WO2004062322A1 - 発光装置及びその作製方法 - Google Patents
発光装置及びその作製方法 Download PDFInfo
- Publication number
- WO2004062322A1 WO2004062322A1 PCT/JP2003/015766 JP0315766W WO2004062322A1 WO 2004062322 A1 WO2004062322 A1 WO 2004062322A1 JP 0315766 W JP0315766 W JP 0315766W WO 2004062322 A1 WO2004062322 A1 WO 2004062322A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light emitting
- emitting device
- conjugated polymer
- light
- hole injection
- Prior art date
Links
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Classifications
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- H—ELECTRICITY
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Definitions
- the present invention relates to a device having a structure in which an anode, a cathode, and a thin film that emits light by a phenomenon called electroluminescence (hereinafter, referred to as “EL”) are sandwiched between the anode and the cathode (hereinafter, “light-emitting device”). ”) On a substrate and the technical field of an electronic device having a light emitting element in a video display unit. Background art
- Video displays are one of the indispensable display devices in modern life, starting with so-called TV monitors, liquid crystal displays that have developed rapidly in recent years, and organic EL displays that are expected to develop in the future. Take various forms according to the application.
- liquid crystal displays and EL displays are light-emitting elements driven at low voltage, and are important video display displays from the viewpoint of energy saving.
- the light-emitting mechanism of an EL display is based on a method in which a thin film (hereinafter, referred to as a “thin film”) composed of a phosphor composition is placed between electrodes and a current is applied to the thin film.
- a thin film hereinafter, referred to as a “thin film”
- the injected electrons and holes injected from the anode recombine at the luminescent center in the phosphor film to form molecular excitons, and use the photons emitted when the molecular excitons return to the ground state Things.
- the thin film is usually formed with a thickness of less than 1 m. Further, since the EL element is a self-luminous element in which the luminous body film itself emits light, there is no need for a pack light as used in a conventional liquid crystal display. Therefore, it is a great advantage that the EL device can be made extremely thin and lightweight.
- the time from carrier injection to recombination is about several tens of nanoseconds in consideration of the carrier mobility of the luminescent material film. Even within the process from recombination to light emission, light is emitted within a few microseconds. Therefore, one of the features is that the response speed is extremely fast.
- the EL element is a carrier-injection type light emitting element, it can be driven by a DC voltage and does not easily generate noise. Also, by forming a uniform ultra-thin film of about 10 O nm with an appropriate material, it can be driven at a voltage of several volts. In other words, the EL element is a self-luminous type and has a wide viewing angle, so it has not only good visibility, but also features such as thinness and light weight, high-speed response, DC low voltage drive, etc. Expected as an element You.
- the light emitting mechanism of an EL display is such that, by arranging a thin film between electrodes and passing an electric current, electrons injected from a cathode and holes injected from an anode are re-emitted at the luminescent center in the luminescent material film. They combine to form molecular excitons and use photons emitted when the molecular excitons return to the ground state. Therefore, efficient injection of holes and electrons into a thin film is one of the prerequisites for producing an efficient light-emitting device.
- a current of about 100 mA / cm 2 is originally injected into a thin film having a high electric resistance.
- a metal with a small work function must be used for the cathode, and a metal with a large work function must be selected for the anode.
- the work function can be virtually arbitrarily controlled by selecting various metals or alloys.
- the anode in a general EL element, the anode is required to be transparent, so that it is currently limited to transparent conductive oxides. Considering such factors, at present, some oxide conductive films must be selected, such as indium monotin oxide (hereinafter referred to as “ITO”).
- ITO indium monotin oxide
- the ITO electrode is obtained by doping tin into indium oxide, and the tin enters a substitution position of indium. Tin and some oxygen vacancies become donors, and conductivity is developed by partially filling the conduction band.
- IT ⁇ is deposited on glass by methods such as sputtering, ion beam sputtering, and vapor phase epitaxy. By appropriately selecting the amount of doping, an electrode having low resistance and high transparency can be manufactured.
- the surface of the ITO is not necessarily flat, which causes poor contact with the thin film used for the EL element or creates a pinhole in the thin film. This is said to be one of the reasons for EL element deterioration.
- the work function of the ITO film can be changed to some extent depending on the process and surface treatment when forming the ITO film. However, such a method has a limit, and thus the hole injection barrier is reduced. Difficult.
- a buffer layer As one method of reducing the hole injection barrier from the ITO anode, it is known to insert a buffer layer on the ITO film. By optimizing the ionization potential of the buffer layer, the hole injection barrier can be reduced.
- Such a buffer layer is called a hole injection layer.
- the materials that function as hole injection layers are roughly classified into metal oxides, low molecular weight organic compounds, and high molecular weight compounds.
- metal oxides include vanadium oxide, molybdenum oxide, ruthenium oxide, and aluminum oxide.
- low molecular organic compounds include starburst-type amines represented by m-MTDATA and metal phthalocyanines.
- conjugated polymers such as polyaniline-polythiophene derivatives are known as polymer compound materials.
- Non-Patent Document 1 S. Tokito, et al., J. Pys. D1996, 29, pp. 2750-2753
- Non-Patent Document 3 (Non-Patent Document 3)
- Non-Patent Document 4 (Non-Patent Document 4)
- Non-Patent Document 5 S. A. VanSlyke, et al., Appl. Phys. Lett., 1996, 69, pp.2160-2162 (Non-Patent Document 5)
- Non-Patent Document 6 (Non-Patent Document 6)
- polymer-based materials are that they can be formed on the ITO surface by a method such as the spin-coat method or the jet-jet method.
- the ink jet method has the advantage of being able to form an arbitrary fine pattern by controlling the position where the droplets adhere to the substrate, and has the advantage of being low cost and simple. Plays an important role.
- the polymer hole injecting material to which the low cost and simple ink jet method can be applied is a very promising material, but has the following problems.
- Conjugated polymers such as polyaniline and polythiophene described above are However, it exhibits little conductivity by itself, and exhibits high conductivity when mixed with a strong acid such as camphorsulfonic acid or poly (styrenesulfonic acid), that is, by doping the strong acid into a conjugated polymer.
- the conductive conjugated polymer doped in this way functions as a hole injection material, but comes into contact with the hole injection layer because a strong acid is used as a doping agent (hereinafter referred to as “dopant”). It is likely to cause significant damage to thin films and ITO.
- TFT thin film transistor
- the polymer material conventionally used as a hole injection material is insoluble in an organic solvent, and is doped with a strong acid, sulfonic acid, and then provided as an aqueous suspension. Therefore, when a film is formed on a water-repellent substrate by an ink jet method, a spin coating method, or the like, the suspension is not uniformly dispersed, and as a result, the thickness of the hole injection layer becomes uneven and a uniform thin film is formed. Difficult to form.
- an insulator used for insulating between pixels is often lipophilic, that is, water-repellent, so that it is not always easy to form a uniform thin film.
- the polymer-based hole injection material has the advantage of being adaptable to the ink-jet method and the spin-coat method, which are low-cost and simple, and can improve the characteristics of the EL element, but it has been adopted so far.
- Polymer-based hole-injection materials are fundamentally suffering from the major problems described above, and leave room for improvement. Confuse. Disclosure of the invention
- the present invention has been made in view of the above problems, and provides a polymer-based hole injection material that improves the characteristics of an EL device and does not adversely affect a thin film or an ITO film that contacts the EL device. Another object is to provide a method for manufacturing an EL light-emitting element using the present material.
- the gist of the present invention is to first introduce a suitable and appropriate side chain into a conjugated polymer (conjugated polymer) having a polythiophene derivative, a polyaniline derivative, a polypyrrole derivative or a polyfuran derivative as a basic skeleton, and to solubilize it in an organic solvent.
- the main chain of the conjugated polymer is oxidized by dropping the electron-accepting organic compound as a dopant into the conjugated polymer without using a strong acid or an oxidizing agent.
- a polymer in which the main chain is oxidized and imparted with conductivity is deposited on an anode such as ITO to form a hole injection layer.
- the functional layers constituting the EL element are laminated, and finally the cathode is formed to produce the EL element.
- conjugated polymer having polythiophene as a basic skeleton at least one compound represented by the formula (1) is recommended.
- the substituents RR 2 may be the same or different and represent an organic residue which may contain a hydrogen atom, an oxygen atom, a sulfur atom or a nitrogen atom. More specifically, an aliphatic hydrocarbon group having 4 to 30 carbon atoms (eg, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-heptyl group, 2,6-dimethylheptyl group, 1-ethylpentyl group, n-octyl group, n-decyl group, n-pentadecyl group, n-heptanyldecyl group, etc.), alicyclic hydrocarbon group having 4 to 10 carbon atoms (Cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, cyclonony
- it may be an aromatic group such as a phenyl group, a naphthyl group, an anthranyl group, and a pyrenyl group.
- a hydrogen atom may be substituted by a hydrocarbon group or the like.
- these aromatic groups may be bonded to a carbonyl group through an alkylene group having 1 to 5 carbon atoms.
- a group having a heterocyclic ring may be used.
- the substituents R ′ and R 2 may be bonded to the thiophene skeleton by an oxygen atom, a sulfur atom, a nitrogen atom, or a silicon atom.
- the electron-accepting organic compound doped as a dopant in the conjugated polymer it is preferable to use an unsaturated compound represented by the formulas (2) to (9) or an aromatic compound.
- the doping of the conjugated polymer improves the solubility in a highly polar organic solvent, so that it is not necessary to introduce an alkyl side chain or the like into these electron-accepting organic compounds.
- the functional layer constituting the EL element in the present invention as described above contributes to recombination of an electron injection material, a hole transport material, an electron transport material, a hole blocking material, an electron blocking material, a light emitting material, and other carriers.
- Form organic or inorganic compounds Refers to a film or a laminate thereof.
- the light emitting material may be an organic compound or an inorganic compound. Further, as the light-emitting material, a material which emits fluorescence by singlet excitation or a material which emits phosphorescence by triplet excitation may be used.
- the polymer main chain when the hole injection layer is formed on the anode, the polymer main chain may be oxidized after forming the conjugated polymer, and conversely, after the polymer main chain is oxidized. A film may be formed.
- a conjugated polymer that is not oxidized that is, a conjugated polymer soluble before doping, but also a conjugated polymer that is insoluble before oxidization or solubilized after oxidation may be used.
- a Langmuir-Blodgett method As a method for forming the conjugated polymer on the anode, a Langmuir-Blodgett method (LB method), a monolayer film method, a dip coating method, a spin coating method, an ink jet method, a printing method, or the like may be used. it can.
- each functional layer is laminated and finally a cathode is formed.
- the functional layers are laminated by a Langmuir project method (LB method),
- LB method Langmuir project method
- a wet method such as a molecular lamination film method, a dip coating method, a spin coating method, an ink jet method, and a printing method
- an evaporation method and a sputtering method can be applied.
- an evaporation method and a sputtering method are applied for the production of the cathode.
- an EL device and a light emitting device including the EL device are manufactured.
- the present invention can be implemented in manufacturing a passive-matrix light-emitting device or an active-matrix light-emitting device, and is not limited to a particular light-emitting device.
- the substrate is not limited to glass, and paper, a polymer film, an inorganic oxide plate containing glass, or the like can be used. (The invention's effect)
- the present invention it is possible to design and synthesize a hole injection material having a basic skeleton of a conjugated polymer that does not contain an acid component and is soluble in an organic solvent. Since the hole injection material of the present invention does not contain an acid component, it does not adversely affect the properties of the thin film, the ITO film, and the TFT that come into contact with the hole injection material. Further, since the hole injection material obtained in the present invention is soluble in an organic solvent, it can be uniformly applied to a substrate having high water repellency, that is, a substrate having high lipophilicity. Therefore, the characteristics and reliability of the conventional EL element can be greatly improved. BRIEF DESCRIPTION OF THE FIGURES
- FIG. 1 is a diagram of a light emitting device that can be manufactured by implementing the present invention.
- FIG. 2 is a diagram of a light emitting device that can be manufactured by implementing the present invention.
- FIG. 3 is a diagram illustrating a method for manufacturing a light emitting device that can be manufactured by implementing the present invention.
- FIG. 4 is a diagram showing the appearance of a light emitting device obtained by implementing the present invention.
- FIG. 5 is a diagram illustrating an example of an electronic apparatus including a light emitting device obtained by implementing the present invention.
- the compound represented by the formula (1) is a polythiophene derivative.
- the substituent RR 2 has a linear or branched structure in order to impart solubility in an organic solvent.
- an alkyl group having 4 or more carbon atoms preferably an aliphatic hydrocarbon group having a linear or branched structure having 4 to 6 carbon atoms, or an alicyclic hydrocarbon group having 4 to 6 carbon atoms.
- a benzene ring having an aliphatic hydrocarbon group or an alicyclic hydrocarbon group or a condensed aromatic ring can be introduced.
- an electron-deficient heteroaromatic ring such as a pyridine ring or a quinoxaline ring is introduced, and an aliphatic hydrocarbon group having 4 or more carbon atoms or an alicyclic hydrocarbon group having 4 to 10 carbon atoms is introduced. What is necessary is just to introduce
- These polythiophene derivative polymers are synthesized into a film by electrochemically oxidizing and polymerizing the corresponding thiophene derivative or using an oxidizing agent.
- the substituent R ' it is preferred to introduce both R 2.
- an aliphatic or alicyclic hydrocarbon group having a linear or branched structure may be introduced via an oxygen atom, a sulfur atom, a nitrogen atom, or a silicon atom.
- an alkoxy group, a thioalkyl group, a dialkylamino group, a trialkylsilyl group preferably an alkoxy group having 4 to 6 carbon atoms, a thioalkyl group, a dialkylamino group, and a trialkylsilyl group are preferred.
- aromatic substituents having these substituents may be introduced, or the aromatic substituent may be introduced via a hetero atom of these substituents.
- the polymerization position is controlled at the 2- and 5-positions of the thiophene ring, and by controlling the polymerization position at the 2- and 5-positions, This is for improving conductivity.
- the substituent R ', R 2 need not necessarily be identical. This is because, the substituent R ', when R 2 are not the same, because the irregularities you experience any main chain structure of the polymer, the improvement in solubility (especially solubility in an organic solvent) is achieved.
- a polymer having a main chain that is, a copolymer may be used. This is because the irregular arrangement of a plurality of thiophenites causes an irregularity in the main chain structure of the copolymer, which is expected to improve solubility (in particular, solubility in organic solvents).
- the substituent RR 2 for the thiophene derivative has been described above.
- the hole injection material of the present invention can be obtained by applying the above substituents R ′ and R 2 as the substituent for polyaniline, polypyrrole, and polyfuran derivatives. Needless to say.
- the obtained ethyl thioglycolate ester (115 g, 558 mmol) was dissolved in a dehydrated ethanol solution (50 O mL) of getyl oxalate (83.5 g, 0.571 mmol), and sodium ethoxide (168 g, 2.5 mol) in ethanol solution I dropped it. After completion of the dropwise addition, the mixture was stirred at 50 ° C for 2 hours. The generated precipitate was filtered, and the filtrate was washed with ethanol. The filtrate was dissolved in 1500 mL of distilled water, and 1 M hydrochloric acid was added dropwise until the pH reached about 1.
- This solid was suspended in aqueous ammonia (20 O mL), and the precipitate obtained after stirring for several hours was filtered and washed with methanol, water, and acetone. The solid thus obtained was dissolved in a gel form, and the soluble portion was concentrated and dried to obtain poly (3,4-dihexoxythiophene) represented by the formula (1) in a yield of 52%.
- the obtained polymer was soluble in organic solvents such as THF, ether, chloroform, and toluene. The polymerization of the monomer, 3,4-jetoxythiophene, was performed in the same manner.
- an electron-accepting organic compound that oxidizes the conjugated polymer used as the hole-injecting material described in Embodiment 1, that is, an electron-accepting organic compound as a dopant doped into the conjugated polymer will be described.
- the doping method is described.
- Formulas (2) to (9) are examples of electron-accepting organic compounds for oxidizing the conjugated polymer.
- an unsaturated compound having an electron accepting property or an aromatic compound In many cases, conjugated polymers are highly polar because of their doping. Therefore, the necessity of introducing an alkyl side chain or the like into the electron-accepting organic compound is not high because the solubility in organic solvents is improved. Further, as the electron-accepting organic compound, it is also possible to use a high molecule in which an organic compound having a structure represented by the formulas (2) to (9) is introduced into a side chain.
- the conjugated polymer may be mixed with the electron-accepting compound in a polar solvent.
- a polar solvent include DMF and NMP, DMAC and DMSO.
- the solution is applied to the substrate.
- a spin coating method, an ink jet method, a dip coating method, an LB method, a spray method, or the like can be used.
- the undoped conjugated polymer previously dissolved in an organic solvent may be applied to a substrate, and then the substrate may be immersed in a solution in which the electron-accepting compound is dissolved.
- an undoped common polymer previously dissolved in an organic solvent may be applied to a substrate, and then contacted with the vapor of the electron-accepting compound under reduced pressure.
- the electron accepting compound as a dopant for doping the conjugated polymer
- a supporting electrolyte such as tetrabutylammonium salt / metal perchlorate in a polar solvent
- dissolving the conjugated polymer and then, after inserting the working electrode and the counter electrode into the solution, an appropriate and appropriate potential. Oxidizes with.
- the appropriate and appropriate potential is a potential at which the main chain of the conjugated polymer is oxidized, and can be easily determined by cyclic portometry (hereinafter, referred to as “cv”).
- the conjugated polymer previously dissolved in an organic solvent is The substrate is immersed in a polar solvent in which a supporting electrolyte such as tetrabutylammonium salt / metal perchlorate is dissolved, and the counter electrode is inserted into the solution. It may be oxidized at a potential at which the chains are oxidized.
- a supporting electrolyte such as tetrabutylammonium salt / metal perchlorate
- the substrate coated with ITO not only quartz and glass but also paper and plastic resin can be used. It is also possible to use a substrate on which TFT is mounted in advance.
- the conjugated polymer described in Embodiments 1 and 2 and the electron-accepting organic compound are used, and the hole injection layer is formed using the hole injection material manufactured by the method described in Embodiment 1. At least one layer is laminated on the substrate.
- each functional layer is laminated.
- the functional layer include a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, a hole blocking layer, and an electron blocking layer.
- the hole transport layer is provided so as to be in contact with the hole injection layer.
- a light emitting layer is provided so as to be in contact with the hole transport layer, an electron transport layer is provided so as to be in contact with the light emitting layer, and an electron injection layer is provided so as to be in contact with the electron transport layer.
- a blocking material having a larger energy difference between the highest occupied molecular orbital and the lowest unoccupied molecular orbital than the hole transporting material contained in the hole transporting layer is included between the hole transporting layer and the cathode. May be.
- These functional layers can be laminated not only by wet methods such as spin coating, dip coating, LB, monolayer lamination, and spraying, but also by vacuum. Dry methods such as vapor deposition and sputtering can also be employed. Thereafter, the cathode is manufactured by using a method such as a vacuum evaporation method or sputtering, and the manufactured device is sealed with glass or the like to complete the device.
- FIG. 1A 101 is a data signal line
- 102 is a gate signal line
- 103 is a power supply line
- 104 is a switching TFT (hereinafter referred to as a switching TFT).
- 105 is a capacitor for holding electric charge
- 106 is a driving TFT (hereinafter referred to as driving TFT) for supplying current to the light emitting element
- 107 is a pixel electrode connected to the drain of the driving TFT. Yes, it functions as an anode of a light emitting element.
- Reference numeral 112 denotes a counter electrode, which functions as a cathode of the light emitting element.
- Fig. 1 (B) shows a drawing corresponding to the cut surface at A-A 'at this time.
- 110 is a base, and a glass substrate, a quartz substrate, a plastic substrate, or another light-transmitting substrate can be used.
- the driving TFT 106 is formed on the base 110 using a semiconductor process.
- an insulator 1010 patterned in a lattice pattern so as to cover the end of the pixel electrode 107 formed so as to be connected to the driving TFT 106 and at least the driving TFT and the switching TFT. 8 are provided.
- the hole injection layers 111a to 111c are formed using the materials and techniques described in the first and second embodiments, and thereafter, in the third embodiment.
- the functional layers 114a to 114c including the light emitting layer are laminated. Note that when electrochemically doping after applying the polymer to the substrate, the pixel electrode 107 itself functions as a working electrode. Thereafter, a counter electrode 112 and a passivation film 113 functioning as a cathode are provided.
- the functional layers 114a to 114c are a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, a hole blocking layer or an electron blocking layer, and contribute to recombination of other carriers. Refers to a layer containing an organic compound or an inorganic compound or a laminate thereof.
- the counter electrode 112 an aluminum film or a silver thin film containing an element belonging to Group 1 or 2 of the periodic table can be used. Since it is necessary to transmit light emitted from 14a to 114c, it is desirable that the thickness of the counter electrode be 50 nm or less.
- the passivation film 113 may be a silicon nitride film, an aluminum nitride film, or the like.
- An insulating film having a high blocking property against moisture and oxygen can be used as a film, a diamond-like carbon film, or the like.
- a conjugated polymer soluble in an organic solvent and doped without using a strong acid or an oxidizing agent is used as a hole injection layer.
- the TFT substrate is not necessarily highly hydrophilic.
- the conjugated polymer conventionally used as a hole injection material is provided as an aqueous suspension. Therefore, in order to form a thin film of a hole injection layer containing a conjugated polymer on the ITO surface of a TFT substrate having poor hydrophilicity, many steps are required for cleaning the substrate.
- the material for doping does not contain a strong acid component, deterioration of the element is suppressed, and the reliability of the light emitting device can be improved.
- 201 is a data signal line
- 202 is a gate signal line
- 203 is a power supply line
- 204 is a switching TFT
- 205 is a charge holding line.
- Capacitor, 206 is a drive?
- Reference numeral 1207 denotes a drain electrode of the driving TFT
- 208 denotes a pixel electrode connected to the drain electrode of the driving TFT
- the pixel electrode 208 functions as an anode of the light emitting element.
- a conductive film which is transparent to visible light so that light emitted from the light emitting layer can be transmitted. It is preferable to use an oxide conductive film such as a compound of zinc oxide or a compound of zinc oxide and zinc oxide.
- Reference numeral 212 denotes a counter electrode, which functions as a cathode of the light emitting element.
- Figure 2 (B) shows a drawing corresponding to the cut surface at A-A '.
- reference numeral 210 denotes a substrate, and a glass substrate, a quartz substrate, a plastic substrate, or another light-transmitting substrate can be used.
- the driving TFT 206 is formed on the substrate 210 by using a semiconductor process. Further, an insulator 209 patterned in a lattice pattern is provided so as to cover at least the end of the pixel electrode 208 formed so as to be connected to the driving TFT 206, the driving TFT and the switching TFT. .
- hole injection layers 21a to 21c are formed using a hole injection material manufactured using the materials and methods described in the first and second embodiments. Is done. Note that when electrochemically doping after applying a polymer, which is a conjugated polymer, to a substrate, the pixel electrode itself functions as a working electrode. Then, as described in Embodiment Mode 3, the functional layers 214a to 214c including the light emitting layer are stacked.
- the functional layers 214a to 214c refer to a carrier injection layer, a carrier transport layer, a carrier blocking layer, and a light emitting layer, and other layers containing an organic compound or an inorganic compound that contribute to carrier recombination. These laminates are referred to. Known materials may be used for the laminated structure and materials of the functional layers 214a to 214c.
- an aluminum film or a silver thin film containing an element belonging to Group 1 or 2 of the periodic table can be used as the counter electrode 212.
- an evaporation film 213, a silicon nitride film, an aluminum nitride film, a diamond-like film, or an insulating film having a high blocking property against moisture and oxygen can be used.
- a conjugated polymer soluble in an organic solvent and doped without using a strong acid or an oxidizing agent, that is, an oxidized conjugated polymer is used as a hole injection layer.
- the TFT substrate is not necessarily highly hydrophilic.
- the conjugated polymer conventionally used as a hole injection material is provided as an aqueous suspension. Therefore, in order to form a thin film of a hole injection layer composed of a conjugated polymer on the ITO surface of a TFT substrate having poor hydrophilicity, many steps are required for cleaning the substrate.
- the present invention by implementing the present invention, it is possible to easily form a hole injection layer on a TFT substrate having poor hydrophilicity, and thus to produce a high-throughput EL device by a low-cost and simple method. It becomes possible. Further, in the present invention, since the material for doping does not contain a strong acid component, deterioration of the element is suppressed, and the reliability of the light emitting device can be improved.
- FIG. 3 shows an example of a multi-chamber one-type manufacturing apparatus in which steps from formation of a light emitter to sealing of a light emitting element are automated.
- reference numeral 11 denotes a loading chamber for receiving substrates
- 12, 14, 14a, 18, and 24 denote transfer chambers (also referred to as common chambers) for transferring substrates to be processed to the respective chambers (chamber 1).
- Reference numerals 5, 17 and 21 denote transfer rooms for transferring substrates between the transfer chambers
- reference numeral 29 denotes a chamber for removing processed substrates.
- Reference numeral 13 denotes a pretreatment chamber, which cleans the electrode surface on the substrate in advance. Alternatively, the work function is adjusted.
- 16 A is a spin-coating chamber for applying doped or oxidized conjugated polymer by electrode spin coating on the substrate
- 16 B is a spin-coating of undoped conjugated polymer onto the electrode on the substrate. It is a room for spinning overnight to apply by the method.
- the substrate coated with the undoped conjugated polymer is transported to the electrolytic pretreatment chamber 16C, and the substrate is oriented vertically, that is, the surface to be treated is oriented in the direction of gravity. It is installed so as to be parallel to it, and then transported to the electrolytic chamber 16D.
- the substrate is immersed in an electrolytic cell containing a supporting electrolyte solution in the electrolytic chamber 16D, and the electrodes on the substrate are directly energized under a constant potential or constant current condition to perform electrochemical doping. Thus, a hole injection layer is formed on the substrate. After this, the substrate is returned to the electrolytic pretreatment chamber
- the substrate having the hole injection layer formed on the substrate is transferred to the transfer chamber 14a via the transfer chamber 15.
- the film forming chambers 16E to 16H connected to the transfer chamber 14a the above-described functional layers and electrodes are stacked. These functional layers and electrodes are manufactured by a spin coating method, a vapor deposition method, a sputtering method, or the like, and each film forming chamber can be set to a specification corresponding to the film forming method.
- the preparation of the cathode in the case of the vapor deposition method, there is a concern that the TFT and the luminescent material may be deteriorated by radiation such as X-rays and electron beams.
- the substrate to be processed is moved to the transfer chamber 24 via the transfer chamber 21.
- 2 7 is a sealing substrate loading chamber for storing the sealing substrate for sealing
- 2 5 Is a dispenser chamber for forming a sealing material
- 26 is a sealing chamber for sealing a light emitting element by bonding a substrate to be processed and a sealing substrate.
- each chamber is separated by a gate valve, and the other chamber can be hermetically shut off. Further, each chamber is connected to a vacuum pump, so that a vacuum can be maintained and an inert gas can be introduced to create a reduced-pressure atmosphere. Of course, it is also possible to form a film under an inert gas at atmospheric pressure.
- a vacuum pump a magnetic levitation pump, a cryopump or a dry pump can be used. It is desirable that the inert gas to be introduced be sufficiently purified in advance through a purifier or the like.
- FIG. 3 shows that the configuration of the manufacturing apparatus shown in FIG. 3 is merely an example, and does not limit the present invention in any way.
- This embodiment mode shows that an apparatus for manufacturing a hole-injection layer for implementing the method for manufacturing a light-emitting device of the present invention can be combined with a multi-chamber single-mode manufacturing apparatus.
- FIG. 4 is a top view of a light emitting device formed by sealing an element substrate on which a thin film transistor is formed with a sealing material.
- FIG. 4B is a cross-sectional view taken along a line BB ′ of FIG. 4A.
- FIG. 4 (C) is a cross-sectional view taken along line AA ′ of FIG. 3 (A).
- a pixel portion (display portion) 82 On the substrate 81, a pixel portion (display portion) 82, a data line driving circuit 83 provided to surround the pixel portion 82, a gate line driving circuit 84a, 84b, and a protection circuit are provided. Roads 85 are arranged, and a sealing material 86 is provided so as to surround them.
- the pixel portion 82 includes a light emitting element manufactured according to the present invention.
- the sealing material 86 an ultraviolet curable resin, an epoxy resin, or another resin can be used, but it is preferable to use a material having as low hygroscopicity as possible.
- seal material 86 may be provided so as to overlap a part of the data line driving circuit 83, the gate line driving circuits 84a and 84b, and a part of the protection circuit 85, or these circuits may be provided. May be provided to avoid the problem.
- the sealing material 87 is adhered using the sealing material 86, and a closed space 88 is formed by the substrate 81, the sealing material 86 and the sealing material 87.
- a glass material a metal material (typically, a stainless steel material), a ceramic material, and a plastic material (including a plastic film) can be used. It is also possible to seal with only an insulating film.
- the sealing material 87 be made of the same material as the substrate 81 on which the transistor is formed. In other words, it is desirable to use a substrate having the same coefficient of thermal expansion as the substrate 81.
- glass is used as the material of the substrate 81 and the sealing material 87, and the sealing material 87 passes through the same thermal history as the substrate 81 in the manufacturing process of the thin film transistor. By doing so, the thermal expansion coefficients are made uniform.
- a hygroscopic agent such as barium oxide or calcium oxide
- a hygroscopic agent such as barium oxide or calcium oxide
- the concave portion is covered with a fine mesh-shaped cover material 90, and the cover material 90 allows air and moisture to pass through, but does not allow the hygroscopic agent 89 to pass.
- the closed space 88 may be filled with a rare gas such as nitrogen or argon, and may be filled with a resin or liquid if it is inert.
- a terminal portion 91 for transmitting signals to the data line driving circuit 83 and the gate line driving circuits 84a, 84b is provided, and the terminal portion 91 is provided with an FPC.
- a data signal such as a video signal is transmitted via 92.
- the cross section of the terminal portion 91 is as shown in FIG. 4 (B).
- the wires 95 provided on the 92 side are electrically connected to each other by using a resin 97 in which a conductor 96 is dispersed.
- the conductor 96 may be a spherical polymer compound that has been subjected to a plating treatment such as gold or silver.
- the protection circuit 85 is provided between the terminal portion 91 and the data line driving circuit 83, and when static electricity such as a sudden pulse signal enters between the two, the pulse signal Plays the role of letting out to the outside. At that time, a high-voltage signal that enters instantaneously can be dulled by a capacitor, and other high voltages can be released to the outside by a circuit configured using a thin-film transistor and a thin-film diode.
- the protection circuit may be provided in another place, for example, between the pixel portion 82 and the data line driving circuit 83 or between the pixel portion 82 and the gate line driving circuits 84a and 84b. Absent. (Embodiment 8)
- An electronic device can be manufactured by incorporating a light-emitting device obtained by implementing the present invention into a display portion.
- Electronic devices include video cameras, digital cameras, goggle-type displays (head-mounted displays), navigation systems, sound playback devices (car audio, audio components, etc.), notebook personal computers, game devices, and mobile information terminals (mobile devices).
- An image reproducing device equipped with a recording medium such as a computer, a mobile phone, a portable game machine or an electronic book, etc. (Specifically, a display capable of reproducing a recording medium such as a digital versatile disc (DVD) and displaying the image.
- Fig. 5 shows specific examples of these electronic devices.
- FIG. 5A illustrates a television, which includes a housing 201, a support 2002, a display portion 203, a part of speakers 2004, a video input terminal 2005, and the like.
- the present invention can be applied to the display portion 2003.
- Fig. 5 (B) shows a digital camera, including the main body 2101, display 2102, image receiving section 2103, operation keys 2104, external connection port 2105, shutter 2106, etc. .
- the present invention can be applied to the display unit 210.
- FIG. 5C illustrates a laptop personal computer, which includes a main body 2201, a housing 2202, a display portion 2203, a keyboard 2204, an external connection port 2205, a pointing mouse 2206, and the like.
- the present invention can be applied to the display portion 2203.
- Fig. 5 (D) shows the mobile computer overnight.
- the present invention can be applied to the display portion 2302.
- FIG. 5 (E) shows a portable image reproducing apparatus (specifically, a DVD reproducing apparatus) equipped with a recording medium, and includes a main body 2401, a housing 2402, a display section A2403, Display section B 244, recording medium (DVD, etc.) Reading section 245, operation keys 246, speaker part 244, etc. are included.
- the display section A2403 mainly displays image information
- the display section B2244 mainly displays character information.
- the display section A2403 and the display section B2404 are used. Can be applied to both.
- the image reproducing device provided with the recording medium includes a home game machine and the like.
- FIG. 5F shows a goggle type display (head-mounted display), which includes a main body 2501, a display section 2502, and an arm section 2503.
- the present invention can be applied to the display portion 2502.
- Fig. 5 (G) shows a video camera, main body 2601, display section 2602, housing 2603, external connection port 2604, remote control receiving section 2605, image receiving section 2 606, battery 260, voice input section 260, operation keys 260, eyepiece section 260, etc. are included.
- the present invention can be applied to the display portion 2602.
- Fig. 5 (H) shows a mobile phone, main body 2701, housing 2720, display section 2703, audio input section 2704, audio output section 2705, operation keys 2 Includes 706, external connection port 270, antenna 270, etc.
- the present invention can be applied to the display portion 2703. Note that the display portion 2703 can display a white character on a black background to reduce current consumption of the mobile phone.
- the display device obtained by implementing the present invention can be used to display all electronic devices. It may be used as a unit.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2003801071470A CN1826840B (zh) | 2002-12-19 | 2003-12-10 | 发光装置及其制造方法 |
AU2003289001A AU2003289001A1 (en) | 2002-12-19 | 2003-12-10 | Light-emitting device and method for manufacturing same |
JP2004544177A JP4519651B2 (ja) | 2002-12-19 | 2003-12-10 | 発光装置及びその作製方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2002368692 | 2002-12-19 | ||
JP2002-368692 | 2002-12-19 |
Publications (1)
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WO2004062322A1 true WO2004062322A1 (ja) | 2004-07-22 |
Family
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PCT/JP2003/015766 WO2004062322A1 (ja) | 2002-12-19 | 2003-12-10 | 発光装置及びその作製方法 |
Country Status (7)
Country | Link |
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US (1) | US7485375B2 (ja) |
JP (1) | JP4519651B2 (ja) |
KR (1) | KR100991112B1 (ja) |
CN (1) | CN1826840B (ja) |
AU (1) | AU2003289001A1 (ja) |
TW (1) | TWI335774B (ja) |
WO (1) | WO2004062322A1 (ja) |
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JP2006154793A (ja) * | 2004-10-29 | 2006-06-15 | Semiconductor Energy Lab Co Ltd | 発光装置の作製方法 |
JP2007080744A (ja) * | 2005-09-15 | 2007-03-29 | Nagoya Institute Of Technology | 正孔注入層およびそれを用いた有機電界発光(el)素子 |
JP2008533701A (ja) * | 2005-02-10 | 2008-08-21 | プレックストロニクス インコーポレーティッド | 正孔注入/輸送層組成物およびデバイス |
JP2012507151A (ja) * | 2008-10-27 | 2012-03-22 | プレックストロニクス インコーポレーティッド | 電荷注入層および輸送層 |
JP2012231174A (ja) * | 2004-09-24 | 2012-11-22 | Semiconductor Energy Lab Co Ltd | 発光装置 |
JP2013058815A (ja) * | 2012-12-28 | 2013-03-28 | Lg Display Co Ltd | 有機el素子および有機el素子の製造方法、並びに有機elディスプレイ |
KR101336109B1 (ko) * | 2004-10-29 | 2013-12-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광장치 |
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Publication number | Priority date | Publication date | Assignee | Title |
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EP1860709B1 (de) | 2006-05-24 | 2012-08-08 | Novaled AG | Verwendung von quadratisch planaren Übergangsmetallkomplexen als Dotand |
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US7919195B2 (en) | 2007-01-11 | 2011-04-05 | Chimei Innolux Corporation | System for displaying images |
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JP2009021104A (ja) * | 2007-07-12 | 2009-01-29 | Sumitomo Chemical Co Ltd | 有機発光素子の製造方法 |
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US8119037B2 (en) | 2008-10-16 | 2012-02-21 | Novaled Ag | Square planar transition metal complexes and organic semiconductive materials using them as well as electronic or optoelectric components |
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JP5852855B2 (ja) | 2010-11-24 | 2016-02-03 | 株式会社半導体エネルギー研究所 | 発光素子、発光装置、照明装置、及び電子機器 |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020109136A1 (en) * | 2001-01-18 | 2002-08-15 | Satoshi Seo | Light emitting device and manufacturing method thereof |
US20020130828A1 (en) * | 2000-12-26 | 2002-09-19 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device, method of driving the same, and electronic device |
JP2002270474A (ja) * | 2001-03-13 | 2002-09-20 | Nippon Chemicon Corp | 固体電解コンデンサの製造方法 |
US20030008175A1 (en) * | 2001-06-13 | 2003-01-09 | Samsung Sdi Co., Ltd. | White electroluminescent polymer and organic electroluminescent device using the same |
US20030010959A1 (en) * | 2001-06-25 | 2003-01-16 | Samsung Sdi Co., Ltd. | Hole transport layer and method for manufacturing the organic EL device by using the same |
JP2003017271A (ja) * | 2001-07-04 | 2003-01-17 | Shunichi Hirao | 有機電界発光素子 |
JP2004022292A (ja) * | 2002-06-14 | 2004-01-22 | Fuji Photo Film Co Ltd | 有機電界発光素子及びその製造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4720432A (en) | 1987-02-11 | 1988-01-19 | Eastman Kodak Company | Electroluminescent device with organic luminescent medium |
US5364654A (en) * | 1990-06-14 | 1994-11-15 | Idemitsu Kosan Co., Ltd. | Process for production of a thin film electrode and an electroluminescence device |
FI923304A (fi) * | 1992-07-20 | 1994-01-21 | Neste Oy | Nya bearbetbara tiofenbaserade polymerer och kopolymerer, och vaermestabila elledande kompositioner daerav |
US5723873A (en) * | 1994-03-03 | 1998-03-03 | Yang; Yang | Bilayer composite electrodes for diodes |
JPH11111463A (ja) * | 1997-09-30 | 1999-04-23 | Sumitomo Chem Co Ltd | 有機エレクトロルミネッセンス素子 |
JP2001508121A (ja) * | 1997-11-05 | 2001-06-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 酸化状態にある共役重合体 |
CA2276808A1 (en) * | 1998-07-04 | 2000-01-04 | Bayer Aktiengesellschaft | Electroluminescent assemblies using boron chelates of 8-aminoquinoline derivatives |
JP2000196140A (ja) * | 1998-12-28 | 2000-07-14 | Sharp Corp | 有機エレクトロルミネッセンス素子とその製造法 |
KR20010050711A (ko) * | 1999-09-29 | 2001-06-15 | 준지 키도 | 유기전계발광소자, 유기전계발광소자그룹 및 이런소자들의 발광스펙트럼의 제어방법 |
US6380346B1 (en) * | 2000-01-18 | 2002-04-30 | Chien-Chung Han | Heterogeneous reaction method for preparing functionalized polyanilines |
JP4024009B2 (ja) * | 2000-04-21 | 2007-12-19 | Tdk株式会社 | 有機el素子 |
JP4026740B2 (ja) * | 2000-09-29 | 2007-12-26 | 富士フイルム株式会社 | 有機発光素子材料及びそれを用いた有機発光素子 |
JP4040249B2 (ja) * | 2000-11-16 | 2008-01-30 | 富士フイルム株式会社 | 発光素子 |
JP3949444B2 (ja) * | 2000-12-26 | 2007-07-25 | 株式会社半導体エネルギー研究所 | 発光装置、該発光装置の駆動方法 |
JP4047015B2 (ja) * | 2001-01-18 | 2008-02-13 | 株式会社半導体エネルギー研究所 | 発光素子、発光装置、電気器具 |
JP2003217862A (ja) * | 2002-01-18 | 2003-07-31 | Honda Motor Co Ltd | 有機エレクトロルミネッセンス素子 |
CN1176976C (zh) * | 2002-04-28 | 2004-11-24 | 中国科学院长春应用化学研究所 | 高分子空穴传输材料及其制备方法 |
US20040004433A1 (en) * | 2002-06-26 | 2004-01-08 | 3M Innovative Properties Company | Buffer layers for organic electroluminescent devices and methods of manufacture and use |
JP2004063363A (ja) * | 2002-07-31 | 2004-02-26 | Semiconductor Energy Lab Co Ltd | 電界発光素子用材料、およびそれを用いた電界発光素子 |
-
2003
- 2003-12-10 KR KR1020057011136A patent/KR100991112B1/ko active IP Right Grant
- 2003-12-10 WO PCT/JP2003/015766 patent/WO2004062322A1/ja active Application Filing
- 2003-12-10 JP JP2004544177A patent/JP4519651B2/ja not_active Expired - Fee Related
- 2003-12-10 CN CN2003801071470A patent/CN1826840B/zh not_active Expired - Fee Related
- 2003-12-10 AU AU2003289001A patent/AU2003289001A1/en not_active Abandoned
- 2003-12-15 TW TW092135432A patent/TWI335774B/zh not_active IP Right Cessation
- 2003-12-16 US US10/735,732 patent/US7485375B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020130828A1 (en) * | 2000-12-26 | 2002-09-19 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device, method of driving the same, and electronic device |
US20020109136A1 (en) * | 2001-01-18 | 2002-08-15 | Satoshi Seo | Light emitting device and manufacturing method thereof |
JP2002270474A (ja) * | 2001-03-13 | 2002-09-20 | Nippon Chemicon Corp | 固体電解コンデンサの製造方法 |
US20030008175A1 (en) * | 2001-06-13 | 2003-01-09 | Samsung Sdi Co., Ltd. | White electroluminescent polymer and organic electroluminescent device using the same |
US20030010959A1 (en) * | 2001-06-25 | 2003-01-16 | Samsung Sdi Co., Ltd. | Hole transport layer and method for manufacturing the organic EL device by using the same |
JP2003017271A (ja) * | 2001-07-04 | 2003-01-17 | Shunichi Hirao | 有機電界発光素子 |
JP2004022292A (ja) * | 2002-06-14 | 2004-01-22 | Fuji Photo Film Co Ltd | 有機電界発光素子及びその製造方法 |
Non-Patent Citations (1)
Title |
---|
SATO YOSHIHARU: "Kobunshi seiko chunyu zairyo no kaihatsu doko", GEKKAN DISPLAY 2, vol. 2, 1 September 2003 (2003-09-01), pages 19, XP002903787 * |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006041020A (ja) * | 2004-07-23 | 2006-02-09 | Konica Minolta Holdings Inc | 有機エレクトロルミネッセンス素子、表示装置及び照明装置 |
JP2012231174A (ja) * | 2004-09-24 | 2012-11-22 | Semiconductor Energy Lab Co Ltd | 発光装置 |
JP2006154793A (ja) * | 2004-10-29 | 2006-06-15 | Semiconductor Energy Lab Co Ltd | 発光装置の作製方法 |
KR101336109B1 (ko) * | 2004-10-29 | 2013-12-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광장치 |
JP2008533701A (ja) * | 2005-02-10 | 2008-08-21 | プレックストロニクス インコーポレーティッド | 正孔注入/輸送層組成物およびデバイス |
JP2007080744A (ja) * | 2005-09-15 | 2007-03-29 | Nagoya Institute Of Technology | 正孔注入層およびそれを用いた有機電界発光(el)素子 |
JP2012507151A (ja) * | 2008-10-27 | 2012-03-22 | プレックストロニクス インコーポレーティッド | 電荷注入層および輸送層 |
US9166169B2 (en) | 2008-10-27 | 2015-10-20 | Solvay Usa, Inc. | Charge injection and transport layers |
JP2013058815A (ja) * | 2012-12-28 | 2013-03-28 | Lg Display Co Ltd | 有機el素子および有機el素子の製造方法、並びに有機elディスプレイ |
Also Published As
Publication number | Publication date |
---|---|
TWI335774B (en) | 2011-01-01 |
AU2003289001A1 (en) | 2004-07-29 |
TW200421220A (en) | 2004-10-16 |
KR100991112B1 (ko) | 2010-11-02 |
KR20050088442A (ko) | 2005-09-06 |
US20040241492A1 (en) | 2004-12-02 |
CN1826840A (zh) | 2006-08-30 |
JPWO2004062322A1 (ja) | 2006-05-18 |
CN1826840B (zh) | 2010-06-23 |
US7485375B2 (en) | 2009-02-03 |
JP4519651B2 (ja) | 2010-08-04 |
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