WO2005017950A3 - 有機イリジウム化合物、その製法、及び膜の製造方法 - Google Patents

有機イリジウム化合物、その製法、及び膜の製造方法 Download PDF

Info

Publication number: WO2005017950A3
Authority: WO; WIPO (PCT)
Prior art keywords: producing; general formula; compound; film; same
Prior art date: 2003-08-19

Application number

PCT/JP2004/011796

Other languages

English (en)

French (fr)

Other versions

WO2005017950A2 (ja

Inventor

Kazuhisa Kawano

Mayumi Takamori

Noriaki Oshima

Original Assignee

Tosoh Corp

Sagami Chem Res

Kazuhisa Kawano

Mayumi Takamori

Noriaki Oshima

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-08-19

Filing date

2004-08-11

Publication date

2005-03-31

2004-08-11 Application filed by Tosoh Corp, Sagami Chem Res, Kazuhisa Kawano, Mayumi Takamori, Noriaki Oshima filed Critical Tosoh Corp

2004-08-11 Priority to KR1020067002922A priority Critical patent/KR101126141B1/ko

2004-08-11 Priority to EP04771757A priority patent/EP1657245B1/en

2004-08-11 Priority to US10/568,388 priority patent/US7265233B2/en

2005-02-24 Publication of WO2005017950A2 publication Critical patent/WO2005017950A2/ja

2005-03-31 Publication of WO2005017950A3 publication Critical patent/WO2005017950A3/ja

Links

150000001875 compounds Chemical class 0.000 title abstract 5
238000000034 method Methods 0.000 title abstract 3
125000000217 alkyl group Chemical group 0.000 abstract 2
229910052741 iridium Inorganic materials 0.000 abstract 2
GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 abstract 2
150000002902 organometallic compounds Chemical class 0.000 abstract 2
229910052783 alkali metal Inorganic materials 0.000 abstract 1
150000001340 alkali metals Chemical class 0.000 abstract 1
125000005843 halogen group Chemical group 0.000 abstract 1
229910052739 hydrogen Inorganic materials 0.000 abstract 1
239000001257 hydrogen Substances 0.000 abstract 1
125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
230000008018 melting Effects 0.000 abstract 1
238000002844 melting Methods 0.000 abstract 1
239000002994 raw material Substances 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1
230000008016 vaporization Effects 0.000 abstract 1
238000009834 vaporization Methods 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
- C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic System
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C13/00—Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
- C07C13/02—Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
- C07C13/08—Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with a five-membered ring
- C07C13/15—Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with a five-membered ring with a cyclopentadiene ring
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Chemical Vapour Deposition (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

PCT/JP2004/011796 2003-08-19 2004-08-11 有機イリジウム化合物、その製法、及び膜の製造方法 WO2005017950A2 (ja)

Priority Applications (3)

Application Number	Priority Date	Filing Date	Title
KR1020067002922A KR101126141B1 (ko)	2003-08-19	2004-08-11	유기 이리듐 화합물, 그의 제법 및 막의 제조방법
EP04771757A EP1657245B1 (en)	2003-08-19	2004-08-11	Organoiridium compound, process for producing the same, and process for producing film
US10/568,388 US7265233B2 (en)	2003-08-19	2004-08-11	Organometallic iridium compound, process for producing the same and process for preparing film

Applications Claiming Priority (6)

Application Number	Priority Date	Filing Date	Title
JP2003295329		2003-08-19
JP2003-295329		2003-08-19
JP2003-383169		2003-11-12
JP2003383169		2003-11-12
JP2004-005503		2004-01-13
JP2004005503		2004-01-13

Publications (2)

Publication Number	Publication Date
WO2005017950A2 WO2005017950A2 (ja)	2005-02-24
WO2005017950A3 true WO2005017950A3 (ja)	2005-03-31

Family

ID=34198752

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
PCT/JP2004/011796 WO2005017950A2 (ja)	2003-08-19	2004-08-11	有機イリジウム化合物、その製法、及び膜の製造方法

Country Status (5)

Country	Link
US (1)	US7265233B2 (ja)
EP (1)	EP1657245B1 (ja)
KR (1)	KR101126141B1 (ja)
TW (1)	TW200517984A (ja)
WO (1)	WO2005017950A2 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20080096381A1 (en) *	2006-10-12	2008-04-24	Han Joseph H	Atomic layer deposition process for iridium barrier layers
US8309174B2 (en)	2008-04-15	2012-11-13	L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude	Heteroleptic iridium precursors to be used for the deposition of iridium-containing films
JP6321252B1 (ja)	2017-03-24	2018-05-09	田中貴金属工業株式会社	イリジウム錯体からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5130172A (en) *	1988-10-21	1992-07-14	The Regents Of The University Of California	Low temperature organometallic deposition of metals

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4670621A (en) *	1986-05-05	1987-06-02	Ethyl Corporation	Catalytic synthesis of olefins from paraffins
US4751344A (en) *	1986-05-05	1988-06-14	Ethyl Corporation	Catalytic synthesis of olefins from paraffins
US4992305A (en) *	1988-06-22	1991-02-12	Georgia Tech Research Corporation	Chemical vapor deposition of transistion metals
US6319832B1 (en) *	1999-02-19	2001-11-20	Micron Technology, Inc.	Methods of making semiconductor devices
JP4696454B2 (ja) *	2003-04-24	2011-06-08	東ソー株式会社	新規有機イリジウム化合物、その製造方法、及び膜の製造方法

2004
- 2004-08-11 KR KR1020067002922A patent/KR101126141B1/ko active IP Right Grant
- 2004-08-11 EP EP04771757A patent/EP1657245B1/en not_active Expired - Fee Related
- 2004-08-11 US US10/568,388 patent/US7265233B2/en active Active
- 2004-08-11 WO PCT/JP2004/011796 patent/WO2005017950A2/ja active Application Filing
- 2004-08-13 TW TW093124361A patent/TW200517984A/zh unknown

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5130172A (en) *	1988-10-21	1992-07-14	The Regents Of The University Of California	Low temperature organometallic deposition of metals

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DZIALLAS M. ET AL.: "Basische metalle lxii darstellung und reaktionen dermetall-basen C5H5Ir(olefin)PPr3 unf C5H5Ir(olefin)2", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 330, no. 1-2, 1987, pages 207 - 219, XP002986336 *

Also Published As

Publication number	Publication date
EP1657245A2 (en)	2006-05-17
EP1657245B1 (en)	2012-07-25
TWI293743B (ja)	2008-02-21
TW200517984A (en)	2005-06-01
WO2005017950A2 (ja)	2005-02-24
KR101126141B1 (ko)	2012-03-23
US20060204660A1 (en)	2006-09-14
US7265233B2 (en)	2007-09-04
EP1657245A4 (en)	2009-07-08
KR20060060023A (ko)	2006-06-02

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