WO2008126680A1 - 感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス - Google Patents
感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス Download PDFInfo
- Publication number
- WO2008126680A1 WO2008126680A1 PCT/JP2008/055778 JP2008055778W WO2008126680A1 WO 2008126680 A1 WO2008126680 A1 WO 2008126680A1 JP 2008055778 W JP2008055778 W JP 2008055778W WO 2008126680 A1 WO2008126680 A1 WO 2008126680A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- photosensitive resin
- resist pattern
- layered product
- producing resist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/08—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols from phenol-aldehyde condensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Abstract
安全性が高い上に感度が高く、化学的安定性に優れていて微細なレジストパターンを形成することが可能な、感光性樹脂組成物を提供する。 (a)多官能エポキシ樹脂と、特定の構造を有するアニオン部を有するオニウム塩を含有する(b)カチオン重合開始剤、及び(d)増感剤を含有してなる感光性樹脂組成物によれば、安全性が高い上に感度が高く、化学的安定性に優れていて微細なレジストパターンを形成することが可能な、感光性樹脂組成物を提供できる。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007099547A JP4564977B2 (ja) | 2007-04-05 | 2007-04-05 | 感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス |
JP2007-099547 | 2007-04-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008126680A1 true WO2008126680A1 (ja) | 2008-10-23 |
Family
ID=39863791
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/055778 WO2008126680A1 (ja) | 2007-04-05 | 2008-03-26 | 感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4564977B2 (ja) |
WO (1) | WO2008126680A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104512113A (zh) * | 2013-10-08 | 2015-04-15 | 佳能株式会社 | 液体排出头 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5137673B2 (ja) * | 2008-04-26 | 2013-02-06 | 日本化薬株式会社 | Mems用感光性樹脂組成物及びその硬化物 |
JP5247396B2 (ja) * | 2008-07-02 | 2013-07-24 | 日本化薬株式会社 | Mems用感光性樹脂組成物及びその硬化物 |
JP5650386B2 (ja) * | 2009-08-11 | 2015-01-07 | 太陽ホールディングス株式会社 | 積層構造物及びその製造方法 |
RU2526258C2 (ru) | 2010-02-05 | 2014-08-20 | Кэнон Кабусики Кайся | Светочувствительная полимерная композиция, способы получения структуры и головка для подачи жидкости |
US9061499B2 (en) | 2010-02-05 | 2015-06-23 | Canon Kabushiki Kaisha | Negative photosensitive resin composition, pattern formation method, and liquid discharge head |
JP5473645B2 (ja) | 2010-02-05 | 2014-04-16 | キヤノン株式会社 | 感光性樹脂組成物及び液体吐出ヘッド |
JP5787720B2 (ja) * | 2010-12-16 | 2015-09-30 | キヤノン株式会社 | 感光性ネガ型樹脂組成物 |
JP6120574B2 (ja) | 2012-01-31 | 2017-04-26 | キヤノン株式会社 | 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド |
JP6071718B2 (ja) | 2013-04-10 | 2017-02-01 | キヤノン株式会社 | 感光性ネガ型樹脂組成物 |
JP2016136200A (ja) | 2015-01-23 | 2016-07-28 | 株式会社東芝 | 半導体装置及び半導体装置の製造方法 |
WO2022190208A1 (ja) * | 2021-03-09 | 2022-09-15 | 昭和電工マテリアルズ株式会社 | 感光性フィルム、感光性エレメント、及び、積層体の製造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000119306A (ja) * | 1998-03-20 | 2000-04-25 | Nippon Soda Co Ltd | ヨ―ドニウム塩化合物を含有する光硬化性組成物 |
JP2000239648A (ja) * | 1999-02-19 | 2000-09-05 | Jsr Corp | 光カチオン重合用光増感剤および光カチオン重合方法 |
JP2003082318A (ja) * | 2001-09-13 | 2003-03-19 | Three M Innovative Properties Co | カチオン重合性接着剤組成物及び異方導電性接着剤組成物 |
US20050113474A1 (en) * | 2003-11-26 | 2005-05-26 | 3M Innovative Properties Company | Cationically curable composition |
JP2006084660A (ja) * | 2004-09-15 | 2006-03-30 | Fuji Photo Film Co Ltd | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
JP2007148208A (ja) * | 2005-11-30 | 2007-06-14 | Sumitomo Chemical Co Ltd | 感放射線性樹脂組成物 |
JP2008037980A (ja) * | 2006-08-04 | 2008-02-21 | Toyo Ink Mfg Co Ltd | 感エネルギー線酸発生組成物、酸の発生方法、および感エネルギー線硬化性組成物 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
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2007
- 2007-04-05 JP JP2007099547A patent/JP4564977B2/ja active Active
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2008
- 2008-03-26 WO PCT/JP2008/055778 patent/WO2008126680A1/ja active Application Filing
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000119306A (ja) * | 1998-03-20 | 2000-04-25 | Nippon Soda Co Ltd | ヨ―ドニウム塩化合物を含有する光硬化性組成物 |
JP2000239648A (ja) * | 1999-02-19 | 2000-09-05 | Jsr Corp | 光カチオン重合用光増感剤および光カチオン重合方法 |
JP2003082318A (ja) * | 2001-09-13 | 2003-03-19 | Three M Innovative Properties Co | カチオン重合性接着剤組成物及び異方導電性接着剤組成物 |
US20050113474A1 (en) * | 2003-11-26 | 2005-05-26 | 3M Innovative Properties Company | Cationically curable composition |
JP2006084660A (ja) * | 2004-09-15 | 2006-03-30 | Fuji Photo Film Co Ltd | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
JP2007148208A (ja) * | 2005-11-30 | 2007-06-14 | Sumitomo Chemical Co Ltd | 感放射線性樹脂組成物 |
JP2008037980A (ja) * | 2006-08-04 | 2008-02-21 | Toyo Ink Mfg Co Ltd | 感エネルギー線酸発生組成物、酸の発生方法、および感エネルギー線硬化性組成物 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104512113A (zh) * | 2013-10-08 | 2015-04-15 | 佳能株式会社 | 液体排出头 |
Also Published As
Publication number | Publication date |
---|---|
JP2008256980A (ja) | 2008-10-23 |
JP4564977B2 (ja) | 2010-10-20 |
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