WO2009072496A1 - Novel tricyclodecane derivative and process for production thereof - Google Patents
Novel tricyclodecane derivative and process for production thereof Download PDFInfo
- Publication number
- WO2009072496A1 WO2009072496A1 PCT/JP2008/071894 JP2008071894W WO2009072496A1 WO 2009072496 A1 WO2009072496 A1 WO 2009072496A1 JP 2008071894 W JP2008071894 W JP 2008071894W WO 2009072496 A1 WO2009072496 A1 WO 2009072496A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- useful
- excimer laser
- optical
- derivative compound
- tricyclodecane derivative
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
- C07C31/13—Monohydroxylic alcohols containing saturated rings
- C07C31/133—Monohydroxylic alcohols containing saturated rings monocyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/24—Halogenated derivatives
- C07C39/367—Halogenated derivatives polycyclic non-condensed, containing only six-membered aromatic rings as cyclic parts, e.g. halogenated poly-hydroxyphenylalkanes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
- C07C43/04—Saturated ethers
- C07C43/12—Saturated ethers containing halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
- C07C59/40—Unsaturated compounds
- C07C59/58—Unsaturated compounds containing ether groups, groups, groups, or groups
- C07C59/64—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings
- C07C59/66—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings
- C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
- C07C69/675—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids of saturated hydroxy-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/56—Ring systems containing bridged rings
- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/60—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members
- C07C2603/66—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
- C07C2603/68—Dicyclopentadienes; Hydrogenated dicyclopentadienes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Abstract
Disclosed are the following items (1) to (3). (1) A novel tricyclodecane derivative compound which is useful as a modifier for a photoresist resin used in the field of photolithography, a dry etching resistance improver or an agricultural or pharmaceutical intermediate, or which is useful for use in various industrial products; and a process for producing the tricyclodecane derivative compound. (2) A tricyclodecane derivative compound which is useful for use in a crosslinked resin, an optical material for an optical fiber, an optical waveguide, an optical disk substrate, a photoresist or the like, a raw material for the optical material, a pharmaceutical or agricultural intermediate, or which is useful for use in various industrial products. (3) A functional resin having excellent alkali developing properties and excellent adhesion to a substrate, which can be used as a chemically amplified resist responsive to far ultraviolet ray exemplified by a KrF excimer laser, an ArF excimer laser, an F2 excimer laser or an EUV, and which can achieve the improvement in resolution or line edge roughness without deteriorating the basic physical properties required for a resist, such as pattern forming properties, dry-etching resistance and heat resistance; a functional resin composition; and a raw material compound for the functional resin composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009544678A JP5504892B2 (en) | 2007-12-05 | 2008-12-02 | Novel tricyclodecane derivative and process for producing the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007314688 | 2007-12-05 | ||
JP2007-314688 | 2007-12-05 | ||
JP2007316352 | 2007-12-06 | ||
JP2007-316352 | 2007-12-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009072496A1 true WO2009072496A1 (en) | 2009-06-11 |
Family
ID=40717674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/071894 WO2009072496A1 (en) | 2007-12-05 | 2008-12-02 | Novel tricyclodecane derivative and process for production thereof |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5504892B2 (en) |
TW (1) | TW200940493A (en) |
WO (1) | WO2009072496A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016106083A (en) * | 2010-07-30 | 2016-06-16 | 三菱瓦斯化学株式会社 | Compound, radiation-sensitive composition, and resist pattern forming method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006028071A1 (en) * | 2004-09-10 | 2006-03-16 | Mitsubishi Rayon Co., Ltd. | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon |
JP2006113140A (en) * | 2004-10-12 | 2006-04-27 | Tokyo Ohka Kogyo Co Ltd | Positive resist composition for immersion exposure and resist pattern forming method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58121207A (en) * | 1982-01-14 | 1983-07-19 | Kao Corp | Ester or ether compound of tricyclic type methylol and perfume or flavor composition containing it |
JP2776273B2 (en) * | 1994-01-31 | 1998-07-16 | 日本電気株式会社 | Monomer having vinyl group |
JP3736817B2 (en) * | 1996-07-12 | 2006-01-18 | 日本化薬株式会社 | Polyfunctional vinyl ether, polymerizable composition and cured product thereof |
JP2002371115A (en) * | 2001-06-15 | 2002-12-26 | Toagosei Co Ltd | Active energy ray-curable resin sheet-forming agent |
JP3783670B2 (en) * | 2002-09-09 | 2006-06-07 | 日本電気株式会社 | Negative photoresist composition and pattern forming method |
JP5396738B2 (en) * | 2007-05-09 | 2014-01-22 | 三菱瓦斯化学株式会社 | Radiation-sensitive composition, compound, method for producing compound, and method for forming resist pattern |
-
2008
- 2008-12-02 WO PCT/JP2008/071894 patent/WO2009072496A1/en active Application Filing
- 2008-12-02 JP JP2009544678A patent/JP5504892B2/en active Active
- 2008-12-05 TW TW097147254A patent/TW200940493A/en unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006028071A1 (en) * | 2004-09-10 | 2006-03-16 | Mitsubishi Rayon Co., Ltd. | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon |
JP2006113140A (en) * | 2004-10-12 | 2006-04-27 | Tokyo Ohka Kogyo Co Ltd | Positive resist composition for immersion exposure and resist pattern forming method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016106083A (en) * | 2010-07-30 | 2016-06-16 | 三菱瓦斯化学株式会社 | Compound, radiation-sensitive composition, and resist pattern forming method |
Also Published As
Publication number | Publication date |
---|---|
TW200940493A (en) | 2009-10-01 |
JP5504892B2 (en) | 2014-05-28 |
JPWO2009072496A1 (en) | 2011-04-21 |
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