WO2009139448A1 - パターン形成方法 - Google Patents
パターン形成方法 Download PDFInfo
- Publication number
- WO2009139448A1 WO2009139448A1 PCT/JP2009/059014 JP2009059014W WO2009139448A1 WO 2009139448 A1 WO2009139448 A1 WO 2009139448A1 JP 2009059014 W JP2009059014 W JP 2009059014W WO 2009139448 A1 WO2009139448 A1 WO 2009139448A1
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- WIPO (PCT)
- Prior art keywords
- pattern
- curable resin
- magnetic recording
- mold
- ultraviolet curable
- Prior art date
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Definitions
- the present invention relates to a pattern forming method, a method for manufacturing a discrete track magnetic recording medium using the pattern forming method, and a discrete track magnetic recording / reproducing apparatus equipped with a magnetic recording medium manufactured by the manufacturing method.
- the present application claims priority based on Japanese Patent Application No. 2008-129700 filed in Japan on May 16, 2008, the contents of which are incorporated herein by reference.
- the convex portion may be described as a peak portion and the concave portion may be referred to as a land portion and a groove portion
- the recording tracks may be connected to each other.
- Attempts have been made to increase track density by physical separation.
- Such a technique is called a discrete track method or a patterned media method depending on the shape of the unevenness.
- nanoimprint lithography As a technique for forming fine irregularities with high throughput by these methods, nanoimprint lithography has attracted attention (see, for example, Patent Document 1).
- a UV nanoimprint method using an ultraviolet curable resin as a layer to which a pattern is transferred is effective (for example, patents). See reference 2.)
- the illuminance of the ultraviolet light often varies depending on the irradiated portion.
- a substrate (work) having an ultraviolet curable resin layer for example, curing unevenness occurs in the ultraviolet curable resin on the substrate.
- a mold release failure from the mold may occur.
- problems such as use of a fine pattern formed on the base material and subsequent fine processing cannot be performed uniformly.
- the present invention has been proposed in view of the above-described conventional circumstances, and prevents unevenness in the illuminance of ultraviolet light applied to the base material, and uniformly cures the ultraviolet curable resin on the base material.
- An object of the present invention is to provide a pattern forming method that enables the above.
- the present invention also provides a method for manufacturing a discrete track magnetic recording medium using this pattern forming method, and a discrete track magnetic recording / reproducing apparatus equipped with the magnetic recording medium manufactured by this manufacturing method.
- the present invention provides the following methods and apparatuses.
- a first step of forming a first ultraviolet curable resin layer on a substrate A second step in which a pattern forming surface on which a predetermined pattern of the first mold is formed is opposed to the first ultraviolet curable resin layer, and the base material and the first mold are pressure-bonded; A member for diffusing ultraviolet light was interposed between the ultraviolet curable resin layer and the ultraviolet light source, and the first mold pattern was diffused to the transferred first ultraviolet curable resin layer by the pressure bonding.
- a third step of irradiating with ultraviolet light (2) The pattern forming method as described in (1) above, wherein the third step is performed simultaneously with the second step.
- the pattern forming method according to one item. (8) The pattern forming method according to any one of (1) to (7), wherein a diffusion plate or a fly-eye lens is used as the member that diffuses the ultraviolet light. (9) The pattern forming method as described in any one of (1) to (8) above, wherein the substrate is a magnetic recording medium.
- (10) A method for manufacturing a discrete track magnetic recording medium using the pattern forming method according to any one of (1) to (9).
- (11) A magnetic recording / reproducing apparatus on which the discrete track magnetic recording medium manufactured by the manufacturing method according to (10) is mounted. Note that the above (2) to (9) are not essential features but represent preferred examples of the present invention.
- ADVANTAGE OF THE INVENTION it is possible to provide the pattern formation method which prevented the variation of the illumination intensity of the ultraviolet light irradiated to a base material, and made it possible to harden
- a method for manufacturing a discrete track magnetic recording medium using such a pattern forming method, and a discrete track magnetic recording / reproducing apparatus equipped with the magnetic recording medium manufactured by such a manufacturing method are provided. Can be provided.
- the first ultraviolet curable resin layer is cured by irradiating with ultraviolet light through a light diffusing member ( It is sectional drawing which shows a 3rd process) state. It is sectional drawing which shows the process of measuring the illumination intensity of ultraviolet light in the example of the manufacturing process of the magnetic recording medium with a pattern film by UV nanoimprint using the pattern formation method of this invention. It is sectional drawing which shows the magnetic recording medium with a pattern film obtained in the example of the manufacturing process of the magnetic recording medium with a pattern film by UV nanoimprint using the pattern formation method of this invention.
- FIG. 1 is a perspective view showing an example of a discrete track magnetic recording / reproducing apparatus to which the present invention is applied.
- FIG. FIG. 25 is a perspective view showing a head gimbal assembly provided in the magnetic recording / reproducing apparatus shown in FIG. 24.
- the present invention relates to a pattern forming method for forming a predetermined pattern on an ultraviolet curable resin by using an imprint method, a method for manufacturing a discrete track magnetic recording medium using this pattern forming method, and a method for manufacturing the same.
- the present invention relates to a discrete track magnetic recording / reproducing apparatus equipped with a magnetic recording medium.
- a pattern forming method, a discrete track magnetic recording medium manufacturing method, and a discrete track magnetic recording / reproducing apparatus to which the present invention is applied will be described in detail with reference to the drawings.
- the UV nanoimprint method using the pattern forming method of the present invention can be applied to the production of a magnetic recording medium with a pattern film, for example.
- a magnetic recording medium 1 as a substrate is prepared.
- the magnetic recording medium 1 used here is not particularly limited and can be selected as necessary.
- the nonmagnetic substrate 2 having the central hole 2a at the center may have the magnetic layer 3 and the protective layer 4 formed on both surfaces.
- the number and type of magnetic layers 3 can be selected as necessary.
- the magnetic layer 3 may be an in-plane magnetic recording layer or a perpendicular magnetic recording layer.
- a protective layer may also be selected as necessary.
- the magnetic recording medium 1 is not limited to the magnetic layer 3 and the protective layer 4 formed on both surfaces of the nonmagnetic substrate 2, and the magnetic layer 3 and the protective layer 4 are formed only on one surface of the nonmagnetic substrate 2. It may be a thing.
- the thickness of the nonmagnetic substrate varies depending on the size of the magnetic recording medium (disk) and can be selected as necessary. However, the thickness is preferably 0.2 to 1.6 mm, and more preferably 0.2 to 1.4 mm. More preferred.
- the magnetic recording layer for the in-plane magnetic recording medium for example, a laminated structure including a nonmagnetic CrMo underlayer and a ferromagnetic CoCrPtTa magnetic layer can be used.
- Examples of magnetic recording layers for perpendicular magnetic recording media include soft magnetic FeCo alloys (FeCoB, FeCoSiB, FeCoZr, FeCoZrB, and FeCoZrBCu, etc.), FeTa alloys (FeTaN, FeTaC, etc.), and Co alloys (CoTaZr, CoZrNB, , Etc.), an orientation control film such as Pt, Pd, NiCr, and NiFeCr, an intermediate film such as Ru, and a 70Co-15Cr-15Pt alloy, and 90 (80Co-5Cr-15Pt). ) / 10SiO a magnetic layer composed of two alloys can be used a material obtained by laminating.
- soft magnetic FeCo alloys FeCoB, FeCoSiB, FeCoZr, FeCoZrB, and FeCoZrBCu, etc.
- FeTa alloys FeTaN, FeTaC, etc.
- Co alloys CoTaZr, CoZrNB,
- the thickness of the magnetic recording layer is selected as necessary, but is generally 3 to 20 nm, preferably 5 to 15 nm or less.
- the magnetic recording layer may be formed so as to obtain sufficient head input / output according to the type of magnetic alloy used and the laminated structure.
- the film thickness of the magnetic layer requires a certain thickness of the magnetic layer in order to obtain a certain level of output during playback.
- parameters indicating recording / playback characteristics usually deteriorate as the output increases. is there. For this reason, it is necessary to set an optimal film thickness.
- the magnetic recording layer is formed as a thin film by a sputtering method. For example, at this time, an uneven shape is formed in the magnetic recording layer.
- a protective film layer is formed on the surface of the magnetic recording layer.
- the protective film layer carbonaceous layers such as carbon (C), hydrogenated carbon (HxC), nitrogenated carbon (CN), amorphous carbon, silicon carbide (SiC), SiO 2 , ZrO 2 , Ti 3 N 4
- a commonly used protective film layer material can be used.
- the protective film may be composed of two or more layers.
- the thickness of the protective film 3 is selected as necessary, but is preferably less than 10 nm. If the thickness of the protective film exceeds 10 nm, the distance between the head and the magnetic layer increases, and sufficient input / output signal strength may not be obtained.
- the protective film layer is formed by a sputtering method. At this time, a protective film having unevenness is formed following the unevenness described above. Further, the thickness of the protective film in the concave portion tends to be larger than the thickness of the protective layer in the convex portion.
- a first ultraviolet curable resin layer 5 is formed on the magnetic recording medium 1 to produce a workpiece 6 (hereinafter referred to as a first step).
- a first ultraviolet curable resin layer 5 is formed on the magnetic recording medium 1 to produce a workpiece 6 (hereinafter referred to as a first step).
- a first ultraviolet curable resin layer 5 is formed on the magnetic recording medium 1 to produce a workpiece 6 (hereinafter referred to as a first step).
- a first ultraviolet curable resins include (meth) acryloyl group, vinyl ether group, N-vinylamide group, vinyl ester group, styryl group (aromatic vinyl group), oxetanyl group, glycidyl group, and / or cyclohexene.
- examples thereof include a resin composition containing a compound having a curable group such as an oxide group.
- a resin composition containing a compound having a fast-curing curable group such as a (meth) acryloyl group, an oxetanyl group, and / or a cyclohexene oxide group can be preferably used.
- Examples of compounds having a (meth) acryloyl group include methyl (meth) acrylate, ethyl (meth) acrylate, (meth) acrylic acid-n-propyl, isopropyl (meth) acrylate, (meth) acrylic acid- n-butyl, isobutyl (meth) acrylate, sec-butyl (meth) acrylate, hexyl (meth) acrylate, octyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (meth) acrylic acid Decyl, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, ( Aliphatic mono (meth) acrylates such as 2-hydroxybutyl (meth) acrylate
- bisphenol A type epoxy resin hydrogenated bisphenol A type epoxy resin, brominated bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, alicyclic type Epoxy resin, N-glycidyl type epoxy resin, bisphenol A novolak type epoxy resin, chelate type epoxy resin, glyoxal type epoxy resin, amino group-containing epoxy resin, rubber modified epoxy resin, dicyclopentadiene phenolic type epoxy resin, silicone modified epoxy Resin, so-called epoxy (meth) acrylate obtained by adding (meth) acrylic acid to epoxy resin such as ⁇ -caprolactone modified epoxy resin, various urethane (meth) acrylates An example can be given.
- examples of the compound having a vinyl ether group include 2-ethylhexyl vinyl ether, octadecyl vinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol monovinyl ether, triethylene glycol monovinyl ether, 9-hydroxynonyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, etc.
- Aliphatic monovinyl ethers such as cyclohexyl vinyl ether, 4-hydroxycyclohexyl vinyl ether, cyclohexanedimethanol monovinyl ether, tricyclodecanyl vinyl ether, and the like; 1,4-butanediol divinyl ether, nonanediol divinyl ether, triethylene Aliphatic divinyli such as glycol divinyl ether Cyclo ether diol divinyl ether, cyclohexane dimethanol divinyl ether, tricyclodecane dimethanol divinyl ether, alicyclic divinyl ether such as pentacyclopentadecane dimethanol divinyl ether; polyfunctionality such as trimethylolpropane trivinyl ether, pentaerythritol tetravinyl ether A vinyl ether etc. can be mentioned.
- examples of the compound having an N-vinylamide group include N-vinylformamide and N-vinylpyrrolidone.
- examples of the compound having a cyclohexene oxide group include cyclohexene oxide and its derivatives, 3 ′, 4′-epoxycyclohexanecarboxylic acid 3,4-epoxycyclohexylmethyl, limonene dioxide, vinylcyclohexene oxide, bis- ( 3,4-epoxycyclohexylmethyl adipate), epoxidized butanetetracarboxylic acid tetrakis- (3-cyclohexenylmethyl) modified ⁇ -caprolactone, 1,2-epoxy of 2,2-bis (hydroxymethyl) -1-butanol Examples include 4- (2-oxiranyl) cyclohexane adduct, 3,4-epoxycyclohexane-1-carboxylic acid allyl ester, 3,4-epoxycyclohexane-1-methyl-1-carboxylic acid allyl ester, and the like.
- Examples of compounds having a glycidyl group include bisphenol A type epoxy resins, hydrogenated bisphenol A type epoxy resins, brominated bisphenol A type epoxy resins, bisphenol F type epoxy resins, novolac type epoxy resins, phenol novolac type epoxy resins, and cresols.
- Examples thereof include epoxy resins such as phenolic epoxy resins, silicone-modified epoxy resins, and ⁇ -caprolactone-modified epoxy resins.
- Examples of the compound having an oxetanyl group include oxetane resins such as Aron Oxetane series manufactured by Toagosei Co., Ltd. and ETERNACOLL OXETAN series manufactured by Ube Industries, Ltd.
- UV curable resins for nanoimprint such as PAK-01 (manufactured by Toyo Gosei Co., Ltd.), NIF-A-1 (manufactured by Asahi Glass Co., Ltd.) may be used. These ultraviolet curable resins may be used alone or in combination of two or more. Furthermore, when applying these ultraviolet curable resins to a substrate, one or more materials may be added as necessary. For example, in addition to a photopolymerization initiator and a sensitizer, a surface conditioner, You may add a viscosity modifier, a solvent, etc.
- the UV curable resin 5 preferably has a viscosity at room temperature after solvent drying of 10000 mPa ⁇ s or less from the viewpoint of the pattern transferability described later.
- the thickness of the ultraviolet curable resin layer is preferably 30 to 300 nm, and more preferably 50 to 200 nm.
- the method for forming the ultraviolet curable resin layer 5 is not particularly limited.
- methods such as spin coating, dip coating, spray coating, and ink jet printing can be used, and the method is appropriately selected according to conditions such as the viscosity of the ultraviolet curable resin 5 to be used.
- one or more first molds 7 having a pattern forming surface are prepared.
- the number and shape of the mold can be selected as necessary.
- a pattern 7A having a convex portion corresponding to a non-magnetic portion of a discrete track magnetic recording medium described later and a concave portion corresponding to a magnetic portion is formed.
- the 1st mold 7 which made the pattern 7A face the 1st ultraviolet curable resin layer 5 on both surfaces of the workpiece
- work 6 is arranged up and down. This is placed on the stage 8 and the workpiece 6 and the first mold 7 are pressure-bonded (hereinafter referred to as a second step).
- the crimping method and conditions are selected as necessary.
- the stage 8 is not particularly limited in terms of material and shape as long as it can stably hold the workpiece 6 and the first mold 7.
- the stage 8 includes a stage having a gripping jig 9 for chucking the mold 7 as shown in FIG. 4, and center holes 6a and 7a provided in the workpiece 6 and the first mold 7 as shown in FIG.
- the first mold 7 it is preferable to use a material that transmits 20% or more of ultraviolet light irradiated during UV nanoimprint.
- a material that transmits 20% or more of ultraviolet light irradiated during UV nanoimprint For example, quartz, glass, cycloolefin polymer (trade name such as ZEONOR manufactured by Nippon Zeon Co., Ltd.), cycloolefin copolymer (trade name manufactured by Mitsui Chemicals, trade name such as TOPAS manufactured by Polyplastics), polyethylene terephthalate, and poly (4-methyl- A mold formed of a material such as pentene-1) or polycarbonate can be used.
- these materials can be used alone for forming a mold, a plurality of these materials can be mixed, or two or more of them can be laminated to be used.
- the preferred thickness of the first mold 7 is 10 to 1000 ⁇ m, more preferably 25 to 500 ⁇ m.
- the first mold 7 may be obtained by forming a second ultraviolet curable resin layer on a resin sheet and forming the pattern 7A on the surface of the second ultraviolet curable resin layer. It can.
- a second mold having a pattern opposite to the pattern 7A is subjected to pressure bonding so that the reverse pattern is in contact with the surface of the second ultraviolet curable resin layer, thereby transferring the pattern.
- the pattern 7A can be used as the pattern 7A.
- the reverse pattern means that the unevenness is opposite. Therefore, it means that it corresponds to the shape of the pattern 7A, that is, the relationship between the mold having the same shape and exactly matching when the opposite pattern and the pattern 7A are overlapped.
- the pattern of the mold can be selected according to need.
- the width of the convex and concave portions of the pattern is preferably 20 to 200 nm, and more preferably 30 to 150 nm.
- the uneven height difference is more preferably 40 to 150 nm, and more preferably 60 to 100 nm.
- cycloolefin polymer examples include cycloolefin polymer, cycloolefin copolymer, polyethylene terephthalate, poly (4-methyl-pentene-1), and polycarbonate because it easily follows the undulation of the surface of the workpiece 6 and has high mold pattern accuracy.
- a second ultraviolet curable resin is applied onto a resin sheet, and a mother stamper (second mold) is pressure-bonded by the UV nanoimprint method, and the pattern is transferred to the resin. It is preferable to use as the mold 7.
- the mother stamper pattern has a pattern in which the unevenness is opposite to the pattern 7A of the first mold 7.
- the thickness of the resin sheet can be selected as necessary, but it is preferably 10 ⁇ m or more and 1 mm or less from the viewpoint of handling and followability to the surface of the workpiece 6.
- the thickness of the second ultraviolet curable resin can also be selected as necessary, but it is preferably 1 ⁇ m or more and 100 ⁇ m or less from the viewpoint of accuracy when transferring the mother stamper pattern.
- the second ultraviolet curable resin the same one as the first ultraviolet curable resin 5 described above can be used.
- the solid or the viscosity at room temperature is 100,000 mPa ⁇ s or more, preferably 500,000 mPa ⁇ s.
- the second ultraviolet curable resin it is preferable for the second ultraviolet curable resin to contain the above resin in a mass ratio of 50% or more, preferably 70 to 100%.
- the viscosity of the liquid resin can be measured using, for example, a rotational viscometer.
- the member for pressing the workpiece 6 and the first mold 7 together there is no particular limitation on the member for pressing the workpiece 6 and the first mold 7 together.
- a method of pressing by hand a method of placing a weight 12 as shown in FIG. 7, a method of providing a groove 13 for blowing compressed air on the stage 8 as shown in FIG.
- a method of pressing with a press device provided with a pressing plate 15 that can move up and down along the guide rail 14 and a method of pressing with a roller 16 as shown in FIG. 10 can be used.
- the pressure when pressing the first mold 7 against the workpiece 6 is the material and shape of the first mold 7, the material and shape of the substrate on the workpiece 6 side, and the type of the first ultraviolet curable resin 5. It depends on the conditions. It is preferable to be greater than 0 Pa and not greater than 50 MPa. More preferably, it is 0.001 to 3 MPa. If no pressure is applied at all, the surface of the workpiece 6 and the first mold 7 are not parallel to each other, and a portion where the first ultraviolet curable resin 5 and the first mold 7 do not come into contact with each other is formed. The workpiece 6 may not be parallel to the substrate surface and may be inclined, and if the pressure is too large, the first mold 7 may be deformed and transfer accuracy may be reduced.
- an ultraviolet light source 17 that irradiates ultraviolet light (UV) is disposed on the stage 8.
- a light diffusing member 18 that diffuses ultraviolet light (UV) is interposed between the ultraviolet light source 17 and the first workpiece 6.
- the ultraviolet light (UV) diffused by the light diffusing member 18 is irradiated to the first ultraviolet curable resin layer 5 through the first mold 7.
- the upper first ultraviolet curable resin layer 5 is cured.
- the workpiece 6 and the first mold 7 are turned upside down while being pressed.
- the first ultraviolet curable resin layer 5 coming to the upper side by the inversion is cured.
- the pattern 7A of the first mold 7 is transferred to the first ultraviolet curable resin layer 5 (hereinafter referred to as a third step).
- the light diffusing member 18 can be selected as necessary.
- a commercially available diffuser plate or fly-eye lens can be used.
- the diffuser is roughly divided into (i) a type in which fine irregularities are formed on the surface of a plate or sheet such as quartz, glass, and resin, and (ii) a matrix of the plate or sheet as described above.
- the thickness of the light diffusing member 18 is preferably 0.5 to 5 mm, and more preferably 1 to 3 mm.
- the size is preferably larger than the workpiece size.
- the transmittance of ultraviolet light is high in the entire wavelength region of 250 nm to 400 nm.
- the light transmittance of the light diffusion member 18 at, for example, 380 nm is preferably 10 to 95%, more preferably 40 to 95%.
- permeability of infrared rays 800 nm or more which is a heat ray is low so that the deformation
- the first mold 7 may have a function of diffusing ultraviolet light (UV).
- UV diffusing ultraviolet light
- any light source capable of curing the first ultraviolet curable resin layer 5 can be used without any particular limitation.
- a light emitting diode type or a continuous pulse emission type it is preferable to use a light emitting diode type or a continuous pulse emission type.
- the former does not emit heat rays simultaneously with ultraviolet light (UV), and the latter emits heat rays only intermittently. For this reason, there exists the characteristic that the workpiece
- the illuminance can be selected as necessary, but is preferably about 50 to 3000 mj / cm 2 , more preferably 100 to 1000 mj / cm 2 .
- the shape of the ultraviolet light source 17 can be selected as necessary.
- a commercially available spot light source or lamp unit may be used.
- a dedicated light source in which a light emitting diode element is arranged in accordance with the shape of the workpiece 6 may be used.
- these ultraviolet light sources 17 may be used alone or in combination. Different types of light sources may be used in combination. However, it is preferable to arrange so that the illuminance of ultraviolet light (UV) received by the workpiece 6 is as uniform as possible.
- the illuminance of ultraviolet light (UV) received by the workpiece 6 can be measured as shown in FIG. 12, for example.
- a sensor unit 19 of an ultraviolet illuminance meter is arranged at a position where the work 6 is arranged at the time of UV nanoimprint. And it can measure with the said sensor by making the ultraviolet light source 17 light. The position of the UV illuminometer can be moved as needed.
- the distance between the workpiece 6 and the ultraviolet light source 17 or between the first mold 7 and the ultraviolet light source 17 is not particularly limited. However, it is preferable to keep an interval of 1 mm or more so that heat generated from the light emitting diode element and the surrounding wiring is not transmitted. When heat is transmitted to the first mold 7 or the workpiece 6, the pattern 7A may be deformed and cannot be transferred with high accuracy.
- the distance from the ultraviolet light source 17 to the light diffusing member 18 can be selected as necessary, but is preferably 5 to 300 mm, more preferably 10 to 100 mm. Further, the distance from the light diffusing member 18 to the first ultraviolet curable resin layer 5 can also be selected as necessary, but when the light diffusing member 18 is provided separately, it is preferably 100 to 500 mm, more preferably 100 to 300 mm. preferable.
- the atmosphere in which ultraviolet irradiation is performed there is no particular limitation on the atmosphere in which ultraviolet irradiation is performed.
- the ultraviolet curable resin 5 applied on the magnetic recording medium 1 is a radical curable resin, it is preferably replaced with an inert gas such as nitrogen.
- it is cationically curable it is preferably replaced with dry air or the like. In such a case, the curing rate can be increased.
- performing ultraviolet irradiation in a vacuum atmosphere (reduced pressure atmosphere) also has an effect of eliminating voids and increasing the curing rate.
- the mold 7 is released from the work 6 to obtain the magnetic recording medium 1 with the pattern coating 5a.
- the pattern coating 5a has a concave portion corresponding to the nonmagnetic portion and a convex portion corresponding to the magnetic portion when a discrete track magnetic recording medium is manufactured.
- the pattern forming method of the present invention which part of the magnetic recording medium 1 has less pattern distortion due to a difference in curing shrinkage, defective mold release, and the like and resistance to various processes. As a result, it is possible to form the pattern film 5a that is uniform, and as a result, it is possible to manufacture a magnetic recording medium with a pattern film that has good yield and good processing accuracy.
- the pattern formation method of this invention is not necessarily limited to the thing of the said embodiment.
- Various modifications can be made without departing from the spirit of the present invention.
- FIG. 3 one work 6 in which the first ultraviolet curable resin layer 5 is formed on both surfaces of the magnetic recording medium 1 on the stage 8, and two works sandwiching the work 6.
- a first mold 7 is disposed.
- FIG. 11 after the first mold 7 is pressure-bonded to the work 6, ultraviolet light is irradiated from the ultraviolet light source 17.
- the UV nanoimprint method of the present invention is not limited to these.
- FIG. 14 an example shown in FIG. 14 is given.
- a workpiece in which the first ultraviolet curable resin layer 5 is formed only on one side of the magnetic recording medium 1 is used.
- UV nanoimprint may be performed by arranging the first mold 7 only on the side where the first ultraviolet curable resin layer 5 is formed.
- the magnetic recording medium 1 in which the pattern film 5a is formed only on one surface of the magnetic recording medium 1 can be obtained. That is, in the present invention, the magnetic recording medium 1 is not limited to the pattern film 5a formed on both surfaces, and the magnetic recording medium 1 may be formed with the pattern film 5a on one surface.
- UV irradiation methods include the examples shown in FIGS.
- the ultraviolet light source 17 and the light diffusing member 18 may be arranged on the side of the work 6, and the work 6 may be irradiated with ultraviolet light (UV) diffused from the lateral direction.
- a stage 8 a that diffuses ultraviolet light (UV) is used, irradiation is performed by an ultraviolet light source 17 disposed below the stage 8 a, and ultraviolet light (UV) diffused from below is applied to the workpiece 6. It may be irradiated.
- FIG. 15 the ultraviolet light source 17 and the light diffusing member 18 may be arranged on the side of the work 6, and the work 6 may be irradiated with ultraviolet light (UV) diffused from the lateral direction.
- UV ultraviolet light
- FIG. 16 a stage 8 a that diffuses ultraviolet light (UV) is used, irradiation is performed by an ultraviolet light source 17 disposed below the stage 8 a, and ultraviolet light (UV) diffused from below is applied to the workpiece 6. It may be
- the ultraviolet light (UV) emitted from the ultraviolet light source 17 is guided to the light irradiation member 18 by the light guide 20, and the ultraviolet light diffused in the work 6 through the light irradiation member 18.
- UV ultraviolet light
- (UV) may be irradiated.
- the third step of irradiating the workpiece 6 with the diffused ultraviolet light (UV) is performed.
- a third step may be performed simultaneously with the second step.
- a weight 12 a such as a quartz plate having minute irregularities on the surface and diffusing ultraviolet light (UV) is placed on the work 6 while being placed on the first mold 7 and the work 6.
- Discrete track type magnetic recording medium manufacturing method Next, an example of a procedure for manufacturing a discrete track magnetic recording medium will be described.
- a magnetic recording medium 25 with a pattern film 24 as shown in FIG. 20 is prepared.
- the magnetic recording medium 25 is coated with an ultraviolet curable resin on the magnetic recording medium 25 in which the magnetic layer 22 and the protective layer 23 are formed on the nonmagnetic substrate 21, and the pattern forming method of the present invention is applied to the coated film.
- a predetermined pattern is transferred by performing UV nanoimprinting using.
- the protective layer 23 and the magnetic layer 22 are partially removed by a method such as dry etching using the pattern film 24 as a mask.
- a method such as dry etching using the pattern film 24 as a mask.
- the pattern film 24 and the protective layer 23 are peeled off by a method such as ashing.
- the recess 22 a formed in the magnetic layer 22 is filled with a nonmagnetic material 26 to flatten the entire surface, and a new protective layer 27 is laminated on the magnetic layer 22.
- a magnetic recording medium 25 in which a magnetic layer and a protective layer are formed on a nonmagnetic substrate is prepared.
- a mask layer of metal or the like is formed thereon, and an ultraviolet curable resin is further applied thereon.
- a pattern coating 24 made of an ultraviolet curable resin is formed using the UV nanoimprinting method of the present invention, and the mask layer is patterned using the formed pattern coating 24 as a mask.
- the magnetic layer 22 may be patterned using the patterned mask layer.
- methods other than the method of separating the track regions by partially removing the magnetic layer 22 may be used.
- an ion beam is applied to a part of the magnetic layer 22 as disclosed in, for example, Japanese Patent Application Laid-Open No. 2007-273067.
- atoms such as silicon, boron, fluorine, phosphorus, tungsten, carbon, indium, germanium, bismuth, krypton, and argon by the method, etc., a region where the magnetic part is amorphized is created, and the track regions are separated. May be.
- the magnetic recording / reproducing apparatus to which the present invention is applied is attached to the discrete magnetic recording medium 28 shown in FIG. 23, the medium driving unit 29 for driving the recording type recording medium 28 in the recording direction, and the head gimbal assembly 30.
- a signal system 33 (recording / reproducing signal processing means).
- the head gimbal assembly 30 includes a suspension arm 41 made of a thin metal plate, a head slider 42 provided on the distal end side of the suspension arm 41, and the magnetic head provided on the head slider 42. 31 and a control member (not shown) conductively connected by a signal line 43.
- the magnetic head 31 is disposed in a portion near the discrete magnetic recording medium 28 on the trading side opposite to the leading side on which the inclined surface of the head slider 42 is formed.
- the magnetic head 31 includes a recording unit and a reproducing unit.
- the magnetic head 31 may be selected as necessary. For example, not only a head having a magnetoresistive (MR) element using a giant magnetoresistive effect (GMR) as a reproducing element, but also a TMR element using a tunnel magnetoresistive effect (TMR) (tunnel-type magnetoresistive effect)
- MR magnetoresistive
- GMR giant magnetoresistive effect
- TMR tunnel magnetoresistive effect
- a head suitable for high recording density can also be used. Further, by using the TMR element, higher density recording can be achieved.
- the magnetic recording / reproducing apparatus configured as described above includes the discrete magnetic recording medium 28 to which the present invention is applied, the flying height of the magnetic head 31 can be reduced, and the stability is high.
- the recording density is high.
- the flying height of the magnetic head 31 is raised to a height of 0.005 ⁇ m to 0.020 ⁇ m, which is lower than the conventional one, the output is improved and a high device SNR is obtained, and a large capacity and high reliability magnetic recording device Can provide.
- this magnetic recording / reproducing apparatus includes a discrete magnetic recording medium 28 provided with a pattern composed of a convex portion made of a magnetic layer and a concave separation region. Therefore, it is difficult to be affected by the adjacent tracks, and it is possible to operate with the reproducing head width and the recording head width being substantially the same width without performing recording widely and performing reproduction narrower than during recording. Therefore, in this magnetic recording / reproducing apparatus, a high reproduction output and a high signal-to-noise ratio (SNR) can be obtained as compared with the case where the reproducing head width is narrower than the recording head width.
- SNR signal-to-noise ratio
- the reproducing part of the magnetic head 31 is composed of a GMR head or a TMR head, so that a sufficient signal intensity can be obtained even at a high recording density, and the magnetic recording / reproducing apparatus having a high recording density. It becomes.
- the recording density can be further improved, for example, a track density of 100 ktrack / inch or more, a linear recording density of 1000 kbit / inch or more, A sufficient SNR can also be obtained when recording / reproducing is performed at a recording density of 100 Gbits per square inch or more.
- a liquid resin for UV nanoimprint (trade name: NIF-A-1 manufactured by Asahi Glass Co., Ltd.) is applied to the easily adhesive surface of the film-like film 50 with a bar coater to form a UV curable resin layer 51 having a thickness of about 10 ⁇ m. 52 was obtained.
- a Ni disc 53 having a central hole 53a having a diameter of 65 mm, a thickness of 0.3 mm, and a hole diameter of 12 mm is prepared, and a mother stamper 55 is prepared on which a pattern 54 is formed as shown in FIG. 27A.
- the pattern 54 is formed on a surface of the disk 53 as a range 53b formed from two concentric circles having an outer diameter of 44 mm and an inner diameter of 18 mm.
- the pattern 54 is a concentric pattern having a convex portion 54a having a width of 120 nm, a concave portion 54b having a width of 80 nm, and a difference in uneven height of 80 nm, as shown in FIG. 27B.
- the synthetic quartz plate 56, the laminated film 52, the mother stamper 55, and the synthetic quartz plate 56 are stacked in this order from above, and this is placed under the ultraviolet irradiation window under the diffusion plate ( Luminit, LLC (USA), trade name: Quartz sol-gel LSD (UVSP)) 58 attached, placed under the diffusion plate 58 of an ultraviolet irradiator (Matsushita Electric Works, trade name: LED-Aicure) 59, illuminance 35 mW / Cm 2 of ultraviolet light was irradiated for 30 seconds.
- Luminit, LLC USA
- UVSP Quartz sol-gel LSD
- the laminated film 52 was separated from the mother stamper 55 to obtain a replica mold 61 having a pattern portion 60 having a shape obtained by inverting the pattern 54 of the mother stamper 55 as shown in FIG.
- a magnetic recording medium 62 is prepared in which a perpendicular recording type magnetic layer and a protective layer are formed on one surface of a disk-shaped glass substrate having a central hole having a diameter of 48 mm, a thickness of 0.6 mm, and a hole diameter of 12 mm.
- the previously prepared ultraviolet curable resin solution A is applied to one surface of the magnetic recording medium 62 by spin coating so as to have a thickness of about 60 nm.
- two pieces of the replica mold 61 produced previously are arranged on the coating film 63 of the ultraviolet curable resin solution A with the pattern portion 60 facing down.
- the synthetic quartz plate (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: VIOSIL) 64 was sandwiched and held so as to be pressurized by its own weight.
- a diffusion plate (Luminit, LLC ( (USA), trade name: Quartz sol-gel LSD (UVSP)) 65 was placed under an ultraviolet irradiator 66, and ultraviolet rays were irradiated for 30 seconds.
- the replica mold 61 was released from the magnetic recording medium 62, and the pattern film formed on the magnetic recording medium 62 was visually confirmed. As a result, defects such as transfer failure and release failure were not confirmed.
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Abstract
Description
また、本発明は、このパターン形成方法を用いたディスクリートトラック式磁気記録媒体の製造方法、並びにこの製造方法により製造された磁気記録媒体を搭載したディスクリートトラック式磁気記録再生装置を提供する。
(1) 基材の上に第一の紫外線硬化性樹脂層を形成する第1の工程と、
第一のモールドの所定のパターンが形成されたパターン形成面を前記第一の紫外線硬化性樹脂層に対向させ、前記基材と第一のモールドとを圧着する第2の工程と、
前記紫外線硬化性樹脂層と紫外光源との間に紫外光を拡散させる部材を介在させて、前記圧着により前記第一のモールドのパターンが転写された第一の紫外線硬化性樹脂層に拡散された紫外光を照射する第3の工程とを有するパターン形成方法。
(2) 前記第3の工程を前記第2の工程と同時に行うことを特徴とする前項(1)に記載のパターン形成方法。
(3) 前記第3の工程を前記第2の工程の後に行うことを特徴とする前項(1)に記載のパターン形成方法。
(4) 厚さが10μm以上1mm以下である樹脂製シートの上に第二の紫外線硬化性樹脂層を形成し、
第一のモールドの所定のパターンとは凹凸が反対のパターンを有する第二のモールドを前記第二の紫外線硬化性樹脂層の表面に前記凹凸が反対のパターンが接するように圧着させることにより、前記凹凸が反対のパターンを第二の紫外線硬化性樹脂層に転写させて、
前記所定のパターンが形成された前記第一のモールドを用意する工程を含むことを特徴とする前項(1)乃至(3)の何れか一項に記載のパターン形成方法。
(5) 前記第一のモールドの紫外光の透過率が20%以上であることを特徴とする前項(1)乃至(4)の何れか一項に記載のパターン形成方法。
(6) 前記基材の上に液状の紫外線硬化性樹脂を塗布することにより、前記第一の紫外線硬化性樹脂層を形成することを特徴とする前項(1)乃至(5)の何れか一項に記載のパターン形成方法。
(7) 前記樹脂製シートの表面に液状の紫外線硬化性樹脂を塗布することにより、前記第二の紫外線硬化性樹脂層を形成することを特徴とする前項(4)乃至(6)の何れか一項に記載のパターン形成方法。
(8) 前記紫外光を拡散させる部材として、拡散板又はフライアイレンズを用いることを特徴とする前項(1)乃至(7)の何れか一項に記載のパターン形成方法。
(9) 前記基材が磁気記録媒体であることを特徴とする前項(1)乃至(8)の何れか一項に記載のパターン形成方法。
(10) 前項(1)乃至(9)の何れか一項に記載のパターン形成方法を用いたディスクリートトラック式磁気記録媒体の製造方法。
(11) 前項(10)に記載の製造方法により製造されたディスクリートトラック式磁気記録媒体を搭載した磁気記録再生装置。
なお上記(2)~(9)は、必須の特徴ではなく、本発明の好ましい例を表わしている。
また、本発明によれば、このようなパターン形成方法を用いたディスクリートトラック式磁気記録媒体の製造方法、並びにこのような製造方法により製造された磁気記録媒体を搭載したディスクリートトラック式磁気記録再生装置を提供することが可能である。
2 非磁性基板
3 磁性層
4 保護層
5 紫外線硬化性樹脂層
5a パターン被膜
6 ワーク
7 第一のモールド
7A パターン
8 ステージ
8a 紫外光拡散ステージ
9 つかみ治具
10 ガイドピン
11 チャック溝
12 オモリ
12a 紫外光拡散オモリ
13 溝
14 ガイドレール
15 押し板
15a 紫外光拡散押し板
16 ローラー
17 紫外光源
18 紫外光拡散部材
19 紫外線照度計センサー部
20 ライトガイド
21 非磁性基板
22 磁性層
23 保護層
24 パターン被膜
25 磁気記録媒体
26 非磁性材料
27 保護層
28 ディスクリートトラック式磁気記録媒体
29 媒体駆動部
30 ヘッドジンバルアセンブリ
31 磁気ヘッド
32 ヘッド駆動部
33 記録再生信号系(記録再生信号処理手段)
41 サスペンションアーム
42 ヘッドスライダ
43 信号線
50 フィルム
51 紫外線硬化性樹脂層
52 積層フィルム
53 円板
54 パターン
55 マザースタンパ
56 合成石英板
57 ステンレス板
58 拡散板
59 紫外線照射機
60 パターン部
61 レプリカモールド
62 磁気記録媒体
63 塗膜
64 合成石英板
65 拡散板
66 紫外線照射機
先ず、本発明を適用したパターン形成方法の一例について説明する。
本発明のパターン形成方法を用いたUVナノインプリントの方法は、例えばパターン被膜付き磁気記録媒体の製造に適用することができる。
面内磁気記録媒体用の磁気記録層としては、例えば、非磁性のCrMo下地層と強磁性のCoCrPtTa磁性層からなる積層構造が利用できる。垂直磁気記録媒体用の磁気記録層としては、例えば、軟磁性のFeCo合金(FeCoB、FeCoSiB、FeCoZr、FeCoZrB、及びFeCoZrBCuなど)、FeTa合金(FeTaN,及びFeTaCなど)、Co合金(CoTaZr,CoZrNB,及びCoBなど)等からなる裏打ち層と、Pt、Pd、NiCr、及びNiFeCrなどの配向制御膜と、必要によりRu等の中間膜、及び70Co-15Cr-15Pt合金や、90(80Co-5Cr-15Pt)/10SiO2合金からなる磁性層を積層した物を利用することができる。
磁気記録層の厚さは必要に応じて選択されるが、一般的には3~20nm、好ましくは5~15nm以下である。磁気記録層は使用する磁性合金の種類と積層構造に合わせて、十分なヘッド出入力が得られるように形成すれば良い。磁性層の膜厚は再生の際に一定以上の出力を得るにはある程度以上の磁性層膜厚が必要であり、一方で記録再生特性を表す諸パラメーターは出力の上昇とともに劣化するのが通例である。このため、最適な膜厚に設定する必要がある。通常、磁気記録層はスパッタ法により薄膜として形成されるが、例えばこの時、磁気記録層に凹凸形状が形成される。
磁気記録層の表面には保護膜層が形成されている。保護膜層としては、炭素(C)、水素化炭素(HxC)、窒素化炭素(CN)、アモルファスカーボン、炭化珪素(SiC)等の炭素質層や、SiO2,ZrO2,Ti3N4など、通常用いられる保護膜層材料を用いる事ができる。また、保護膜が2層以上の層から構成されても良い。
保護膜3の膜厚は必要に応じて選択されるが、好ましくは10nm未満である。保護膜の膜厚が10nmを超えると、ヘッドと磁性層との距離が大きくなり、十分な出入力信号の強さが得られなくなる場合がある。
通常、保護膜層はスパッタ法により形成されるが、この時、前述の凹凸に倣って凹凸を有する保護膜が形成される。また凹部の保護膜の厚さは凸部の保護層の厚さよりも大きくなる傾向がある。
この紫外光源17と第一のワーク6との間には、紫外光(UV)を拡散させる光拡散部材18を介在させる。光拡散部材18により拡散された紫外光(UV)を第一のモールド7を介して第一の紫外線硬化性樹脂層5に照射する。そして、上側の第一の紫外線硬化性樹脂層5を硬化させる。この後、ワーク6と第一のモールド7を圧着させた状態のまま上下を反転させる。そして同様に、拡散された紫外光を照射することにより、反転により上側に来た第一の紫外線硬化性樹脂層5を硬化させる。以上の方法によって、第一のモールド7のパターン7Aを、第一の紫外線硬化性樹脂層5に転写する(以下、第3の工程という。)。
なお、ワーク6が受ける紫外光(UV)の照度は、例えば図12に示すように測定することができる。UVナノインプリント時にワーク6を配置する位置に、ワーク6の代わりに、紫外線照度計のセンサー部19を配置する。そして、紫外光源17を点灯させることにより、前記センサーにて測定することができる。紫外線照度計の位置は必要に応じて移動できる。
また紫外光源17から光拡散部材18の距離も必要に応じて選択できるが、5~300mmが好ましく、10~100mmがより好ましい。また光拡散部材18から第一の紫外線硬化性樹脂層5までの距離も必要に応じて選択できるが、光拡散部材18を別途設ける場合、100~500mmが好ましく、100~300mmであることがより好ましい。
例えば、上記実施形態では、図3に示されるように、ステージ8上に、磁気記録媒体1の両面に第一の紫外線硬化性樹脂層5を形成した1つのワーク6と、それを挟む2つの第一のモールド7と、を配置している。また図11に示すように、これら第一のモールド7をワーク6に圧着させた後、紫外光源17から紫外光を照射している。しかしながら、本発明のUVナノインプリントの方法はこれらのみに限定されるものではない。
次に、ディスクリートトラック式磁気記録媒体を製造する手順の一例について説明する。
ディスクリートトラック式磁気記録媒体を製造する際は、先ず、図20に示すような、パターン被膜24付き磁気記録媒体25を用意する。この磁気記録媒体25には、非磁性基板21の上に磁性層22及び保護層23を形成した磁気記録媒体25上に紫外線硬化性樹脂を塗布し、この塗布膜に、本発明のパターン形成方法を用いたUVナノインプリントを行う事により、所定のパターンが転写されている。
次に、図21に示すように、パターン被膜24をマスクとして、ドライエッチングなどの方法で保護層23及び磁性層22を部分的に除去する。
次に、図22に示すように、アッシングなどの方法で、パターン被膜24及び保護層23を剥離する。
次に、図23に示すように、磁性層22に形成された凹部22aを非磁性材料26で埋め表面全体を平坦にし、磁性層22上に新たな保護層27を積層する。
以上の工程を経ることにより、本発明のディスクリートトラック式磁気記録媒体28を得ることができる。
次に、本発明を適用した磁気記録再生装置(HDD)について説明する。
例えば図24に示す本発明を適用した磁気記録再生装置は、上記図23に示すディスクリート型磁気記録媒体28と、これを記録方向に駆動する媒体駆動部29と、ヘッドジンバルアセンブリ30に取り付けられた磁気ヘッド31と、磁気ヘッド31をディスクリート型磁気記録媒体28に対して相対運動させるヘッド駆動部32と、磁気ヘッド31への信号入力と磁気ヘッド31からの出力信号再生とを行うための記録再生信号系33(記録再生信号処理手段)とを具備したものである。
磁気ヘッド31は、記録部と再生部とからなる。磁気ヘッド31は必要に応じて選択して良い。例えば、再生素子として巨大磁気抵抗効果(GMR;Giant Magneto Resistive)を利用したMR(magnetoresistance)素子などを有するヘッドだけでなく、トンネル磁気抵抗効果(TMR;Tunnel-type Magneto Resistive)を利用したTMR素子などを有する、高記録密度に適したヘッドも用いることができる。また、TMR素子を用いることによって、さらなる高密度記録化が可能となる。
本実施例では、先ず、図26に示すように、ポリエチレンテレフタレートフィルム(東洋紡績製、商品名:コスモシャインA4100、100μm厚)を切り抜いて作製した直径70mm、孔径12mmの中心孔50aを有する円板状フィルム50の易接着面に、UVナノインプリント用液状樹脂(旭硝子製、商品名:NIF-A-1)をバーコーターで塗布して厚み約10μm紫外線硬化性樹脂層51を形成して、積層フィルム52を得た。
次に、オキセタニル基含有シルセスキオキサン樹脂(東亞合成製、商品名:OX-SQ-H)6.5gに光カチオン重合開始剤(サンアプロ製、商品名:CPI-100P)を0.20g、増感剤として9,10-ジブトキシアントラセンを0.10g、及び溶媒としてプロピレングリコールモノメチルエーテルアセテートを93.2g加え、暗室中でミックスローターを用いて60rpmで12時間かけて分散し、紫外線硬化性樹脂溶液Aを調製した。
次に、直径48mm、厚み0.6mm、孔径12mmの中心孔を有する円板状のガラス基板の片面に、垂直記録型磁性層及び保護層を成膜した磁気記録媒体62を用意する。そして、この磁気記録媒体62の片面に、先に調製した紫外線硬化性樹脂溶液Aを厚み約60nmになるようにスピンコートにより塗布する。塗布後に、図31に示すように、この紫外線硬化性樹脂溶液Aの塗膜63の上に、先に作製したレプリカモールド61をパターン部60を下にして対向させて配置したものを、2枚の合成石英板(信越化学工業製、商品名:VIOSIL)64で挟んで保持し、合成石英板の自重で加圧されるようにした。
本比較例では、磁気記録媒体上でのUVナノインプリント工程において上記拡散板65を紫外線照射機66に取り付けず、紫外光を照射した以外は、実施例と同様に行った。その結果、パターン被膜が離型時に磁気記録媒体62から剥がれてレプリカモールド61に付いてしまう欠陥が5箇所確認された。
Claims (14)
- 基材の上に第一の紫外線硬化性樹脂層を形成する第1の工程と、
第一のモールドの所定のパターンが形成されたパターン形成面を前記第一の紫外線硬化性樹脂層に対向させ、前記基材と第一のモールドとを圧着する第2の工程と、
前記紫外線硬化性樹脂層と紫外光源との間に紫外光を拡散させる部材を介在させて、前記圧着により前記第一のモールドのパターンが転写された第一の紫外線硬化性樹脂層に拡散された紫外光を照射する第3の工程とを有するパターン形成方法。 - 前記第3の工程を前記第2の工程と同時に行うことを特徴とする請求項1に記載のパターン形成方法。
- 前記第3の工程を前記第2の工程の後に行うことを特徴とする請求項1に記載のパターン形成方法。
- 厚さが10μm以上1mm以下である樹脂製シートの上に第二の紫外線硬化性樹脂層を形成し、
第一のモールドの所定のパターンとは凹凸が反対のパターンを有する第二のモールドを前記第二の紫外線硬化性樹脂層の表面に前記凹凸が反対のパターンが接するように圧着させることにより、前記凹凸が反対のパターンを第二の紫外線硬化性樹脂層に転写させて、
前記所定のパターンが形成された前記第一のモールドを用意する工程を含むことを特徴とする請求項1に記載のパターン形成方法。 - 前記第一のモールドの紫外光の透過率が20%以上であることを特徴とする請求項1に記載のパターン形成方法。
- 前記基材の上に液状の紫外線硬化性樹脂を塗布することにより、前記第一の紫外線硬化性樹脂層を形成することを特徴とする請求項1に記載のパターン形成方法。
- 前記樹脂製シートの表面に液状の紫外線硬化性樹脂を塗布することにより、前記第二の紫外線硬化性樹脂層を形成することを特徴とする請求項4に記載のパターン形成方法。
- 前記紫外光を拡散させる部材として、拡散板又はフライアイレンズを用いることを特徴とする請求項1に記載のパターン形成方法。
- 前記基材が磁気記録媒体であることを特徴とする請求項1に記載のパターン形成方法。
- 請求項1に記載のパターン形成方法を用いたディスクリートトラック式磁気記録媒体の製造方法。
- 請求項10に記載の製造方法により製造されたディスクリートトラック式磁気記録媒体を搭載した磁気記録再生装置。
- 前記基材が、非磁性基板の少なくとも一つの面に、磁性層及び保護層がこの順で形成された基材であることを特徴とする請求項1に記載のパターン形成方法。
- 前記紫外光を拡散させる部材が、石英、ガラス、及び樹脂から選択される板又はシートであって、かつ(i)表面に微細な凹凸を形成されている、(ii)マトリックス中にマトリックスとは異なる屈折率の微粒子を分散させている、および(iii)表面に光を散乱させることのできる塗膜を形成している、から選択される部材であることを特徴とする請求項1に記載のパターン形成方法。
- 前記紫外光を拡散させる部材が、微細な凹凸を形成したまたは光を散乱させる塗膜を形成した第一のモールド7であることを特徴とする請求項1に記載のパターン形成方法。
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CN2009801170030A CN102027415A (zh) | 2008-05-16 | 2009-05-14 | 图案形成方法 |
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CN105575782A (zh) * | 2016-02-26 | 2016-05-11 | 上海华力微电子有限公司 | 提高紫外光固化均匀性的方法 |
JP2020514094A (ja) * | 2016-12-21 | 2020-05-21 | エヌシーシー ナノ, エルエルシー | 機能材料を基板上に堆積させるための方法 |
KR20200084604A (ko) * | 2019-01-03 | 2020-07-13 | 부산대학교 산학협력단 | 렌즈 표면 나노구조층 및 이의 제조 방법 |
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JP2012109487A (ja) * | 2010-11-19 | 2012-06-07 | Hitachi High-Technologies Corp | 両面インプリント装置 |
KR101272261B1 (ko) * | 2012-08-10 | 2013-06-13 | 유승국 | 시료보관기구의 제조방법 및 시료보관기구 |
CN104424967A (zh) * | 2013-09-10 | 2015-03-18 | 株式会社东芝 | 图案形成方法、磁记录介质的制造方法及微粒子分散液 |
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US20110070462A1 (en) | 2011-03-24 |
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