WO2008146874A1 - Active energy ray-curable composition and optical material - Google Patents

Active energy ray-curable composition and optical material Download PDF

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Publication number
WO2008146874A1
WO2008146874A1 PCT/JP2008/059886 JP2008059886W WO2008146874A1 WO 2008146874 A1 WO2008146874 A1 WO 2008146874A1 JP 2008059886 W JP2008059886 W JP 2008059886W WO 2008146874 A1 WO2008146874 A1 WO 2008146874A1
Authority
WO
WIPO (PCT)
Prior art keywords
independently represent
active energy
energy ray
curable composition
methyl group
Prior art date
Application number
PCT/JP2008/059886
Other languages
French (fr)
Japanese (ja)
Inventor
Yasuyuki Sanai
Original Assignee
Toagosei Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toagosei Co., Ltd. filed Critical Toagosei Co., Ltd.
Priority to JP2009516352A priority Critical patent/JP5212368B2/en
Publication of WO2008146874A1 publication Critical patent/WO2008146874A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Disclosed is an active energy ray-curable composition having excellent workability at room temperature, which enables to obtain a cured product having excellent heat resistance in addition to high refractive index and high light transmittance. Also disclosed is an optical material obtained by using such a composition. Specifically disclosed is an active energy ray-curable composition which is characterized by containing a di(meth)acrylate (A) represented by the formula (1) below and an ethylenically unsaturated compound (B) other then the component (A). (In the formula (1), R1and R3 independently represent a hydrogen atom or a methyl group; R2 and R4 independently represent an alkylene group; R5 represents a hydrogen atom or a methyl group; R6 represents a hydrogen atom, a halogen atom or a methyl group; R7 and R8 independently represent a halogen atom or a methyl group; m1 and m2 independently represent an integer of 0-4; and m3 and m4 independently represent an integer of 0-2.)
PCT/JP2008/059886 2007-05-30 2008-05-29 Active energy ray-curable composition and optical material WO2008146874A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009516352A JP5212368B2 (en) 2007-05-30 2008-05-29 Active energy ray-curable composition and optical material

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-143220 2007-05-30
JP2007143220 2007-05-30

Publications (1)

Publication Number Publication Date
WO2008146874A1 true WO2008146874A1 (en) 2008-12-04

Family

ID=40075107

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059886 WO2008146874A1 (en) 2007-05-30 2008-05-29 Active energy ray-curable composition and optical material

Country Status (3)

Country Link
JP (1) JP5212368B2 (en)
TW (1) TW200906869A (en)
WO (1) WO2008146874A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5182288B2 (en) * 2007-05-30 2013-04-17 東亞合成株式会社 Active energy ray-curable composition, coating composition, coating member and optical material
EP2684900A1 (en) * 2011-03-08 2014-01-15 DIC Corporation Radically curable compound, cured product of same, and method for producing same
JPWO2018016614A1 (en) * 2016-07-21 2019-05-09 三菱瓦斯化学株式会社 Compound, resin, composition and pattern forming method

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS595240A (en) * 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト Radiation polymerizable mixture
JPH04253716A (en) * 1991-02-05 1992-09-09 Dainippon Ink & Chem Inc New actinic radiation-curable resin composition
JPH04255703A (en) * 1990-08-31 1992-09-10 Hoechst Celanese Corp Acrylate ester of 1,1,1-trishydroxyphenylethane
JPH08134145A (en) * 1994-11-07 1996-05-28 Nippon Kayaku Co Ltd Resin composition, composition for lens and its cured product
JP2001122828A (en) * 1999-10-27 2001-05-08 Shinnakamura Kagaku Kogyo Kk Bifunctional (meth)acrylic ester composition and dihydric alcohol therefor
JP2001125474A (en) * 1999-10-27 2001-05-11 Nippon Paint Co Ltd Photosensitive composition for recording volume hologram and hologram obtainable therefrom
JP2002280075A (en) * 2001-03-13 2002-09-27 Korea Res Inst Of Chem Technol Polyalkylene oxide-based solid polymer electrolytic composition
JP2003171420A (en) * 2001-12-06 2003-06-20 Fuji Photo Film Co Ltd Photopolymerizable composition
JP2006208780A (en) * 2005-01-28 2006-08-10 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
WO2006083869A2 (en) * 2005-01-31 2006-08-10 Ception Therapeutics, Inc. Tumor necrosis factor inhibitors
WO2006132139A1 (en) * 2005-06-06 2006-12-14 Mitsubishi Gas Chemical Company, Inc. Compound for resist and resist composition
JP2007086342A (en) * 2005-09-21 2007-04-05 Fujifilm Corp Photosensitive lithographic printing plate
JP2007163577A (en) * 2005-12-09 2007-06-28 Canon Inc Electrophotographic photoreceptor, process cartridge, and electrophotographic apparatus

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS595240A (en) * 1982-06-21 1984-01-12 ヘキスト・アクチエンゲゼルシヤフト Radiation polymerizable mixture
JPH04255703A (en) * 1990-08-31 1992-09-10 Hoechst Celanese Corp Acrylate ester of 1,1,1-trishydroxyphenylethane
JPH04253716A (en) * 1991-02-05 1992-09-09 Dainippon Ink & Chem Inc New actinic radiation-curable resin composition
JPH08134145A (en) * 1994-11-07 1996-05-28 Nippon Kayaku Co Ltd Resin composition, composition for lens and its cured product
JP2001122828A (en) * 1999-10-27 2001-05-08 Shinnakamura Kagaku Kogyo Kk Bifunctional (meth)acrylic ester composition and dihydric alcohol therefor
JP2001125474A (en) * 1999-10-27 2001-05-11 Nippon Paint Co Ltd Photosensitive composition for recording volume hologram and hologram obtainable therefrom
JP2002280075A (en) * 2001-03-13 2002-09-27 Korea Res Inst Of Chem Technol Polyalkylene oxide-based solid polymer electrolytic composition
JP2003171420A (en) * 2001-12-06 2003-06-20 Fuji Photo Film Co Ltd Photopolymerizable composition
JP2006208780A (en) * 2005-01-28 2006-08-10 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
WO2006083869A2 (en) * 2005-01-31 2006-08-10 Ception Therapeutics, Inc. Tumor necrosis factor inhibitors
WO2006132139A1 (en) * 2005-06-06 2006-12-14 Mitsubishi Gas Chemical Company, Inc. Compound for resist and resist composition
JP2007086342A (en) * 2005-09-21 2007-04-05 Fujifilm Corp Photosensitive lithographic printing plate
JP2007163577A (en) * 2005-12-09 2007-06-28 Canon Inc Electrophotographic photoreceptor, process cartridge, and electrophotographic apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5182288B2 (en) * 2007-05-30 2013-04-17 東亞合成株式会社 Active energy ray-curable composition, coating composition, coating member and optical material
EP2684900A1 (en) * 2011-03-08 2014-01-15 DIC Corporation Radically curable compound, cured product of same, and method for producing same
KR20140031177A (en) * 2011-03-08 2014-03-12 디아이씨 가부시끼가이샤 Radically curable compound, cured product of same, and method for producing same
EP2684900A4 (en) * 2011-03-08 2014-08-13 Dainippon Ink & Chemicals Radically curable compound, cured product of same, and method for producing same
KR101865634B1 (en) * 2011-03-08 2018-06-08 디아이씨 가부시끼가이샤 Radically curable compound, cured product of same, and method for producing same
JPWO2018016614A1 (en) * 2016-07-21 2019-05-09 三菱瓦斯化学株式会社 Compound, resin, composition and pattern forming method
JP7194355B2 (en) 2016-07-21 2022-12-22 三菱瓦斯化学株式会社 Compound, resin, composition and pattern forming method

Also Published As

Publication number Publication date
JP5212368B2 (en) 2013-06-19
JPWO2008146874A1 (en) 2010-08-19
TW200906869A (en) 2009-02-16

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