WO2005078782A1 - プラズマ処理装置及びプラズマ処理方法 - Google Patents
プラズマ処理装置及びプラズマ処理方法 Download PDFInfo
- Publication number
- WO2005078782A1 WO2005078782A1 PCT/JP2005/002217 JP2005002217W WO2005078782A1 WO 2005078782 A1 WO2005078782 A1 WO 2005078782A1 JP 2005002217 W JP2005002217 W JP 2005002217W WO 2005078782 A1 WO2005078782 A1 WO 2005078782A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- transmission window
- plasma
- processing apparatus
- plasma processing
- processing
- Prior art date
Links
- 238000012545 processing Methods 0.000 title claims abstract description 153
- 238000003672 processing method Methods 0.000 title claims description 6
- 230000005540 biological transmission Effects 0.000 claims abstract description 100
- 238000000034 method Methods 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 9
- 230000002093 peripheral effect Effects 0.000 claims description 49
- 230000005684 electric field Effects 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 9
- 239000003989 dielectric material Substances 0.000 claims description 7
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 5
- 239000002245 particle Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 description 13
- 239000007789 gas Substances 0.000 description 12
- 238000011109 contamination Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- -1 for example Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32238—Windows
Definitions
- the present invention relates to a plasma processing apparatus and a plasma processing method.
- a conventional plasma processing apparatus using microwaves of this type has a flat transmission window made of a dielectric material, for example, quartz or ceramics, which hermetically covers the upper opening of the processing container.
- the transmission window is supported by a support portion that supports the periphery of the transmission window in the processing container.
- a metal plate called a slot antenna On the upper surface of the transmission window, there is provided a metal plate called a slot antenna, for example, in which a number of slots are formed.
- a strong electromagnetic field standing wave is formed in the transmission window, and in particular, the contact point between the transmission window and the supporting portion supporting the transmission window (for example, the support section is strong at the inner edge of the processing vessel, and the energy from the electric field is high! Plasma tends to form (referred to herein as the "edge effect").
- the edge effect is that near the dielectric, the microwave electric field is strong, and the electron temperature of the plasma is high. If there is a material surface in that region, the potential difference increases and the irradiation energy of ions to the surface increases. is there.
- the member near the contact point is sputtered by the plasma and adheres to the substrate to be processed, and the processing rate of the processed object may be non-uniform or the quality of the processing may be degraded.
- differences occur in the quality of plasma generated in other parts of the transmission window (for example, radical density, plasma density, electron temperature), resulting in uneven processing. It may lead to This phenomenon becomes more pronounced when the power is increased for high-speed processing.
- Patent Document 1 Japanese Patent Publication No. 2002-299240
- the present invention has been made in view of the power, and has been described above as being caused by the generation of a strong electric field and plasma in the vicinity of the contact between the supporting portion supporting the transmission window and the transmission window. For the purpose of suppressing the adverse effects.
- a plasma processing apparatus of the present invention includes a transmission window made of a dielectric material that hermetically covers an upper opening of a processing container, and a support that supports a peripheral portion of the transmission window in the processing container.
- the transmission window has a hanging portion of the same material as the transmission window in a central region, and a predetermined distance is provided between an outer peripheral surface of the hanging portion and an inner surface of a side wall of the processing vessel continuing from the support portion. It is characterized in that the above gap is formed.
- the outer peripheral surface of the downwardly protruding lower part of the transmission window functions as a kind of shielding wall, and the peripheral portion of the supporting portion inside the processing container.
- the amount of particles, radicals, and the like sputtered by a strong electric field, plasma, or the like in the vicinity can reach the object to be processed. Since a strong impedance change point is generated inside the contact portion between the transmission window and the support part, that is, on the outer peripheral surface of the hanging part, the microwave propagating from the inside of the transmission window to the outside is reflected there.
- the electric field concentration at the inner peripheral edge of the processing vessel of the support is reduced, and the generation of a strong electric field and high-density plasma at the inner peripheral edge of the processing vessel at the support can be suppressed.
- the predetermined distance is 0.5 to 10 mm, more preferably 0.5 to 5 mm. That is, the predetermined distance between the outer peripheral surface of the hanging portion and the inner surface of the side wall of the processing vessel where the supporting portion or the supporting portion force continues.
- the distance should be 0.5-10 mm, more preferably 0.5-5 mm. If the space is narrow, as described in detail below, a strong electric field is generated between the outer peripheral surface of the hanging part and the inner surface of the side wall of the processing vessel following the support, which solves the problems of the prior art described above. It becomes difficult. On the other hand, if it is too far away, the shielding effect of the hanging part is lost.
- the outer peripheral surface of the downwardly protruding hanging part in the strong electric field near the contact between the transmission window and the support member, which causes abnormal discharge functions as a kind of shielding wall.
- the plasma enters and reaches the vicinity of the contact, this plasma neutralizes the charge-up and causes a strong electric field. Can be suppressed.
- the plasma in order for the plasma to exist in the minute gap, it is necessary that there be at least a space for forming the sheath.
- the sheath becomes 0. 2 mm weak.
- the plasma at this time is argon plasma. Since the sheath must be formed on both the hanging part and the support member, the width of the gap must be at least 0.4 mm. Considering errors in manufacturing and assembling, the predetermined distance of the gap must be longer than 0.5 mm.
- the gap between the outer peripheral surface of the hanging part and the inner surface of the side wall of the processing vessel following the support or the support should be 0.5 to 10 mm, more preferably 0.5 to 5 mm.
- the outer peripheral surface of the hanging portion may be a tapered surface in which the gap gradually increases downward.
- a recess may be formed in the center region of the hanging part.
- a relatively convex portion is formed outside the hanging portion of the transmission window, and thereby the intensity of the electric field generated on each lower surface side of the concave portion and the convex portion is different. Therefore, the plasma density above the object can be controlled.
- the side wall forming the concave portion may be a tapered surface inclined toward the center of the concave portion. This makes it possible to adjust the degree of microwave reflection and to control the finer plasma density.
- the width of the hanging part is preferably ⁇ 4 or less.
- the vertical length of the hanging part is
- LZD is preferably 3 or more.
- the vertical length of the hanging part is preferably at least 20 mm, and more preferably at least 30 mm.
- At least one of the surfaces facing the inside of the processing vessel on the support portion or the side wall following the support portion may be coated with Y O (yttria).
- a plasma processing apparatus includes a transmission window having a dielectric force that air-tightly covers an upper opening of a processing container, and a peripheral edge of the transmission window in the processing container.
- the eaves are formed as described above. It functions as a shielding wall, suppresses the strong electric field near the inner peripheral edge of the processing vessel in the support section, suppresses the sputtering by plasma, and suppresses the amount of particles and radicals reaching the workpiece.
- the electric field concentration at the inner peripheral edge of the processing vessel of the support portion is reduced, and the generation of a strong electric field and high-density plasma at the inner peripheral edge of the processing vessel of the support portion can be suppressed.
- the predetermined distance should be 0.5 mm to 10 mm, preferably 0.5 mm to 5 mm.
- the plasma processing method of the present invention includes a transmission window having a dielectric force and hermetically covering an upper opening of the processing container, and a supporting portion for supporting a peripheral portion of the transmission window in the processing container.
- the transmission window has a hanging part made of the same material as the transmitting window in a central area, and an outer periphery of the hanging part is provided.
- a plasma processing apparatus having a gap formed between the surface and the support part force and the inner surface of the side wall of the processing vessel, and controlling the strength of the electric field around the transmission window by adjusting the gap. Characterized by
- the plasma processing apparatus includes a transmission window made of a dielectric material that hermetically covers an upper opening of the processing container; A supporting portion for supporting a peripheral portion of the transmission window, wherein the transmission window has a hanging portion made of the same material as the transmission window in a central region, and a processing vessel continuing from the outer peripheral surface of the hanging portion and the supporting portion.
- a gap is formed between the inner surface of the side wall and the plasma processing apparatus, which is a tapered surface with the gap gradually increasing downward, and the taper angle of the tapered surface is reduced. It is characterized in that the intensity of the electric field around the transmission window is controlled by adjusting.
- the degree of the microwave reflection described above can be reduced, and the contact point between the transmission window and the support portion supporting the transmission window can be reduced.
- the strength of the electric field for example, the peripheral portion of the support portion inside the processing container
- a member near the contact portion is sputtered by the plasma due to the strong electric field and the generation of plasma near the contact portion between the support portion supporting the transmission window and the transmission window.
- FIG. 1 is a graph showing the relationship between electron density and sheath length.
- FIG. 2 is a longitudinal sectional view of a plasma processing apparatus according to an embodiment.
- FIG. 3 is a longitudinal sectional view showing the vicinity of a transmission window of the plasma processing apparatus of FIG. 1.
- FIG. 4 is a longitudinal sectional view near a transmission window in which an outer peripheral surface of a hanging part is a tapered surface.
- FIG. 5 is a vertical cross-sectional view near a transmission window having a recess in the center of the hanging part.
- FIG. 6 is a longitudinal sectional view showing the vicinity of a transmission window of a plasma processing apparatus having an eave portion inside a side wall of a processing container.
- FIG. 7 is an enlarged cross-sectional view of the vicinity of a transmission window and a support portion contact point in another embodiment.
- [8] is a graph showing the relationship between the gap length and the electron temperature.
- FIG. 9 is a graph showing a relationship between a gap length and an electron density.
- Fig. 10 is a graph showing distributions of electron densities on a wafer according to an embodiment and a conventional technique in an oxide film forming process.
- FIG. 2 shows a longitudinal section of a plasma processing apparatus 1 according to the present embodiment.
- the plasma processing apparatus 1 is, for example, made of aluminum and has a bottomed cylindrical shape with an open top.
- a processing container 2 is provided.
- Processing container 2 is grounded.
- a susceptor 3 for mounting, for example, a semiconductor wafer (hereinafter, referred to as a wafer) W as a substrate is provided at the bottom of the processing container 2.
- This susceptor 3 For example, a high-frequency power for bias is supplied from an AC power supply 4 provided outside the processing container 2.
- an exhaust pipe 12 for exhausting the atmosphere in the processing container 2 by an exhaust device 11 such as a vacuum pump is provided at the bottom of the processing container 2.
- a gas introducing portion 13 such as a gas nozzle for supplying a processing gas from a processing gas supply source (not shown) is provided.
- a transmission window 20 having a quartz force is provided via a sealing material 14 such as an O-ring for ensuring airtightness.
- a sealing material 14 such as an O-ring for ensuring airtightness.
- dielectric materials for example, ceramics such as A1N or sapphire may be used.
- the processing space S is formed in the processing container 2 by the transmission window 20.
- the transmission window 20 has a circular planar shape.
- An antenna member for example, a disk-shaped slot antenna 30 is provided above the transmission window 20, and an antenna covering the slow wave plate 31 and the slow wave plate 31 is provided on the upper surface of the slot antenna 30.
- a cover 32 is provided.
- the slot antenna 30 also has a thin disk force of a conductive material, for example, copper, such as Ag or Au, and a large number of slits 33 are formed, for example, in a spiral or concentric arrangement. ing.
- a coaxial waveguide 35 is connected to the antenna cover 32, and the coaxial waveguide 35 is composed of an inner conductor 35a and an outer tube 35b.
- the inner conductor 35a is connected to the slot antenna 30.
- the inner conductor 35a has a conical shape on the side of the slot antenna 30 so that microwaves can efficiently propagate to the slot antenna 30.
- the coaxial waveguide 35 receives, for example, a 2.45 GHz microwave generated by the microwave supply device 36 through the load matching device 37, the coaxial waveguide 35, the delay plate 31, and the slot antenna 30. The light is transmitted to the transmission window 20.
- An electric field is formed on the lower surface of the transmission window 20 by the energy, and the processing gas supplied into the processing chamber 2 by the gas introduction unit 13 is turned into plasma, and the wafer W on the susceptor 3 is subjected to a predetermined plasma processing. For example, a film forming process or an etching process is performed.
- the shape of the transmission window 20 and its support state are as follows. That is, the transmission window 20 projects downward in the central area on the lower surface side, that is, at least on the surface facing the substrate. It has a shape with a hanging portion 21 of uniform thickness.
- a gap d is formed between the outer peripheral surface 21a of the hanging portion 21 and the inner side wall surface 5a of the processing vessel 2 continuing from the support portion 6, as shown in FIG.
- the length of the gap d is set to 0.5 mm to 10 mm, preferably 0.5 mm to 5 mm.
- the corner M of the outer peripheral surface 21a of the hanging portion 21 and the portion of the transmission window 20 supported by the support portion 6 and the corner N of the boundary between the outer peripheral surface of the hanging portion 21 and the lower surface of the hanging portion 21 are also composed of curved surfaces.
- the plasma processing apparatus 1 has the above-described configuration.
- the wafer W is placed on the susceptor 3 in the processing chamber 2, and the gas W A predetermined pressure is set in the processing space S by exhausting from the exhaust pipe 12 while supplying a predetermined processing gas into the processing vessel 2 from the introduction section 13.
- a high-frequency bias voltage is applied to the wafer W by the AC power supply 4, a microwave is generated by the microwave supply device 36, and the microwave is introduced into the processing chamber 2 through the transmission window 20 to be below the transmission window 20.
- the processing gas in the processing space S is turned into plasma, and by selecting the type of the processing gas and the like, a predetermined plasma processing such as an etching processing and an etching processing is performed on the wafer W.
- a predetermined plasma processing such as an etching processing and an etching processing is performed on the wafer W.
- Various types of plasma processing such as film formation processing can be performed.
- a hanging portion 21 made of the same material as that of the transmission window 20 is provided in a central region of the transmission window 20, and a contact point between the support portion 6 and the transmission window 20 is provided. Therefore, the hanging part 21 functions as a shielding wall, and the strength near the contact point C, electric field, and plasma cannot be seen directly from above the wafer W on the susceptor 3! / Thus, the amount of particles, radicals, and the like, which are sputtered, reaching the ueno and W can be suppressed. Due to the presence of the hanging part 21, a strong impedance change point occurs on the outer peripheral surface 21a of the hanging part 21, and the microwave introduced through the transmission window 20 is reflected there. The inside is relaxed, and the generation of a strong electric field and high-density plasma in the vicinity is suppressed.
- the distance between the outer peripheral surface 21a of the hanging portion 21 and the inner wall surface 5a following the support portion 6 is 0.5 mm. Since the gap d having a thickness of one 10 mm, more preferably 0.5 mm to 5 mm is formed, an electric field is not strongly generated in the gap d. By adjusting the size (length) of the gap d, the concentration of the electric field can be controlled, and as a result, the plasma density in the space below the transmission window 20 can be controlled.
- the corner M of the outer peripheral surface 21a of the hanging portion 21 and the portion supported by the support portion 6 in the transmission window 20, and the corner N of the boundary between the outer peripheral surface of the hanging portion 21 and the lower surface of the hanging portion 21 are as follows. Since both are composed of curved surfaces, the concentration of the electric field near that part is also prevented.
- the member near the contact C between the support section 6 and the transmission window 20 is sputtered by plasma, and the object to be processed is There is no danger of sticking to a certain wafer W or non-uniformity in the processing rate of the wafer W, and the quality of processing is not degraded.
- the plasma density can also be controlled by adjusting the size of the gap d.
- the outer peripheral surface 21a of the hanging portion 21 of the transmission window 20 is formed as a vertical surface, that is, a surface parallel to the inner surface 5a of the side wall 5, as shown in FIG.
- the outer peripheral surface 21a of the hanging portion 21 may be formed as a tapered surface such that the gap d gradually increases with downward force. Then, by adjusting the angle formed by the outer peripheral surface 21a and the inner wall surface 5a, that is, the taper angle 0, the degree of microwave reflection at the peripheral portion in the transmission window 20 can be reduced. By controlling the degree of concentration of the electric field in the peripheral portion, the plasma density in the peripheral portion can be controlled.
- the transmission window 20 shown in Fig. 5 can be proposed.
- the transmission window 20 has a concave portion 22 formed in the central region of the hanging portion 21.
- the side wall 23 facing the recess 22 in the transmission window 20 forming the recess 22 is formed as a tapered surface inclined toward the center of the recess 22.
- the convex portion 24 is relatively formed outside the hanging portion 21 of the transmission window 20, and thus the convex portion 24 is formed on the lower surface side of the concave portion 22 and the convex portion 24.
- the electric field strength can be varied, and the plasma density above the wafer W can be controlled. Since the side wall 23 has a tapered surface, the degree of microwave reflection can be further adjusted at the side wall 23, and a finer and more complicated control of the plasma density is performed. And the uniformity of the plasma can be improved.
- the harmful effect of the concentration of the electric field at the contact point C is prevented by providing the hanging portion 21 in the transmission window 20, but as shown in FIG.
- An eave portion 25 protruding into the processing vessel 2 may be provided inside the side wall 5 below the gap 6 at a predetermined distance e or more from the lower surface of the transmission window 20.
- the length of the eaves 25 and the size (length) of e be set so that the contact C is blocked by the eaves 25 and the contact C on the wafer W does not directly enter the visual field.
- the size of the gap e itself is preferably 0.5 mm to 10 mm, more preferably 0.5 mm to 5 mm.
- the eave portion 25 functions as a shielding wall as described above, suppresses a strong electric field near the contact C, suppresses sputtering by plasma, and prevents particles and radicals from appearing on the surface of the wafer or the W. Therefore, the concentration of the electric field on the inner peripheral edge of the processing vessel in the support portion is reduced, and the generation of a strong electric field and high-density plasma on the inner peripheral edge of the processing vessel in the support portion can be suppressed.
- the vertical length L of the hanging portion 21 is preferably 20 mm or more, more preferably 30 mm or more, according to the example of FIG.
- the side wall 23 of the hanging portion 21 on the side of the concave portion 22 may not be the tapered surface as described above, but may be a vertical surface as shown in FIG.
- FIG. 8 is a measurement graph showing the relationship between the distance (horizontal axis) from the transmission window 20 and the electron temperature in the microwave plasma
- FIG. 9 is also the electron density.
- the distance from the transmission window 20 is particularly high when the electron temperature is 10 mm or less, and the electron temperature is relatively high when the pressure is low even at 10 to 20 mm. Is preferred.
- the plasma resistance of the support portion 6 and at least one of the surfaces facing the inside of the processing vessel 2 on the side wall inner surface 5a continuing from the support portion 6 are determined. Excellent Y
- An O (yttria) coating portion 41 may be formed. Coating part 41
- reference numeral 42 denotes a sealing member such as an O-ring.
- the effective contact surface, the coating part 41 and the transmission window 20 are not physically in contact with each other, and the gap is preferably smaller than 0.2 mm, more preferably smaller than 0.05 mm.
- the contamination element is A1
- A1 was not detected in the contamination element, but was Y, and the amount was 28 ⁇ 10 1 G / cm 2 .
- YO has good plasma resistance, so the amount of metal contamination
- the evaluation of the effect of the hanging part 21 from the viewpoint of the amount of contamination was also as follows. That is, from the example of the structure shown in FIG. 7, when there is no hanging part 21, the amount of contamination of A1 is le x iC ⁇ Zcm 2 and the amount of contamination of Y is SS X lC ⁇ Zcm 2 , if it has a depending portion 21 as shown in FIG. 7, when the gap length D to 2 mm, the amount of-contamination Chillon of A1 is 7. 5 X 10 1 (> / cm 2, Y con Tamineshiyon The amount was 0.61 X 10 10 Zcm 2. The processing pressure was 6.65 Pa (5 mTorr) in all cases when argon plasma was generated.
- the supporting portion 6 has a shape protruding from the side wall 5 of the processing container 2 to the inside of the processing container 2, but the supporting portion 6 may have a strong shape as described above.
- the respective effects of the present invention do not change at all.
- the width of the hanging part is described as follows.
- ⁇ is the wavelength at which the microwave propagates through the transmitting window
- the width of the hanging part Since it is easy to enter the part 21 and the electric field generated between the hanging part 21 and the support part 6 may become strong, It is preferable that the width M of the hanging portion 21 is ⁇ Z4 or less.
- the relationship between the gap d and the length of the hanging portion can be described with reference to FIG. Assuming that the vertical length of the hanging portion 21 is L, LZD is preferably 3 or more.
- the plasma processing apparatus 1 having the transmission window 20 shown in FIG. 4 the results of the measurement of the distribution of the electron density over the center force on the wafer W and the edge when the oxide film was formed were shown.
- the pressure inside the processing vessel 2 is 133 Pa and the microwave power is 4500 W.
- the electron density at the center of the wafer W is relatively reduced, and the uniformity of the oxide film formation rate (the uniformity in the wafer surface) is reduced. ) was 3.5%. This is considered that the edge effect affects the plasma density.
- the electron density at the center of ⁇ and W does not decrease, and the oxidization does not occur.
- the uniformity of the film formation rate was also 1.8%. This is because, as a result of the suppression of the edge effect, the amount of microwave power is reduced, and as a result, the plasma density is improved as a whole, thereby improving the plasma density in the central part with respect to the periphery. is there. Therefore, it can be seen that in the present invention, the edge effect was suppressed and uniform processing was performed.
- the present invention is useful for processing uniformity of a plasma processing apparatus having a support for supporting a transmission window made of a dielectric in a processing container.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/589,272 US8267040B2 (en) | 2004-02-16 | 2005-02-15 | Plasma processing apparatus and plasma processing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004037851 | 2004-02-16 | ||
JP2004-037851 | 2004-02-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005078782A1 true WO2005078782A1 (ja) | 2005-08-25 |
Family
ID=34857789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/002217 WO2005078782A1 (ja) | 2004-02-16 | 2005-02-15 | プラズマ処理装置及びプラズマ処理方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8267040B2 (ja) |
KR (1) | KR100872260B1 (ja) |
WO (1) | WO2005078782A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009021220A (ja) * | 2007-06-11 | 2009-01-29 | Tokyo Electron Ltd | プラズマ処理装置、アンテナおよびプラズマ処理装置の使用方法 |
US20100170872A1 (en) * | 2007-06-11 | 2010-07-08 | Tokyo Electron Limited | Plasma processing apparatus and method for using plasma processing apparatus |
US20110253311A1 (en) * | 2006-01-31 | 2011-10-20 | Tokyo Electron Limited | Substrate processing apparatus for performing plasma process |
US20130112352A1 (en) * | 2007-06-11 | 2013-05-09 | Tohoku University | Plasma processing apparatus |
CN103392217A (zh) * | 2010-12-23 | 2013-11-13 | 六号元素有限公司 | 用于制造合成金刚石材料的微波等离子体反应器 |
JP5422396B2 (ja) * | 2008-01-31 | 2014-02-19 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101114848B1 (ko) * | 2008-02-08 | 2012-03-07 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치 및 플라즈마 처리 방법 |
JP5475261B2 (ja) * | 2008-03-31 | 2014-04-16 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP5357486B2 (ja) * | 2008-09-30 | 2013-12-04 | 東京エレクトロン株式会社 | プラズマ処理装置 |
WO2010090058A1 (ja) * | 2009-02-06 | 2010-08-12 | 国立大学法人東北大学 | プラズマ処理装置 |
JP5835985B2 (ja) * | 2010-09-16 | 2015-12-24 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
GB201021853D0 (en) * | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
KR20130056987A (ko) * | 2011-11-23 | 2013-05-31 | 삼성전자주식회사 | 기판처리장치 |
JP6081842B2 (ja) * | 2013-03-28 | 2017-02-15 | ブラザー工業株式会社 | 成膜装置 |
WO2015116244A1 (en) * | 2014-01-30 | 2015-08-06 | Applied Materials, Inc. | Corner spoiler for improving profile uniformity |
JP2016086099A (ja) | 2014-10-27 | 2016-05-19 | 東京エレクトロン株式会社 | プラズマ処理装置 |
FR3042092B1 (fr) * | 2015-10-05 | 2019-07-26 | Sairem Societe Pour L'application Industrielle De La Recherche En Electronique Et Micro Ondes | Dispositif elementaire de production d’un plasma avec applicateur coaxial |
JP6792786B2 (ja) * | 2016-06-20 | 2020-12-02 | 東京エレクトロン株式会社 | ガス混合装置および基板処理装置 |
US20190189398A1 (en) * | 2017-12-14 | 2019-06-20 | Tokyo Electron Limited | Microwave plasma processing apparatus |
JP6938672B2 (ja) * | 2018-07-20 | 2021-09-22 | 株式会社日立ハイテク | プラズマ処理装置 |
KR20220003862A (ko) * | 2020-07-02 | 2022-01-11 | 삼성전자주식회사 | 유도 결합형 플라즈마 처리 장치 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003059919A (ja) * | 2001-08-17 | 2003-02-28 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置および処理方法 |
JP2003168681A (ja) * | 2001-12-03 | 2003-06-13 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置および処理方法 |
JP2004259581A (ja) * | 2003-02-26 | 2004-09-16 | Shimadzu Corp | プラズマ処理装置 |
JP2004311510A (ja) * | 2003-04-02 | 2004-11-04 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置および処理方法 |
JP2005063986A (ja) * | 2003-08-08 | 2005-03-10 | Advanced Lcd Technologies Development Center Co Ltd | 処理装置およびプラズマ装置 |
JP2005100931A (ja) * | 2003-09-04 | 2005-04-14 | Tokyo Electron Ltd | プラズマ処理装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0763035B2 (ja) | 1986-11-17 | 1995-07-05 | 日本電信電話株式会社 | マイクロ波励起によるプラズマ生成源 |
US5234526A (en) | 1991-05-24 | 1993-08-10 | Lam Research Corporation | Window for microwave plasma processing device |
US5955382A (en) * | 1995-10-30 | 1999-09-21 | Kabushiki Kaisha Toshiba | Microwave excitation plasma processing apparatus and microwave excitation plasma processing method |
JPH09232099A (ja) | 1996-02-20 | 1997-09-05 | Hitachi Ltd | プラズマ処理装置 |
WO1997036461A1 (fr) * | 1996-03-28 | 1997-10-02 | Sumitomo Metal Industries, Ltd. | Procede et dispositif de traitement plasmique |
JP5036092B2 (ja) | 1999-03-24 | 2012-09-26 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
JP4849705B2 (ja) * | 2000-03-24 | 2012-01-11 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ生成導入部材及び誘電体 |
JP3478266B2 (ja) * | 2000-12-04 | 2003-12-15 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP2002299240A (ja) | 2001-03-28 | 2002-10-11 | Tadahiro Omi | プラズマ処理装置 |
JP3723783B2 (ja) * | 2002-06-06 | 2005-12-07 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP2004200307A (ja) * | 2002-12-17 | 2004-07-15 | Tokyo Electron Ltd | プラズマ処理装置 |
-
2005
- 2005-02-15 WO PCT/JP2005/002217 patent/WO2005078782A1/ja active Application Filing
- 2005-02-15 US US10/589,272 patent/US8267040B2/en active Active
- 2005-02-15 KR KR1020067016347A patent/KR100872260B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003059919A (ja) * | 2001-08-17 | 2003-02-28 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置および処理方法 |
JP2003168681A (ja) * | 2001-12-03 | 2003-06-13 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置および処理方法 |
JP2004259581A (ja) * | 2003-02-26 | 2004-09-16 | Shimadzu Corp | プラズマ処理装置 |
JP2004311510A (ja) * | 2003-04-02 | 2004-11-04 | Ulvac Japan Ltd | マイクロ波プラズマ処理装置および処理方法 |
JP2005063986A (ja) * | 2003-08-08 | 2005-03-10 | Advanced Lcd Technologies Development Center Co Ltd | 処理装置およびプラズマ装置 |
JP2005100931A (ja) * | 2003-09-04 | 2005-04-14 | Tokyo Electron Ltd | プラズマ処理装置 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110253311A1 (en) * | 2006-01-31 | 2011-10-20 | Tokyo Electron Limited | Substrate processing apparatus for performing plasma process |
JP2009021220A (ja) * | 2007-06-11 | 2009-01-29 | Tokyo Electron Ltd | プラズマ処理装置、アンテナおよびプラズマ処理装置の使用方法 |
US20100170872A1 (en) * | 2007-06-11 | 2010-07-08 | Tokyo Electron Limited | Plasma processing apparatus and method for using plasma processing apparatus |
US20130112352A1 (en) * | 2007-06-11 | 2013-05-09 | Tohoku University | Plasma processing apparatus |
US8568556B2 (en) * | 2007-06-11 | 2013-10-29 | Tokyo Electron Limited | Plasma processing apparatus and method for using plasma processing apparatus |
US8733281B2 (en) * | 2007-06-11 | 2014-05-27 | Tokyo Electron Limited | Plasma processing apparatus |
JP5422396B2 (ja) * | 2008-01-31 | 2014-02-19 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
CN103392217A (zh) * | 2010-12-23 | 2013-11-13 | 六号元素有限公司 | 用于制造合成金刚石材料的微波等离子体反应器 |
CN103392217B (zh) * | 2010-12-23 | 2015-12-16 | 六号元素有限公司 | 用于制造合成金刚石材料的微波等离子体反应器 |
Also Published As
Publication number | Publication date |
---|---|
KR100872260B1 (ko) | 2008-12-05 |
KR20060108773A (ko) | 2006-10-18 |
US20070264441A1 (en) | 2007-11-15 |
US8267040B2 (en) | 2012-09-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2005078782A1 (ja) | プラズマ処理装置及びプラズマ処理方法 | |
JP4430560B2 (ja) | プラズマ処理装置 | |
JP4566789B2 (ja) | プラズマ処理方法およびプラズマ処理装置 | |
KR101202270B1 (ko) | 플라즈마 처리 장치 및 플라즈마 처리 방법 | |
US7686917B2 (en) | Plasma processing system and apparatus and a sample processing method | |
JP5454467B2 (ja) | プラズマエッチング処理装置およびプラズマエッチング処理方法 | |
KR100436950B1 (ko) | 저압 스퍼터링 방법 및 장치 | |
JP5835985B2 (ja) | プラズマ処理装置及びプラズマ処理方法 | |
TWI442837B (zh) | Plasma processing device and plasma processing method | |
US5951887A (en) | Plasma processing apparatus and plasma processing method | |
KR100642157B1 (ko) | 플라즈마 처리 장치 및 방법 그리고 플라즈마 생성용전극판 | |
US7771607B2 (en) | Plasma processing apparatus and plasma processing method | |
WO2007088894A1 (ja) | 基板処理装置、ならびにそれに用いられる基板載置台およびプラズマに曝される部材 | |
JPH09106900A (ja) | プラズマ処理方法及びプラズマ処理装置 | |
JP5220772B2 (ja) | プラズマ処理装置およびプラズマ処理装置用突起部材 | |
JP2006040638A (ja) | プラズマ処理装置 | |
JP2007250569A (ja) | プラズマ処理装置およびプラズマに曝される部材 | |
WO2021033612A1 (ja) | クリーニング方法及びマイクロ波プラズマ処理装置 | |
KR101087514B1 (ko) | 드라이 에칭 방법 | |
WO2004017684A1 (ja) | プラズマ処理装置 | |
KR102107310B1 (ko) | 플라즈마 처리 장치 | |
JP3147769B2 (ja) | プラズマ処理装置および処理方法 | |
JP3699416B2 (ja) | プラズマ処理装置 | |
JPH06120140A (ja) | 半導体製造方法および装置 | |
JP3364131B2 (ja) | プラズマ処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 1020067016347 Country of ref document: KR |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: DE |
|
WWP | Wipo information: published in national office |
Ref document number: 1020067016347 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10589272 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase | ||
WWP | Wipo information: published in national office |
Ref document number: 10589272 Country of ref document: US |