WO2004091792A2 - Dispositif microfluidique a surfaces ultraphobiques - Google Patents

Dispositif microfluidique a surfaces ultraphobiques Download PDF

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Publication number
WO2004091792A2
WO2004091792A2 PCT/US2004/011580 US2004011580W WO2004091792A2 WO 2004091792 A2 WO2004091792 A2 WO 2004091792A2 US 2004011580 W US2004011580 W US 2004011580W WO 2004091792 A2 WO2004091792 A2 WO 2004091792A2
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Prior art keywords
asperities
asperity
liquid
fluid
flow channel
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PCT/US2004/011580
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English (en)
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WO2004091792A3 (fr
Inventor
Charles W. Extrand
Michael Wright
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Entegris, Inc.
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Priority claimed from US10/454,742 external-priority patent/US6845788B2/en
Priority claimed from US10/652,586 external-priority patent/US6923216B2/en
Application filed by Entegris, Inc. filed Critical Entegris, Inc.
Priority to JP2006510056A priority Critical patent/JP2006523533A/ja
Priority to EP04759543A priority patent/EP1618035A4/fr
Publication of WO2004091792A2 publication Critical patent/WO2004091792A2/fr
Publication of WO2004091792A3 publication Critical patent/WO2004091792A3/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B63—SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
    • B63B—SHIPS OR OTHER WATERBORNE VESSELS; EQUIPMENT FOR SHIPPING 
    • B63B1/00—Hydrodynamic or hydrostatic features of hulls or of hydrofoils
    • B63B1/32—Other means for varying the inherent hydrodynamic characteristics of hulls
    • B63B1/34—Other means for varying the inherent hydrodynamic characteristics of hulls by reducing surface friction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L9/00—Supporting devices; Holding devices
    • B01L9/52—Supports specially adapted for flat sample carriers, e.g. for plates, slides, chips
    • B01L9/527—Supports specially adapted for flat sample carriers, e.g. for plates, slides, chips for microfluidic devices, e.g. used for lab-on-a-chip
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502715—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by interfacing components, e.g. fluidic, electrical, optical or mechanical interfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502746—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the means for controlling flow resistance, e.g. flow controllers, baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B08B17/065—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B64—AIRCRAFT; AVIATION; COSMONAUTICS
    • B64B—LIGHTER-THAN AIR AIRCRAFT
    • B64B1/00—Lighter-than-air aircraft
    • B64B1/06—Rigid airships; Semi-rigid airships
    • B64B1/14—Outer covering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B64—AIRCRAFT; AVIATION; COSMONAUTICS
    • B64C—AEROPLANES; HELICOPTERS
    • B64C1/00—Fuselages; Constructional features common to fuselages, wings, stabilising surfaces or the like
    • B64C1/38—Constructions adapted to reduce effects of aerodynamic or other external heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00—Influencing flow of fluids
    • F15D1/02—Influencing flow of fluids in pipes or conduits
    • F15D1/06—Influencing flow of fluids in pipes or conduits by influencing the boundary layer
    • F15D1/065—Whereby an element is dispersed in a pipe over the whole length or whereby several elements are regularly distributed in a pipe
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L13/00—Cleaning or rinsing apparatus
    • B01L13/02—Cleaning or rinsing apparatus for receptacle or instruments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/16—Surface properties and coatings
    • B01L2300/161—Control and use of surface tension forces, e.g. hydrophobic, hydrophilic
    • B01L2300/165—Specific details about hydrophobic, oleophobic surfaces
    • B01L2300/166—Suprahydrophobic; Ultraphobic; Lotus-effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/08—Regulating or influencing the flow resistance
    • B01L2400/084—Passive control of flow resistance
    • B01L2400/086—Passive control of flow resistance using baffles or other fixed flow obstructions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L9/00—Supporting devices; Holding devices
    • B01L9/52—Supports specially adapted for flat sample carriers, e.g. for plates, slides, chips
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02—Articles
    • B65G2201/0235—Containers
    • B65G2201/0258—Trays, totes or bins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

Definitions

  • This invention relates generally to microfluidic devices, and more specifically to a microfluidic device having ultraphobic fluid contact surfaces.
  • Microfluidic devices have already found useful application in printing devices and in so-called "lab-on-a-chip” devices, wherein complex chemical and biochemical reactions are carried out in microfluidic devices.
  • the very small volumes of liquid needed for reactions in such a system enables increased reaction response time, low sample volume, and reduced reagent cost. It is anticipated that a myriad of further applications will become evident as the technology is refined and developed.
  • a significant factor in the design of a microfluidic device is the resistance to fluid movement imposed by contact of fluid with surfaces in the microscopic channels of the device. In order to overcome this resistance, higher fluid pressures are required within the device. In turn, fluid flow rates through the device may be limited by the amount of pressure that can be tolerated by the device or the process that the device supports. In addition, pressure losses through microscopic flow channels may vary greatly due to the characteristics of surfaces in the flow channel. What is needed in the industry is a microfluidic device with fluid flow channels having predictable and optimal levels of resistance to fluid flow.
  • the invention substantially meets the needs of the industry for a microfluidic device having fluid flow channels with predictable and optimal levels of fluid flow resistance.
  • all or any portion of the fluid flow channels of any microfluidic device are provided with durable ultraphobic fluid contact surfaces.
  • the ultraphobic surface generally includes a substrate portion with a multiplicity of projecting regularly shaped microscale or nanoscale asperities disposed in a regular array so that the surface has a predetermined contact line density measured in meters of contact line per square meter of surface area equal to or greater than a critical contact line density value "Ax" determined according to the formula:
  • the asperities may be formed in or on the substrate material itself or in one or more layers of material disposed on the surface of the substrate.
  • the asperities may be any regularly or irregularly shaped three dimensional solid or cavity and may be disposed in any regular geometric pattern.
  • the invention may also include process of making a microfluidic device including steps of forming at least one microscopic fluid flow channel in a body, the fluid flow channel having a fluid contact surface, and disposing a multiplicity of substantially uniformly shaped asperities in a substantially uniform pattern on the fluid contact surface.
  • Each asperity may have a cross-sectional dimension and an asperity rise angle relative to the fluid contact surface.
  • the asperities may be spaced apart by a substantially uniform spacing dimension and positioned so that the surface has a contact line density measured in meters of contact line per square meter of surface area equal to or greater than a critical contact line density value "Ax" determined according to the formula:
  • the ratio of the cross-sectional dimension of the asperities to the spacing dimension of the asperities is preferably less than or equal to 0.1 and most preferably less than or equal to 0.01.
  • the asperities may be formed using photolithography, or using nanomachming, microstamping, microcontact printing, self-assembling metal colloid monolayers, atomic force microscopy nanomachming, sol-gel molding, self-assembled monolayer directed patterning, chemical etching, sol-gel stamping, printing with colloidal inks, or by disposing a layer of carbon nanotubes on the substrate.
  • the process may further include the step of determining a critical asperity height value "Z c " in meters according to the formula:
  • ⁇ a ,o is the true advancing contact angle of the liquid on the surface in degrees
  • ⁇ is the asperity rise angle in degrees. It is anticipated that fluid flow channels in a microfluidic device having ultraphobic fluid contact surfaces will exhibit sharply reduced resistance to fluid flow, leading to greatly improved device efficiencies, lower intradevice pressures and improved fluid flow throughput.
  • the ultraphobic surfaces will be durable, and capable of exhibiting predictable ultraphobic properties under fluid pressures up to the maximum design pressure.
  • Fig. 1 is a perspective, greatly enlarged view of an ultraphobic surface according to the present invention
  • Fig. la is a schematic view of a liquid slug in a flow channel
  • Fig. lb is an exploded view of a microfluidic device according to the present invention.
  • Fig. lc is a cross-sectional view of an alternative embodiment of a microfluidic device according to the present invention.
  • Fig. 2 is a top plan view of a portion of the surface of Fig. 1;
  • Fig. 3 is a side elevation view of the surface portion depicted in Fig. 2;
  • Fig. 4 is a partial top plan view of an alternative embodiment of an ultraphobic surface according to the present invention wherein the asperities are arranged in a hexagonal array;
  • Fig. 5 is a side elevation view of the alternative embodiment of Fig. 4;
  • Fig. 6 is a side elevation view depicting the deflection of liquid suspended between asperities
  • Fig. 7 is a side elevation view depicting a quantity of liquid suspended atop asperities
  • Fig. 8 is a side elevation view depicting the liquid contacting the bottom of the space between asperities
  • Fig. 9 is a side elevation view of a single asperity in an alternative embodiment of an ultraphobic surface according to the present invention wherein the asperity rise angle is an acute angle;
  • Fig. 10 is a side elevation view of a single asperity in an alternative embodiment of an ultraphobic surface according to the present invention wherein the asperity rise angle is an obtuse angle;
  • Fig. 11 a partial top plan view of an alternative embodiment of an ultraphobic surface according to the present invention wherein the asperities are cylindrical and are arranged in a rectangular array;
  • Fig. 12 is a side elevation view of the alternative embodiment of Fig. 11;
  • Fig. 13 is a table listing formulas for contact line density and linear fraction of contact for a variety of asperity shapes and arrangements;
  • Fig. 14 is a side elevation view of an alternative embodiment of an ultraphobic surface according to the present invention.
  • Fig. 15 is a top plan view of the alternative embodiment of Fig. 14;
  • Fig. 16 is a top plan view of a single asperity in an alternative embodiment of an ultraphobic surface according to the present invention.
  • Fig. 17 is a graphical representation for a specific ultraphobic surface and liquid of the relationship between asperity spacing (y) and maximum pressure (P) for various values of the jc y ratio.
  • microfluidic device refers broadly to any other device or component that may be used to contact, handle, transport, contain, process, or convey a fluid, wherein the fluid flows through one or more fluid flow channels of microscopic dimensions.
  • microscopic means dimensions of 500 ⁇ m or less.
  • Fluid flow channel broadly refers to any channel, conduit, pipe, tube, chamber, or other enclosed space of any cross- sectional shape used to handle, transport, contain, or convey a fluid.
  • fluid contact surface refers broadly to any surface or portion thereof of a fluid flow channel that may be in contact with a fluid.
  • a surface resists wetting to an extent that a small droplet of water or other liquid exhibits a very high stationary contact angle with the surface (greater than about 120 degrees), if the surface exhibits a markedly reduced propensity to retain liquid droplets, or if a liquid-gas-solid interface exists at the surface when completely submerged in liquid, the surface may be referred to as an "ultrahydrophobic" or “ultralyophobic" surface.
  • ultraphobic is used to refer generally to both ultrahydrophobic and ultralyophobic surfaces.
  • Friction between a liquid and a surface may be dramatically lower for an ultraphobic surface as opposed to a conventional surface.
  • ultraphobic surfaces are extremely desirable for reducing resistance to fluid flow due to surface resistance forces, especially in microfluidic applications.
  • the surface may be ultraphobic.
  • Such an ultraphobic surface generally takes the form of a substrate member with a multiplicity of microscale to nanoscale projections or cavities, referred to herein as "asperities".
  • the pressure ⁇ P to .ai ) for moving a liquid slug through a horizontal flow channel at a given velocity may be divided into components of viscous forces, surface forces, and gravity forces (head) so that:
  • a horizontally oriented cylindrical flow channel 110 is depicted in cross-section in Fig. la.
  • the cylindrical flow chaimel 110 is defined by a channel wall 115 having a fluid contact surface 120.
  • a liquid slug 100 is depicted within flow channel 110.
  • Liquid slug 100 has a forward interface 130 with fluid 132 and a rear interface 140 with fluid 142. It will be appreciated that fluid 132 and fluid 142 may be in gaseous or liquid form.
  • equation (1) For horizontally oriented cylindrical flow channel 110, the general relation given in equation (1) above maybe more specifically expressed as:
  • ⁇ is the viscosity of the liquid
  • L is the length of liquid slug 100
  • v is the velocity with which liquid slug 100 is moving
  • R is the cross-sectional radius of the cylindrical flow channel 110
  • ⁇ is the surface tension of the liquid in liquid slug 100
  • ⁇ r is the actual receding contact angle of the rear interface 140 of liquid slug 100 with surface 120 of flow channel 110
  • ⁇ a is the actual advancing contact angle of the forward interface 130 of liquid slug 100 with surface 120 of flow channel 110.
  • a microfluidic device 10 according to the present invention is depicted in a greatly enlarged, exploded view in Fig. lb.
  • Device 10 generally includes a body 11 with a rectangular flow channel 12 formed therein.
  • Body 11 generally includes a main portion 13 and a cover portion 14.
  • Flow channel 12 is defined on three sides by inwardly facing surfaces 15 on main portion 13 and on a fourth side by an inwardly facing surface 16 on cover portion 14.
  • Surfaces 15 and surface 16 together define channel wall 16a.
  • all or any desired portion of channel wall 16a may be provided with an ultraphobic fluid contact surface 20.
  • a two-piece configuration with rectangular flow channel is depicted in Fig. lb, it will of course be readily appreciated that microfluidic device 10 may be formed in any other configuration and with virtually any other flow channel shape or configuration, including a one piece body 11 with a cylindrical, polygonal, or irregularly shaped flow channel formed therein.
  • body 200 is formed in one integral piece.
  • Cylindrical flow channel 202 is defined within body 200, and has a channel wall 204 presenting ultraphobic fluid contact surface 20 facing into flow channel 202.
  • the surface 20 generally includes a substrate 22 with a multiplicity of projecting asperities 24.
  • substrate 22 may be a portion of body 11 or may be a separate layer of material on body 11.
  • Asperities 24 are typically formed from substrate 22 as also further described herein.
  • Each asperity 24 has a plurality of sides 26 and a top 28.
  • Each asperity 24 has a width dimension, annotated "x" in the figures, and a height dimension, annotated "z” in the figures.
  • asperities 24 are disposed in a regular rectangular array, each asperity spaced apart from the adjacent asperities by a spacing dimension, annotated
  • ultraphobic fluid contact surface 20 will exhibit ultraphobic properties when a liquid-solid-gas interface is maintained at the surface. As depicted in Fig. 7, if liquid 32 contacts only the tops 28 and a portion of the sides 26 proximate top edge 30 of asperities 24, leaving a space 34 between the asperities filled with air or other gas, the requisite liquid-solid-gas interface is present. The liquid may be said to be "suspended" atop and between the top edges 30 of the asperities 24.
  • the formation of the liquid-solid-gas interface depends on certain interrelated geometrical parameters of the asperities 24 and the properties of the liquid, and the interaction of the liquid with the solid surface.
  • the geometrical properties of asperities 24 may be selected so that the surface 20 exhibits ultraphobic properties at any desired liquid pressure.
  • surface 20 may be divided into uniform areas 36, depicted bounded by dashed lines, surrounding each asperity 24.
  • the area density of asperities ( ⁇ ) in each uniform area 36 may be described by the equation:
  • Perimeter p may be referred to as a "contact line” defining the location of the liquid-solid-gas interface.
  • the contact line density (A) of the surface which is the length of contact line per unit area of the surface, is the product of the perimeter (p) and the area density of asperities ( ⁇ ) so that:
  • Body forces ⁇ F) associated with gravity may be determined according to the following formula:
  • the true advancing contact angle ⁇ a ,o of a liquid on a given solid material is defined as the largest experimentally measured stationary contact angle of the liquid on a surface of the material having essentially no asperities.
  • the true advancing contact angle is readily measurable by techniques well known in the art.
  • a critical contact line density parameter A may be determined for predicting ultraphobic properties in a surface:
  • g is the density (p) of the liquid
  • g is the acceleration due to gravity
  • A is the depth of the liquid
  • ⁇ is the rise angle of the side of the asperities relative to the substrate in degrees
  • ⁇ a, o is the experimentally measured true advancing contact angle of the liquid on the asperity material in degrees.
  • a surface 20 formed according to the above relations will exhibit ultraphobic properties under any liquid pressure values up to and including the value of P used in equation (12) above.
  • the ultraphobic properties will be exhibited whether the surface is submerged, subjected to a jet or spray of liquid, or impacted with individual droplets.
  • the remaining details of the geometry of the asperities may be determined according to the relationship of x and y given in the equation for contact line density.
  • the geometry of the surface may be determined by choosing the value of either x or y in the contact line equation and solving for the other variable.
  • contact angle hysteresis ( ⁇ ) ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • a ⁇ ⁇ p ⁇ A ⁇ 0 + ⁇ ), (13)
  • ⁇ p is the linear fraction of contact along the asperities
  • ⁇ A ⁇ o is the difference between the true advancing contact angle ⁇ a ,o) and the true receding contact angle ⁇ r> o) for the surface material
  • (co) is the rise angle of the asperities.
  • Equations for determining for surfaces having other geometries are given in Fig. 13.
  • the actual advancing contact angle of the surface may be determined according to the equation:
  • the liquid interface deflects downwardly between adjacent asperities by an amount Di as depicted in Fig. 6. If the amount Di is greater than the height (z) of the asperities 24, the liquid will contact the substrate 22 at a point between the asperities 24. If this occurs, the liquid will be drawn into space 34, and collapse over the asperities, destroying the ultraphobic character of the surface.
  • Di represents a critical asperity height (Z c ), and is determinable according to the following formula: ⁇ __ d (l - cos ( ⁇ a - + ⁇ - 180 ° ))
  • ⁇ d is the least distance between adjacent asperities at the contact line
  • co is the asperity rise angle
  • ⁇ a>0 is the experimentally measured true advancing contact angle of the liquid on the asperity material.
  • the height (z) of asperities 24 must be at least equal to, and is preferably greater than, critical asperity height (Z c ).
  • ⁇ is 90 degrees
  • ⁇ may be an acute angle as depicted in Fig. 9 or an obtuse angle as depicted in Fig. 10.
  • ⁇ be between 80 and 130 degrees.
  • asperities may be polyhedral, cylindrical as depicted in Figs. 11-12, cylindroid, or any other suitable three dimensional shape.
  • various strategies may be utilized to optimize contact line density of the asperities.
  • the asperities 24 may be formed with a base portion 38 and a head portion 40. The larger perimeter of head portion 40 at top edge 30 increases the contact line density of the surface.
  • features such as recesses 42 may be formed in the asperities 24 as depicted in Fig. 16 to increase the perimeter at top edge 30, thereby increasing contact line density.
  • the asperities may also be cavities formed in the substrate.
  • the asperities may be arranged in a rectangular array as discussed above, in a polygonal array such as the hexagonal array depicted in Figs. 4-5, or a circular or ovoid arrangement.
  • the asperities may also be randomly distributed so long as the critical contact line density is maintained, although such a random arrangement may have less predictable ultraphobic properties, and is therefore less preferred.
  • the critical contact line density and other relevant parameters may be conceptualized as averages for the surface.
  • formulas for calculating contact line densities for various other asperity shapes and arrangements are listed.
  • the substrate material may be any material upon which micro or nano scale asperities may be suitably formed.
  • the asperities may be formed directly in the substrate material itself, or in one or more layers of other material deposited on the substrate material, by photolithography or any of a variety of suitable methods. Direct extrusion may be used to form asperities in the form of parallel ridges. Such parallel ridges are most desirably oriented transverse to the direction fluid flow.
  • a photolithography method that may be suitable for forming micro/nanoscale asperities is disclosed in PCT Patent Application Publication WO 02/084340, hereby fully incorporated herein by reference.
  • Carbon nanotube structures may also be usable to form the desired asperity geometries. Examples of carbon nanotube structures are disclosed in U.S. Patent Application Publication Nos. 2002/0098135 and 2002/0136683, also hereby fully incorporated herein by reference. Also, suitable asperity structures may be formed using known methods of printing with colloidal inks. Of course, it will be appreciated that any other method by which micro/nanoscale asperities may be accurately formed may also be used.
  • repellency characteristics of the ultraphobic flow channel surfaces in order to minimize contact of the liquid slug with the flow channel surfaces, thereby also minimizing the resulting surface forces.
  • repellency characteristics of the surface may be optimized by selecting relatively lower values for ⁇ p , ⁇ , x/y, or A, while still ensuring that the surface has a sufficient critical contact line density value (A L ) to ensure that the surface has ultraphobic properties at the maximum pressure expected to be encountered in the flow channel.
  • a L critical contact line density value
  • the x/y ratio for the asperity geometry should be less than about 0.1 and most preferably about 0.01.
  • a cylindrical microscopic flow channel is to be formed in a silicon body to produce a microfluidic device.
  • An ultraphobic surface is to be provided on the inwardly facing walls of the microscopic flow channel according to the present invention.
  • the channel walls will also be coated with organosilane so that the channel has the following dimensions and characteristics:
  • the pressure required to move the liquid slug through the smooth flow channel may be calculated as:
  • Repellancy of the fluid contact surface is optimized by selecting a small x/y ratio so as to increase the actual advancing and receding contact angles of the water at the fluid contact surface:
  • y should be about 1 x 10 "5 m or 10 ⁇ m for a maximum pressure of 100 Pa and an x/y ratio of 0.01. Accordingly:
  • the square asperities are placed on the fluid contact surfaces in the flow channel in a rectangular array, they should have a cross-sectional dimension of about lOOnm, should be spaced at about 10 ⁇ m apart and should be at least 0.9 ⁇ m in height.
  • Fig. 17 is a plot of the relationship between asperity spacing
  • y should be about 1 x 10 "5 m or 10 ⁇ m for a maximum pressure of 100 Pa and an x/y ratio of 0.01. Accordingly:
  • the square asperities are placed on the fluid contact surfaces in the flow channel in a rectangular array, they should have a cross-sectional dimension of about 1 ⁇ m, should be spaced at about 10 ⁇ m apart and should be at least 0.8 ⁇ m in height.

Abstract

L'invention concerne un dispositif microfluidique dont les canaux d'écoulement de fluide comportent des surfaces de contact avec le fluide présentant un caractère ultraphobique durable. Cette surface ultraphobique comprend de manière générale une section de substrat comprenant une multiplicité d'aspérités proéminentes de forme régulière, d'échelle micrométrique ou nanométrique, disposées de manière à former un réseau ordonné, de telle manière que la surface présente une ligne de séparation prédéterminée d'une densité égale ou supérieure à une densité critique de ligne de contact, et que le rapport entre la section transversale des aspérités et l'espacement de ces dernières est inférieur ou égal à 0,1.
PCT/US2004/011580 2003-04-15 2004-04-15 Dispositif microfluidique a surfaces ultraphobiques WO2004091792A2 (fr)

Priority Applications (2)

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JP2006510056A JP2006523533A (ja) 2003-04-15 2004-04-15 超撥水性表面を有するマイクロ流体装置
EP04759543A EP1618035A4 (fr) 2003-04-15 2004-04-15 Dispositif microfluidique a surfaces ultraphobiques

Applications Claiming Priority (6)

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US46296303P 2003-04-15 2003-04-15
US60/462,963 2003-04-15
US10/454,742 2003-06-03
US10/454,742 US6845788B2 (en) 2003-04-15 2003-06-03 Fluid handling component with ultraphobic surfaces
US10/652,586 2003-08-29
US10/652,586 US6923216B2 (en) 2003-04-15 2003-08-29 Microfluidic device with ultraphobic surfaces

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WO2004091792A3 WO2004091792A3 (fr) 2005-06-09

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WO2007075287A1 (fr) * 2005-12-15 2007-07-05 Kimberly-Clark Worldwide, Inc. Dispositifs microfluidiques a canal rugueux
WO2008036074A2 (fr) * 2005-08-03 2008-03-27 General Electric Company Articles présentant une faible mouillabilité et leurs procédés de fabrication
US7833486B2 (en) 2003-05-23 2010-11-16 Gyros Patent Ab Hydrophilic/hydrophobic surfaces

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EP2172260A1 (fr) * 2008-09-29 2010-04-07 Corning Incorporated Dispositifs microfluidiques à flux multiple
KR101533277B1 (ko) * 2008-12-09 2015-07-03 삼성전자주식회사 나노 조도가 형성된 현상제 접촉매체를 가진 화상형성장치
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JP5322173B2 (ja) * 2009-09-07 2013-10-23 国立大学法人 宮崎大学 微細流路の形成方法
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US7833486B2 (en) 2003-05-23 2010-11-16 Gyros Patent Ab Hydrophilic/hydrophobic surfaces
WO2008036074A2 (fr) * 2005-08-03 2008-03-27 General Electric Company Articles présentant une faible mouillabilité et leurs procédés de fabrication
WO2008036074A3 (fr) * 2005-08-03 2008-08-07 Gen Electric Articles présentant une faible mouillabilité et leurs procédés de fabrication
WO2007075287A1 (fr) * 2005-12-15 2007-07-05 Kimberly-Clark Worldwide, Inc. Dispositifs microfluidiques a canal rugueux

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EP1618035A4 (fr) 2006-06-14
MY135712A (en) 2008-06-30
KR20060003001A (ko) 2006-01-09
JP2006523533A (ja) 2006-10-19
WO2004091792A3 (fr) 2005-06-09

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