WO2008081872A1 - Regenerating apparatus and method of regeneration - Google Patents

Regenerating apparatus and method of regeneration Download PDF

Info

Publication number
WO2008081872A1
WO2008081872A1 PCT/JP2007/075131 JP2007075131W WO2008081872A1 WO 2008081872 A1 WO2008081872 A1 WO 2008081872A1 JP 2007075131 W JP2007075131 W JP 2007075131W WO 2008081872 A1 WO2008081872 A1 WO 2008081872A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning liquid
regeneration
regenerating
supply
regenerated
Prior art date
Application number
PCT/JP2007/075131
Other languages
French (fr)
Japanese (ja)
Inventor
Tokuo Takamoto
Original Assignee
Hirata Corporation
Three Dyne Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirata Corporation, Three Dyne Corporation filed Critical Hirata Corporation
Priority to KR1020097014192A priority Critical patent/KR101126588B1/en
Priority to JP2008552152A priority patent/JP5250426B2/en
Publication of WO2008081872A1 publication Critical patent/WO2008081872A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/42—Regulation; Control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Abstract

In a processing, such as cleaning, it is intended to realize not only use of a cleaning liquid but also regeneration of the used cleaning liquid and reuse as a regenerated cleaning liquid. There is provided a liquid regenerating apparatus comprising recovery means for recovery of any cleaning liquid used by processing equipment where a cleaning liquid is used; regenerating means for regeneration of the recovered used cleaning liquid to thereby obtain a regenerated cleaning liquid; supply means for supply of the regenerated cleaning liquid to the processing equipment; and control means for control of the recovery means, regenerating means and supply means. The apparatus may be further provided with linking means for, in order to realize simultaneous operation of the processing equipment and the regenerating means, conducting therebetween supply of the used cleaning liquid and regenerated cleaning liquid.
PCT/JP2007/075131 2006-12-27 2007-12-27 Regenerating apparatus and method of regeneration WO2008081872A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020097014192A KR101126588B1 (en) 2006-12-27 2007-12-27 Regenerating of washing liquid apparatus, regenerating of washing liquid system and method of regeneration
JP2008552152A JP5250426B2 (en) 2006-12-27 2007-12-27 Playback apparatus and playback method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2006/326079 WO2008081508A1 (en) 2006-12-27 2006-12-27 Regeneration apparatus and method of regeneration
JPPCT/JP2006/326079 2006-12-27

Publications (1)

Publication Number Publication Date
WO2008081872A1 true WO2008081872A1 (en) 2008-07-10

Family

ID=39588199

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2006/326079 WO2008081508A1 (en) 2006-12-27 2006-12-27 Regeneration apparatus and method of regeneration
PCT/JP2007/075131 WO2008081872A1 (en) 2006-12-27 2007-12-27 Regenerating apparatus and method of regeneration

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/326079 WO2008081508A1 (en) 2006-12-27 2006-12-27 Regeneration apparatus and method of regeneration

Country Status (4)

Country Link
KR (1) KR101126588B1 (en)
CN (1) CN101600517A (en)
TW (1) TWI373362B (en)
WO (2) WO2008081508A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT509587B1 (en) * 2010-10-11 2011-10-15 Tms Transport Und Montagesysteme Gmbh METHOD AND A CLEANING APPARATUS FOR CLEANING INDUSTRIALLY PREPARED COMPONENTS
TWI630652B (en) 2014-03-17 2018-07-21 斯克林集團公司 Substrate processing apparatus and substrate processing method using substrate processing apparatus
CN104056798B (en) * 2014-05-21 2016-02-03 上海和辉光电有限公司 The recovery of cleaning fluid and supply arrangement and method
CN104858178A (en) * 2014-09-15 2015-08-26 杜正阔 Ultrasonic cleaning machine technology capable of realizing evaporation, pressurization, liquefaction and regeneration of cleaning liquid
JP6499414B2 (en) * 2014-09-30 2019-04-10 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing equipment
JP6748150B2 (en) * 2018-06-14 2020-08-26 ファナック株式会社 Galvano mirror and laser processing equipment
CN110871192A (en) * 2019-10-30 2020-03-10 宁波兰羚钢铁实业有限公司 Method for reducing heavy oil coating and oil stain on surface of steel coil in longitudinal shearing processing
KR102598967B1 (en) * 2020-09-07 2023-11-06 현대자동차주식회사 Apparatus and method for treating treatment solution
CN113426752B (en) * 2021-06-28 2023-01-03 北京七星华创集成电路装备有限公司 Cleaning equipment for mask plate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000292932A (en) * 1999-04-09 2000-10-20 Seiko Epson Corp Resist processing device
JP2002180278A (en) * 2000-12-07 2002-06-26 Sanyo Special Steel Co Ltd Method of controlling concentration of hydrochloric acid in steel product hydrochloric acid pickling tank, and method of pickling steel products
JP2006223917A (en) * 2005-02-15 2006-08-31 Sanyo Electric Co Ltd Distillation apparatus with solvent recovery function

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2758813B2 (en) * 1993-11-04 1998-05-28 出光興産株式会社 Capillary washing method and apparatus
JP3117871B2 (en) * 1994-06-17 2000-12-18 大同特殊鋼株式会社 Method and apparatus for pickling steel
JP3168928B2 (en) * 1996-11-29 2001-05-21 住友金属工業株式会社 Steel plate cleaning equipment
US6354310B1 (en) * 1998-11-12 2002-03-12 General Electric Company Apparatus and process to clean and strip coatings from hardware
JP2000334400A (en) * 1999-05-31 2000-12-05 Nakajima Kogyo:Kk Cleaning system
JP3697123B2 (en) * 1999-11-19 2005-09-21 三菱重工業株式会社 Waste liquid recycling device for printing press
JP4733855B2 (en) * 2001-04-27 2011-07-27 株式会社野坂電機 Acid recovery method for waste acid solution
KR100753629B1 (en) * 2006-05-26 2007-08-29 세메스 주식회사 Apparatus and method for treating substrates

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000292932A (en) * 1999-04-09 2000-10-20 Seiko Epson Corp Resist processing device
JP2002180278A (en) * 2000-12-07 2002-06-26 Sanyo Special Steel Co Ltd Method of controlling concentration of hydrochloric acid in steel product hydrochloric acid pickling tank, and method of pickling steel products
JP2006223917A (en) * 2005-02-15 2006-08-31 Sanyo Electric Co Ltd Distillation apparatus with solvent recovery function

Also Published As

Publication number Publication date
KR101126588B1 (en) 2012-03-27
TW200918147A (en) 2009-05-01
KR20090097912A (en) 2009-09-16
CN101600517A (en) 2009-12-09
TWI373362B (en) 2012-10-01
WO2008081508A1 (en) 2008-07-10

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