらず、有機有機ＥＬ表示素子がなかなか市場に出回ら
なかったのは、発光能を有する有機層（以下、有機発光
層という）は、水分に対して非常に敏感であることが挙
げられる。よって、極僅かな水分（１ｐｐｍ程度）でも
劣化してしまい、表示デバイスとして役に立たなくなる
等、発光素子としての積層プロセスに困難性がある。[0010] Despite being such an excellent display element, the organic organic EL display element has not been readily available on the market because an organic layer having a luminous ability (hereinafter referred to as an organic luminescent layer) is exposed to moisture. It is very sensitive. Therefore, there is a difficulty in the lamination process as a light emitting element, for example, deterioration is caused even by a very small amount of water (about 1 ppm), and the layer is not useful as a display device.
【００１１】一般に、発光素子の積層工程には、有機発
光層が劣化しないように、シャドウマスクを用いた蒸着
プロセスが用いられる。しかし、高精細なシャドウマス
クを作製することは困難であるため、液晶表示素子クラ
スの高精細な表示素子を作製することは難しかった。In general, a vapor deposition process using a shadow mask is used in the laminating step of the light emitting element so that the organic light emitting layer is not deteriorated. However, since it is difficult to produce a high-definition shadow mask, it has been difficult to produce a high-definition display element of a liquid crystal display element class.
【００１２】図５に、従来の有機ＥＬ表示素子の製造に
用いていた格子状シャドウマスクの構成を示す。図示さ
れていない外枠に、Ｒ、Ｇ、Ｂ毎の有機発光層を積層さ
せるために、所定間隔を空けて図中縦方向に延在した複
数の部材２１と、この部材２１と直交する方向に延在し
た複数のブリッジ２２とが設けられている。ブリッジ２
２は、画素の上下間を切断するために設けられている。
このようなシャドウマスクを、金属材料を用いてエッチ
ング加工により製造していた。ここで、部材２１の幅は
例えば１００μｍで、５０μｍ間隔で設けられており、
ブリッジ２２の幅は１０μｍである。FIG. 5 shows the structure of a lattice-shaped shadow mask used in the manufacture of a conventional organic EL display device. In order to stack organic light emitting layers for each of R, G, and B on an outer frame (not shown), a plurality of members 21 extending in a vertical direction in the drawing at predetermined intervals, and a direction orthogonal to the members 21. And a plurality of bridges 22 extending therefrom are provided. Bridge 2
Reference numeral 2 is provided for cutting the upper and lower portions of the pixel.
Such a shadow mask has been manufactured by etching using a metal material. Here, the width of the member 21 is, for example, 100 μm, and is provided at 50 μm intervals.
The width of the bridge 22 is 10 μm.
【００１３】高精細なシャドウマスクを得るには、薄板
を用いて微細加工を行う必要がある。しかし、薄板を用
いてエッチング加工すると、エッチングには等方性があ
るため、幅の狭いブリッジ２２には破損が発生し易いた
め難しい。また、加工されたシャドウマスクを扱う際に
も、撓みや破損等が発生し易いためハンドリングに問題
がある。加工やハンドリングの容易性を求めて板の厚さ
を厚くしたり、ブリッジ２２の幅を広くすると、有機発
光層の画素の上下間隔が広く空いてしまい、高精細な画
像を得ることができない。In order to obtain a high-definition shadow mask, it is necessary to perform fine processing using a thin plate. However, etching using a thin plate is difficult because the etching is isotropic and the narrow bridge 22 is easily damaged. Also, when handling the processed shadow mask, there is a problem in handling since the deflection or breakage is liable to occur. If the thickness of the plate is increased or the width of the bridge 22 is increased in order to facilitate processing and handling, the vertical distance between the pixels of the organic light emitting layer is widened, and a high-definition image cannot be obtained.
【００１４】[0014]
【発明が解決しようとする課題】上述のように、従来は
格子状シャドウマスクを用いて有機発光層を積層してい
たが、高精細な画像を実現することが困難であった。As described above, conventionally, organic light emitting layers are laminated using a lattice-shaped shadow mask, but it has been difficult to realize a high-definition image.
【００１５】本発明は上記事情に鑑みてなされたもの
で、簡易なプロセスにより高歩留まりでかつ高精細な有
機ＥＬ表示素子を実現する、マスク及びそれを用いた有
機ＥＬ表示素子の製造方法を提供することを目的とす
る。The present invention has been made in view of the above circumstances, and provides a mask for realizing a high-yield and high-definition organic EL display element by a simple process and a method for manufacturing an organic EL display element using the same. The purpose is to do.
【００１６】[0016]
【課題を解決するための手段】本発明のマスクは、外枠
と、前記外枠の内側において、一方向に延在し両端を前
記外枠により支持された状態で、相互に所定間隔を空け
て設けられた複数の金属片とを備えることを特徴とす
る。According to the present invention, there is provided a mask having an outer frame and a predetermined distance from each other inside the outer frame, the first frame extending in one direction and both ends being supported by the outer frame. And a plurality of metal pieces provided.
【００１７】本発明の有機ＥＬ表示素子の製造方法は、
一主面上に複数の走査線及び信号線が交差するように配
置され、交点近傍に位置する画素毎に、画素電極とスイ
ッチング素子とが配置されたアクティブマトリクス基板
を有する有機ＥＬ表示素子の製造方法であって、前記ア
クティブマトリクス基板上に、ストライプ状のマスクを
介して発光能を有する有機層を一方向に延在するように
成膜する工程と、前記有機層にレーザ光の照射を行って
切断することにより、前記有機層が各画素に対応するよ
うにしてなる工程とを備えることを特徴とする。The method for manufacturing an organic EL display element of the present invention comprises:
Manufacture of an organic EL display element having an active matrix substrate in which a plurality of scanning lines and signal lines are arranged so as to intersect on one main surface, and a pixel electrode and a switching element are arranged for each pixel located near the intersection. A method of forming an organic layer having a light emitting ability so as to extend in one direction via a stripe-shaped mask on the active matrix substrate, and irradiating the organic layer with laser light. Cutting the organic layer so that the organic layer corresponds to each pixel.
【００１８】ここで、前記レーザの断面形状は帯状であ
ってもよい。Here, the cross section of the laser may be a band.
【００１９】[0019]
【発明の実施の形態】以下、本発明の一実施の形態につ
いて図面を参照して説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings.
【００２０】上述したように、従来の製造方法で高精細
な有機ＥＬ表示素子を作製するには、非常に微細な構造
の格子状シャドウマスクが必要であるが、シャドウマス
クに用いられる金属をエッチング加工する際に、エッチ
ングに等方性があるためブリッジが削れてしまい、格子
パターン状のシャドウマスクの作製が困難であった。As described above, in order to manufacture a high-definition organic EL display element by a conventional manufacturing method, a grid-shaped shadow mask having a very fine structure is required. However, the metal used for the shadow mask is etched. During processing, the bridge is shaved due to isotropic etching, making it difficult to produce a grid pattern shadow mask.
【００２１】本実施の形態では、格子状シャドウマスク
を用いることなく、高精細な有機ＥＬ表示素子の製造を
可能とする。即ち、後述するストライプ状シャドウマス
クを用いることで、縦方向の有機発光層を一括で蒸着す
る。そして、この有機発光層をレーザー照射により切断
するプロセスを追加することにより、有機発光層の各画
素間でのショートの発生を確実に防止する。In the present embodiment, it is possible to manufacture a high-definition organic EL display element without using a lattice-shaped shadow mask. That is, the organic light emitting layers in the vertical direction are collectively deposited by using a stripe-shaped shadow mask described later. Then, by adding a process of cutting the organic light emitting layer by laser irradiation, occurrence of a short circuit between the pixels of the organic light emitting layer is reliably prevented.
【００２２】図１に、本実施の形態によるマスクを用い
て製造するアクティブマトリクス型有機有機ＥＬ表示素
子の縦断面を、工程別に示す。FIG. 1 shows a vertical cross section of an active matrix type organic organic EL display device manufactured by using the mask according to the present embodiment for each process.
【００２３】図１（ａ）に示されたように、透光性を有
する絶縁基板３上に、成膜及びそのパターニング工程を
繰り返すことで、第１の電極４と、各画素に対応する透
明電極５とを順に形成していく。透明電極５の形成に
は、通常用いられているフォトエッチング技術、あるい
はマスクスパッタ法を用いてもよい。As shown in FIG. 1A, the first electrode 4 and the transparent electrode corresponding to each pixel are formed by repeatedly forming and patterning a film on an insulating substrate 3 having a light-transmitting property. The electrodes 5 are sequentially formed. The transparent electrode 5 may be formed by using a commonly used photoetching technique or a mask sputtering method.
【００２４】次に、各画素間の電気的ショートを防ぐた
め、絶縁層６として例えば紫外線硬化型アクリル樹脂レ
ジストを用いて各画素を囲むように格子状に形成する。Next, in order to prevent an electrical short between the pixels, the insulating layer 6 is formed in a lattice shape so as to surround the pixels by using, for example, an ultraviolet-curable acrylic resin resist.
【００２５】本実施の形態においてはアクリル樹脂を用
いているが、感光性を有するものであれば他の材料であ
ってもよく、例えばポリイミド樹脂を用いてもよい。絶
縁層６を形成後、例えば２２０℃で３０分間ベーク処理
を行い、硬化させる。In this embodiment, an acrylic resin is used, but other materials having photosensitivity may be used, for example, a polyimide resin may be used. After the formation of the insulating layer 6, a baking process is performed at, for example, 220 ° C. for 30 minutes to be cured.
【００２６】この後、図１（ｂ）に示されたように、有
機発光層７Ｒ、７Ｇ、７Ｂを形成する。有機発光層７
Ｒ、７Ｇ、７Ｂは、それぞれＲ、Ｇ、Ｂの各色を発色す
るものであり、図２の平面図に示されたように、ストラ
イプ状にＲ、Ｇ、Ｂ毎の有機発光層７Ｒ、７Ｇ、７Ｂを
形成する。Thereafter, as shown in FIG. 1B, organic light emitting layers 7R, 7G, 7B are formed. Organic light emitting layer 7
R, 7G, and 7B emit R, G, and B colors, respectively, and as shown in the plan view of FIG. 2, organic light emitting layers 7R, 7G for each of R, G, and B in a stripe shape. , 7B.
【００２７】ここで、有機発光層７Ｒ、７Ｇ、７Ｂの積
層には、図４に示されたストライプ状のシャドウマスク
１を用いる。このシャドウマスク１は、外枠１ａの内壁
に対し、図中縦方向に延在した複数の部材２が、所定間
隔を空けてそれぞれの両端が接合され支持されている。
部材２の幅は、例えば１００μｍで、間隔は５０μｍと
する。Here, the stripe-shaped shadow mask 1 shown in FIG. 4 is used for laminating the organic light emitting layers 7R, 7G, 7B. In the shadow mask 1, a plurality of members 2 extending in the vertical direction in the figure are supported at both ends thereof at predetermined intervals with respect to the inner wall of the outer frame 1a.
The width of the member 2 is, for example, 100 μm, and the interval is 50 μm.
【００２８】従来の製造方法では、上述したように有機
発光層の積層に格子状のシャドウマスクを用いていた
が、微細加工が困難なため高精細な画像を実現できなか
った。In the conventional manufacturing method, a lattice-shaped shadow mask is used for laminating the organic light emitting layers as described above. However, since fine processing is difficult, a high-definition image cannot be realized.
【００２９】これに対し、本実施の形態では、ストライ
プ状のシャドウマスク１を用いて有機発光層の積層を行
う。このシャドウマスク１には、幅の狭いブリッジは存
在しないので、薄板を用いて容易に微細加工を行うこと
ができる。On the other hand, in the present embodiment, the organic light emitting layers are stacked using the stripe-shaped shadow mask 1. Since there is no narrow bridge in the shadow mask 1, fine processing can be easily performed using a thin plate.
【００３０】有機発光層７Ｒ、７Ｇ、７Ｂの積層工程で
は、いずれか１色の有機発光層を積層後、シャドウマス
ク１を画素１列分ずらして次の有機発光層を積層させ、
さらにシャドウマスク１を画素１列分ずらして次の有機
発光層を積層させる。あるいは、３色毎に用意した３枚
のシャドウマスクを用いて順次積層を行ってもよい。In the step of laminating the organic light emitting layers 7R, 7G, and 7B, the organic light emitting layers of any one color are stacked, the shadow mask 1 is shifted by one pixel, and the next organic light emitting layer is stacked.
Further, the next organic light emitting layer is stacked by shifting the shadow mask 1 by one column of pixels. Alternatively, the layers may be sequentially stacked using three shadow masks prepared for each of the three colors.
【００３１】この後、図１（ｃ）に示されたように、帯
状のエキシマレーザー（波長２００ｎｍ、パワー３００
ｍＪ／ｃｍ2、幅５μｍ）を、有機発光層７Ｒ、７Ｇ、
７Ｂのストライプ方向と直交する方向に走査しつつ画素
ピッチで照射することで、有機発光層７Ｒ、７Ｇ、７Ｂ
を各画素に対応するように切断する。これにより、各々
の有機発光層７Ｒ、７Ｇ、７Ｂの各画素間でのショート
の発生を確実に防止することができる。ここで、有機発
光層７Ｒ、７Ｇ、７Ｂを画素間で確実に切断するように
レーザ照射するため、照射された絶縁層６の表面にはく
ぼみ６ａが生じるが、素子の特性には全く影響を与えな
い。図３に、レーザー照射によリ有機発光層７Ｒ、７
Ｇ、７Ｂを間隔１２を空けて切断した後の平面状態を示
す。Thereafter, as shown in FIG. 1C, a strip-shaped excimer laser (wavelength 200 nm, power 300
mJ / cm 2, width 5 μm), and the organic light emitting layers 7R, 7G,
Irradiation at a pixel pitch is performed while scanning in a direction orthogonal to the stripe direction of the organic light emitting layers 7R, 7G, and 7B.
Is cut to correspond to each pixel. As a result, occurrence of a short circuit between the pixels of the organic light emitting layers 7R, 7G, 7B can be reliably prevented. Here, since the organic light emitting layers 7R, 7G, and 7B are irradiated with laser so as to surely cut them between the pixels, the surface of the irradiated insulating layer 6 has depressions 6a, but has no influence on the characteristics of the device. Do not give. FIG. 3 shows that the organic light emitting layers 7R and 7R are irradiated by laser irradiation.
The plane state after cutting G and 7B with an interval 12 is shown.
【００３２】図１（ｄ）に示されたように、全面を覆う
ようにＡｌ等の電極材を蒸着し、第２の電極８をべた状
に形成する。ここで、絶縁層６形成後のプロセスは、全
て真空条件下で行なう。As shown in FIG. 1D, an electrode material such as Al is deposited to cover the entire surface, and the second electrode 8 is formed in a solid shape. Here, all processes after the formation of the insulating layer 6 are performed under vacuum conditions.
【００３３】このようにして得られたアレイ基板に表面
を封止するため、図示されていない対向カバーガラスに
おいて、アレイ基板の有機発光層７Ｒ、７Ｇ、７Ｂの積
層された画素領域の外側に対応する位置に紫外線硬化型
シール材を塗布する。そして、対向カバーガラスとアレ
イ基板とを張り合わせる。この後、紫外線を照射させて
シール材を硬化させて完成する。ここで、シールの貼り
あわせ工程は、Ｎ2またはＡｒガスの雰囲気中で行な
う。In order to seal the surface to the array substrate obtained in this manner, a portion corresponding to the outside of the pixel region where the organic light emitting layers 7R, 7G and 7B of the array substrate are laminated is placed on the opposite cover glass (not shown). UV-curable sealing material is applied to the position to be cured. Then, the opposing cover glass and the array substrate are laminated. Thereafter, the sealing material is cured by irradiating ultraviolet rays to complete the sealing material. Here, the sticking step of the seal is performed in an atmosphere of N2 or Ar gas.
【００３４】本実施の形態により製造したカラー表示型
アクティブマトリクス有機ＥＬ表示装置は、微細加工が
容易なストライプ状シャドウマスクを用いて有機発光層
を積層し、レーザ光を照射して切断することにより、高
精細な表示品位を実現することができる。The active matrix organic EL display device of the color display type manufactured according to the present embodiment is obtained by laminating organic light emitting layers using a stripe-shaped shadow mask which can be easily finely processed, and cutting by irradiating a laser beam. , High-definition display quality can be realized.
【００３５】上述した実施の形態は一例であり、本発明
を限定するものではない。例えば、上記実施の形態で膜
の形成に用いた材料や積層法等は、必要に応じて自由に
変えることができる。The above-described embodiment is an example, and does not limit the present invention. For example, the material, the lamination method, and the like used for forming the film in the above embodiment can be freely changed as necessary.
【００３６】[0036]
【発明の効果】以上説明したように、本発明によれば、
微細加工が容易なストライプ状シャドウマスクを用いて
有機発光層を積層し、その後レーザ光を照射して画素毎
に切断することによリ、高精細で表示品位の高い有機Ｅ
Ｌ表示装置の製造を簡易なプロセスにより実現すること
ができる。As described above, according to the present invention,
The organic light-emitting layer is laminated using a stripe-shaped shadow mask that is easy to finely process, and then irradiated with a laser beam to be cut for each pixel.
The manufacture of the L display device can be realized by a simple process.
【図１】本発明の一実施の形態による有機ＥＬ表示素子
の製造方法を工程別に示した素子の縦断面図。FIG. 1 is a longitudinal sectional view of an element showing a method of manufacturing an organic EL display element according to an embodiment of the present invention for each process.
【図２】同製造方法における一工程であって、有機発光
層を積層した状態を示した平面図。FIG. 2 is a plan view showing a state in which an organic light emitting layer is stacked, which is one step in the manufacturing method.
【図３】図３に示された積層後の有機発光層にレーザ照
射を行って切断した状態を示した平面図。FIG. 3 is a plan view showing a state in which the organic light emitting layer after lamination shown in FIG. 3 is cut by performing laser irradiation.
【図４】上記製造方法で用いられるストライプ状シャド
ウマスクの構成を示した平面図。FIG. 4 is a plan view showing a configuration of a stripe-shaped shadow mask used in the manufacturing method.
【図５】従来の製造方法において有機発光層の積層に用
いていたマスクを示した平面図。FIG. 5 is a plan view showing a mask used for laminating an organic light emitting layer in a conventional manufacturing method.
１ シャドウマスク １ａ 外枠 ２ 部材 ３ 絶縁基板 ４ 第１の電極 ５ 透明電極 ６ 絶縁層 ７Ｒ、７Ｇ、７Ｂ 有機発光層 ８ 第２の電極 REFERENCE SIGNS LIST 1 shadow mask 1a outer frame 2 member 3 insulating substrate 4 first electrode 5 transparent electrode 6 insulating layer 7R, 7G, 7B organic light emitting layer 8 second electrode
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０５Ｂ 33/12 Ｈ０５Ｂ 33/12 Ｂ 33/14 33/14 Ａ Ｆターム(参考） 3K007 AB04 AB18 BA06 CB01 DA01 DB03 EB00 FA01 4K029 BA62 BB03 BC07 BD00 CA01 GA00 HA03 5C094 AA05 AA43 BA03 BA12 BA27 CA19 CA24 DA13 DB04 EA04 EA05 EB02 ED15 FA01 FA02 FB01 FB12 FB14 FB15 GB10──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05B 33/12 H05B 33/12 B 33/14 33/14 A F term (Reference) 3K007 AB04 AB18 BA06 CB01 DA01 DB03 EB00 FA01 4K029 BA62 BB03 BC07 BD00 CA01 GA00 HA03 5C094 AA05 AA43 BA03 BA12 BA27 CA19 CA24 DA13 DB04 EA04 EA05 EB02 ED15 FA01 FA02 FB01 FB12 FB14 FB15 GB10
Claims (3)
枠により支持された状態で、相互に所定間隔を空けて設
けられた複数の金属片と、 を備えることを特徴とするマスク。An outer frame, and a plurality of metal pieces provided in the inner side of the outer frame at predetermined intervals from each other while extending in one direction and both ends are supported by the outer frame. A mask comprising:
するように配置され、交点近傍に位置する画素毎に、画
素電極とスイッチング素子とが配置されたアクティブマ
トリクス基板を有する有機ＥＬ表示素子の製造方法にお
いて、 前記アクティブマトリクス基板上に、ストライプ状のマ
スクを介して発光能を有する有機層を一方向に延在する
ように成膜する工程と、 前記有機層にレーザ光の照射を行って切断することによ
り、前記有機層が各画素に対応するようにしてなる工程
と、 を備えることを特徴とする有機ＥＬ表示素子の製造方
法。2. An organic circuit comprising: an active matrix substrate in which a plurality of scanning lines and signal lines are arranged on one main surface so as to intersect, and for each pixel located near an intersection, a pixel electrode and a switching element are arranged. In the method for manufacturing an EL display element, a step of forming an organic layer having a luminous ability so as to extend in one direction through a stripe-shaped mask on the active matrix substrate; Irradiating and cutting to make the organic layer correspond to each pixel. A method for manufacturing an organic EL display element, comprising:
特徴とする請求項２記載の有機ＥＬ表示素子の製造方
法。3. The method for manufacturing an organic EL display element according to claim 2, wherein said laser has a band-shaped cross section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000299219A JP2002110345A (en) | 2000-09-29 | 2000-09-29 | Manufacturing method of mask and organic el display element using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000299219A JP2002110345A (en) | 2000-09-29 | 2000-09-29 | Manufacturing method of mask and organic el display element using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002110345A true JP2002110345A (en) | 2002-04-12 |
Family
ID=18781060
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000299219A Pending JP2002110345A (en) | 2000-09-29 | 2000-09-29 | Manufacturing method of mask and organic el display element using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002110345A (en) |
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| JP2004119304A (en) * | 2002-09-27 | 2004-04-15 | Sanyo Electric Co Ltd | Organic electroluminescence display device and method for manufacturing the same |
| JP2005011810A (en) * | 2003-06-16 | 2005-01-13 | Eastman Kodak Co | Method of making top-emitting oled device |
| US7073518B2 (en) | 2003-12-04 | 2006-07-11 | Kanto Kagaku Kabushiki Kaisha | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device |
| US20080290794A1 (en) * | 2007-04-03 | 2008-11-27 | Canon Kabushiki Kaisha | Color image display panel and method of producing the same, and color image display apparatus |
| WO2009157496A1 (en) * | 2008-06-23 | 2009-12-30 | Canon Kabushiki Kaisha | Method for manufacturing organic el display device |
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2000
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2004119304A (en) * | 2002-09-27 | 2004-04-15 | Sanyo Electric Co Ltd | Organic electroluminescence display device and method for manufacturing the same |
| US7279834B2 (en) | 2002-09-27 | 2007-10-09 | Sanyo Electric Co., Ltd. | Organic electroluminescent display apparatus and method of fabricating the same |
| JP2005011810A (en) * | 2003-06-16 | 2005-01-13 | Eastman Kodak Co | Method of making top-emitting oled device |
| US7073518B2 (en) | 2003-12-04 | 2006-07-11 | Kanto Kagaku Kabushiki Kaisha | Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device |
| US20080290794A1 (en) * | 2007-04-03 | 2008-11-27 | Canon Kabushiki Kaisha | Color image display panel and method of producing the same, and color image display apparatus |
| US8118633B2 (en) * | 2007-04-03 | 2012-02-21 | Canon Kabushiki Kaisha | Color image display panel and method of producing the same, and color image display apparatus |
| WO2009157496A1 (en) * | 2008-06-23 | 2009-12-30 | Canon Kabushiki Kaisha | Method for manufacturing organic el display device |
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| CN110140228A (en) * | 2016-12-13 | 2019-08-16 | 诺瓦尔德股份有限公司 | Prepare method, organic electronic device and the device comprising the organic electronic device of organic electronic device |
| CN110140228B (en) * | 2016-12-13 | 2022-02-11 | 诺瓦尔德股份有限公司 | Method for preparing organic electronic device, organic electronic device and apparatus comprising the same |
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