WO2008139809A1 - 質量分析ユニット - Google Patents
質量分析ユニット Download PDFInfo
- Publication number
- WO2008139809A1 WO2008139809A1 PCT/JP2008/057249 JP2008057249W WO2008139809A1 WO 2008139809 A1 WO2008139809 A1 WO 2008139809A1 JP 2008057249 W JP2008057249 W JP 2008057249W WO 2008139809 A1 WO2008139809 A1 WO 2008139809A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mass spectrometry
- mass
- charge ratio
- spectrometry unit
- current value
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/30—Vacuum gauges by making use of ionisation effects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
- G01N27/622—Ion mobility spectrometry
- G01N27/623—Ion mobility spectrometry combined with mass spectrometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
- H01J41/10—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas of particle spectrometer type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/0027—Methods for using particle spectrometers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/34—Dynamic spectrometers
- H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Molecular Biology (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/599,301 US8138473B2 (en) | 2007-05-15 | 2008-04-14 | Mass spectrometry unit |
CN200880015797A CN101680856A (zh) | 2007-05-15 | 2008-04-14 | 质谱分析单元 |
KR1020097024728A KR101141782B1 (ko) | 2007-05-15 | 2008-04-14 | 질량 분석 유닛 |
DE112008001297.0T DE112008001297B4 (de) | 2007-05-15 | 2008-04-14 | Massenspektrometrieeinheit |
JP2009514039A JP5016031B2 (ja) | 2007-05-15 | 2008-04-14 | 質量分析ユニット |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-129408 | 2007-05-15 | ||
JP2007129408 | 2007-05-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008139809A1 true WO2008139809A1 (ja) | 2008-11-20 |
Family
ID=40002030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/057249 WO2008139809A1 (ja) | 2007-05-15 | 2008-04-14 | 質量分析ユニット |
Country Status (7)
Country | Link |
---|---|
US (1) | US8138473B2 (ja) |
JP (1) | JP5016031B2 (ja) |
KR (1) | KR101141782B1 (ja) |
CN (1) | CN101680856A (ja) |
DE (1) | DE112008001297B4 (ja) |
TW (1) | TWI425208B (ja) |
WO (1) | WO2008139809A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011242172A (ja) * | 2010-05-14 | 2011-12-01 | Ulvac Japan Ltd | 酸素検出計、酸素検出機能付き電離真空計及び質量分析計 |
JP2014224775A (ja) * | 2013-05-16 | 2014-12-04 | 独立行政法人産業技術総合研究所 | 粒子分析法および粒子分析装置 |
DE112011100568B4 (de) * | 2010-02-17 | 2017-01-19 | Ulvac, Inc. | Vierpol-Massenspektrometer |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8020457B2 (en) * | 2008-08-08 | 2011-09-20 | Babcock & Wilcox Power Generation Group, Inc. | Apparatus for use in sample monitoring |
CN102339722A (zh) * | 2011-10-14 | 2012-02-01 | 安徽皖仪科技股份有限公司 | 一种离子源灯丝 |
CN103048377B (zh) * | 2011-10-17 | 2015-06-10 | 中国科学院化学研究所 | 极紫外(euv)光刻胶超高真空热处理检测装置与方法 |
PL2789007T3 (pl) * | 2011-12-05 | 2019-04-30 | Smiths Detection Montreal Inc | Układy, urządzenia i sposoby do analizy próbki z wykorzystaniem spektrometrii mas |
US8987664B2 (en) * | 2013-02-07 | 2015-03-24 | Shimadzu Corporation | Mass spectrometry device |
TW201520526A (zh) * | 2013-09-30 | 2015-06-01 | Mks Instr Inc | 冷陰極離子化真空計 |
JP2017107816A (ja) * | 2015-12-11 | 2017-06-15 | 株式会社堀場エステック | 熱電子放出用フィラメント、四重極質量分析計、及び残留ガス分析方法 |
JP6973640B2 (ja) * | 2018-05-30 | 2021-12-01 | 株式会社島津製作所 | イメージング質量分析データ処理装置 |
CN110376272B (zh) * | 2019-06-12 | 2022-02-08 | 中国科学院微电子研究所 | 气体分压的在线测量装置及其在线测量方法 |
JP7314000B2 (ja) * | 2019-09-19 | 2023-07-25 | キヤノンアネルバ株式会社 | 電子発生装置および電離真空計 |
Citations (7)
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JPH0485565U (ja) * | 1990-11-30 | 1992-07-24 | ||
JPH09324269A (ja) * | 1997-02-06 | 1997-12-16 | Fujitsu Ltd | 真空処理方法 |
JPH1154083A (ja) * | 1997-07-31 | 1999-02-26 | Shimadzu Corp | イオン化装置 |
JP2002042721A (ja) * | 2000-07-19 | 2002-02-08 | Anelva Corp | イオン付着質量分析装置 |
JP2003329647A (ja) * | 2002-05-13 | 2003-11-19 | Hitachi Ltd | 爆発物検知システム |
JP2004028675A (ja) * | 2002-06-24 | 2004-01-29 | Hitachi Ltd | 危険物検知システム |
JP2006267129A (ja) * | 2006-06-26 | 2006-10-05 | Hitachi Ltd | 分析装置 |
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DE1498845A1 (de) * | 1962-01-31 | 1969-05-14 | Leybold Heraeus Gmbh & Co Kg | Ionisierungsvorrichtung fuer in grossen Totaldruckbereichen verwendbare Massenspektrometer |
JPS49127687A (ja) | 1973-04-09 | 1974-12-06 | ||
JPH01154083A (ja) | 1987-12-11 | 1989-06-16 | Canon Inc | 触知情報処理装置 |
JP2675064B2 (ja) | 1988-05-09 | 1997-11-12 | 日本電子株式会社 | 質量分析装置用イオン源 |
JPH03261061A (ja) | 1990-03-09 | 1991-11-20 | Shimadzu Corp | ガスクロマトグラフ質量分析計 |
JP2943226B2 (ja) | 1990-03-29 | 1999-08-30 | 株式会社島津製作所 | ガスクロマトグラフ質量分析計のイオン源 |
JPH0485565A (ja) | 1990-07-30 | 1992-03-18 | Ricoh Co Ltd | 画像形成方法 |
JPH05109860A (ja) | 1991-10-21 | 1993-04-30 | Hitachi Ltd | 反応ガス種のモニタの可能な半導体製造装置 |
JP3324135B2 (ja) | 1992-03-24 | 2002-09-17 | 株式会社日立製作所 | モニタリング装置 |
JPH07151816A (ja) | 1993-11-29 | 1995-06-16 | Ulvac Japan Ltd | フィラメント劣化状態測定方法及びフィラメント交換時期指示方法 |
GB9409953D0 (en) * | 1994-05-17 | 1994-07-06 | Fisons Plc | Mass spectrometer and electron impact ion source therefor |
JP3355869B2 (ja) | 1995-04-28 | 2002-12-09 | 日新電機株式会社 | イオン源制御装置 |
JPH08321277A (ja) | 1995-05-25 | 1996-12-03 | Hitachi Ltd | 質量分析計のキャリブレーションガス導入装置 |
JPH0922681A (ja) | 1995-07-07 | 1997-01-21 | Yokogawa Analytical Syst Kk | 四重極質量分析計 |
GB9518258D0 (en) | 1995-09-07 | 1995-11-08 | Micromass Ltd | Charged-Particle detectors and mass spectrometers employing the same |
JP3734913B2 (ja) | 1997-01-27 | 2006-01-11 | 株式会社アルバック | 電離真空計制御装置 |
JP3378781B2 (ja) * | 1997-09-03 | 2003-02-17 | 三洋電機株式会社 | 空気調和機 |
DE19826583A1 (de) * | 1998-06-15 | 2000-01-27 | Siemens Ag | Verfahren zur Messung von gasförmigen chemischen Bestandteilen in einem Prozessreaktor zum Behandeln von elektrischen Bauelementen, insbesondere Wafern |
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JP2000036283A (ja) | 1998-07-17 | 2000-02-02 | Shimadzu Corp | 質量分析装置 |
JP3450722B2 (ja) | 1998-10-27 | 2003-09-29 | キヤノン株式会社 | 電子機器及びその電力消費削減方法、記録装置及びその電力消費削減方法 |
JP3768360B2 (ja) | 1999-02-03 | 2006-04-19 | 株式会社アルバック | イオン源及びそのイオン源を用いた質量分析計 |
JP3677410B2 (ja) * | 1999-04-30 | 2005-08-03 | 株式会社日立製作所 | 液体クロマトグラフ質量分析装置 |
JP2001015060A (ja) | 1999-06-29 | 2001-01-19 | Japan Atom Energy Res Inst | 四極子質量分析計または熱陰極電離真空計の測定子用熱電子放出電流制御回路 |
JP4054493B2 (ja) * | 1999-09-20 | 2008-02-27 | 株式会社日立製作所 | イオン源 |
US6777686B2 (en) * | 2000-05-17 | 2004-08-17 | Varian Semiconductor Equipment Associates, Inc. | Control system for indirectly heated cathode ion source |
JP2002033075A (ja) | 2000-07-18 | 2002-01-31 | Shimadzu Corp | 質量分析装置 |
JP2002174607A (ja) * | 2000-12-07 | 2002-06-21 | Fuji Electric Co Ltd | 電気電子機器の保守装置および保守方法 |
US7355171B2 (en) * | 2002-01-29 | 2008-04-08 | Tokyo Electron Limited | Method and apparatus for process monitoring and control |
JP4057896B2 (ja) | 2002-11-26 | 2008-03-05 | 株式会社アルバック | 異常対応型ヘリウムリークディテクタ |
JP4199050B2 (ja) | 2003-05-22 | 2008-12-17 | 株式会社アルバック | 四重極型質量分析計とそれを有する真空装置 |
US20060075968A1 (en) * | 2004-10-12 | 2006-04-13 | Applied Materials, Inc. | Leak detector and process gas monitor |
JP2006266854A (ja) * | 2005-03-23 | 2006-10-05 | Shinku Jikkenshitsu:Kk | 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置 |
JP2006329662A (ja) * | 2005-05-23 | 2006-12-07 | Ulvac Japan Ltd | 質量分析装置およびその使用方法 |
JP2006352963A (ja) | 2005-06-14 | 2006-12-28 | Sharp Corp | 電源供給システム、及び該電源供給システムを備えた電気機器 |
JP2007129408A (ja) | 2005-11-02 | 2007-05-24 | Ishida Co Ltd | ノイズ除去装置、重量測定装置、ノイズ除去方法、及びディジタルフィルタの設計方法 |
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-
2008
- 2008-04-14 DE DE112008001297.0T patent/DE112008001297B4/de active Active
- 2008-04-14 JP JP2009514039A patent/JP5016031B2/ja active Active
- 2008-04-14 CN CN200880015797A patent/CN101680856A/zh active Pending
- 2008-04-14 US US12/599,301 patent/US8138473B2/en active Active
- 2008-04-14 WO PCT/JP2008/057249 patent/WO2008139809A1/ja active Application Filing
- 2008-04-14 KR KR1020097024728A patent/KR101141782B1/ko active IP Right Grant
- 2008-04-15 TW TW097113648A patent/TWI425208B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0485565U (ja) * | 1990-11-30 | 1992-07-24 | ||
JPH09324269A (ja) * | 1997-02-06 | 1997-12-16 | Fujitsu Ltd | 真空処理方法 |
JPH1154083A (ja) * | 1997-07-31 | 1999-02-26 | Shimadzu Corp | イオン化装置 |
JP2002042721A (ja) * | 2000-07-19 | 2002-02-08 | Anelva Corp | イオン付着質量分析装置 |
JP2003329647A (ja) * | 2002-05-13 | 2003-11-19 | Hitachi Ltd | 爆発物検知システム |
JP2004028675A (ja) * | 2002-06-24 | 2004-01-29 | Hitachi Ltd | 危険物検知システム |
JP2006267129A (ja) * | 2006-06-26 | 2006-10-05 | Hitachi Ltd | 分析装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112011100568B4 (de) * | 2010-02-17 | 2017-01-19 | Ulvac, Inc. | Vierpol-Massenspektrometer |
JP2011242172A (ja) * | 2010-05-14 | 2011-12-01 | Ulvac Japan Ltd | 酸素検出計、酸素検出機能付き電離真空計及び質量分析計 |
JP2014224775A (ja) * | 2013-05-16 | 2014-12-04 | 独立行政法人産業技術総合研究所 | 粒子分析法および粒子分析装置 |
Also Published As
Publication number | Publication date |
---|---|
CN101680856A (zh) | 2010-03-24 |
JPWO2008139809A1 (ja) | 2010-07-29 |
KR101141782B1 (ko) | 2012-05-03 |
US8138473B2 (en) | 2012-03-20 |
JP5016031B2 (ja) | 2012-09-05 |
US20100213363A1 (en) | 2010-08-26 |
TW200912301A (en) | 2009-03-16 |
DE112008001297B4 (de) | 2016-06-09 |
TWI425208B (zh) | 2014-02-01 |
KR20100007930A (ko) | 2010-01-22 |
DE112008001297T5 (de) | 2010-04-08 |
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