WO2009034770A1 - 密着露光の方法及びその装置 - Google Patents

密着露光の方法及びその装置 Download PDF

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Publication number
WO2009034770A1
WO2009034770A1 PCT/JP2008/062385 JP2008062385W WO2009034770A1 WO 2009034770 A1 WO2009034770 A1 WO 2009034770A1 JP 2008062385 W JP2008062385 W JP 2008062385W WO 2009034770 A1 WO2009034770 A1 WO 2009034770A1
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WO
WIPO (PCT)
Prior art keywords
mask
contact
work
close contact
exposure method
Prior art date
Application number
PCT/JP2008/062385
Other languages
English (en)
French (fr)
Inventor
Shigeru Harada
Original Assignee
Hitachi Via Mechanics, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Via Mechanics, Ltd. filed Critical Hitachi Via Mechanics, Ltd.
Publication of WO2009034770A1 publication Critical patent/WO2009034770A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　密着誤差を最小限に抑制しつつ、密着面略中心の真空引きを効果的に行い密着不良を防止した、真空密着露光方法を提供すること。 ワーク（１２０）を載置したテーブル（１４０）の端縁部に装備されたパッキン（１３０）により、パッキン（１３０）をテーブル（１４０）に配設したマスク（１１０）に密着させる工程、初期設定圧力値まで真空引きを行い、マスク（１１０）を凸状にたわませてマスク（１１０）の略中心からワーク（１２０）に密着させる工程、更に真空引きを行うと共にマスク（１１０）の端縁部を保持するマスクホルダー（１７０）を上昇させ、マスク（１１０）のたわみを増大させつつマスク（１１０）の端縁部に向かって更にワーク（１２０）に密着させる工程、及びマスク（１１０）がワーク（１２０） の略端縁部まで密着したことに応じて、マスクホルダー（１７０）の上昇を停止させる工程を含む真空密着方法による。
PCT/JP2008/062385 2007-09-12 2008-07-09 密着露光の方法及びその装置 WO2009034770A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-236421 2007-09-12
JP2007236421A JP4651648B2 (ja) 2007-09-12 2007-09-12 密着露光の方法及びその装置

Publications (1)

Publication Number Publication Date
WO2009034770A1 true WO2009034770A1 (ja) 2009-03-19

Family

ID=40451782

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062385 WO2009034770A1 (ja) 2007-09-12 2008-07-09 密着露光の方法及びその装置

Country Status (2)

Country Link
JP (1) JP4651648B2 (ja)
WO (1) WO2009034770A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016218117A (ja) * 2015-05-15 2016-12-22 株式会社ブイ・テクノロジー 密着露光装置における密着方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101451094B1 (ko) * 2013-10-04 2014-10-15 주식회사 옵티레이 밀착형 노광 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000235266A (ja) * 1998-12-18 2000-08-29 Nsk Ltd 密着露光装置における密着方法
JP2004133302A (ja) * 2002-10-11 2004-04-30 Toshiba Corp フォトマスク密着方法およびその装置
JP2006258929A (ja) * 2005-03-15 2006-09-28 Nsk Ltd 露光装置のマスク密着方法
JP2007171621A (ja) * 2005-12-22 2007-07-05 Adtec Engineeng Co Ltd 密着型露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123229A (ja) * 1982-12-28 1984-07-17 Yamagata Nippon Denki Kk 半導体装置の製造方法
JPH07219234A (ja) * 1994-01-27 1995-08-18 Ono Sokki Co Ltd 露光機の密着装置
JP4420507B2 (ja) * 2000-01-24 2010-02-24 株式会社オーク製作所 基板露光方法および装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000235266A (ja) * 1998-12-18 2000-08-29 Nsk Ltd 密着露光装置における密着方法
JP2004133302A (ja) * 2002-10-11 2004-04-30 Toshiba Corp フォトマスク密着方法およびその装置
JP2006258929A (ja) * 2005-03-15 2006-09-28 Nsk Ltd 露光装置のマスク密着方法
JP2007171621A (ja) * 2005-12-22 2007-07-05 Adtec Engineeng Co Ltd 密着型露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016218117A (ja) * 2015-05-15 2016-12-22 株式会社ブイ・テクノロジー 密着露光装置における密着方法

Also Published As

Publication number Publication date
JP4651648B2 (ja) 2011-03-16
JP2009069362A (ja) 2009-04-02

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