WO2005010231A3 - Procede cvd pour deposer au moins une couche iii-v-n sur un substrat - Google Patents
Procede cvd pour deposer au moins une couche iii-v-n sur un substrat Download PDFInfo
- Publication number
- WO2005010231A3 WO2005010231A3 PCT/EP2004/051222 EP2004051222W WO2005010231A3 WO 2005010231 A3 WO2005010231 A3 WO 2005010231A3 EP 2004051222 W EP2004051222 W EP 2004051222W WO 2005010231 A3 WO2005010231 A3 WO 2005010231A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- substrate
- iii
- deposition
- cvd method
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003134202 DE10334202A1 (de) | 2003-07-24 | 2003-07-24 | CVD-Verfahren zum Abscheiden mindestens einer III-V-N-Schicht auf einem Substrat |
DE10334202.8 | 2003-07-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005010231A2 WO2005010231A2 (fr) | 2005-02-03 |
WO2005010231A3 true WO2005010231A3 (fr) | 2005-03-10 |
Family
ID=34071931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/051222 WO2005010231A2 (fr) | 2003-07-24 | 2004-06-24 | Procede cvd pour deposer au moins une couche iii-v-n sur un substrat |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10334202A1 (fr) |
WO (1) | WO2005010231A2 (fr) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6146457A (en) * | 1997-07-03 | 2000-11-14 | Cbl Technologies, Inc. | Thermal mismatch compensation to produce free standing substrates by epitaxial deposition |
WO2001082384A1 (fr) * | 2000-04-26 | 2001-11-01 | Osram Opto Semiconductors Gmbh | Composant semi-conducteur emetteur de rayonnement et son procede de fabrication |
US20020190259A1 (en) * | 2001-05-29 | 2002-12-19 | Werner Goetz | III-Nitride light emitting devices with low driving voltage |
US20030033974A1 (en) * | 2001-07-11 | 2003-02-20 | Tetsuzo Ueda | Layered substrates for epitaxial processing, and device |
-
2003
- 2003-07-24 DE DE2003134202 patent/DE10334202A1/de not_active Withdrawn
-
2004
- 2004-06-24 WO PCT/EP2004/051222 patent/WO2005010231A2/fr active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6146457A (en) * | 1997-07-03 | 2000-11-14 | Cbl Technologies, Inc. | Thermal mismatch compensation to produce free standing substrates by epitaxial deposition |
WO2001082384A1 (fr) * | 2000-04-26 | 2001-11-01 | Osram Opto Semiconductors Gmbh | Composant semi-conducteur emetteur de rayonnement et son procede de fabrication |
US20020190259A1 (en) * | 2001-05-29 | 2002-12-19 | Werner Goetz | III-Nitride light emitting devices with low driving voltage |
US20030033974A1 (en) * | 2001-07-11 | 2003-02-20 | Tetsuzo Ueda | Layered substrates for epitaxial processing, and device |
Non-Patent Citations (2)
Title |
---|
SOMEYA T ET AL: "Highly reflective <formula><roman>GaN/Al</roman><inf><roman>0.34</rom an></inf><roman>Ga</roman><inf><roman>0.66</roman></inf><roman>N</rom an></formula> quarter-wave reflectors grown by metal organic chemical vapor deposition", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 73, no. 25, 21 December 1998 (1998-12-21), pages 3653 - 3655, XP012021649, ISSN: 0003-6951 * |
STECKI A J ET AL: "SIC RAPID THERMAL CARBONIZATION OF THE (111)SI SEMICONDUCTOR-ON- INSULATOR STRUCTURE AND SUBSEQUENT METALORGANIC CHEMICAL VAPOR DEPOSITION OF GAN", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 69, no. 15, 7 October 1996 (1996-10-07), pages 2264 - 2266, XP000640978, ISSN: 0003-6951 * |
Also Published As
Publication number | Publication date |
---|---|
WO2005010231A2 (fr) | 2005-02-03 |
DE10334202A1 (de) | 2005-02-17 |
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