WO2007144125A3 - Abbildungsvorrichtung - Google Patents

Abbildungsvorrichtung Download PDF

Info

Publication number
WO2007144125A3
WO2007144125A3 PCT/EP2007/005127 EP2007005127W WO2007144125A3 WO 2007144125 A3 WO2007144125 A3 WO 2007144125A3 EP 2007005127 W EP2007005127 W EP 2007005127W WO 2007144125 A3 WO2007144125 A3 WO 2007144125A3
Authority
WO
WIPO (PCT)
Prior art keywords
immersion
protective plate
lens
medium
lens system
Prior art date
Application number
PCT/EP2007/005127
Other languages
English (en)
French (fr)
Other versions
WO2007144125A2 (de
Inventor
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Publication of WO2007144125A2 publication Critical patent/WO2007144125A2/de
Publication of WO2007144125A3 publication Critical patent/WO2007144125A3/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)

Abstract

Linsensystem oder Linsenspiegelsystem, insbesondere Projektionsobjektiv, zur Abbildung eines in einer Objektebene des Linsensystems oder des Linsenspiegelsystems, insbesondere des Projektionsobjektivs, angeordneten Musters, insbesondere einer Objektstruktur, in eine Bildebene des Projektionsobjektivs mit Hilfe eines Immersionsmediums (2), das zwischen einem optischen element (1) des Linsensystems oder des Linsenspiegelsystems und der Bildebene angeordnet ist, wobei zwischen dem Linsensystem und dem Immersionsmedium (2) eine Schutzplatte (3, 17) angeordnet ist, wobei seitlich an das Element (1) und/oder anschließend an die Schutzplatte (3, 17) wenigstens ein Mittel angeordnet ist, das bewirkt, dass der Partialdruck des Immersionsmediums (2) an der äußeren Kontur des Elements (1), zwischen dem Element (1) und der Schutzplatte (3, 17) viel geringer ist als über der Immersionsflüssigkeit selbst. Geeignete Mittel sind beispielsweise eine Abdichtung, eine Zwischenimmersionsflüssigkeit, eine umlaufende Seitenwand, Zu- und Ableitungen für den Austausch des Mediums zwischen Element (1) und Schutzplatte (3) oder Aufnahmemittel zur Adsorption oder Absorption des Immersionsmittels (2).
PCT/EP2007/005127 2006-06-13 2007-06-11 Abbildungsvorrichtung WO2007144125A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006027609A DE102006027609A1 (de) 2006-06-13 2006-06-13 Abbildungsvorrichtung
DE102006027609.4 2006-06-13

Publications (2)

Publication Number Publication Date
WO2007144125A2 WO2007144125A2 (de) 2007-12-21
WO2007144125A3 true WO2007144125A3 (de) 2008-02-21

Family

ID=38473908

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/005127 WO2007144125A2 (de) 2006-06-13 2007-06-11 Abbildungsvorrichtung

Country Status (2)

Country Link
DE (1) DE102006027609A1 (de)
WO (1) WO2007144125A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3172624B1 (de) 2014-07-25 2020-01-01 ASML Netherlands B.V. Immersionslithographievorrichtung und verfahren zur herstellung einer vorrichtung
DE102017217380A1 (de) 2017-09-29 2019-04-04 Carl Zeiss Microscopy Gmbh Immersionsvorrichtung zur dynamischen Anpassung eines Mediums an eine Probe
DE102017217389A1 (de) * 2017-09-29 2019-04-04 Carl Zeiss Microscopy Gmbh Optische Linse zur Verwendung in einer Medienzuführungsvorrichtung sowie Objektiv, Medienzuführungsvorrichtung und Mikroskop
DE102019207210B4 (de) 2019-05-17 2020-06-25 Carl Zeiss Smt Gmbh Verfahren zur Detektion von Defektursachen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1510871A2 (de) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US20050225737A1 (en) * 2003-12-19 2005-10-13 Carl Zeiss Smt Ag Projection objective for immersion lithography

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL75353C (de) * 1952-07-11
US7133114B2 (en) * 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1510871A2 (de) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US20050225737A1 (en) * 2003-12-19 2005-10-13 Carl Zeiss Smt Ag Projection objective for immersion lithography

Also Published As

Publication number Publication date
DE102006027609A1 (de) 2007-12-20
WO2007144125A2 (de) 2007-12-21

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