WO2008136317A1 - 熱線遮蔽塩化ビニルフィルム製造用組成物およびその製造方法、並びに、熱線遮蔽塩化ビニルフィルム - Google Patents

熱線遮蔽塩化ビニルフィルム製造用組成物およびその製造方法、並びに、熱線遮蔽塩化ビニルフィルム Download PDF

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Publication number
WO2008136317A1
WO2008136317A1 PCT/JP2008/057802 JP2008057802W WO2008136317A1 WO 2008136317 A1 WO2008136317 A1 WO 2008136317A1 JP 2008057802 W JP2008057802 W JP 2008057802W WO 2008136317 A1 WO2008136317 A1 WO 2008136317A1
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WO
WIPO (PCT)
Prior art keywords
composition
vinyl chloride
chloride film
heat ray
shielding heat
Prior art date
Application number
PCT/JP2008/057802
Other languages
English (en)
French (fr)
Inventor
Kenichi Fujita
Original Assignee
Sumitomo Metal Mining Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co., Ltd. filed Critical Sumitomo Metal Mining Co., Ltd.
Priority to KR1020097024129A priority Critical patent/KR101507186B1/ko
Priority to ES08751940.1T priority patent/ES2587382T3/es
Priority to US12/450,963 priority patent/US8258226B2/en
Priority to BRPI0810694A priority patent/BRPI0810694B1/pt
Priority to EP08751940.1A priority patent/EP2143762B1/en
Priority to AU2008246747A priority patent/AU2008246747B2/en
Priority to CN2008800134719A priority patent/CN101668812B/zh
Publication of WO2008136317A1 publication Critical patent/WO2008136317A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/20—Compounding polymers with additives, e.g. colouring
    • C08J3/203—Solid polymers with solid and/or liquid additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00—Compounds of tungsten
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00—Compounds of tungsten
    • C01G41/02—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G49/00—Compounds of iron
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/12—Esters; Ether-esters of cyclic polycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/04—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
    • C08L27/06—Homopolymers or copolymers of vinyl chloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/30—Three-dimensional structures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
    • C08J2327/06—Homopolymers or copolymers of vinyl chloride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/27—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

一般式ＷＯＸで示されるタングステン酸化物微粒子、および／または、一般式ＭｙＷＯＺで示され、かつ六方晶の結晶構造を持つ複合タングステン酸化物微粒子と、分散剤とを、有機溶剤に分散して分散液を得る工程と、当該分散液に、塩化ビニルフィルム製造用可塑剤を混合して混合物を得る工程と、当該混合物から減圧蒸留法で上記有機溶剤を５重量％以下となる迄、除去して上記熱線遮蔽塩化ビニルフィルム製造用組成物を得る工程とにより、熱線遮蔽塩化ビニルフィルム製造用組成物を製造した。 
PCT/JP2008/057802 2007-04-26 2008-04-23 熱線遮蔽塩化ビニルフィルム製造用組成物およびその製造方法、並びに、熱線遮蔽塩化ビニルフィルム WO2008136317A1 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1020097024129A KR101507186B1 (ko) 2007-04-26 2008-04-23 열선 차폐 염화 비닐 필름 제조용 조성물 및 이의 제조방법, 및 열선 차폐 염화 비닐 필름
ES08751940.1T ES2587382T3 (es) 2007-04-26 2008-04-23 Composición para producir una película de poli(cloruro de vinilo) protectora de la radiación térmica, procedimiento de producción de la composición y película de poli(cloruro de vinilo) protectora de la radiación térmica
US12/450,963 US8258226B2 (en) 2007-04-26 2008-04-23 Composition for manufacturing heat ray-shielding polyvinyl chloride film and manufacturing method of the same, and heat ray-shielding polyvinyl chloride film
BRPI0810694A BRPI0810694B1 (pt) 2007-04-26 2008-04-23 método de manufatura de uma composição, composição para manufaturar um filme de poli (cloreto de vinila), e, filme de poli (cloreto de vinila) para blindagem contra radiação de calor
EP08751940.1A EP2143762B1 (en) 2007-04-26 2008-04-23 Composition for producing a heat ray shielding polyvinyl chloride film, method for production of the composition, and heat ray shielding polyvinyl chloride film
AU2008246747A AU2008246747B2 (en) 2007-04-26 2008-04-23 Composition for producing vinyl chloride film for shielding heat ray, method for production of the composition, and vinyl chloride film for shielding heat ray
CN2008800134719A CN101668812B (zh) 2007-04-26 2008-04-23 热线屏蔽氯乙烯膜制造用组合物及其制造方法、以及热线屏蔽氯乙烯膜

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007117019A JP5245283B2 (ja) 2007-04-26 2007-04-26 熱線遮蔽塩化ビニルフィルム製造用組成物およびその製造方法、並びに、熱線遮蔽塩化ビニルフィルム
JP2007-117019 2007-04-26

Publications (1)

Publication Number Publication Date
WO2008136317A1 true WO2008136317A1 (ja) 2008-11-13

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ID=39943429

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057802 WO2008136317A1 (ja) 2007-04-26 2008-04-23 熱線遮蔽塩化ビニルフィルム製造用組成物およびその製造方法、並びに、熱線遮蔽塩化ビニルフィルム

Country Status (9)

Country Link
US (1) US8258226B2 (ja)
EP (1) EP2143762B1 (ja)
JP (1) JP5245283B2 (ja)
KR (1) KR101507186B1 (ja)
CN (1) CN101668812B (ja)
AU (1) AU2008246747B2 (ja)
BR (1) BRPI0810694B1 (ja)
ES (1) ES2587382T3 (ja)
WO (1) WO2008136317A1 (ja)

Cited By (3)

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WO2010092013A1 (de) * 2009-02-12 2010-08-19 Basf Se Polymerzusammensetzungen enthaltend nanopartikuläre ir-absorber
US20110135896A1 (en) * 2009-12-07 2011-06-09 Samgong Co., Ltd. Organic-inorganic hybrid transparent hydrogel complex for fire retardant glass, fire retardant glass assembly using the same, and manufacturing method thereof
JP2014094493A (ja) * 2012-11-08 2014-05-22 Sumitomo Metal Mining Co Ltd 透明樹脂積層体とその製造方法、ならびに熱線遮蔽機能を有するプライマー層形成用のプライマー液

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KR101320228B1 (ko) * 2007-10-25 2013-10-21 스미토모 긴조쿠 고잔 가부시키가이샤 고내열성 마스터 배치, 열선 차폐 투명 수지 성형체, 및 열선 차폐 투명 적층체
JP5169863B2 (ja) * 2009-01-20 2013-03-27 住友金属鉱山株式会社 複合タングステン酸化物微粒子分散体の製造方法、および当該分散体を用いた成形体の製造方法、並びに成形体
JP2012016679A (ja) * 2010-07-09 2012-01-26 Showa Denko Kk 銅イオンで修飾された酸化タングステン系光触媒の分散液の製造方法
EP2786972A4 (en) 2011-12-02 2015-08-05 Sumitomo Metal Mining Co THERMAL RADIATION PROTECTIVE FILM, COMBINED THERMAL AND TRANSPARENT RADIATION PROTECTION SUBSTRATE, VEHICLE EQUIPPED WITH TRANSPARENT LAMINATE PROTECTIVE SUBSTRATE AGAINST THERMAL RADIATION AS WINDOW MATERIAL, AND BUILDING USING TRANSPARENT LAMINATE PROTECTIVE SUBSTRATE AGAINST RADIATION THERMAL AS WINDOW MATERIAL
TWI422552B (zh) * 2012-02-08 2014-01-11 Nanya Plastics Corp 一種透明隔熱材料及其製法
JP5942466B2 (ja) * 2012-02-22 2016-06-29 住友金属鉱山株式会社 複合タングステン酸化物微粒子分散ポリカーボネート樹脂組成物およびそれを用いた熱線遮蔽成形体並びに熱線遮蔽積層体
JP5888053B2 (ja) * 2012-03-28 2016-03-16 住友金属鉱山株式会社 熱線遮蔽膜、熱線遮蔽合わせ透明基材、および、当該熱線遮蔽合わせ透明基材が窓材として搭載されている自動車
JP5961498B2 (ja) * 2012-09-18 2016-08-02 富士フイルム株式会社 熱線カットフィルムおよびその製造方法、合わせガラス並びに熱線カット部材
JP5895895B2 (ja) * 2013-04-23 2016-03-30 住友金属鉱山株式会社 熱線遮蔽塩化ビニルフィルム製造用組成物およびその製造方法、並びに、熱線遮蔽塩化ビニルフィルム、熱線遮蔽合わせ透明基材
US9434652B2 (en) 2013-07-23 2016-09-06 Industrial Technology Research Institute Infrared absorption material, method for fabricating the same, and thermal isolation structure employing the same
JP6327025B2 (ja) * 2014-07-09 2018-05-23 コニカミノルタ株式会社 赤外線吸収樹脂組成物およびその製造方法
US10875278B2 (en) 2014-08-06 2020-12-29 Sumitomo Metal Mining Co., Ltd. Heat ray shielding film, heat ray shielding laminated transparent base material, vehicle, and building
CN107709467A (zh) * 2015-06-30 2018-02-16 住友金属矿山股份有限公司 热射线遮蔽膜、热射线遮蔽夹层透明基材、汽车、建造物、分散体、混合组成物、及分散体的制造方法、分散液、分散液的制造方法
US20170363788A1 (en) * 2016-06-20 2017-12-21 Sumitomo Metal Mining Co., Ltd. Heat-ray shielding particle dispersing liquid, heat-ray shielding particle dispersing body, heat-ray shielding laminated transparent substrate and heat-ray shielding transparent substrate
TWI589627B (zh) * 2016-07-04 2017-07-01 Nanya Plastics Corp 一種低可見光穿透兼具高紅外線阻隔的透明聚酯膜及其製法
GB2562116B (en) * 2017-05-05 2022-04-27 William Blythe Ltd Metal oxide, composition comprising the same and method of making metal oxide
GB2562115B (en) 2017-05-05 2022-02-16 William Blythe Ltd Tungsten oxide
EP3421439A1 (en) * 2017-06-29 2019-01-02 Saint-Gobain Glass France Functionalized substrate
CN110407255A (zh) * 2019-07-17 2019-11-05 中国科学院上海硅酸盐研究所 一种碳包覆铯钨青铜复合粉体及其制备方法
JP2022101126A (ja) * 2020-12-24 2022-07-06 共同印刷株式会社 タングステン系赤外線吸収性顔料分散液、染色液、繊維製品、及び繊維製品の処理方法

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JPH0578544A (ja) 1991-09-18 1993-03-30 Kuraray Co Ltd 熱線反射板状体
JPH06264050A (ja) 1993-01-13 1994-09-20 Nippon Shokubai Co Ltd 熱線遮蔽材
JPH06256541A (ja) 1993-03-05 1994-09-13 Mitsui Toatsu Chem Inc 近赤外線吸収フィルム及びそれを用いた熱線遮断シート
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ES2587382T3 (es) 2016-10-24
BRPI0810694B1 (pt) 2018-08-28
US20100140533A1 (en) 2010-06-10
AU2008246747B2 (en) 2014-04-24
CN101668812B (zh) 2013-07-10
EP2143762A4 (en) 2010-12-08
BRPI0810694A2 (pt) 2014-10-21
AU2008246747A1 (en) 2008-11-13
JP5245283B2 (ja) 2013-07-24
CN101668812A (zh) 2010-03-10
KR20100017145A (ko) 2010-02-16
EP2143762A1 (en) 2010-01-13
EP2143762B1 (en) 2016-05-18
JP2008274047A (ja) 2008-11-13
US8258226B2 (en) 2012-09-04

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