TW200517984A - Organometallic iridium compound, process of producing the same, and process of producing thin film using the same - Google Patents

Organometallic iridium compound, process of producing the same, and process of producing thin film using the same

Info

Publication number
TW200517984A
TW200517984A TW093124361A TW93124361A TW200517984A TW 200517984 A TW200517984 A TW 200517984A TW 093124361 A TW093124361 A TW 093124361A TW 93124361 A TW93124361 A TW 93124361A TW 200517984 A TW200517984 A TW 200517984A
Authority
TW
Taiwan
Prior art keywords
producing
same
compound
thin film
organometallic iridium
Prior art date
Application number
TW093124361A
Other languages
English (en)
Other versions
TWI293743B (zh
Inventor
Kazuhisa Kawano
Mayumi Takamori
Noriaki Oshima
Original Assignee
Tosoh Corp
Sagami Chem Res
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp, Sagami Chem Res filed Critical Tosoh Corp
Publication of TW200517984A publication Critical patent/TW200517984A/zh
Application granted granted Critical
Publication of TWI293743B publication Critical patent/TWI293743B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic System
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C13/00—Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
    • C07C13/02—Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
    • C07C13/08—Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with a five-membered ring
    • C07C13/15—Monocyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with a five-membered ring with a cyclopentadiene ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
TW093124361A 2003-08-19 2004-08-13 Organometallic iridium compound, process of producing the same, and process of producing thin film using the same TW200517984A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003295329 2003-08-19
JP2003383169 2003-11-12
JP2004005503 2004-01-13

Publications (2)

Publication Number Publication Date
TW200517984A true TW200517984A (en) 2005-06-01
TWI293743B TWI293743B (zh) 2008-02-21

Family

ID=34198752

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093124361A TW200517984A (en) 2003-08-19 2004-08-13 Organometallic iridium compound, process of producing the same, and process of producing thin film using the same

Country Status (5)

Country Link
US (1) US7265233B2 (zh)
EP (1) EP1657245B1 (zh)
KR (1) KR101126141B1 (zh)
TW (1) TW200517984A (zh)
WO (1) WO2005017950A2 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080096381A1 (en) * 2006-10-12 2008-04-24 Han Joseph H Atomic layer deposition process for iridium barrier layers
US8309174B2 (en) 2008-04-15 2012-11-13 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Heteroleptic iridium precursors to be used for the deposition of iridium-containing films
JP6321252B1 (ja) 2017-03-24 2018-05-09 田中貴金属工業株式会社 イリジウム錯体からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4670621A (en) * 1986-05-05 1987-06-02 Ethyl Corporation Catalytic synthesis of olefins from paraffins
US4751344A (en) * 1986-05-05 1988-06-14 Ethyl Corporation Catalytic synthesis of olefins from paraffins
US4992305A (en) * 1988-06-22 1991-02-12 Georgia Tech Research Corporation Chemical vapor deposition of transistion metals
US5130172A (en) * 1988-10-21 1992-07-14 The Regents Of The University Of California Low temperature organometallic deposition of metals
US6319832B1 (en) * 1999-02-19 2001-11-20 Micron Technology, Inc. Methods of making semiconductor devices
JP4696454B2 (ja) * 2003-04-24 2011-06-08 東ソー株式会社 新規有機イリジウム化合物、その製造方法、及び膜の製造方法

Also Published As

Publication number Publication date
EP1657245A2 (en) 2006-05-17
EP1657245B1 (en) 2012-07-25
TWI293743B (zh) 2008-02-21
WO2005017950A2 (ja) 2005-02-24
KR101126141B1 (ko) 2012-03-23
US20060204660A1 (en) 2006-09-14
US7265233B2 (en) 2007-09-04
WO2005017950A3 (ja) 2005-03-31
EP1657245A4 (en) 2009-07-08
KR20060060023A (ko) 2006-06-02

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