WO2003056066A3 - Apparatus for the generation and supply of fluorine gas - Google Patents

Apparatus for the generation and supply of fluorine gas Download PDF

Info

Publication number
WO2003056066A3
WO2003056066A3 PCT/EP2002/014909 EP0214909W WO03056066A3 WO 2003056066 A3 WO2003056066 A3 WO 2003056066A3 EP 0214909 W EP0214909 W EP 0214909W WO 03056066 A3 WO03056066 A3 WO 03056066A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas
supply
cylinder
electrolytic cell
generation
Prior art date
Application number
PCT/EP2002/014909
Other languages
French (fr)
Other versions
WO2003056066A2 (en
Inventor
Kennedy Colin
Takato Kimura
Minoru Ino
Jun Sonobe
Original Assignee
Air Liquide
Kennedy Colin
Takato Kimura
Minoru Ino
Jun Sonobe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide, Kennedy Colin, Takato Kimura, Minoru Ino, Jun Sonobe filed Critical Air Liquide
Priority to US10/500,406 priority Critical patent/US20050161321A1/en
Priority to AU2002367093A priority patent/AU2002367093A1/en
Priority to EP02805785A priority patent/EP1461475A2/en
Priority to KR10-2004-7010078A priority patent/KR20040075034A/en
Publication of WO2003056066A2 publication Critical patent/WO2003056066A2/en
Publication of WO2003056066A3 publication Critical patent/WO2003056066A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Drying Of Semiconductors (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Abstract

To provide an apparatus for fluorine gas generation and supply that is disposed in the gas supply system of a semiconductor processing system and that in the event of abnormalities in the apparatus enables back up by a safe and inexpensive structure. An apparatus 30 for the generation and supply of gas is disposed in the gas supply system of a semiconductor processing system. This apparatus 30 contains an electrolytic cell 34 that generates fluorine gas and a cylinder 62 that holds a substitute gas selected from the group consisting of nitrogen fluoride, sulfur fluoride, and chlorine fluoride. The electrolytic cell 34 and cylinder 62 are connected to a gas switching section 56 that selectively supplies a gas utilization section with fluorine gas from the electrolytic cell 34 or with substitute gas from the cylinder 62. A controller 40 controls the gas switching section 56 in such a manner that, upon detection of an abnormal state at the electrolytic cell 34 or in the gas supply path by detectors 36, 72, substitute gas is supplied from the cylinder 62 to the gas utilization section.
PCT/EP2002/014909 2001-12-27 2002-12-20 Apparatus for the generation and supply of fluorine gas WO2003056066A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US10/500,406 US20050161321A1 (en) 2001-12-27 2002-12-20 Apparatus for the generation and supply of fluorine gas
AU2002367093A AU2002367093A1 (en) 2001-12-27 2002-12-20 Apparatus for the generation and supply of fluorine gas
EP02805785A EP1461475A2 (en) 2001-12-27 2002-12-20 Apparatus for the generation and supply of fluorine gas
KR10-2004-7010078A KR20040075034A (en) 2001-12-27 2002-12-20 Apparatus for the Generation and Supply of Fluorine Gas

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001/397278 2001-12-27
JP2001397278A JP3725822B2 (en) 2001-12-27 2001-12-27 Fluorine gas generation and supply equipment

Publications (2)

Publication Number Publication Date
WO2003056066A2 WO2003056066A2 (en) 2003-07-10
WO2003056066A3 true WO2003056066A3 (en) 2004-03-25

Family

ID=19189170

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/014909 WO2003056066A2 (en) 2001-12-27 2002-12-20 Apparatus for the generation and supply of fluorine gas

Country Status (8)

Country Link
US (1) US20050161321A1 (en)
EP (1) EP1461475A2 (en)
JP (1) JP3725822B2 (en)
KR (1) KR20040075034A (en)
CN (1) CN1608146A (en)
AU (1) AU2002367093A1 (en)
TW (1) TWI252214B (en)
WO (1) WO2003056066A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3569277B1 (en) * 2003-05-28 2004-09-22 東洋炭素株式会社 Current control method and current control device for gas generator
JP3725145B2 (en) * 2003-07-14 2005-12-07 東洋炭素株式会社 Molten salt electrolytic bath control device and control method thereof
JP4018726B2 (en) 2006-02-07 2007-12-05 東洋炭素株式会社 Semiconductor manufacturing plant
JP5659491B2 (en) * 2009-01-30 2015-01-28 セントラル硝子株式会社 Semiconductor manufacturing equipment including fluorine gas generator
KR20120098683A (en) * 2009-10-16 2012-09-05 솔베이 플루오르 게엠베하 High-purity fluorine gas, the production and use thereof, and a method for monitoring impurities in a fluorine gas
US20130017644A1 (en) * 2011-02-18 2013-01-17 Air Products And Chemicals, Inc. Fluorine Based Chamber Clean With Nitrogen Trifluoride Backup
TWI458843B (en) * 2011-10-06 2014-11-01 Ind Tech Res Inst Evaporation apparatus and method of forminf organic film
CN104651873A (en) * 2014-12-22 2015-05-27 四川聚核科技有限公司 Intelligentized container modularized middle-temperature electrolytic fluorine-preparing device
JP2016134569A (en) * 2015-01-21 2016-07-25 株式会社東芝 Semiconductor manufacturing equipment
FR3111133A1 (en) * 2020-06-04 2021-12-10 Université du Mans AUTOMATED CHEMICAL TREATMENT PROCESS OF A SOLID SUBSTRATE BY A FLUORATION LINE

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0857796A2 (en) * 1993-07-30 1998-08-12 Applied Materials, Inc. Apparatus for the low temperature etching of cold-wall CVD reactors
JP2001267241A (en) * 2000-03-10 2001-09-28 L'air Liquide Method and apparatus for cleaning, and method and apparatus for etching
WO2001077412A1 (en) * 2000-04-07 2001-10-18 Toyo Tanso Co., Ltd. Apparatus for generating fluorine gas

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU543291B2 (en) * 1981-01-06 1985-04-18 Medishield Corp. Ltd. Gas switching device
GB9418598D0 (en) * 1994-09-14 1994-11-02 British Nuclear Fuels Plc Fluorine cell
WO2000014782A1 (en) * 1998-09-03 2000-03-16 Nippon Sanso Corporation Feed device for large amount of semiconductor process gas

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0857796A2 (en) * 1993-07-30 1998-08-12 Applied Materials, Inc. Apparatus for the low temperature etching of cold-wall CVD reactors
JP2001267241A (en) * 2000-03-10 2001-09-28 L'air Liquide Method and apparatus for cleaning, and method and apparatus for etching
WO2001077412A1 (en) * 2000-04-07 2001-10-18 Toyo Tanso Co., Ltd. Apparatus for generating fluorine gas
EP1283280A1 (en) * 2000-04-07 2003-02-12 Toyo Tanso Co., Ltd. Apparatus for generating fluorine gas

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 26 1 July 2002 (2002-07-01) *

Also Published As

Publication number Publication date
CN1608146A (en) 2005-04-20
JP2003193278A (en) 2003-07-09
TW200306950A (en) 2003-12-01
AU2002367093A1 (en) 2003-07-15
AU2002367093A8 (en) 2003-07-15
JP3725822B2 (en) 2005-12-14
TWI252214B (en) 2006-04-01
EP1461475A2 (en) 2004-09-29
KR20040075034A (en) 2004-08-26
US20050161321A1 (en) 2005-07-28
WO2003056066A2 (en) 2003-07-10

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