WO2007142235A1 - Polishing cloth for precision processing - Google Patents
Polishing cloth for precision processing Download PDFInfo
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- WO2007142235A1 WO2007142235A1 PCT/JP2007/061372 JP2007061372W WO2007142235A1 WO 2007142235 A1 WO2007142235 A1 WO 2007142235A1 JP 2007061372 W JP2007061372 W JP 2007061372W WO 2007142235 A1 WO2007142235 A1 WO 2007142235A1
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- WIPO (PCT)
- Prior art keywords
- nonwoven fabric
- layer
- polishing
- single yarn
- polishing cloth
- Prior art date
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Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/02—Synthetic macromolecular fibres
- B32B2262/0276—Polyester fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/51—Elastic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/54—Yield strength; Tensile strength
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/726—Permeability to liquids, absorption
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2429/00—Carriers for sound or information
- B32B2429/02—Records or discs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2432/00—Cleaning articles, e.g. mops, wipes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
- B32B5/022—Non-woven fabric
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
- B32B5/06—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer characterised by a fibrous or filamentary layer mechanically connected, e.g. by needling to another layer, e.g. of fibres, of paper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
- B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
Definitions
- the present invention relates to a polishing cloth for precision processing of a magnetic disk, and particularly to a polishing cloth used for texturing of a hard disk (hereinafter referred to as a textured polishing cloth).
- a desired fine uneven pattern that is, a texture is formed on a hard disk substrate before coating a magnetic thin film.
- a texture is formed on a hard disk substrate before coating a magnetic thin film.
- a flocked fabric or a woven or knitted fabric has been used as a polishing cloth for processing (JP-A-6-295432).
- the fibers are thinned.
- the abrasive grains uniformly adhere to the surface of the abrasive cloth, and when the abrasive cloth is pressed against the disk, the abrasive grains are evenly pressed against the disk surface, and the surface roughness of the disk can be reduced. It is said.
- the fiber diameter of the polishing cloth is 3 to 15 m, there is a limit to improving the processing accuracy, and it has become unable to cope with the high capacity of recent hard disks.
- the above-mentioned method of obtaining ultrafine fibers from a non-woven fabric made of sea-island yarn impregnated with a polymer elastic body by removing the sea component with an appropriate solvent and leaving the island component is as follows. There are several tens of forces in the yarn and hundreds of island component forces.Therefore, a fiber bundle that is tens of times the fiber diameter of the island component single yarn and several hundred times thicker (the single yarn is biased). There are not a few of them in the form of bundles.
- Japanese Patent Application Laid-Open No. 9 262775 proposes an ultrafine thread polishing cloth using split yarn or meltblown nonwoven fabric. According to this proposal, the melt-blown nonwoven fabric constituting the polished surface is maintained in the form by fusion of the fibers constituting the nonwoven fabric, and is not fixed with the resin, so that the removal of the resin is not performed. The problem of dropping does not occur. Moreover, since the fibers are unstretched and the fibers themselves are soft, the abrasive particles are not excessively pressed against the disk surface, so that the disk surface is rarely damaged.
- the fibers constituting the melt-blown nonwoven fabric layer are mainly fibers having a fiber diameter of 10 ⁇ m or less, and are excellent in retaining fine abrasive particles. Can be formed. Further, since the single yarn is not fixed to a resin such as a polymer elastic body, the fiber has a degree of freedom, so that it is possible to prevent deep scratches on the disk surface during surface polishing.
- An object of the present invention is to provide a polishing cloth for precision processing of a magnetic disk, in particular, a polishing cloth for texture processing having excellent polishing accuracy in texturing of a hard disk.
- the inventors of the present invention have intensively studied the polishing cloth used for precision processing of the hard disk in order to improve the information recording density of the hard disk.
- it In addition to thinning the single yarn of the polishing layer, it has a specific three-dimensional structure in which the single yarn is dispersed in the horizontal direction and the maximum height roughness of the polishing layer is 70 m or less in the vertical direction.
- a polishing cloth having specific water absorption and compression characteristics can dramatically reduce the surface average roughness of the hard disk surface, and has led to the present invention.
- the present invention is as follows.
- a polishing cloth comprising a multilayer structure sheet of two or more layers in which a single yarn-dispersed nonwoven fabric and a support are laminated.
- the single yarn-dispersed nonwoven fabric is used as the first layer of the polishing surface layer,
- the number average fiber diameter of the single yarn constituting is 0.1 to 1.7 m, the surface of the first layer is raised, and the maximum height roughness of the surface of the first layer is 70 m or less,
- Abrasive cloth for precision machining characterized in that the water absorption rate is 100 to 240 mm and the compression energy is 0.1 to 0.30 gf 'cmZcm 2
- the precision processing abrasive cloth of the present invention is obtained by subjecting a multilayer structure sheet obtained by laminating a single yarn-dispersed non-woven fabric and a support to hydrophilic treatment so that the water absorption speed described later is obtained, and then raising the single-fiber-dispersed non-woven fabric Is obtained.
- single yarn dispersion means that the single yarn does not exist unevenly and does not form a bundle (fiber bundle) in the overall observation.
- the single yarn is dispersed. Is a state where 4 or more are not adhered. Since the single yarn-dispersed non-woven fabric does not have fiber bundles, the first layer of the polished surface has excellent fiber dispersibility and smoothness. It is suitable for use as a polishing cloth for precision processing such as texturing because it can be uniformly dispersed without being pressed, and the polishing surface can be easily pressed against the disk with uniform surface pressure.
- the single yarn-dispersed nonwoven fabric may be subjected to hydrophilic processing. If the single yarn-dispersed non-woven fabric is made of a hydrophilic resin and has a water absorption rate described later, it is not necessary to perform hydrophilic processing.
- the number average fiber diameter of the single yarn of the single yarn-dispersed nonwoven fabric used for the first layer of the surface layer on the polishing side is 0.1 to 1.7 m, preferably 0.4 to 1. 5 m, more preferably 0.4 to 1.3 m. If the number average fiber diameter of the single yarn is less than 0.1 m, the single yarn strength decreases, so that it cannot withstand the force applied during texturing and the single yarn breaks. As a result, the abrasive cannon will be unevenly polished if the grinding force is insufficient in texturing that is difficult to fix.
- the above-mentioned configuration requirement that the first layer on the polishing side surface is composed of a single yarn-dispersed nonwoven fabric not containing fiber bundles, and the number average fiber diameter of the single yarn constituting the single yarn-dispersed nonwoven fabric is 0.1 to 1. Is a requirement necessary to uniformly disperse the bullets in the horizontal direction of the polishing cloth for precision processing.
- the above requirements alone cannot be said to be a precision processing polishing cloth that can sufficiently meet the currently required processing accuracy.
- the monofilament-dispersed nonwoven fabric used for the first layer on the surface on the polishing side has a lot of irregularities in the vertical direction.
- the texture processing is processed with constant pressure. In the process, a portion where the surface of the first layer does not come into uniform contact with the surface of the disk is generated, which causes agglomeration and unevenness (non-uniform dispersion) of the abrasive barrels, which makes it difficult to perform high-precision polishing. It is.
- the maximum height roughness of the first layer surface of the polishing pad for precision processing of the present invention is 70 ⁇ m or less, preferably 50 ⁇ m or less, more preferably 40 ⁇ m or less. It is important to be. If it exceeds 70 / zm, in the texturing process that is covered with constant pressure, the surface of the first layer of the abrasive cloth does not come into uniform contact with the disk surface. As a result, it becomes difficult to perform highly accurate polishing.
- the maximum height roughness of the first layer surface of the polishing pad can be measured by the method described later.
- a nonwoven fabric made of sea-island yarn produced by a composite spinning method is impregnated with a polymer elastic body, and then the sea component is removed with an appropriate solvent to form ultrafine fibers.
- the thickness of the single yarn-dispersed nonwoven fabric which is the first layer on the polishing side after surface finishing by puffing or the like is preferably 100 ⁇ m or more, more preferably 120 to 500 ⁇ m. The When the thickness is smaller than that, the influence of the support appears on the polishing-side first layer, and the maximum height roughness becomes large.
- the single yarn diameter of the fibers constituting the nonwoven fabric is preferably less than 8. O / zm, more preferably less than 4. O / zm. More preferably, it is less than 3.3 m.
- the larger the single yarn diameter of the fiber the larger the unevenness of the nonwoven fabric that is the support, thereby increasing the maximum height roughness or size of the single yarn-dispersed nonwoven fabric of the polishing first layer.
- the precision processing abrasive cloth of the present invention has a water absorption rate of 100 to 240 mm, preferably 110 to 200 mm, and more preferably 120 to 180 mm.
- the water absorption speed is less than 100 mm, the slurry liquid containing abrasive grains is not sufficiently absorbed by the surface of the polishing cloth during processing, and it is difficult to sufficiently hold the abrasive barrels. As a result, it becomes difficult to obtain a sufficient grinding amount.
- the method for providing water absorption as described above is not particularly limited, and a physical surface treatment method such as a graft polymerization treatment or a plasma treatment, and the surface is coated with an ion-exchangeable rosin oxide to be hydrophilic.
- a physical surface treatment method such as a graft polymerization treatment or a plasma treatment
- the surface is coated with an ion-exchangeable rosin oxide to be hydrophilic.
- Examples include surface coating treatment that imparts properties, and chemical surface treatment methods such as sulfonating the surface by concentrated sulfuric acid treatment.
- a method of performing hydrophilic processing using a solution of a hydrophilic component such as a surfactant can also be mentioned as a method for providing water absorption.
- nonionic surfactants that do not contain metal ions are used.
- hydrophilic resin such as copolymer polyester of polyethylene terephthalate and polyethylene glycol in order to provide water absorption. The water absorption rate can be measured by the method described later.
- the compression energy is 0. 10-0. A 30gf-cm / cm 2, preferably 0. 10 ⁇ 0. 25gf 'cmZcm 2.
- the compression energy is an index indicating the hardness of the object to be evaluated, and the greater the compression energy value, the softer the softness. If the compression energy is less than 0.10 gf'cmZcm 2 , that is, if the polishing cloth is too hard, the surface of the disk substrate is likely to be damaged although the amount of grinding is large.
- compression energy is 0.10 to 0. It is necessary that 30Gf'cmZcm 2. The compression energy can be measured by the method described later.
- the number average fiber diameter of the single yarn-dispersed nonwoven fabric needs to be 0.1 to 1.7 ⁇ m.
- the compression energy can be within an appropriate range by laminating the single yarn-dispersed nonwoven fabric with the support to form a multilayer structure sheet. That is, the compression energy can be adjusted by using the material, basis weight, thickness, and porosity of the support as adjustment factors. Also, as will be described later, a polymer elastic body can be used as a compression energy adjusting factor. In this way, by adjusting the support material, porosity, etc., it is possible to provide an appropriate cushioning property that is difficult to achieve with only a single yarn-dispersed nonwoven fabric as the polishing layer. It became possible to perform efficient polishing.
- polishing-side first layer of the precision processing polishing cloth of the present invention needs to be raised.
- Raising has the following three effects.
- puffing paper such as sandpaper at a high speed surface.
- a force applied by a method called a puffing method in which the surface is raised by rubbing is preferably coated with a surfactant on the surface before puffing.
- the surfactant it is possible to reduce the frictional force between the puffing paper and the first layer on the polishing side, to prevent the single yarn from being cut, and to improve the fiber orientation.
- the brushed length of the first layer on the polishing side is preferably 50-3000 ⁇ m, more preferably 50-2000 ⁇ m, and even more preferably 50-: L000 ⁇ m.
- the gripping ability of the abrasive cannon is sufficient, so that a sufficient amount of grinding can be obtained and the surface is soft and the surface of the disk substrate is hardly damaged.
- the raised length is 3000 ⁇ m or less, the degree of freedom of the fiber is not too large and it is appropriate, so the fine fiber in the first layer on the polishing side should be in contact with the radial direction of the disk substrate perpendicularly during processing. Is easy, and the grooves along the circumferential direction can be uniformly provided.
- the gripping ability of the abrasive particles is not excessively increased, the surface roughness of the disk substrate can be reduced.
- the standard deviation of the absorbance of the single yarn-dispersed nonwoven fabric used for the first layer is preferably 0.050 or less. If the standard deviation of absorbance is 0.050 or less, a single yarn-dispersed non-woven fabric with good fiber dispersibility is uniform, and there are few partial unevenness. It can be carried out. The standard deviation of absorbance can be measured by the method described later.
- examples of the method for producing a single yarn-dispersed nonwoven fabric include a melt blow method and a wet spun lace method.
- the melt blow method is suitable as a method for producing a single yarn-dispersed nonwoven fabric used for the first layer because it is easy to make the number average fiber diameter of the single yarn thinner than other production methods.
- the non-woven fabric manufactured by the melt-blowing method is called melt-blown non-woven fabric! O
- a melt blown nonwoven fabric suitable as one of the single yarn-dispersed nonwoven fabrics used in the present invention has a single yarn collection condition such that the standard deviation of absorbance is 0.050 or less.
- Manufactured by the melt-blowing method with added husband and controlled high-speed gas flow and accompanying flow As a method for producing a polyester melt blown nonwoven fabric, for example, a nozzle having a nozzle diameter of 0.2 to 0.4 mm and a nozzle pitch of 0.3 to 1.0 mm is used, and the intrinsic viscosity is 0.4.
- a 0 to 0.75 positive esterolate polymer is melted by calo heat and fed to a die heated to 250 to 350 ° C.
- the discharge amount per nozzle was discharged from 0.05 to 0.50 gZ from the nozzle, and the gas heated to 280 to 380 ° C from the vicinity of the opening end of this nozzle was 0.18 to 0.
- the flow of the high-speed gas flow and the accompanying flow is controlled using a rectifier as described in, for example, Japanese Patent Publication No. 62-12345.
- a method of collecting and pressing so as to obtain a desired basis weight, thickness, and bulk density can be mentioned.
- thermoplastic resin having fiber-forming ability as the resin constituting the single yarn-dispersed nonwoven fabric.
- polyesters such as polyethylene terephthalate, polybutylene terephthalate, polytrimethylene terephthalate, polyethylene terephthalate copolymer; polyamides such as nylon 6, nylon 66, nylon 12, polyamide copolymer; polyethylene, polypropylene, polymethyl Polyolefins such as pentene; Polyacrylonitriles; Bull polymers such as polystyrene and poly vinyl chloride; Aliphatic polyester polymers such as polylactic acid, lactic acid copolymer, and polydaricolic acid; Aliphatic polyester amide Based copolymers.
- Nonwoven fabric treatment methods include three-dimensional entanglement such as needle punching and water jet treatment, thermal bonding, adhesives, etc.
- three-dimensional entanglement by water jet treatment increases the density of fibers, and From the viewpoint of smoothness of the surface of the polishing cloth, it is preferable.
- the polyester fiber when the fiber constituting the single yarn-dispersed nonwoven fabric is polyester, the polyester fiber preferably has a crystallinity of 35% or more. If the degree of crystallinity is 35% or more, the single yarn strength is high, so it can withstand the force applied during texturing and the single yarn will not break. As a result, the abrasive cannons are fixed and can easily be ground to obtain a sufficient grinding force in texturing. In addition, depending on conditions such as the puffing paper barrel and load, it is easy to fabricate an abrasive cloth in which the single yarn is not cut during the puffing cache.
- the strength of the polyester fiber tends to decrease as the intrinsic viscosity decreases.
- the crystallinity is 35% or more, Good results are also obtained when a polyester with a low intrinsic viscosity is selected to reduce the number average fiber diameter of the single yarn dispersed nonwoven fabric.
- the polymer elastic body is not particularly limited, but it is easy to impregnate and has good cushioning properties as an abrasive cloth.
- Polyurethane is preferable.
- solvent-based polyurethane, water-based polyurethane and the like can be used, and water-based polyurethane is preferred because of its low environmental impact and low manufacturing cost.
- Examples of the polyurethane component that is preferably used in the emulsion as the water-based polyurethane include the following.
- Examples of the polyol component include polyester polyols such as polyethylene adipate glycol and polybutylene adipate glycol; polyether polyols such as polyethylene glycol and polytetramethylene glycol; and polycarbonate polyols.
- Examples of the isocyanate component include aromatic diisocyanates such as 4,4'-diphenylmethane diisocyanate; alicyclic diisocyanates such as 4,4'-dicyclohexylmethane diisocyanate; aliphatic diisocyanates such as hexamethylene diisocyanate. Etc.
- chain extender examples include glycols such as ethylene glycol; diamines such as ethylenediamine, hexamethylenediamine, and 4,4′-dicyclohexylmethanediamine. Polyurethanes in which the above various components are appropriately combined can be used.
- the content of the polymer elastic body is preferably 30 to 20 wt% or less with respect to the polishing cloth, more preferably 0.5 to 20 wt%, still more preferably 1 to: LOwt%. Depending on the content, the surface condition, cushioning properties, hardness, and polishing performance of the polishing cloth can be adjusted. If the content of the polymer elastic body is 30 wt% or less, the effect of adding the polymer elastic body can be sufficiently obtained, a sufficient amount of grinding and precise control of the grinding can be achieved, and a good texture can be obtained. Workability and productivity can be obtained.
- the thickness of the single yarn-dispersed nonwoven fabric constituting the precision processing abrasive cloth is preferably 100 ⁇ m or more, more preferably 120 to 500 111.
- the polishing cloth is pressed against the disc by a rubber roll or the like, with the opposite force to the polishing layer.
- the thickness of the single yarn-dispersed nonwoven fabric is less than 100 m, there is a concern that the influence of the support appears on the polishing layer side, and high-precision processing becomes difficult.
- the thickness of the single yarn-dispersed nonwoven fabric is preferably 100 ⁇ m or more.
- the polishing cloth of the present invention has the following 1.
- the elongation in the longitudinal direction (MD direction) when loaded with OkgfZcm is preferably 4% or less, more preferably 3% or less, and 1.
- the elongation in the longitudinal direction (CD direction) when loaded with OkgfZcm is preferably 12% or less, more preferably 9% or less. If the elongation in the MD direction and the elongation in the CD direction are within the above ranges, the polishing cloth can be pressed uniformly against the surface of the disk substrate, so a fine and uniform uneven pattern can be processed. Is possible.
- the polishing cloth of the present invention it is preferable to puff the polishing-side first layer.
- the noffing material for example, # 100 to # 1000 puffing paper can be used, and a suitable range can be appropriately selected for the processing speed and the number of times.
- the fibers on the first layer on the polishing side are sufficiently fixed, and the puffing pages of # 150 to # 300 are relatively rough. A part can be used. Also, if the polymer elastic body is not impregnated, it is relatively fine! /, By using a # 400 to # 600 puffing paper, it is processed several times, so that the smoothness of the first layer on the polishing side Can improve the maximum height roughness performance.
- examples of the support include nonwoven fabrics such as short fiber nonwoven fabrics and long fiber nonwoven fabrics, porous materials, and films. Of these, non-woven fabrics are desirable because they have a high porosity and a high cushioning property and are excellent in caulking properties.
- a nonwoven fabric used as a support for example, after carding, it is formed into a sheet with a cross layer, an air layer, etc., and entangled with a needle cloth-one-punch method, or a dry spunlace method entangled with a columnar water flow Wet spunlace method, normal spunbond method, etc. Is mentioned.
- the woven fabric has a large surface roughness
- the surface is greatly affected by the surface roughness of the woven fabric.
- the surface roughness of the first layer on the polishing side increases, and precise texture processing may be difficult.
- it since there is a large difference in fiber diameter between the fibers constituting the woven fabric and the single yarn-dispersed nonwoven fabric of the first layer on the polishing side, it may be difficult to directly entangle the two into a nonwoven fabric.
- the polishing cloth for precision processing of the present invention has a three-dimensional structure in which single yarn dispersion is performed in the horizontal direction and the maximum height roughness of the surface of the first layer on the polishing side is 70 m or less in the vertical direction.
- ultramicrotome (ULTRACUT-N: made by REICHERT) as a polishing cloth sample. Then, it was cut in the cross-sectional direction, and this was observed with a scanning electron microscope CFSM-5510 (JEOL Ltd.), and an image with an acceleration voltage of 20 kV and a magnification of 50 was taken. The thickness of any 10 single yarn dispersed nonwoven fabrics was measured, and the arithmetic average value thereof was taken as the thickness of the single yarn dispersed nonwoven fabric.
- the basis weight (gZm 2 ) is measured in accordance with JIS L 1096-1999, and the thickness (mm) is measured using a dial thickness gauge (Peacock: manufactured by Ozaki Mfg. Co., Ltd.) with 20 samples. The average value was used.
- the surface of the single yarn-dispersed non-woven fabric was 3D Real Surface View Microscope (VE-9800: manufactured by Keyence Corporation) ), And an image with a magnification of 50 times was taken.
- the maximum height roughness (the difference in height between the top and bottom of the roughness curve) of a 2 mm long abrasive cloth sample was measured per measurement. This measurement was performed 10 times. Evaluation was made using the average of the 10 measurements.
- Abrasive cloth sample was cut in the cross-section direction using an ultramicrotome (ULTRACUT-N: manufactured by REICHERT), and observed with a scanning electron microscope CFSM-5510 (manufactured by JEOL Ltd.). Magnification at an acceleration voltage of 20 kV A 500x image was taken. Any 10 images was observed, and the presence or absence of a fiber bundle forming a bundle shape was confirmed as a single yarn was present in a biased manner
- the single yarn-dispersed nonwoven fabric of the polishing side first layer was peeled off from the polishing sheet, and the heat of fusion was measured with a differential scanning calorimeter (DSC-60: manufactured by Shimadzu Corporation) (temperature rising rate was 20 ° CZ min. The sample weight is about 5mg). If the heat of fusion per unit mass measured is ⁇ ⁇ , the crystallinity (Xc) can also be calculated by the following formula force. Where ⁇ ⁇ is the unit mass of the crystal
- KES-G5 manufactured by Kato Tech Co., Ltd.
- the test conditions are as follows.
- compression energy was obtained from a correlation diagram between pressure and deformation. It means that it is easy to compress, ie, it is soft, so that compression energy is large. The smaller the compression energy is, the harder it is.
- PET Polyethylene terephthalate
- the obtained melt-blown nonwoven fabric had a basis weight of 60 gZm 2 , a thickness of 280 ⁇ m, a single yarn number average fiber diameter of 1. O ⁇ m, and a standard deviation of absorbance of 0.032.
- a PET fiber having a single yarn diameter of 3.2 m was produced by a direct spinning method, and short fibers cut to a length of 5. Omm were dispersed in water to obtain a papermaking slurry.
- the slurry was papermaking, papermaking sheet basis weight 42gZm 2 (A), and were prepared papermaking sheet basis weight 17gZm 2 (B).
- a three-dimensional entanglement is performed by jetting a high-speed water flow while sucking from below so that the static pressure becomes 20 kPa.
- a multi-layered sheet was produced.
- the high-speed water flow was continuously jetted at a pressure of 3. OMPa from a nozzle with a diameter of 0.2 mm arranged in a row at a pitch of 3. Omm, and the high-pressure water flow collided with the sheet at a position 30 mm from the nozzle. .
- this multilayer structure sheet was impregnated with water-based polyether polyurethane emulsion (AP-18: manufactured by Nikka Chemical Co., Ltd.) so as to be 12 wt% with respect to the multilayer structure sheet.
- the polyurethane was coagulated by drying with a hot air dryer (130 ° CX for 3 minutes).
- the surfactant (Emulgen 120: manufactured by Kao Corporation) is included to 0.5 wt%. It was immersed and dried with a hot air dryer (130 ° C. X 2 minutes). This processing makes it possible to improve water absorption.
- a textured polishing cloth was obtained.
- the single yarn-dispersed non-woven fabric that is the first layer on the polishing side of the obtained textured polishing cloth has a number average fiber diameter of 1. O ⁇ m, a thickness of 160 m, and a maximum height roughness of 42 m. There were no fiber bundles observed.
- the obtained polishing cloth was slit into a 38 mm width, and a disk substrate having a Ni—P plating and a polish cache on an aluminum plate was textured under the following conditions.
- Polishing cloth supply speed lOcmZ min
- the surface average roughness (Ra) of the processed disk substrate was measured and found to be 0.31 nm.
- melt blown nonwoven fabric In the production of the melt blown nonwoven fabric, the weight per unit area was 60 gZm 2 , the thickness was 280 m, the number average fiber diameter of the single yarn was 0.6 ⁇ A melt blown nonwoven fabric with a standard deviation of 0.028 was obtained. Next, using the obtained melt blown nonwoven fabric, in the same manner as in Example 1, production of a textured polishing cloth and textured 'Ra measurement were performed.
- the number average fiber diameter of the single yarn constituting the melt blown nonwoven fabric can be reduced to 0.6 m by reducing the single-hole discharge rate to half that of Example 1, and the single yarn fine diameter can be reduced. As a result, it was possible to reduce the maximum height roughness of the surface of the first layer on the polishing side of the textured polishing cloth to 34 ⁇ m, and the fiber bundles were not observed. The surface roughness (Ra) of the disk substrate after texturing was measured and found to be 0.26 nm. [0089] [Example 3]
- melt blown nonwoven fabric in the same manner as in Example 1 except that nylon 6 (UBE nylon 1011FB: manufactured by Ube Industries Co., Ltd.) was used as the polymer, the basis weight was 60 gZm 2 , the thickness was 280 / ⁇ ⁇ , and the number average of single yarn A melt blown nonwoven fabric having a fiber diameter of 1.4 / ⁇ ⁇ and a standard deviation of absorbance of 0.038 was obtained.
- production of a textured polishing cloth and textured 'Ra measurement were performed.
- Example 2 Obtained in the same manner as in Example 1, using a melt blown nonwoven fabric having a basis weight of 60 gZm 2 , a thickness of 280 / ⁇ ⁇ , a single yarn number average fiber diameter of 1. O ⁇ m, and a standard deviation of absorbance of 0.032, and having a multilayer structure Single yarn-dispersed non-woven fabric surface, which is the first layer on the polishing side, with a paper speed of lOOOOmZ, using # 500 buffing paper (C54P500: manufactured by Riken Chemical Co., Ltd.) without impregnating the sheet with polyether water-based polyurethane emulsion.
- # 500 buffing paper C54P500: manufactured by Riken Chemical Co., Ltd.
- Average fiber diameter is 1. O ⁇ m, thickness is 110 / ⁇ ⁇ , and maximum height roughness is 56 / zm and no fiber bundles were observed.
- the average surface roughness (Ra) of the textured disk substrate was measured and found to be 0.42 nm.
- Example 2 Obtained in the same manner as in Example 1, using a melt blown nonwoven fabric having a basis weight of 60 gZm 2 , a thickness of 280 / ⁇ ⁇ , a single yarn number average fiber diameter of 1. O ⁇ m, and a standard deviation of absorbance of 0.032, and having a multilayer structure Except that the sheet is not impregnated with the polyether-based aqueous polyurethane emulsion, the production of the textured polishing cloth and the texture processing 'Ra measurement are performed in the same manner as in Example 1. Was carried out.
- the smoothness of the polishing layer was poor.
- the maximum height roughness of the surface was 98 ⁇ m, and the maximum height roughness was about twice that of Example 1 impregnated with a polymer elastic body.
- the surface roughness (Ra) of the disk substrate after texturing was measured and found to be 0.68 nm.
- the surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.61 ⁇ m.
- Polyester copolymer polymer (PET copolymerized with polyethylene dallic acid having a molecular weight of 4000%) was used for the sea component, and regular type PET (intrinsic viscosity 0.65) was used for the island component.
- PET copolymerized with polyethylene dallic acid having a molecular weight of 4000% was used for the sea component
- regular type PET intrinsic viscosity 0.65
- Each of these two types of polymer is weighed with a gear pump, and the sea component is 35 wt% and the island component is 65 wt%.
- An undrawn yarn was obtained by melt spinning at ° C.
- the obtained undrawn yarn was heat-drawn at a temperature of 75 ° C and draw ratio of 2.8, and heat-set at 130 ° C, and the island component fiber diameter was 1.2 m. (Fiber diameter 14.8 m) was obtained.
- the obtained sea-island type composite fiber was cut to 5. Omm and dispersed in water to make a papermaking slurry. This slurry is made into a paper sheet (B) having a basis weight of 17 gZm 2 and a basis weight of 150 g.
- a Zm 2 paper sheet (D) was produced.
- a multilayered structure sheet (E) was produced.
- the high-speed water flow was continuously injected at a pressure of 3. OMPa from a nozzle with a diameter of 0.2 mm arranged in a row at a pitch of 3. Omm, and a high-pressure water flow was made to collide with the sheet at a position 30 mm from the nozzle.
- the obtained multilayer structure sheet (E) is impregnated with a dimethylformamide (DMF) solution of a solvent-based polyether polyurethane emulsion in an amount of 26 wt% with respect to the multilayer structure sheet, and immersed in a water bath.
- the polyurethane was coagulated (wet coagulation), and then dried with a hot air dryer (130 ° CX 3 minutes).
- sea components were eluted with a 5 wt% NaOH aqueous solution at 80 ° C. to form ultrafine fibers having a number average fiber diameter of 1.2 m.
- JSM-5510 manufactured by JEOL Ltd.
- Example 2 As in Example 1, the texture processing 'Ra measurement was performed. As a result, the surface average roughness (Ra) of the disk substrate after texture addition was 0.84 nm.
- a melt blown nonwoven fabric was produced in the same manner as in Example 1 except that the heating air temperature was 340 ° C.
- the resulting meltblown nonwoven fabric had a basis weight of 60 gZm 2 , a thickness of 280 m, a number average fiber diameter of single yarn of 1.8 / ⁇ ⁇ , and a standard deviation of absorbance of 0.046.
- the maximum height roughness of the surface of the single yarn-dispersed nonwoven fabric, which is the first layer on the polishing side, is 70 m or less. Force The heating air temperature in the production of the melt blown nonwoven fabric was low (in Example 1, at 365 ° C). Therefore, the number average fiber diameter of the melt blown nonwoven fabric increases, and the dispersibility of the abrasive grains in the horizontal direction deteriorates. As a result, the surface flatness of the disk substrate after texturing is reduced. It is thought that the average roughness (Ra) has increased.
- a melt blown nonwoven fabric was produced in the same manner as in Example 1 except that the heating air temperature was set to 315 ° C and the rectifier was not used.
- the resulting meltblown nonwoven fabric had a basis weight of 60 gZ m 2 , a thickness of 280 / ⁇ ⁇ , a number average fiber diameter of single yarn of 2.5 / ⁇ ⁇ , and a standard deviation of absorbance of 0.068.
- melt blown nonwoven fabric in the same manner as in Example 1 except that nylon 6 (UBE nylon 1011FB: manufactured by Ube Industries) was used as the polymer, the basis weight was 60 gZm 2 , the thickness was 280 / ⁇ ⁇ , and the number average of single yarn A melt blown nonwoven fabric having a fiber diameter of 1.O ⁇ m and a standard deviation of absorbance of 0.032 was obtained.
- nylon 6 UE nylon 1011FB: manufactured by Ube Industries
- a multilayer structure sheet was produced in the same manner as in Example 1, and then not impregnated with a surfactant, dimethylformamide (DMF) of a solvent-based polyether polyurethane emulsion Except that the solution was impregnated so as to be 1 lwt% with respect to the multilayer structure sheet, the production of the textured polishing cloth and the textured 'Ra measurement were performed in the same manner as in Example 3. .
- a surfactant dimethylformamide (DMF) of a solvent-based polyether polyurethane emulsion
- the surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.58 ⁇ m.
- Example 1 Using a melt blown nonwoven fabric obtained in the same manner as in Example 1, having a basis weight of 60 gZm 2 , a thickness of 280 / ⁇ ⁇ , and a single yarn number average fiber diameter of 1. O ⁇ m and a standard deviation of absorbance of 0.032 A multilayer structure sheet was produced in the same manner as in 1.
- a dimethylformamide (DMF) solution of a solvent-based polycarbonate polyurethane emulsion is immersed in the multilayer structure sheet so as to be 34 wt% with respect to the multilayer structure sheet.
- DMF dimethylformamide
- hot air except for drying with a dryer (130 ° CX for 3 minutes), the production of a textured polishing cloth and the textured 'Ra measurement were carried out in the same manner as in Example 1.
- the surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.59 ⁇ m.
- melt-blown nonwoven fabric Using the obtained melt-blown nonwoven fabric, an attempt was made to produce a textured polishing cloth in the same manner as in Example 1.
- melt blown nonwoven fabric surface which is the first layer on the polishing side
- the crystallinity of the single yarn-dispersed nonwoven fabric as the polishing-side first layer was measured and found to be 27.2%.
- Example 1 Using a melt-blown nonwoven fabric obtained in the same manner as in Example 1, having a basis weight of 30 gZm 2 , a thickness of 140 / ⁇ ⁇ , a single yarn number average fiber diameter of 1. O ⁇ m, and a standard deviation of absorbance of 0.032 A multilayer structure sheet was produced in the same manner as in 1.
- Tables 1 and 2 show the structures and physical properties of the polishing cloths produced in the above Examples and Comparative Examples.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Nonwoven Fabrics (AREA)
- Reinforced Plastic Materials (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
A polishing cloth for precision processing which comprises a multilayered sheet composed of two or more superposed layers comprising a single-yarn-dispersed nonwoven fabric and a support. It is characterized in that the single-yarn-dispersed nonwoven fabric is the first layer, i.e., the outermost layer, on the polishing side, the single yarns constituting the single-yarn-dispersed nonwoven fabric have a number-average fiber diameter of 0.1-1.7 µm, the surface of the first layer has been raised, and the first-layer surface has a maximum height/roughness of 70 µm or less, water absorption rate of 100-240 mm, and compression energy of 0.10-0.30 gf•cm/cm2.
Description
明 細 書 Specification
精密加工用研磨布 Abrasive cloth for precision processing
技術分野 Technical field
[0001] 本発明は、磁気ディスクの精密加工用研磨布、特に、ハードディスクのテクスチャー 加工に用いられる研磨布(以下、テクスチャー加工用研磨布という)に関するものであ る。 [0001] The present invention relates to a polishing cloth for precision processing of a magnetic disk, and particularly to a polishing cloth used for texturing of a hard disk (hereinafter referred to as a textured polishing cloth).
背景技術 Background art
[0002] 近年、コンピューター及びデジタルカメラ、携帯電話、映像音楽記録再生機器等の 高性能化 ·小型化 ·記録の大容量化が進んで 、る。これらを可能として 、る要因の一 つ力 情報の高密度記録化であり、ハードディスクはデータの書き込み及び読み出し 等のアクセス速度が速く容量単価の安 、磁気記録媒体の一つであるため、多くの電 子機器類に搭載され、一般家庭にも広く普及してきている。 In recent years, computers, digital cameras, mobile phones, video and music recording / playback devices, etc. have been improved in performance, size and recording capacity. One of the factors that make these possible is the high-density recording of information, and the hard disk is one of the magnetic recording media because it has a high access speed for data writing and reading, etc. It is installed in electronic devices and has become widespread in ordinary households.
[0003] ハードディスクの一般的な製法においては、磁性薄膜をコーティングする前にハー ドディスク基板に所望の微細な凹凸パターン、すなわちテクスチャーを加工形成する 。このテクスチャーを加工形成することにより、磁気ヘッドと接触した際の傷の抑制、 磁気ディスクへの磁気ヘッドの吸着防止、磁気異方性を高め情報記録密度の向上 等の効果がある。 In a general manufacturing method of a hard disk, a desired fine uneven pattern, that is, a texture is formed on a hard disk substrate before coating a magnetic thin film. By processing and forming this texture, there are effects such as suppression of scratches when in contact with the magnetic head, prevention of adsorption of the magnetic head to the magnetic disk, increase of magnetic anisotropy, and improvement of information recording density.
[0004] 近年、加速度的に開発が進むハードディスクの情報記録密度の向上のためには、( 1)磁気ヘッドの低浮上化、(2) CSS (コンタクト 'スタート 'アンド'ストップ)動作時のへ ッドクラッシュと磁気ヘッドの吸着抑制、を目的としたテクスチャーの更なる微細化、す なわち、ディスク表面の凹凸の平均深さに代表される表面平均粗さ (Ra)の低減が必 要であり、そのためには、研磨精度の向上が極めて重要である。 [0004] In order to improve the information recording density of hard disks, which are being developed at an accelerated pace in recent years, (1) magnetic heads have low flying height, and (2) CSS (contact 'start' and 'stop) operation It is necessary to further refine the texture for the purpose of suppressing crush and magnetic head adsorption, that is, to reduce the surface average roughness (Ra) represented by the average depth of the irregularities on the disk surface. For that purpose, improvement of polishing accuracy is extremely important.
[0005] これら、ハードディスク基板のテクスチャー加工用研磨布としては、従来から、研磨 布を構成する繊維の直径を細くすることにより研磨性能を向上させるという提案が数 多くなされている。 [0005] Conventionally, as a polishing cloth for texturing of a hard disk substrate, many proposals have been made to improve the polishing performance by reducing the diameter of the fibers constituting the polishing cloth.
[0006] 例えば、従来のテクスチャー加工の方法としては、加工用研磨布として植毛布や織 編物が用いられていた (特開平 6— 295432号公報)。この方法によれば、繊維を細
くすると研磨布の表面に研磨砥粒が均一に付着し、研磨布をディスクに押し付けた 際に研磨砥粒が均等にディスク表面に押し付けられ、ディスクの表面粗さを低減する ことが可能となると言われている。し力し、研磨布の繊維径は 3〜 15 mであるため、 加工精度を向上させるには限界があり、最近のハードディスクの高容量ィヒには十分 対応できなくなった。 [0006] For example, as a conventional texture processing method, a flocked fabric or a woven or knitted fabric has been used as a polishing cloth for processing (JP-A-6-295432). According to this method, the fibers are thinned. As a result, the abrasive grains uniformly adhere to the surface of the abrasive cloth, and when the abrasive cloth is pressed against the disk, the abrasive grains are evenly pressed against the disk surface, and the surface roughness of the disk can be reduced. It is said. However, since the fiber diameter of the polishing cloth is 3 to 15 m, there is a limit to improving the processing accuracy, and it has become unable to cope with the high capacity of recent hard disks.
[0007] 最近では、複合紡糸法により作製された海島糸から成る不織布において、不織布 に高分子弾性体を含浸させた後、適当な溶媒で海成分を除去することによって極細 繊維を形成させ、さらに片面、或いは、両面を起毛させることによりテクスチャー加工 用研磨布を得るという提案が種々なされており(特開 2002— 79472号公報、特開 2 003— 170348号公報、特開 2004— 130395号公報など)、テクスチャー加工用研 磨布の主流となっている。この種の加工用研磨布は、海島糸を用いることによって単 糸の繊維径が 1. 9 m以下の極細繊維となり、従来の織編物の繊維径 (約 5 m)よ りはるかに細いため、テクスチャー加工の精度を向上させることが可能である。 [0007] Recently, in a nonwoven fabric made of sea-island yarn produced by a composite spinning method, after impregnating the nonwoven fabric with a polymer elastic body, an ultrafine fiber is formed by removing sea components with an appropriate solvent, Various proposals have been made to obtain a polishing cloth for texturing by raising one side or both sides (JP 2002-79472 A, JP 2 003-170348 A, JP 2004-130395 A, etc.) ), Which is the mainstream of textured polishing cloth. This type of polishing cloth for processing is made of ultra-fine fibers with a fiber diameter of 1.9 m or less using Umijima yarn, which is much thinner than the fiber diameter of conventional knitted and knitted fabrics (about 5 m). It is possible to improve the accuracy of texturing.
[0008] しかし、高分子弾性体を含浸させた海島糸から成る不織布から、適当な溶媒で海 成分を除去して島成分を残すことにより極細繊維を得るという上記の方法は、 1本の 海島糸の中に数十本力 数百本の島成分力 なる単糸があるため、島成分の単糸 の繊維径の数十倍力 数百倍の太さである繊維束 (単糸が偏って存在し、束状を形 成している状態)が少なからず存在することとなる。 [0008] However, the above-mentioned method of obtaining ultrafine fibers from a non-woven fabric made of sea-island yarn impregnated with a polymer elastic body by removing the sea component with an appropriate solvent and leaving the island component is as follows. There are several tens of forces in the yarn and hundreds of island component forces.Therefore, a fiber bundle that is tens of times the fiber diameter of the island component single yarn and several hundred times thicker (the single yarn is biased). There are not a few of them in the form of bundles.
[0009] このような繊維束が存在すると、テクスチャー加工用研磨布として用いたとき、研磨 層の表面粗さを小さくすることが困難となる。即ち、ディスクに研磨面を均等な面圧で 押し当てることが困難となり、ディスクの表面粗さを低減させるには限界がある。更に、 繊維束の周辺では大きな凹部が発生し易ぐそのため、繊維束周辺では研磨砥粒が 凝集し易くなり、その凝集した研磨砥粒はディスク表面を局部的に研削し、深い傷を 付けてしまうという問題があった。 [0009] When such a fiber bundle is present, it is difficult to reduce the surface roughness of the polishing layer when used as a textured polishing cloth. That is, it becomes difficult to press the polishing surface against the disc with uniform surface pressure, and there is a limit to reducing the surface roughness of the disc. In addition, large recesses are likely to occur around the fiber bundle, so that abrasive grains easily aggregate around the fiber bundle. The aggregated abrasive grains locally grind the disk surface and cause deep scratches. There was a problem that.
[0010] 一方、繊維束が存在しな!、テクスチャー加工用研磨布として、特開平 9 262775 号公報には、割繊糸ゃメルトブロー不織布を用いた極細糸の研磨布が提案されてい る。この提案によれば、研磨面を構成するメルトブロー不織布は、不織布を構成する 繊維同士の融着によって形態が保たれており、榭脂で固定していないため榭脂の脱
落という問題は生じない。しかも繊維は未延伸で、繊維自体が柔らかいため、研磨粒 子を過度にディスク表面に押圧しないので、ディスク表面に大きな傷を付けることが 少ない。 [0010] On the other hand, there is no fiber bundle! As a textured polishing cloth, Japanese Patent Application Laid-Open No. 9 262775 proposes an ultrafine thread polishing cloth using split yarn or meltblown nonwoven fabric. According to this proposal, the melt-blown nonwoven fabric constituting the polished surface is maintained in the form by fusion of the fibers constituting the nonwoven fabric, and is not fixed with the resin, so that the removal of the resin is not performed. The problem of dropping does not occur. Moreover, since the fibers are unstretched and the fibers themselves are soft, the abrasive particles are not excessively pressed against the disk surface, so that the disk surface is rarely damaged.
[0011] また、メルトブロー不織布層を構成する繊維が、主として繊維径 10 μ m以下の繊維 であり、微細な研磨粒子の保持性に優れているため、ディスク表面を均一に研磨し、 微細なテクスチャーを形成することができる。また、単糸が高分子弾性体などの榭脂 に固定されていないので繊維に自由度があるため、表面研磨の際にディスク表面に 深 ヽ傷を付けることを防止することができる。 [0011] Further, the fibers constituting the melt-blown nonwoven fabric layer are mainly fibers having a fiber diameter of 10 μm or less, and are excellent in retaining fine abrasive particles. Can be formed. Further, since the single yarn is not fixed to a resin such as a polymer elastic body, the fiber has a degree of freedom, so that it is possible to prevent deep scratches on the disk surface during surface polishing.
[0012] しかしながら、テクスチャー加工では、研磨布の背面をゴムロールで押さえてデイス ク表面に研磨面を押圧するため、繊維自体の柔らかさに加え、研磨布全体の柔らか さが重要となってくる。また、繊維径が細いメルトブロー不織布は、比表面積が大きい ため、研磨砲粒と接触する面積は大きぐ研磨性能の向上には効果的である。しかし 、ポリプロピレンやポリエステルなどの疎水性熱可塑性榭脂からなるメルトブロー不織 布の場合は、研磨砥粒を含んだスラリー液を滴下しても、スラリー液が均一に拡散せ ず、テクスチャー加工精度が不十分になるという問題があった。すわなち、特開平 9 - 262775号公報に開示されて 、る研磨布では、テクスチャーの加工精度を向上さ せるためには限界があった。 However, in texture processing, since the back surface of the polishing cloth is pressed with a rubber roll and the polishing surface is pressed against the disk surface, the softness of the entire polishing cloth is important in addition to the softness of the fibers themselves. In addition, a melt blown nonwoven fabric with a small fiber diameter has a large specific surface area, so that the area in contact with the abrasive cannon is large, which is effective for improving the polishing performance. However, in the case of a melt blown nonwoven fabric made of hydrophobic thermoplastic resin such as polypropylene or polyester, even if a slurry liquid containing abrasive grains is dropped, the slurry liquid does not diffuse uniformly, and the texturing accuracy is high. There was a problem of becoming insufficient. In other words, the polishing cloth disclosed in Japanese Patent Laid-Open No. 9-262775 has a limit for improving the texture processing accuracy.
[0013] 以上のように、従来の技術では、最近求められているハードディスクの情報記録密 度の向上に十分に対応できるテクスチャー加工用研磨布を得ることは困難であり、加 ェ精度のさらなる向上が可能なテクスチャー加工用研磨布が切望されている。 [0013] As described above, with the conventional technology, it is difficult to obtain a textured polishing cloth that can sufficiently cope with the recently demanded improvement in the information recording density of hard disks, and further improvement in processing accuracy is achieved. There is a strong demand for a polishing cloth that can be textured.
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0014] 本発明は、磁気ディスクの精密加工用研磨布、特に、ハードディスクのテクスチャー 加工において研磨精度の優れるテクスチャー加工用研磨布を提供することを目的と するものである。 [0014] An object of the present invention is to provide a polishing cloth for precision processing of a magnetic disk, in particular, a polishing cloth for texture processing having excellent polishing accuracy in texturing of a hard disk.
課題を解決するための手段 Means for solving the problem
[0015] 本発明者らは、ハードディスクの情報記録密度を向上させるために、ハードディスク を精密加工するために用いられる研磨布にっ 、て鋭意検討を進めた結果、研磨布
の研磨層の単糸を細くすることに加え、水平方向には単糸分散であり、鉛直方向に は研磨層の最大高さ粗さが 70 m以下であるという特定の三次元構造を有し、更に 、特定の吸水性と圧縮特性を有する研磨布が、ハードディスク表面の表面平均粗さ を画期的に低減させ得ることを見出し、本発明をなすに至った。 [0015] The inventors of the present invention have intensively studied the polishing cloth used for precision processing of the hard disk in order to improve the information recording density of the hard disk. In addition to thinning the single yarn of the polishing layer, it has a specific three-dimensional structure in which the single yarn is dispersed in the horizontal direction and the maximum height roughness of the polishing layer is 70 m or less in the vertical direction. Furthermore, it has been found that a polishing cloth having specific water absorption and compression characteristics can dramatically reduce the surface average roughness of the hard disk surface, and has led to the present invention.
即ち、本発明は下記の通りである。 That is, the present invention is as follows.
[0016] (1)単糸分散不織布と支持体を積層した 2層以上の多層構造シートからなる研磨 布であり、単糸分散不織布を研磨側の表層の第一層とし、単糸分散不織布を構成す る単糸の数平均繊維径は 0. 1〜1. 7 mであり、第一層の表面が起毛されており、 第一層表面の最大高さ粗さが 70 m以下であり、吸水速度が 100〜240mm、圧縮 エネルギーが 0. 10〜0. 30gf' cmZcm2であることを特徴とする精密加工用研磨布 [0016] (1) A polishing cloth comprising a multilayer structure sheet of two or more layers in which a single yarn-dispersed nonwoven fabric and a support are laminated. The single yarn-dispersed nonwoven fabric is used as the first layer of the polishing surface layer, The number average fiber diameter of the single yarn constituting is 0.1 to 1.7 m, the surface of the first layer is raised, and the maximum height roughness of the surface of the first layer is 70 m or less, Abrasive cloth for precision machining, characterized in that the water absorption rate is 100 to 240 mm and the compression energy is 0.1 to 0.30 gf 'cmZcm 2
[0017] (2)単糸分散不織布がメルトブロー不織布であることを特徴とする上記 1に記載の 精密加工用研磨布。 [0017] (2) The precision processing abrasive cloth according to the above item 1, wherein the single yarn-dispersed nonwoven fabric is a melt blown nonwoven fabric.
(3)第一層の単糸分散不織布の厚みが 100 μ m以上であることを特徴とする上記 1 または 2に記載の精密加工用研磨布。 (3) The polishing cloth for precision machining as described in 1 or 2 above, wherein the thickness of the single-layer dispersed nonwoven fabric of the first layer is 100 μm or more.
[0018] (4)第一層に使用する単糸分散不織布が、標準偏差 0. 050以下の吸光度を有す ることを特徴とする上記 1〜3のいずれかに記載の精密加工用研磨布。 [0018] (4) The precision processing abrasive cloth according to any one of 1 to 3 above, wherein the single yarn-dispersed nonwoven fabric used for the first layer has an absorbance with a standard deviation of 0.050 or less. .
(5)第一層の単糸分散不織布がポリエステル繊維カゝら成り、該ポリエステル繊維の 結晶化度が 35%以上であることを特徴とする上記 1〜4のいずれかに記載の精密加 ェ用研磨布。 (5) The precision treatment as described in any one of (1) to (4) above, wherein the single-layer dispersed nonwoven fabric of the first layer is made of polyester fiber, and the crystallinity of the polyester fiber is 35% or more. Abrasive cloth.
[0019] (6)多層構造シート中に高分子弾性体が含浸されていることを特徴とする上記 1〜 5の 、ずれかに記載の精密加工用研磨布。 [0019] (6) The polishing cloth for precision processing as described in any one of 1 to 5 above, wherein the multilayer structure sheet is impregnated with a polymer elastic body.
(7)高分子弾性体が、多層構造シートに対して 30wt%以下で付与されていること を特徴とする上記 1〜6のいずれかに記載の精密加工用研磨布。 (7) The polishing cloth for precision machining as described in any one of 1 to 6 above, wherein the polymer elastic body is applied to the multilayer structure sheet at 30 wt% or less.
[0020] (8)高分子弾性体がポリウレタンであることを特徴とする上記 1〜7のいずれかに記 載の精密加工用研磨布。 [8] The precision processing polishing cloth as described in any one of [1] to [7] above, wherein the polymer elastic body is polyurethane.
(9) 1. OkgfZcm荷重時の長手方向の伸度が 4%以下、幅方向の伸度が 12%以 下であることを特徴とする上記 1〜8のいずれかに記載の精密加工用研磨布。
[0021] (10)支持体が不織布であることを特徴とする上記 1〜9のいずれかに記載の精密 加工用研磨布。 (9) 1. Polishing for precision machining according to any one of 1 to 8 above, wherein the elongation in the longitudinal direction when loaded with OkgfZcm is 4% or less and the elongation in the width direction is 12% or less. cloth. [0021] (10) The polishing cloth for precision machining as described in any one of 1 to 9 above, wherein the support is a nonwoven fabric.
(11)支持体が、織物の両面に繊維径 10 m以下の極細繊維層を積層させた積 層体であることを特徴とする上記 1〜10のいずれかに記載の精密加工用研磨布。 (11) The precision processing abrasive cloth according to any one of the above items 1 to 10, wherein the support is a laminate obtained by laminating ultrafine fiber layers having a fiber diameter of 10 m or less on both surfaces of the woven fabric.
[0022] 以下、本発明について詳細に説明する。 [0022] Hereinafter, the present invention will be described in detail.
本発明の精密加工用研磨布は、単糸分散している不織布と支持体を積層した多層 構造シートに、後述する吸水速度になるよう親水加工を施した後、単糸分散不織布 を起毛することにより得られる。 The precision processing abrasive cloth of the present invention is obtained by subjecting a multilayer structure sheet obtained by laminating a single yarn-dispersed non-woven fabric and a support to hydrophilic treatment so that the water absorption speed described later is obtained, and then raising the single-fiber-dispersed non-woven fabric Is obtained.
[0023] 本発明において、単糸分散とは、全体的な観察において、単糸が偏って存在して おらず、束状 (繊維束)を形成していないことを言い、好ましくは、単糸が 4本以上固 着していないで分散している状態をいう。単糸分散不織布は、繊維束を有していない ため、研磨面の第一層の繊維分散性及び平滑性が極めて優れており、その結果、テ タスチヤ一加工を行う際、研磨砲粒は凝集することがなく均一に分散し、更に、デイス クに研磨面を均等な面圧で押し当てることが容易であるため、テクスチャー加工など の精密加工用研磨布として好適である。 [0023] In the present invention, single yarn dispersion means that the single yarn does not exist unevenly and does not form a bundle (fiber bundle) in the overall observation. Preferably, the single yarn is dispersed. Is a state where 4 or more are not adhered. Since the single yarn-dispersed non-woven fabric does not have fiber bundles, the first layer of the polished surface has excellent fiber dispersibility and smoothness. It is suitable for use as a polishing cloth for precision processing such as texturing because it can be uniformly dispersed without being pressed, and the polishing surface can be easily pressed against the disk with uniform surface pressure.
[0024] また、支持体と積層する前に、単糸分散不織布を親水加工してもよい。なお、単糸 分散不織布が親水性樹脂からなり、後述する吸水速度を有する場合には、親水加工 を施す必要はない。 [0024] Further, before lamination with the support, the single yarn-dispersed nonwoven fabric may be subjected to hydrophilic processing. If the single yarn-dispersed non-woven fabric is made of a hydrophilic resin and has a water absorption rate described later, it is not necessary to perform hydrophilic processing.
[0025] 本発明において、研磨側の表層の第一層に用いられる単糸分散不織布の単糸の 数平均繊維径は 0. 1〜1. 7 mであり、好ましくは 0. 4〜1. 5 m、さらに好ましく は 0. 4〜1. 3 mである。単糸の数平均繊維径が 0. 1 m未満であると、単糸強力 が低下するためテクスチャー加工時に加わる力に耐えることができず単糸は破断して しまう。そのため、研磨砲粒は固定され難ぐテクスチャー加工において研削力不足 ゃ不均一な研磨となる。一方、数平均繊維径が 1. 7 mを超えた場合は、表層の起 毛繊維の緻密性が低下し、また、起毛繊維の粗密斑が大きくなるため、研磨砥粒は 均一に分散され難くなり、その結果、高精度の研磨を行うことが困難となる。 [0025] In the present invention, the number average fiber diameter of the single yarn of the single yarn-dispersed nonwoven fabric used for the first layer of the surface layer on the polishing side is 0.1 to 1.7 m, preferably 0.4 to 1. 5 m, more preferably 0.4 to 1.3 m. If the number average fiber diameter of the single yarn is less than 0.1 m, the single yarn strength decreases, so that it cannot withstand the force applied during texturing and the single yarn breaks. As a result, the abrasive cannon will be unevenly polished if the grinding force is insufficient in texturing that is difficult to fix. On the other hand, when the number average fiber diameter exceeds 1.7 m, the fineness of the raised fibers on the surface layer decreases, and the density of the raised fibers increases, so that the abrasive grains are difficult to disperse uniformly. As a result, it becomes difficult to perform highly accurate polishing.
[0026] テクスチャー加工用研磨布に求められているのは、前記の如ぐディスク表面の凹 凸の平均深さに代表される表面平均粗さ (Ra)の低減である。そのためには、テクス
チヤ一加工時における研磨砲粒の凝集の抑制と、均一分散が重要である。 [0026] What is required of the polishing cloth for texturing is a reduction in the average surface roughness (Ra) typified by the average concave / convex depth of the disk surface as described above. To that end, Tex It is important to suppress the agglomeration of the abrasive barrels and to uniformly disperse them during the machining.
前記の、研磨側の表面の第一層が繊維束を含まない単糸分散不織布から成り、単 糸分散不織布を構成する単糸の数平均繊維径が 0. 1〜1. であるという構成 要件は、精密加工用研磨布の水平方向へ砲粒を均一に分散させるために必要な要 件である。 The above-mentioned configuration requirement that the first layer on the polishing side surface is composed of a single yarn-dispersed nonwoven fabric not containing fiber bundles, and the number average fiber diameter of the single yarn constituting the single yarn-dispersed nonwoven fabric is 0.1 to 1. Is a requirement necessary to uniformly disperse the bullets in the horizontal direction of the polishing cloth for precision processing.
[0027] し力しながら、上記の要件だけでは現在求められている加工精度に十分応えられる 精密加工用研磨布とは言えない。なぜなら、研磨側の表面の第一層に用いられる単 糸分散不織布は、鉛直方向に少なからず凹凸を有しており、その凹凸の大きさによ つては、一定加圧で加工されるテクスチャー加工工程において、ディスク表面に該第 一層の表面が均一に接触しない部分が発生するため、研磨砲粒の凝集や偏り(不均 一分散)が起こり、高精度の研磨を行うことが困難となる力 である。 [0027] However, the above requirements alone cannot be said to be a precision processing polishing cloth that can sufficiently meet the currently required processing accuracy. This is because the monofilament-dispersed nonwoven fabric used for the first layer on the surface on the polishing side has a lot of irregularities in the vertical direction. Depending on the size of the irregularities, the texture processing is processed with constant pressure. In the process, a portion where the surface of the first layer does not come into uniform contact with the surface of the disk is generated, which causes agglomeration and unevenness (non-uniform dispersion) of the abrasive barrels, which makes it difficult to perform high-precision polishing. It is.
[0028] 従って、鉛直方向への凹凸を低減させ、さらに、精密加工用研磨布の水平方向へ 砲粒を均一に分散させる要件と合わせて、三次元的な砲粒分散性を制御することが 重要なのである。 [0028] Therefore, it is possible to control the three-dimensional barrel dispersibility together with the requirement to reduce unevenness in the vertical direction and further to uniformly disperse the barrels in the horizontal direction of the polishing cloth for precision processing. It is important.
[0029] このような考えから、本発明の精密加工用研磨布の第一層表面の最大高さ粗さは 7 0 μ m以下、好ましくは 50 μ m以下、更に好ましくは 40 μ m以下であることが重要で ある。 70 /z mを超えた場合、一定加圧でカ卩ェされるテクスチャー加工工程において、 ディスク表面に研磨布の第一層の表面が均一に接触しない部分が発生するため、砥 粒の凝集や偏りが起こり、高精度の研磨を行うことが困難となる。なお、研磨布の第 一層表面の最大高さ粗さは、後記の方法によって測定することができる。 From such an idea, the maximum height roughness of the first layer surface of the polishing pad for precision processing of the present invention is 70 μm or less, preferably 50 μm or less, more preferably 40 μm or less. It is important to be. If it exceeds 70 / zm, in the texturing process that is covered with constant pressure, the surface of the first layer of the abrasive cloth does not come into uniform contact with the disk surface. As a result, it becomes difficult to perform highly accurate polishing. The maximum height roughness of the first layer surface of the polishing pad can be measured by the method described later.
[0030] また、精密加工用研磨布の構成及び製造方法と、研磨層の最大高さ粗さについて は、以下の(1)〜(3)のような関係がある。 [0030] Further, there is the following relationship (1) to (3) regarding the configuration and manufacturing method of the polishing cloth for precision processing and the maximum height roughness of the polishing layer.
(1)複合紡糸法により作製された海島糸から成る不織布において、不織布に高分 子弾性体を含浸させた後、適当な溶媒で海成分を除去することで極細繊維を形成さ せるという製造方法は、少なからず繊維束が残存してしまい、その繊維束の影響によ つて研磨層の最大高さ粗さを 70 μ m以下にすることは困難である。 (1) A manufacturing method in which a nonwoven fabric made of sea-island yarn produced by a composite spinning method is impregnated with a polymer elastic body, and then the sea component is removed with an appropriate solvent to form ultrafine fibers. However, not a few fiber bundles remain, and it is difficult to reduce the maximum roughness of the polishing layer to 70 μm or less due to the influence of the fiber bundles.
[0031] (2)パフイングなどによって表面仕上げ加工を行った後の研磨側第一層である単糸 分散不織布の厚みは、好ましくは 100 μ m以上、より好ましくは 120〜500 μ mであ
る。それより厚みが小さい場合には、研磨側第一層に支持体の影響が現れ、最大高 さ粗さが大きくなる。 [0031] (2) The thickness of the single yarn-dispersed nonwoven fabric which is the first layer on the polishing side after surface finishing by puffing or the like is preferably 100 μm or more, more preferably 120 to 500 μm. The When the thickness is smaller than that, the influence of the support appears on the polishing-side first layer, and the maximum height roughness becomes large.
[0032] (3)単糸分散不織布に積層する支持体として不織布を用いる場合、不織布を構成 する繊維の単糸直径は、好ましくは 8. O /z m未満、より好ましくは 4. O /z m未満、更 に好ましくは 3. 3 m未満である。繊維の単糸直径が太くなるほど支持体である不織 布の凹凸は大きくなり、それにより研磨側第一層の単糸分散不織布の最大高さ粗さ ち大さくなる。 [0032] (3) When a nonwoven fabric is used as the support laminated on the single yarn-dispersed nonwoven fabric, the single yarn diameter of the fibers constituting the nonwoven fabric is preferably less than 8. O / zm, more preferably less than 4. O / zm. More preferably, it is less than 3.3 m. The larger the single yarn diameter of the fiber, the larger the unevenness of the nonwoven fabric that is the support, thereby increasing the maximum height roughness or size of the single yarn-dispersed nonwoven fabric of the polishing first layer.
[0033] 本発明の精密加工用研磨布は、吸水速度が 100〜240mmであり、好ましくは 110 〜200mm、さらに好ましくは 120〜 180mmである。吸水速度が 100mm未満である 場合には、加工中に研磨砥粒を含んだスラリー液が研磨布の表面に十分に吸液さ れないため、研磨砲粒を十分に把持することが困難であり、その結果、十分な研削量 を得ることが困難となる。一方、吸水速度が 240mmを超えると、スラリー液力 研磨 布の水平方向に十分拡散する前に、垂直方向に吸液されてしまうため、研磨砲粒を 均一に拡散させることが困難である。その結果、研磨砲粒分布に斑が生じ、その斑が 原因となり、加工精度の高いテクスチャーを実施することが困難になる。 [0033] The precision processing abrasive cloth of the present invention has a water absorption rate of 100 to 240 mm, preferably 110 to 200 mm, and more preferably 120 to 180 mm. When the water absorption speed is less than 100 mm, the slurry liquid containing abrasive grains is not sufficiently absorbed by the surface of the polishing cloth during processing, and it is difficult to sufficiently hold the abrasive barrels. As a result, it becomes difficult to obtain a sufficient grinding amount. On the other hand, when the water absorption speed exceeds 240 mm, the slurry is absorbed in the vertical direction before it is sufficiently diffused in the horizontal direction of the slurry liquid polishing cloth, so that it is difficult to uniformly disperse the abrasive barrels. As a result, unevenness is generated in the distribution of the abrasive barrels, and the unevenness makes it difficult to implement a texture with high processing accuracy.
[0034] 上記のような吸水性を具備させる方法は、特に限定されず、グラフト重合処理、ブラ ズマ処理など物理的な表面処理法、表面をイオン交換性榭脂ゃ酸化物で被覆して 親水性を付与する表面コート処理法、濃硫酸処理により表面をスルフォン化するなど の化学的な表面処理法などが挙げられる。また、界面活性剤などの親水性成分の溶 液を用いて、親水加工を施す方法も、吸水性を具備させる方法として挙げられる。 [0034] The method for providing water absorption as described above is not particularly limited, and a physical surface treatment method such as a graft polymerization treatment or a plasma treatment, and the surface is coated with an ion-exchangeable rosin oxide to be hydrophilic. Examples include surface coating treatment that imparts properties, and chemical surface treatment methods such as sulfonating the surface by concentrated sulfuric acid treatment. Further, a method of performing hydrophilic processing using a solution of a hydrophilic component such as a surfactant can also be mentioned as a method for providing water absorption.
[0035] なお、界面活性剤としては、イオン系と非イオン系とがあるが、磁気ディスクの精密 加工用研磨布として用いることを考慮すると、金属イオンを含まな 、非イオン系界面 活性剤が好ましい。さらに、ポリエチレンテレフタレートとポリエチレングリコールとの共 重合ポリエステルなど、親水性を有する榭脂を用いることも、吸水性を具備させるた めに好ましい。なお、吸水速度は後記の方法により測定することができる。 [0035] Although there are ionic and nonionic surfactants, considering that they are used as polishing cloths for precision machining of magnetic disks, nonionic surfactants that do not contain metal ions are used. preferable. Furthermore, it is also preferable to use hydrophilic resin such as copolymer polyester of polyethylene terephthalate and polyethylene glycol in order to provide water absorption. The water absorption rate can be measured by the method described later.
[0036] また、本発明の精密加工用研磨布は、圧縮エネルギーが 0. 10-0. 30gf-cm/c m2であり、好ましくは 0. 10〜0. 25gf' cmZcm2である。圧縮エネルギーは被評価 物の硬さを示す指標であり、圧縮エネルギーの値が大きいほど柔らカ 、ことを示す。
圧縮エネルギーが 0. 10gf 'cmZcm2未満の場合、すなわち、研磨布が硬すぎると、 研削量は大きいがディスク基板の表面に傷が付きやすい。一方、圧縮エネルギーが 0. 30gf 'cmZcm2を超える場合、すなわち、研磨布が柔らかすぎると、基板表面に 傷は付き難 、が、研削量力 、さく加工性が悪 、と 、う問題が生じる。 [0036] In addition, precision machining polishing cloth of the present invention, the compression energy is 0. 10-0. A 30gf-cm / cm 2, preferably 0. 10~0. 25gf 'cmZcm 2. The compression energy is an index indicating the hardness of the object to be evaluated, and the greater the compression energy value, the softer the softness. If the compression energy is less than 0.10 gf'cmZcm 2 , that is, if the polishing cloth is too hard, the surface of the disk substrate is likely to be damaged although the amount of grinding is large. On the other hand, if the compression energy exceeds 0.30 gf'cmZcm 2 , that is, if the polishing cloth is too soft, the surface of the substrate is difficult to be scratched, but the amount of grinding and the workability are poor.
[0037] 研削量とテクスチャー加工精度の両方を満足させるためには、圧縮エネルギーが 0 . 10〜0. 30gf'cmZcm2であることが必要である。なお、圧縮エネルギーは、後記 の方法により測定することができる。 [0037] In order to satisfy both the amount of grinding and texturing accuracy, compression energy is 0.10 to 0. It is necessary that 30Gf'cmZcm 2. The compression energy can be measured by the method described later.
[0038] 加工精度を向上させるためには、単糸分散不織布の数平均繊維径が 0. 1〜1. 7 μ mであることが必要である。しかし、このような数平均繊維径の単糸分散不織布の み力 構成された研磨布では、上記の圧縮エネルギー範囲を満足することは困難で ある。なぜなら、繊維径が細いために空隙率が小さくなり、クッション性に劣るからであ る。 [0038] In order to improve the processing accuracy, the number average fiber diameter of the single yarn-dispersed nonwoven fabric needs to be 0.1 to 1.7 μm. However, it is difficult to satisfy the above-mentioned compression energy range with an abrasive cloth composed only of a single yarn-dispersed nonwoven fabric having a number average fiber diameter. This is because, since the fiber diameter is thin, the porosity is small and the cushioning property is poor.
[0039] そこで本発明では、単糸分散不織布を支持体と積層して多層構造シートとすること により、圧縮エネルギーを適切な範囲内とすることを可能とした。すなわち、支持体の 素材、目付、厚み、空隙率を調整因子とすることで、圧縮エネルギーを調整すること が可能である。また、後述するように、高分子弾性体を、圧縮エネルギーの調整因子 として用いることも可能である。このように、支持体の素材や空隙率等を調整すること により、研磨層として、単糸分散不織布だけでは達成することが困難である適当なク ッシヨン性を具備させることで、高精度で安定的な研磨を行うことが可能となった。 [0039] Therefore, in the present invention, the compression energy can be within an appropriate range by laminating the single yarn-dispersed nonwoven fabric with the support to form a multilayer structure sheet. That is, the compression energy can be adjusted by using the material, basis weight, thickness, and porosity of the support as adjustment factors. Also, as will be described later, a polymer elastic body can be used as a compression energy adjusting factor. In this way, by adjusting the support material, porosity, etc., it is possible to provide an appropriate cushioning property that is difficult to achieve with only a single yarn-dispersed nonwoven fabric as the polishing layer. It became possible to perform efficient polishing.
[0040] 本発明の精密加工用研磨布の研磨側第一層は起毛されていることが必要である。 [0040] The polishing-side first layer of the precision processing polishing cloth of the present invention needs to be raised.
起毛させることには、次の三つの効果がある。 Raising has the following three effects.
(1)研磨砲粒と接触する表面積が大きくなり、その結果、研磨砲粒の把持能力が向 上し、研削量が向上する。 (1) The surface area that comes into contact with the abrasive cannon is increased, and as a result, the gripping ability of the abrasive cannon is improved and the amount of grinding is improved.
[0041] (2)研磨側第一層の繊維の配向性が向上し、テクスチャー加工時に円周方向に繊 維が接触する。その結果、高精度の研磨を行うことが可能となる。 [0041] (2) The fiber orientation of the first layer on the polishing side is improved, and the fibers contact in the circumferential direction during texturing. As a result, highly accurate polishing can be performed.
(3)研磨布の表面の接触抵抗力 S小さくなるため、ディスク基板表面に深い傷が付き 難くなる。 (3) Since the contact resistance S on the surface of the polishing cloth is small, it is difficult for the disk substrate surface to be deeply scratched.
[0042] 一般に、起毛は、サンドペーパー等のパフイングペーパーを用いて、表面を高速で
擦過して起毛させるパフイング法とよばれる方法で行われる力 パフイング前に界面 活性剤を表面に塗布することが好ましい。界面活性剤を塗布することで、パフイング ペーパーと研磨側第一層の摩擦力を低下させ、単糸の切断防止、繊維配向性の向 上を図ることが可能となる。 [0042] Generally, napping is performed using puffing paper such as sandpaper at a high speed surface. A force applied by a method called a puffing method in which the surface is raised by rubbing is preferably coated with a surfactant on the surface before puffing. By applying the surfactant, it is possible to reduce the frictional force between the puffing paper and the first layer on the polishing side, to prevent the single yarn from being cut, and to improve the fiber orientation.
[0043] 研磨側第一層の起毛長は、 50-3000 μ mであることが好ましぐより好ましくは 50 〜2000 μ m、さらに好ましくは 50〜: L000 μ mである。起毛長力 0 μ m以上である と、研磨砲粒の把持能力が十分であるため十分な研削量が得られ、表面のタツチ性 も柔らかいためディスク基板の表面に傷がつくことが殆どない。また、起毛長が 3000 μ m以下であると、繊維の自由度が大き過ぎず適度であるため、研磨側第一層の極 細繊維は、加工時にディスク基板の半径方向と垂直に接触することが容易であり、円 周方向に沿った溝を均一に付けることができる。また、研磨砲粒の把持能力が過度 に大きくならないため、ディスク基板の表面粗さを小さくすることができる。 [0043] The brushed length of the first layer on the polishing side is preferably 50-3000 μm, more preferably 50-2000 μm, and even more preferably 50-: L000 μm. When the brushed length is 0 μm or more, the gripping ability of the abrasive cannon is sufficient, so that a sufficient amount of grinding can be obtained and the surface is soft and the surface of the disk substrate is hardly damaged. In addition, if the raised length is 3000 μm or less, the degree of freedom of the fiber is not too large and it is appropriate, so the fine fiber in the first layer on the polishing side should be in contact with the radial direction of the disk substrate perpendicularly during processing. Is easy, and the grooves along the circumferential direction can be uniformly provided. In addition, since the gripping ability of the abrasive particles is not excessively increased, the surface roughness of the disk substrate can be reduced.
[0044] 本発明において、研磨側第一層の単糸分散不織布としては、繊維の粗密斑が極め て小さい不織布を用いることが好ましい。その指標として、第一層に使用する単糸分 散不織布の吸光度の標準偏差は 0. 050以下であることが好ましい。吸光度の標準 偏差が 0. 050以下であると、繊維分散性が良ぐ単糸分散不織布が均一で部分的 な粗密斑が小さいため、研磨砲粒が均一に分散し易ぐ高精度の加工を行うことがで きる。なお、吸光度の標準偏差は後記の方法によって測定することができる。 [0044] In the present invention, it is preferable to use a non-woven fabric with extremely small density of fibers as the single yarn-dispersed non-woven fabric of the polishing side first layer. As an index thereof, the standard deviation of the absorbance of the single yarn-dispersed nonwoven fabric used for the first layer is preferably 0.050 or less. If the standard deviation of absorbance is 0.050 or less, a single yarn-dispersed non-woven fabric with good fiber dispersibility is uniform, and there are few partial unevenness. It can be carried out. The standard deviation of absorbance can be measured by the method described later.
[0045] 本発明にお 、て、単糸分散不織布の製造方法としては、例えば、メルトブロー法、 湿式スパンレース法などを挙げることができる。この中でもメルトブロー法は、他の製 造方法に比べて単糸の数平均繊維径を細くすることが容易であるため、第一層に用 V、る単糸分散不織布の製造方法として好適である(以下、メルトブロー法により製造さ れる不織布をメルトブロー不織布と!ヽぅ) o [0045] In the present invention, examples of the method for producing a single yarn-dispersed nonwoven fabric include a melt blow method and a wet spun lace method. Among these, the melt blow method is suitable as a method for producing a single yarn-dispersed nonwoven fabric used for the first layer because it is easy to make the number average fiber diameter of the single yarn thinner than other production methods. (Hereinafter, the non-woven fabric manufactured by the melt-blowing method is called melt-blown non-woven fabric!) O
[0046] また、本発明に用いられる単糸分散不織布の一つとして好適であるメルトブロー不 織布は、前記した吸光度の標準偏差が 0. 050以下となるよう、単糸の捕集条件にェ 夫を加え、高速ガス流と随伴流の流れを制御したメルトブロー法により製造される。ポ リエステルメルトブロー不織布の製造方法としては、例えば、ノズル直径が 0. 2〜0. 4mm、ノズルピッチが 0. 3〜1. 0mmで配置された紡口を使用し、固有粘度が 0. 4
0〜0. 75のポジエステノレ重合体をカロ熱溶融後、 250〜350oCにカロ熱されたダイに送 り込む。 [0046] In addition, a melt blown nonwoven fabric suitable as one of the single yarn-dispersed nonwoven fabrics used in the present invention has a single yarn collection condition such that the standard deviation of absorbance is 0.050 or less. Manufactured by the melt-blowing method with added husband and controlled high-speed gas flow and accompanying flow. As a method for producing a polyester melt blown nonwoven fabric, for example, a nozzle having a nozzle diameter of 0.2 to 0.4 mm and a nozzle pitch of 0.3 to 1.0 mm is used, and the intrinsic viscosity is 0.4. A 0 to 0.75 positive esterolate polymer is melted by calo heat and fed to a die heated to 250 to 350 ° C.
[0047] 次いで、ノズル当りの吐出量を 0. 05〜0. 50gZ分でノズルから吐出させ、この紡 口の開口端近傍から 280〜380°Cに加熱されたガスを 0. 18〜0. 40MPaの圧力で 噴射させ、さらに、単糸の飛散、凝集を防ぐために、例えば、特公昭 62— 12345号 公報に記載されているような整流器を用いて、高速ガス流と随伴流の流れを制御し、 所望の目付、厚み、嵩密度となるように捕集し、プレスするという方法が挙げられる。 [0047] Next, the discharge amount per nozzle was discharged from 0.05 to 0.50 gZ from the nozzle, and the gas heated to 280 to 380 ° C from the vicinity of the opening end of this nozzle was 0.18 to 0. In order to inject at a pressure of 40 MPa, and to prevent scattering and aggregation of single yarns, the flow of the high-speed gas flow and the accompanying flow is controlled using a rectifier as described in, for example, Japanese Patent Publication No. 62-12345 Then, a method of collecting and pressing so as to obtain a desired basis weight, thickness, and bulk density can be mentioned.
[0048] 本発明にお ヽて、単糸分散不織布を構成する榭脂としては、繊維形成能がある熱 可塑性榭脂を用いることが好ましい。例えば、ポリエチレンテレフタレート、ポリブチレ ンテレフタレート、ポリトリメチレンテレフタレート、ポリエチレンテレフタレート系共重合 体などのポリエステル類;ナイロン 6、ナイロン 66、ナイロン 12、ポリアミド系共重合体 などのポリアミド類;ポリエチレン、ポリプロピレン、ポリメチルペンテンなどのポリオレフ イン類;ポリアクリロニトリル類;ポリスチレン、ポリ塩ィ匕ビニルなどのビュル系重合体類 ;ポリ乳酸、乳酸共重合体、ポリダリコール酸などの脂肪族ポリエステル系重合体類; 脂肪族ポリエステルアミド系共重合体類などが挙げられる。 [0048] In the present invention, it is preferable to use a thermoplastic resin having fiber-forming ability as the resin constituting the single yarn-dispersed nonwoven fabric. For example, polyesters such as polyethylene terephthalate, polybutylene terephthalate, polytrimethylene terephthalate, polyethylene terephthalate copolymer; polyamides such as nylon 6, nylon 66, nylon 12, polyamide copolymer; polyethylene, polypropylene, polymethyl Polyolefins such as pentene; Polyacrylonitriles; Bull polymers such as polystyrene and poly vinyl chloride; Aliphatic polyester polymers such as polylactic acid, lactic acid copolymer, and polydaricolic acid; Aliphatic polyester amide Based copolymers.
[0049] 不織布の処理方法としては、ニードルパンチ処理やウォータージェット処理等の三 次元交絡、熱接着、接着剤などが挙げられる力 中でもウォータージェット処理による 三次元交絡が、繊維の高密度化、および、研磨布表面の平滑ィ匕という観点から好ま しい。 [0049] Nonwoven fabric treatment methods include three-dimensional entanglement such as needle punching and water jet treatment, thermal bonding, adhesives, etc. Among others, three-dimensional entanglement by water jet treatment increases the density of fibers, and From the viewpoint of smoothness of the surface of the polishing cloth, it is preferable.
[0050] 本発明にお 、て、単糸分散不織布を構成する繊維がポリエステルである場合、ポリ エステル繊維の結晶化度は 35%以上であることが好ま 、。結晶化度が 35%以上 であると、単糸強力が高いため、テクスチャー加工時に加わる力に耐えることができ、 単糸が破断しない。そのため研磨砲粒は固定され易ぐテクスチャー加工において 十分な研削力が得られ、均一な研磨ができる。更に、パフイングペーパーの砲粒や 負荷などの条件によっても、パフイングカ卩ェ中に単糸の切断がなぐ研磨布の作製が 容易である。 [0050] In the present invention, when the fiber constituting the single yarn-dispersed nonwoven fabric is polyester, the polyester fiber preferably has a crystallinity of 35% or more. If the degree of crystallinity is 35% or more, the single yarn strength is high, so it can withstand the force applied during texturing and the single yarn will not break. As a result, the abrasive cannons are fixed and can easily be ground to obtain a sufficient grinding force in texturing. In addition, depending on conditions such as the puffing paper barrel and load, it is easy to fabricate an abrasive cloth in which the single yarn is not cut during the puffing cache.
[0051] また、紡糸条件が同一である場合、固有粘度が小さくなるにつれ、ポリエステル繊 維の結晶化度は低下する傾向がある力 結晶化度が 35%以上であると、第一層の
単糸分散不織布の数平均繊維径を小さくするために、固有粘度の小さなポリエステ ルを選択した場合にも良好な結果が得られる。 [0051] Further, when the spinning conditions are the same, the strength of the polyester fiber tends to decrease as the intrinsic viscosity decreases. When the crystallinity is 35% or more, Good results are also obtained when a polyester with a low intrinsic viscosity is selected to reduce the number average fiber diameter of the single yarn dispersed nonwoven fabric.
[0052] 研磨布の圧縮エネルギーを制御するという点、及び、第一層の表面を平滑化すると いう点から、高分子弾性体を含浸させることが好ましい。また、榭脂による繊維の固定 不足に起因した繊維の偏りなどが発生する場合、テクスチャー加工条件によっては、 加工の均一性が悪ィ匕する可能性がある力 そのような場合、繊維の偏りを防ぐために 高分子弾性体を含浸させることは効果的である。 [0052] From the viewpoint of controlling the compression energy of the polishing cloth and smoothing the surface of the first layer, it is preferable to impregnate the polymer elastic body. In addition, if there is a fiber bias due to insufficient fixation of the fiber due to the resin, the force that may deteriorate the processing uniformity depending on the texture processing conditions. To prevent this, it is effective to impregnate the polymer elastic body.
[0053] 高分子弾性体としては、特に限定はないが、含浸加工が容易であること及び研磨 布としてのクッション性が良好であること力 ポリウレタンが好ましい。ポリウレタンとし ては、溶剤系ポリウレタン、水系ポリウレタン等を用いることができ、環境への負荷が 小さ 、こと、製造コストが安価であることから水系ポリウレタンが好ま 、。 [0053] The polymer elastic body is not particularly limited, but it is easy to impregnate and has good cushioning properties as an abrasive cloth. Polyurethane is preferable. As the polyurethane, solvent-based polyurethane, water-based polyurethane and the like can be used, and water-based polyurethane is preferred because of its low environmental impact and low manufacturing cost.
[0054] 水系ポリウレタンはェマルジヨンで用いることが好ましぐポリウレタン成分としては、 以下のものが例示される。ポリオール成分としては、ポリエチレンアジペートグリコー ル、ポリブチレンアジペートグリコールなどのポリエステルポリオール類;ポリエチレン グリコール、ポリテトラメチレングリコールなどのポリエーテルポリオール類;ポリカーボ ネートポリオール類等が挙げられる。イソシァネート成分としては、 4, 4'ージフエ-ル メタンジイソシァネート等の芳香族ジイソシァネート; 4, 4'ージシクロへキシルメタンジ イソシァネート等の脂環族ジイソシァネート;へキサメチレンジイソシァネート等の脂肪 族ジイソシァネート等が挙げられる。また、鎖伸長剤としては、エチレングリコール等 のグリコール類;エチレンンジァミン、へキサメチレンジァミン、 4, 4'ージシクロへキシ ルメタンジァミン等のジァミン類などを挙げることができる。また、上記各種成分を適 宜組み合わせたポリウレタンを用いることができる。 [0054] Examples of the polyurethane component that is preferably used in the emulsion as the water-based polyurethane include the following. Examples of the polyol component include polyester polyols such as polyethylene adipate glycol and polybutylene adipate glycol; polyether polyols such as polyethylene glycol and polytetramethylene glycol; and polycarbonate polyols. Examples of the isocyanate component include aromatic diisocyanates such as 4,4'-diphenylmethane diisocyanate; alicyclic diisocyanates such as 4,4'-dicyclohexylmethane diisocyanate; aliphatic diisocyanates such as hexamethylene diisocyanate. Etc. Examples of the chain extender include glycols such as ethylene glycol; diamines such as ethylenediamine, hexamethylenediamine, and 4,4′-dicyclohexylmethanediamine. Polyurethanes in which the above various components are appropriately combined can be used.
[0055] 高分子弾性体の含有量は、研磨布に対して 30wt%以下が好ましぐより好ましくは 0. 5〜20wt%、さらに好ましくは 1〜: LOwt%であり、高分子弾性体の含有量によつ て研磨布の表面状態、クッション性、硬度、研磨性能を調整することができる。高分子 弾性体の含有量が 30wt%以下であると、高分子弾性体を含有させたことによる効果 が十分に得られ、十分な研削量と研削の精密な制御が可能となり、良好なテクスチャ 一加工性および生産性が得られる。
[0056] 本発明にお 、て、精密加工用研磨布を構成する単糸分散不織布の厚みは 100 μ m以上であることが好ましぐょり好ましくは120〜500 111でぁる。テクスチャー加工 では、研磨布は研磨層とは反対側力もゴムロールなどでディスクに押し当てられる。 その際に、単糸分散不織布の厚みが 100 m未満である場合、支持体の影響が研 磨層側に現れ、高精度の加工が困難になるという懸念がある。特に、支持体として織 物や太径の繊維カゝら成る不織布を用いる場合には、単糸分散不織布の厚みが 100 μ m以上であることが好ましい。 [0055] The content of the polymer elastic body is preferably 30 to 20 wt% or less with respect to the polishing cloth, more preferably 0.5 to 20 wt%, still more preferably 1 to: LOwt%. Depending on the content, the surface condition, cushioning properties, hardness, and polishing performance of the polishing cloth can be adjusted. If the content of the polymer elastic body is 30 wt% or less, the effect of adding the polymer elastic body can be sufficiently obtained, a sufficient amount of grinding and precise control of the grinding can be achieved, and a good texture can be obtained. Workability and productivity can be obtained. In the present invention, the thickness of the single yarn-dispersed nonwoven fabric constituting the precision processing abrasive cloth is preferably 100 μm or more, more preferably 120 to 500 111. In texturing, the polishing cloth is pressed against the disc by a rubber roll or the like, with the opposite force to the polishing layer. At this time, if the thickness of the single yarn-dispersed nonwoven fabric is less than 100 m, there is a concern that the influence of the support appears on the polishing layer side, and high-precision processing becomes difficult. In particular, when a nonwoven fabric made of woven fabric or large-diameter fiber is used as the support, the thickness of the single yarn-dispersed nonwoven fabric is preferably 100 μm or more.
[0057] 本発明の研磨布は、 1. OkgfZcm荷重時の長手方向(MD方向)の伸度が 4%以 下であることが好ましぐより好ましくは 3%以下であり、また、 1. OkgfZcm荷重時の 長手方向(CD方向)の伸度が 12%以下であることが好ましぐより好ましくは 9%以下 である。 MD方向の伸度及び CD方向の伸度が上記の範囲であると、均一に、且つ、 研磨布をディスク基板の表面に安定して押圧させることができるので、微細で均一な 凹凸パターンを加工することが可能である。 [0057] The polishing cloth of the present invention has the following 1. The elongation in the longitudinal direction (MD direction) when loaded with OkgfZcm is preferably 4% or less, more preferably 3% or less, and 1. The elongation in the longitudinal direction (CD direction) when loaded with OkgfZcm is preferably 12% or less, more preferably 9% or less. If the elongation in the MD direction and the elongation in the CD direction are within the above ranges, the polishing cloth can be pressed uniformly against the surface of the disk substrate, so a fine and uniform uneven pattern can be processed. Is possible.
[0058] 本発明の研磨布において、研磨側第 1層をパフイング処理することが好ましい。ノ フィング材としては、例えば、 # 100〜# 1000のパフイングペーパーを用いることが でき、処理速度、回数は適宜、好適な範囲を選択することができる。 [0058] In the polishing cloth of the present invention, it is preferable to puff the polishing-side first layer. As the noffing material, for example, # 100 to # 1000 puffing paper can be used, and a suitable range can be appropriately selected for the processing speed and the number of times.
[0059] 本発明において、高分子弾性体が含浸されている場合は、研磨側第 1層の繊維の 固定ィ匕が十分になされており、比較的目の粗い # 150〜 # 300のパフイングぺーパ 一を用いることができる。また、高分子弾性体が含浸されていない場合は、比較的目 の細か!/、 # 400〜 # 600のパフイングペーパーを用いて、数回処理することにより、 研磨側第 1層の平滑性を高め、最大高さ粗さ性能を改善することができる。 [0059] In the present invention, when the polymer elastic body is impregnated, the fibers on the first layer on the polishing side are sufficiently fixed, and the puffing pages of # 150 to # 300 are relatively rough. A part can be used. Also, if the polymer elastic body is not impregnated, it is relatively fine! /, By using a # 400 to # 600 puffing paper, it is processed several times, so that the smoothness of the first layer on the polishing side Can improve the maximum height roughness performance.
[0060] 本発明にお 、て、支持体としては、例えば、短繊維不織布、長繊維不織布などの 不織布、多孔質体、フィルムなどが挙げられる。なかでも、空隙率が高くクッション性 に富むこと及びカ卩ェ性に優れる点力ゝら不織布が望ましい。 [0060] In the present invention, examples of the support include nonwoven fabrics such as short fiber nonwoven fabrics and long fiber nonwoven fabrics, porous materials, and films. Of these, non-woven fabrics are desirable because they have a high porosity and a high cushioning property and are excellent in caulking properties.
[0061] 支持体として用いる不織布の製造方法としては、例えば、カーデイングした後、クロ スレイヤー、エアーレイヤー等でシート化して、針布により交絡させる-一ドルパンチ 法、柱状水流により交絡させる乾式スパンレース法、繊維を水分散させて抄造法でシ ート化した後、柱状水流で交絡させる湿式スパンレース法、通常のスパンボンド法等
が挙げられる。なかでも、得られる不織布の目付斑及び厚み斑が小さぐ物性の等方 性に優れる点で、湿式スパンレース法を使用することが好ま U、。 [0061] As a method for producing a nonwoven fabric used as a support, for example, after carding, it is formed into a sheet with a cross layer, an air layer, etc., and entangled with a needle cloth-one-punch method, or a dry spunlace method entangled with a columnar water flow Wet spunlace method, normal spunbond method, etc. Is mentioned. In particular, it is preferable to use the wet spunlace method because of the excellent isotropy of the physical properties of the resulting non-woven fabrics, which have small weight spots and thick spots.
[0062] 研磨布の寸法安定性をさらに向上させるために、織物を内在させる方法も挙げられ る。その場合には、支持体として、織物の両面に繊維径 10 m以下の極細繊維層を 積層させた積層体を用いることが好ま 、。 [0062] In order to further improve the dimensional stability of the polishing cloth, a method of incorporating a woven fabric is also mentioned. In that case, it is preferable to use a laminate in which ultrafine fiber layers having a fiber diameter of 10 m or less are laminated on both sides of the fabric as the support.
[0063] 織物は表面粗さが大きいため、研磨側第 1層の単糸分散不織布を織物に直接積 層させると、表面が織物の表面粗さの影響を大きく受ける。その結果、研磨側第 1層 の表面粗さが大きくなり、精密なテクスチャー加工が困難となる場合がある。また、織 物を構成する繊維と研磨側第 1層の単糸分散不織布の繊維径には大きな差異があ るため、両者を直接交絡させて不織布とすることは困難となる場合がある。以上の理 由から、織物の両面に極細繊維層を積層させた積層体を、支持体として用いることが 好ましい。 [0063] Since the woven fabric has a large surface roughness, when the single yarn-dispersed nonwoven fabric of the first layer on the polishing side is directly stacked on the woven fabric, the surface is greatly affected by the surface roughness of the woven fabric. As a result, the surface roughness of the first layer on the polishing side increases, and precise texture processing may be difficult. In addition, since there is a large difference in fiber diameter between the fibers constituting the woven fabric and the single yarn-dispersed nonwoven fabric of the first layer on the polishing side, it may be difficult to directly entangle the two into a nonwoven fabric. For the above reasons, it is preferable to use a laminate in which ultrafine fiber layers are laminated on both sides of a woven fabric as a support.
発明の効果 The invention's effect
[0064] 本発明の精密加工用研磨布は、水平方向には単糸分散であり、鉛直方向には研 磨側の第一層表面の最大高さ粗さが 70 m以下であるという三次元構造の単糸分 散不織布を用い、特定の吸水速度と圧縮特性を有することにより、ハードディスク用 テクスチャー加工にぉ 、て、高精度の研磨を行うことが可能である。 [0064] The polishing cloth for precision processing of the present invention has a three-dimensional structure in which single yarn dispersion is performed in the horizontal direction and the maximum height roughness of the surface of the first layer on the polishing side is 70 m or less in the vertical direction. By using a single yarn-dispersed non-woven fabric having a structure and having a specific water absorption speed and compression characteristics, it is possible to perform high-precision polishing for texture processing for hard disks.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0065] 以下に実施例を挙げて、本発明をさらに説明する力 本発明は実施例のみに限定 されるものではない。なお、測定方法、評価方法等は下記のとおりである。 [0065] The ability to further explain the present invention with reference to the following examples The present invention is not limited to only the examples. Measurement methods, evaluation methods, etc. are as follows.
[0066] (1)数平均繊維径( μ m) [0066] (1) Number average fiber diameter (μm)
研磨側第一層の単糸分散不織布表面の任意な 10箇所を、走査型電子顕微鏡 CFS M— 5510:日本電子株式会社製)により観察し、加速電圧 20kVで倍率 3500倍の 画像を撮影した。 1枚の画像につき任意の 10本の単糸の直径を測定し、これを 10枚 の写真について行った。合計 100本の単糸直径の測定値を求め、それらの算術平 均値を数平均繊維径とした。 Ten arbitrary locations on the surface of the single-sided nonwoven fabric of the polishing side first layer were observed with a scanning electron microscope (CFS M-5510: manufactured by JEOL Ltd.), and an image with an acceleration voltage of 20 kV and a magnification of 3500 times was taken. The diameter of any 10 single yarns per image was measured and this was done on 10 photos. A total of 100 single yarn diameter measurements were obtained, and the arithmetic average value was taken as the number average fiber diameter.
[0067] (2)研磨側第 1層の単糸分散不織布の厚み (mm) [0067] (2) Thickness of the single yarn-dispersed nonwoven fabric of the first layer on the polishing side (mm)
研磨布試料を、ウルトラミクロトーム(ULTRACUT— N :REICHERT製)を使用し
て断面方向にカットし、これを走査型電子顕微鏡 CFSM— 5510 :日本電子株式会社 )で観察し、加速電圧 20kVで倍率 50倍の画像を撮影した。任意の 10点の単糸分散 不織布の厚みを測定し、それらの算術平均値を単糸分散不織布の厚みとした。 Use an ultramicrotome (ULTRACUT-N: made by REICHERT) as a polishing cloth sample. Then, it was cut in the cross-sectional direction, and this was observed with a scanning electron microscope CFSM-5510 (JEOL Ltd.), and an image with an acceleration voltage of 20 kV and a magnification of 50 was taken. The thickness of any 10 single yarn dispersed nonwoven fabrics was measured, and the arithmetic average value thereof was taken as the thickness of the single yarn dispersed nonwoven fabric.
[0068] (3)メルトブロー不織布の目付及び厚み [0068] (3) The basis weight and thickness of the melt blown nonwoven fabric
目付 (gZm2)は、 JIS L 1096— 1999に準拠して測定し、厚み (mm)は、ダイヤ ルシックネスゲージ (ピーコック:(株)尾崎製作所製)を用い、サンプルを 20点測定し て、その平均値を用いた。 The basis weight (gZm 2 ) is measured in accordance with JIS L 1096-1999, and the thickness (mm) is measured using a dial thickness gauge (Peacock: manufactured by Ozaki Mfg. Co., Ltd.) with 20 samples. The average value was used.
[0069] (4)吸光度の標準偏差 [0069] (4) Standard deviation of absorbance
25cm X 18cmの試料を、温度 20°C、湿度 60%の雰囲気に 12時間以上放置した 後、地合計 (フォーメーションテスター FMT— ΜΠΙ :野村商事社製)にセットし、各画 素の透過率を測定した。得られた透過率から、定義された吸光度換算式を用いて、 吸光度とその標準偏差を算出した。 After leaving a 25cm x 18cm sample in an atmosphere of 20 ° C and 60% humidity for 12 hours or more, set it on the ground total (Formation Tester FMT—ΜΠΙ: Nomura Shoji Co., Ltd.) and set the transmittance of each pixel. It was measured. From the obtained transmittance, the absorbance and its standard deviation were calculated using a defined absorbance conversion formula.
[0070] (5)最大高さ粗さ m) [0070] (5) Maximum height roughness m)
4cm X 10cmの研磨布試料を、温度 20°C、湿度 60%の雰囲気に 12時間以上放 置した後、単糸分散不織布の表面を 3Dリアルサーフェスビュー顕微鏡 (VE- 9800 :株式会社キーエンス社製)で観察し、倍率 50倍の画像を撮影した。得られた画像の 断面プロファイルを解析することにより、 1回の測定につき 2mm長さの研磨布試料の 最大高さ粗さ(粗さ曲線の山頂部と谷底部の高さの差異)を測定し、この測定を 10回 行った。得られた 10回の測定値の平均値で評価した。 After leaving a 4cm x 10cm abrasive cloth sample in an atmosphere of temperature 20 ° C and humidity 60% for 12 hours or more, the surface of the single yarn-dispersed non-woven fabric was 3D Real Surface View Microscope (VE-9800: manufactured by Keyence Corporation) ), And an image with a magnification of 50 times was taken. By analyzing the cross-sectional profile of the obtained image, the maximum height roughness (the difference in height between the top and bottom of the roughness curve) of a 2 mm long abrasive cloth sample was measured per measurement. This measurement was performed 10 times. Evaluation was made using the average of the 10 measurements.
[0071] (6)テクスチャー加工結果 (Ra) (nm) [0071] (6) Texture processing result (Ra) (nm)
JIS B 0601— 1994に準拠して行った。 The test was conducted in accordance with JIS B 0601—1994.
原子間力顕微鏡(Nano Scope IV D3100 : Digital Instruments社製)を使用して 、ディスク基板サンプルの任意の直線状表面 10箇所にっ 、て算術平均粗さを測定 し、 10箇所の測定値を平均することにより、表面平均粗さ (Ra)を求めた。 Using an atomic force microscope (Nano Scope IV D3100: manufactured by Digital Instruments), measure the arithmetic average roughness of 10 arbitrary linear surfaces of the disk substrate sample, and average the 10 measured values. Thus, the surface average roughness (Ra) was obtained.
[0072] (7)繊維束の有無 [0072] (7) Presence or absence of fiber bundle
研磨布試料を、ウルトラミクロトーム(ULTRACUT— N :REICHERT製)を使用し て断面方向にカットし、これを走査型電子顕微鏡 CFSM— 5510 :日本電子株式会社 製)で観察し、加速電圧 20kVで倍率 500倍の画像を撮影した。任意の 10枚の画像
を観察し、単糸が偏って存在しており、束状を形成している繊維束の有無を確認した Abrasive cloth sample was cut in the cross-section direction using an ultramicrotome (ULTRACUT-N: manufactured by REICHERT), and observed with a scanning electron microscope CFSM-5510 (manufactured by JEOL Ltd.). Magnification at an acceleration voltage of 20 kV A 500x image was taken. Any 10 images Was observed, and the presence or absence of a fiber bundle forming a bundle shape was confirmed as a single yarn was present in a biased manner
[0073] (8)結晶化度(%) [0073] (8) Crystallinity (%)
研磨側第一層の単糸分散不織布を研磨シートから剥離し、示差走査型熱量計 (D SC-60 :島津製作所株式会社製)で融解熱量を測定した (昇温速度は 20°CZ分、 試料重量は約 5mg)。測定した単位質量当たりの融解熱量を Δ Η とすると、結晶化 度 (Xc)は次式力も算出することができる。ここで、 Δ Ηは、結晶の単位質量当たりの The single yarn-dispersed nonwoven fabric of the polishing side first layer was peeled off from the polishing sheet, and the heat of fusion was measured with a differential scanning calorimeter (DSC-60: manufactured by Shimadzu Corporation) (temperature rising rate was 20 ° CZ min. The sample weight is about 5mg). If the heat of fusion per unit mass measured is Δ Η, the crystallinity (Xc) can also be calculated by the following formula force. Where Δ 、 is the unit mass of the crystal
0 0
融解熱量である。 The amount of heat of fusion.
Xc (%) = [ A H Ζ Δ Η〕 X 100 Xc (%) = [A H Ζ Δ Η] X 100
m 0 m 0
[0074] (9)吸水速度 (mm) [0074] (9) Water absorption speed (mm)
JIS L 1907— 2003に準じて、鉛直に吊るした試験片の下端を水中に浸し、一定 時間(10分間)放置した後、上昇した水の高さを測定した。 In accordance with JIS L 1907-2003, the lower end of a vertically suspended test piece was immersed in water and allowed to stand for a certain time (10 minutes), and then the height of the raised water was measured.
[0075] (10)圧縮エネルギー(gf'cmZcm2) [0075] (10) Compression energy (gf'cmZcm 2 )
測定機器は、 KES— G5 (カトーテック株式会社製)を用いた。試験条件は、以下の 通りである。 As a measuring instrument, KES-G5 (manufactured by Kato Tech Co., Ltd.) was used. The test conditions are as follows.
[0076] · SENS (記録感度): 2 [0076] · SENS (recording sensitivity): 2
'力計の種類: lkg 'Type of force meter: lkg
•SPEED RANGE : 0. 02mmZ秒 SPEED RANGE: 0.02mmZ seconds
•加圧面積: 2cm2 • Pressurized area: 2cm 2
•STROKE SET: 5. 0 STROKE SET: 5.0
'取り込み間隔: 0. 5 'Ingestion interval: 0.5
'上限荷重: 50gfZcm2 'Upper limit load: 50gfZcm 2
[0077] 上記の試験条件下で圧縮し、圧力と変形量との相関図から圧縮エネルギーを得た 。圧縮エネルギーが大きい程、圧縮されやすい、即ち、柔らかいことを意味する。圧 縮エネルギーが小さ 、ほど硬 、ことを意味する。 [0077] Compression was performed under the test conditions described above, and compression energy was obtained from a correlation diagram between pressure and deformation. It means that it is easy to compress, ie, it is soft, so that compression energy is large. The smaller the compression energy is, the harder it is.
[0078] (11)伸度(%) [0078] (11) Elongation (%)
JIS L 1096— 2003に準じて、定速伸長型引張試験機(テンシロン RTC— 1210 A: (株)オリエンテック社製)を用いて測定した。試験条件は、以下の通りである。
'試験片の寸法:幅 2. 5cm、長さ 20cm According to JIS L 1096-2003, the measurement was performed using a constant speed extension type tensile tester (Tensilon RTC-1210 A: manufactured by Orientec Co., Ltd.). The test conditions are as follows. 'Specimen dimensions: width 2.5cm, length 20cm
•つかみ間隔: 10cm • Grab interval: 10cm
,引張速度: lOcmZ分 , Tensile speed: lOcmZ min
[0079] [実施例 1] [0079] [Example 1]
固有粘度が 0. 51のポリエチレンテレフタレート(以下、 PETと略す)ペレットを、押 出機で加熱溶融後、 310°Cに加熱したダイに送り込んだ。溶融 PETを、直径 0. 3m mのノズルが 1. Ommピッチで一列に配列された紡口から、ノズル当りの吐出量 0. 2 OgZ分で吐出し、この紡口の開口端近傍から 365°Cに加熱された空気を 0. 24MPa の圧力で噴射させ、生成した単糸群を紡口下 60cmに位置せしめた移動する捕集面 上に連続的に集積し、メルトブロー不織布として巻き取った。 Polyethylene terephthalate (hereinafter abbreviated as PET) pellets with an intrinsic viscosity of 0.51 were heated and melted with an extruder and fed into a die heated to 310 ° C. Molten PET is ejected at a discharge volume of 0.2 OgZ per nozzle from a nozzle with 0.3 mm diameter nozzles arranged in a row at a pitch of 1. Omm, and 365 ° from the vicinity of the opening end of this nozzle. Air heated to C was jetted at a pressure of 0.24 MPa, and the produced single yarn group was continuously accumulated on a moving collecting surface located 60 cm below the spinning nozzle and wound up as a melt blown nonwoven fabric.
[0080] 得られたメルトブロー不織布は、 目付量 60gZm2、厚み 280 μ m、単糸の数平均 繊維径 1. O ^ m,吸光度の標準偏差 0. 032であった。 [0080] The obtained melt-blown nonwoven fabric had a basis weight of 60 gZm 2 , a thickness of 280 µm, a single yarn number average fiber diameter of 1. O ^ m, and a standard deviation of absorbance of 0.032.
一方、直接紡糸法によって単糸直径 3. 2 mの PET繊維を製造し、長さ 5. Omm に切断した短繊維を水中に分散せしめ抄造用スラリーとした。このスラリーを抄造し、 目付量 42gZm2の抄造シート (A)、及び、 目付量 17gZm2の抄造シート(B)を製造 した。 On the other hand, a PET fiber having a single yarn diameter of 3.2 m was produced by a direct spinning method, and short fibers cut to a length of 5. Omm were dispersed in water to obtain a papermaking slurry. The slurry was papermaking, papermaking sheet basis weight 42gZm 2 (A), and were prepared papermaking sheet basis weight 17gZm 2 (B).
[0081] 100デニール Z48フィラメントの PET繊維仮撚り加工糸力 なる目付量 41gZm2 の平織物(経糸密度 46本 Z2. 54cm、緯糸密度 54本 Z2. 54cm,無撚)の両面に 抄造シート (A)及び (B)を積層して、抄造シート (C)を製造した。 [0081] 100 denier Z48 filament PET fiber false twisting force Strength of sheet fabric on both sides of plain fabric with a basis weight of 41gZm 2 (warp density 46 Z2. 54cm, weft density 54 Z2. 54cm, untwisted) ) And (B) were laminated to produce a paper sheet (C).
[0082] 上記で得られたメルトブロー不織布を、抄造シート (C)のシート (A)側に積層した後 、静圧が 20kPaになるよう下方から吸引しながら、高速水流を噴射して三次元交絡さ せ多層構造シートを製造した。高速水流は、 3. Ommピッチで一列に配列された直 径 0. 2mmのノズルより、 3. OMPaの圧力で連続的に噴射させ、ノズルから 30mmの 位置で、シートに高圧水流を衝突させた。 [0082] After laminating the melt blown nonwoven fabric obtained above on the sheet (A) side of the papermaking sheet (C), a three-dimensional entanglement is performed by jetting a high-speed water flow while sucking from below so that the static pressure becomes 20 kPa. A multi-layered sheet was produced. The high-speed water flow was continuously jetted at a pressure of 3. OMPa from a nozzle with a diameter of 0.2 mm arranged in a row at a pitch of 3. Omm, and the high-pressure water flow collided with the sheet at a position 30 mm from the nozzle. .
[0083] 次いで、この多層構造シートに、水系のポリエーテル系ポリウレタンェマルジヨン(A P- 18 :日華化学株式会社製)を、多層構造シートに対して 12wt%となるよう含浸さ せ、熱風乾燥機で乾燥(130°C X 3分)してポリウレタンを凝固させた。 [0083] Next, this multilayer structure sheet was impregnated with water-based polyether polyurethane emulsion (AP-18: manufactured by Nikka Chemical Co., Ltd.) so as to be 12 wt% with respect to the multilayer structure sheet. The polyurethane was coagulated by drying with a hot air dryer (130 ° CX for 3 minutes).
次 、で、界面活性剤(ェマルゲン 120:花王株式会社製)を 0. 5wt%となるよう含
浸させ、熱風乾燥機で乾燥(130°C X 2分)した。この加工により、吸水性を向上させ ることが可能となる。 Next, the surfactant (Emulgen 120: manufactured by Kao Corporation) is included to 0.5 wt%. It was immersed and dried with a hot air dryer (130 ° C. X 2 minutes). This processing makes it possible to improve water absorption.
[0084] さらに、 # 240のパフイングペーパー(W54P240 :理研化学社製)を用い、ぺーパ 一速度 lOOOmZ分で、研磨側第一層であるメルトブロー不織布面をパフイングして [0084] Furthermore, using # 240 puffing paper (W54P240: manufactured by Riken Chemical Co., Ltd.), the melt blown nonwoven fabric surface, which is the first layer on the polishing side, was puffed at a paper speed of lOOOOmZ.
、テクスチャー加工用研磨布を得た。 A textured polishing cloth was obtained.
[0085] 得られたテクスチャー加工用研磨布の研磨側第一層である単糸分散不織布は、数 平均繊維径が 1. O ^ m,厚みが 160 m、最大高さ粗さが 42 mであり、繊維束は 観察されなかった。 [0085] The single yarn-dispersed non-woven fabric that is the first layer on the polishing side of the obtained textured polishing cloth has a number average fiber diameter of 1. O ^ m, a thickness of 160 m, and a maximum height roughness of 42 m. There were no fiber bundles observed.
得られた研磨布を 38mm幅にスリットして用い、以下の条件で、アルミニウム板に Ni —Pメツキ後ポリッシユカ卩ェを施したディスク基板をテクスチャー加工した。 The obtained polishing cloth was slit into a 38 mm width, and a disk substrate having a Ni—P plating and a polish cache on an aluminum plate was textured under the following conditions.
[0086] (テクスチャー加工条件) [0086] (Texture processing conditions)
砥粒:ダイヤモンド遊離砥粒 Abrasive: Diamond loose abrasive
砥粒平均粒径: 0. 3 μ ηι Average grain size: 0.3 μ ηι
基板回転数: 500rpm Board rotation speed: 500rpm
研磨布供給速度: lOcmZ分 Polishing cloth supply speed: lOcmZ min
トラバース条件:振幅 lmm、 600回 Z分(10Hz) Traverse conditions: Amplitude lmm, 600 times Z min (10Hz)
加工後のディスク基板の表面平均粗さ(Ra)を測定したところ、 0. 31nmであった。 The surface average roughness (Ra) of the processed disk substrate was measured and found to be 0.31 nm.
[0087] [実施例 2] [0087] [Example 2]
メルトブロー不織布の製造において、単孔吐出量を 0. 10gZ分とした以外は実施 例 1と同様にして、目付量 60gZm2、厚み 280 m、単糸の数平均繊維径 0. 6 μ ηι 、吸光度の標準偏差 0. 028のメルトブロー不織布を得た。次いで、得られたメルトブ ロー不織布を用い、実施例 1と同様にして、テクスチャー加工用研磨布の作製、及び 、テクスチャー加工 'Ra測定を実施した。 In the production of the melt blown nonwoven fabric, the weight per unit area was 60 gZm 2 , the thickness was 280 m, the number average fiber diameter of the single yarn was 0.6 μηι A melt blown nonwoven fabric with a standard deviation of 0.028 was obtained. Next, using the obtained melt blown nonwoven fabric, in the same manner as in Example 1, production of a textured polishing cloth and textured 'Ra measurement were performed.
[0088] 単孔吐出量を実施例 1の半分に低下させることによりメルトブロー不織布を構成す る単糸の数平均繊維径を 0. 6 mに小さくすること力でき、単糸の細径ィ匕によって、 得られたテクスチャー加工用研磨布の研磨側第 1層表面の最大高さ粗さは 34 μ mま で小さくすることが可能となり、また、繊維束は観察されな力つた。テクスチャー加工 後のディスク基板の表面平均粗さ(Ra)を測定したところ、 0. 26nmであった。
[0089] [実施例 3] [0088] The number average fiber diameter of the single yarn constituting the melt blown nonwoven fabric can be reduced to 0.6 m by reducing the single-hole discharge rate to half that of Example 1, and the single yarn fine diameter can be reduced. As a result, it was possible to reduce the maximum height roughness of the surface of the first layer on the polishing side of the textured polishing cloth to 34 μm, and the fiber bundles were not observed. The surface roughness (Ra) of the disk substrate after texturing was measured and found to be 0.26 nm. [0089] [Example 3]
メルトブロー不織布の製造において、ポリマーにナイロン 6 (UBEナイロン 1011FB :宇部興産株式会社製)を用いた以外は実施例 1と同様にして、 目付量 60gZm2、 厚み 280 /ζ πι、単糸の数平均繊維径 1. 4 /ζ πι、吸光度の標準偏差 0. 038のメルト ブロー不織布を得た。次いで、得られたメルトブロー不織布を用い、実施例 1と同様 にして、テクスチャー加工用研磨布の作製、及び、テクスチャー加工 'Ra測定を実施 した。 In the production of the melt blown nonwoven fabric, in the same manner as in Example 1 except that nylon 6 (UBE nylon 1011FB: manufactured by Ube Industries Co., Ltd.) was used as the polymer, the basis weight was 60 gZm 2 , the thickness was 280 / ζ πι, and the number average of single yarn A melt blown nonwoven fabric having a fiber diameter of 1.4 / ζ πι and a standard deviation of absorbance of 0.038 was obtained. Next, using the obtained melt-blown nonwoven fabric, in the same manner as in Example 1, production of a textured polishing cloth and textured 'Ra measurement were performed.
[0090] 得られたテクスチャー加工用研磨布の研磨側第一層である単糸分散不織布の数 平均繊維径は 1. 4 /ζ πι、厚みは 120 m、最大高さ粗さは 48 mであり、繊維束は 観察されなかった。テクスチャー加工後のディスク基板の表面平均粗さ (Ra)を測定 したところ、 0. 39nmであった。 [0090] Number of single yarn-dispersed nonwoven fabrics as the polishing-side first layer of the resulting textured polishing cloth Average fiber diameter is 1.4 / ζ πι, thickness is 120 m, maximum height roughness is 48 m There were no fiber bundles observed. The surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.39 nm.
[0091] [実施例 4] [0091] [Example 4]
実施例 1と同様にして得られた、 目付量 60gZm2、厚み 280 /ζ πι、単糸の数平均 繊維径 1. O ^ m,吸光度の標準偏差 0. 032のメルトブロー不織布を用い、多層構造 シートにポリエーテル系水系ポリウレタンェマルジヨンを含浸させず、 # 500のバフィ ングペーパー(C54P500:理研化学社製)を用い、ペーパー速度 lOOOmZ分で研 磨側第一層である単糸分散不織布面を 4回パフイングした以外は、実施例 1と同様に して、テクスチャー加工用研磨布の作製、及び、テクスチャー加工 'Ra測定を実施し た。 Obtained in the same manner as in Example 1, using a melt blown nonwoven fabric having a basis weight of 60 gZm 2 , a thickness of 280 / ζ πι, a single yarn number average fiber diameter of 1. O ^ m, and a standard deviation of absorbance of 0.032, and having a multilayer structure Single yarn-dispersed non-woven fabric surface, which is the first layer on the polishing side, with a paper speed of lOOOOmZ, using # 500 buffing paper (C54P500: manufactured by Riken Chemical Co., Ltd.) without impregnating the sheet with polyether water-based polyurethane emulsion. In the same manner as in Example 1, except that puffing was performed four times, production of a textured polishing cloth and textured Ra measurement were performed.
[0092] 得られたテクスチャー加工用研磨布の研磨側第一層である単糸分散不織布の数 平均繊維径は 1. O ^ m,厚みは 110 /ζ πι、最大高さ粗さは 56 /z mであり、繊維束は 観察されなかった。テクスチャー加工後のディスク基板の表面平均粗さ (Ra)を測定 したところ、 0. 42nmであった。 [0092] Number of single-fiber-dispersed nonwoven fabrics as the first layer on the polishing side of the obtained textured polishing cloth Average fiber diameter is 1. O ^ m, thickness is 110 / ζ πι, and maximum height roughness is 56 / zm and no fiber bundles were observed. The average surface roughness (Ra) of the textured disk substrate was measured and found to be 0.42 nm.
[0093] [比較例 1] [0093] [Comparative Example 1]
実施例 1と同様にして得られた、 目付量 60gZm2、厚み 280 /ζ πι、単糸の数平均 繊維径 1. O ^ m,吸光度の標準偏差 0. 032のメルトブロー不織布を用い、多層構造 シートにポリエーテル系水系ポリウレタンェマルジヨンを含浸させない以外は、実施例 1と同様にして、テクスチャー加工用研磨布の作製、及び、テクスチャー加工 'Ra測
定を実施した。 Obtained in the same manner as in Example 1, using a melt blown nonwoven fabric having a basis weight of 60 gZm 2 , a thickness of 280 / ζ πι, a single yarn number average fiber diameter of 1. O ^ m, and a standard deviation of absorbance of 0.032, and having a multilayer structure Except that the sheet is not impregnated with the polyether-based aqueous polyurethane emulsion, the production of the textured polishing cloth and the texture processing 'Ra measurement are performed in the same manner as in Example 1. Was carried out.
[0094] 高分子弾性体を含浸させずに、比較的目の粗!、パフイングペーパーを用いてパフ イングしたため、研磨層の平滑性が悪ぐ研磨側第一層である単糸分散不織布の表 面の最大高さ粗さは 98 μ mであり、高分子弾性体を含浸させた実施例 1と比較して 約 2倍の最大高さ粗さであった。テクスチャー加工後のディスク基板の表面平均粗さ( Ra)を測定したところ、 0. 68nmであった。 [0094] Since the puffed paper was relatively rough without impregnating the polymer elastic body, and the puffed paper was used, the smoothness of the polishing layer was poor. The maximum height roughness of the surface was 98 μm, and the maximum height roughness was about twice that of Example 1 impregnated with a polymer elastic body. The surface roughness (Ra) of the disk substrate after texturing was measured and found to be 0.68 nm.
[0095] [比較例 2] [0095] [Comparative Example 2]
実施例 1と同様にして得られた、 目付量 60gZm2、厚み 280/ζ πι、単糸の数平均 繊維径 1. O ^ m,吸光度の標準偏差 0. 032のメルトブロー不織布を用い、抄造シ一 HA)と (B)を構成する短繊維の単糸直径を 10.: mとした以外は、実施例 1と同 様にして、テクスチャー加工用研磨布の作製、及び、テクスチャー加工 'Ra測定を実 施した。 Using a melt blown nonwoven fabric obtained in the same manner as in Example 1 and having a basis weight of 60 gZm 2 , a thickness of 280 / ζ πι, a single yarn number average fiber diameter of 1. O ^ m, and a standard deviation of absorbance of 0.032, (I) Fabrication of textured polishing cloth and texture processing 'Ra measurement in the same manner as in Example 1 except that the single yarn diameter of the short fibers constituting HA) and (B) was set to 10 .: m. Was implemented.
テクスチャー加工後のディスク基板の表面平均粗さ (Ra)を測定したところ、 0. 61η mであった。 The surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.61 ηm.
[0096] [比較例 3] [0096] [Comparative Example 3]
アルカリ減量し易!、ポリエステル共重合体ポリマー(分子量 4000のポリエチレンダリ コールを 10 %共重合した PET)を海成分に用い、レギュラータイプの PET (固有 粘度 0. 65)を島成分に用いた。この 2種のポリマーを各々ギアポンプで計量し、海成 分 35wt%、島成分 65wt%の割合で、島本数 100本 Zホールの紡口を用いて 290 Alkaline weight loss is easy! Polyester copolymer polymer (PET copolymerized with polyethylene dallic acid having a molecular weight of 4000%) was used for the sea component, and regular type PET (intrinsic viscosity 0.65) was used for the island component. Each of these two types of polymer is weighed with a gear pump, and the sea component is 35 wt% and the island component is 65 wt%.
°Cで溶融紡糸して未延伸糸を得た。 An undrawn yarn was obtained by melt spinning at ° C.
[0097] 得られた未延伸糸を、温度 75°C、延伸倍率 2. 8倍で熱延伸し、 130°Cで熱セットし て、島成分の繊維径 1. 2 mの海島型複合繊維 (繊維径 14. 8 m)を得た。 [0097] The obtained undrawn yarn was heat-drawn at a temperature of 75 ° C and draw ratio of 2.8, and heat-set at 130 ° C, and the island component fiber diameter was 1.2 m. (Fiber diameter 14.8 m) was obtained.
得られた海島型複合繊維を 5. Ommに切断し、水中に分散せしめて抄造用スラリ 一とした。このスラリーを抄造し、 目付量 17gZm2の抄造シート (B)及び目付量 150gThe obtained sea-island type composite fiber was cut to 5. Omm and dispersed in water to make a papermaking slurry. This slurry is made into a paper sheet (B) having a basis weight of 17 gZm 2 and a basis weight of 150 g.
Zm2の抄造シート (D)を製造した。 A Zm 2 paper sheet (D) was produced.
[0098] 次いで、実施例 1と同様にして、 100デニール Z48フィラメントの PET繊維力 なる 目付量 41gZm2の平織物の両面に、抄造シート (D)と抄造シート (B)を積層した後[0098] Next, in the same manner as in Example 1, the paper sheet (D) and the paper sheet (B) were laminated on both sides of a plain woven fabric having a basis weight of 41 gZm 2 with a PET fiber strength of 100 denier Z48 filament.
、静圧が 15kPaになるよう下方から吸引しながら、高速水流を噴射して三次元交絡さ
せ多層構造シート (E)を製造した。高速水流は、 3. Ommピッチで一列に配列された 直径 0. 2mmのノズルより、 3. OMPaの圧力で連続的に噴射させ、ノズルから 30mm の位置で該シートに高圧水流を衝突させた。 3D entanglement by spraying high-speed water flow while sucking from below so that the static pressure is 15kPa A multilayered structure sheet (E) was produced. The high-speed water flow was continuously injected at a pressure of 3. OMPa from a nozzle with a diameter of 0.2 mm arranged in a row at a pitch of 3. Omm, and a high-pressure water flow was made to collide with the sheet at a position 30 mm from the nozzle.
[0099] 得られた多層構造シート (E)に溶剤系のポリエーテル系ポリウレタンェマルジヨンの ジメチルホルムアミド (DMF)溶液を、多層構造シートに対して 26wt%となるよう含浸 させ、水槽に浸漬させることでポリウレタンを凝固 (湿式凝固)後、熱風乾燥機で乾燥 ( 130°C X 3分)した。さらに、 80°Cの 5wt%NaOH水溶液で海成分を溶出して、数 平均繊維径 1. 2 mである極細繊維を形成させた。なお、走査型電子顕微鏡 (JSM - 5510 :日本電子株式会社製)で観察した際、繊維束の存在が確認された。 [0099] The obtained multilayer structure sheet (E) is impregnated with a dimethylformamide (DMF) solution of a solvent-based polyether polyurethane emulsion in an amount of 26 wt% with respect to the multilayer structure sheet, and immersed in a water bath. The polyurethane was coagulated (wet coagulation), and then dried with a hot air dryer (130 ° CX 3 minutes). Furthermore, sea components were eluted with a 5 wt% NaOH aqueous solution at 80 ° C. to form ultrafine fibers having a number average fiber diameter of 1.2 m. When observed with a scanning electron microscope (JSM-5510: manufactured by JEOL Ltd.), the presence of the fiber bundle was confirmed.
[0100] 次!、で、 # 240のパフイングペーパー(理研化学社製、 W54P240)を用い、ぺー パー速度 lOOOmZ分で第一層表面をパフイングして起毛し、テクスチャー加工用研 磨布を得た。研磨層第一層である不織布を構成する単糸の数平均繊維径が 1. 2 μ mであり、また、高分子弾性体を含浸しているにも関らず、繊維束が存在していたた め、テクスチャー加工用研磨布の研磨側第一層の最大高さ粗さは 120 mであり、き わめて大きかった。 [0100] Next !, using # 240 puffing paper (W54P240, manufactured by RIKEN CHEMICAL CO., LTD.), Puffing the surface of the first layer at a paper speed of lOOOOmZ and raising the surface to obtain a polishing cloth for texturing It was. The number average fiber diameter of the single yarn composing the non-woven fabric that is the first layer of the polishing layer is 1.2 μm, and the fiber bundle is present even though it is impregnated with a polymer elastic body. Therefore, the maximum height roughness of the polishing-side first layer of the textured polishing cloth was 120 m, which was extremely large.
実施例 1と同様にして、テクスチャー加工 'Ra測定を実施した結果、テクスチャー加 ェ後のディスク基板の表面平均粗さ(Ra)は 0. 84nmであった。 As in Example 1, the texture processing 'Ra measurement was performed. As a result, the surface average roughness (Ra) of the disk substrate after texture addition was 0.84 nm.
[0101] [比較例 4] [0101] [Comparative Example 4]
加熱空気温度を 340°Cとしたこと以外は、実施例 1と同様にしてメルトブロー不織布 を製造した。得られたメルトブロー不織布は、 目付量 60gZm2、厚み 280 m、単糸 の数平均繊維径 1. 8 /ζ πι、吸光度の標準偏差 0. 046であった。 A melt blown nonwoven fabric was produced in the same manner as in Example 1 except that the heating air temperature was 340 ° C. The resulting meltblown nonwoven fabric had a basis weight of 60 gZm 2 , a thickness of 280 m, a number average fiber diameter of single yarn of 1.8 / ζ πι, and a standard deviation of absorbance of 0.046.
このメルトブロー不織布を用い、実施例 1と同様にして、テクスチャー加工用研磨布 の作製、及び、テクスチャー加工 'Ra測定を実施した結果、テクスチャー加工後のデ イスク基板の表面平均粗さ(Ra)は 0. 52nmであった。 Using this melt blown non-woven fabric, in the same manner as in Example 1, the production of the textured polishing cloth and the texturing process' Ra measurement result showed that the surface average roughness (R a ) of the disk substrate after texturing Was 0.52 nm.
[0102] 研磨側第一層である単糸分散不織布の表面の最大高さ粗さは 70 m以下である 力 メルトブロー不織布の製造における加熱空気温度が低力つた (実施例 1では 365 °Cで実施)ため、メルトブロー不織布の数平均繊維径が増大して、研磨砥粒の水平 方向への分散性が悪くなり、その結果、テクスチャー加工後のディスク基板の表面平
均粗さ (Ra)が大きくなつたと考えられる。 [0102] The maximum height roughness of the surface of the single yarn-dispersed nonwoven fabric, which is the first layer on the polishing side, is 70 m or less. Force The heating air temperature in the production of the melt blown nonwoven fabric was low (in Example 1, at 365 ° C). Therefore, the number average fiber diameter of the melt blown nonwoven fabric increases, and the dispersibility of the abrasive grains in the horizontal direction deteriorates. As a result, the surface flatness of the disk substrate after texturing is reduced. It is thought that the average roughness (Ra) has increased.
[0103] [比較例 5] [0103] [Comparative Example 5]
加熱空気温度を 315°Cとして、整流器を用いなかったこと以外は、実施例 1と同様 にしてメルトブロー不織布を製造した。得られたメルトブロー不織布は、 目付量 60gZ m2、厚み 280 /ζ πι、単糸の数平均繊維径 2. 5 /ζ πι、吸光度の標準偏差 0. 068であ つた ο A melt blown nonwoven fabric was produced in the same manner as in Example 1 except that the heating air temperature was set to 315 ° C and the rectifier was not used. The resulting meltblown nonwoven fabric had a basis weight of 60 gZ m 2 , a thickness of 280 / ζ πι, a number average fiber diameter of single yarn of 2.5 / ζ πι, and a standard deviation of absorbance of 0.068.
このメルトブロー不織布を用い、実施例 1と同様にして、テクスチャー加工用研磨布 の作製、及び、テクスチャー加工 'Ra測定を実施した結果、テクスチャー加工後のデ イスク基板の表面平均粗さ(Ra)は 0. 65nmであった。 Using this melt blown non-woven fabric, in the same manner as in Example 1, the production of the textured polishing cloth and the texturing process' Ra measurement result showed that the surface average roughness (R a ) of the disk substrate after texturing Was 0.665 nm.
[0104] [比較例 6] [Comparative Example 6]
メルトブロー不織布の製造において、ポリマーにナイロン 6 (UBEナイロン 1011FB :宇部興産株式会社製)を用いた以外は実施例 1と同様にして、 目付量 60gZm2、 厚み 280 /ζ πι、単糸の数平均繊維径 1. O ^ m,吸光度の標準偏差 0. 032のメルト ブロー不織布を得た。 In the production of the melt blown nonwoven fabric, in the same manner as in Example 1 except that nylon 6 (UBE nylon 1011FB: manufactured by Ube Industries) was used as the polymer, the basis weight was 60 gZm 2 , the thickness was 280 / ζ πι, and the number average of single yarn A melt blown nonwoven fabric having a fiber diameter of 1.O ^ m and a standard deviation of absorbance of 0.032 was obtained.
[0105] 得られたメルトブロー不織布を用い、実施例 1と同様にして多層構造シートを作製し 、次いで、界面活性剤を含浸させないこと、溶剤系のポリエーテル系ポリウレタンエマ ルジョンのジメチルホルムアミド(DMF)溶液を、多層構造シートに対して 1 lwt%とな るように含浸させたこと以外は、実施例 3と同様にして、テクスチャー加工用研磨布の 作製、及び、テクスチャー加工 'Ra測定を実施した。 [0105] Using the obtained melt-blown nonwoven fabric, a multilayer structure sheet was produced in the same manner as in Example 1, and then not impregnated with a surfactant, dimethylformamide (DMF) of a solvent-based polyether polyurethane emulsion Except that the solution was impregnated so as to be 1 lwt% with respect to the multilayer structure sheet, the production of the textured polishing cloth and the textured 'Ra measurement were performed in the same manner as in Example 3. .
テクスチャー加工後のディスク基板の表面平均粗さ (Ra)を測定したところ、 0. 58η mであった。 The surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.58 ηm.
[0106] [比較例 7] [Comparative Example 7]
実施例 1と同様にして得られた、 目付量 60gZm2、厚み 280 /ζ πι、単糸の数平均 繊維径 1. O ^ m,吸光度の標準偏差 0. 032のメルトブロー不織布を用い、実施例 1 と同様にして多層構造シートを作製した。 Example 1 Using a melt blown nonwoven fabric obtained in the same manner as in Example 1, having a basis weight of 60 gZm 2 , a thickness of 280 / ζ πι, and a single yarn number average fiber diameter of 1. O ^ m and a standard deviation of absorbance of 0.032 A multilayer structure sheet was produced in the same manner as in 1.
[0107] 次いで、多層構造シートに溶剤系のポリカーボネート系ポリウレタンェマルジヨンの ジメチルホルムアミド (DMF)溶液を、多層構造シートに対して 34wt%となるように含 浸させ、水槽に浸漬することによってポリウレタンを凝固 (湿式凝固)させた後、熱風
乾燥機で乾燥(130°C X 3分)したこと以外は、実施例 1と同様にして、テクスチャー 加工用研磨布の作製、及び、テクスチャー加工 'Ra測定を実施した。 [0107] Next, a dimethylformamide (DMF) solution of a solvent-based polycarbonate polyurethane emulsion is immersed in the multilayer structure sheet so as to be 34 wt% with respect to the multilayer structure sheet. After coagulation (wet coagulation), hot air Except for drying with a dryer (130 ° CX for 3 minutes), the production of a textured polishing cloth and the textured 'Ra measurement were carried out in the same manner as in Example 1.
テクスチャー加工後のディスク基板の表面平均粗さ (Ra)を測定したところ、 0. 59η mであった。 The surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.59 ηm.
[0108] [比較例 8] [Comparative Example 8]
固有粘度が 0.39の PETペレットを用いた以外は、実施例 1と同様にして得られた、 目付量 60gZm2、厚み 280 m、単糸の数平均繊維径 0. 9 /ζ πι、吸光度の標準偏 差 0. 045のメルトブロー不織布を用い、実施例 1と同様にして多層構造シートを作製 した。 Except for using PET pellets with an intrinsic viscosity of 0.39, obtained in the same manner as in Example 1, the basis weight 60 gZm 2 , thickness 280 m, single yarn number average fiber diameter 0.9 / ζ πι, absorbance standard Using a melt blown nonwoven fabric with a deviation of 0.045, a multilayer structure sheet was produced in the same manner as in Example 1.
[0109] 得られたメルトブロー不織布を用い、実施例 1と同様にしてテクスチャー加工用研磨 布の作製を試みた。研磨側第一層であるメルトブロー不織布面をパフイングしたとこ ろ、多くの単糸が切断してしまい、評価に値するテクスチャー加工用研磨布を作製す ることができな力つた。研磨側第一層である単糸分散不織布の結晶化度を測定した ところ、 27. 2%であった。 [0109] Using the obtained melt-blown nonwoven fabric, an attempt was made to produce a textured polishing cloth in the same manner as in Example 1. When the melt blown nonwoven fabric surface, which is the first layer on the polishing side, was puffed, many single yarns were cut, and it was difficult to produce a textured polishing cloth worthy of evaluation. The crystallinity of the single yarn-dispersed nonwoven fabric as the polishing-side first layer was measured and found to be 27.2%.
[0110] [比較例 9] [0110] [Comparative Example 9]
実施例 1と同様にして得られた、目付量 30gZm2、厚み 140 /ζ πι、単糸の数平均 繊維径 1. O ^ m,吸光度の標準偏差 0. 032のメルトブロー不織布を用い、実施例 1 と同様にして多層構造シートを作製した。 Example 1 Using a melt-blown nonwoven fabric obtained in the same manner as in Example 1, having a basis weight of 30 gZm 2 , a thickness of 140 / ζ πι, a single yarn number average fiber diameter of 1. O ^ m, and a standard deviation of absorbance of 0.032 A multilayer structure sheet was produced in the same manner as in 1.
この多層構造シートからなるテクスチャー加工用研磨布を用いて、テクスチャーカロ ェ 'Ra測定を実施した。テクスチャー加工後のディスク基板の表面平均粗さ (Ra)を 測定したところ、 0. 63nmであった。 Using the textured polishing cloth comprising the multilayer structure sheet, texture calorie Ra measurement was performed. The surface average roughness (Ra) of the disk substrate after texturing was measured and found to be 0.63 nm.
以上の実施例、比較例で作製された研磨布の構造および物性を、表 1、 2に示す。 Tables 1 and 2 show the structures and physical properties of the polishing cloths produced in the above Examples and Comparative Examples.
(注 1 ) メルトブロー: メルトブロー不織布 (Note 1) Melt blow: Melt blow nonwoven fabric
(注 2 ) 海島糸:海島複合糸から得た極細繊維不織布
(Note 2) Umijima Yarn: Ultra-fine fiber nonwoven fabric obtained from Umijima composite yarn
表 2 Table 2
Claims
請求の範囲 The scope of the claims
[I] 単糸分散不織布と支持体を積層した 2層以上の多層構造シートからなる研磨布で あり、単糸分散不織布を研磨側の表層の第一層とし、単糸分散不織布を構成する単 糸の数平均繊維径は 0. 1〜1. 7 mであり、第一層の表面が起毛されており、第一 層表面の最大高さ粗さが 70 m以下であり、吸水速度が 100〜240mm、圧縮エネ ルギ一が 0. 10〜0. 30gf' cmZcm2であることを特徴とする精密加工用研磨布。 [I] A polishing cloth composed of a multilayer structure sheet of two or more layers in which a single yarn-dispersed nonwoven fabric and a support are laminated. The single yarn-dispersed nonwoven fabric is used as the first layer of the polishing-side surface layer. The number average fiber diameter of the yarn is 0.1 to 1.7 m, the surface of the first layer is raised, the maximum height roughness of the surface of the first layer is 70 m or less, and the water absorption speed is 100 A polishing cloth for precision machining, characterized in that the compression energy is ˜240 mm and the compression energy is from 0.10 to 0.30 gf ′ cmZcm 2 .
[2] 単糸分散不織布がメルトブロー不織布であることを特徴とする請求項 1に記載の精 密加工用研磨布。 [2] The polishing cloth for fine processing according to [1], wherein the single yarn-dispersed nonwoven fabric is a melt blown nonwoven fabric.
[3] 第一層の単糸分散不織布の厚みが 100 m以上であることを特徴とする請求項 1 または 2に記載の精密加工用研磨布。 [3] The polishing cloth for precision processing according to claim 1 or 2, wherein the thickness of the single-layer dispersed nonwoven fabric of the first layer is 100 m or more.
[4] 第一層に使用する単糸分散不織布が、標準偏差 0. 050以下の吸光度を有するこ とを特徴とする請求項 1〜3のいずれかに記載の精密加工用研磨布。 [4] The precision processing abrasive cloth according to any one of [1] to [3], wherein the single yarn-dispersed nonwoven fabric used in the first layer has an absorbance with a standard deviation of 0.050 or less.
[5] 第一層の単糸分散不織布がポリエステル繊維カゝら成り、該ポリエステル繊維の結晶 化度が 35%以上であることを特徴とする請求項 1〜4のいずれかに記載の精密加工 用研磨布。 [5] The precision processing according to any one of [1] to [4], wherein the first-layer single-fiber-dispersed nonwoven fabric is made of polyester fiber, and the crystallinity of the polyester fiber is 35% or more. Abrasive cloth.
[6] 多層構造シート中に高分子弾性体が含浸されていることを特徴とする請求項 1〜5 の!、ずれかに記載の精密加工用研磨布。 6. The precision processing abrasive cloth according to any one of claims 1 to 5, wherein the multilayer structure sheet is impregnated with a polymer elastic body.
[7] 高分子弾性体が、多層構造シートに対して 30wt%以下で付与されていることを特 徴とする請求項 1〜6のいずれかに記載の精密加工用研磨布。 [7] The precision processing abrasive cloth according to any one of [1] to [6], wherein the polymer elastic body is applied to the multilayer structure sheet at 30 wt% or less.
[8] 高分子弾性体がポリウレタンであることを特徴とする請求項 1〜7のいずれかに記載 の精密加工用研磨布。 [8] The precision processing abrasive cloth according to any one of [1] to [7], wherein the polymer elastic body is polyurethane.
[9] 1. OkgfZcm荷重時の長手方向の伸度力 以下、幅方向の伸度が 12%以下で あることを特徴とする請求項 1〜8のいずれかに記載の精密加工用研磨布。 [9] 1. The polishing cloth for precision machining according to any one of claims 1 to 8, wherein the elongation in the longitudinal direction when loaded with OkgfZcm is equal to or less than 12% in the width direction.
[10] 支持体が不織布であることを特徴とする請求項 1〜9のいずれかに記載の精密加 ェ用研磨布。 [10] The polishing cloth for precision heating according to any one of [1] to [9], wherein the support is a nonwoven fabric.
[II] 支持体が、織物の両面に繊維径 10 μ m以下の極細繊維層を積層させた積層体で あることを特徴とする請求項 1〜10のいずれかに記載の精密加工用研磨布。
[II] The precision processing abrasive cloth according to any one of claims 1 to 10, wherein the support is a laminate in which ultrafine fiber layers having a fiber diameter of 10 μm or less are laminated on both sides of a woven fabric. .
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Cited By (2)
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JP2010069592A (en) * | 2008-09-19 | 2010-04-02 | Asahi Kasei Fibers Corp | Abrasive cloth for processing texture |
JP2011042010A (en) * | 2009-08-21 | 2011-03-03 | Kuraray Co Ltd | Surface-machining method for polishing pad, and the polishing pad achieved by the same |
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JPH09262775A (en) * | 1996-01-24 | 1997-10-07 | Japan Vilene Co Ltd | Polishing sheet |
JPH10128674A (en) * | 1996-10-28 | 1998-05-19 | Rooder Nitta Kk | Polishing pad |
JP2000237951A (en) * | 1999-02-19 | 2000-09-05 | Toray Ind Inc | Polishing cloth and polishing device |
JP2003025215A (en) * | 2001-07-10 | 2003-01-29 | Unitika Ltd | Nonwoven fabric for polishing and abrasive sheet |
JP2004005981A (en) * | 2003-05-27 | 2004-01-08 | Kanebo Ltd | Polishing tape used for manufacturing magnetic recording medium |
JP2004130395A (en) * | 2002-10-08 | 2004-04-30 | Toray Ind Inc | Abrasive cloth for glass texture working, and method of manufacturing magnetic recording medium using the same |
JP2004303280A (en) * | 2003-03-28 | 2004-10-28 | Hoya Corp | Method for manufacturing glass substrate for information recording medium |
JP2005329534A (en) * | 2004-04-21 | 2005-12-02 | Toray Ind Inc | Polishing cloth |
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JP3901939B2 (en) * | 2000-12-05 | 2007-04-04 | 帝人コードレ株式会社 | Polishing base fabric and polishing method |
TWI341230B (en) * | 2004-04-21 | 2011-05-01 | Toray Industries | Polishing cloth and production method for the nanofiber construction |
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2007
- 2007-06-05 WO PCT/JP2007/061372 patent/WO2007142235A1/en active Application Filing
- 2007-06-05 JP JP2008520589A patent/JP5032472B2/en active Active
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Patent Citations (8)
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JPH09262775A (en) * | 1996-01-24 | 1997-10-07 | Japan Vilene Co Ltd | Polishing sheet |
JPH10128674A (en) * | 1996-10-28 | 1998-05-19 | Rooder Nitta Kk | Polishing pad |
JP2000237951A (en) * | 1999-02-19 | 2000-09-05 | Toray Ind Inc | Polishing cloth and polishing device |
JP2003025215A (en) * | 2001-07-10 | 2003-01-29 | Unitika Ltd | Nonwoven fabric for polishing and abrasive sheet |
JP2004130395A (en) * | 2002-10-08 | 2004-04-30 | Toray Ind Inc | Abrasive cloth for glass texture working, and method of manufacturing magnetic recording medium using the same |
JP2004303280A (en) * | 2003-03-28 | 2004-10-28 | Hoya Corp | Method for manufacturing glass substrate for information recording medium |
JP2004005981A (en) * | 2003-05-27 | 2004-01-08 | Kanebo Ltd | Polishing tape used for manufacturing magnetic recording medium |
JP2005329534A (en) * | 2004-04-21 | 2005-12-02 | Toray Ind Inc | Polishing cloth |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2010069592A (en) * | 2008-09-19 | 2010-04-02 | Asahi Kasei Fibers Corp | Abrasive cloth for processing texture |
JP2011042010A (en) * | 2009-08-21 | 2011-03-03 | Kuraray Co Ltd | Surface-machining method for polishing pad, and the polishing pad achieved by the same |
Also Published As
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TW200825241A (en) | 2008-06-16 |
JPWO2007142235A1 (en) | 2009-10-29 |
TWI410298B (en) | 2013-10-01 |
JP5032472B2 (en) | 2012-09-26 |
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