WO2004034421A3 - Method for electric field assisted deposition of films of nanoparticles - Google Patents

Method for electric field assisted deposition of films of nanoparticles Download PDF

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Publication number
WO2004034421A3
WO2004034421A3 PCT/US2002/014593 US0214593W WO2004034421A3 WO 2004034421 A3 WO2004034421 A3 WO 2004034421A3 US 0214593 W US0214593 W US 0214593W WO 2004034421 A3 WO2004034421 A3 WO 2004034421A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrodes
pair
nanoparticles
film deposition
films
Prior art date
Application number
PCT/US2002/014593
Other languages
French (fr)
Other versions
WO2004034421A2 (en
Inventor
Irving P Herman
Mohammad A Islam
Original Assignee
Univ Columbia
Irving P Herman
Mohammad A Islam
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Columbia, Irving P Herman, Mohammad A Islam filed Critical Univ Columbia
Priority to JP2004542971A priority Critical patent/JP4130655B2/en
Priority to PCT/US2002/014593 priority patent/WO2004034421A2/en
Publication of WO2004034421A2 publication Critical patent/WO2004034421A2/en
Publication of WO2004034421A3 publication Critical patent/WO2004034421A3/en
Priority to US10/974,406 priority patent/US7510638B2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/02—Particle morphology depicted by an image obtained by optical microscopy
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/114—Poly-phenylenevinylene; Derivatives thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Abstract

The present invention is directed to a method for depositing unpatterned or selectively patterned nanoparticle films of controlled thickness on the respective film deposition surface of each of a pair of electrodes. In the present method, a pair of electrodes, each having a conducting film deposition surface, are immersed in a non-conducting nonpolar solvent in which nanoparticles, each having ligands attached thereto, are suspended. A voltage is applied to the pair of electrodes thereby causing films of the nanoparticles to deposit on the respective film deposition surface of each of the pair of electrodes. The nanoparticle films formed by the present method may be unpatterned or they may be patterned by patterning the conducting film deposition surface of at least one electrode of the pair of electrodes. The nanoparticle films formed according to the method of the present invention are useful as layers in electronic devices.
PCT/US2002/014593 2002-05-10 2002-05-10 Method for electric field assisted deposition of films of nanoparticles WO2004034421A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004542971A JP4130655B2 (en) 2002-05-10 2002-05-10 Field-assisted deposition method of nanoparticle films
PCT/US2002/014593 WO2004034421A2 (en) 2002-05-10 2002-05-10 Method for electric field assisted deposition of films of nanoparticles
US10/974,406 US7510638B2 (en) 2002-05-10 2004-10-27 Method of electric field assisted deposition of films of nanoparticles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2002/014593 WO2004034421A2 (en) 2002-05-10 2002-05-10 Method for electric field assisted deposition of films of nanoparticles

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/974,406 Continuation US7510638B2 (en) 2002-05-10 2004-10-27 Method of electric field assisted deposition of films of nanoparticles

Publications (2)

Publication Number Publication Date
WO2004034421A2 WO2004034421A2 (en) 2004-04-22
WO2004034421A3 true WO2004034421A3 (en) 2004-07-01

Family

ID=32092075

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/014593 WO2004034421A2 (en) 2002-05-10 2002-05-10 Method for electric field assisted deposition of films of nanoparticles

Country Status (2)

Country Link
JP (1) JP4130655B2 (en)
WO (1) WO2004034421A2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8174667B2 (en) 2006-10-12 2012-05-08 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
US8618531B2 (en) 2005-08-12 2013-12-31 Cambrios Technologies Corporation Transparent conductors comprising metal nanowires
US9534124B2 (en) 2010-02-05 2017-01-03 Cam Holding Corporation Photosensitive ink compositions and transparent conductors and method of using the same

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7212284B2 (en) * 2004-05-12 2007-05-01 General Electric Company Method for forming nanoparticle films and application thereof
KR100632632B1 (en) * 2004-05-28 2006-10-12 삼성전자주식회사 Method for preparing a multi-layer of nano-crystals and organic-inorganic hybrid electro-luminescence device using the same
CN101589473B (en) 2006-10-12 2011-10-05 凯博瑞奥斯技术公司 Nanowire-based transparent conductors and applications thereof
EP2147466B9 (en) 2007-04-20 2014-07-16 Cambrios Technologies Corporation Composite transparent conductors
EP2103719A1 (en) * 2008-03-18 2009-09-23 Technical University of Denmark A method for producing a multilayer structure
JP5299903B2 (en) * 2009-01-23 2013-09-25 Ｊｓｒ株式会社 Method for forming silicon particle layer and method for forming silicon film
EP3680213A1 (en) 2012-06-29 2020-07-15 Northeastern University Three-dimensional crystalline, homogenous, and hybrid nanostructures fabricated by electric field directed assembly of nanoelements
CN110459622A (en) * 2012-07-20 2019-11-15 旭化成株式会社 Semiconductor film and semiconductor element
US9399826B2 (en) * 2014-05-15 2016-07-26 Samsung Electronics Co., Ltd. Thin film deposition apparatus and thin film deposition method using electric field
CN110294965A (en) * 2018-03-21 2019-10-01 Tcl集团股份有限公司 Ink and preparation method thereof
CN110294969A (en) * 2018-03-21 2019-10-01 Tcl集团股份有限公司 Ink and preparation method thereof
CN110981878A (en) * 2019-11-28 2020-04-10 Tcl华星光电技术有限公司 Phthalocyanine nanosphere, preparation method thereof and color filter
CN113745442A (en) * 2021-08-23 2021-12-03 深圳市华星光电半导体显示技术有限公司 Preparation method of nano particle film, nano particle film and display panel
CN114197015B (en) * 2021-12-10 2023-06-27 深圳市华星光电半导体显示技术有限公司 Nanoparticle film, method for producing nanoparticle film, and display panel
WO2023209954A1 (en) * 2022-04-28 2023-11-02 シャープディスプレイテクノロジー株式会社 Light emitting element, display device, and method for manufacturing display device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060026A (en) * 1997-07-31 2000-05-09 Starfire Electronic Development & Mktg., Ltd. Photoelectrochemical device containing a quantum confined silicon particle
US20030089611A1 (en) * 2001-11-15 2003-05-15 The Board Of Trustts Of The University Of Illinois Elemental silicon nanoparticle plating and method for the same
US6582673B1 (en) * 2000-03-17 2003-06-24 University Of Central Florida Carbon nanotube with a graphitic outer layer: process and application

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060026A (en) * 1997-07-31 2000-05-09 Starfire Electronic Development & Mktg., Ltd. Photoelectrochemical device containing a quantum confined silicon particle
US6582673B1 (en) * 2000-03-17 2003-06-24 University Of Central Florida Carbon nanotube with a graphitic outer layer: process and application
US20030089611A1 (en) * 2001-11-15 2003-05-15 The Board Of Trustts Of The University Of Illinois Elemental silicon nanoparticle plating and method for the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8618531B2 (en) 2005-08-12 2013-12-31 Cambrios Technologies Corporation Transparent conductors comprising metal nanowires
US8174667B2 (en) 2006-10-12 2012-05-08 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
US9534124B2 (en) 2010-02-05 2017-01-03 Cam Holding Corporation Photosensitive ink compositions and transparent conductors and method of using the same

Also Published As

Publication number Publication date
WO2004034421A2 (en) 2004-04-22
JP4130655B2 (en) 2008-08-06
JP2006501370A (en) 2006-01-12

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