WO2008062666A1 - Système d'irradiation à faisceau d'électrons - Google Patents

Système d'irradiation à faisceau d'électrons Download PDF

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Publication number
WO2008062666A1
WO2008062666A1 PCT/JP2007/071603 JP2007071603W WO2008062666A1 WO 2008062666 A1 WO2008062666 A1 WO 2008062666A1 JP 2007071603 W JP2007071603 W JP 2007071603W WO 2008062666 A1 WO2008062666 A1 WO 2008062666A1
Authority
WO
WIPO (PCT)
Prior art keywords
electron beam
substrate
electron
chamber
passage hole
Prior art date
Application number
PCT/JP2007/071603
Other languages
English (en)
Japanese (ja)
Inventor
Tatsuya Matsumura
Original Assignee
Hamamatsu Photonics K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K.K. filed Critical Hamamatsu Photonics K.K.
Publication of WO2008062666A1 publication Critical patent/WO2008062666A1/fr

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows

Definitions

  • Electron beam irradiation device
  • the present invention relates to an electron beam irradiation apparatus.
  • a chamber that forms an electron beam passage hole, an electron gun that emits an electron beam provided on one end side of the chamber, a plurality of electron guns provided on the other end side of the chamber There exist some which are provided with the electron beam transmission unit which has an electron beam transmission member (for example, refer to patent documents 1).
  • Such an electron beam irradiation apparatus is particularly effective when the area to be irradiated with the electron beam is relatively wide because the electron beam emitted from the electron gun is deflected so as to sequentially pass through all the electron beam transmitting members. It is.
  • the electron beam transmission unit is provided with a plurality of electron beam transmission members because the electron beam transmission member is generally made of beryllium or the like.
  • each electron beam transmitting member is reduced in area to prevent the electron beam transmitting member from being damaged.
  • Patent Document 1 Japanese Unexamined Patent Application Publication No. 2004-239920
  • the electron beam irradiation apparatus as described above has the following problems. That is, when the electron beam emitted from the electron gun is deflected so as to sequentially pass through all the electron beam transmitting members, in the electron beam transmitting unit, adjacent electron beams that are adjacent to each other only by the electron beam transmitting member. The electron beam is also applied to the frame portion between the transmissive members. Therefore, the frame portion between adjacent electron beam transmitting members generates heat, and in the worst case, it may melt.
  • the present invention has been made in view of such circumstances, and in an electron beam transmission unit, an electron that can suppress the generation of heat at a frame portion between adjacent electron beam transmission members. It aims at providing a beam irradiation apparatus.
  • an electron beam irradiation apparatus includes a chamber in which an electron beam passage hole is formed, an electron gun that is provided at one end of the chamber and emits an electron beam, and a chamber. And an electron beam transmission unit having a plurality of electron beam transmission members arranged in a predetermined direction, and a focusing means for collecting electron beams emitted from the electron gun and passing through the electron beam passage hole.
  • an electron beam emitted from an electron gun is focused by a focusing means when passing through an electron beam passage hole, and a plurality of electron beam transmitting members arranged in a predetermined direction are used.
  • the electron beam transmission unit is irradiated.
  • the electron beam that is focused by the focusing means and passes through the electron beam passage hole is, in the electron beam transmission unit, a frame portion between adjacent electron beam transmission members from the time when the electron beam transmission member is irradiated with the electron beam.
  • the beam is deflected in a predetermined direction by the deflection unit and the control unit so that the time during which the electron beam is irradiated is shortened. Therefore, the electron beam can be reliably emitted to the outside through each electron beam transmitting member, and in the electron beam transmitting unit, it is possible to suppress heat generation at the frame portion between adjacent electron beam transmitting members. Can do.
  • the focusing means is arranged so that the image of the electron beam irradiated to the electron beam transmission member has a size included in the electron beam transmission member. It is preferable to focus the lines. Thereby, in an electron beam transmission unit, it can further suppress that an electron beam is irradiated to the flame
  • the electron beam transmission unit has a substrate with an electron beam transmission member attached to the other end surface, and is opposed to the electron beam transmission member on the substrate. It is preferable that an opening is formed in the portion, and a recess is formed in the portion facing the other end of the electron beam passage hole on one end surface of the substrate. In this case, the thickness of the portion of the substrate facing the other end of the electron beam passage hole is thinner than the thickness of the portion of the substrate attached to the chamber. This maintains the mounting strength between the substrate and the chamber.
  • the substrate can be prevented from being heated by being irradiated with the electron beam when the electron beam passes through the opening of the substrate toward the electron beam transmitting member. Furthermore, the portion of the substrate that faces the other end of the electron beam passage hole is offset toward the outside of the chamber. Thereby, heat can be efficiently released from the substrate to the outside of the chamber.
  • the electron beam irradiation apparatus it is preferable that at least a portion on one end surface side of the substrate in the opening has a shape that spreads toward the one end surface side of the substrate.
  • the substrate is made of brass!
  • the substrate is detachable from the chamber, and the electron beam transmitting member is detachable from the substrate.
  • the electron beam transmission unit can be removed from the chamber and a new electron beam transmission unit can be attached to the chamber.
  • the damaged electron beam transmission member can be removed from the substrate and a new electron beam transmission member can be attached.
  • FIG. 1 is a longitudinal sectional view of an embodiment of an electron beam irradiation apparatus according to the present invention.
  • FIG. 2 is an enlarged longitudinal sectional view around the force sword of FIG.
  • FIG. 3 is an enlarged plan view around the force sword of FIG.
  • FIG. 4 is an enlarged vertical sectional view around the electron beam transmission unit of FIG.
  • FIG. 5 is a sectional view taken along line V—V in FIG.
  • FIG. 6 is an enlarged plan view of the periphery of the electron beam transmission unit of FIG.
  • FIG. 7 is a diagram showing a relationship between an electron beam image irradiated on an electron beam transmitting member and the shape of an electron beam transmitting part.
  • Electron beam irradiation device 2, 2, 2 ... electron beam passage hole, 2a ... rear end of electron beam passage hole (one
  • Bunch means 7 ⁇ deflection coil (deflection means), 9 ⁇ ⁇ ⁇ control unit (control means), 10 ⁇ electron gun, 20 ⁇ ⁇ ⁇ electron beam transmission unit, 20a ... frame portion, 21 ⁇ ⁇ ⁇ electron Line transmitting member, 21a ... Electron beam transmitting portion, 22 ... Substrate, 22a ... Substrate rear end surface (one end surface), 22b ... Substrate front end surface (other end surface), 22c ... Substrate opening, 22d ... Substrate opening Recess, ⁇ ... Electron beam.
  • the electron beam irradiation apparatus 1 is hermetically sealed in the chamber 3 so as to close the chamber 3 that forms the electron beam passage hole 2 and the rear end (one end) 2a of the electron beam passage hole 2.
  • an electron beam transmission unit 20 that is airtightly attached to the chamber 3 so as to block the front end (other end) 2b of the electron beam passage hole 2.
  • the electron gun 10 emits the electron beam EB emitted from the force sword 11 in the Z-axis direction.
  • the electron beam EB emitted from the electron gun 10 passes through the electron beam passage hole 2 with a directing force toward the electron beam transmission unit 20.
  • the electron beam transmissive unit 20 has a plurality (here, five) of electron beam transmissive members 21 arranged in the Y-axis direction (predetermined direction).
  • the side irradiated with the electron beam EB by the electron beam irradiation apparatus 1 is the front side, and the opposite side is the rear side.
  • the electron beam EB emitted from the electron gun 10 is deflected in the Y-axis direction so as to sequentially pass through all the electron beam transmission members 21. This is particularly effective when the area to be irradiated is relatively wide.
  • the electron beam irradiation device 1 is used to irradiate an irradiation object that flows on the line in an inert gas such as nitrogen with an electron beam EB to dry, sterilize, or modify the surface of the irradiation object. Is done.
  • the chamber 3 includes a chamber 3 to which the electron gun 10 is attached and an electron beam transmission unit 20. And a chamber 3 to be attached. Chamber 3 is formed in a cylindrical shape with metal
  • the cross section of the electron beam passage hole 2 formed by the chamber 3 is circular, and the electron beam passage hole 2 has a shape in which a small diameter portion on the front side and a large diameter portion on the rear side are connected.
  • the chamber 3 is formed in a trapezoidal plate shape from metal. Electron beam formed by chamber 3
  • the cross section of the passage hole 2 is a rectangular shape whose longitudinal direction is the Y-axis direction, and the electron beam passage hole 2 is
  • the shape is divergent only in the Y-axis direction toward the front side.
  • a flange 4 formed in a disk shape from metal.
  • Electron gun 10 In the chamber 3, an alignment coil 6 and a focusing coil (focusing means) 6 are arranged so as to be paired with the small diameter portion of the electron beam passage hole 2 interposed therebetween. Electron gun 10
  • the electron beam EB passing through the core beam passage hole 2 is displaced by the alignment coil 6 from the mechanical center of each member constituting the electron gun section 10 and the electron beam EB passage path, and the residual magnetism of each component member.
  • a deflection coil (biasing means) 7 is disposed on the front surface of the flange 4. Focused by the focusing coil 6 and passed through the electron beam passage hole 2.
  • the passing electron beam EB is deflected by the deflection coil 7 in the Y-axis direction.
  • an exhaust pipe 8 that connects the electron beam passage hole 2 and a vacuum pump (not shown) is formed in the chamber 3.
  • the inside of the chamber 3 that is, the electron beam passage hole 2 is evacuated.
  • the electron beam irradiation apparatus 1 includes a control unit (control means) 9 for controlling the whole.
  • the electron gun 10 includes a case 12 formed of a metal in a rectangular parallelepiped shape, an insulating block 13, and a high breakdown voltage connector 14.
  • the case 12 is airtightly fixed to the rear end portion of the chamber 3.
  • the front wall of the case 12 is provided with an opening 12a that allows the inside of the case 12 and the inside of the chamber 3 to communicate with each other.
  • an opening 12b for attaching the connector 14 is provided on the side wall of the case 12. Opening 12b
  • the inner surface of the case 12 around the inner surface is provided with an uneven portion to ensure the bonding strength with the insulating block 13.
  • the insulating block 13 is made of an insulating material (for example, epoxy resin) and insulates the power supply path from the connector 14 force to the cathode 11 from the outside.
  • the insulating block 13 protrudes into the large diameter portion of the electron beam passage hole 2 from the base portion 13a accommodated in the case 12 and through the opening 12a from the base portion 13a, and the front end portion in the Z-axis direction has a small diameter of the electron beam passage hole 2.
  • a protruding portion 13b facing the rear end of the portion.
  • the base portion 13a occupies most of the internal space of the case 12, and is in contact with the inner surface of the case 12 on the opening 12a side and the opening 12b side.
  • a film 15 made of a conductive material is affixed to a portion of the base portion 13a that does not contact the inner surface of the case 12, so that the film 15 is electrically connected to the case 12 having a ground potential.
  • the surface potential of the insulating block 13 facing the inner surface of the case 12 can be set to the ground potential, and the stability during operation can be improved.
  • the connector 14 is for supplying a high voltage to the force sword 11 from a power supply device external to the electron beam irradiation apparatus 1.
  • the connector 14 is inserted into the opening 12 b on the side wall of the case 12, and is buried and fixed in the insulating block 7 with the tip of the connector 14 positioned near the center of the insulating block 13.
  • An uneven portion is provided on the outer peripheral surface of the distal end portion of the connector 14 so as to ensure the bonding strength with the insulating block 13.
  • a hook inlet 14a into which a power plug for holding the distal end of the external wiring connected to the power supply device is inserted.
  • a pair of internal wires 16 and 16 are connected to the tip of the connector 14.
  • the internal wirings 16 and 16 extend from the tip of the connector 14 toward the center of the base portion 13a, and are bent at the center of the base portion 13a to extend to the front end portion of the protruding portion 13b.
  • Sockets 31, 31 embedded in the front end portion of the protruding portion 13 b are connected to the internal wirings 16, 16.
  • the sockets 31, 31 are connected to the front end portion protruding from the front end surface of the protruding portion 13 b with a force sword 11.
  • the power supply pins 32 and 32 that are crossed are connected.
  • the power feeding pins 32 and 32 pass through the ceramic plate 33 disposed on the front end face of the protruding portion 13b, and are fixed to the ceramic plate 33 by brazing or the like.
  • the force sword 11 is a thin plate-like member that emits electrons to be an electron beam EB. That is, the cathode 11 is a heating power supply device different from the power supply device used for emitting the electron beam EB. As a result, the electron emitter 11a (see FIG. 2) is energized and heated to a temperature at which electrons can be emitted through the internal wirings 16, 16, the sockets 31, 31 and the power supply pins 32, 32. After that, the force sword 11 emits electrons to be an electron beam EB when a high voltage is applied to one of the internal wirings 16 by the power supply device.
  • an intermediate electrode 17 which is a so-called grid is provided.
  • the intermediate electrode 17 generates an electric field that draws out electrons emitted from the cathode 11 and focuses the electron beam EB when a predetermined voltage is applied.
  • a predetermined voltage For applying a predetermined voltage to the intermediate electrode 17, the same potential as that of the cathode 11 can be easily applied to the intermediate electrode 17 by electrically connecting any of the internal wirings 16 near the tip of the protruding portion 13 b.
  • the internal wiring may be provided from the connector 14 in the same manner as the internal wirings 16 and 16. As a result, the electron beam EB is emitted from the electron gun 10 to the front side in the Z-axis direction.
  • a ceramic plate 33 is disposed on the front end surface of the protruding portion 13b.
  • An encircling member 18 is disposed on the ceramic plate 33 so as to surround the front end portions of the power supply pins 32, 32.
  • the front end surface of the enclosing member 18 has a thin plate shape that covers and covers the front end of the opening of the enclosing member 18.
  • a lid member 19 is disposed.
  • the surrounding member 18 and the lid member 19 are made of metal and are in contact with the intermediate electrode 17. As a result, the surrounding member 18 and the lid member 19 have the same potential as the intermediate electrode 17.
  • the force sword 11, the surrounding member 18, the lid member 19, the power supply pins 32 and 32, and the ceramic plate 33 are integrally unitized. Therefore, when replacing the power sword 11, it is possible to replace this unit with force S. Accordingly, it is possible to easily replace the force sword 11 without making complicated adjustments such as positioning of the force sword 11 with respect to the lid member 19.
  • the force sword 11 is formed into a thin plate shape with a high melting point metal (for example, tungsten, molybdenum, rhenium, niobium, tantalum, thorium oxide, etc.) or an alloy (for example, a mixed 'tungsten mixed tungsten with thorium oxide). It has a rectangular electron emission portion 11a formed and facing a rectangular aperture 19a provided on the lid member 19.
  • the aperture 19a is provided so as to include the front surface of the electron emission portion 11a when viewed from the Z-axis direction.
  • the shape is similar to the front surface of the electron emission portion 11a, and the distance between the edge portion of the aperture 19a and the edge portion of the front surface of the electron emission portion 11a is narrow. .
  • a reflector ib supported by one power supply pin 32 is arranged with an interval of 0.5 mm to 1.5 mm from the electron emission part 11a. Further, since the front surface of the electron emission portion 11a and the front surface of the lid member 19 are located on substantially the same plane, the electric field generated by the intermediate electrode 17 acts equally on the front surface of the electron emission portion 11a. Electrons are emitted substantially uniformly from the front surface of the electron emission portion 11a. Of the electrons emitted from the electron emitting portion 11a, the electrons from the front surface of the electron emitting portion 11a are directly emitted to the front side in the Z-axis direction.
  • the reflector l ib reflects a part of the electrons emitted from the rear surface of the electron emission part 11a to the Z-axis direction side, and a part of it further reflects from the gap between the aperture 19a and the electron emission part 11a to the Z-axis. Released to the direction side. For this reason, it is placed in particular applications that require high current extraction!
  • the electron beam transmission unit 20 has a substrate 22 formed in a rectangular plate shape from brass.
  • the substrate 22 is airtightly attached to the front end surface of the chamber 3 via an O-ring 23 so that the rear end surface (one end surface) 22a contacts.
  • a frame member 24 to which the electron beam transmitting member 21 is fixed is attached to the end surface (other end surface) 22b through an O-ring 25 in an airtight manner.
  • Substrate 22 is connected to chamber 3 by bolt 26
  • the electron beam transmitting member 21 is detachably attached to the substrate 22 with bolts 27.
  • the electron beam transmitting member 21 can be kept airtight and is formed in a rectangular thin film shape from a material (for example, beryllium, titanium, aluminum, etc.) excellent in the transmittance of the electron beam EB.
  • the frame member 24 is formed in a rectangular ring shape from metal (for example, stainless steel).
  • the electron beam transmitting member 21 is airtightly fixed to the front end surface of the frame member 24 by, for example, brazing so as to cover and cover the front end of the opening of the frame member 24, and the electron beam transmitting portion of the electron beam transmitting member 21 21 a has a rectangular shape with the Y-axis direction as the longitudinal direction when viewed from the Z-axis direction.
  • An opening 22c having a rectangular cross section is formed in a portion of the substrate 22 that faces each electron beam transmitting member 21. It is the shape of.
  • a concave portion 22d having a rectangular cross section is formed in a portion of the rear end surface 22a of the substrate 22 facing the front end 2b of the electron beam passage hole 2.
  • the inside of the chamber 3 (that is, the electron beam passage hole 2) is evacuated by the vacuum pump through the exhaust pipe 8, and the electric power is supplied through the internal wirings 16, 16, the sockets 31, 31 and the power supply pins 32, 32.
  • a high voltage is applied to the force sword 11 by the source device, electrons are emitted from the force of the electron emitting portion 11a of the force sword 11.
  • Electrons emitted from the electron emitting portion 11a are emitted to the front side in the Z-axis direction by the aperture 19a and the reflector plate ib, accelerated and focused by the electric field generated by the intermediate electrode 17, and the electron beam EB is emitted from the electron gun.
  • the light is emitted from 10 to the front side in the Z-axis direction.
  • the electron beam EB emitted from the electron gun 10 and passing through the electron beam passage hole 2 is corrected for the central axis by the alignment coil 6 and then the electron beam transmitting member 21 by the focusing coil 6.
  • the image power S of the electron beam EB irradiated to the electron beam transmitting member 21 is controlled so as to be substantially the same as the shape of the electron beam transmitting portion 21a when viewed from the Z-axis direction.
  • the focusing coil 6 is controlled by the section 9.
  • the central axial force of the electron beam EB passing through the line passing hole 2 is repeatedly changed linearly along the axial direction.
  • the time during which the electron beam EB is irradiated onto the frame portion 20a between the adjacent electron beam transmission members 21, 21 is longer than the time during which the electron beam transmission member 21 is irradiated with the electron beam EB.
  • the deflection coil 7 is controlled by the control unit 9 so as to be shortened. Such control is realized, for example, by causing the control unit 9 to pass a current whose current value changes stepwise through the deflection coil 7.
  • the electron beam EB deflected in the Y-axis direction by the deflection coil 7 is sequentially transmitted through each electron beam transmitting portion 21a and emitted to the outside.
  • the electron beam EB emitted to the outside is irradiated to the irradiation object flowing on the line in an inert gas such as nitrogen, and the irradiation object is dried and sterilized. Surface modification is performed.
  • the electron beam EB emitted from the electron gun 10 is focused by the focusing coil 6 when passing through the electron beam passage hole 2, and is moved in the Y-axis direction.
  • the electron beam transmission unit 20 having a plurality of electron beam transmission members 21 is irradiated. At this time, the electron beam EB focused by the focusing coil 6 and passing through the electron beam passage hole 2 is
  • the time for the electron beam EB to be irradiated to the frame portion 20a between the adjacent electron beam transmission members 21, 21 is shorter than the time for the electron beam transmission member 21 to be irradiated with the electron beam EB.
  • the deflection coil 7 and the control unit 9 deflect the beam in the Y-axis direction. Accordingly, the electron beam EB can be reliably emitted to the outside through each electron beam transmitting member 21, and in the electron beam transmitting unit 20, a frame portion 20a between adjacent electron beam transmitting members 21 and 21 is provided. Can be prevented from generating heat.
  • the electron beam EB emitted from the electron gun 10 and passing through the electron beam passage hole 2 is the image power S of the electron beam EB irradiated on the electron beam transmitting member 21;
  • the focusing coil 6 and the control unit 9 so as to be substantially the same as the shape of the electron beam transmitting part 21a in the Z-axis direction.
  • the electron beam EB is irradiated to the frame portion 20a between the adjacent electron beam transmissive members 21 and 21, and this portion is further suppressed from generating heat, while each electron beam transmissive unit 20 is transparent.
  • the electron dose emitted from the electron beam transmitting portion 21a to the outside can be made uniform.
  • the shape of the electron beam EB in the electron beam transmission part 21a rectangular, the X-direction width of the electron beam transmission part 2la, which is expensive and easily damaged, can be narrowed. And extending the life of the output window.
  • a concave portion 22d having a rectangular cross section is formed in a portion facing the front end 2b of the electron beam passage hole 2 on the rear end surface 22a of the substrate 22.
  • the thickness of the portion of the substrate 22 facing the front end 2b of the electron beam passage hole 2 is thinner than the thickness of the portion of the substrate 22 attached to the chamber 3.
  • the mounting strength with the bar 3 can be maintained, and the electron beam EB opens the opening 22c of the substrate 22.
  • the substrate 22 It is possible to suppress the substrate 22 from generating heat by directing the electron beam transmitting member 21 through the electron beam EB and irradiating the substrate 22 with the electron beam EB. Furthermore, the front end 2 of the electron beam passage hole 2 in the substrate 22 The part facing b is offset to the outside of the chamber 3. This makes the board 22
  • each opening 22c of the substrate 22 has a shape that spreads toward the rear end surface 22a side of the substrate 22.
  • the electron beam EB is directed to the electron beam transmitting member 21 through the opening 22c of the substrate 22, and the substrate 22 is further prevented from being irradiated with the electron beam EB and generating heat. it can.
  • the substrate 22 is formed in a rectangular plate shape from brass. Since brass has a high thermal conductivity, even if a part of the substrate 22 is irradiated with the electron beam EB, heat easily diffuses throughout the substrate 22. Therefore, it is possible to prevent a situation in which a part of the substrate 22 irradiated with the electron beam EB is melted. Furthermore, the strength of the substrate 22 can be increased as compared with the case where the substrate 22 is made of aluminum, for example.
  • the substrate 22 is attached to the chamber 3 with bolts 26.
  • the electron beam transmitting member 21 is detachable from the substrate 22 with bolts 27. As a result, for example, when one electron beam transmitting member 21 is damaged, the electron beam transmitting unit 20 is also removed from the chamber 3 force, and a new electron beam transmitting unit is immediately removed.
  • the damaged electron beam transmission member 21 can be removed from the substrate 22 and a new electron beam transmission member 21 can be attached.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Dans un dispositif d'irradiation (1) à faisceau d'électrons, un faisceau d'électrons (EB) émis par un canon à électrons (10) est convergé par une bobine (62) de convergence lorsqu'il passe à travers un orifice (2) correspondant et est appliqué à une unité (20) de transmission de faisceau d'électrons comprenant une pluralité d'éléments (21) de transmission de faisceau d'électrons alignés dans la direction d'un axe Y. Le faisceau d'électrons (EB) convergé par la bobine (62) de convergence et passant à travers l'orifice (2) est dévié et dans la direction de l'axe Y par une bobine (7) de déflexion et une unité de commande (9), de telle façon que dans l'unité de transmission (20) de faisceau d'électrons, le temps pendant lequel le faisceau d'électrons (EB) est appliqué sur une section de châssis (20a) se trouvant entre deux éléments de transmission de faisceau électronique adjacents est plus court que le temps pendant lequel le faisceau d'électrons (EB) est appliqué à l'élément de transmission (21) de faisceau d'électrons.
PCT/JP2007/071603 2006-11-24 2007-11-07 Système d'irradiation à faisceau d'électrons WO2008062666A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006317516A JP2008128977A (ja) 2006-11-24 2006-11-24 電子線照射装置
JP2006-317516 2006-11-24

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WO2008062666A1 true WO2008062666A1 (fr) 2008-05-29

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TW (1) TW200832447A (fr)
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JP2010032495A (ja) * 2008-06-27 2010-02-12 Rigaku Corp ガスフロー型比例計数管
JP5829542B2 (ja) * 2012-02-08 2015-12-09 浜松ホトニクス株式会社 電子線照射装置及び電子線透過ユニット
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